WO2018028461A1 - 一种新型阳离子型光引发剂及其制备方法和应用 - Google Patents
一种新型阳离子型光引发剂及其制备方法和应用 Download PDFInfo
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- WO2018028461A1 WO2018028461A1 PCT/CN2017/095371 CN2017095371W WO2018028461A1 WO 2018028461 A1 WO2018028461 A1 WO 2018028461A1 CN 2017095371 W CN2017095371 W CN 2017095371W WO 2018028461 A1 WO2018028461 A1 WO 2018028461A1
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- cationic photoinitiator
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- 239000012952 cationic photoinitiator Substances 0.000 title claims abstract description 34
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- 239000000543 intermediate Substances 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 17
- 239000007787 solid Substances 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 14
- 239000002994 raw material Substances 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 238000006243 chemical reaction Methods 0.000 claims description 13
- 229910052736 halogen Inorganic materials 0.000 claims description 12
- 150000002367 halogens Chemical class 0.000 claims description 12
- 150000002431 hydrogen Chemical class 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 claims description 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 8
- 239000008367 deionised water Substances 0.000 claims description 8
- 229910021641 deionized water Inorganic materials 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 6
- 125000005119 alkyl cycloalkyl group Chemical group 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 claims description 5
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 5
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical group C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims description 4
- 150000001450 anions Chemical class 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical group C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical group C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 claims description 4
- 125000001072 heteroaryl group Chemical group 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- -1 sulfur ion Chemical class 0.000 claims description 4
- 238000003786 synthesis reaction Methods 0.000 claims description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 4
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims description 3
- 229910017008 AsF 6 Inorganic materials 0.000 claims description 3
- 238000005727 Friedel-Crafts reaction Methods 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 229910018286 SbF 6 Inorganic materials 0.000 claims description 3
- 125000002015 acyclic group Chemical group 0.000 claims description 3
- 150000001924 cycloalkanes Chemical class 0.000 claims description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 230000000269 nucleophilic effect Effects 0.000 claims description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 2
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 claims description 2
- 125000000041 C6-C10 aryl group Chemical group 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims description 2
- 230000009471 action Effects 0.000 claims description 2
- 239000000853 adhesive Substances 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000000976 ink Substances 0.000 claims description 2
- 125000002971 oxazolyl group Chemical group 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- 239000003566 sealing material Substances 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 239000011593 sulfur Substances 0.000 claims description 2
- 235000005074 zinc chloride Nutrition 0.000 claims description 2
- 239000011592 zinc chloride Substances 0.000 claims description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims 2
- 125000003943 azolyl group Chemical group 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000004383 yellowing Methods 0.000 abstract description 9
- 238000013508 migration Methods 0.000 abstract description 6
- 230000005012 migration Effects 0.000 abstract description 6
- 238000010521 absorption reaction Methods 0.000 abstract description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 239000011259 mixed solution Substances 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 239000007791 liquid phase Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 230000000977 initiatory effect Effects 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229940126062 Compound A Drugs 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000005457 ice water Substances 0.000 description 3
- 238000000016 photochemical curing Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical group S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 229940125782 compound 2 Drugs 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 231100000989 no adverse effect Toxicity 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 125000005913 (C3-C6) cycloalkyl group Chemical group 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- DQNSRQYYCSXZDF-UHFFFAOYSA-N 1,4-bis(ethenoxymethyl)cyclohexane Chemical compound C=COCC1CCC(COC=C)CC1 DQNSRQYYCSXZDF-UHFFFAOYSA-N 0.000 description 1
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 1
- WVXLLHWEQSZBLW-UHFFFAOYSA-N 2-(4-acetyl-2-methoxyphenoxy)acetic acid Chemical compound COC1=CC(C(C)=O)=CC=C1OCC(O)=O WVXLLHWEQSZBLW-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 125000005520 diaryliodonium group Chemical group 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-M dihydrogenphosphate Chemical compound OP(O)([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-M 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 239000012949 free radical photoinitiator Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine group Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- QBJDFZSOZNDVDE-UHFFFAOYSA-M sodium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F QBJDFZSOZNDVDE-UHFFFAOYSA-M 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
- C07D335/12—Thioxanthenes
- C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
- C07D335/16—Oxygen atoms, e.g. thioxanthones
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D327/00—Heterocyclic compounds containing rings having oxygen and sulfur atoms as the only ring hetero atoms
- C07D327/02—Heterocyclic compounds containing rings having oxygen and sulfur atoms as the only ring hetero atoms one oxygen atom and one sulfur atom
- C07D327/06—Six-membered rings
- C07D327/08—[b,e]-condensed with two six-membered carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/76—Dibenzothiophenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
- C07D335/12—Thioxanthenes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Definitions
- the invention belongs to the technical field of organic light curing, and particularly relates to a novel cationic photoinitiator and a preparation method and application thereof.
