WO2018019226A1 - 可调平的版库设备 - Google Patents

可调平的版库设备 Download PDF

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Publication number
WO2018019226A1
WO2018019226A1 PCT/CN2017/094273 CN2017094273W WO2018019226A1 WO 2018019226 A1 WO2018019226 A1 WO 2018019226A1 CN 2017094273 W CN2017094273 W CN 2017094273W WO 2018019226 A1 WO2018019226 A1 WO 2018019226A1
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WO
WIPO (PCT)
Prior art keywords
magazine
bearing
frame
rotating shaft
library
Prior art date
Application number
PCT/CN2017/094273
Other languages
English (en)
French (fr)
Inventor
范永威
陈淮阳
Original Assignee
上海微电子装备（集团）股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 上海微电子装备（集团）股份有限公司 filed Critical 上海微电子装备（集团）股份有限公司
Priority to US16/321,664 priority Critical patent/US10976673B2/en
Priority to JP2019504837A priority patent/JP6771088B2/ja
Priority to KR1020197004729A priority patent/KR102192204B1/ko
Priority to SG11201900824XA priority patent/SG11201900824XA/en
Publication of WO2018019226A1 publication Critical patent/WO2018019226A1/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus

Definitions

  • the present invention relates to the field of mask transmission, and more particularly to an adjustable flat library device.
  • a lithographic apparatus is a device that exposes a pattern on a reticle onto a silicon or glass substrate.
  • some lithography equipment uses a dedicated internal library to store a certain number of reticle in addition to the external library.
  • the workflow of the mask transfer system the reticle-equipped box is placed in the external library, the unlocking mechanism is unlocked and barcode scanned, and then placed in the internal library for replacement, and the robot removes the reticle from the internal library. Send to the mask table for exposure. After exposure, the mask table is handed over to the robot, sent back by the robot, and the exposed mask is returned to the internal library.
  • a reticle storage device with reasonable structure and use method can not only improve the working efficiency of mask transmission, but also improve the transmission precision and the cleanliness of the reticle, thereby providing more lithographic equipment.
  • a reliable reticle can not only improve the working efficiency of mask transmission, but also improve the transmission precision and the cleanliness of the reticle, thereby providing more lithographic equipment.
  • the existing reticle storage device is liftable, and the magazine is fixed on the lifting shaft, and includes a transmission mechanism 100, a support frame 101 and a magazine 102. There are a number of slots in the magazine and are moved along the Z direction by the transmission mechanism 100 through the connector.
  • the magazine is heavy, causing the transmission mechanism to wear and produce particles; the open version of the library will cause contamination of the surface of the reticle; the reticle may produce a relief, which is not conducive to subsequent pick and place. ; can not achieve security interlocks.
  • the structure is a cantilever structure, the bearing is heavier, the deformation amount is relatively large, and the design also has a certain error. In order to be able to be smoothly installed with the interface, it is necessary to perform Z-direction adjustment and first-time adjustment. If there is no first level adjustment, the whole When the level of the library equipment is poor, the level is more time-consuming.
  • the technical problem to be solved by the present invention is that when the level of the entire library device is poor, the level of adjustment is relatively time consuming.
  • the present invention provides an adjustable flat library device, including a magazine structure, a hinge structure and a frame structure; the library structure is mounted on the frame structure, thereby enabling The frame structure is leveled by the spindle structure, and the magazine structure can also be leveled relative to the frame structure.
  • the adjustable flat plate apparatus further includes a sealing structure disposed on the plate structure to enable the outer opening of the plate structure to be sealed.
  • the sealing structure comprises a structural body, a sealing door, a plate interface plate and a pushback mechanism, wherein the structural body is connected to the plate structure or the frame structure through the plate interface plate, and the pushback mechanism Both are mounted on the structural body, the sealing door is opened and closed at an outer opening of the magazine structure; and the pushback mechanism is driven to control opening and closing of the sealing door.
  • the sealing structure further includes an interlocking sensor, wherein the interlocking sensor is disposed on the structural body to detect whether the robot reaches a preset position for taking a plate or a plate, and the pushback structure is driven to be referenced. The detection result of the interlock sensor controls opening and closing of the sealing door.
  • the rotating shaft structure comprises a main rotating shaft, an adjusting mechanism, a frame interface device and a universal bearing, wherein the two ends of the main rotating shaft are respectively connected to the adjusting mechanism and the universal bearing, and the main rotating shaft also passes through the frame interface device Attached to the frame structure, the adjustment mechanism achieves leveling of the frame structure and the magazine structure thereon by adjusting the posture position of the main rotating shaft.
