WO2018003418A1 - Procédé de fabrication d'un filtre de réglage d'éclairement, filtre de réglage d'éclairement, système optique d'éclairage et dispositif d'exposition - Google Patents

Procédé de fabrication d'un filtre de réglage d'éclairement, filtre de réglage d'éclairement, système optique d'éclairage et dispositif d'exposition Download PDF

Info

Publication number
WO2018003418A1
WO2018003418A1 PCT/JP2017/020885 JP2017020885W WO2018003418A1 WO 2018003418 A1 WO2018003418 A1 WO 2018003418A1 JP 2017020885 W JP2017020885 W JP 2017020885W WO 2018003418 A1 WO2018003418 A1 WO 2018003418A1
Authority
WO
WIPO (PCT)
Prior art keywords
illuminance
filter
illuminance adjustment
exposure surface
exposure
Prior art date
Application number
PCT/JP2017/020885
Other languages
English (en)
Japanese (ja)
Inventor
洋徳 川島
Original Assignee
株式会社ブイ・テクノロジー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ブイ・テクノロジー filed Critical 株式会社ブイ・テクノロジー
Publication of WO2018003418A1 publication Critical patent/WO2018003418A1/fr

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Definitions

  • the present invention relates to a method of manufacturing an illuminance adjustment filter, an illuminance adjustment filter, an illumination optical system, and an exposure apparatus, and more specifically, an illuminance adjustment that can suppress variation in illuminance distribution on an exposure surface by the illuminance adjustment filter.
  • the present invention relates to a filter manufacturing method, an illuminance adjustment filter, an illumination optical system, and an exposure apparatus.
  • the illumination optical system of the exposure apparatus includes a light source, a fly-eye lens in which a plurality of lens elements are arranged in a matrix, a plurality of reflecting mirrors that change the direction of the optical path, and the like.
  • the pattern-formed mask is irradiated through a plurality of reflecting mirrors, and the pattern is exposed and transferred onto the workpiece.
  • the exposure apparatus described in Patent Document 1 includes an illuminance distribution correction filter having a plurality of liquid crystal cells in order to cope with deterioration over time of the optical system, and controls each liquid crystal cell to control the illuminance distribution correction filter. It is disclosed that the light transmittance distribution is corrected, the illuminance distribution of light irradiated to the plurality of lens elements of the fly-eye lens is updated quickly, and the illuminance distribution of light irradiated to the reticle is made uniform.
  • Patent Document 1 the light transmittance distribution of the illuminance distribution correction filter is corrected by controlling a plurality of liquid crystal cells.
  • a complicated control device is required to control the liquid crystal cell, and the illuminance distribution correction filter is manufactured. There was a problem that cost increased.
  • the present invention has been made in view of the above-described problems, and an object thereof is to suppress variation in illuminance distribution on the exposure surface caused by components of the illumination optical system and to make the illuminance distribution uniform.
  • An object of the present invention is to provide an illumination adjustment filter manufacturing method, illumination adjustment filter, illumination optical system, and exposure apparatus.
  • a fly-eye lens having a plurality of lens elements in which light from a light source is arranged in a matrix of p rows and q columns (p and q are integers), and the light emitted from the fly eye lens
  • the illuminance of p rows and q columns arranged in the optical path and corresponding to each of the plurality of lens elements
  • a method of manufacturing an illuminance adjustment filter including an adjustment unit, Measuring the illuminance I (i) at an arbitrary point i (i is an integer) on the exposure surface without arranging the illuminance adjustment filter in the optical path; Calculating the light transmittance distribution of each of the illuminance adjustment units based on the illuminance I (i) of each of the points measured on the exposure surface; Forming the illuminance adjustment filter including the illuminance adjustment section each having
  • the calculation step includes: Calculating an average value Iave of illuminance I (i) at each point measured on the exposure surface; A step of setting the light transmittance of each point on the illuminance adjustment unit corresponding to each measurement point on the exposure surface to 1- (I (i) ⁇ Iave) / I (i);
  • the manufacturing method of the illumination intensity adjustment filter as described in (1) characterized by comprising.
  • the illuminance adjustment filter is An optical filter comprising a plurality of cells that are the illuminance adjusting units arranged in a matrix of p rows and q columns, and being arranged between a light source and the fly eye lens (1) to (3)
  • the manufacturing method of the illumination intensity adjustment filter in any one of.
  • the illuminance adjustment filter includes: Two sets of wires each composed of a plurality of wires arranged in parallel with each other, The wires of the two sets of wire groups are arranged orthogonally to each other along a matrix of the fly-eye lens, Any of (1) to (3), wherein the wire of each wire group is a wire filter that is movable in a direction orthogonal to the optical axis of the light and the longitudinal direction of the wire.
  • each illuminance adjustment unit of the illuminance adjustment filter is centered according to the amount of deviation between the center of the exposure area of the exposure surface and the center of each irradiation area irradiated from each lens element.
  • the p and q are odd numbers,
  • the length of each side of the illuminance adjustment unit is Lx, Ly, the length of each side of the irradiation area on the exposure surface by the illuminance adjustment unit is Dx, Dy, and
