WO2017097204A1 - 金属网格单膜双面电容屏功能片及其制作方法 - Google Patents

金属网格单膜双面电容屏功能片及其制作方法 Download PDF

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Publication number
WO2017097204A1
WO2017097204A1 PCT/CN2016/108909 CN2016108909W WO2017097204A1 WO 2017097204 A1 WO2017097204 A1 WO 2017097204A1 CN 2016108909 W CN2016108909 W CN 2016108909W WO 2017097204 A1 WO2017097204 A1 WO 2017097204A1
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Prior art keywords
metal mesh
metal
film
capacitive screen
functional sheet
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PCT/CN2016/108909
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English (en)
French (fr)
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赵宗轩
陶少勋
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金英花
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Publication of WO2017097204A1 publication Critical patent/WO2017097204A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • the present invention relates to the field of touch screen technologies, and in particular, to a metal mesh single film double-sided capacitive screen functional sheet and a manufacturing method thereof.
  • the first one is to print or plate a transparent ITO (indium tin oxide) layer on both sides of the glass; the second process is in two pieces of PET (polyethylene). Terephthalate, polyterephthalic plastic) film is coated on one side of the ITO substrate, then metal copper is plated on the ITO substrate, and finally two PET sheets are aligned to form a composite film layer;
  • the process is to form two sides of the functional piece by plating ITO substrate on two PET films, and the two sides of the functional piece need to be screen printed silver wire or laser laser wire, and then screen printed with a layer of insulating ink to protect Floor.
  • the ITO material is expensive and the production cost is high.
  • the first process cannot achieve low impedance due to the ITO layer plated on the glass, especially in a large-area touch screen, the high impedance seriously affects the touch sensitivity of the touch panel, and even increases the driving circuit.
  • the design and manufacturing cost, and the thickness of the functional sheet is large, and the light transmittance is low, which is disadvantageous for the thin design of the touch panel and affects the display effect.
  • the glass substrate is generally between 0.33 and 1.1 mm because of its thick thickness, and it is difficult to achieve a light and thin effect, and at the same time is brittle and cannot perform bending work.
  • the ITO coating on the surface of the PET material cannot be greatly bent due to the material characteristics of the ITO coating, and the curved surface operation cannot be realized;
  • the resistance value is relatively large, commonly used is 150 ⁇ , it is difficult to achieve high-precision effect; each single-sided process requires two yellow light processing production and two etching, and two pieces need to be bonded together, so the production process Complex, low manufacturing efficiency, and foaming and impurities during bonding, which affect product yield. If the pattern of ITO or metal mesh on two PET films is inaccurate, there will be moiré phenomenon. When the user views the display screen at a close distance, the grid on the function piece can be clearly seen, which affects the display effect.
  • the present invention provides a metal mesh single-film double-sided capacitive screen functional sheet with high manufacturing efficiency, low cost, good flexibility, and suitable for roll-to-roll production process and a manufacturing method thereof.
  • a metal mesh single-film double-sided capacitive screen functional sheet comprising a PET film and a metal mesh respectively plated on two faces of the PET film, and a line width of a metal wire constituting the metal mesh It is between 1 and 20 ⁇ m.
  • the metal wire has a line width of between 2 and 8 ⁇ m.
  • the metal mesh includes a plurality of the metal wires disposed in parallel, and a spacing between the adjacent two parallel metal wires is 150 to 400 ⁇ m.
  • the spacing between the adjacent two parallel metal wires is 150 to 200 ⁇ m.
  • the outer surface of the metal mesh is formed with a blackening layer.
  • a chromium oxide layer is formed between the PET film and the metal mesh on both sides thereof.
  • Another object of the present invention is to provide a method for fabricating the above-described metal mesh single-film double-sided capacitive screen functional sheet, comprising:
  • the exposing step, the developing step, and the etching step are all performed simultaneously on both sides of the PET film.
  • the exposing step, the developing step, and the etching step are both in a surging liquid In the body.
  • the method for fabricating the metal mesh single-film double-sided capacitive screen functional sheet further comprises: after the etching step is completed, blackening the surface of the metal material to form a blackening layer.