  • the adjusting mechanism comprises a first spherical bearing, an upper bearing seat, a bearing block connecting block, a wedge block and an adjusting screw, and the adjusting screw connects the wedge block in a vertical Z direction, and further
  • the wedge block is driven in a horizontal X direction by an adjustment of a vertical Z direction, the wedge block being connected to the upper bearing seat via the bearing block connecting block, the upper bearing seat being connected to the first spherical bearing by the first spherical bearing
  • One end of the main rotating shaft is further adjusted to swing in the RY direction with respect to the inner circumference of the first spherical bearing as the horizontal X direction of the wedge block, wherein the RY direction refers to a level Y perpendicular to the horizontal X direction. Rotate.
  • the adjusting mechanism further includes an adjusting screw, the adjusting screw adjusts a position between the bearing block connecting block and the upper bearing seat along the Y direction, so that the upper bearing seat is opposite to the first spherical bearing
  • the circle makes a swing in the RX direction, wherein the RX direction refers to a rotation around the horizontal X direction.
  • the universal bearing comprises a second spherical bearing, a lower bearing seat and a Z-direction adjusting block, wherein the lower bearing seat is connected to one end of the main rotating shaft through the second spherical bearing, the Z-direction adjusting block The position of the main shaft in the vertical Z direction is adjusted by a top block.
  • the frame structure comprises a magazine support frame and a storage device support frame, wherein the plate support is mounted on an upper side of the storage device support frame, and the magazine structure is mounted on the upper side of the plate support frame
  • the bottom of the storage device support frame is provided with a locking device for locking the position after being leveled by the rotating shaft structure.
  • the frame structure is provided with an air bath interface, and the air bath interface is externally connected to the inert gas source, and is internally connected to the plate structure through the air bath tube.
  • the frame structure is provided with a pumping particle interface, and the pumping particle interface is connected to the library structure by pumping a particle tube.
  • the library structure comprises a shelf, a magazine disposed on the shelf, and a slot provided in the magazine, and the mask is taken in the slot.
  • the leveling structure and the frame structure are leveled by a plurality of leveling screws.
  • a letterpress sensor is disposed in the library structure.
  • the invention introduces two levels of leveling mechanism, one level is the version structure and the frame structure Between the other, the level is the frame structure and the shaft structure. Therefore, after two levels of leveling, rapid leveling, and reduced labor intensity during leveling.
  • FIG. 1 is a schematic diagram of a mask storage device in the prior art
  • FIG. 2 is a schematic diagram of a library device in an alternative embodiment of the present invention.
  • Figure 3 is a schematic view of a frame structure in an alternative embodiment of the present invention.
  • Figure 4 is a schematic view showing the structure of a rotating shaft in an alternative embodiment of the present invention.
  • Figure 5 is a cross-sectional view showing the structure of a rotating shaft in an alternative embodiment of the present invention.
  • Figure 6 is a partial cross-sectional view showing an adjustment mechanism in an alternative embodiment of the present invention.
  • FIG. 7 is a schematic diagram of a repository structure in an alternative embodiment of the present invention.
  • Figure 8 is a schematic view of a sealing structure in an alternative embodiment of the present invention.
  • 1-air bath tube 2-frame structure; 3-axis structure; 4-plate structure; 5-sealing structure; 6-pulverized particle tube;
  • 201-storage device support frame 202-spindle interface; 203-plate support frame; 204-air bath interface; 205-thread lock bar; 206-guide tube; 207-thread guide groove; 208-powder interface;
  • 3011-interface board 3012-upper bearing housing; 3013-first spherical bearing; 3014-adjustment screw; 3015-wedge block; 3016-adjustment screw; 3017-fixing screw; 3018-bearing block connecting block;
  • 401-embossed sensor 402-leveling screw; 403-air bath interface; 404-plate; 405-plate slot; 406-cover; 407-mask presence sensor;
  • 500-structure body 501-sealed door; 502-plate library interface board; 503-return structure; 504-interlock sensor.
  • FIG. 1 to FIG. 8 is an optional embodiment of the present invention. It can be considered that those skilled in the art do not change the spirit and content of the present invention. Within the scope, it can be modified and polished.
  • the present invention provides a tunable flat library apparatus comprising a magazine structure 4, a hinge structure 3 and a frame structure 2; the magazine structure 4 is mounted on the frame structure 2, and is further capable of passing the frame structure 2 is leveled by the spindle structure 3, which can also be leveled relative to the frame structure 2.
  • the present invention introduces two levels of leveling mechanism, one level between the magazine structure 4 and the frame structure 2, and the other level is between the frame structure 2 and the rotating shaft structure 3, so that two levels can be achieved, Quickly level and reduce labor intensity during leveling.
