WO2018008366A1 - 保持装置、投影光学系、露光装置、および物品製造方法 - Google Patents

保持装置、投影光学系、露光装置、および物品製造方法 Download PDF

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Publication number
WO2018008366A1
WO2018008366A1 PCT/JP2017/022347 JP2017022347W WO2018008366A1 WO 2018008366 A1 WO2018008366 A1 WO 2018008366A1 JP 2017022347 W JP2017022347 W JP 2017022347W WO 2018008366 A1 WO2018008366 A1 WO 2018008366A1
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WIPO (PCT)
Prior art keywords
holding device
optical element
support member
concave mirror
curved surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2017/022347
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English (en)
French (fr)
Japanese (ja)
Inventor
春見　和之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to CN201780041316.7A priority Critical patent/CN109416515B/zh
Priority to KR1020197002334A priority patent/KR102193387B1/ko
Publication of WO2018008366A1 publication Critical patent/WO2018008366A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Definitions

  • the present invention relates to a holding device, a projection optical system, an exposure device, and an article manufacturing method.
  • An optical system that corrects aberration by arranging a deformable mirror in the middle of the optical path is known.
  • a technique for measuring a wavefront at high speed and correcting it with a deformable mirror in order to suppress a reduction in image resolution caused by atmospheric fluctuations In addition, in a projection exposure apparatus used for manufacturing semiconductors, there is a technique for correcting aberrations by using a mirror that is used in an optical system as a variable shape mirror in order to cope with deterioration of aberrations due to temperature changes during exposure. .
  • a thin mirror for example, about 5 mm
  • the optical element is held in substantially the same state as in actual use, the surface shape is measured to determine the processing amount, and the amount of processing is determined based on the determined processing amount.
  • Patent Document 1 There is a method of correcting a processed surface (Patent Document 1).
  • variable shape mirror is usually supported at multiple points by a plurality of support members (actuators and the like).
  • the deformable mirror is removed from the support member during processing, and the deformable mirror is attached to the support member during surface shape measurement.
  • processing and measurement are repeated, it may be disadvantageous in terms of working time and cost.
  • An object of the present invention is to provide a holding device that is advantageous in reducing the influence of, for example, a self-weight deformation of an optical element having a curved surface.
  • the present invention is a holding device that holds an optical element having a curved surface so that the optical axis direction thereof is a horizontal direction, and includes a support member that supports the optical element.
  • the support member In a plane including the direction of the optical axis of the element and the direction of gravity, the support member is characterized in that the support member supports the portion supporting the optical element at an angle with respect to the direction of the optical axis.
  • FIG. 1 is a schematic view showing the arrangement of an exposure apparatus including a holding device according to the first embodiment of the present invention.
  • the exposure apparatus 100 can be used, for example, in a lithography process in a manufacturing process of a flat panel such as a liquid crystal display device or an organic EL device.
  • the exposure apparatus 100 scans projection exposure that transfers (exposes) a pattern image formed on a reticle (mask) (not shown) onto a substrate (not shown) by a step-and-scan method.
  • a device is a schematic view showing the arrangement of an exposure apparatus including a holding device according to the first embodiment of the present invention.
  • the exposure apparatus 100 can be used, for example, in a lithography process in a manufacturing process of a flat panel such as a liquid crystal display device or an organic EL device.
  • the exposure apparatus 100 scans projection exposure that transfers (exposes) a pattern image formed on a reticle (mask) (not shown) onto a substrate (not shown) by a step-and
  • the exposure apparatus 100 includes a holding device 110, an illumination optical system 120, a projection optical system 130, a mask stage 140 that can move while holding a mask, and a substrate stage 150 that can move while holding a substrate. .
  • the substrate exposure process is executed by a control unit (not shown) controlling each unit.
