WO2017188299A1 - 酸化物焼結体、スパッタリングターゲット及び酸化物半導体膜 - Google Patents
酸化物焼結体、スパッタリングターゲット及び酸化物半導体膜 Download PDFInfo
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- WO2017188299A1 WO2017188299A1 PCT/JP2017/016493 JP2017016493W WO2017188299A1 WO 2017188299 A1 WO2017188299 A1 WO 2017188299A1 JP 2017016493 W JP2017016493 W JP 2017016493W WO 2017188299 A1 WO2017188299 A1 WO 2017188299A1
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- Prior art keywords
- sintered body
- oxide
- represented
- oxide sintered
- tft
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Definitions
- the present invention manufactures a thin film transistor (TFT) used for a display device such as a liquid crystal display (LCD) or an organic electroluminescence (EL) display, an oxide semiconductor film that can be used for a TFT, and an oxide semiconductor film.
- TFT thin film transistor
- the present invention relates to a sputtering target that can be used at the time, and an oxide sintered body as a material thereof.
- Amorphous (amorphous) oxide semiconductors used in thin film transistors have higher carrier mobility than general-purpose amorphous silicon (a-Si), a large optical band gap, and can be deposited at low temperatures. It is expected to be applied to next-generation displays that require high resolution and high-speed driving, and resin substrates with low heat resistance.
- a-Si general-purpose amorphous silicon
- a sputtering method of sputtering a sputtering target is preferably used. This is because the thin film formed by the sputtering method has a component composition, film thickness, etc. in the film surface direction (in the film surface) as compared with the thin film formed by the ion plating method, vacuum evaporation method, or electron beam evaporation method. This is because the internal uniformity is excellent and a thin film having the same component composition as the sputtering target can be formed.
- Patent Document 1 discloses an oxide sintered body made of In, Y, and O, having Y / (Y + In) of 2.0 to 40 atom% and a volume resistivity of 5 ⁇ 10 ⁇ 2 ⁇ cm or less. It is described as being used as a target. As for the content of Sn element, there is a description that Sn / (In + Sn + other all metal atoms) is 2.8 to 20 atomic%.
- Patent Document 2 describes an oxide sintered body composed of In, Sn, Y, and O and having Y / (In + Sn + Y) of 0.1 to 2.0 atomic%, and a sputtering target using the oxide sintered body. It is described that the thin film obtained from this target constitutes equipment such as a flat panel display and a touch panel.
- Patent Document 3 describes a sintered body having a lattice constant intermediate between the lattice constants of YInO 3 and In 2 O 3 and using this as a sputtering target. Further, indium oxide, a composition consisting of yttrium oxide and tin oxide, a sintered body containing In 2 O 3 and Y 2 SnO 7 compounds are described. Further, a sintered body made of yttrium oxide, tin oxide, and zinc oxide and containing Y 2 Sn 2 O 7 and ZnO or a Zn 2 SnO 4 compound is described. This sintered body is fired under a special condition of an oxygen atmosphere using an atmosphere firing furnace.
- the volume resistivity is low and the density is high, but it is brittle and cracks or causes chipping during the production of sputtering. In some cases, the production yield did not increase. In addition, since the strength is low, the sputtering may occur when sputtering with high power.
- Patent Document 4 contains In, Sn, and Zn, and one or more elements selected from the group consisting of Mg, Si, Al, Sc, Ti, Y, Zr, Hf, Ta, La, Nd, and Sm. It describes oxide sinters and their use as sputtering targets.
- This sintered body is a sintered body containing In 2 O 3 and a Zn 2 SnO 4 compound.
- Patent Document 5 an element selected from In, Sn, Zn, and Mg, Al, Ga, Si, Ti, Y, Zr, Hf, Ta, La, Nd, and Sm is added.
- a sputtering target comprising a spinel structure compound is described.
- Patent Document 6 an element selected from In, Sn, Zn and Hf, Zr, Ti, Y, Nb, Ta, W, Mo and Sm is added, and an In 2 O 3 phase, a spinel phase, X 2 Sn is added.
- 2 O 7 phase (pyrochlore phase) and ZnX sintered body from 2 O 6 comprising one or more layers selected is described.
- An object of the present invention is to provide a TFT that exhibits excellent TFT performance, an oxide semiconductor film that can be used in the TFT, a sputtering target that can form the oxide semiconductor film, and an oxide sintered body that is a material thereof. It is to be.
- the following oxide sintered bodies and the like are provided.
- An oxide containing In element, Zn element, Sn element and Y element An oxide sintered body having a sintered body density of 100.00% or more of a theoretical density.
- 3. The oxide sintered body according to 2, wherein any one or more of a Y element and a Zn element is solid solution substituted in the bixbite phase. 4). 4.
- An oxide comprising an In element, a Zn element, a Sn element, and a Y element, wherein the atomic ratio of the Zn element and the In element is in the following range, and does not include a spinel phase represented by Zn 2 SnO 4 Sintered body. 0.01 ⁇ Zn / (In + Zn + Y + Sn) ⁇ 0.25 0.50 ⁇ In / (In + Zn + Y + Sn) 6). 6.
- the oxide sintered body according to 5 comprising a bixbite phase represented by In 2 O 3 and a pyrochlore phase represented by Y 2 Sn 2 O 7 . 7). 7.
- the oxide sintered body according to 6 wherein any one or more of a Y element and a Zn element is substituted for a solid solution in the bixbite phase. 8).
- Including In element, Zn element, Sn element and Y element, satisfying the atomic ratio of Zn element and In element is in the following range, Consisting of a bixbite phase represented by In 2 O 3 and a pyrochlore phase represented by Y 2 Sn 2 O 7 , or It consists of a bixbite phase represented by In 2 O 3 , a pyrochlore phase represented by Y 2 Sn 2 O 7 , and an indium trizin coindate phase represented by In ((Zn 3 In) O 6 ).
- Oxide sintered body 0.01 ⁇ Zn / (In + Zn + Y + Sn) ⁇ 0.25 0.50 ⁇ In / (In + Zn + Y + Sn) 10. 10.
- a sputtering target comprising the oxide sintered body according to any one of 12.1 to 11.
- a TFT that exhibits excellent TFT performance an oxide semiconductor film that can be used for the TFT, a sputtering target that can form the oxide semiconductor film, and an oxide sintered body that is a material thereof are provided. it can.
- FIG. 2 is an X-ray diffraction pattern of an oxide sintered body produced in Example 1.
- FIG. 3 is an X-ray diffraction pattern of an oxide sintered body produced in Example 2.
- FIG. 3 is an X-ray diffraction pattern of an oxide sintered body produced in Example 3.
- FIG. 2 is an X-ray diffraction pattern of an oxide sintered body produced in Comparative Example 1.
- FIG. 3 is an X-ray diffraction pattern of an oxide sintered body produced in Comparative Example 2.
- FIG. It is a figure which shows one Embodiment of TFT of this invention. It is a figure which shows one Embodiment of TFT of this invention.
- the first aspect of the oxide sintered body of the present invention includes an oxide containing In element, Zn element, Sn element and Y element, and the sintered body density is 100.00% or more of the theoretical density.
- the sintered body density is 100.00% or more of the theoretical density.
- oxide A, oxide B, oxide C, and oxide D are used as the raw material powder of the oxide sintered body
- charge amount is a (g), b (g), c (g), and d (g)
- Theoretical density (a + b + c + d) / ((a / density of oxide A) + (b / density of oxide B) + (c / density of oxide C) + (d / density of oxide D))
- the density of each oxide is almost the same as the density, the value of the specific gravity of the oxide described in the Chemistry Handbook Fundamentals I Nippon Chemistry Rev. 2 (Maruzen Co., Ltd.) was used. .
- the sintered body density of the first aspect of the oxide sintered body of the present invention being 100.00% or more of the theoretical density means that there are few voids that can cause abnormal discharge and start nodules. Stable sputtering is possible with less occurrence of cracks during sputtering.
- the sintered body density is preferably 100.01% or more, more preferably 100.1% or more of the theoretical density. There is no particular upper limit, but it is preferably 105% or less. If it exceeds 105%, a metal component may be contained, and it takes time to optimize the sputtering conditions and annealing conditions for making a semiconductor, or after the conditions are determined for each target, the semiconductor film is formed. You may have to do this.
- the first aspect of the oxide sintered body of the present invention preferably includes a bixbite phase represented by In 2 O 3 and a pyrochlore phase represented by Y 2 Sn 2 O 7 . Since the oxide sintered body includes a bixbite phase represented by In 2 O 3 and a pyrochlore phase represented by Y 2 Sn 2 O 7 , a bixbite phase in which the zinc element is represented by In 2 O 3 and / Or It can be dissolved in the pyrochlore phase represented by Y 2 Sn 2 O 7 and the oxide sintered body can exhibit a high density.
