WO2017173679A1 - 触摸显示面板、其制备方法以及触摸显示器 - Google Patents

触摸显示面板、其制备方法以及触摸显示器 Download PDF

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WO2017173679A1
WO2017173679A1 PCT/CN2016/080151 CN2016080151W WO2017173679A1 WO 2017173679 A1 WO2017173679 A1 WO 2017173679A1 CN 2016080151 W CN2016080151 W CN 2016080151W WO 2017173679 A1 WO2017173679 A1 WO 2017173679A1
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layer
graphene oxide
insulating layer
source
display device
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French (fr)
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樊勇
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/481—Insulated gate field-effect transistors [IGFETs] characterised by the gate conductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80—Constructional details
    • H10K10/82—Electrodes
    • H10K10/84—Ohmic electrodes, e.g. source or drain electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens

Definitions

  • the present invention relates to the field of touch display technologies, and in particular, to a touch display panel, a method of fabricating the same, and a touch display.
  • Graphene has a hard texture, high transparency (penetration rate ⁇ 97.7%), high thermal conductivity (up to 5300) W/m•K), high electron mobility (over 15,000) Excellent in particular, such as cm2/V•s), has been increasing in applications in recent years, especially in touch screen applications (as an alternative to traditional transparent conductive film ITO) and in LED applications.
  • the existing display with touch function is realized by bonding the touch panel and the display screen together, the display screen realizes the display function, the touch panel realizes the detection of the touch position, and then the touch position and the display are performed through an external circuit.
  • the content is related to each other, and the touch control of the display content is realized under the processing of the operating system.
  • the disadvantage of the way of bonding the display screen to the touch panel for display and touch function is that the first is to increase the number of parts of the process and the device; the second is to add a touch panel on the display panel to reduce visible light.
  • the transmittance is the same as that of the display panel and the touchpad.
  • the invention provides a touch display panel, a preparation method thereof and a touch display, which can solve the problem that the touch display panel existing in the prior art has a complicated structure and high cost.
  • the present invention adopts a technical solution to provide a touch display panel including an upper substrate, a lower substrate, and a display device layer disposed between the upper substrate and the lower substrate.
  • a first insulating layer and a transparent touch electrode layer a first insulating layer and a transparent touch electrode layer; the display device layer is located on the lower substrate for displaying an image; the first insulating layer is located on the display device layer for spacing the display a device layer and the transparent touch electrode layer; the transparent touch electrode layer is located on the first insulating layer for detecting a touch position, and the material of the transparent touch electrode layer is transparent conductive graphene.
  • the display device layer comprises a plurality of TFT devices, the TFT device comprising a source/drain pattern layer, a light emitting layer, a second insulating layer and a gate pattern layer, the light emitting layer being located in the source/drain pattern Below the layer, the second insulating layer is located under the light emitting layer, and the gate pattern layer is located under the light emitting layer via the second insulating layer, and the material of the light emitting layer is reduced graphene oxide.
  • the material of the source/drain pattern layer and the gate pattern layer are all reduced graphene oxide.
  • a touch display including a touch display panel, the touch display panel including an upper substrate, a lower substrate, and the upper substrate and the a display device layer, a first insulating layer and a transparent touch electrode layer between the substrates; the display device layer is located on the lower substrate for displaying an image; the first insulating layer is located at the display device layer The transparent touch electrode layer is located on the first insulating layer for detecting a touch position, and the transparent touch electrode layer is disposed on the first display layer.
  • the material is transparent conductive graphene.
  • the display device layer comprises a plurality of TFT devices, the TFT device comprising a source/drain pattern layer, a light emitting layer, a second insulating layer and a gate pattern layer, the light emitting layer being located in the source/drain pattern Below the layer, the second insulating layer is located under the light emitting layer, the gate pattern layer is located below the light emitting layer via the second insulating layer, and the material of the light emitting layer is reduced graphene oxide.
  • the material of the source/drain pattern layer and the gate pattern layer are all reduced graphene oxide. .
  • another technical solution adopted by the present invention is to provide a method for preparing a touch display panel, the method comprising the steps of: forming a transparent touch electrode layer on the upper substrate, wherein the transparent touch The material of the electrode layer is transparent conductive graphene; a first insulating layer is formed on the transparent touch electrode layer; a display device layer is formed on the first insulating layer; and the lower substrate is covered on the display device layer.