  • the Y axis is taken in the scanning direction of the reticle and the substrate during exposure in a plane perpendicular to the Z axis which is the vertical direction s
  • the X axis is taken in the non-scanning direction perpendicular to the Y axis. taking it.
  • the substrate is a substrate to be processed made of, for example, a glass material and having a surface coated with a photosensitive agent (resist). Further, the reticle is an original plate made of, for example, a glass material and having a pattern (a fine uneven pattern) to be transferred to the substrate.
  • a photosensitive agent resist
  • the reticle is an original plate made of, for example, a glass material and having a pattern (a fine uneven pattern) to be transferred to the substrate.
  • Light emitted from a light source (not shown) included in the illumination optical system 120 forms, for example, an arc-shaped illumination area long in the X direction on the mask by a slit (not shown) included in the illumination optical system 120. be able to.
  • the mask and the substrate are respectively held by the mask stage 140 and the substrate stage 150, and are arranged at optically conjugate positions (object plane and image plane positions of the projection optical system 130) via the projection optical system 130.
  • the projection optical system 130 has a predetermined projection magnification, and projects the pattern formed on the mask onto the substrate.
  • the mask stage 140 and the substrate stage 150 are relatively moved in a direction (for example, the Y direction) parallel to the object plane of the projection optical system 130 at a speed ratio corresponding to the projection magnification of the projection optical system 130.
  • the scanning exposure which scans a slit light on a board
  • the projection optical system 130 includes a lens barrel that holds flat mirrors 131 and 133, a convex mirror 132, and a concave mirror (shape variable mirror) M.
  • the exposure light emitted from the illumination optical system 120 and transmitted through the mask is bent in the optical path by the plane mirror 131 and enters the upper part of the reflection surface of the concave mirror M.
  • the exposure light reflected by the upper part of the concave mirror M is reflected by the convex mirror 132 and enters the lower part of the reflective surface of the concave mirror M.
  • the exposure light reflected from the lower part of the concave mirror M is bent on the optical path by the plane mirror 133 and forms an image on the substrate.
  • the surface of the convex mirror 132 becomes an optical pupil.
  • the exposure apparatus 100 can include an alignment measurement unit 171, a substrate height measurement unit 172, and an image plane measurement unit 161.
  • the alignment measurement unit 171 measures the position (XY direction) of the substrate by imaging a mark (alignment mark) on the substrate mounted on the substrate stage 150 and performing image processing.
  • the substrate height measuring unit 172 measures the position (the height of the surface of the substrate) in the Z direction of the surface of the substrate while the substrate stage 150 is moving.
  • the image plane measuring unit 161 is provided on the substrate stage 150, for example, and by capturing a projected image of the reference mark 162 provided on the mask stage 131, the position and height of the image plane (X, Y in the figure). , Z direction). This is for knowing the position on the apparatus where the mask image is located. By moving the substrate stage 150, it is possible to know exactly where the mask pattern is projected on the apparatus coordinates. .
  • the image plane measuring unit 161 is used to calibrate the relationship between the drive amount of the deformable mirror and the image.
  • the exposure apparatus 100 is required to correct the optical aberration of the projection optical system 130 in order to improve the resolution. Therefore, the exposure apparatus 100 of the present embodiment includes a holding device 110 that holds the concave mirror M that is an optical element included in the projection optical system 130 and deforms the reflecting surface thereof.
  • the holding device 110 deforms the reflecting surface of the concave mirror M from a reference shape to a target shape that corrects the optical aberration, the magnification, distortion, and focus of the projection optical system 130.
  • the reference shape is an arbitrary shape with respect to the reflecting surface of the concave mirror M. For example, the shape or design shape of the reflecting surface of the concave mirror M at a certain time can be used.
  • the holding device 110 deforms the reflecting surface of the concave mirror M
  • the mirror that the holding device 110 deforms the reflecting surface is not limited to the concave mirror.
  • a spherical mirror or an aspherical mirror having a concave or convex curved surface may be used.