  • the invention forms a very fine and dense metal mesh on only two sides of a PET film, so that the metal grids on both sides can form a dense touch dot on the functional sheet after being energized, and the thickness is greatly reduced compared with the prior art. Thin, and improve the touch sensitivity of the capacitive screen function sheet, the viewer can hardly observe the metal mesh with the naked eye, avoiding the moiré phenomenon and optimizing the display effect.
  • the functional sheet using the PET film as the substrate has good flexibility, the functional sheet of the present invention can be completed by one exposure, one development, and one etching on both sides of the substrate by a roll-to-roll process, thereby improving manufacturing efficiency and simplifying manufacturing. Process, reducing manufacturing costs.
  • FIG. 1 is a schematic structural view of a metal mesh single-film double-sided capacitive screen functional sheet according to an embodiment of the present invention.
  • FIG. 2 is a schematic diagram of a manufacturing process of a metal mesh single-film double-sided capacitive screen functional sheet according to an embodiment of the present invention.
  • FIG 3 is a schematic cross-sectional view showing the surface of a two-layer metal material coated with a photoresist according to an embodiment of the present invention.
  • FIG. 4 is a schematic view of an exposure mode according to an embodiment of the present invention.
  • FIG. 5 is a schematic cross-sectional structural view of the manufacturing material of FIG. 3 after exposure.
  • FIG. 6 is a schematic cross-sectional structural view of the fabrication material of FIG. 5 after etching.
  • FIG. 7 is a schematic cross-sectional structural view of the fabrication material of FIG. 6 after photoresist removal.
  • a metal mesh single-film double-sided capacitive screen functional sheet includes a PET film 10 and a metal mesh 20 respectively coated on both faces of the PET film 10, wherein the metal mesh is formed.
  • the line width of the metal wire 21 of the cell 20 is between 1 and 20 ⁇ m.
  • the metal mesh 20 is made of copper which is excellent in ductility and conductivity. It can be understood that in other embodiments, the metal mesh 20 can also be a metal alloy such as a copper-nickel alloy. Since the ductility and conductivity of copper are superior to those of indium tin oxide, high-strength bending can be performed, and the surface resistance can be achieved between 5 and 10 ⁇ . The sensitivity of the product produced by this material is improved by 500 to 1000. Double, so high precision can be achieved.
  • the metal mesh 20 includes a plurality of metal wires 21 arranged in parallel, and the spacing between adjacent two parallel metal wires 21 is 150 to 400 ⁇ m. Preferably, the spacing between adjacent two parallel metal lines 21 is 150-200 ⁇ m, even if the capacitive screen function sheet is used in a smaller-sized touch screen product. In order to avoid the moiré phenomenon as much as possible, the metal mesh 20 of the screen surface can be seen when the naked eye is observed at a close distance, and the line width of the metal wire 21 is preferably between 2 and 8 ⁇ m. In a large-screen touch screen product of 21 inches or more, the line width of the metal wire 21 can be designed to be 20 ⁇ m and the line pitch is 200-400 ⁇ m.
  • the metal lines 21 in the metal mesh 20 may also be other shapes than straight lines, such as polygonal, circular, elliptical, irregular closed shapes, and the like.
  • the outer surface of the metal mesh 20 is further formed with a blackening layer 22 for preventing oxidation.
  • the blackening layer 22 may be a metal oxide such as copper oxide, which can protect the metal mesh 20 from being protected. Oxidation, ensuring the service life of the product.
  • the blackening layer 22 can prevent the light emitted by the display screen from being reflected by the metal mesh 20 and then entering the viewer's eyes during the use of the touch screen, thereby preventing the viewer from seeing the metal mesh 20 and affecting the display effect and the user.
  • a metal oxide such as copper oxide
  • a chromium oxide layer 30 is formed between the PET film 10 and the metal mesh 20 on both sides thereof, so that the metal mesh 20 can be better combined with the PET film 10 to improve the bonding strength.