- Photoinitiators are a key component of photocurable products and play a decisive role in the cure rate of photocurable products.
- Photoinitiators can be divided into cationic photoinitiators and free radical photoinitiators according to their initiation mechanism. Compared with free radical polymerization, cationic photocuring systems have less oxygen inhibition and volume shrinkage during curing. Small, resin selection type is wider and more. In China, the research and development of cationic photocuring systems is relatively late, and there are not many enterprises capable of industrial production.
- Triarylsulfonium salt is one of the most widely used and best-performing cationic photoinitiators. It is superior to diaryliodonium salts in terms of absorption wavelength, thermal stability and initiation activity, but such photoinitiators
- the maximum absorption wavelength of the agent is still less than 300 nm, and the long-wavelength light source cannot be effectively utilized, and the solubility and migration problems are present, which limits the use to some extent.
- People have tried to improve its structure, such as introducing long-chain alkyl groups to improve its solubility, introducing polyfunctional groups to improve the efficiency of initiation and thermal stability, etc. However, in practical applications, these improved structures tend to migrate easily to small molecules. Compounds, yellowing and other defects, and the efficiency of initiation still needs to be further improved. To this end, the subject photoinitiator was developed.
- the object of the present invention is firstly to provide a novel cationic photoinitiator. It has been found that, as described in the following, in combination with the sulfonium salt structure and the hydrazine structure, the obtained photoinitiator absorbs red light, has excellent sensitizing properties, and is characterized by difficulty in migration and yellowing resistance.
- R 1 and R 2 independently of each other represent halogen, OH, CN, NO 2 , C 1 -C 20 linear or branched alkyl, C 3 -C 20 cycloalkyl, C 4 -C 20 cycloalkane Alkylalkyl, C 4 -C 20 alkylcycloalkyl, C 6 -C 40 aryl or heteroaryl, wherein -CH 2 - may be optionally -O-, -S-, -NH -, -CO-, -COO- or -OCO-;
- n 1 and m 2 represent the number of R 1 and R 2 , respectively, and independently take an integer of 0 to 3;
- R 4 and R 5 independently of each other represent hydrogen, a C 1 -C 10 linear or branched alkyl group, a C 3 -C 10 cycloalkyl group, a C 4 -C 12 cycloalkylalkyl group, C 4 - An alkylcycloalkyl group of C 12 wherein -CH 2 - may be optionally substituted by -O-, -S-, -CO-, -COO- or -OCO-; and optionally, R 4 and R 5 can be linked into a ring;
- R 6 and R 7 may be the same or different, and each independently represents a phenyl group, a diphenyl sulfide group, a benzophenone group, a decyl group, a diphenyl ether group, an oxazolyl group, wherein hydrogen may be used.
- a halogen, CN, NO 2 , or C 1 -C 8 alkyl group, and -CH 2 - in the C 1 -C 8 alkyl group may be optionally -O-, -S -, -CO-, -COO- or -OCO- is substituted; optionally, R 6 and R 7 may be linked into a ring;
- R 3 represents a hydrogen, halogen, CN, NO 2 , R 8 , -CO-R 8 or S + (R 6 )(R 7 ) group;
- R 8 represents a C 1 -C 10 linear or branched alkyl group a C 3 -C 10 cycloalkyl group, a C 4 -C 15 cycloalkylalkyl group, a C 6 -C 20 aryl group, a C 7 -C 20 arylalkyl group, wherein the cycloalkyl structure and H in the aryl structure may be optionally substituted by a C 1 -C 6 alkyl group, and -CH 2 - may be optionally -O-, -S-, -NH-, -CO-, -COO- Or replaced by -OCO-;
- X - represents a non-nucleophilic anion
- n 1 or 2.
- R 1 and R 2 independently of each other represent a straight or branched chain of halogen, OH, CN, NO 2 or C 1 -C 10 .
- n 1 and m 2 independently take an integer of 0-2. Further preferably, both m 1 and m 2 are 0.