  • the rotating shaft structure 3 includes a main rotating shaft 302, an adjusting mechanism 301, a frame interface device 304 and a universal bearing 303, and two ends of the main rotating shaft 302 are respectively connected
  • the adjusting mechanism 301 and the universal bearing 303, the main rotating shaft 302 is also fixed to the frame structure 2 through the frame interface device 304, and the adjusting mechanism 301 realizes the frame structure 2 by adjusting the posture position of the rotating shaft The leveling of the repository structure 4 on it.
  • the adjusting mechanism 301 includes a first spherical bearing 3013, an upper bearing block 3012, a bearing block connecting block 3018, a wedge block 3015 and an adjusting screw 3016.
  • the adjusting screw 3016 is connected to the wedge block 3015 in the Z direction, and further passes through the Z direction.
  • the adjustment drives the wedge block 3015 to be adjusted in the X direction. From the name of the wedge block 3015, it should be possible to obtain a member having a wedge face, based on the wedge face, Naturally, the conversion of the Z-direction and the X-direction motion can be obtained, which is easily understood by those skilled in the art, and therefore, the wedge block 3015 is connected to the upper bearing housing 3012 through the bearing block connecting block 3018.
  • the bearing housing 3012 is coupled to one end of the main rotating shaft 302 through the first spherical bearing 3013, and is further adjusted in the RY direction with respect to the inner circumference of the first spherical bearing 3013 as the X-direction of the wedge-shaped block 3015 is adjusted. swing.
  • the present invention also introduces a fixing screw 3017 to achieve the locking of the wedge block 3015.
  • the wedge block 3015 also has a waist-shaped hole through which the set screw 3017 passes, thereby providing some room for adjustment.
  • the adjustment in the RY direction can be realized.
  • the adjustment process can be described as: adjusting the adjusting screw 3016, the wedge block 3015 will drive the bearing block connecting block 3018 to move in the X direction, because the lower end is fixed, and the upper bearing
  • the main shaft 302 connected to the seat 3012 is forced to swing slightly along the RY, after adjusting the RY, the fixing screw 3017 is locked;
  • the adjustment mechanism 301 further includes an adjusting screw 3014, and the adjusting screw 3014 adjusts the bearing seat along the Y direction.
  • the position between the connecting block 3018 and the upper bearing housing 3012 further causes the upper bearing housing 3012 to swing in the RX direction with respect to the inner ring of the first spherical bearing 3013.
  • the adjustment screw 3014 is adjusted, and the upper bearing housing 3012 moves in the Y direction. Since the lower end is fixed, the main rotation shaft 302 is forced to swing along the RX to achieve a small amplitude. Adjust for RX.
  • the universal bearing 303 includes a second spherical bearing 3031, a lower bearing housing 3032, and a Z-direction adjusting block 3034.
  • the lower bearing housing 3032 is connected to the main rotating shaft through the second spherical bearing 3031.
  • the Z-direction adjustment block 3034 adjusts the position of the main shaft 3032 in the Z direction by a top block 3035.
  • the universal bearing 303 further includes a lock nut 3033 for locking the position of the Z-direction adjustment block 3034.
  • the Z-direction adjustment block 3034 is rotated, so that the Z-direction adjustment block 3034 The Z-direction is moved, and then the top block 3035 connected thereto is adjusted to the Z-direction of the magazine mechanism, and after being adjusted, the lock nut 3033 is used for locking.
  • the frame structure 2 includes a magazine support frame 203 and a storage device support frame 201.
  • the magazine support frame 203 is disposed on an upper side of the storage device support frame 201, and the magazine structure 4 is installed on The upper side of the magazine support frame 203; the bottom of the storage device support frame 201 is provided with a locking device for locking the position adjusted by the rotating shaft structure 3.
  • the thread locking lever 205 moves along the guiding tube 206 in the thread guiding groove 207 and is locked with the external device.
  • the guiding tube 206 or the thread guiding groove 207 is connected to the storage device support frame 201.
  • the first leveling can be completed after being locked by the locking device.
  • the present invention can also achieve a second leveling.
  • the magazine structure 4 and the frame structure 2 are adjusted by a plurality of leveling screws 402. level.
  • the frame structure 2 is provided with an air bath interface 204, and the air bath interface 204 is externally connected to an inert gas source, and is internally connected to the magazine structure 4 through the air bath tube 1.
  • the inert gas nitrogen enters the magazine structure 4 through the gas bath interface 204 to protect and clean the reticle.