  • the step of forming a transparent touch electrode layer on the upper substrate comprises: spraying or printing graphene oxide on the substrate; curing the graphene oxide; patterning the cured graphene oxide The transparent touch electrode layer is formed.
  • step of patterning the cured graphene oxide to form a transparent touch electrode layer patterning is performed by laser irradiation, and the graphene oxide is reduced.
  • the step of forming a display device layer on the first insulating layer comprises: forming a source/drain pattern layer on the first insulating layer; forming a light-emitting layer on the source/drain pattern layer; A second insulating layer is formed on the light emitting layer; and a gate pattern layer is formed on the second insulating layer.
  • the step of forming a source/drain pattern layer on the first insulating layer comprises: spraying or printing source/drain graphene oxide on the first insulating layer; and the source/drain graphene oxide The layer is cured; the cured source/drain graphene oxide is patterned by laser irradiation while the source/drain graphene oxide is reduced to form a source/drain pattern layer;
  • Forming a light-emitting layer on the source/drain pattern layer includes: spraying or printing a light-emitting semiconductor graphene oxide on the source/drain pattern layer; curing the light-emitting semiconductor graphene oxide; using laser irradiation In the manner of patterning the cured light-emitting semiconductor graphene oxide, the light-emitting semiconductor graphene oxide is reduced to form a light-emitting layer.
  • the step of forming a gate pattern layer on the second insulating layer comprises: spraying or printing a gate graphene oxide on the second insulating layer; and performing the gate graphene oxide by laser irradiation Patterning to form a gate pattern layer; or forming a gate metal layer on the second insulating layer; patterning the metal layer by etching to form a gate pattern layer.
  • the invention has the beneficial effects that the transparent touch electrode layer with touch function is disposed on the display device layer in the display panel, so that the display panel has a touch function, thereby There is no need to add a touch panel to the display panel, which reduces the number of processes and parts, and avoids the problem of reduced visible light transmittance caused by the touch panel, and avoids the adhesion of the display panel to the touch panel, which tends to result in low yield.
  • the problem is that the present invention simplifies and optimizes the structure of the touch display panel and reduces the cost.
  • FIG. 1 is a schematic structural view of an embodiment of a touch display panel of the present invention
  • FIG. 2 is a schematic structural view of an embodiment of a touch display of the present invention.
  • FIG. 3 is a schematic flow chart of a first embodiment of a method for fabricating a touch display panel according to the present invention
  • FIG. 4 is a schematic flow chart of a second embodiment of a method for fabricating a touch display panel according to the present invention.
  • FIG. 5 is a flow chart of a second embodiment of a method for fabricating a touch display panel of the present invention.
  • FIG. 6 is a schematic flow chart of step S21 in Figure 4.
  • FIG. 7 is a schematic flow chart of step S23 in Figure 4.
  • step S231 in FIG. 7 is a schematic flow chart of step S231 in FIG. 7;
  • step S232 in FIG. 7 is a schematic flow chart of step S232 in FIG. 7;
  • FIG. 10 is a schematic flow chart of step S234 in FIG. 7.
  • FIG. 1 is a schematic structural diagram of an embodiment of a touch display panel of the present invention.
  • the touch display panel of the present invention includes an upper substrate 11, a lower substrate 12, and a display device layer, a first insulating layer 13, and a transparent touch electrode layer 14 disposed between the upper substrate 11 and the lower substrate 12.
  • the materials of the upper substrate 11 and the lower substrate 12 are waterproof and oxygen-proof transparent organic materials, such as PET, or the materials of the upper substrate 11 and the lower substrate 12 may be glass or nickel, and the upper substrate 11 and the lower substrate 12 are given.
  • the intermediate display device layer, the first insulating layer 13, and the transparent touch electrode layer 14 and the like provide support and protection.
  • a display device layer is located on the lower substrate 12 for displaying an image.
  • the first insulating layer 13 is on the display device layer for separating the display device layer and the transparent touch electrode layer 14.
  • the first insulating layer 13 may be a PI layer and may be formed on the display device layer by spraying.
  • the transparent touch electrode layer 14 is located on the first insulating layer 13 for detecting the touch position.
  • the material of the transparent touch electrode layer 14 is transparent conductive graphene. Specifically, the transparent conductive graphene is reduced graphene oxide.
  • the touch display panel further includes a control circuit (not shown) for correlating the touch position detected by the transparent touch electrode layer 14 with the display content of the display device layer, and processing in the operating system. Under the touch control of the display content.
  • the present invention provides a touch control function on the display device layer in the display panel, so that the display panel has a touch function, thereby eliminating the need to add touch on the display panel.