  • a fly-eye lens having a plurality of lens elements in which light from a light source is arranged in a matrix of p rows and q columns (p and q are integers), and the light emitted from the fly eye lens
  • the illuminance of p rows and q columns arranged in the optical path and corresponding to each of the plurality of lens elements
  • An illuminance adjustment filter including an adjustment unit, The illuminance adjustment unit has a light transmittance distribution based on illuminance I (i) at an arbitrary point i (i is an integer) on the exposure surface in a state where the illuminance adjustment filter is not disposed in the optical path.
  • An illuminance adjustment filter comprising a corresponding pattern.
  • a light source a fly-eye lens having a plurality of lens elements arranged in a matrix of p rows and q columns (p and q are integers), and a reflection that reflects the light emitted from the fly-eye lens
  • An illumination optical system comprising: a mirror; and the illuminance adjustment filter according to (9).
  • a mask support part that supports the mask, a work support part that supports the work, and the illumination optical system according to (10)
  • An exposure apparatus that irradiates the work with light from the illumination optical system through the mask on which an exposure pattern is formed, and exposes and transfers the exposure pattern of the mask onto the work.
  • the illuminance I (i) at an arbitrary point i (i is an integer) on the exposure surface is measured and measured without the illuminance adjustment filter being disposed in the optical path.
  • an illuminance adjustment filter including an illuminance adjustment unit each having a pattern corresponding to the calculated light transmittance distribution Therefore, variation in the illuminance distribution on the exposure surface due to the components of the illumination optical system can be suppressed, and the illuminance distribution on the exposure surface can be made uniform.
  • the illuminance adjustment unit has an illuminance at an arbitrary point i (i is an integer) on the exposure surface in a state where the illuminance adjustment filter is not disposed in the optical path. Since each pattern corresponding to the light transmittance distribution based on I (i) is provided, variation in the illuminance distribution on the exposure surface due to the components of the illumination optical system is suppressed, and the illuminance distribution on the exposure surface is reduced. It can be made uniform.
  • the illumination optical system of the present invention it is possible to provide a unit in which the illuminance distribution on the exposure surface is made more uniform by providing the illuminance adjustment filter described above. Further, according to the exposure apparatus of the present invention, a more accurate exposure result can be obtained by using the illumination optical system including the illuminance adjustment filter described above.
  • FIG. 1 is a front view of an exposure apparatus according to a first embodiment of the present invention. It is a figure which shows the structure of the illuminating device shown in FIG. (A) shows the illuminance on the exposure surface of the light emitted from each lens element when light having a substantially uniform illuminance emitted from the light source unit is corrected by an optical filter and incident on each lens element of the fly-eye lens. It is a figure and (b) is a figure which shows the image of the whole illumination intensity in an exposure surface. (A) is a top view which shows the illumination distribution of the exposure surface before illumination correction, (b) is a table
  • FIG. 5 is a plan view of an optical filter for correcting the illuminance distribution shown in FIG. 4.
  • A) is a top view which shows the pattern of the light transmittance of the cell of the optical filter shown in FIG. 5, (b) is a table
  • A) is a top view which shows the illumination distribution of the exposure surface after illumination correction, (b) is a table
  • the proximity exposure apparatus PE uses a mask M smaller than the workpiece W as a material to be exposed, holds the mask M on a mask stage (mask support portion) 1, and holds the workpiece W on the workpiece stage (workpiece (workpiece)).
  • the mask M is irradiated with light for pattern exposure from the illumination device 3 toward the mask M in a state where the mask M and the workpiece W are placed close to each other with a predetermined exposure gap.
  • the pattern M is exposed and transferred onto the workpiece W.
  • the work stage 2 is moved stepwise with respect to the mask M in the two axial directions of the X axis direction and the Y axis direction, and exposure transfer is performed for each step.
  • an X-axis stage feed mechanism 5 for moving the X-axis feed base 5a stepwise in the X-axis direction is installed on the apparatus base 4.
  • a Y-axis stage feed mechanism 6 for step-moving the Y-axis feed base 6a in the Y-axis direction is installed in order to move the work stage 2 stepwise in the Y-axis direction.
  • the work stage 2 is installed on the Y-axis feed base 6 a of the Y-axis stage feed mechanism 6.
  • the work W On the upper surface of the work stage 2, the work W is held in a state of being sucked by a work chuck or the like. Further, a substrate side displacement sensor 15 for measuring the lower surface height of the mask M is disposed on the side portion of the work stage 2. Therefore, the substrate side displacement sensor 15 can move in the X and Y axis directions together with the work stage 2.
  • a plurality of (four in the embodiment shown in the figure) X-axis linear guide rails 51 are arranged in the X-axis direction, and each guide rail 51 has a lower surface of the X-axis feed base 5 a.
  • a slider 52 fixed to the bridge is straddled.
  • the X-axis feed base 5 a is driven by the first linear motor 20 of the X-axis stage feed mechanism 5 and can reciprocate along the guide rail 51 in the X-axis direction.