  • FIG. 2 is a schematic diagram of a manufacturing process of a metal mesh single-film double-sided capacitive screen functional sheet according to an embodiment of the present invention
  • FIG. 3 is a schematic cross-sectional structural view of a surface of a two-layer metal material coated with a photoresist according to an embodiment of the present invention
  • 4 is a schematic view showing an exposure mode of the embodiment of the present invention
  • FIG. 5 is a schematic cross-sectional structural view of the material of FIG. 3 after exposure
  • FIG. 6 is a schematic cross-sectional structural view of the material of FIG.
  • FIG. 7 is a schematic cross-sectional structural view of the fabrication material of FIG. 6 after photoresist removal.
  • FIG. 3 is a schematic cross-sectional structural view of a surface of a two-layer metal material coated with a photoresist according to an embodiment of the present invention
  • 4 is a schematic view showing an exposure mode of the embodiment of the present invention
  • FIG. 5 is a schematic cross-sectional structural view of the
  • the manufacturing method of the metal grid single film double-sided capacitive screen function sheet mainly comprises:
  • the PET film 10 was aged in a roll-to-roll manner by a gas floating aging apparatus.
  • the aging time is about 30 min, and the aging temperature is 140 ° C, so that the PET film 10 is pre-shrinked to stabilize the film size.
  • the PET film 10 has a thickness of 50 to 200 ⁇ m.
  • Chromium oxide material 3 and metal material 2 Chromium oxide material 3 and metal material 2.
  • the aged PET film 10 is passed through a coating apparatus, and a chromium oxide material 3 and a metal material 2 as an adhesion layer are sequentially plated on both surfaces of the film 1 by vacuum magnetron sputtering to form a PET copper film.
  • the photoresist 4 is applied.
  • the produced PET copper film is coated with a photoresist 4 on the surface of each layer of the metal material 2 by a coater, and sequentially subjected to tension control-protective film peeling-resistive coating-baking-cooling-double-sided protective film- The process of tension control-receiving and the like completes double-sided photoresist coating, as shown in FIG.
  • the photoresist 4 selects a positive photoresist for TFT-LCD, and the portion irradiated with the light is dissolved in the photoresist developing solution, and the portion not irradiated with the light is not dissolved in the photoresist developing solution, and its characteristics are It has good coating uniformity, fast photospeed, large exposure latitude, good linearity, high contrast and high resolution, good adhesion to the substrate, and high corrosion resistance.
  • the coating thickness of the photoresist is 2 ⁇ 0.5 ⁇ m, the uniformity of the coated photoresist is less than 3%, and the tension control is adjustable at 1-5kgf.
  • the double-sided protective film of the product can protect the product from damage during handling and protect it.
  • the coated PET copper film is passed through a high-precision exposure machine and is flattened by tension control.
  • a mask 5 is attached to both sides of the PET copper film (Fig. 4), and a CCD (Charge-coupled Device) is used. Grab the point on the mask 5 to achieve precise alignment and fixation of both sides of the PET copper film, then illuminate the exposure lamp, and map the line pattern on the mask 5 to the photoresist on the PET copper film by illumination 4 on.
  • the exposure lamp is a high-energy mercury lamp with a power of 8Kw, and the emitted light is parallel uv (ultraviolet) light.
  • the angle between the uv light and the mask 5 is 90 ⁇ 0.5°, and the alignment accuracy is ⁇ 2 ⁇ m, the light intensity is 200mj/cm 2 , and finally extremely fine mesh cells are formed on the pattern, and the accuracy of the mesh exposure is high.
  • the grid unit has a wire diameter of 2-5 ⁇ m and a line pitch of 150-200 ⁇ m.
  • the exposed PET copper film was passed through a development-curing apparatus, followed by a discharge-stripping-developing-pure water-drying-baking-coating. After transporting to the developing position, it is necessary to peel off the protective film on both sides of the product before development. After development, the unexposed portion of the photoresist 4 is insoluble in the developer, and the portion of the photoresist 4 that is not irradiated with light remains on the surface of the metal material 2 to form a corresponding grid pattern (see FIG. 5). .