- R 4 and R 5 independently of each other represent hydrogen, a C 1 -C 8 linear or branched alkyl group, a C 3 -C 6 cycloalkyl group, a C 4 -C 10 cycloalkylalkyl group, Wherein acyclic-CH 2 - may be optionally substituted by -O-, -S-, -CO-, -COO- or -OCO-; and optionally, R 3 and R 4 may be bonded to each other to form Cycloalkyl.
- R 6 and R 7 independently of each other represent phenyl, diphenyl sulfide, benzophenone, fluorenyl, diphenyl ether, carbazolyl, wherein the hydrogen may be optionally CN, NO 2 or a C 1 -C 4 alkyl group, and -CH 2 - in the C 1 -C 4 alkyl group may be optionally -O-, -S-, -CO-, -COO - or -OCO- replaced.
- R 6 and R 7 are independently of each other selected from the group consisting of:
- R 6 and R 7 may also be bonded to each other to form a ring by a sulfur ion; preferably the following groups are formed:
- R 3 represents a hydrogen, halogen, CN, NO 2 , R 8 , -CO-R 8 or S + (R 6 ) (R 7 ) group;
- R 8 represents a linear or branched C 1 -C 6 An alkyl group, a C 3 -C 8 cycloalkyl group, a C 4 -C 10 cycloalkylalkyl group, a C 6 -C 10 aryl group, a C 7 -C 12 arylalkyl group, wherein a cycloalkane
- the H in the base structure and the aryl structure may be optionally substituted by a C 1 -C 4 alkyl group, and the acyclic -CH 2 - may be optionally -O-, -S-, -NH-, -CO -, -COO- or -OCO-.
- R 3 represents a S + (R 6 ) (R 7 ) group
- it is bilaterally symmetric with the S + (R 6 ) (R 7 ) group on the other side.
- X ⁇ is selected from the group consisting of C m F 2m+1 SO 3 - , BF 4 - , SbF 6 - , AsF 6 - , PF 6 - and B(C 6 Q 5 ) 4 - , wherein Q represents hydrogen or halogen, m is an integer from 1-8.
- X - is selected from the group consisting of CF 3 SO 3 - , C 4 F 9 SO 3 - , C 8 F 17 SO 3 - , PF 6 - , AsF 6 - , SbF 6 - or B(C 6 H 5 ) 4 - , B(C 6 F 5 ) 4 - .
- n is the same as the number of the S + (R 6 ) (R 7 ) group in the formula (I).
- R 3 represents a S + (R 6 )(R 7 ) group
- n takes 2; when R 3 does not represent a S + (R 6 )(R 7 ) group, n takes 1.
- cationic photoinitiator of the present invention may be selected from the following structures:
- the present invention also relates to a method for preparing a novel cationic photoinitiator represented by the above formula (I), and the reaction scheme is as follows:
- R 3 represents a S + (R 6 )(R 7 ) group
- R 3 ' represents hydrogen
- R 3 ' R 3 ;
- the raw material a and the raw material b are subjected to a Friedel-Craft reaction in an organic solvent under the action of aluminum trichloride or zinc chloride to synthesize an intermediate;
- the intermediate is added to an organic solvent in which NaX or KX is dissolved, stirred until dissolved, and then stirred by adding deionized water to precipitate a solid, which is suction filtered and recrystallized to obtain a product; wherein X of NaX and KX is the above non-nucleophilic Sex anion.
- the raw materials used are all known compounds in the prior art, and can be easily prepared commercially or by a known synthesis method.
- the raw material a can be synthesized by a method disclosed in, for example, Chinese Patent Application No. 201010557275.7, 200910030326.8, 2015109373280.0, the entire disclosure of which is incorporated herein by reference.
- steps (1) and (2) are conventional reactions in the art for synthesizing similar compounds.
- the specific reaction conditions are readily ascertainable to those skilled in the art on the basis of the synthetic idea disclosed in the present invention.
- the reaction temperature is usually -10 to 30 °C.
- the organic solvent to be used is not particularly limited as long as it can dissolve the raw material and has no adverse effect on the reaction, such as dichloromethane, dichloroethane, benzene, toluene, xylene, and the like.
- the ion exchange reaction in the step (2) is carried out in a solvent system, and the organic solvent to be used is not particularly limited as long as it can dissolve the reaction raw material, is miscible with water, and has no adverse effect on the reaction, such as acetone, methyl ethyl ketone, methyl group. Isobutyl ketone, cyclohexanone, methanol, ethanol, isopropanol.