  • the board reduces the number of processes and parts, and avoids the problem of reduced visible light transmittance caused by the touch panel, and avoids the problem that the display panel and the touch panel are easy to cause a low yield rate, and the invention is simplified and optimized.
  • the structure of the touch display panel is reduced and the cost is reduced.
  • the display device layer includes a plurality of TFT devices 15 including a source/drain pattern layer 151, a light emitting layer 152, a second insulating layer 153, and a gate pattern layer 154, and the light emitting layer 152 is located at the source/drain electrodes Below the pattern layer 151, the second insulating layer 153 is located under the light emitting layer 152, the second insulating layer 153 is used to separate the light emitting layer 152 and the gate pattern layer 154, and the gate pattern layer 154 is located in the light emitting layer via the second insulating layer 153. Below the 152.
  • the materials of the light-emitting layer 152, the source/drain pattern layer 151, and the gate pattern layer 153 are all reduced graphene oxide. It is worth mentioning that the material of the gate pattern layer 153 may also be a metal such as a high reflectivity metal. According to the difference of the gate voltage, the pixels can be divided into three kinds of pixels of red, green and blue (RGB), and the RGB pixels are separated by the insulating layer SiO2.
  • RGB red, green and blue
  • the present invention also provides a touch display comprising the touch display panel 21 and the frame 22 as shown in FIG. 2, which is a schematic structural view of an embodiment of the touch display of the present invention.
  • the touch display of the present invention simplifies and optimizes the structure while reducing cost.
  • FIG. 3 is a schematic flow chart of a first embodiment of a method for fabricating a touch display panel according to the present invention.
  • the method for preparing the touch display panel of the embodiment includes the following steps:
  • the upper substrate may be PET, or glass, or nickel. Provides support for the transparent touch electrode layer, as well as protection. Specifically, the material of the transparent touch electrode layer is transparent conductive reduced graphene oxide. The transparent touch electrode layer is used for detecting a touch position.
  • the first insulating layer formed in step S12 is for forming a transparent touch electrode layer and subsequently forming a display device layer, and the first insulating layer may be a PI layer.
  • the display device layer is used to display an image. Specifically, the display content of the display device layer and the touch position detected by the transparent touch electrode layer are associated by the control circuit, and the touch control of the display content is implemented by operating system processing.
  • the lower substrate covers the display device layer, so that the display device layer, the transparent touch electrode layer and the first insulating layer are both located between the upper substrate and the lower substrate, thereby realizing the upper substrate and the lower substrate pair display device layer and the transparent touch electrode Protection of the layer and the first insulating layer and the like.
  • the preparation method of the touch display panel of the invention is simple in process, low in cost, and can optimize the structure of the prepared touch display panel.
  • Figure 4 It is a schematic flow chart of the second embodiment of the method for preparing the touch display panel of the present invention.
  • 5 is a flow chart of a second embodiment of a method of fabricating a touch display panel of the present invention.
  • FIG. 6 is a schematic flowchart of step S21 in FIG. Specifically, step S21 includes the following steps:
  • the thickness of the sprayed or printed graphene oxide is from several tens of nanometers to several hundreds of nanometers.
  • step S212 since the graphene oxide film which has just been prepared contains moisture, the moisture in the film and the nitrogen gas are removed by passing nitrogen gas on the surface of the film, thereby realizing film solidification.
  • step S213 patterning is performed by laser irradiation, and the technique is called LSG (Laser scribing).
  • LSG Laser scribing
  • Graphene Graphene technology, which can simultaneously reduce graphene oxide during laser irradiation, wherein the wavelength of the laser is 700-800 nm.
  • the degree of reduction of graphene oxide can be controlled by the time of laser irradiation. Since graphene oxide is an insulator and is not electrically conductive, the graphene oxide irradiated with laser light is reduced to obtain reduced graphene oxide, and thus has electrical conductivity.
  • the graphene of the graphene oxide film is formed by laser irradiation onto the graphene oxide having a mask to form a transparent touch electrode layer.
  • the PI insulating layer can be formed by spraying.
  • FIG. 7 is a schematic flowchart of step S23 in FIG.
  • step S23 includes:
  • FIG. 8 is a schematic flowchart of step S231 in FIG. 7.
  • Step S231 further includes the following steps:
  • step S2312 since the graphene oxide film which has just been prepared contains moisture, the moisture in the film and nitrogen gas are removed by nitrogen gas on the surface of the film, thereby realizing film solidification.