  • a plurality of guide rails 53 for Y-axis linear guides are arranged on the X-axis feed base 5a in the Y-axis direction.
  • Each guide rail 53 has a slider 54 fixed to the lower surface of the Y-axis feed base 6a. Is straddled. Accordingly, the Y-axis feed base 6 a is driven by the second linear motor 21 of the Y-axis stage feed mechanism 6 and can reciprocate in the Y-axis direction along the guide rail 53.
  • the vertical coarse motion device 7 having a relatively coarse positioning resolution but a large moving stroke and moving speed, and the vertical coarse motion Positioning with high resolution is possible compared with the apparatus 7, and a vertical fine movement apparatus 8 is provided for finely adjusting the gap between the opposing surfaces of the mask M and the work W to a predetermined amount by finely moving the work stage 2 up and down. .
  • the vertical coarse movement device 7 moves the work stage 2 up and down with respect to the fine movement stage 6b by an appropriate drive mechanism provided on the fine movement stage 6b described later.
  • the stage coarse movement shafts 14 fixed at four positions on the bottom surface of the work stage 2 are engaged with linear motion bearings 14a fixed to the fine movement stage 6b, and are guided in the vertical direction with respect to the fine movement stage 6b.
  • it is desirable that the vertical coarse motion device 7 has high repeated positioning accuracy even if the resolution is low.
  • the vertical fine movement device 8 includes a fixed base 9 fixed to the Y-axis feed base 6a, and a linear guide guide rail 10 attached to the fixed base 9 with its inner end inclined obliquely downward.
  • a ball screw nut (not shown) is coupled to a slide body 12 that reciprocates along the guide rail 10 via a slider 11 straddling the guide rail 10, and an upper end surface of the slide body 12. Is in contact with the flange 12a fixed to the fine movement stage 6b so as to be slidable in the horizontal direction.
  • the vertical fine movement device 8 may drive the slide body 12 by a linear motor instead of driving the slide body 12 by the motor 17 and the ball screw.
  • the vertical fine movement device 8 is installed on one end side (left end side in FIG. 1) in the Y-axis direction of the Z-axis feed base 6a and two on the other end side, for a total of three units, and each is independently driven and controlled. It has become so. Accordingly, the vertical fine movement device 8 independently finely adjusts the heights of the three flanges 12 a based on the measurement results of the gap amounts between the mask M and the workpiece W at a plurality of locations by the gap sensor 27, and the workpiece stage 2. Fine-tune the height and inclination of In addition, when the height of the work stage 2 can be sufficiently adjusted by the vertical fine movement device 8, the vertical coarse movement device 7 may be omitted.
  • a bar mirror (both not shown) facing the interferometer is installed.
  • the bar mirror 19 facing the Y-axis laser interferometer 18 is arranged along the X-axis direction on one side of the Y-axis feed base 6a, and the bar mirror facing the X-axis laser interferometer is located on the Y-axis feed base 6a. It is arranged along the Y-axis direction on one end side.
  • the Y-axis laser interferometer 18 and the X-axis laser interferometer are each arranged so as to always face the corresponding bar mirror and supported by the apparatus base 4.
  • Two Y-axis laser interferometers 18 are installed apart from each other in the X-axis direction.
  • the two Y-axis laser interferometers 18 detect the position of the Y-axis feed base 6a and consequently the work stage 2 in the Y-axis direction and the yawing error via the bar mirror 19.
  • the X-axis laser interferometer detects the position of the X-axis feed base 5a and eventually the work stage 2 in the X-axis direction via the opposing bar mirror.
  • the mask stage 1 is inserted in a X, Y, ⁇ direction (in the X, Y plane) by inserting a mask base frame 24 composed of a substantially rectangular frame body and a gap into a central opening of the mask base frame 24.
  • the mask base frame 24 is held at a fixed position above the work stage 2 by a support column 4a protruding from the apparatus base 4.
  • a frame-shaped mask holder 26 is provided on the lower surface of the central opening of the mask frame 25. That is, a plurality of mask holder suction grooves connected to a vacuum suction device (not shown) are provided on the lower surface of the mask frame 25, and the mask holder 26 is sucked to the mask frame 25 through the plurality of mask holder suction grooves. Retained.
  • a plurality of mask suction grooves are provided on the lower surface of the mask holder 26 for sucking the peripheral portion of the mask M on which the mask pattern is not drawn.
  • the mask M passes through the mask suction grooves. Then, it is detachably held on the lower surface of the mask holder 26 by a vacuum suction device (not shown).
  • the illumination device 3 of the exposure apparatus PE of the present embodiment includes, for example, a high-pressure mercury lamp 61 that is a light source for ultraviolet irradiation, and a reflector 62 that collects light emitted from the high-pressure mercury lamp 61.
  • a plane mirror 66 for changing the direction of the optical path EL emitted from the fly-eye lens 65, and a high-pressure mercury lamp 61 It comprises a collimation mirror 67 to irradiate et light as parallel light, the plane mirror 68 to irradiate toward a the parallel light to the mask M, the.
  • the exposure control shutter unit 64 when the exposure control shutter unit 64 is controlled to be opened at the time of exposure, the light emitted from the high-pressure mercury lamp 61 is reflected by the flat mirror 63 and passes through the optical filter 90 to the fly-eye lens 65. Incident on the incident surface.
  • the fly-eye lens 65 is used to make incident light have as uniform an illuminance distribution as possible on the irradiation surface. Then, the light emitted from the exit surface of the fly-eye lens 65 is converted into parallel light while its traveling direction is changed by the plane mirror 66, the collimation mirror 67, and the plane mirror 68.