- the reaction temperature is not particularly limited and may be room temperature.
- the present invention also includes the use of the cationic photoinitiator represented by the above formula (I) in a photocurable composition.
- the cationic photoinitiator or mixture thereof can be used directly in the formulation or in combination with other cationic photoinitiators.
- the photocurable composition containing the cationic photoinitiator of the present invention may optionally further contain a known additive such as a solvent, a sensitizer, a pigment, a filler, an antifoaming agent, and a leveling agent as needed. And non-reactive resins.
- the photoinitiator of the present invention can be applied to coatings, coating agents, photoresists, photosensitive materials, sealing materials, inks, adhesives, polarizing films, epoxy floors, and the like.
- the photoinitiator is capable of matching longer absorption wavelengths during application, resulting in excellent solubility, low mobility and yellowing resistance.
- the application properties of the photoinitiator represented by the formula (I) of the present invention are evaluated by formulating an exemplary photocurable composition, including photosensitivity, storage stability, migration, yellowing resistance and the like.
- the photocurable composition was formulated according to the formulation shown in Table 2. First, a cationic photoinitiator is dissolved in a solvent of propylene carbonate, and then uniformly mixed with a cationically polymerizable monomer to prepare a photocurable composition.
- the cationically polymerizable monomer is one or a combination of two or more of A1, A2 and A3:
- A1 3,4-epoxycyclohexylcarboxylic acid-3',4'-epoxycyclohexylmethyl ester (CAS: 2386-87-0);
- A2 bis(3,4-epoxycyclohexylmethyl) hexanoate (CAS: 3130-19-6);
- A3 1,4-cyclohexanedimethanol divinyl ether (CAS: 17351-75-6).
- the cationic photoinitiator is a cationic photoinitiator of the invention or as a comparative compound A and/or B.
- the composition was stirred under a yellow light, and a film was formed by roll-coating on a PET template, and dried at 90 ° C for 5 minutes to remove a solvent to form a coating film having a film thickness of about 2 ⁇ m.
- the substrate on which the coating film was formed was cooled to room temperature, and the coating film was exposed to light by a high pressure mercury lamp (exposure machine model RW-UV70201, wavelength 200-500 nm, light intensity 100 mW/cm 2 ), exposure time 2 s, room temperature 2 min.
- Exposure machine model RW-UV70201 exposure machine model 200-500 nm, light intensity 100 mW/cm 2
- exposure time 2 s room temperature 2 min.
- the pencil hardness of the cured film was observed (test method is referred to GB/T 6739-1986); the higher the pencil hardness, the better the photocurability of the composition, that is, the more excellent the sensitivity of the initiator.
- ⁇ pencil hardness is 2H or more
- the pencil hardness is 2B or less or the pencil hardness cannot be measured.
- the composition was stirred under a yellow light, and a film was formed by roll-coating on a PET template, and dried at 90 ° C for 5 minutes to remove a solvent to form a coating film having a film thickness of about 2 ⁇ m.
- the substrate on which the coating film was formed was cooled to room temperature, and the coating film was exposed to light by a high pressure mercury lamp (exposure machine model RW-UV70201, wavelength: 200-500 nm, light intensity: 100 mW/cm 2 ), and the exposure time was 4 s. Cured film.
- the composition was stirred under a yellow light, and a film was formed by roll-coating on a PET template, and dried at 90 ° C for 5 minutes to remove a solvent to form a coating film having a film thickness of about 2 ⁇ m.
- the substrate on which the coating film was formed was cooled to room temperature, and the coating film was exposed to light by a high pressure mercury lamp (exposure machine model RW-UV70201, wavelength: 200-500 nm, light intensity: 100 mW/cm 2 ), and the exposure time was 4 s. Cured film.
- the light source was a high pressure mercury lamp (main wavelength 365 nm, whole machine power: about 2.2 KW), and the cured film was continuously irradiated for 6 hours to observe the yellowing of the cured film:
- ⁇ colorless and transparent, the surface is smooth
- ⁇ The surface is yellow or the viscosity is increased.
- the photocurable composition obtained above was heated in an oven at 80 ° C for 24 hours under light shielding, and stored at room temperature for one month in the dark, and the viscosity of the composition before and after one month of heating was measured. The less the viscosity rises, the better the storage stability.