  • step S2313 the graphene oxide is reduced by the LSG technique, and the formed reduced graphene oxide has electrical conductivity. Further, the graphene oxide is irradiated to the graphene oxide having a mask to pattern the graphene oxide to form a source/drain pattern layer.
  • FIG. 9 is a schematic flow chart of step S232 in FIG. Specifically, step S232 includes:
  • the film Since the graphene oxide film which has just been prepared contains moisture, the film is cured by removing nitrogen and nitrogen from the film by passing nitrogen gas on the surface of the film.
  • the light-emitting semiconductor graphene oxide is reduced by the LSG technique, and the formed reduced graphene oxide has conductive properties. Further, the graphene oxide having a mask is irradiated with laser light to pattern the graphene oxide to form a light-emitting layer.
  • the second insulating layer may be a SiNX insulating layer, which may be formed by vapor deposition (CVD).
  • FIG. 10 is a schematic flowchart of step S234 in FIG. 7 .
  • the gate metal layer may be a high reflectivity metal layer, which may be formed on the second insulating layer by evaporation.
  • step S2342 may pattern the gate metal layer by etching, for example, dry etching.
  • the gate metal layer may also be patterned by spraying or printing graphene oxide on the second insulating layer and by reducing the graphene oxide by the LSG technique.
  • the present invention can simplify and optimize the touch display panel, and has a simple process flow and low cost.

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Abstract

一种触摸显示面板、其制备方法以及触摸显示器。触摸显示面板包括上基板（11）、下基板（12）以及设置在上基板（11）和下基板（12）之间的显示器件层、第一绝缘层（13）和透明触控电极层（14）；显示器件层位于下基板（12）上，用于显示图像；第一绝缘层（13）位于显示器件层上，用于隔开显示器件层和透明触控电极层（14）；透明触控电极层（14）位于第一绝缘层（13）上，用于检测触摸位置，透明触控电极层（14）的材料为透明导电石墨烯。触摸显示面板的结构简化并优化了，并降低了成本。

Description

触摸显示面板、其制备方法以及触摸显示器
【技术领域】