  • this parallel light is irradiated as light for pattern exposure substantially perpendicularly to the surface of the mask W held on the mask stage 1 and further the work W held on the work stage 2, and the pattern of the mask M is irradiated. It is exposed and transferred onto the workpiece W.
  • the optical filter 90 of this embodiment is used to correct this variation in illuminance (illuminance distribution).
  • each cell (illuminance adjustment unit) 91 of the optical filter 90 is a matrix of p rows and q columns (for example, 3 rows and 3 columns in FIG. 3), similarly to the lens element 65 a of the fly-eye lens 65. Are arranged in a shape.
  • the size of each cell 91 is substantially the same size as each lens element 65a.
  • the lens element 65a of the fly-eye lens 65 and the cell 91 of the optical filter 90 are disposed so as to face each other so that their row and column directions coincide with each other.
  • a pattern 93 having the same light transmittance distribution is formed in each cell 91 of the optical filter 90 (see FIG. 5).
  • the light passing through the pattern 93 of each cell 91 overlaps through each lens element 65a of the fly-eye lens 65, so that a part of the illuminance distribution on the exposure surface changes and exposure is performed.
  • the illuminance distribution can be improved by reducing the illuminance of the portion with high illuminance on the surface.
  • the pitch of the cells 91 of the optical filter 90 is constant, the light from the lamp unit 60 is not parallel light, and is slightly condensed or diffused through the optical filter 90 while being diffused. In such a case, the pitch of each cell 91 of the optical filter 90 may be shifted in accordance with the angle between the parallel light and the optical path. Therefore, the cell size of the optical filter 90 is not limited to the same size as each lens element 65a, but can be changed according to the pitch.
  • the illuminance I (i) at an arbitrary point i (i is an integer) on the exposure surface is measured in a state where the optical filter 90 is not disposed in the optical path EL. Then, the light transmittance distribution of the cell 91 is calculated based on the measured illuminance I (i) at each point. Further, an optical filter 90 including cells 91 each having a pattern 93 corresponding to the calculated light transmittance distribution is formed.
  • the illuminance I (i) at an arbitrary point i on the exposure surface is measured to obtain the minimum illuminance Imin of the illuminance I (i).
  • the light transmittance distribution is obtained by setting the light transmittance of each point on the cell 91 corresponding to each measurement point i on the exposure surface as 1- (I (i) -Imin) / I (i).
  • the light transmittance of each point on the cell 91 corresponding to a brighter portion than the minimum illuminance Imin is reduced, and the illuminance at each point on the exposure surface is adjusted to the minimum illuminance Imin, so that the illuminance is uniform as a whole.
  • the light transmittance distribution can be provided by depositing a chromium dot pattern on the quartz substrate of the optical filter 90 or a density filter whose transmittance varies depending on the deposited multilayer film.
  • the light transmittance can be arbitrarily set by changing the size and density of the dot pattern.
  • the material of the optical filter 90 is preferably a quartz substrate, but may be soda glass.
  • the lens elements 65a may be appropriately set from three or more arranged in the vertical direction and three or more in the horizontal direction, and the number of cells 91 of the optical filter 90 is also the number of lenses of the fly-eye lens 65. It is designed appropriately according to the number of elements 65a.
  • the optical filter 90 can also cool the optical filter 90 by blowing cooling air from a nozzle (not shown) as necessary.
  • the high-pressure mercury lamp 61 may be a single lamp or may be configured by an LED. Further, the installation order of the optical filter 90 and the exposure control shutter unit 64 may be reversed. Further, a DUV cut filter, a polarization filter, and a band pass filter may be disposed between the fly-eye lens 65 and the exposure surface.
  • FIG. 4A shows that the maximum illuminance of the exposure light on the exposure surface (on the workpiece W) is 44.0 mW / cm 2 and the minimum due to the components of the illumination optical system such as the manufacturing error of the plane mirror 68.
  • the illuminance is 39.4 mW / cm 2
  • the average illuminance is 42.1 mW / cm 2
  • the uniformity is 5.52%.
  • the correction of the illuminance distribution is performed by setting the light transmittance of a point on the cell 91 corresponding to the portion where the illuminance on the exposure surface is the minimum illuminance Imin to 100% and the minimum illuminance Imin.
  • the light transmittance of the other part with higher illuminance is adjusted by the optical filter 90 having the cell 91 of the pattern 93 in which the light transmittance is lowered in proportion to the illuminance difference from the minimum illuminance Imin.
  • the illuminance distribution on the exposure surface after adjustment is such that the illuminance of the portion with high illuminance decreases, the maximum illuminance is 39.6 mW / cm 2 , and the minimum illuminance is 39.2 mW / cm 2 , the average illuminance is 39.4 mW / cm 2 , the uniformity is improved to 0.52%, and the illuminance is substantially uniform as a whole. This improves the exposure accuracy.
  • the intensity of the exposure light can be adjusted by moving the optical filter 90 along the optical path EL as necessary. Specifically, the illuminance on the exposure surface decreases as the optical filter 90 is brought closer to the fly-eye lens 65.
