JP6808381B2 - 保持装置、投影光学系、露光装置、および物品製造方法 - Google Patents

保持装置、投影光学系、露光装置、および物品製造方法 Download PDF

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Publication number
JP6808381B2
JP6808381B2 JP2016135253A JP2016135253A JP6808381B2 JP 6808381 B2 JP6808381 B2 JP 6808381B2 JP 2016135253 A JP2016135253 A JP 2016135253A JP 2016135253 A JP2016135253 A JP 2016135253A JP 6808381 B2 JP6808381 B2 JP 6808381B2
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JP
Japan
Prior art keywords
optical element
support member
holding device
optical
curved surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2016135253A
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English (en)
Japanese (ja)
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JP2018005117A (ja
JP2018005117A5 (enExample
Inventor
春見　和之
和之 春見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2016135253A priority Critical patent/JP6808381B2/ja
Priority to CN201780041316.7A priority patent/CN109416515B/zh
Priority to KR1020197002334A priority patent/KR102193387B1/ko
Priority to PCT/JP2017/022347 priority patent/WO2018008366A1/ja
Publication of JP2018005117A publication Critical patent/JP2018005117A/ja
Publication of JP2018005117A5 publication Critical patent/JP2018005117A5/ja
Application granted granted Critical
Publication of JP6808381B2 publication Critical patent/JP6808381B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2016135253A 2016-07-07 2016-07-07 保持装置、投影光学系、露光装置、および物品製造方法 Expired - Fee Related JP6808381B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2016135253A JP6808381B2 (ja) 2016-07-07 2016-07-07 保持装置、投影光学系、露光装置、および物品製造方法
CN201780041316.7A CN109416515B (zh) 2016-07-07 2017-06-16 保持装置、投影光学系统、曝光装置及物品制造方法
KR1020197002334A KR102193387B1 (ko) 2016-07-07 2017-06-16 보유 지지 장치, 투영 광학계, 노광 장치 및 물품 제조 방법
PCT/JP2017/022347 WO2018008366A1 (ja) 2016-07-07 2017-06-16 保持装置、投影光学系、露光装置、および物品製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016135253A JP6808381B2 (ja) 2016-07-07 2016-07-07 保持装置、投影光学系、露光装置、および物品製造方法

Publications (3)

Publication Number Publication Date
JP2018005117A JP2018005117A (ja) 2018-01-11
JP2018005117A5 JP2018005117A5 (enExample) 2019-08-08
JP6808381B2 true JP6808381B2 (ja) 2021-01-06

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016135253A Expired - Fee Related JP6808381B2 (ja) 2016-07-07 2016-07-07 保持装置、投影光学系、露光装置、および物品製造方法

Country Status (4)

Country Link
JP (1) JP6808381B2 (enExample)
KR (1) KR102193387B1 (enExample)
CN (1) CN109416515B (enExample)
WO (1) WO2018008366A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK3566637T3 (da) 2018-05-11 2024-12-16 Optos Plc Oct-billedbehandling
JP7227810B2 (ja) * 2019-03-25 2023-02-22 キヤノン株式会社 光学装置、露光装置および物品製造方法
TWI730666B (zh) * 2020-03-12 2021-06-11 財團法人國家實驗研究院 具有次鏡調焦機構之光學系統

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0626571Y2 (ja) * 1986-12-12 1994-07-20 三菱重工業株式会社 砂杭施工機用液圧式押し込み装置
JP2000084795A (ja) 1998-09-17 2000-03-28 Nikon Corp 光学部品の加工システム及び加工方法
US6618209B2 (en) 2000-08-08 2003-09-09 Olympus Optical Co., Ltd. Optical apparatus
DE10045265A1 (de) * 2000-09-13 2002-03-21 Zeiss Carl Vorrichtung zum Bündeln der Strahlung einer Lichtquelle
CN101546575B (zh) * 2001-01-30 2012-11-07 松下电器产业株式会社 备有可形变镜子的信息装置
WO2005045814A1 (ja) * 2003-11-06 2005-05-19 Matsushita Electric Industrial Co., Ltd. 可変形ミラー、光学ヘッド及び光記録再生装置
KR100596498B1 (ko) 2004-06-30 2006-07-03 전자부품연구원 다중 프레임 기반 온라인 얼굴 인식 시스템
JP2006196559A (ja) * 2005-01-12 2006-07-27 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP4633484B2 (ja) * 2005-01-19 2011-02-16 オリンパス株式会社 光学素子の支持機構
JP5414204B2 (ja) * 2008-05-29 2014-02-12 キヤノン株式会社 光学素子保持装置、露光装置およびデバイス製造方法
CN102162900B (zh) * 2011-05-18 2012-06-13 中国科学院长春光学精密机械与物理研究所 反射镜高精度装夹装置
KR101254177B1 (ko) 2011-10-07 2013-04-19 위아코퍼레이션 주식회사 방사형 기저 함수 신경회로망 알고리즘을 이용한 실시간 얼굴 인식 시스템
CN102436052B (zh) * 2011-12-13 2013-07-24 北京空间机电研究所 一种大口径轻质反射镜光轴水平重力卸载支撑方法
CN102997880A (zh) * 2012-11-26 2013-03-27 西安力德测量设备有限公司 三坐标机防振动气动控制微调系统
EP2789973B1 (de) * 2013-04-12 2017-11-22 Hexagon Technology Center GmbH Rotationslaser mit durch Aktuatoren gezielt verformbarer Linse
JP2015065246A (ja) * 2013-09-24 2015-04-09 キヤノン株式会社 光学装置、光学系、露光装置及び物品の製造方法

Also Published As

Publication number Publication date
KR102193387B1 (ko) 2020-12-22
JP2018005117A (ja) 2018-01-11
CN109416515A (zh) 2019-03-01
CN109416515B (zh) 2021-03-30
WO2018008366A1 (ja) 2018-01-11
KR20190022731A (ko) 2019-03-06

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