  • the frame structure is provided with a pumping particle interface 208, which is connected to the magazine structure 4 by means of a pumping particle tube 6.
  • the pumping particle tube 6 is connected to the pumping particle interface 208 for extracting microscopic particles which may appear in the library structure 4.
  • the library structure 4 includes a shelf 404, a magazine disposed on the shelf 404, and a slot 405 disposed in the library, and the mask is taken in the version. Slot 405.
  • a relief sensor 401 is provided in the magazine structure 4.
  • the library structure 4 further includes a mask presence sensor 407 and a cover 406. The cover is disposed outside the package structure 4, and the mask presence sensor 407 is used. It is detected whether the mask is placed in the plate slot 405.
  • the lower end of the shelf 404 is connected to the magazine support frame 2203, and the upper end is provided with two magazines.
  • the customer can place one or two magazines according to actual needs, and each magazine has six layout slots 405;
  • the magazine can be used for the second leveling using the leveling screw 402 alone, the relief sensor 401 can detect whether the mask is a relief;
  • the air bath interface 204 is connected to the air bath tube in the magazine, and the mask presence sensor 407 is used to detect the slot.
  • the presence or absence of an internal mask are only examples, and should not be limited thereto, and those skilled in the art can make changes according to actual needs.
  • the adjustable flat plate apparatus further includes a sealing structure 5, and the sealing structure 5 is disposed on the magazine structure 4, and in the closed state, The outer opening of the magazine structure 4 is sealed. Therefore, when the pick-and-place operation is not performed, the magazine structure 4 is closed by the sealing structure 5, and at this time, the shielding gas can be charged into the magazine structure 4 through the air bath tube.
  • the sealing structure 5 includes a structural body 500, a sealing door 501, a plate interface plate 502, and a pushback mechanism 503.
  • the structural body 500 is connected to the library structure through the library interface board 502. 4 or frame structure 2, the pushback mechanism 503 is mounted to the structure