  • the pattern 93 corresponding to the calculated light transmittance distribution is calculated after measuring the light transmittance distribution of each cell 91 based on the measured illuminance I (i) of each point.
  • the optical filter 90 including the cell 91 provided with each is formed.
  • the light transmittance distribution is calculated by obtaining the minimum illuminance Imin of the measured illuminance I (i) at each point, and calculating the light transmittance at each point on the cell 91 corresponding to each measured point on the exposure surface. Since 1 ⁇ (I (i) ⁇ Imin) / I (i), the illuminance at a portion brighter than the minimum illuminance Imin is suppressed according to the minimum illuminance Imin, and the illuminance distribution on the exposure surface is made uniform. Can do.
  • An optical filter 90 including a plurality of cells 91 arranged in a matrix of p rows and q columns and disposed between the lamp unit 60 and the fly-eye lens 65 is relatively inexpensive as an illuminance adjustment filter. Can be produced.
  • the pattern 93 is given by vapor-depositing chromium on the substrate of the optical filter 90, the light transmittance at an arbitrary point of the cell 91 can be set to an arbitrary size.
  • the fly-eye lens 65 which has the lamp unit 60 and the some lens element 65a arranged in the matrix form of p row and q column (p and q are integers), , A plane mirror 66 that reflects light emitted from the fly-eye lens 65, a collimation mirror 67, a plane mirror 68, and an optical filter 90, so that a unit with a more uniform illuminance distribution on the exposure surface is provided. Can be provided.
  • the optical filter 90 includes the mask M supported by the mask stage 1, the work W supported by the work stage 2, and the illumination device 30. Since the exposure light from the lamp unit 60 whose illuminance is corrected is irradiated onto the workpiece W through the mask M and the exposure pattern is exposed and transferred to the workpiece W, a more accurate exposure result can be obtained.
  • the pattern 93 is designed in accordance with the minimum illuminance Imin on the exposure surface.
  • the illuminance I (i) of each measured point is The pattern 93 may be designed using the average illuminance Iave.
  • the illuminance is adjusted based on the average value of the illuminance I (i) at each point on the exposure surface. Specifically, the illuminance I (i) at each point on the exposure surface is measured, and the average illuminance Iave of the measured illuminance I (i) at each point is calculated. Next, the light transmittance of each point on the cell 91 corresponding to each measurement point on the exposure surface is set to 1- (I (i) -Iave) / I (i). However, when the value of the light transmittance at each point exceeds 1, it is set to 1.
  • the light transmittance of each point on the cell 91 corresponding to a portion brighter than the average illuminance Iave decreases, and the illuminance of each point on the exposure surface, strictly speaking, the illuminance of the portion brighter than the average illuminance Iave It is adjusted to the illuminance Iave. Therefore, it becomes brighter as a whole than the optical filter 90 of the first embodiment, and adjustment is made with an emphasis on the balance between illuminance and uniform illuminance distribution.
  • the manufacturing method of the optical filter 90a of 2nd Embodiment is demonstrated with reference to FIG.
  • the center C 1 of the pattern 93 with respect to the center C 2 of the cell 91 is formed by changing the offset amount for each cell 91.
  • the size of the irradiation area on the exposure surface of the light emitted from each lens element 65a of the fly-eye lens 65 is substantially the same.
  • the position of the irradiation area on the exposure surface of the light emitted from each lens element 65a is slightly different depending on the position of the lens element 65a.
  • the light is emitted from, for example, the central lens element A (65a) among a plurality of (9 in the embodiment shown in the figure) lens elements 65a arranged in a matrix.
  • the light forms an irradiation area B indicated by a dotted line in FIG. 8 on the exposure surface, and the light passing through the center O of the lens element A is irradiated to the center O 1 of the irradiation area B.
  • the light emitted from, for example, the upper right lens element C of the central lens element A forms an irradiation area D (indicated by a one-dot chain line in FIG. 8) on the exposure surface.
  • the irradiation area D is offset from the irradiation area B to the upper right.
  • the light passing through the center P of the lens element C is irradiated to the center P 1 of the irradiation area D.
  • the center P 1 is offset by ⁇ to the right upward from the center O 1 of the irradiation area B.
  • each lens element 65a located around the lens element A also forms an irradiation area offset from the irradiation area B in the left-right and vertical directions on the exposure surface, and the center of each lens element 65a is formed.
  • the passing light is irradiated to positions offset from the center O1 in the left and right and up and down directions, respectively.
  • the offset direction and the offset amount ⁇ are determined according to the position of each lens element 65a with respect to the lens element A.
  • the irradiation areas B, D,... Irradiated on the exposure surface by the lens elements 65a are offset from each other, and all the lens elements are used as the exposure areas used for the exposure of the workpiece W.
  • the central irradiation area E (minimum rectangular area shown in FIG. 8) irradiated with the light from 65a is used.
  • the light passing through the portion indicated by the one-dot chain line of the fly-eye lens 65 irradiates the central irradiation area E.
  • the irradiation pattern of each pattern 93 emitted from each lens element 65a of the fly-eye lens 65 and formed on the exposure surface is an irradiation area by the lens element A It does not completely overlap with the irradiation pattern B, but is formed at positions slightly offset in the vertical and horizontal directions, respectively.