  • the holding device 110 is used to deform the reflecting surface of the mirror included in the projection optical system 130 of the exposure apparatus 100, but is not limited thereto, and is included in, for example, a telescope. It may be used to deform the reflecting surface of the mirror.
  • the holding object of the holding device 110 may be a transmissive or refractive optical element as well as a reflective optical element.
  • the holding device 110 of the present embodiment includes a base 111, a support member 112 that supports the concave mirror M, a plurality of actuators 113, and a detection unit 114.
  • the plurality of actuators 113 are controlled by a control unit (not shown).
  • the concave mirror M has a reflective surface that reflects light and a back surface that is a surface opposite to the reflective surface, and a part including the center of the concave mirror M (hereinafter, center portion) is interposed via the support member 112.
  • the base 111 is fixed.
  • the central part of the concave mirror M is fixed to the base 111 because the central part of the concave mirror M used in the projection optical system 130 is often outside the effective area where the amount of incident light is small compared to other areas. This is because the necessity of deforming the central portion is small.
  • the reflecting surface of the concave mirror M is a concave spherical surface having a radius of curvature of about 2000 mm in the initial state, but the holding device 110 of this embodiment can change the shape by a driving amount of about several hundred nm in the normal direction of the reflecting surface. Is possible.
  • the shape of the reflecting surface it is possible to change the focal plane and distortion of the image of the mask pattern projected onto the substrate in accordance with the pattern on the substrate. Even if the focus position fluctuates due to uneven thickness of the substrate or the pattern is distorted through the process, the overlay image and CD (Critical Dimension) accuracy are improved by changing the projected image according to the distorted pattern. Is.
  • the concave mirror M is a thin mirror having a diameter of 1 m and a thickness of about 5 mm, and is made of thin glass in order to change the shape of the reflecting surface (concave surface). By making it thin, it can be deformed with a relatively small force.
  • the base 111 supports the entire holding device 110.
  • the support member 112 is a support column that fixes the concave mirror M, and one end fixes and holds the central portion of the concave mirror M. The other end that is different from the end that supports the concave mirror M is fixed to the base 111.
  • the concave mirror M is processed into an approximately spherical shape by, for example, bending a flat plate having a thickness of 5 mm, and then finished into a precise spherical shape by polishing the reflecting surface. Compared to grinding and polishing from a bulk glass material to finish it into a spherical shape, it is advantageous in terms of glass material cost and processing cost.
  • the plurality of actuators 113 are arranged between the concave mirror M and the base 111, and apply force to a plurality of locations on the back surface of the concave mirror M, respectively.
  • the plurality of actuators 113 includes, for example, a plurality of first actuators 113a that apply a force to the peripheral region of the concave mirror M, and a plurality of second actuators 113b that apply a force to the region of the concave mirror M that is closer to the center than the peripheral region. Including.
  • Each of the plurality of first actuators 113a is deformed so as to change the distance between the first end connected to the back surface of the concave mirror M and the second end connected to the base 111. Thereby, each of the plurality of first actuators 113a can apply a force to each portion of the back surface of the concave mirror M to which the first end is connected.
  • an actuator having relatively high rigidity such as a piezo actuator or a magnetostrictive actuator can be used as a piezo actuator or a magnetostrictive actuator.
  • Each of the plurality of second actuator 113b is, for example, and a movable element 113b 1 and a stator 113b 2 not in contact with each other, it is possible to apply a force to each portion of the back surface of the concave mirror M.
  • a voice coil motor or a linear motor can be used as the second actuator 113b.
  • the coils of the stator 113b 2 is fixed to the base 111, the magnet of the movable element 113b 1 may be fixed to the back surface of the concave mirror M.
  • Each second actuator 114b can generate a Lorentz force between the coil and the magnet by supplying a current to the coil, and can apply a force to each part of the concave mirror M.
  • the detecting unit 114 detects the distance between the concave mirror M and the base 111.