- the oxide sintered body includes a bixbite phase represented by In 2 O 3 and a pyrochlore phase represented by Y 2 Sn 2 O 7 is to examine the crystal structure with an X-ray diffractometer (XRD). It can be confirmed with.
- XRD X-ray diffractometer
- the first aspect of the oxide sintered body of the present invention may include indium trizincodate represented by In ((Zn 3 In) O 6 ) as long as the effects of the present invention are not impaired.
- the crystal phase of the first aspect of the oxide sintered body of the present invention includes a bixbite phase represented by In 2 O 3 , a pyrochlore phase represented by Y 2 Sn 2 O 7 , and any In ((Zn It may consist only of the indium tolidine coindate phase represented by 3 In) O 6 ).
- a bixbite compound composed of indium oxide and a hexagonal crystal represented by In 2 O 3 (ZnO) m (where m is an integer of 1 to 20) are usually used.
- ZnO In 2 O 3
- a layered compound is formed. This indicates that the zinc element reacts with indium oxide without being dissolved in indium oxide.
- yttrium oxide is added to this composition, a hexagonal layered compound represented by indium oxide and / or In 2 O 3 (ZnO) 2 in which the yttrium element is dissolved is produced.
- the abundance ratio of the bixbite phase represented by In 2 O 3 is 50 to 50% in the oxide sintered body. It is preferably 99 wt%, more preferably 60 to 98 wt%.
- the pyrochlore phase or the indium trizin coindate phase is contained in the sintered body mainly composed of the bixbite phase represented by In 2 O 3.
- Application to fluorescent materials other than the target material can also be considered by dispersing and doping rare earth elements.
- a bixbite phase represented by In 2 O 3 is preferably a main component.
- the bixbite phase represented by In 2 O 3 is the main component means that the existence ratio of the bixbite phase represented by In 2 O 3 is 50 wt% or more in the oxide sintered body. , Preferably 60 wt% or more, more preferably 70 wt% or more, and even more preferably 80 wt% or more.
- the oxide sintered body of the present invention contains a bixbite phase represented by In 2 O 3, preferably any one or more of Y element and Zn element in the bixbyite phase is a solid solution substitution. Thereby, it becomes easy to improve the density of a sintered compact.
- the fact that zinc element is solid solution substituted in the bixbite phase represented by In 2 O 3 means that the lattice constant of the bixbite structure of indium oxide in the sintered body is smaller than the lattice constant of indium oxide alone. Can be confirmed.
- the fact that the yttrium element is substituted for the bixbite phase represented by In 2 O 3 is that the lattice constant of the bixbite structure of indium oxide in the sintered body is larger than the lattice constant of indium oxide alone.
- the solid solution substitution of the zinc element and the yttrium element can be adjusted by the amount of yttrium oxide used for manufacturing the sintered body. By adding a small amount of yttrium oxide, indium oxide with a bixbite structure in which zinc element is replaced by solid solution can be generated. By increasing the amount of yttrium oxide added, a bixbite structure in which yttrium element is replaced by solid solution Indium oxide can be produced.
- the “lattice constant” is defined as the length of the lattice axis of the unit cell, and can be determined by the X-ray diffraction method.
- the lattice constant of the bixbyite structure of indium oxide is 10.118 ⁇ .
- the atomic ratio of Zn, Y, Sn, and In is preferably as follows.
- the atomic ratio represented by Zn / (In + Zn + Y + Sn) is preferably 0.01 to 0.25, more preferably 0.03 to 0.25.
- the atomic ratio represented by Y / (In + Zn + Y + Sn) is preferably 0.03 to 0.25, more preferably 0.05 to 0.20.
- the atomic ratio represented by Sn / (In + Zn + Y + Sn) is preferably 0.03 to 0.30, more preferably 0.05 to 0.30.
- the atomic ratio represented by In / (In + Zn + Y + Sn) is preferably 0.20 to 0.93, more preferably 0.25 to 0.87.
- the first aspect of the oxide sintered body of the present invention is obtained by manufacturing a sintered body using raw materials so as to satisfy the above composition.
- the atomic ratio represented by Zn / (In + Zn + Y + Sn) is preferably 0.01 to 0.25. If it is less than 0.01, the effect of increasing the density by the zinc element cannot be obtained, and only a low-density sintered body may be obtained. If it exceeds 0.25, the zinc element cannot be dissolved in the pyrochlore compound represented by indium oxide or Y 2 Sn 2 O 7 , so that it is precipitated as zinc oxide, or a hexagonal crystal layer such as In 2 O 3 (ZnO) 2. A compound may appear.
- the atomic ratio represented by Zn / (In + Zn + Y + Sn) is preferably 0.03 to 0.25, more preferably 0.05 to 0.22, and still more preferably 0.08 to 0.20. .
- the atomic ratio represented by Y / (In + Zn + Y + Sn) is preferably 0.03 to 0.25. If it is less than 0.03, when a semiconductor layer of a thin film transistor (TFT) is formed using a sputtering target manufactured from a sintered body, it may be a conductor without being made into a semiconductor, and only a TFT lacking stability can be obtained. There may not be. In the case of exceeding 0.25, when a semiconductor layer of a thin film transistor (TFT) is formed using a sputtering target manufactured from a sintered body, the semiconductor layer may be formed as an insulator without being formed into a semiconductor.
- the atomic ratio represented by Y / (In + Zn + Y + Sn) is preferably 0.05 to 0.22, more preferably 0.05 to 0.20, and still more preferably 0.07 to 0.20. .
- the atomic ratio represented by Sn / (In + Zn + Y + Sn) is preferably 0.03 to 0.30. If it is less than 0.03, the resistance value of the target does not decrease, the sintering density does not increase, the strength of the sintered body thereafter does not increase, and the linear expansion coefficient and thermal conductivity may be adversely affected.
- a thin film transistor (TFT) semiconductor layer is formed using a sputtering target manufactured from a sintered body of less than 0.03, it dissolves in a mixed acid composed of phosphoric acid, nitric acid, and acetic acid, which is an etching solution for wiring metal. As a result, the back channel TFT which is the TFT structure may not be formed.
- the density of the sintered body is easily improved.
- etching may not be performed with an organic acid such as oxalic acid, and a TFT may not be formed.
- the atomic ratio represented by Sn / (In + Zn + Y + Sn) is preferably 0.05 to 0.30, more preferably 0.08 to 0.28, and even more preferably 0.10 to 0.25. .
- the atomic ratio represented by In / (In + Zn + Y + Sn) is preferably 0.20 to 0.93.
- the composition ratio of the indium element in the sintered body is preferably higher because a TFT having high mobility, which is a characteristic of the TFT, can be obtained. However, the amount is determined from the added amount of each additive element considering the characteristics of the TFT to be obtained. Can be defined.
- the atomic ratio represented by In / (In + Zn + Y + Sn) is preferably 0.25 to 0.87.
- the content (atomic ratio) of each metal element in the sintered body can be determined by measuring the abundance of each element by, for example, ICP (Inductively Coupled Plasma) measurement. it can.
- ICP Inductively Coupled Plasma
- the oxide sintered body of the present invention may contain indium element, zinc element, tin element and yttrium element, and the metal element contained in the oxide sintered body of the present invention is substantially composed of indium element, zinc element, It may consist of tin element and yttrium element.
- “substantially” means that the content ratio of indium element, zinc element, tin element and yttrium element in the metal element contained in the oxide sintered body is, for example, 90 atm% or more, 95 atm% or more, 98 atm% As mentioned above, it means 99 atm% or more or 100 atm%.
- the oxide sintered body of the present invention may contain a gallium element as a metal element other than the indium element, the zinc element, the tin element, and the yttrium element as long as the effects of the present invention are not impaired.
- the bulk resistance of the oxide sintered body of the present invention is preferably 10 m ⁇ cm or less, more preferably 8 m ⁇ cm or less, and particularly preferably 5 m ⁇ cm or less. Bulk resistance can be measured by the method described in the Examples. If the bulk resistance is large, the target may be charged during film formation with high power, causing abnormal discharge, or the plasma state may not be stable, and sparks may occur.
- the three-point bending strength of the oxide sintered body of the present invention is preferably 120 MPa or more, more preferably 140 MPa or more, and further preferably 150 MPa or more. If the three-point bending strength is low, when the sputter film is formed with high power, the strength of the target is weak, so the target may be cracked or chipped, causing solids to scatter on the target and cause abnormal discharge. There is.
- the three-point bending strength can be evaluated in accordance with JIS R 1601 “Room temperature bending strength test of fine ceramics”.
- test piece having a width of 4 mm, a thickness of 3 mm, and a length of 40 mm
- the test piece is placed on two fulcrums arranged at a fixed distance (30 mm), and the crosshead speed is 0 from the center between the fulcrums. It can be evaluated by applying a load of 0.5 mm / min and calculating the bending strength from the maximum load when it breaks.