  • the deviation of the irradiation pattern of each cell 91 on the exposure surface is the center O 1 of the exposure area (center irradiation area E) of the exposure surface and the center (for example, P 1 ) of each irradiation area irradiated from each lens element 65a.
  • the center C 1 of the pattern 93 in each cell 91 can be adjusted by being offset with respect to the center C 2 of each cell 91 according to the offset amount ⁇ .
  • the length of each side of the cells 91 is set to Lx, Ly, and exposure by the cells 91.
  • the length of each side of the irradiation area on the surface is Dx, Dy
  • the lens element 65a located in the center is the reference lens A
  • the center C 1 of the pattern 93 of the cell 91 corresponding to is offset from the center C 2 of the cell 91 by m ⁇ Lx 2 / Dx and n ⁇ Ly 2 / Dy.
  • the pattern 93 of the lens element 65a other than the reference lens A are respectively formed deviated to the center O direction of the reference lens A from the center C 2 of each cell 91.
  • the irradiation pattern on the exposure surface of the pattern 93 of each cell 91 matches, and the illuminance distribution is made uniform.
  • the pattern 93 of the cell 91 is the center C 1, since it is formed by an offset with respect to the center C 2 of each cell 91, each of the irradiation pattern matches by each pattern 93, thereby improving the adjustment accuracy of the illuminance distribution.
  • each side of the cell 91 is Lx, Ly
  • the length of each side of the irradiation area by the cell 91 is Dx, Dy
  • the center C 1 of the pattern 93 of the cell 91 corresponding to the other lens element 65 a located at a position shifted by m rows and n columns from the reference lens A is defined as the center C 1 of the cell 91.
  • 2 is offset by m ⁇ Lx 2 / Dx and n ⁇ Ly 2 / Dy, so that even in the optical filter 90 a having the cells 91 in the odd rows and the odd columns, each irradiation by each pattern 93 is performed. Patterns match and the illuminance distribution adjustment accuracy improves.
  • the illuminance adjustment filter has been described as the optical filter 90, but may be configured by the wire filter 100.
  • the wire filter 100 includes a first wire group 101X in which a plurality of wires 102X are arranged in parallel in the X direction and a plurality of wires 102Y in parallel in the Y direction. And a second wire group 101Y.
  • the wire rods 102X of the first wire group 101X and the wire rods 102Y of the second wire group 101Y are arranged so as to be orthogonal to each other, and a plurality of fly eye lenses 65 arranged in a matrix of p rows and q columns. Arranged along the lens element 65a.
  • Wires 102X and 102Y can be applied to wires, elongated plates, and the like, and the cross-sectional shape is not particularly limited, such as a circle, a semicircle, an ellipse, a triangle, a quadrangle, and other polygons.
  • each wire 102X of the first wire group 101X is independently provided by a driving mechanism 103X such as a bimetal or a piezo element provided at an end (for example, the left end in FIG. 9) of each wire 102X. It is movable in the Y direction.
  • each wire 102Y of the second wire group 101Y is independently provided by a driving mechanism 103Y such as a bimetal or a piezo element provided at an end (for example, the upper end of FIG. 9) of each wire 102Y. It is movable in the X direction.
  • the wire members 102X and 102Y of the two wire groups 101X and 101Y of the wire filter 100 are moved in the direction orthogonal to the optical axis EL and the longitudinal direction of the wire members 102X and 102Y, respectively, and configured by a plurality of wire members 102X.
  • the light transmittance of the wire filter 100 is changed by changing the pattern Px to be formed and the pattern Py composed of the plurality of wires 102Y, thereby adjusting the variation in the illuminance distribution on the exposure surface.
  • the size of the region where one pattern Px and one pattern Py overlap is approximately the same as the size of the lens element 65a of the fly-eye lens 65.
  • the method of adjusting the variation in the illuminance distribution by reducing the illuminance of the bright portion with the wire filter 100 in accordance with the low illuminance portion on the exposure surface is the same as that of the optical filter 90. .
  • the illuminance adjustment filter includes two sets of wire groups 101X and 102X each composed of a plurality of wires 102X and 102Y arranged in parallel to each other.
  • the wire rods 102X and 102Y of the two sets of wire groups 101X and 101Y are arranged orthogonally to each other along the matrix of the fly-eye lens 65, and the wire rods 102X and 102Y are respectively optical axes.
  • the wire filter 100 Since the wire filter 100 is movable in the direction orthogonal to the longitudinal direction of the EL and the wire rods 102X and 102Y, the wire rods 102X and 102Y of the two wire groups 101X and 101Y of the wire filter 100 are connected to the optical path EL and the wire rod 102X. , 102Y on the exposure surface by moving in the direction perpendicular to the longitudinal direction. It is possible to adjust the variation in the illuminance distribution. Moreover, the wire filter 100 can be used with the some illuminating device 3 by adjusting the patterns Px and Py according to the illuminating device 3 to be used.
  • the optical filter or wire filter that is the illuminance adjustment unit is preferably disposed between the light source and the fly-eye lens, but may be disposed at any position in the optical path, for example, Further, it may be disposed between the fly-eye lens and the reflecting mirror.
  • the present invention is based on a Japanese patent application (Japanese Patent Application No. 2016-127613) filed on June 28, 2016, the contents of which are incorporated herein by reference.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