本发明涉及触摸显示技术领域，特别是涉及一种触摸显示面板、其制备方法以及触摸显示器。
【背景技术】
石墨烯具有质地坚硬，透明高（穿透率≈97.7%），导热系数高（达5300 W/m•K），电子迁移率高（超过15000 cm2/V•s）等优良特定，近年来在显示器上的应用，逐渐增多，尤其是在触摸屏的应用（作为替代传统透明导电薄膜ITO）和在LED方面的应用。
近年来由于石墨烯发光元件的出现，使石墨烯在显示领域的应用得以扩展，采用石墨烯材料制作的发光元件可通过栅极电压调节石墨烯发光二极管发光颜色。
现有的带触控功能的显示屏的实现方式是将触摸板和显示屏粘接到一起，显示屏实现显示的功能，触摸板实现触摸位置的检测，再通过外部电路，将触摸位置与显示内容相互关联，在操作系统的处理下，实现对显示内容进行触摸控制。这种将显示屏与触摸板粘结实现显示与触控功能的方式的缺点在于，一是增加了工艺过程和器件的零部件数量；二是在显示面板上面增加了触控板，降低了可见光的透过率；三是显示面板和触控板粘合的方式，在显示屏的面积较大的时候，容易在两者的粘合面上引入气泡，成为不良品，降低产品良率，最终影响器件的成本。
【发明内容】
本发明提供一种触摸显示面板、其制备方法以及触摸显示器，能够解决现有技术存在的触摸显示面板结构复杂及成本高的问题。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种触摸显示面板，该触摸显示面板包括上基板、下基板以及设置在所述上基板和所述下基板之间的显示器件层、第一绝缘层和透明触控电极层；所述显示器件层位于所述下基板上，用于显示图像；所述第一绝缘层位于所述显示器件层上，用于隔开所述显示器件层和所述透明触控电极层；所述透明触控电极层位于所述第一绝缘层上，用于检测触摸位置，所述透明触控电极层的材料为透明导电石墨烯。
其中，所述显示器件层包括多个TFT器件，所述TFT器件包括源/漏极图案层、发光层、第二绝缘层和栅极图案层，所述发光层位于所述源/漏极图案层下方，所述第二绝缘层位于所述发光层下方，所述栅极图案层隔着所述第二绝缘层位于所述发光层的下方，所述发光层的材料均为还原氧化石墨烯。
其中，所述源/漏极图案层和所述栅极图案层的材料均为还原氧化石墨烯。
为解决上述技术问题，本发明采用的另一个技术方案是：提供一种触摸显示器，该触摸显示器包括触摸显示面板，所述触摸显示面板包括上基板、下基板以及设置在所述上基板和所述下基板之间的显示器件层、第一绝缘层和透明触控电极层；所述显示器件层位于所述下基板上，用于显示图像；所述第一绝缘层位于所述显示器件层上，用于隔开所述显示器件层和所述透明触控电极层；所述透明触控电极层位于所述第一绝缘层上，用于检测触摸位置，所述透明触控电极层的材料为透明导电石墨烯。
其中，所述显示器件层包括多个TFT器件，所述TFT器件包括源/漏极图案层、发光层、第二绝缘层和栅极图案层，所述发光层位于所述源/漏极图案层下方，所述第二绝缘层位于所述发光层下方，所述栅极图案层隔着所述第二绝缘层位于所述发光层的下方，所述发光层的材料为还原氧化石墨烯。
其中，所述源/漏极图案层和所述栅极图案层的材料均为还原氧化石墨烯。。
为解决上述技术问题，本发明采用的又一个技术方案是：提供一种触摸显示面板的制备方法，该方法包括以下步骤：在上基板上形成透明触控电极层，其中，所述透明触控电极层的材料为透明导电石墨烯；在所述透明触控电极层上形成第一绝缘层；在所述第一绝缘层上形成显示器件层；在所述显示器件层上覆盖下基板。
其中，所述在上基板上形成透明触控电极层的步骤包括：在所述基板上喷涂或印刷氧化石墨烯；将所述氧化石墨烯进行固化；将固化后的所述氧化石墨烯进行图案化而形成透明触控电极层。
其中，所述将固化后的所述氧化石墨烯进行图案化而形成透明触控电极层的步骤中，采用激光照射的方式进行图案化，同时将所述氧化石墨烯进行还原。
其中，在所述第一绝缘层上形成显示器件层的步骤包括：在所述第一绝缘层上形成源/漏极图案层；在所述源/漏极图案层上形成发光层；在所述发光层上形成第二绝缘层；在所述第二绝缘层上形成栅极图案层。
其中，在所述第一绝缘层上形成源/漏极图案层的步骤包括：在所述第一绝缘层上喷涂或印刷源/漏极氧化石墨烯；将所述源/漏极氧化石墨烯层进行固化；采用激光照射的方式将固化后的所述源/漏极氧化石墨烯进行图案化，同时将所述源/漏极氧化石墨烯进行还原从而形成源/漏极图案层；
在所述源/漏极图案层上形成发光层的步骤包括：在所述源/漏极图案层上喷涂或印刷发光半导体氧化石墨烯；将所述发光半导体氧化石墨烯进行固化；采用激光照射的方式将固化后的所述发光半导体氧化石墨烯进行图案化，同时将所述发光半导体氧化石墨烯进行还原，从而形成发光层。
