JPS64913A - Luminator - Google Patents

Luminator

Info

Publication number
JPS64913A
JPS64913A JP62156873A JP15687387A JPS64913A JP S64913 A JPS64913 A JP S64913A JP 62156873 A JP62156873 A JP 62156873A JP 15687387 A JP15687387 A JP 15687387A JP S64913 A JPS64913 A JP S64913A
Authority
JP
Japan
Prior art keywords
fluxes
light
incident
outgoing
condensing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62156873A
Other languages
Japanese (ja)
Other versions
JPH01913A (en
Inventor
Masakatsu Ota
Akiyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62156873A priority Critical patent/JPS64913A/en
Publication of JPH01913A publication Critical patent/JPH01913A/en
Publication of JPS64913A publication Critical patent/JPS64913A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

PURPOSE: To enhance the uniformity of a light density distribution and to improve an illuminance distribution and the efficiency of condensing light by generating a large number of luminous fluxes by means of outgoing fluxes obtained by mixing fluxes from a light condensing means, overlapping these fluxes and projecting a surface to be irradiated with said fluxes.
CONSTITUTION: Luminous fluxes from a light source 1 are condensed by an elliptical mirror 2, made incident on an optical pipe 3 arranged so that an incident surface 3a can be positioned close to a 2nd focus of the mirror 2, and are mixed in the optical pipe 3. The light condenser lens 5 condenses fluxes and converges them on the incident surface 6a of an optical integrator 6. Thus the outgoing surface 3b and the incident surface 6a are optically brought into close contact with each other to improve the efficiency of condensing light. Besides, similar uniform distributions of intensity can be formed on the incident and outgoing surfaces 6a and 3b.
COPYRIGHT: (C)1989,JPO&Japio
JP62156873A 1987-06-24 1987-06-24 Luminator Pending JPS64913A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62156873A JPS64913A (en) 1987-06-24 1987-06-24 Luminator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62156873A JPS64913A (en) 1987-06-24 1987-06-24 Luminator

Publications (2)

Publication Number Publication Date
JPH01913A JPH01913A (en) 1989-01-05
JPS64913A true JPS64913A (en) 1989-01-05

Family

ID=15637256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62156873A Pending JPS64913A (en) 1987-06-24 1987-06-24 Luminator

Country Status (1)

Country Link
JP (1) JPS64913A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5368647A (en) * 1991-06-26 1994-11-29 Canon Kabushiki Kaisha Photo-excited processing apparatus for manufacturing a semiconductor device that uses a cylindrical reflecting surface
US6259512B1 (en) 1997-08-04 2001-07-10 Canon Kabushiki Kaisha Illumination system and exposure apparatus having the same
US6285855B1 (en) 1997-03-24 2001-09-04 Canon Kabushiki Kaisha Illumination system and exposure apparatus having the same
US6392742B1 (en) 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus
WO2012137842A1 (en) * 2011-04-04 2012-10-11 株式会社ニコン Illumination apparatus, exposure apparatus, device production method, light-guiding optical element, and method for producing light-guiding optical element

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5368647A (en) * 1991-06-26 1994-11-29 Canon Kabushiki Kaisha Photo-excited processing apparatus for manufacturing a semiconductor device that uses a cylindrical reflecting surface
US6285855B1 (en) 1997-03-24 2001-09-04 Canon Kabushiki Kaisha Illumination system and exposure apparatus having the same
US6259512B1 (en) 1997-08-04 2001-07-10 Canon Kabushiki Kaisha Illumination system and exposure apparatus having the same
US6392742B1 (en) 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus
WO2012137842A1 (en) * 2011-04-04 2012-10-11 株式会社ニコン Illumination apparatus, exposure apparatus, device production method, light-guiding optical element, and method for producing light-guiding optical element

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