L'invention concerne un procédé de fabrication d'un filtre de réglage d'éclairement comprenant les étapes suivantes : mesure de l'éclairement I(i) à un point arbitraire i (i est un nombre entier) sur une surface d'exposition sans qu'un filtre optique (90) soit placé dans un trajet optique EL ; calcule de la distribution du facteur de transmission optique pour chaque cellule (91) en se basant sur l'éclairement I(i) mesuré à chaque point ; et formation d'un filtre optique (90) comprenant des cellules (91) ayant chacune un motif (93) correspondant à la distribution du facteur de transmission optique calculée. Ainsi, toute variation de la distribution de l'éclairement sur la surface d'exposition provoquée par les composants constituant un système optique d'éclairage est réduite au minimum.
PCT/JP2017/020885 2016-06-28 2017-06-05 Procédé de fabrication d'un filtre de réglage d'éclairement, filtre de réglage d'éclairement, système optique d'éclairage et dispositif d'exposition WO2018003418A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-127613 2016-06-28
JP2016127613A JP6712508B2 (ja) 2016-06-28 2016-06-28 照度調整フィルタの製造方法、照度調整フィルタ、照明光学系、及び露光装置

Publications (1)

Publication Number Publication Date
WO2018003418A1 true WO2018003418A1 (fr) 2018-01-04

Family

ID=60786293

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/020885 WO2018003418A1 (fr) 2016-06-28 2017-06-05 Procédé de fabrication d'un filtre de réglage d'éclairement, filtre de réglage d'éclairement, système optique d'éclairage et dispositif d'exposition