- the linear expansion coefficient of the oxide sintered body of the present invention is preferably 8.0 ⁇ 10 ⁇ 6 (K ⁇ 1 ) or less, and more preferably 7.5 ⁇ 10 ⁇ 6 (K ⁇ 1 ) or less. and further preferably 7.0 ⁇ 10 -6 (K -1) or less. If the coefficient of linear expansion is large, it is heated during sputtering with high power, the target expands, deformation occurs between the bonded copper plates, microcracks enter the target due to stress, and abnormalities occur due to cracking and chipping. May cause discharge.
- a standard test piece with a width of 5 mm, a thickness of 5 mm, and a length of 10 mm is used. It can be evaluated by using a machine.
- the thermal conductivity of the oxide sintered body of the present invention is preferably 5.0 (W / m ⁇ K) or more, more preferably 5.5 (W / m ⁇ K) or more, and 6.0. (W / m ⁇ K) or more is more preferable, and 6.5 (W / m ⁇ K) or more is most preferable.
- the thermal conductivity is low, when sputtering film formation is performed with high power, the temperature of the sputtered surface and the bonded surface are different, and there is a possibility that microcracks, cracks, and chipping may occur in the target due to internal stress.
- the thermal conductivity can be calculated by, for example, obtaining a specific heat capacity and a thermal diffusivity by a laser flash method using a standard test piece having a diameter of 10 mm and a thickness of 1 mm, and multiplying this by the density of the test piece.
- the second aspect of the oxide sintered body of the present invention includes an In element, a Zn element, a Sn element, and a Y element, the atomic ratio of the Zn element and the In element is in the following range, and Zn 2 SnO 4 Does not include the spinel phase represented. 0.01 ⁇ Zn / (In + Zn + Y + Sn) ⁇ 0.25 0.50 ⁇ In / (In + Zn + Y + Sn)
- a second aspect of the oxide sintered body of the present invention does not contain a spinel phase represented by Zn 2 SnO 4 can be confirmed by examining the crystal structure, for example, by X-ray diffraction measurement device (XRD).
- XRD X-ray diffraction measurement device
- the atomic ratio represented by Zn / (In + Zn + Y + Sn) is based on the viewpoint of improving the density of the sintered body and the crystallinity of the resulting oxide semiconductor film. From the viewpoint of control, it is preferably 0.03 to 0.25, more preferably 0.05 to 0.22, and still more preferably 0.08 to 0.20. Further, the atomic ratio represented by In / (In + Zn + Y + Sn) is preferably 0.50 to 0.93 from the viewpoint of improving the density of the sintered body and keeping the mobility of the obtained TFT high. Preferably it is 0.50 to 0.87.
- a second aspect of the oxide sintered body of the present invention preferably contains a bixbite phase represented by an In 2 O 3, a pyrochlore phase which is represented by Y 2 Sn 2 O 7.
- zinc element can be dissolved in the bixbite phase represented by In 2 O 3 and / or the pyrochlore phase represented by Y 2 Sn 2 O 7 , and the oxide sintered body can exhibit a high density.
- the oxide sintered body includes a bixbite phase represented by In 2 O 3 and a pyrochlore phase represented by Y 2 Sn 2 O 7 , for example, by the above-described X-ray diffraction measurement apparatus (XRD). You can check by checking.
- XRD X-ray diffraction measurement apparatus
- the second aspect of the oxide sintered body of the present invention is from the viewpoint of improving the density of the sintered body, and from the viewpoint of controlling the crystallinity of the resulting oxide semiconductor film and keeping the mobility of the TFT high. It is preferable that the atomic ratio of the Y element and the Sn element is in the following range. 0.03 ⁇ Y / (In + Zn + Y + Sn) ⁇ 0.25 0.03 ⁇ Sn / (In + Zn + Y + Sn) ⁇ 0.30
- the atomic ratio represented by Y / (In + Zn + Y + Sn) is a viewpoint for controlling the compound in the oxide sintered body, and also a protective film or insulating film of the TFT. From the viewpoint of maintaining the heat resistance of the oxide semiconductor film in the CVD process in the manufacturing process and the subsequent heat treatment, it is preferably 0.05 to 0.22, more preferably 0.05 to 0.20. And more preferably 0.07 to 0.20.
- the atomic ratio represented by Sn / (In + Zn + Y + Sn) improves the resistance to chemicals for etching the metal in the oxide semiconductor film obtained from the viewpoint of controlling the compound in the oxide sintered body. From the viewpoint, it is preferably 0.05 to 0.30, more preferably 0.08 to 0.28, and still more preferably 0.10 to 0.25.
- the third aspect of the oxide sintered body of the present invention includes an In element, a Zn element, a Sn element, and a Y element, and satisfies an atomic ratio of the Zn element and the In element within the following range: Consisting of a bixbite phase represented by In 2 O 3 and a pyrochlore phase represented by Y 2 Sn 2 O 7 , or It consists only of a bixbite phase represented by In 2 O 3 , a pyrochlore phase represented by Y 2 Sn 2 O 7 , and an indium trizin coindate phase represented by In ((Zn 3 In) O 6 ). 0.01 ⁇ Zn / (In + Zn + Y + Sn) ⁇ 0.25 0.50 ⁇ In / (In + Zn + Y + Sn)
- a third aspect of the oxide sintered body of the present invention consists of pyrochlore phase represented by bixbyite phase and Y 2 Sn 2 O 7 is represented by In 2 O 3 alone, or, In 2 O 3 X in bixbyite phase represented, Y 2 Sn 2 O 7 represented by the pyrochlore phase and in ((Zn 3 in) O 6) by consisting of only indium tolidine coins dating phase represented, for example the above-mentioned This can be confirmed by examining the crystal structure with a line diffraction measurement device (XRD).
- XRD line diffraction measurement device
- the atomic ratio represented by Zn / (In + Zn + Y + Sn) controls the crystallinity of the oxide semiconductor film obtained from the viewpoint of improving the sintered body density. From this viewpoint, it is preferably 0.03 to 0.25, more preferably 0.05 to 0.22, and still more preferably 0.08 to 0.20.
- the atomic ratio represented by In / (In + Zn + Y + Sn) is preferably 0.50 to 0.93, more preferably from the viewpoint of improving the density of the sintered body and keeping the mobility of the resulting TFT high. Is 0.50 to 0.87.
- the third aspect of the oxide sintered body of the present invention is Y from the viewpoint of improving the density of the sintered body and controlling the crystallinity of the resulting oxide semiconductor film to keep the mobility of the TFT high.
- the atomic ratio of the element and the Sn element is preferably in the following range. 0.03 ⁇ Y / (In + Zn + Y + Sn) ⁇ 0.25 0.03 ⁇ Sn / (In + Zn + Y + Sn) ⁇ 0.30
- the atomic ratio represented by Y / (In + Zn + Y + Sn) is a viewpoint for controlling the compound in the oxide sintered body, and also a protective film or insulating film of the TFT. From the viewpoint of maintaining the heat resistance of the oxide semiconductor film in the CVD process in the manufacturing process and the subsequent heat treatment, it is preferably 0.05 to 0.22, more preferably 0.05 to 0.20. And more preferably 0.07 to 0.20.
- the atomic ratio represented by Sn / (In + Zn + Y + Sn) improves the resistance to chemicals for etching the metal in the oxide semiconductor film obtained from the viewpoint of controlling the compound in the oxide sintered body. From the viewpoint, it is preferably 0.05 to 0.30, more preferably 0.08 to 0.28, and still more preferably 0.10 to 0.25.
- the oxide sintered body of the present invention includes a step of preparing a mixed powder of raw material powders containing indium element, zinc element, tin element and yttrium element, a step of forming a mixed powder to produce a molded body, and a molded body. It can manufacture by passing through the process of baking.
- the raw material powder is preferably an oxide powder, and indium oxide, zinc oxide, tin oxide and yttrium oxide are preferably used as the raw material powder.
- the mixing ratio of the raw material powders should correspond to the atomic ratio of the sintered body to be obtained.
- the oxide sintered body of the present invention it is preferable to mix at a mixing ratio satisfying the following atomic ratio: 0.01 ⁇ Zn / (In + Zn + Y + Sn) ⁇ 0.25 0.03 ⁇ Y / (In + Zn + Y + Sn) ⁇ 0.25 0.03 ⁇ Sn / (In + Zn + Y + Sn) ⁇ 0.30 0.20 ⁇ In / (In + Zn + Y + Sn) ⁇ 0.93
- a more preferable mixing ratio etc. are the same as the atomic ratio demonstrated with the oxide sintered compact of each aspect.
- the average particle diameter of the raw material powder is preferably 0.1 ⁇ m to 2 ⁇ m, more preferably 0.5 ⁇ m to 1.5 ⁇ m.
- the average particle diameter of the raw material powder can be measured with a laser diffraction type particle size distribution apparatus or the like.
- the method for mixing and forming the raw materials is not particularly limited, and can be performed using a known method.
- a binder may be added when mixing.