  • the main body 500, the sealing door 501 is opened and closed at an outer opening of the magazine structure 4; the pushback mechanism 503 is driven to control opening and closing of the sealing door 501.
  • the sealing structure 5 further includes an interlocking sensor 504, and the interlocking sensor 504 is disposed on the structural body 500 for detecting whether the robot reaches a preset position of the plate or the plate, the pushback The structure 503 is driven to control the opening and closing of the sealing door 501 with reference to the detection result of the interlock sensor 504. It can be understood that when the interlock sensor 504 detects that the robot is in place for the plate or plate, the pushback mechanism 503 opens the sealing door 501, and the interlock sensor 504 ensures that the sealing door is not blocked when the robot performs the plate or plate operation. Close to avoid interference between the sealed door and the robot.
  • the pushback mechanism 503 is a crank linkage that is coupled to the seal door 501, the control of which may also be combined with the relief sensor 401 and/or the mask presence sensor 407.
  • the crank linkage rotates by the driving of the motor, thereby driving the sealing door 501 connected to the crank linkage. If the relief is detected, to avoid sealing The door hits the reticle and requires manual intervention.
  • the present invention introduces two levels of leveling mechanism, one level between the library structure and the frame structure, and the other level is between the frame structure and the axis structure, so that two levels can be achieved, Quickly level and reduce labor intensity during leveling.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)

Abstract

一种可调平的版库设备，包括版库结构（4）、转轴结构（3）和框架结构（2）；版库结构（4）安装于框架结构（2），进而能够通过框架结构（2）被转轴结构（3）调平，版库结构（4）还能够相对于框架结构（2）被调平。

Description

可调平的版库设备 技术领域
本发明涉及掩模传输领域，尤其涉及一种可调平的版库设备。
背景技术
光刻设备是一种将掩模版上的图案曝光成像到硅片或玻璃基板上的设备。为了提高生产效率、管理掩模版、以及完成与交换版手的交接，有些光刻设备除了外部版库外，还会使用专用的内部版库来存储一定数量的掩模版。
掩模传输系统的工作流程:将装有掩模版的版盒放入外部版库中，解锁机构进行解锁和条码扫描然后将其放入内部版库备用，机械手从内部版库中取出掩模版，送至掩模台曝光。曝光后由掩模台交接于机械手，由机械手送回，把曝光好的掩模版放回内部版库。
从以上流程可以看出，一种结构和使用方法合理的掩模版存储设备不仅可以提高掩模传输的工作效率，而且还能提高传输精度，以及掩模版的洁净度，从而为光刻设备提供更可靠的掩模版。
请参考图1，现有掩模版存储设备是可升降的，版库固定在升降轴上，包括传动机构100，支撑架101和版库102。版库内有若干个槽并通过连接件在传动机构100的作用下沿着Z向运动。