  • the developer was KOH, the concentration was 0.8 mol/L, the development time was 50 sec, the temperature was 30 ⁇ 1 ° C, the resistivity of pure water was 16-18 M′ ⁇ cm, the baking temperature was 140° C., and the baking time was 90 sec.
  • the developing section is changed from the conventional spraying method to the developing liquid surge mode to avoid damage of the photoresist due to direct spraying of the developing solution.
  • a protective film is attached to both sides of the product to be transported again.
  • the developed-solidified material is passed through an etching-de-filming-blackening apparatus, followed by discharge-strip-etching-etching-pure water-drying-release-pure-washing-blowing-blackening-pure washing-blowing Dry-film coating process, etching away portions other than the pattern on the metal material 2, and forming a metal mesh 20 on the metal material 2 in a pattern conforming to the photoresist 4; meanwhile, etching the chromium oxide material 3, in oxidation A chrome oxide layer 30 (shown in FIG.
  • the etching solution is a mixture of sulfuric acid hydrogen peroxide, the concentration is 0.8 mol/L, the temperature is 45 ⁇ 1 ° C, the etching time is 50 sec, the leaching solution is selected to be NaOH, the concentration is 0.8 mol/L, the temperature is 40 ⁇ 3° C., and the film is removed.
  • the blackening solution was selected to be oxidized with potassium persulfate in an alkaline environment to produce black copper oxide on the surface of the copper film; liquid ratio: sodium hydroxide 110 ⁇ 10 g/L, potassium persulfate 35 ⁇ 5 g/L, temperature It is 60 ⁇ 5°C and the blackening time is 120sec. All the above stages are changed from the traditional spray method to the chemical liquid surge to avoid damage to the copper grid caused by the spray of liquid.
  • the resistivity of pure water is 16-18 M' ⁇ .cm.
  • the exposure step, the development step, and the etching step are all performed simultaneously on both sides of the PET film 10, and both are performed in a surging chemical liquid.