- ⁇ viscosity change is less than 1.5 times
- Example / Comparative Example Sensitivity Mobility Yellowing resistance Storage stability Example 19 ⁇ ⁇ ⁇ ⁇ Example 20 ⁇ ⁇ ⁇ ⁇ Example 21 ⁇ ⁇ ⁇ ⁇ Example 22 ⁇ ⁇ ⁇ ⁇ Example 23 ⁇ ⁇ ⁇ ⁇ Example 24 ⁇ ⁇ ⁇ ⁇ Example 25 ⁇ ⁇ ⁇ ⁇ Example 26 ⁇ ⁇ ⁇ ⁇ Example 27 ⁇ ⁇ ⁇ ⁇ Example 28 ⁇ ⁇ ⁇ ⁇ Example 29 ⁇ ⁇ ⁇ ⁇ Comparative example 1 ⁇ ⁇ ⁇ ⁇ Comparative example 2 ⁇ ⁇ ⁇ Comparative example 3 ⁇ ⁇ ⁇ ⁇ Comparative example 4 ⁇ ⁇ ⁇ ⁇ Comparative Example 5 ⁇ ⁇ ⁇ ⁇ ⁇
- the photocurable composition using the cationic photoinitiator of the present invention is excellent in photographic performance compared to the conventional sulfonium salt photoinitiator (compounds A and B), and the pencil hardness of the cured film is uniform. It has more than 2H and is characterized by difficulty in migration, yellowing resistance and better storage stability.
- the cationic photoinitiator used in Examples 19-29 has a larger molecular weight than the compound A or B, and the molar amount is relatively low at the same mass, and the pencil hardness is above 2H, further illustrating The photoinitiator of the present invention has advantages in photographic performance.
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Abstract
Description
实施例/比较例 | 感光性 | 迁移性 | 耐黄变性 | 储存稳定性 |
实施例19 | ◎ | ◎ | ◎ | ◎ |
实施例20 | ◎ | ◎ | ◎ | ◎ |
实施例21 | ◎ | ◎ | ◎ | ◎ |
实施例22 | ◎ | ◎ | ◎ | ◎ |
实施例23 | ◎ | ◎ | ◎ | ◎ |
实施例24 | ◎ | ◎ | ◎ | ◎ |
实施例25 | ◎ | ◎ | ◎ | ◎ |
实施例26 | ◎ | ◎ | ◎ | ◎ |
实施例27 | ◎ | ◎ | ◎ | ◎ |
实施例28 | ◎ | ◎ | ◎ | ◎ |
实施例29 | ◎ | ◎ | ◎ | ◎ |
比较例1 | ● | ○ | ● | ○ |
比较例2 | ● | ○ | ● | ○ |
比较例3 | ○ | ○ | ○ | ○ |
比较例4 | ○ | ○ | ○ | ○ |
比较例5 | ○ | ○ | ○ | ○ |
Claims (13)
- 一种阳离子型光引发剂,其特征在于,所述阳离子型光引发剂具有如通式(I)所示的结构:其中,R1和R2相互独立地表示卤素、OH、CN、NO2、C1-C20的直链或支链烷基、C3-C20的环烷基、C4-C20的环烷基烷基、C4-C20的烷基环烷基、C6-C40的芳基或杂芳基,其中的-CH2-可任选地被-O-、-S-、-NH-、-CO-、-COO-或-OCO-所取代;m1和m2分别表示R1和R2的个数,m1和m2相互独立地取0-3的整数;R4和R5相互独立地表示氢、C1-C10的直链或支链烷基、C3-C10的环烷基、C4-C12的环烷基烷基、C4-C12的烷基环烷基,其中的-CH2-可任选地被-O-、-S-、-CO-、-COO-或-OCO-所取代;并且任选地,R4和R5可链接成环;R6和R7可相同,也可不同,两者相互独立地表示苯基、二苯硫醚基、二苯甲酮基、芴基、二苯醚基、咔唑基,其中的氢可任选地被卤素、CN、NO2、或C1-C8的烷基所取代,且所述C1-C8的烷基中的-CH2-可任选地被-O-、-S-、-CO-、-COO-或-OCO-所取代;任选地,R6和R7可连接成环;R3代表氢、卤素、CN、NO2、R8、-CO-R8或S+(R6)(R7)基团;R8表示C1-C10的直链或支链烷基、C3-C10的环烷基、C4-C15的环烷基烷基、C6-C20的芳基、C7-C20的芳基烷基,其中,环烷基结构和芳基结构中的H可任选地被C1-C6的烷基所取代,-CH2-可任选地被-O-、-S-、-NH-、-CO-、-COO-或-OCO-所取代;X-表示非亲核性阴离子;n为1或2。