但这种设计会产生几个问题：版库较重，导致传动机构的磨损并产生颗粒；开放的版库会造成掩模版表面的污染；掩模版有可能会产生凸版，不利于后续的取放；不能实现安全互锁。而且该结构为悬臂结构，承载较重，变形量会比较大，同时设计也会有一定的误差，为了能与接口顺利安装，因此需要进行Z向调节和第一次调水平。如果没有第一次调水平，整 个版库设备水平度较差时，调水平比较费时。
发明内容
本发明所要解决的技术问题是现有整个版库设备水平度较差时，调水平比较费时。
为了解决以上提到的问题，本发明提供了一种可调平的版库设备，包括版库结构、转轴结构和框架结构；所述版库结构安装于所述框架结构上，进而能够通过所述框架结构被所述转轴结构调平，所述版库结构还能够相对于所述框架结构被调平。
可选的，所述的可调平的版库设备还包括密封结构，所述密封结构设于所述版库结构上，能够使所述版库结构的对外开口处被密封。
可选的，所述密封结构包括结构主体、密封门、版库接口板和回推机构，所述结构主体通过所述版库接口板连接所述版库结构或框架结构，所述回推机构均安装于所述结构主体，所述密封门启闭于所述版库结构的对外开口处；所述回推机构被驱动控制所述密封门的启闭。
可选的，所述密封结构还包括互锁传感器，所述互锁传感器设于所述结构主体，用以检测机械手是否到达取版或放版的预设位置，所述回推结构被驱动参照所述互锁传感器的检测结果控制所述密封门的启闭。
可选的，所述转轴结构包括主转轴、调节机构、框架接口装置和万向轴承，所述主转轴的两端分别连接所述调节机构和万向轴承，所述主转轴还通过框架接口装置与所述框架结构固接，所述调节机构通过调整所述主转轴的姿态位置实现所述框架结构及其上的版库结构的调平。
可选的，所述调节机构包括第一球面轴承、上轴承座、轴承座连接块、楔形块和调节螺钉，所述调节螺钉沿竖直Z向连接所述楔形块，进而 通过竖直Z向的调节驱动所述楔形块沿水平X向调整，所述楔形块通过所述轴承座连接块连接所述上轴承座，所述上轴承座通过所述第一球面轴承连接于所述主转轴的一端，进而随着所述楔形块的水平X向调整相对所述第一球面轴承的内圈做RY方向的摆动，其中，RY方向是指绕垂直于水平X向的水平Y向旋转。
可选的，所述调节机构还包括调整螺钉，所述调整螺钉沿Y向调整轴承座连接块与上轴承座之间的位置，进而使得所述上轴承座相对所述第一球面轴承的内圈做RX方向的摆动，其中，RX方向是指绕水平X向旋转。
可选的，所述万向轴承包括第二球面轴承、下轴承座和Z向调整块，所述下轴承座通过所述第二球面轴承连接所述主转轴的一端，所述Z向调整块通过一顶块调整所述主转轴沿竖直Z向的位置。
可选的，所述框架结构包括版库支撑架和存储设备支撑架，所述版库支撑架设于所述存储设备支撑架上侧，所述版库结构安装于所述版库支撑架上侧；所述存储设备支撑架底部设有用以锁紧被所述转轴结构调平后位置的锁紧装置。
可选的，所述框架结构上设有气浴接口，气浴接口对外连接惰性气体源，对内通过气浴管接入所述版库结构。
可选的，所述框架结构上设有抽颗粒接口，所述抽颗粒接口通过抽颗粒管接入所述版库结构。
可选的，所述版库结构包括版架、设于所述版架上的版库，以及设于所述版库中的版槽，掩膜版取放于所述版槽。
可选的，所述版库结构和框架结构之间通过若干调平螺钉实现调平。
可选的，所述版库结构中设有凸版传感器。
本发明引入了两个层次的调平机制，一层次在于版库结构与框架结构 之间，另一个层次在于框架结构与转轴结构，故而，经过两次调平、快速调平、降低调平时劳动强度。
在进一步可选的方案中，还可进一步实现Z向调节、减少掩模版表面颗粒物、避免凸版发生、实现安全互锁、螺纹杆锁紧、便于维护等效果。
附图说明
图1是现有技术中掩膜版存储设备的示意图；
图2是本发明一可选实施例中版库设备的示意图；
图3是本发明一可选实施例中框架结构的示意图；
图4是本发明一可选实施例中转轴结构的示意图；
图5是本发明一可选实施例中转轴结构的剖面示意图；
图6是本发明一可选实施例中调整机构的局部剖面示意图；
图7是本发明一可选实施例中版库结构的示意图；
图8是本发明一可选实施例中密封结构的示意图；
图中，1-气浴管；2-框架结构；3-转轴结构；4-版库结构；5-密封结构；6-抽颗粒管；
201-存储设备支撑架；202-转轴接口；203-版库支撑架；204-气浴接口；205-螺纹锁紧杆；206-导向管；207-螺纹导向槽；208-抽颗粒接口；
301-调节机构；302-主转轴；303-万向轴承；304-框架接口装置；
3011-接口板；3012-上轴承座；3013-第一球面轴承；3014-调整螺钉；3015-楔形块；3016-调节螺钉；3017-固定螺钉；3018-轴承座连接块；
3031-第二球面轴承；3032-下轴承座；3033-锁紧螺母；3034-Z向调整块；3035-顶块；
401-凸版传感器；402-调平螺钉；403-气浴接口；404-版架；405-版槽；406-罩壳；407-掩模存在传感器；
500-结构主体；501-密封门；502-版库接口板；503-回推结构；504-互锁传感器。
具体实施方式
以下将结合图1至图8对本发明提供的可调平的版库设备进行详细的描述，其为本发明可选的实施例，可以认为，本领域技术人员在不改变本发明精神和内容的范围内，能够对其进行修改和润色。
本发明提供了一种可调平的版库设备，包括版库结构4、转轴结构3和框架结构2；所述版库结构4安装于所述框架结构2上，进而能够通过所述框架结构2被所述转轴结构3调平，所述版库结构4还能够相对于所述框架结构2被调平。
可见，本发明引入了两个层次的调平机制，一层次在于版库结构4与框架结构2之间，另一个层次在于框架结构2与转轴结构3之间，故而可以实现两次调平、快速调平、降低调平时劳动强度。