  • the invention forms a very fine and dense metal mesh on only two sides of a PET film, so that the metal grids on both sides can form a dense touch dot on the functional sheet after being energized, and the thickness is greatly reduced compared with the prior art. Thin, and improve the touch sensitivity of the capacitive screen function sheet, the viewer can hardly observe the metal mesh with the naked eye, avoiding the moiré phenomenon and optimizing the display effect.
  • the functional sheet using the PET film as the substrate has good flexibility, the functional sheet of the present invention can be completed by one exposure, one development, and one etching on both sides of the substrate by a roll-to-roll process, thereby improving manufacturing efficiency and simplifying manufacturing.
  • the process reduces the manufacturing cost; since the PET film is used instead of the traditional ITO, the price is low, the manufacturing cost is reduced by 70% compared with the conventional material, and the market prospect is far-reaching.

Abstract

一种金属网格单膜双面电容屏功能片及其制造方法，该功能片包括，一层PET膜（10）和分别镀覆于PET膜（10）的两个面上的金属网格（20），组成金属网格（20）的金属线（21）的线宽在1～20μm之间。一种金属网格单膜双面电容屏功能片的制作方法。由于仅在一层PET膜（10）的两面分别形成极细且密集的金属网格（20），使得两侧的金属网格（20）通电后可以在功能片上形成密集的触摸网点，与现有技术相比不仅厚度大幅减薄，而且提高了电容屏功能片的触控灵敏度，观看者使用肉眼很难观察到金属网格，避免了莫尔纹现象，优化了显示效果。同时，由于PET膜（10）弯曲性好，功能片可以通过卷对卷工艺在基材两侧完成一次曝光、一次显影、一次蚀刻，提高了制造效率，简化了制造工艺，降低了制造成本。

Description

金属网格单膜双面电容屏功能片及其制作方法 技术领域
本发明涉及触摸屏技术领域，尤其涉及一种金属网格单膜双面电容屏功能片及其制作方法。
背景技术
市面上主流的制作触摸面板功能片的工艺主要有三种，第一种是在玻璃的两面印刷或镀附透明的ITO(氧化铟锡)层；第二种工艺是在分别在两片PET(polyethylene terephthalate，聚对苯二甲酸类塑料)薄膜的单面镀制ITO基材后，再在ITO基材上镀金属铜，最后将两片PET对位贴合在一起，形成复合膜层；第三种工艺是在两片PET薄膜上镀制ITO基材分别制作出功能片的两面，同时功能片的两边导线需要通过丝网印刷银线或者激光镭射导线，再通过丝网印刷一层绝缘油墨保护层。
但是ITO材料价格昂贵，生产成本高，第一种工艺由于玻璃上镀制的ITO层不能够做到低阻抗，尤其是大面积触摸屏中，高阻抗严重影响触摸面板的触摸灵敏度，甚至增加驱动电路设计和制造成本，且此种功能片厚度大、透光率较低，不利于触摸面板的薄型化设计且影响显示效果。且玻璃基材因其厚度较厚，一般在0.33～1.1mm之间，很难实现轻薄的效果，同时易碎，不能实现弯曲作业。
