JP6712508B2 - 照度調整フィルタの製造方法、照度調整フィルタ、照明光学系、及び露光装置 - Google Patents
照度調整フィルタの製造方法、照度調整フィルタ、照明光学系、及び露光装置 Download PDFInfo
- Publication number
- JP6712508B2 JP6712508B2 JP2016127613A JP2016127613A JP6712508B2 JP 6712508 B2 JP6712508 B2 JP 6712508B2 JP 2016127613 A JP2016127613 A JP 2016127613A JP 2016127613 A JP2016127613 A JP 2016127613A JP 6712508 B2 JP6712508 B2 JP 6712508B2
- Authority
- JP
- Japan
- Prior art keywords
- illuminance
- filter
- exposure
- illuminance adjustment
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 104
- 238000004519 manufacturing process Methods 0.000 title claims description 29
- 238000005286 illumination Methods 0.000 title claims description 27
- 238000009826 distribution Methods 0.000 claims description 61
- 238000002834 transmittance Methods 0.000 claims description 37
- 239000011159 matrix material Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 13
- 238000005259 measurement Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 238000004364 calculation method Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- 238000012546 transfer Methods 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 3
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- 229910052753 mercury Inorganic materials 0.000 description 5
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- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
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- 238000013461 design Methods 0.000 description 2
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- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Microscoopes, Condenser (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016127613A JP6712508B2 (ja) | 2016-06-28 | 2016-06-28 | 照度調整フィルタの製造方法、照度調整フィルタ、照明光学系、及び露光装置 |
| PCT/JP2017/020885 WO2018003418A1 (fr) | 2016-06-28 | 2017-06-05 | Procédé de fabrication d'un filtre de réglage d'éclairement, filtre de réglage d'éclairement, système optique d'éclairage et dispositif d'exposition |
| TW106121545A TW201802876A (zh) | 2016-06-28 | 2017-06-28 | 照度調整濾光器之製造方法、照度調整濾光器、照明光學系統及曝光裝置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016127613A JP6712508B2 (ja) | 2016-06-28 | 2016-06-28 | 照度調整フィルタの製造方法、照度調整フィルタ、照明光学系、及び露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2018004742A JP2018004742A (ja) | 2018-01-11 |
| JP6712508B2 true JP6712508B2 (ja) | 2020-06-24 |
Family
ID=60786293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016127613A Expired - Fee Related JP6712508B2 (ja) | 2016-06-28 | 2016-06-28 | 照度調整フィルタの製造方法、照度調整フィルタ、照明光学系、及び露光装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6712508B2 (fr) |
| TW (1) | TW201802876A (fr) |
| WO (1) | WO2018003418A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6611019B2 (ja) * | 2018-02-27 | 2019-11-27 | ウシオ電機株式会社 | 光源装置、プロジェクタ |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6442821A (en) * | 1987-08-10 | 1989-02-15 | Nikon Corp | Lighting device |
| JP3440458B2 (ja) * | 1993-06-18 | 2003-08-25 | 株式会社ニコン | 照明装置、パターン投影方法及び半導体素子の製造方法 |
| JPH0922869A (ja) * | 1995-07-07 | 1997-01-21 | Nikon Corp | 露光装置 |
| JP2001267205A (ja) * | 2000-03-15 | 2001-09-28 | Nec Corp | 露光装置 |
| JP3918440B2 (ja) * | 2001-02-09 | 2007-05-23 | ウシオ電機株式会社 | 照度分布均一化フィルタを備えた光照射装置 |
| JP2002305137A (ja) * | 2001-04-05 | 2002-10-18 | Nikon Corp | ドットパターン作成方法、照明装置、露光装置 |
| JP2004055856A (ja) * | 2002-07-19 | 2004-02-19 | Canon Inc | 照明装置、それを用いた露光装置及びデバイス製造方法 |
| JP2006210553A (ja) * | 2005-01-27 | 2006-08-10 | Seiko Epson Corp | 露光装置、照度分布補正フィルター、及び半導体装置の製造方法 |
| JP5387893B2 (ja) * | 2008-04-14 | 2014-01-15 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
-
2016
- 2016-06-28 JP JP2016127613A patent/JP6712508B2/ja not_active Expired - Fee Related
-
2017
- 2017-06-05 WO PCT/JP2017/020885 patent/WO2018003418A1/fr active Application Filing
- 2017-06-28 TW TW106121545A patent/TW201802876A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2018004742A (ja) | 2018-01-11 |
| TW201802876A (zh) | 2018-01-16 |
| WO2018003418A1 (fr) | 2018-01-04 |
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