有关所述转轴结构3，请参考图4和图5，所述转轴结构3包括主转轴302、调节机构301、框架接口装置304和万向轴承303，所述主转轴302的两端分别连接所述调节机构301和万向轴承303，所述主转轴302还通过框架接口装置304与所述框架结构2固接，所述调节机构301通过调整所述转轴的姿态位置实现所述框架结构2及其上的版库结构4的调平。
有关其中的调节机构301：
所述调节机构301包括第一球面轴承3013、上轴承座3012、轴承座连接块3018、楔形块3015和调节螺钉3016，所述调节螺钉3016沿Z向连接所述楔形块3015，进而通过Z向的调节驱动所述楔形块3015沿X向调整，从楔形块3015的名称，应该能得到其是具有楔形面的构件，基于楔形面， 自然可以得到Z向与X向运动的转化，此为本领域技术人员容易理解的，故而不做展开阐述，所述楔形块3015通过所述轴承座连接块3018连接所述上轴承座3012，所述上轴承座3012通过所述第一球面轴承3013连接于所述主转轴302的一端，进而随着所述楔形块3015的X向调整相对所述第一球面轴承3013的内圈做RY方向的摆动。
除此以外，本发明可选方案还引入了固定螺钉3017实现楔形块3015位姿的锁定，进一步的，为了实现直线运动与最终的摆动的转化，在本发明可选的实施例中，所述楔形块3015还具有腰形孔，固定螺钉3017穿过所述腰型孔，进而提供了一定的调整余地。
通过以上设计，可以实现RY方向上的调整，具体来说，其调整过程可以描述为：调节调节螺钉3016，楔形块3015将带动轴承座连接块3018沿X向运动，由于下端固定，与上轴承座3012相连的主转轴302被迫沿RY小幅度摆动，调整好RY之后，锁紧固定螺钉3017；
在本发明进一步可选的实施例中，不仅可以调整RY方向，还可进一步调整RX方向，具体来说，所述调节机构301还包括调整螺钉3014，所述调整螺钉3014沿Y向调整轴承座连接块3018与上轴承座3012之间的位置，进而使得所述上轴承座3012相对所述第一球面轴承3013的内圈做RX方向的摆动。
在具体操作时，能够在完成RY方向调整后再进行，具体来说，调节调整螺钉3014，上轴承座3012沿Y向运动，由于下端固定，主转轴302被迫沿RX作小幅度摆动，实现对RX调节。
有关所述万向轴承303：
所述万向轴承303包括第二球面轴承3031、下轴承座3032和Z向调整块3034，所述下轴承座3032通过所述第二球面轴承3031连接所述主转轴 3032的一端，所述Z向调整块3034通过一顶块3035调整所述主转轴3032沿Z向的位置。
进一步可选的方案中，所述万向轴承303还包括锁紧螺母3033，用以锁紧Z向调整块3034的位置，在实际调整时，转动Z向调整块3034，使得Z向调整块3034沿Z向运动，进而使与之相连的顶块3035实现对版库机构Z向调节，调好之后使用锁紧螺母3033进行锁紧。
有关所述框架结构2：
请参考图3，所述框架结构2包括版库支撑架203和存储设备支撑架201，所述版库支撑架203设于所述存储设备支撑架201上侧，所述版库结构4安装于所述版库支撑架203上侧；所述存储设备支撑架201底部设有用以锁紧被所述转轴结构3调平后位置的锁紧装置。
对于其中的锁紧装置，包括螺纹锁紧杆205、导向管206和螺纹导向槽207，所述螺纹锁紧杆205沿着导向管206在螺纹导向槽207内运动，并与外界设备锁紧。进一步可选方案中，所述导向管206或螺纹导向槽207与所述存储设备支撑架201连接。
通过以上的转轴结构3，实现了Z向、RX以及RY方向的调平后，通过锁紧装置锁紧后，即可完成第一次调平。
在以上第一次调平的基础上，本发明还可实现第二次调平，本发明优选的实施例中，所述版库结构4和框架结构2之间通过若干调平螺钉402实现调平。
在本发明可选的实施例中，所述框架结构2上设有气浴接口204，气浴接口204对外连接惰性气体源，对内通过气浴管1接入所述版库结构4。具体的实施例中，惰性气体氮气经气浴接口204进入版库结构4，对掩模版起到保护和清洁的作用。
在本发明可选的实施例中，所述框架结构上设有抽颗粒接口208，所述抽颗粒接口通过抽颗粒管6接入所述版库结构4。抽颗粒管6与抽颗粒接口208相连，用来抽出版库结构4中可能出现的微小颗粒。
有关所述版库结构4：
请参考图7，所述版库结构4包括版架404、设于所述版架404上的版库，以及设于所述版库中的版槽405，掩膜版取放于所述版槽405。所述版库结构4中设有凸版传感器401。在其他可选的实施例中，所述版库结构4还包括掩模存在传感器407和罩壳406，所述罩壳外罩于所述版库结构4外，所述掩模存在传感器407用以检测掩膜版是否置于版槽405。
进一步具体方案中，版架404下端与版库支撑架2203相连，上端放置有2个版库，客户可根据实际需要放置1或2个版库，每个版库有6个版槽405；且版库能单独使用调平螺钉402进行第二次调平，凸版传感器401可检测掩模版是否凸版；气浴接口204与版库中的气浴管相连，掩模存在传感器407用来检测版槽内掩模版的有无。上述版库的数量及每个版库中版槽的数量仅作为示例，不应以此为限，本领域技术人员可以根据实际需要进行更改。
本发明优选的实施例中，请参考图8，所述的可调平的版库设备还包括密封结构5，所述密封结构5设于所述版库结构4上，进而在关闭状态下，使得所述版库结构4的对外开口处被密封。故而，在不执行取放版操作时，版库结构4由密封结构5封闭，此时，保护气体可以经气浴管充入版库结构4。