其中，在所述第二绝缘层上形成栅极图案层的步骤包括：在所述第二绝缘层上喷涂或印刷栅极氧化石墨烯；采用激光照射的方式将所述栅极氧化石墨烯进行图案化而形成栅极图案层；或者，在所述第二绝缘层上形成栅极金属层；通过蚀刻的方式将所述金属层进行图案话而形成栅极图案层。
本发明的有益效果是：区别于现有技术的情况，本发明通过在显示面板内的显示器件层上设置了具有触控功能的透明触控电极层，使得该显示面板具有触控功能，从而无需再在显示面板上增加触摸板，减少了工艺过程和零部件数量，且避免了触摸板导致的可见光透过率降低的问题，还避免了显示面板与触控板粘合易导致良品率低的问题，本发明简化并优化了触摸显示面板的结构，并降低了成本。
【附图说明】
图1是本发明触摸显示面板实施例的结构示意图；
图2是本发明触摸显示器实施例的结构示意图；
图3是本发明触摸显示面板的制备方法第一实施例的流程示意图;
图4 是本发明触摸显示面板的制备方法第二实施例的流程示意图;
图5是本发明触摸显示面板的制备方法第二实施例的流程图;
图6是图4中步骤S21的流程示意图;
图7是图4中步骤S23的流程示意图;
图8是图7中步骤S231的流程示意图;
图9是图7中步骤S232的流程示意图;
图10是图7中步骤S234的流程示意图。
【具体实施方式】
下面结合附图和具体实施方式对本发明进行详细说明。
请参阅图1，图1是本发明触摸显示面板实施例的结构示意图。
本发明的触摸显示面板包括上基板11、下基板12以及设置在上基板11和下基板12之间的显示器件层、第一绝缘层13和透明触控电极层14。
其中，上基板11和下基板12的材料为防水防氧的透明有机材质，如PET，或者，上基板11和下基板12的材料也可以是玻璃或者镍等，上基板11和下基板12给中间的显示器件层、第一绝缘层13和透明触控电极层14等结构提供支撑以及保护作用。
显示器件层位于下基板上12，用于显示图像。
第一绝缘层13位于显示器件层上，用于隔开显示器件层和透明触控电极层14。具体地，该第一绝缘层13可以是PI层，可以通过喷涂的方式形成在显示器件层上。
透明触控电极层14位于第一绝缘层13上，用于检测触摸位置，透明触控电极层14的材料为透明导电石墨烯，具体地，该透明导电石墨烯是还原氧化石墨烯。
具体而言，该触摸显示面板还包括控制电路（图未示），控制电路用于将透明触控电极层14检测出的触摸位置与显示器件层的显示内容进行相互关联，在操作系统的处理下，实现对显示内容进行触摸控制。
区别于现有技术，本发明通过在显示面板内的显示器件层上设置了具有触控功能的透明触控电极层14，使得该显示面板具有触控功能，从而无需再在显示面板上增加触摸板，减少了工艺过程和零部件数量，且避免了触摸板导致的可见光透过率降低的问题，还避免了显示面板与触控板粘合易导致良品率低的问题，本发明简化并优化了触摸显示面板的结构，并降低了成本。
具体而言，显示器件层包括多个TFT器件15，TFT器件15包括源/漏极图案层151、发光层152、第二绝缘层153和栅极图案层154，发光层152位于源/漏极图案层151下方，第二绝缘层153位于发光层152下方，第二绝缘层153用于隔开发光层152和栅极图案层154，栅极图案层154隔着第二绝缘层153位于发光层152的下方。
其中，发光层152、源/漏极图案层151和栅极图案层153的材料均为还原氧化石墨烯。值得一提的是，栅极图案层153的材料还可以是金属，例如高反射率金属。根据栅极电压的不同，可以把像素区分成红绿蓝（RGB）三种像素，RGB像素由绝缘层SiO2分割开。
本发明还提供了一种触摸显示器，该触摸显示器包括上述触摸显示面板21和框体22，如图2所示，图2是本发明触摸显示器实施例的结构示意图。本发明的触摸显示器能简化并优化结构，同时还能降低成本。
本发明还提供了一种触摸显示面板的制备方法，请参阅图3，图3是本发明触摸显示面板的制备方法第一实施例的流程示意图。
具体地，本实施例的触摸显示面板的制备方法包括以下步骤：
S11、在上基板上形成透明触控电极层，其中，透明触控电极层的材料为透明导电石墨烯。
其中，上基板可以是PET，或者玻璃，或者镍等。为透明触控电极层提供支撑，以及保护作用。具体地，透明触控电极层的材料为透明导电的还原氧化石墨烯。该透明触控电极层用于检测检测触摸位置。
S12、在透明触控电极层上形成第一绝缘层。
