JPS6442821A - Lighting device - Google Patents

Lighting device

Info

Publication number
JPS6442821A
JPS6442821A JP62199439A JP19943987A JPS6442821A JP S6442821 A JPS6442821 A JP S6442821A JP 62199439 A JP62199439 A JP 62199439A JP 19943987 A JP19943987 A JP 19943987A JP S6442821 A JPS6442821 A JP S6442821A
Authority
JP
Japan
Prior art keywords
screening
light flux
uniform illumination
illuminated
small
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62199439A
Other languages
Japanese (ja)
Inventor
Koji Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62199439A priority Critical patent/JPS6442821A/en
Publication of JPS6442821A publication Critical patent/JPS6442821A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable a uniform illumination by arranging a parallel plain transparent member which forms a screening part which partially screens light flux incident on one of small lens groups of fly eye integrator at the incident light side of the fly eye integrator at a specified distance. CONSTITUTION:Circular screening parts 31 and 32 are formed as a screening member for screening central part of light flux which incides into two small lenses 21 and 22 among a large number of small lenses. Thus, a circular low- illumination part is produced at the center of surface of object to be illuminated by the light flux which passed the small lens which is subjected to the operation of this screening part and a non-uniform illumination distribution (hot spot) where the central part is elevated by flare is compensated. It enables a uniform illumination distribution over the entire range of surface of object to be illuminated.
JP62199439A 1987-08-10 1987-08-10 Lighting device Pending JPS6442821A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62199439A JPS6442821A (en) 1987-08-10 1987-08-10 Lighting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62199439A JPS6442821A (en) 1987-08-10 1987-08-10 Lighting device

Publications (1)

Publication Number Publication Date
JPS6442821A true JPS6442821A (en) 1989-02-15

Family

ID=16407835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62199439A Pending JPS6442821A (en) 1987-08-10 1987-08-10 Lighting device

Country Status (1)

Country Link
JP (1) JPS6442821A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0427816U (en) * 1990-06-28 1992-03-05
US5615047A (en) * 1993-06-18 1997-03-25 Nikon Corporation Illumination apparatus and exposure apparatus using it
US6281964B1 (en) 1997-04-30 2001-08-28 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method
US6741394B1 (en) 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
US6768546B2 (en) 1998-04-30 2004-07-27 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method using the same
JP2016218381A (en) * 2015-05-26 2016-12-22 株式会社ブイ・テクノロジー Illumination device for proximity exposure, proximity exposure apparatus and proximity exposure method
WO2018003418A1 (en) * 2016-06-28 2018-01-04 株式会社ブイ・テクノロジー Method for manufacturing illuminance adjustment filter, illuminance adjustment filter, lighting optical system, and exposure device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0427816U (en) * 1990-06-28 1992-03-05
US5615047A (en) * 1993-06-18 1997-03-25 Nikon Corporation Illumination apparatus and exposure apparatus using it
US6281964B1 (en) 1997-04-30 2001-08-28 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method
US6339467B1 (en) 1997-04-30 2002-01-15 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method
US6741394B1 (en) 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
US6768546B2 (en) 1998-04-30 2004-07-27 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method using the same
JP2016218381A (en) * 2015-05-26 2016-12-22 株式会社ブイ・テクノロジー Illumination device for proximity exposure, proximity exposure apparatus and proximity exposure method
WO2018003418A1 (en) * 2016-06-28 2018-01-04 株式会社ブイ・テクノロジー Method for manufacturing illuminance adjustment filter, illuminance adjustment filter, lighting optical system, and exposure device
JP2018004742A (en) * 2016-06-28 2018-01-11 株式会社ブイ・テクノロジー Manufacturing method of illumination intensity adjusting filter, illumination intensity adjusting filter, illumination optical system and exposure device

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