后两种工艺虽然利用两层PET薄膜取代玻璃作为基材，因ITO镀膜时其材质的特性导致附着在PET材料表面的ITO不可进行大幅度弯曲，无法实现曲面作业；而且，这两种功能片的阻值均较大，常用的为150Ω，很难实现高精度的效果；每个单面制程需要两次黄光加工生产和两次蚀刻，同时需要将两片贴合在一起，因此生产流程复杂、制造效率较低，同时在贴合时会产生起泡和杂质而影响产品良率，如果两层PET薄膜上的ITO或金属网格制造的图案对准不精确则会存在莫尔纹现象，使用者近距离观看显示屏时，可以很明显地看得到功能片上的网格，影响显示效果。
发明内容
鉴于现有技术存在的不足，本发明提供了一种制造效率高、成本低、弯曲性好、适用于卷对卷生产工艺的金属网格单膜双面电容屏功能片及其制作方法。
为了实现上述的目的，本发明采用了如下的技术方案：
一种金属网格单膜双面电容屏功能片，包括一层PET膜和分别镀覆于所述PET膜的两个面上的金属网格，组成所述金属网格的金属线的线宽在1～20μm之间。
进一步地，所述金属线的线宽在2～8μm之间。
进一步地，所述金属网格包括多根平行设置的所述金属线，相邻的两根平行的所述金属线之间的间距为150～400μm。
进一步地，相邻的两根平行的所述金属线之间的间距为150～200μm。
进一步地，所述金属网格外表面形成有黑化层。
进一步地，所述PET膜与其两面的所述金属网格之间均形成有氧化铬层。
本发明的另一目的在于提供一种上述的金属网格单膜双面电容屏功能片的制作方法，包括：
提供一层PET膜；
对所述PET膜老化处理；
在所述PET膜的两面分别镀一层氧化铬材料；
在每层所述氧化铬材料的表面镀一层金属材料；
在每层所述金属材料的表面涂覆光刻胶；
曝光，使所述光刻胶部分固化形成图案；
显影，去除所述光刻胶未固化的部分；
蚀刻，以去除部分金属材料并在所述金属材料上形成与所述光刻胶一致的图案的金属网格。
进一步地，所述曝光步骤、所述显影步骤和蚀刻步骤均是分别在所述PET膜的两侧同时进行。
进一步地，所述曝光步骤、所述显影步骤和所述蚀刻步骤均是在涌动的液 体中进行。
进一步地，所述的金属网格单膜双面电容屏功能片的制作方法还包括在所述蚀刻步骤完成后，对所述金属材料的表面黑化处理形成黑化层。
本发明仅在一层PET膜的两面分别形成极细且密集的金属网格，使得两侧的金属网格通电后可以在功能片上形成密集的触摸网点，与现有技术相比不仅厚度大幅减薄，而且提高了电容屏功能片的触控灵敏度，观看者使用肉眼很难观察到金属网格，避免了莫尔纹现象，优化了显示效果。同时，由于使用PET膜作为基材的功能片弯曲性好，本发明的功能片可以通过卷对卷工艺在基材两侧一次曝光、一次显影、一次蚀刻完成，提高了制造效率，简化了制造工艺，降低了制造成本。
附图说明
图1为本发明实施例的金属网格单膜双面电容屏功能片的结构示意图。
图2为本发明实施例的金属网格单膜双面电容屏功能片的制作工艺原理图。
图3为本发明实施例的两层金属材料表面涂覆光刻胶后的剖面结构示意图。
图4为本发明实施例的曝光方式示意图。
图5为图3的制作材料曝光后的剖面结构示意图。
图6为图5的制作材料蚀刻后的剖面结构示意图。
图7为图6的制作材料去光阻后的剖面结构示意图。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本发明进一步详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
参阅图1，本发明实施例的金属网格单膜双面电容屏功能片包括一层PET膜10和分别镀覆于PET膜10的两个面上的金属网格20，其中，组成金属网格20的金属线21的线宽在1～20μm之间。该金属网格20为延展性和导电性较好的铜制成。可以理解的是，在其他实施方式中，金属网格20也可以是金属合金如铜镍合金。由于铜的延展性和导电性优于氧化铟锡，故而可以进行高强度弯曲，其表面阻值可实现5-10Ω之间，用此材料生产出的产品其灵敏度提高500～1000 倍，故而可实现高精密度的效果。
金属网格20包括多根平行设置的金属线21，相邻的两根平行的金属线21之间的间距为150～400μm。较佳地，相邻的两根平行的金属线21之间的间距为150～200μm，即使该电容屏功能片应用在较小尺寸的触摸屏产品中也不容易被看到。为尽可能地避免莫尔纹现象，防止肉眼近距离观察电容屏时可以看到屏幕表面的金属网格20，金属线21的线宽最好在2～8μm之间。在21寸以上的大屏幕触摸屏产品中，金属线21的线宽可设计为20μm，线距200-400μm。
在其他实施方式中，金属网格20中的金属线21也可以是直线以外的其他形状，如多边形、环形、椭圆形、不规则的封闭形状等。
本实施例中，金属网格20的外表面还形成有防止氧化的黑化层22，该黑化层22可以是金属氧化物，如氧化铜，可以起到保护金属网格20、防止其被氧化、保证产品的使用寿命的作用。同时，该黑化层22可以避免在触摸屏的使用过程中，由显示屏发出的光被金属网格20反射后射入观看者眼中，避免观看者看到金属网格20而影响显示效果和用户体验。