步骤S12中形成的第一绝缘层用于将透明触控电极层和后续形成显示器件层，该第一绝缘层可以是PI层。
S13、在第一绝缘层上形成显示器件层。
显示器件层用于显示图像。具体地，该显示器件层的显示内容与透明触控电极层检测到的触摸位置会通过控制电路进行关联，并通过操作系统处理实现对显示内容进行触摸控制。
S14、在显示器件层上覆盖下基板。
将下基板覆盖住显示器件层，使显示器件层、透明触控电极层和第一绝缘层均位于上基板和下基板之间，从而实现上基板和下基板对显示器件层、透明触控电极层和第一绝缘层等的保护作用。
本发明触摸显示面板的制备方法工艺简单，成本低，并能优化制备所得的触摸显示面板的结构。
请参阅图4和图5，图4 是本发明触摸显示面板的制备方法第二实施例的流程示意图。图5是本发明触摸显示面板的制备方法第二实施例的流程图。
S21、在上基板上形成透明触控电极层，其中，透明触控电极层的材料为透明导电石墨烯。
请参阅图6，图6是图4中步骤S21的流程示意图。具体地，步骤S21包括以下步骤：
S211、在基板上喷涂或印刷氧化石墨烯。
步骤S211中，喷涂或印刷的氧化石墨烯的厚度为几十纳米到几百纳米。
S212、将氧化石墨烯进行固化。
步骤S212中，由于刚制备得到的氧化石墨烯薄膜内含有水分，通过在薄膜表面穿氮气的方式带走薄膜内的水分和氮气，从而实现薄膜固化。
S213、将固化后的氧化石墨烯进行图案化而形成透明触控电极层。
步骤S213中，采用激光照射的方式进行图案化，该技术称为LSG(Laser scribing graphene)技术，激光照射时可同时将氧化石墨烯进行还原，其中，激光的波长为700-800nm。氧化石墨烯的还原程度可以通过激光照射的时间来控制。由于氧化石墨烯为绝缘体，不导电，被激光照射的氧化石墨烯被还原，从而得到还原氧化石墨烯，因而具有导电特性。通过激光照射到具有掩膜板（mask）的氧化石墨烯，从而实现了对氧化石墨烯薄膜的图案化而形成透明触控电极层。
S22、在透明触控电极层上形成第一绝缘层。
具体地，可以通过喷涂的方式形成PI绝缘层。
S23、在第一绝缘层上形成显示器件层。
请参阅图7，图7是图4中步骤S23的流程示意图。
具体地，步骤S23包括：
S231、在第一绝缘层上形成源/漏极图案层。
如图7所示，图8是图7中步骤S231的流程示意图。步骤S231进一步包括以下步骤：
S2311、在第一绝缘层上喷涂或印刷源/漏极氧化石墨烯。
S2312、将源/漏极氧化石墨烯层进行固化。
步骤S2312中，由于刚制备得到的氧化石墨烯薄膜内含有水分，通过在薄膜表面穿氮气的方式带走薄膜内的水分和氮气，从而实现薄膜固化。
S2313、采用激光照射的方式将固化后的源/漏极氧化石墨烯进行图案化，同时将源/漏极氧化石墨烯进行还原从而形成源/漏极图案层。
步骤S2313中，通过LSG技术将氧化石墨烯进行还原，形成的还原氧化石墨烯具有导电特性。并且，通过激光照射到具有掩膜板的氧化石墨烯，从而图案化氧化石墨烯而形成源/漏极图案层。
S232、在源/漏极图案层上形成发光层。
如图9所示，图9是图7中步骤S232的流程示意图。具体地，步骤S232包括：
S2321、在源/漏极图案层上喷涂或印刷发光半导体氧化石墨烯。
S2322、将发光半导体氧化石墨烯进行固化。
由于刚制备得到的氧化石墨烯薄膜内含有水分，通过在薄膜表面穿氮气的方式带走薄膜内的水分和氮气，从而实现薄膜固化。
S2323、采用激光照射的方式将固化后的发光半导体氧化石墨烯进行图案化，同时将发光半导体氧化石墨烯进行还原，从而形成发光层。
本步骤通过LSG技术将发光半导体氧化石墨烯进行还原，形成的还原氧化石墨烯具有导电特性。并且，通过激光照射到具有掩膜板的氧化石墨烯，从而图案化氧化石墨烯而形发光层。
S233、在发光层上形成第二绝缘层。
步骤S233中，第二绝缘层可以是SiNX绝缘层，其可以通过气相沉积（CVD）的方式形成。
S234、在第二绝缘层上形成栅极图案层。
具体地，请参阅图10，图10是图7中步骤S234的流程示意图。
S2341、在第二绝缘层上形成栅极金属层。
步骤S2341中，栅极金属层可以是高反射率金属层，其可以通过蒸镀的方式形成在第二绝缘层上。
S2342、将栅极金属层进行图案化而形成栅极图案层。
具体地，步骤S2342可以通过蚀刻的方式，例如，干刻，对栅极金属层进行图案化。在其他实施例中，栅极金属层还可以通过在第二绝缘层上喷涂或印刷氧化石墨烯，并且，通过LSG技术对氧化石墨烯进行还原，同时进行图案化。
S24、在显示器件层上覆盖下基板。