  • the detection unit 114 can include a plurality of sensors (for example, electrostatic capacitance sensors) that respectively detect the distance between the concave mirror M and the base 111.
  • the plurality of actuators 113 can be feedback-controlled based on the detection result by the detection unit 114, and the reflection surface of the concave mirror M can be accurately deformed to the target shape.
  • the plurality of sensors in the detection unit 114 are preferably provided in the vicinity of the first actuator 113a. This is because a piezo actuator used as the first actuator 113a has hysteresis, and a displacement corresponding to the command value (voltage) cannot be obtained. Therefore, feedback control based on the detection result by the detection unit 114 may be performed for each of the plurality of first actuators 113a. On the other hand, in the voice coil motor used as the second actuator 113b, hysteresis hardly occurs and a displacement corresponding to the command value (voltage or current) can be obtained. Therefore, the feedback control based on the detection result by the detection unit 114 may not be performed for the second actuator 113b.
  • FIG. 2 (A) and 2 (B) are views showing a state in which the concave mirror M is held by the support member 112 of the holding device 110.
  • FIG. FIG. 2A shows a case where the support direction of the concave mirror M by the support member 112 is a direction along the horizontal direction (optical axis direction).
  • FIG. 2 (B) shows a case in which a portion supporting the concave mirror M is supported by being inclined upward with respect to the optical axis direction in a plane including the direction of the optical axis of the concave mirror M and the direction of gravity. It is.
  • a hole is provided in the center of the back surface of the concave mirror M (direction passing through the center of curvature of the concave mirror M, center of the outer diameter).
  • the end face of the support member 112 is positioned by fitting into the hole and joined with an adhesive or the like.
  • the optical axis direction of the reflecting surface of the concave mirror M is the horizontal direction (direction along the Y axis), and is indicated by a one-dot chain line in the drawing.
  • the support direction of the concave mirror M is indicated by a solid line. In FIG. 2A, the optical axis direction and the support direction coincide with each other, and only the optical axis direction is shown for convenience.
  • the concave mirror M Since the concave mirror M is as thin as 5 mm, it is deformed (inclined) by its own weight.
  • the shape of the concave mirror M ′ after deformation is indicated by a two-dot chain line in the drawing.
  • the reflecting surface of the concave mirror M rotates around the X axis and becomes downward due to its own weight deformation.
  • the support direction shown in FIG. 2B is determined based on the obtained amount by actually holding the concave mirror in the horizontal direction on the jig and measuring the amount of inclination by its own weight using a position sensor or the like. To do. Or you may obtain
  • the support mirror is inclined and the concave mirror M is held by the fixing portion 112, and the first actuator 113a is attached to the peripheral area.
  • the reflection surface (concave surface) of the concave mirror M has a shape with little distortion.
  • FIG. 3 is a diagram showing the positions of the first actuator 113a and the second actuator 113b and the amount of deviation of the concave mirror M from the desired reflecting surface shape by contour lines.
  • the position of the first actuator 113a is indicated by a circle, and the position of the second actuator 113b is indicated by an x.
  • the amount of deviation of the concave mirror M from the desired reflecting surface shape is indicated by solid and broken contour lines. What is indicated by a broken line of the contour line indicates that it is indented more than the desired reflecting surface shape, and what is indicated by a solid line indicates that it is protruding.
  • the tilt component that is a large component of the self-weight deformation is corrected.
  • a small deformation locally occurs as shown by contour lines. This is because the holding point on the back surface side of the concave mirror M is strictly fixed not by a point but by a surface, so that minute irregularities remain around the holding position.
  • the deviation amount is 1 ⁇ m or less for both the protruding amount and the dent amount and can be corrected by the second actuator 113b.
  • the second actuator 113b it is sufficient that there is a thrust of about 10N, and this amount can be sufficiently handled by the voice coil motor.
  • the deviation amount is 10 ⁇ m or more.