- the mixing of the raw materials can be performed using a known device such as a ball mill, a bead mill, a jet mill, or an ultrasonic device. Conditions such as the pulverization time may be adjusted as appropriate, but are preferably about 6 to 100 hours.
- a mixed powder can be pressure-molded to form a molded body. By this step, the product is formed into a product shape (for example, a shape suitable as a sputtering target).
- a molded product can be obtained by filling the mixed powder in a mold and molding the mold usually by a die press or cold isostatic press (CIP), for example, at a pressure of 100 Ma or more.
- CIP cold isostatic press
- molding aids such as polyvinyl alcohol, polyethylene glycol, methylcellulose, polywax, oleic acid, and stearic acid may be used.
- the obtained molded product can be sintered at a sintering temperature of 1200 to 1650 ° C. for 10 hours or longer to obtain a sintered body.
- the sintering temperature is preferably 1350 to 1600 ° C, more preferably 1400 to 1600 ° C, still more preferably 1450 to 1600 ° C.
- the sintering time is preferably 10 to 50 hours, more preferably 12 to 40 hours, still more preferably 13 to 30 hours.
- the sintering temperature is less than 1200 ° C. or the sintering time is less than 10 hours, the sintering does not proceed sufficiently, and the electrical resistance of the target is not sufficiently lowered, which may cause abnormal discharge.
- the firing temperature exceeds 1650 ° C. or the firing time exceeds 50 hours, the average crystal grain size increases due to remarkable crystal grain growth, and coarse pores are generated, and the sintered body strength is reduced. May cause abnormal discharge.
- the compact is sintered (fired) in an air atmosphere or an oxygen gas atmosphere.
- the oxygen gas atmosphere is preferably an atmosphere having an oxygen concentration of, for example, 10 to 50% by volume.
- the oxide sintered body of the present invention can increase the density of the sintered body even if the temperature raising process and the holding process (sintering process) are performed in an air atmosphere.
- the heating rate during sintering is from 800 ° C. to a sintering temperature (1200 to 1650 ° C.) of 0.1 to 2 ° C./min.
- the temperature range above 800 ° C. is the range where the sintering proceeds most. If the rate of temperature rise in this temperature range is slower than 0.1 ° C./min, crystal grain growth becomes significant, and there is a possibility that densification cannot be achieved.
- the rate of temperature increase is faster than 2 ° C./min, a temperature distribution is generated in the molded body, and the sintered body may be warped or cracked.
- the rate of temperature increase from 800 ° C. to the sintering temperature is preferably 0.5 to 2.0 ° C./min, more preferably 1.0 to 1.8 ° C./min.
- the obtained sintered body is cut and polished, and bonded to a backing plate to obtain the sputtering target of the present invention.
- the surface of the sintered body often has a sintered portion in a highly oxidized state or has an uneven surface, and needs to be cut into a specified size.
- the surface may be polished with # 200, # 400, or # 800.
- bonding with metal indium is preferable.
- the sputtering target of the present invention can be applied to DC sputtering, RF sputtering, AC sputtering, pulsed DC sputtering, and the like.
- An oxide semiconductor film can be obtained by film formation using the above sputtering target.
- the oxide semiconductor film can be formed by a vapor deposition method, a sputtering method, an ion plating method, a pulse laser vapor deposition method, or the like using the above target.
- the oxide semiconductor film of the present invention has the following atomic ratio. 0.01 ⁇ Zn / (In + Zn + Y + Sn) ⁇ 0.25 0.03 ⁇ Y / (In + Zn + Y + Sn) ⁇ 0.25 0.03 ⁇ Sn / (In + Zn + Y + Sn) ⁇ 0.30 0.20 ⁇ In / (In + Zn + Y + Sn) ⁇ 0.93
- the mobility may be reduced when the oxide semiconductor film is crystallized to generate an interface of large crystal grains to form a TFT. If it exceeds 0.25, the etching rate of the oxide semiconductor film becomes too high and the etching rate cannot be controlled, or the chemical resistance to the resist stripping solution decreases and the surface of the oxide semiconductor film dissolves. There is. On the other hand, when the thickness exceeds 0.25, when a semiconductor layer of a thin film transistor (TFT) is formed using a sputtering target manufactured from a sintered body, only a TFT lacking stability may be obtained.
- the atomic ratio represented by Zn / (In + Zn + Y + Sn) is preferably 0.03 to 0.25, more preferably 0.05 to 0.22, and still more preferably 0.08 to 0.20. .
- the atomic ratio represented by Y / (In + Zn + Y + Sn) is less than 0.03, it may not be a semiconductor and may be a conductor, and only a TFT lacking stability may be obtained. On the other hand, if it exceeds 0.25, there is a case where it is not made into a semiconductor but an insulator.
- the atomic ratio represented by Y / (In + Zn + Y + Sn) is preferably 0.05 to 0.22, more preferably 0.05 to 0.20, and still more preferably 0.07 to 0.20. .
- the atomic ratio represented by Sn / (In + Zn + Y + Sn) is less than 0.03, it is dissolved in a mixed acid composed of phosphoric acid, nitric acid and acetic acid which is an etching solution for wiring metal, and the back channel TFT which is a TFT structure is formed. It may not be possible to form. On the other hand, if it exceeds 0.30, etching may not be possible with an organic acid such as oxalic acid, and a TFT may not be formed.
- the atomic ratio represented by Sn / (In + Zn + Y + Sn) is preferably 0.05 to 0.30, more preferably 0.08 to 0.28, and even more preferably 0.10 to 0.25. .
- the atomic ratio represented by In / (In + Zn + Y + Sn) is 0.20 to 0.93.
- the composition ratio of the indium element in the oxide semiconductor film is preferably higher because a TFT having high mobility, which is a characteristic of the TFT, is obtained.
- the amount of each additive element added in consideration of the desired TFT characteristics What is necessary is just to prescribe
- the atomic ratio represented by In / (In + Zn + Y + Sn) is preferably 0.25 to 0.87, more preferably 0.50 to 0.87.
- the content (atomic ratio) of each metal element in the oxide semiconductor film can be obtained by measuring the abundance of each element by, for example, ICP (Inductively Coupled Plasma) measurement. it can.
- ICP Inductively Coupled Plasma
- the oxide semiconductor film of the present invention may be amorphous.
- the oxide semiconductor film of the present invention can be manufactured using the sputtering target of the present invention.
- the oxide thin film obtained from the sputtering target of the present invention can be used for a TFT, and can be particularly suitably used as a channel layer.
- the element configuration of the TFT is not particularly limited, and various known element configurations can be employed.
- FIG. 6 shows an example of the TFT of the present invention.
- a semiconductor film 40 which is an oxide semiconductor of the present invention is formed on a gate insulating film 30 on a silicon wafer (gate electrode) 20, and interlayer insulating films 70 and 70a are formed.
- 70a on the semiconductor film 40 also functions as a channel layer protective layer.
- a source electrode 50 and a drain electrode 60 are provided on the semiconductor film.
- FIG. 7 shows an example of the TFT of the present invention.
- a semiconductor film 40 which is an oxide semiconductor of the present invention is formed on a gate insulating film (for example, SiO 2 ) 30 on a silicon wafer (gate electrode) 20, and a source electrode 50 and a drain are formed on the semiconductor film 40.
- An electrode 60 is provided, and a protective layer 70 b (for example, a SiO 2 film formed by CVD) is provided on the semiconductor film 40, the source electrode 50, and the drain electrode 60.
- a protective layer 70 b for example, a SiO 2 film formed by CVD
- the silicon wafer 20 and the gate insulating film 30 may be a silicon wafer with a thermal oxide film, the silicon wafer may be used as a gate electrode, and the thermal oxide film (SiO 2 ) may be used as a gate insulating film.
- the gate electrode 20 may be formed on a substrate such as glass.
- the band gap of the oxide semiconductor film of the present invention is preferably 3.0 eV or more.
- the band gap is 3.0 eV or more, light on the long wavelength side from a wavelength near 420 nm is not absorbed.
- light from the light source of the organic EL or TFT-LCD is not absorbed, and when used as a TFT channel layer, there is no malfunction due to the light of the TFT, and light stability can be improved. it can.
- it is 3.1 eV or more, More preferably, it is 3.3 eV or more.
- the material for forming each of the drain electrode, the source electrode and the gate electrode is not particularly limited, and a commonly used material can be arbitrarily selected.
- transparent electrodes such as indium tin oxide (ITO), indium zinc oxide (IZO), ZnO, SnO 2 , metal electrodes such as Al, Ag, Cu, Cr, Ni, Mo, Au, Ti, Ta, or these
- metal electrode or a laminated electrode of an alloy containing can be used.
- a silicon wafer may be used as a substrate, and in that case, the silicon wafer also acts as an electrode.