Country Status (3)

Country Link
JP (1) JP6712508B2 (fr)
TW (1) TW201802876A (fr)
WO (1) WO2018003418A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6611019B2 (ja) * 2018-02-27 2019-11-27 ウシオ電機株式会社 光源装置、プロジェクタ

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6442821A (en) * 1987-08-10 1989-02-15 Nikon Corp Lighting device
JPH07130600A (ja) * 1993-06-18 1995-05-19 Nikon Corp 照明装置
JPH0922869A (ja) * 1995-07-07 1997-01-21 Nikon Corp 露光装置
JP2001267205A (ja) * 2000-03-15 2001-09-28 Nec Corp 露光装置
JP2002237442A (ja) * 2001-02-09 2002-08-23 Ushio Inc 照度分布均一化フィルタを備えた光照射装置
JP2002305137A (ja) * 2001-04-05 2002-10-18 Nikon Corp ドットパターン作成方法、照明装置、露光装置
JP2004055856A (ja) * 2002-07-19 2004-02-19 Canon Inc 照明装置、それを用いた露光装置及びデバイス製造方法
JP2006210553A (ja) * 2005-01-27 2006-08-10 Seiko Epson Corp 露光装置、照度分布補正フィルター、及び半導体装置の製造方法
JP2009260337A (ja) * 2008-04-14 2009-11-05 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6442821A (en) * 1987-08-10 1989-02-15 Nikon Corp Lighting device
JPH07130600A (ja) * 1993-06-18 1995-05-19 Nikon Corp 照明装置
JPH0922869A (ja) * 1995-07-07 1997-01-21 Nikon Corp 露光装置
JP2001267205A (ja) * 2000-03-15 2001-09-28 Nec Corp 露光装置
JP2002237442A (ja) * 2001-02-09 2002-08-23 Ushio Inc 照度分布均一化フィルタを備えた光照射装置
JP2002305137A (ja) * 2001-04-05 2002-10-18 Nikon Corp ドットパターン作成方法、照明装置、露光装置
JP2004055856A (ja) * 2002-07-19 2004-02-19 Canon Inc 照明装置、それを用いた露光装置及びデバイス製造方法
JP2006210553A (ja) * 2005-01-27 2006-08-10 Seiko Epson Corp 露光装置、照度分布補正フィルター、及び半導体装置の製造方法
JP2009260337A (ja) * 2008-04-14 2009-11-05 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法

Also Published As

Publication number Publication date
JP2018004742A (ja) 2018-01-11
JP6712508B2 (ja) 2020-06-24
TW201802876A (zh) 2018-01-16

Similar Documents

Publication Publication Date Title
US20030035090A1 (en) Scanning exposure method and apparatus
CN107615170B (zh) 曝光用照明装置、曝光装置和曝光方法
WO2007145038A1 (fr) Aligneur de proximité et procédé d'exposition de proximité
KR102175590B1 (ko) 조명 장치, 광학 장치, 임프린트 장치, 투영 장치 및 물품의 제조 방법
JP6535197B2 (ja) 露光装置及び露光方法
WO2019155886A1 (fr) Dispositif d'exposition de proximité, procédé d'exposition de proximité et dispositif d'émission de lumière pour dispositif d'exposition de proximité
JPH1145842A (ja) 投影露光装置と露光方法、該露光装置の調整方法、及び回路デバイス製造方法
TW202202950A (zh) 曝光用之光源裝置、照明裝置、曝光裝置及曝光方法
WO2018003418A1 (fr) Procédé de fabrication d'un filtre de réglage d'éclairement, filtre de réglage d'éclairement, système optique d'éclairage et dispositif d'exposition
KR19980703210A (ko) 역운동을 갖는 스캐닝 리소그래피 시스템
JP6587557B2 (ja) 露光用照明装置、露光装置及び露光方法
JP6761306B2 (ja) 照明光学系、リソグラフィ装置、及び物品製造方法
JPWO2019059315A1 (ja) 露光用照明装置、露光装置及び露光方法
JP2016218381A (ja) 近接露光用照明装置、近接露光装置及び近接露光方法
KR101724640B1 (ko) 레이저 노광 장치
TWI748017B (zh) 近接曝光裝置及近接曝光方法
JP6500282B2 (ja) 露光装置及び照明装置
JP6485627B2 (ja) 露光装置及び露光方法
KR101578385B1 (ko) 근접 노광 장치, 근접 노광 방법 및 조명 광학계
JP6570298B2 (ja) 照明光学系及び露光装置並びにデバイス製造方法
JP2019109445A (ja) 近接露光装置及び近接露光方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17819783

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17819783

Country of ref document: EP

Kind code of ref document: A1