  • the local deformation is corrected, so that the excessive amount of light as described above. May be about 1 ⁇ m. Therefore, the time required for processing can be greatly shortened, and the cost can be suppressed.
  • the corrected reflecting surface shape is set as a reference shape (initial position of the actuator 113).
  • the control unit changes the shape of the reflecting surface of the concave mirror M from the reference shape to each of the actuators 113 based on the amount of deformation of the reflecting surface for correcting the optical aberration, the magnification, distortion, and focus of the projected image. Drive.
  • the correction of the shift amount is a means different from the above, and measures the shape of the concave mirror M so as to measure a local deformation (a deformation component excluding a tilt component having a large influence) in advance and correct it. There is a way to do it.
  • a local deformation a deformation component excluding a tilt component having a large influence
  • the local deformation is corrected by processing, it is not necessary to drive the actuator 113b in the initial state, so that it is not necessary to always drive the actuator 113b, and heat generation can be suppressed. From the viewpoint of thermal distortion, correction by processing that suppresses heat generation can improve the correction accuracy of the reflecting surface shape more than correction by driving the actuator 113b.
  • the holding device 110 does not need to remove the concave mirror M from the support member 112 for correction of its own weight deformation, and does not need to perform shape processing. Become. Further, even when the self-weight deformation is corrected by machining, the machining amount can be reduced as compared with the prior art, which can be advantageous in terms of machining time. According to this embodiment, it is possible to provide a holding device for a deformable mirror that suppresses the influence of its own weight deformation.
  • FIG. 4 is a schematic view showing the arrangement of an exposure apparatus 200 according to the second embodiment of the present invention.
  • Members having the same functions as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.
  • the concave mirror M is held by a fixing member 210 joined to a lens barrel 230 constituting a projection optical system.
  • the concave mirror M is deformed by its own weight, and the supporting direction of the fixing member 210 (shown by a solid line in the figure) is such that the optical axis of the reflecting surface (shown by a one-dot chain line in the figure) is horizontal. Tilt.
  • the shape of the concave mirror M ′ after its own weight deformation is indicated by a two-dot chain line in the drawing.
  • the solid line shows the shape of the concave mirror M before its own weight deformation.
  • local unevenness is generated at the center of the concave mirror M.
  • local deformation may be corrected by processing in advance. According to the configuration of the present embodiment, since an actuator is not required, it is possible to realize a scanning type exposure apparatus with better pattern transfer performance at a lower cost.
  • the optical axis of the concave mirror M after its own weight deformation is supported so as to be horizontal, but the target optical axis direction after its own weight deformation is the arrangement of other mirrors included in the projection optical system, etc. Determined from.
  • the concave mirror M supported in the above embodiment is a convex mirror, for example, a portion supporting the mirror is supported by being inclined downward with respect to the direction of the optical axis.
  • the method for manufacturing an article according to the present embodiment is suitable for manufacturing an article such as a microdevice such as a semiconductor device or an element having a fine structure, for example.
  • a latent image pattern is formed on the photosensitive agent applied to the substrate using the above-described exposure apparatus (a step of exposing the substrate), and the latent image pattern is formed in this step.
  • Developing (processing) the substrate includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like).
  • the method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
PCT/JP2017/022347 2016-07-07 2017-06-16 保持装置、投影光学系、露光装置、および物品製造方法 Ceased WO2018008366A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201780041316.7A CN109416515B (zh) 2016-07-07 2017-06-16 保持装置、投影光学系统、曝光装置及物品制造方法
KR1020197002334A KR102193387B1 (ko) 2016-07-07 2017-06-16 보유 지지 장치, 투영 광학계, 노광 장치 및 물품 제조 방법

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JP2016-135253 2016-07-07
JP2016135253A JP6808381B2 (ja) 2016-07-07 2016-07-07 保持装置、投影光学系、露光装置、および物品製造方法

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