- 根据权利要求1所述的阳离子型光引发剂,其特征在于:R1和R2相互独立地表示卤素、OH、CN、NO2、C1-C10的直链或支链烷基、C3-C10的环烷基、C4-C12的环烷基烷基、C4-C12的烷基环烷基、C6-C20的芳基或杂芳基,其中的-CH2-可任选地被-O-、-S-、-NH-、-CO-、-COO-或-OCO-所取代。
- 根据权利要求1或2所述的阳离子型光引发剂,其特征在于:m1和m2相互独立地取0-2的整数,优选地,m1和m2均为0。
- 根据权利要求1所述的阳离子型光引发剂,其特征在于:R4和R5相互独立地表示氢、C1-C8的直链或支链烷基、C3-C6的环烷基、C4-C10的环烷基烷基,其中的非环-CH2-可任选地被-O-、-S-、-CO-、-COO-或-OCO-所取代;并且任选地,R3和R4可彼此相连以形成环烷基。
- 根据权利要求1所述的阳离子型光引发剂,其特征在于:R6和R7相互独立地表示苯基、二苯硫醚基、二苯甲酮基、芴基、二苯醚基、咔唑基,其中的氢可任选地被CN、NO2、或C1-C4的烷基所取代,且所述C1-C4的烷基中的-CH2-可任选地被-O-、-S-、-CO-、-COO-或-OCO-所取代。
- 根据权利要求1所述的阳离子型光引发剂,其特征在于:R3代表氢、卤素、CN、NO2、R8、-CO-R8或S+(R6)(R7)基团;R8表示C1-C6的直链或支链烷基、C3-C8的环烷基、C4-C10的环烷基烷基、C6-C10的芳基、C7-C12的芳基烷基,其中,环烷基结构和芳基结构中的H可任选地被C1-C4的烷基所取代,非环-CH2-可任选地被-O-、-S-、-NH-、-CO-、-COO-或-OCO-所取代。
- 根据权利要求1或7所述的阳离子型光引发剂,其特征在于:当R3表示S+(R6)(R7)基团时,R3与另一侧的S+(R6)(R7)基团左右对称。
- 根据权利要求1所述的阳离子型光引发剂,其特征在于:X-选自CmF2m+1SO3 -、BF4 -、SbF6 -、AsF6 -、PF6 -或B(C6Q5)4 -,其中Q代表氢或卤素,m为1-8的整数。
- 根据权利要求1所述的阳离子型光引发剂,其特征在于:n的取值与通式(I)中S+(R6)(R7)基团的数量相同。
- 权利要求1-10中任一项所述的阳离子型光引发剂在光固化组合物的应用。
- 根据权利要求12所述的应用,其特征在于:所述的阳离子型光引发剂用于制作涂料、涂布剂、光致抗蚀剂、光敏材料、密封材料、油墨、粘合剂、偏光膜、环氧地坪。
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1989145A (zh) * | 2004-05-28 | 2007-06-27 | 三亚普罗株式会社 | 新颖的氟代烷基氟磷酸盐和过渡金属络合物盐 |
CN101778818A (zh) * | 2007-08-07 | 2010-07-14 | 株式会社Adeka | 芳香族硫鎓盐化合物 |
US8192590B1 (en) * | 2008-04-14 | 2012-06-05 | University Of Central Florida Research Foundation, Inc. | Microwave-assisted formation of sulfonium photoacid generators |
JP2012167051A (ja) * | 2011-02-14 | 2012-09-06 | Hitachi Chemical Co Ltd | スルホニウムベンゼンスルホネート錯体及び樹脂組成物 |
JP2014070020A (ja) * | 2012-09-27 | 2014-04-21 | Sumitomo Seika Chem Co Ltd | トリアリールスルホニウム塩の製造方法 |
CN104267578A (zh) * | 2014-08-15 | 2015-01-07 | 同济大学 | 一类含芴的硫鎓盐类光生酸剂、制备方法及其应用 |
CN104781304A (zh) * | 2012-10-16 | 2015-07-15 | 横滨橡胶株式会社 | 阳离子聚合引发剂、硬化剂组合物以及环氧树脂组合物 |
CN105130860A (zh) * | 2015-08-09 | 2015-12-09 | 同济大学 | 一类含芴结构的双支化光敏化合物、制备方法及其应用 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0115588D0 (en) | 2001-06-26 | 2001-08-15 | Coates Brothers Plc | Novel compounds for use as photoinitiators |
GB0204467D0 (en) | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
ATE473209T1 (de) | 2005-07-01 | 2010-07-15 | Basf Se | Sulfoniumsalzinitiatoren |
WO2007118794A1 (en) | 2006-04-13 | 2007-10-25 | Ciba Holding Inc. | Sulphonium salt initiators |
EP2125713B1 (en) | 2006-10-04 | 2012-04-18 | Basf Se | Sulphonium salt photoinitiators |
WO2009047152A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
EP2197840B1 (en) | 2007-10-10 | 2013-11-06 | Basf Se | Sulphonium salt initiators |