进一步可选方案中，所述密封结构5包括结构主体500、密封门501、版库接口板502和回推机构503，所述结构主体500通过所述版库接口板502连接所述版库结构4或框架结构2，所述回推机构503安装于所述结构 主体500，所述密封门501启闭于所述版库结构4的对外开口处；所述回推机构503被驱动控制所述密封门501的启闭。
而密封门501被依据什么对象进行控制，本发明诸多可选方案可以给出不同的设计，而不限于任何一种。举例来说，所述密封结构5还包括互锁传感器504，所述互锁传感器504设于所述结构主体500，用以检测机械手是否到达取版或放版的预设位置，所述回推结构503被驱动参照所述互锁传感器504的检测结果控制所述密封门501的启闭。可以理解为：互锁传感器504检测到机械手到位进行取版或放版时，回推机构503打开密封门501，同时互锁传感器504能确保在机械手进行取版或放版操作时密封门不会关闭，避免密封门与机械手干涉。
本发明可选的实施例中，回推机构503为曲柄连杆机构，它与密封门501连接，其控制还可与凸版传感器401和/或掩模存在传感器407相结合。举例来说，当凸版传感器401没有检测到凸版时，通过电机的驱动，曲柄连杆机构进行转动，进而驱动连接在所述曲柄连杆机构上的密封门501，若检测到凸版，为避免密封门撞到掩模版，需要人工进行干预。
综上所述，本发明引入了两个层次的调平机制，一层次在于版库结构与框架结构之间，另一个层次在于框架结构与转轴结构之间，故而，可以实现两次调平、快速调平、降低调平时劳动强度。
在进一步可选的方案中，还可进一步实现Z向调节、减少掩模版表面颗粒物、避免凸版发生、实现安全互锁、螺纹杆锁紧、便于维护等效果。

Claims (14)

  1. 一种可调平的版库设备，其特征在于：包括版库结构、转轴结构和框架结构；所述版库结构安装于所述框架结构上，进而能够通过所述框架结构被所述转轴结构调平，所述版库结构还能够相对于所述框架结构被调平。
  2. 如权利要求1所述的可调平的版库设备，其特征在于：还包括密封结构，所述密封结构设于所述版库结构上，能够使所述版库结构的对外开口处被密封。
  3. 如权利要求2所述的可调平的版库设备，其特征在于：所述密封结构包括结构主体、密封门、版库接口板和回推机构，所述结构主体通过所述版库接口板连接所述版库结构或框架结构，所述回推机构安装于所述结构主体，所述密封门启闭于所述版库结构的对外开口处；所述回推机构被驱动控制所述密封门的启闭。
  4. 如权利要求3所述的可调平的版库设备，其特征在于：所述密封结构还包括互锁传感器，所述互锁传感器设于所述结构主体，用以检测机械手是否到达取版或放版的预设位置，所述回推结构被驱动参照所述互锁传感器的检测结果控制所述密封门的启闭。
  5. 如权利要求1所述的可调平的版库设备，其特征在于：所述转轴结构包括主转轴、调节机构、框架接口装置和万向轴承，所述主转轴的两端分别连接所述调节机构和万向轴承，所述主转轴还通过框架接口装置与所述框架结构固接，所述调节机构通过调整所述主转轴的姿态位置实现所述框架结构及其上的版库结构的调平。
  6. 如权利要求5所述的可调平的版库设备，其特征在于：所述调节机 构包括第一球面轴承、上轴承座、轴承座连接块、楔形块和调节螺钉，所述调节螺钉沿竖直Z向连接所述楔形块，进而通过竖直Z向的调节驱动所述楔形块沿水平X向调整，所述楔形块通过所述轴承座连接块连接所述上轴承座，所述上轴承座通过所述第一球面轴承连接于所述主转轴的一端，进而随着所述楔形块的水平X向调整相对所述第一球面轴承的内圈做RY方向的摆动，其中，RY方向是指绕垂直于水平X向的水平Y向旋转。
  7. 如权利要求6所述的可调平的版库设备，其特征在于：所述调节机构还包括调整螺钉，所述调整螺钉沿Y向调整轴承座连接块与上轴承座之间的位置，进而使得所述上轴承座相对所述第一球面轴承的内圈做RX方向的摆动，其中，RX方向是指绕水平X向旋转。
  8. 如权利要求5所述的可调平的版库设备，其特征在于：所述万向轴承包括第二球面轴承、下轴承座和Z向调整块，所述下轴承座通过所述第二球面轴承连接所述主转轴的一端，所述Z向调整块通过一顶块调整所述主转轴沿竖直Z向的位置。
  9. 如权利要求1所述的可调平的版库设备，其特征在于：所述框架结构包括版库支撑架和存储设备支撑架，所述版库支撑架设于所述存储设备支撑架上侧，所述版库结构安装于所述版库支撑架上侧；所述存储设备支撑架底部设有用以锁紧被所述转轴结构调平后位置的锁紧装置。
  10. 如权利要求1或9所述的可调平的版库设备，其特征在于：所述框架结构上设有气浴接口，气浴接口对外连接惰性气体源，对内通过气浴管接入所述版库结构。
  11. 如权利要求1或9所述的可调平的版库设备，其特征在于：所述框架结构上设有抽颗粒接口，所述抽颗粒接口通过抽颗粒管接入所述版库结构。
  12. 如权利要求1所述的可调平的版库设备，其特征在于：所述版库结构包括版架、设于所述版架上的版库，以及设于所述版库中的版槽，掩膜版取放于所述版槽。
  13. 如权利要求1或12所述的可调平的版库设备，其特征在于：所述版库结构和框架结构之间通过若干调平螺钉实现调平。
  14. 如权利要求1或12所述的可调平的版库设备，其特征在于：所述版库结构中设有凸版传感器。
PCT/CN2017/094273 2016-07-29 2017-07-25 可调平的版库设备 WO2018019226A1 (zh)

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