- the material for forming the insulating film and the protective film is not particularly limited, and a commonly used material can be arbitrarily selected. Specifically, for example, SiO 2, SiNx, Al 2 O 3, Ta 2 O 5, TiO 2, MgO, ZrO 2, CeO 2, K 2 O, Li 2 O, Na 2 O, Rb 2 O, Sc Compounds such as 2 O 3 , Y 2 O 3 , HfO 2 , CaHfO 3 , PbTiO 3 , BaTa 2 O 6 , SrTiO 3 , Sm 2 O 3 , and AlN can be used.
- a protective film on the drain electrode, the source electrode, and the channel layer.
- the durability is easily improved even when the TFT is driven for a long time.
- a top gate type TFT has a structure in which a gate insulating film is formed on a channel layer, for example.
- the protective film or the insulating film can be formed by, for example, CVD, but at that time, the process may be performed at a high temperature.
- the protective film or the insulating film often contains an impurity gas immediately after film formation, and it is preferable to perform heat treatment (annealing treatment).
- the oxide semiconductor film of the present invention By removing these impurity gases by heat treatment, a stable protective film or insulating film is obtained, and a highly durable TFT element can be easily formed.
- the oxide semiconductor film of the present invention it becomes difficult to be affected by the temperature in the CVD process and the subsequent heat treatment. Therefore, even when the protective film or the insulating film is formed, the TFT characteristics are stabilized. Can be improved.
- Examples 1 to 9 Zinc oxide powder, yttrium oxide powder, tin oxide powder and indium oxide powder were weighed so as to have the atomic ratio shown in Table 1 (Table 1-1 and Table 1-2 are collectively referred to as Table 1).
- the mixture was put into a pot and mixed and ground for 72 hours by a dry ball mill to prepare a mixed powder.
- This mixed powder was put into a mold and formed into a press-molded body at a pressure of 500 kg / cm 2 .
- This molded body was densified by CIP at a pressure of 2000 kg / cm 2 .
- this molded body was placed in a firing furnace, held at 350 ° C. for 3 hours under an atmospheric pressure atmosphere, heated at 100 ° C./hour, and sintered at 1450 ° C. for 20 hours. Thereafter, it was left to cool to obtain an oxide sintered body.
- XRD charts of the sintered bodies of Examples 1 to 3 are shown in FIGS. 1 to 3, respectively.
- a bixbite phase represented by In 2 O 3 and a pyrochlore phase represented by Y 2 Sn 2 O 7 were confirmed.
- an indium trizincodate phase represented by In ((Zn 3 In) O 6 ) was further confirmed.
- the lattice constants of the bixbyite structure represented by In 2 O 3 are 10.06889 ⁇ and 10.09902 ⁇ ⁇ ⁇ ⁇ , respectively. Therefore, in Examples 1 and 2, the lattice constant is represented by In 2 O 3. It can be seen that zinc element is replaced by solid solution in the bixbite phase. In Example 3, since the lattice constant of the bixbite structure represented by In 2 O 3 is 10.13330 ⁇ , in Example 3, yttrium element was dissolved in the bixbite phase represented by In 2 O 3. It turns out that it is replacing.
- the XRD measurement conditions are as follows. The lattice constant was determined from the obtained X-ray diffraction. Apparatus: Rigaku Co., Ltd. Smartlab X-ray: Cu-K ⁇ ray (wavelength 1.5418 mm, monochromatized with graphite monochromator) 2 ⁇ - ⁇ reflection method, continuous scan (2.0 ° / min) Sampling interval: 0.02 ° Slit DS (divergence slit), SS (scattering slit), RS (light receiving slit): 1 mm
- the sintered body obtained in Examples 1 to 9 was evaluated as follows. The results are shown in Table 1.
- Element composition ratio (atomic ratio)
- the elemental composition in the sintered body was measured by an induction plasma emission analyzer (ICP-AES).
- the relative density was calculated by measuring the measured density of the manufactured oxide sintered body by the Archimedes method and dividing the measured density by the calculated density of the oxide sintered body. The calculated density was calculated by dividing the total weight of the raw material powder used for manufacturing the oxide sintered body by the total volume of the raw material powder used for manufacturing the oxide sintered body.
- the bulk resistance (conductivity) of the sintered body was measured based on the four-probe method using a resistivity meter (Loresta AX MCP-T370, manufactured by Mitsubishi Chemical Corporation).
- Comparative Examples 1 to 4 Examples 1 to 9 were used except that yttrium oxide powder, tin oxide powder, indium oxide powder, and zinc oxide powder were used so that the atomic ratios shown in Table 2 were obtained (comparative examples 1 and 2 did not use zinc oxide powder). In the same manner as above, a sintered body was produced and evaluated. The results are shown in Table 2.
- Examples 10, 11, 14, 15, 16 Manufacture of thin film transistor (TFT)>
- Film-forming process A sputtering target was produced using the sintered body shown in Table 3 obtained in Examples 2, 3, 1, 6, and 7.
- a thin film (semiconductor film) having a thickness of 50 nm was formed on a silicon wafer (gate electrode) with a thermal oxide film (gate insulating film) by sputtering using these sputtering targets through a metal mask.
- a mixed gas of high purity argon and high purity oxygen was used as the sputtering gas. The results are shown in Table 3.
- Titanium metal was formed by sputtering using a metal mask as the source / drain electrodes.
- the obtained laminate was heat-treated at 350 ° C. for 30 minutes in the atmosphere to complete a TFT.
- a SiO 2 film (protective insulating film) is formed on the semiconductor film after the heat treatment by chemical vapor deposition (CVD) at a substrate temperature of 350 ° C. Then, heat treatment was performed at 350 ° C. for 30 minutes as post-annealing.
- a film was formed with an ion coater using a metal mask so that the size was less than 2 mm, and indium solder was placed on the Au metal to improve the contact, thereby obtaining a sample for measuring the Hall effect.
- ABC-G manufactured by Nippon Electric Glass Co., Ltd. was used for the glass substrate.
- the sample for Hall effect measurement was set in a Hall effect / specific resistance measuring apparatus (ResiTest 8300 type, manufactured by Toyo Technica Co., Ltd.), the Hall effect was evaluated at room temperature, and the carrier density and mobility were obtained.
- a SiO 2 film was formed with a CVD apparatus at a substrate temperature of 350 ° C., and then Hall measurement was performed. Further, the hole measurement was performed after the heat treatment at 350 ° C. for 30 minutes. A SiO 2 film was pierced with a measuring needle up to a gold layer and contacted.
- -Band gap of semiconductor film A semiconductor film was formed on a quartz substrate by sputtering using a sputtering target manufactured from the sintered body shown in Table 3 in Examples 2, 3, 1, 6, and 7, and the temperature was 350 ° C.
- the transmission spectrum of a thin film sample subjected to heat treatment for 5 minutes was measured. After converting the wavelength on the horizontal axis to energy (eV) and the transmittance on the vertical axis to ( ⁇ h ⁇ ) 2 (where ⁇ is an absorption coefficient, h is a Planck's constant, and v is a frequency), absorption occurs. Fitting was performed on the rising portion, and the eV value where it intersected with the baseline was calculated.
- the density of the sintered body is less likely to be higher than a technique using a HIP, spark plasma sintering (SPS) or oxygen atmosphere firing furnace.
- SPS spark plasma sintering
- Table 1 it can be seen that the sintered body of the present example has a high density even when firing in a simple air atmosphere.
- An oxide semiconductor film having the composition shown in Table 3 is useful as a thin film transistor.
- the sintered body of the present invention can be used as a sputtering target, and the obtained sputtering target can be used when an oxide semiconductor thin film of a thin film transistor is produced by a vacuum process such as a sputtering method.
