KR102193387B1 - 보유 지지 장치, 투영 광학계, 노광 장치 및 물품 제조 방법 - Google Patents

보유 지지 장치, 투영 광학계, 노광 장치 및 물품 제조 방법 Download PDF

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Publication number
KR102193387B1
KR102193387B1 KR1020197002334A KR20197002334A KR102193387B1 KR 102193387 B1 KR102193387 B1 KR 102193387B1 KR 1020197002334 A KR1020197002334 A KR 1020197002334A KR 20197002334 A KR20197002334 A KR 20197002334A KR 102193387 B1 KR102193387 B1 KR 102193387B1
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KR
South Korea
Prior art keywords
optical element
support member
holding device
fixedly supported
curved surface
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020197002334A
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English (en)
Korean (ko)
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KR20190022731A (ko
Inventor
가즈유키 가스미
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20190022731A publication Critical patent/KR20190022731A/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
KR1020197002334A 2016-07-07 2017-06-16 보유 지지 장치, 투영 광학계, 노광 장치 및 물품 제조 방법 Expired - Fee Related KR102193387B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016135253A JP6808381B2 (ja) 2016-07-07 2016-07-07 保持装置、投影光学系、露光装置、および物品製造方法
JPJP-P-2016-135253 2016-07-07
PCT/JP2017/022347 WO2018008366A1 (ja) 2016-07-07 2017-06-16 保持装置、投影光学系、露光装置、および物品製造方法

Publications (2)

Publication Number Publication Date
KR20190022731A KR20190022731A (ko) 2019-03-06
KR102193387B1 true KR102193387B1 (ko) 2020-12-22

Family

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Family Applications (1)

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KR1020197002334A Expired - Fee Related KR102193387B1 (ko) 2016-07-07 2017-06-16 보유 지지 장치, 투영 광학계, 노광 장치 및 물품 제조 방법

Country Status (4)

Country Link
JP (1) JP6808381B2 (enExample)
KR (1) KR102193387B1 (enExample)
CN (1) CN109416515B (enExample)
WO (1) WO2018008366A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK3566637T3 (da) 2018-05-11 2024-12-16 Optos Plc Oct-billedbehandling
JP7227810B2 (ja) * 2019-03-25 2023-02-22 キヤノン株式会社 光学装置、露光装置および物品製造方法
TWI730666B (zh) * 2020-03-12 2021-06-11 財團法人國家實驗研究院 具有次鏡調焦機構之光學系統

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000084795A (ja) 1998-09-17 2000-03-28 Nikon Corp 光学部品の加工システム及び加工方法
US20040070843A1 (en) 2000-08-08 2004-04-15 Olympus Optical Co., Ltd. Optical apparatus
KR100596498B1 (ko) 2004-06-30 2006-07-03 전자부품연구원 다중 프레임 기반 온라인 얼굴 인식 시스템
KR101254177B1 (ko) 2011-10-07 2013-04-19 위아코퍼레이션 주식회사 방사형 기저 함수 신경회로망 알고리즘을 이용한 실시간 얼굴 인식 시스템
JP2015065246A (ja) * 2013-09-24 2015-04-09 キヤノン株式会社 光学装置、光学系、露光装置及び物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0626571Y2 (ja) * 1986-12-12 1994-07-20 三菱重工業株式会社 砂杭施工機用液圧式押し込み装置
DE10045265A1 (de) * 2000-09-13 2002-03-21 Zeiss Carl Vorrichtung zum Bündeln der Strahlung einer Lichtquelle
CN101546575B (zh) * 2001-01-30 2012-11-07 松下电器产业株式会社 备有可形变镜子的信息装置
WO2005045814A1 (ja) * 2003-11-06 2005-05-19 Matsushita Electric Industrial Co., Ltd. 可変形ミラー、光学ヘッド及び光記録再生装置
JP2006196559A (ja) * 2005-01-12 2006-07-27 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP4633484B2 (ja) * 2005-01-19 2011-02-16 オリンパス株式会社 光学素子の支持機構
JP5414204B2 (ja) * 2008-05-29 2014-02-12 キヤノン株式会社 光学素子保持装置、露光装置およびデバイス製造方法
CN102162900B (zh) * 2011-05-18 2012-06-13 中国科学院长春光学精密机械与物理研究所 反射镜高精度装夹装置
CN102436052B (zh) * 2011-12-13 2013-07-24 北京空间机电研究所 一种大口径轻质反射镜光轴水平重力卸载支撑方法
CN102997880A (zh) * 2012-11-26 2013-03-27 西安力德测量设备有限公司 三坐标机防振动气动控制微调系统
EP2789973B1 (de) * 2013-04-12 2017-11-22 Hexagon Technology Center GmbH Rotationslaser mit durch Aktuatoren gezielt verformbarer Linse

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000084795A (ja) 1998-09-17 2000-03-28 Nikon Corp 光学部品の加工システム及び加工方法
US20040070843A1 (en) 2000-08-08 2004-04-15 Olympus Optical Co., Ltd. Optical apparatus
KR100596498B1 (ko) 2004-06-30 2006-07-03 전자부품연구원 다중 프레임 기반 온라인 얼굴 인식 시스템
KR101254177B1 (ko) 2011-10-07 2013-04-19 위아코퍼레이션 주식회사 방사형 기저 함수 신경회로망 알고리즘을 이용한 실시간 얼굴 인식 시스템
JP2015065246A (ja) * 2013-09-24 2015-04-09 キヤノン株式会社 光学装置、光学系、露光装置及び物品の製造方法

Also Published As

Publication number Publication date
JP2018005117A (ja) 2018-01-11
JP6808381B2 (ja) 2021-01-06
CN109416515A (zh) 2019-03-01
CN109416515B (zh) 2021-03-30
WO2018008366A1 (ja) 2018-01-11
KR20190022731A (ko) 2019-03-06

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