综上所述，本发明能简化并优化触摸显示面板，并且工艺流程简单，成本低。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (12)

  1. 一种触摸显示面板，其中，包括上基板、下基板以及设置在所述上基板和所述下基板之间的显示器件层、第一绝缘层和透明触控电极层；
    所述显示器件层位于所述下基板上，用于显示图像；
    所述第一绝缘层位于所述显示器件层上，用于隔开所述显示器件层和所述透明触控电极层；
    所述透明触控电极层位于所述第一绝缘层上，用于检测触摸位置，所述透明触控电极层的材料为透明导电石墨烯。
  2. 根据权利要求1所述的显示面板，其中，所述显示器件层包括多个TFT器件，所述TFT器件包括源/漏极图案层、发光层、第二绝缘层和栅极图案层，所述发光层位于所述源/漏极图案层下方，所述第二绝缘层位于所述发光层下方，所述栅极图案层隔着所述第二绝缘层位于所述发光层的下方，所述发光层的材料为还原氧化石墨烯。
  3. 根据权利要求2所述的显示面板，其中，所述源/漏极图案层和所述栅极图案层的材料均为还原氧化石墨烯。
  4. 一种触摸显示器，其中，包括触摸显示面板，所述触摸显示面板包括上基板、下基板以及设置在所述上基板和所述下基板之间的显示器件层、第一绝缘层和透明触控电极层；
    所述显示器件层位于所述下基板上，用于显示图像；
    所述第一绝缘层位于所述显示器件层上，用于隔开所述显示器件层和所述透明触控电极层；
    所述透明触控电极层位于所述第一绝缘层上，用于检测触摸位置，所述透明触控电极层的材料为透明导电石墨烯。
  5. 根据权利要求4所述的触摸显示器，其中，所述显示器件层包括多个TFT器件，所述TFT器件包括源/漏极图案层、发光层、第二绝缘层和栅极图案层，所述发光层位于所述源/漏极图案层下方，所述第二绝缘层位于所述发光层下方，所述栅极图案层隔着所述第二绝缘层位于所述发光层的下方，所述发光层的材料为还原氧化石墨烯。
  6. 根据权利要求5所述的触摸显示器，其中，所述源/漏极图案层和所述栅极图案层的材料均为还原氧化石墨烯。
  7. 一种触摸显示面板的制备方法，其中，包括以下步骤：
    在上基板上形成透明触控电极层，其中，所述透明触控电极层的材料为透明导电石墨烯；
    在所述透明触控电极层上形成第一绝缘层；
    在所述第一绝缘层上形成显示器件层；
    在所述显示器件层上覆盖下基板。
  8. 根据权利要求7所述的方法，其中，所述在上基板上形成透明触控电极层的步骤包括：
    在所述基板上喷涂或印刷氧化石墨烯；
    将所述氧化石墨烯进行固化；
    将固化后的所述氧化石墨烯进行图案化而形成透明触控电极层。
  9. 根据权利要求8所述的方法，其中，所述将固化后的所述氧化石墨烯进行图案化而形成透明触控电极层的步骤中，采用激光照射的方式进行图案化，同时将所述氧化石墨烯进行还原。
  10. 根据权利要求9所述的方法，其中，在所述第一绝缘层上形成显示器件层的步骤包括：
    在所述第一绝缘层上形成源/漏极图案层；
    在所述源/漏极图案层上形成发光层；
    在所述发光层上形成第二绝缘层；
    在所述第二绝缘层上形成栅极图案层。
  11. 根据权利要求10所述的方法，其中，在所述第一绝缘层上形成源/漏极图案层的步骤包括：
    在所述第一绝缘层上喷涂或印刷源/漏极氧化石墨烯；
    将所述源/漏极氧化石墨烯层进行固化；
    采用激光照射的方式将固化后的所述源/漏极氧化石墨烯进行图案化，同时将所述源/漏极氧化石墨烯进行还原从而形成源/漏极图案层；
    在所述源/漏极图案层上形成发光层的步骤包括：
    在所述源/漏极图案层上喷涂或印刷发光半导体氧化石墨烯；
    将所述发光半导体氧化石墨烯进行固化；
    采用激光照射的方式将固化后的所述发光半导体氧化石墨烯进行图案化，同时将所述发光半导体氧化石墨烯进行还原，从而形成发光层。
  12. 根据权利要求11所述的方法，其中，在所述第二绝缘层上形成栅极图案层的步骤包括：
    在所述第二绝缘层上喷涂或印刷栅极氧化石墨烯；
    采用激光照射的方式将所述栅极氧化石墨烯进行图案化而形成栅极图案层；或者，
    在所述第二绝缘层上形成栅极金属层；
    通过蚀刻的方式将所述金属层进行图案话而形成栅极图案层。
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