Abstract
Description
1.In元素、Zn元素、Sn元素及びY元素を含む酸化物を含み、
焼結体密度が理論密度の100.00%以上であることを特徴とする酸化物焼結体。
2.In2O3で表されるビックスバイト相と、Y2Sn2O7で表されるパイロクロア相を含むことを特徴とする1に記載の酸化物焼結体。
3.前記ビックスバイト相に、Y元素及びZn元素のいずれか1以上が固溶置換していることを特徴とする2に記載の酸化物焼結体。
4.前記Zn元素、Y元素、Sn元素及びIn元素の原子比が下記範囲であることを特徴とする1~3のいずれか一項に記載の酸化物焼結体。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
0.20≦In/(In+Zn+Y+Sn)≦0.93
5.In元素、Zn元素、Sn元素及びY元素を含み、前記Zn元素、及びIn元素の原子比が下記範囲であり、Zn2SnO4で表されるスピネル相を含まないことを特徴とする酸化物焼結体。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.50≦In/(In+Zn+Y+Sn)
6.In2O3で表されるビックスバイト相と、Y2Sn2O7で表されるパイロクロア相を含むことを特徴とする5に記載の酸化物焼結体。
7.前記ビックスバイト相に、Y元素及びZn元素のいずれか1以上が固溶置換していることを特徴とする6に記載の酸化物焼結体。
8.前記Y元素及びSn元素の原子比が下記範囲であることを特徴とする5~7のいずれか一項に記載の酸化物焼結体。
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
9.In元素、Zn元素、Sn元素及びY元素を含み、前記Zn元素及びIn元素の原子比が下記範囲であることを満たし、
In2O3で表されるビックスバイト相及びY2Sn2O7で表されるパイロクロア相のみからなる、又は、
In2O3で表されるビックスバイト相、Y2Sn2O7で表されるパイロクロア相及びIn((Zn3In)O6)で表されるインジウムトリジンコインデート相のみからなることを特徴とする酸化物焼結体。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.50≦In/(In+Zn+Y+Sn)
10.前記ビックスバイト相に、Y元素及びZn元素のいずれか1以上が固溶置換していることを特徴とする9に記載の酸化物焼結体。
11.前記Y元素及びSn元素の原子比が下記範囲であることを特徴とする9又は10に記載の酸化物焼結体。
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
12.1~11のいずれか一項に記載の酸化物焼結体を含むことを特徴とするスパッタリングターゲット。
13.Zn元素、Y元素、Sn元素及びIn元素の原子比が下記範囲であることを特徴とする酸化物半導体膜。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
0.20≦In/(In+Zn+Y+Sn)≦0.93
14.非晶質であることを特徴とする13に記載の酸化物半導体膜。
15.13又は14に記載の酸化物半導体膜を含むことを特徴とする薄膜トランジスタ。
本発明の酸化物焼結体の第1の態様、後述の本発明の酸化物焼結体の第2の態様及び後述の本発明の酸化物焼結体の第3の態様を総括して、本発明の酸化物焼結体という。
ここで「焼結体密度が理論密度の100.00%以上」とは、アルキメデス法により測定される酸化物焼結体の実測密度を、酸化物焼結体の理論密度で除した値が百分率で100.00%以上であることを意味する。本発明において、理論密度は以下のように算出されるものである。
理論密度=酸化物焼結体に用いた原料粉末の総重量/酸化物焼結体に用いた原料粉末の総体積
理論密度=(a+b+c+d)/((a/酸化物Aの密度)+(b/酸化物Bの密度)+(c/酸化物Cの密度)+(d/酸化物Dの密度))
尚、各酸化物の密度は、密度と比重はほぼ同等であることから、化学便覧 基礎編I日本化学編 改定2版(丸善株式会社)に記載されている酸化物の比重の値を用いた。
焼結体密度は、理論密度の好ましくは100.01%以上であり、より好ましくは100.1%以上である。上限は特にないが、105%以下がよい。105%超になると、金属成分が含有される場合があり、半導体化するスパッタ条件やアニール条件を適正化するのに時間を要するようになったり、ターゲット毎に条件を決定してから半導体成膜をしなければならなくなる場合がある。
酸化物焼結体がIn2O3で表されるビックスバイト相と、Y2Sn2O7で表されるパイロクロア相を含むことは、X線回折測定装置(XRD)により結晶構造を調べることで確認できる。
本発明の酸化物焼結体の第1の態様の結晶相は、In2O3で表されるビックスバイト相、Y2Sn2O7で表されるパイロクロア相、及び任意のIn((Zn3In)O6)で表されるインジウムトリジンコインデート相のみからなってもよい。
酸化インジウムと酸化亜鉛及び酸化スズを含む焼結体では、通常、酸化インジウムからなるビックスバイト化合物とIn2O3(ZnO)m(ここで、mは1~20の整数)で表される六方晶層状化合物、及びZn2SnO4で表されるスピネル化合物が生成することがある。
一方で、酸化インジウム、酸化イットリウム及び酸化スズを含む焼結体は、In2O3で表されるビックスバイト化合物とY2Sn2O7で表されるパイロクロア化合物が出現することが知られている。
In2O3で表されるビックスバイト相の存在比率が上記範囲の場合、パイロクロア相又はインジウムトリジンコインデート相がIn2O3で表されるビックスバイト相を主成分とする焼結体中に分散しており、希土類元素をドーピングする等により、ターゲット素材以外の蛍光材料等への応用も考えることができる。
「In2O3で表されるビックスバイト相が主成分である」とは、In2O3で表されるビックスバイト相の存在比率が、酸化物焼結体中、50wt%以上であることを意味し、好ましくは60wt%以上、より好ましくは70wt%以上、さらに好ましくは80wt%以上である。
In2O3で表されるビックスバイト相に亜鉛元素が固溶置換していることは、焼結体中の酸化インジウムのビックスバイト構造の格子定数が、酸化インジウムのみの格子定数より小さくなっていることにより確認できる。また、In2O3で表されるビックスバイト相にイットリウム元素が固溶置換していることは、焼結体中の酸化インジウムのビックスバイト構造の格子定数が、酸化インジウムのみの格子定数より大きくなっていることにより確認できる。
亜鉛元素とイットリウム元素の固溶置換は、焼結体の製造に用いる酸化イットリウムの添加量により調整できる。酸化イットリウムの添加量を少量にすることで、亜鉛元素が固溶置換したビックスバイト構造の酸化インジウムを生成でき、酸化イットリウムの添加量を多くすることで、イットリウム元素が固溶置換したビックスバイト構造の酸化インジウムを生成できる。
ここで、「格子定数」とは、単位格子の格子軸の長さと定義され、X線回折法によって決定することができる。酸化インジウムのビックスバイト構造の格子定数は10.118Åである。
Zn/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.01~0.25、より好ましくは0.03~0.25である。
Y/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.03~0.25、より好ましくは0.05~0.20である。
Sn/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.03~0.30、より好ましくは0.05~0.30である。
In/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.20~0.93、より好ましくは0.25~0.87である。
上記組成を満たすように原料を用いて焼結体の製造を行うことで、本発明の酸化物焼結体の第1の態様が得られる。
Zn/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.03~0.25であり、より好ましくは0.05~0.22であり、さらに好ましくは0.08~0.20である。
Y/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.05~0.22であり、より好ましくは0.05~0.20であり、さらに好ましくは0.07~0.20である。
Sn/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.05~0.30であり、より好ましくは0.08~0.28であり、さらに好ましくは0.10~0.25である。
焼結体中のインジウム元素の組成割合は、多い方がTFTの特性である移動度が高いTFTが得られることから好ましいが、得たいTFTの特性を考慮した各添加元素の添加量からその量を規定すればよい。
In/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.25~0.87である。
本発明において「実質的」とは、酸化物焼結体中に含まれる金属元素に占めるインジウム元素、亜鉛元素、スズ元素及びイットリウム元素の含有割合が、例えば90atm%以上、95atm%以上、98atm%以上、99atm%以上又は100atm%であることを意味する。
本発明の酸化物焼結体は、本発明の効果を損なわない範囲で、インジウム元素、亜鉛元素、スズ元素及びイットリウム元素以外の金属元素として、ガリウム元素を含んでもよい。
バルク抵抗が大きいと、大パワーでの成膜時に、ターゲットが帯電し、異常放電を起こしたり、プラズマ状態が安定せず、スパークが発生したりするおそれがある。
3点曲げ強度が小さいと、大パワーでスパッタ成膜した場合、ターゲットの強度が弱いために、ターゲットが割れたり、チッピングを起こして、固体がターゲット上に飛散し、異常放電の原因となるおそれがある。3点曲げ強度は、JIS R 1601「ファインセラミックスの室温曲げ強さ試験」に準じて評価できる。具体的には、幅4mm、厚さ3mm、長さ40mmの標準試験片を用いて、一定距離(30mm)に配置された2支点上に試験片を置き、支点間の中央からクロスヘッド速度0.5mm/min荷重を加え、破壊した時の最大荷重より、曲げ強さを算出することで評価できる。