CN101302257A (zh) * | 2008-06-03 | 2008-11-12 | 江南大学 | 一种紫外光敏复合引发体系及其应用 |
KR101700980B1 (ko) | 2009-02-20 | 2017-01-31 | 산아프로 가부시키가이샤 | 술포늄염, 광산 발생제 및 감광성 수지 조성물 |
JP5645510B2 (ja) * | 2009-07-10 | 2014-12-24 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物およびこれを用いたパターン形成方法 |
JP2013234320A (ja) * | 2012-04-13 | 2013-11-21 | Fujifilm Corp | 光酸発生剤含有組成物、それを用いた感光性組成物、硬化膜、パターン配向膜、及び水溶性の光酸発生剤 |
JP6797911B2 (ja) * | 2016-06-09 | 2020-12-09 | サンアプロ株式会社 | スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物 |
EP3492476A4 (en) * | 2016-07-28 | 2020-03-18 | San-Apro Ltd. | SULPHONIUM SALT, HEAT OR PHOTO ACID GENERATOR, HEAT-CURABLE OR PHOTO-CURABLE COMPOSITION AND HARDENED PRODUCT THEREOF |
US11142495B2 (en) | 2016-10-17 | 2021-10-12 | Toyo Gosei Co., Ltd. | Composition and method for manufacturing device using same |
-
2016
- 2016-08-08 CN CN201610646348.7A patent/CN107698477B/zh active Active
-
2017
- 2017-08-01 EP EP17838591.0A patent/EP3498691B1/en active Active
- 2017-08-01 US US16/318,890 patent/US10995082B2/en active Active
- 2017-08-01 WO PCT/CN2017/095371 patent/WO2018028461A1/zh unknown
- 2017-08-01 JP JP2019501977A patent/JP6741854B2/ja active Active
- 2017-08-01 KR KR1020197001265A patent/KR102206574B1/ko active IP Right Grant
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1989145A (zh) * | 2004-05-28 | 2007-06-27 | 三亚普罗株式会社 | 新颖的氟代烷基氟磷酸盐和过渡金属络合物盐 |
CN101778818A (zh) * | 2007-08-07 | 2010-07-14 | 株式会社Adeka | 芳香族硫鎓盐化合物 |
US8192590B1 (en) * | 2008-04-14 | 2012-06-05 | University Of Central Florida Research Foundation, Inc. | Microwave-assisted formation of sulfonium photoacid generators |
JP2012167051A (ja) * | 2011-02-14 | 2012-09-06 | Hitachi Chemical Co Ltd | スルホニウムベンゼンスルホネート錯体及び樹脂組成物 |
JP2014070020A (ja) * | 2012-09-27 | 2014-04-21 | Sumitomo Seika Chem Co Ltd | トリアリールスルホニウム塩の製造方法 |
CN104781304A (zh) * | 2012-10-16 | 2015-07-15 | 横滨橡胶株式会社 | 阳离子聚合引发剂、硬化剂组合物以及环氧树脂组合物 |
CN104267578A (zh) * | 2014-08-15 | 2015-01-07 | 同济大学 | 一类含芴的硫鎓盐类光生酸剂、制备方法及其应用 |
CN105130860A (zh) * | 2015-08-09 | 2015-12-09 | 同济大学 | 一类含芴结构的双支化光敏化合物、制备方法及其应用 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2019225185A1 (ja) * | 2018-05-25 | 2021-06-24 | サンアプロ株式会社 | スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物 |
JP7174044B2 (ja) | 2018-05-25 | 2022-11-17 | サンアプロ株式会社 | スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物 |
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