線膨張係数が大きいと、大パワーでスパッタリング中に加熱され、ターゲットが膨張し、ボンディングされている銅版との間で変形が起こり、応力によりターゲットにマイクロクラックが入ったり、割れやチッピングにより、異常放電の原因となるおそれがある。
線膨張係数は、例えば幅5mm、厚さ5mm、長さ10mmの標準試験片を用いて、昇温速度を5℃/分にセットし、300℃に到達した時の熱膨張による変位を位置検出機を用いることにより評価できる。
熱伝導率が小さいと、大パワーでスパッタリング成膜した場合に、スパッタ面とボンディングされた面の温度が異なり、内部応力によりターゲットにマイクロクラックや割れ、チッピングが発生するおそれがある。
熱伝導率は、例えば直径10mm、厚さ1mmの標準試験片を用いて、レーザーフラッシュ法により比熱容量と熱拡散率を求め、これに試験片の密度を乗算することにより算出できる。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.50≦In/(In+Zn+Y+Sn)
また、In/(In+Zn+Y+Sn)で表される原子比は、焼結体の密度を向上させる観点、また、得られるTFTの移動度を高く保つ観点から、好ましくは0.50~0.93、より好ましくは0.50~0.87である。
これにより、亜鉛元素がIn2O3で表されるビックスバイト相及び/又はY2Sn2O7で表されるパイロクロア相に固溶し、酸化物焼結体が高い密度を示すことができる。
酸化物焼結体がIn2O3で表されるビックスバイト相と、Y2Sn2O7で表されるパイロクロア相を含むことは、例えば上述したX線回折測定装置(XRD)により結晶構造を調べることで確認できる。
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
また、Sn/(In+Zn+Y+Sn)で表される原子比は、酸化物焼結体中の化合物を制御する観点、また、得られる酸化物半導体膜の金属をエッチングするための薬液への耐性を向上させる観点から、好ましくは0.05~0.30であり、より好ましくは0.08~0.28であり、さらに好ましくは0.10~0.25である。
In2O3で表されるビックスバイト相及びY2Sn2O7で表されるパイロクロア相のみからなる、又は、
In2O3で表されるビックスバイト相、Y2Sn2O7で表されるパイロクロア相及びIn((Zn3In)O6)で表されるインジウムトリジンコインデート相のみからなる。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.50≦In/(In+Zn+Y+Sn)
また、In/(In+Zn+Y+Sn)で表される原子比は、焼結体密度を向上させる観点、また、得られるTFTの移動度を高く保つ観点から、好ましくは0.50~0.93、より好ましくは0.50~0.87である。
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
また、Sn/(In+Zn+Y+Sn)で表される原子比は、酸化物焼結体中の化合物を制御する観点、また、得られる酸化物半導体膜の金属をエッチングするための薬液への耐性を向上させる観点から、好ましくは0.05~0.30であり、より好ましくは0.08~0.28であり、さらに好ましくは0.10~0.25である。
原料粉末の混合比は、得ようとする焼結体の原子比に対応させるとよく、本発明の酸化物焼結体の第1の態様では、下記原子比を満たす混合比で混合すると好ましい:
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
0.20≦In/(In+Zn+Y+Sn)≦0.93
また、本発明の酸化物焼結体の第2及び第3の態様では、下記原子比を満たす混合比で混合すると好ましい:
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.50≦In/(In+Zn+Y+Sn)
上記混合比について、より好ましい混合比等は各態様の酸化物焼結体で説明した原子比と同じである。
原料の混合は、例えば、ボールミル、ビーズミル、ジェットミル又は超音波装置等の公知の装置を用いて行うことができる。粉砕時間等の条件は、適宜調整すればよいが、6~100時間程度が好ましい。成形方法は、例えば、混合粉末を加圧成形して成形体とすることができる。この工程により、製品の形状(例えば、スパッタリングターゲットとして好適な形状)に成形する。
尚、成形処理に際しては、ポリビニルアルコールやポリエチレングリコール、メチルセルロース、ポリワックス、オレイン酸、ステアリン酸等の成形助剤を用いてもよい。
焼結温度は好ましくは1350~1600℃、より好ましくは1400~1600℃、さらに好ましくは1450~1600℃である。焼結時間は好ましくは10~50時間、より好ましくは12~40時間、さらに好ましくは13~30時間である。
本発明の焼結体において800℃から上の温度範囲は、焼結が最も進行する範囲である。この温度範囲での昇温速度が0.1℃/分より遅くなると、結晶粒成長が著しくなって、高密度化を達成することができないおそれがある。一方、昇温速度が2℃/分より速くなると、成形体に温度分布が生じ、焼結体が反ったり割れたりするおそれがある。
800℃から焼結温度における昇温速度は、好ましくは0.5~2.0℃/分、より好ましくは1.0~1.8℃/分である。
焼結体表面は、高酸化状態の焼結部が存在したり、面が凸凹であることが多く、また、指定の大きさに切断加工する必要がある。スパッタリング中の異常放電やパーティクルの発生を抑えるために、表面を#200番、もしくは#400番、さらには#800番の研磨を行ってもよい。ボンディング法としては、金属インジウムにより接合するのがよい。
上記スパッタリングターゲットを用いて成膜することにより、酸化物半導体膜を得ることができる。
酸化物半導体膜は、上記ターゲットを用いて、蒸着法、スパッタリング法、イオンプレーティング法、パルスレーザー蒸着法等により作製することができる。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
0.20≦In/(In+Zn+Y+Sn)≦0.93
Zn/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.03~0.25であり、より好ましくは0.05~0.22であり、さらに好ましくは0.08~0.20である。
Y/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.05~0.22であり、より好ましくは0.05~0.20であり、さらに好ましくは0.07~0.20である。
Sn/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.05~0.30であり、より好ましくは0.08~0.28であり、さらに好ましくは0.10~0.25である。
酸化物半導体膜中のインジウム元素の組成割合は、多い方がTFTの特性である移動度が高いTFTが得られることから好ましいが、所望のTFTの特性を考慮した各添加元素の添加量からその量を規定すればよい。
In/(In+Zn+Y+Sn)で表される原子比は、好ましくは0.25~0.87、より好ましくは0.50~0.87である。
シリコンウエハー20及びゲート絶縁膜30は、熱酸化膜付きシリコンウエハーを用いて、シリコンウエハーをゲート電極とし、熱酸化膜(SiO2)をゲート絶縁膜としてもよい。
保護膜又は絶縁膜は、例えばCVDにより形成することができるが、その際に高温度によるプロセスになる場合がある。また、保護膜又は絶縁膜は、成膜直後は不純物ガスを含有していることが多く、加熱処理(アニール処理)を行うことが好ましい。加熱処理によりそれらの不純物ガスを取り除くことにより安定した保護膜又は絶縁膜となり、耐久性の高いTFT素子を形成しやすくなる。
本発明の酸化物半導体膜を用いることにより、CVDプロセスにおける温度の影響、及びその後の加熱処理による影響を受けにくくなるため、保護膜又は絶縁膜を形成した場合であっても、TFT特性の安定性を向上させることができる。
表1(表1-1及び表1-2を総括して、表1という)に示す原子比となるように、酸化亜鉛粉末、酸化イットリウム粉末、酸化スズ粉末及び酸化インジウム粉末を秤量し、ポリエチレン製のポットに入れて、乾式ボールミルにより72時間混合粉砕し、混合粉末を作製した。
この混合粉末を金型に入れ、500kg/cm2の圧力でプレス成型体とした。この成型体を2000kg/cm2の圧力でCIPにより緻密化を行った。次に、この成型体を焼成炉に設置して、大気圧雰囲気下で、350℃で3時間保持した後に、100℃/時間にて昇温し、1450℃にて、20時間焼結した。その後、放置冷却して酸化物焼結体を得た。
チャートをJADE6により分析した結果、実施例1~9の焼結体では、In2O3で表されるビックスバイト相、Y2Sn2O7で表されるパイロクロア相が確認された。実施例2~4,6,8,9の焼結体ではさらにIn((Zn3In)O6)で表されるインジウムトリジンコインデート(Indium Trizincoindate)相も確認された。
実施例1及び2において、In2O3で表されるビックスバイト構造の格子定数はそれぞれ10.06889Å及び10.09902Å、であることから、実施例1及び2ではIn2O3で表されるビックスバイト相に亜鉛元素が固溶置換していることが分かる。実施例3においては、In2O3で表されるビックスバイト構造の格子定数が10.13330Åであることから、実施例3ではIn2O3で表されるビックスバイト相にイットリウム元素が固溶置換していることが分かる。
装置:(株)リガク製SmartlabX線:Cu-Kα線(波長1.5418Å、グラファイトモノクロメータにて単色化)
2θ-θ反射法、連続スキャン(2.0°/分)
サンプリング間隔:0.02°
スリットDS(発散スリット)、SS(散乱スリット)、RS(受光スリット):1mm
(1)元素組成比(原子比)
誘導プラズマ発光分析装置(ICP-AES)により焼結体中の元素組成を測定した。
結晶構造の確認に用いたXRDの結果から、ビックスバイト構造の格子定数を確認した。
相対密度は、製造した酸化物焼結体についてアルキメデス法により実測密度を測定し、当該実測密度を酸化物焼結体の計算密度で除することにより算出した。計算密度は、酸化物焼結体の製造に用いた原料粉末の総重量を酸化物焼結体の製造に用いた原料粉末の総体積で除することで算出した。
焼結体のバルク抵抗(導電性)を抵抗率計(三菱化学(株)製、ロレスタAX MCP-T370)を使用して四探針法に基づき測定した。
得られた焼結体について各結晶相の存在比率(wt%)は、XRDチャートから、全パターンフィッティング(WPF)法により存在比として求めた。
表2に示す原子比となるように、酸化イットリウム粉末、酸化スズ粉末、酸化インジウム粉末、酸化亜鉛粉末を用いた(比較例1,2は酸化亜鉛粉末は用いず)他は実施例1~9と同様にして焼結体を製造し、評価した。結果を表2に示す。
<薄膜トランジスタ(TFT)の製造>
(1)成膜工程
実施例2,3,1,6,7で得られた、表3に示す焼結体を用いてスパッタリングターゲットを作製した。熱酸化膜(ゲート絶縁膜)付きのシリコンウエハー(ゲート電極)上に、これらスパッタリングターゲットを用いて、スパッタリングにより、メタルマスクを介して50nmの薄膜(半導体膜)を形成した。スパッタガスとして、高純度アルゴン及び高純度酸素の混合ガスを用いた。結果を表3に示す。
ソース・ドレイン電極として、メタルマスクを用いてチタン金属をスパッタ成膜した。得られた積層体を大気中にて350℃30分加熱処理して、TFTを完成した。
(2)で得られたTFTにおいて、加熱処理後の半導体膜の上に、基板温度350℃で化学蒸着法(CVD)により、SiO2膜(保護絶縁膜)を形成し、その後、後アニールとして350℃30分加熱処理を行った。
・原子比
誘導プラズマ発光分析装置(ICP-AES)により半導体膜中の元素組成を測定した。結果を表3に示す。
・ホール効果測定
半導体膜のみをガラス基板に載せたサンプルを成膜し、上記TFT製造の各段階でホール測定を行い、キャリヤー密度の増減を測定した。具体的には以下の通りである。結果を表3に示す。
TFT製造工程と同様にガラス基板上に厚さ50nmの半導体膜を成膜し、350℃30分の加熱処理を行った後、1cm角の正方形に切り出して、4角に金(Au)を2mm×2mm以下の大きさ位になるようにメタルマスクを用いてイオンコーターで成膜し、Au金属上にインジウムはんだを乗せて接触を良くしてホール効果測定用サンプルとした。
ガラス基板には、日本電気硝子株式会社製ABC-Gを用いた。
ホール効果測定用サンプルをホール効果・比抵抗測定装置(ResiTest8300型、東陽テクニカ社製)にセットし、室温においてホール効果を評価し、キャリヤー密度及び移動度を求めた。
スパッタ後(膜堆積後)の加熱していない膜及び加熱した後の膜の結晶質をX線回折(XRD)測定によって評価した。その結果、加熱前はアモルファスであり、加熱後もアモルファスであった。
実施例2,3,1,6,7の、表3に示す焼結体から製造したスパッタリングターゲットを用いてスパッタリングにより石英基板上に半導体膜を成膜し、350℃30分の加熱処理した薄膜試料の透過スペクトルを測定した。横軸の波長をエネルギー(eV)に、縦軸の透過率を(αhν)2(ここで、αは吸収係数、hはプランク定数、vは振動数である。)に変換したあと、吸収が立ち上がる部分にフィッティングし、それをベースラインと交わるところのeV値を算出した。
上記(2)で得られたTFTと、上記(3)でSiO2保護膜を形成したTFTの下記特性について、評価を行った。(3)で得られたTFTについては、SiO2膜に測定用針を金属チタンの層まで突き刺し評価を行った。結果を表3に示す。
飽和移動度は、ドレイン電圧に5V印加した場合の伝達特性から求めた。具体的に、伝達特性Id-Vgのグラフを作成し、各Vgのトランスコンダクタンス(Gm)を算出し、線形領域の式により飽和移動度を導いた。尚、Gmは∂(Id)/∂(Vg)によって表され、Vgは-15~25Vまで印加し、その範囲での最大移動度を飽和移動度と定義した。本発明において特に断らない限り、飽和移動度はこの方法で評価した。上記Idはソース・ドレイン電極間の電流、Vgはソース・ドレイン電極間に電圧Vdを印加したときのゲート電圧である。
閾値電圧(Vth)は、伝達特性のグラフよりId=10-9AでのVgと定義した。
Vg=-10VのIdの値をOff電流値とし、Vg=20VのIdの値をOn電流値として比[On/Off]を決めた。
実施例2,3及び比較例1で得られた焼結体を用いてスパッタリングターゲットを作製した。スパッタリングターゲットについて以下のように耐久性試験を行った。
表3に示す半導体膜を成膜するスパッタ条件で、DC成膜パワーを400Wとして連続10時間の運転を行った後のターゲット表面を観察した。実施例2,3の焼結体を用いたターゲット表面には、エロージョンの発生以外大きな変化は見られなかった。一方、比較例1の焼結体を用いたターゲットでは、エロージョン部に黒色の異物が多数みられた。また、ヘアーラインクラックが観察された。さらに、マイクロアークカウンターで異常放電の回数を計測したところ、実施例2,3の焼結体を用いたターゲットでは、アークはほぼ計測できなかったが、比較例1の焼結体を用いたターゲットでは多数頻発していた。
本願のパリ優先の基礎となる日本出願明細書の内容を全てここに援用する。
Claims (15)
- In元素、Zn元素、Sn元素及びY元素を含む酸化物を含み、
焼結体密度が理論密度の100.00%以上であることを特徴とする酸化物焼結体。 - In2O3で表されるビックスバイト相と、Y2Sn2O7で表されるパイロクロア相を含むことを特徴とする請求項1に記載の酸化物焼結体。
- 前記ビックスバイト相に、Y元素及びZn元素のいずれか1以上が固溶置換していることを特徴とする請求項2に記載の酸化物焼結体。
- 前記Zn元素、Y元素、Sn元素及びIn元素の原子比が下記範囲であることを特徴とする請求項1~3のいずれか一項に記載の酸化物焼結体。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
0.20≦In/(In+Zn+Y+Sn)≦0.93 - In元素、Zn元素、Sn元素及びY元素を含み、前記Zn元素、及びIn元素の原子比が下記範囲であり、Zn2SnO4で表されるスピネル相を含まないことを特徴とする酸化物焼結体。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.50≦In/(In+Zn+Y+Sn) - In2O3で表されるビックスバイト相と、Y2Sn2O7で表されるパイロクロア相を含むことを特徴とする請求項5に記載の酸化物焼結体。
- 前記ビックスバイト相に、Y元素及びZn元素のいずれか1以上が固溶置換していることを特徴とする請求項6に記載の酸化物焼結体。
- 前記Y元素及びSn元素の原子比が下記範囲であることを特徴とする請求項5~7のいずれか一項に記載の酸化物焼結体。
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30 - In元素、Zn元素、Sn元素及びY元素を含み、前記Zn元素及びIn元素の原子比が下記範囲であることを満たし、
In2O3で表されるビックスバイト相及びY2Sn2O7で表されるパイロクロア相のみからなる、又は、
In2O3で表されるビックスバイト相、Y2Sn2O7で表されるパイロクロア相及びIn((Zn3In)O6)で表されるインジウムトリジンコインデート相のみからなることを特徴とする酸化物焼結体。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.50≦In/(In+Zn+Y+Sn) - 前記ビックスバイト相に、Y元素及びZn元素のいずれか1以上が固溶置換していることを特徴とする請求項9に記載の酸化物焼結体。
- 前記Y元素及びSn元素の原子比が下記範囲であることを特徴とする請求項9又は10に記載の酸化物焼結体。
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30 - 請求項1~11のいずれか一項に記載の酸化物焼結体を含むことを特徴とするスパッタリングターゲット。
- Zn元素、Y元素、Sn元素及びIn元素の原子比が下記範囲であることを特徴とする酸化物半導体膜。
0.01≦Zn/(In+Zn+Y+Sn)≦0.25
0.03≦Y /(In+Zn+Y+Sn)≦0.25
0.03≦Sn/(In+Zn+Y+Sn)≦0.30
0.20≦In/(In+Zn+Y+Sn)≦0.93 - 非晶質であることを特徴とする請求項13に記載の酸化物半導体膜。
- 請求項13又は14に記載の酸化物半導体膜を含むことを特徴とする薄膜トランジスタ。
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WO2024042997A1 (ja) * | 2022-08-25 | 2024-02-29 | 株式会社ジャパンディスプレイ | 酸化物半導体膜、薄膜トランジスタ、および電子機器 |
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CN109071359B (zh) | 2022-02-15 |
JP2021038143A (ja) | 2021-03-11 |
JP6917880B2 (ja) | 2021-08-11 |
KR20180136939A (ko) | 2018-12-26 |
TWI754426B (zh) | 2022-02-01 |
US11078120B2 (en) | 2021-08-03 |
JPWO2017188299A1 (ja) | 2018-05-10 |
US20210355033A1 (en) | 2021-11-18 |
CN109071359A (zh) | 2018-12-21 |
KR102382128B1 (ko) | 2022-04-01 |
JP6266853B1 (ja) | 2018-01-24 |
US20200325072A1 (en) | 2020-10-15 |
TWI720188B (zh) | 2021-03-01 |
TW202114960A (zh) | 2021-04-16 |
JP2018104271A (ja) | 2018-07-05 |
TW201806908A (zh) | 2018-03-01 |
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