在PET膜10与其两面的金属网格20之间均形成有氧化铬层30，使得金属网格20能更好地与PET膜10结合，提高结合强度。
如图2，为本发明实施例的金属网格单膜双面电容屏功能片的制作工艺原理图；图3为本发明实施例的两层金属材料表面涂覆光刻胶后的剖面结构示意图；图4为本发明实施例的曝光方式示意图；图5为图3的制作材料曝光后的剖面结构示意图；图6为图5的制作材料蚀刻后的剖面结构示意图。图7为图6的制作材料去光阻后的剖面结构示意图。
制作该金属网格单膜双面电容屏功能片的制作方法主要包括：
提供一层PET膜10；
对PET膜10老化处理；
在PET膜10的两面分别镀一层氧化铬材料3；
在每层氧化铬材料3的表面镀一层金属材料2；
在每层金属材料2的表面涂覆光刻胶4；
曝光，使光刻胶4部分固化形成图案；
显影，去除光刻胶4未固化的部分；
蚀刻，以去除部分金属材料2并在金属材料2上形成与光刻胶4一致的图案的金属网格20；同时，蚀刻氧化铬材料3，以在氧化铬材料3上形成与光刻胶4一致的图案的氧化铬层30。
以及脱膜，以使被蚀刻的金属材料2更好地脱落；
最后清洗产品，即完成功能片制作。
具体制作步骤如下：
(1)将PET膜10以卷对卷的方式通过气体浮动式老化设备进行老化。其中老化时间约30min，老化温度为140℃，使PET膜10预先收缩，稳定膜材尺寸。其中PET膜10厚度为50～200μm。
镀氧化铬材料3和金属材料2。将老化过的PET膜10通过镀膜设备，采用真空磁控溅射的方式在薄膜1的两个面分别依次镀上作为粘附层的氧化铬材料3和金属材料2，形成PET铜膜。
涂覆光刻胶4。将制作的PET铜膜通过涂布机在每层金属材料2的表面涂覆光刻胶4，依次经过张力控制-保护膜剥离-光阻涂布-烘烤-冷却-双面贴保护膜-张力控制-收料等过程完成双面光刻胶涂布，如图3所示。其中光刻胶4选择TFT-LCD专用正性光刻胶，其被光照射到的部分会溶于光阻显影液，而没有被光照射到的部分不会溶于光阻显影液，其特点在于有良好的涂布均匀性、感光速度快、曝光宽容度大、有良好的线性，高对比度和高分辨率，并与基材具备良好的粘附性，以及高抗蚀性。光刻胶的涂布厚度为2±0.5μm,涂布光刻胶均匀度差值小于3％,张力控制在1-5kgf可调。产品的双面贴附的保护膜可以保证产品在搬运过程中不受损伤，起到保护作用。
曝光。将涂布好的PET铜膜通过高精度曝光机，经过张力控制使其平整，在PET铜膜的两面同时附加掩膜版5(如图4)，通过CCD(Charge-coupled Device，电荷耦合元件)抓取掩膜版5上的点实现PET铜膜两面的精确对位和固定，然后点亮曝光灯，通过光照将掩膜版5上的线路图案映射到PET铜膜上的光刻胶4上。这里，曝光灯是高能水银灯，其功率为8Kw，发出的光线为平行的uv(ultraviolet,紫外线)光，uv光与掩膜版5的所成的角度为90±0.5°，对位精度为±2μm，光强度为200mj/cm2，最终在图案上形成极其细密的网格单元，网格曝光的精确度高。该网格单元的线径为2-5μm，线距150-200μm。
(5)显影。将曝光后的PET铜膜通过显影-固化设备，依次经过放料-剥膜-显影-纯水洗-吹干-烘烤-覆膜收料。搬运至显影位置后，显影前需要剥离产品两面的保护膜。显影后，光刻胶4中未受光照的部分不溶于显影液，而光刻胶4中未被光照射的部分固化后保留在金属材料2表面，形成相应的网格图案(如图5)。显影液为KOH，浓度为0.8mol/L，显影时间50sec，温度为30±1℃，纯水的电阻率为16-18M′Ω.cm，烘烤温度为140℃，烘烤时间90sec。本实施方式中，显影段由传统的喷淋方式改为显影液涌动的方式，避免由于显影液的直接喷淋造成光刻胶的损坏。显影完成后，在产品的两面再次贴附保护膜，以便再次搬运。
(5)蚀刻、脱膜及黑化。将显影-固膜好的材料通过蚀刻-脱膜-黑化设备，依次经过放料-剥膜-蚀刻-纯水洗-吹干-脱膜-纯水洗-吹干-黑化-纯水洗-吹干-覆膜收料处理，蚀刻掉金属材料2上图案以外的部分，并在金属材料2上形成与光刻胶4一致的图案的金属网格20；同时，蚀刻氧化铬材料3，在氧化铬材料3上形成与光刻胶4图案一致的氧化铬层30(如图6)；然后水洗、脱模以去除光刻胶和蚀刻残留物等(如图7)；最后，对两面的金属网格20表面黑化处理，形成起保护和防反光作用的黑化层22。这里，蚀刻液采用硫酸双氧水混合液，浓度为0.8mol/L，温度为45±1℃，蚀刻时间50sec,脱膜液选择NaOH，浓度为0.8mol/L，温度为40±3℃，脱膜时间50sec，黑化液选择在碱性环境下用过硫酸钾氧化，使铜膜表面产生黑色氧化铜；液体配比：氢氧化钠110±10g/L，过硫酸钾35±5g/L，温度为60±5℃，黑化时间120sec，上述各阶段均由传统的喷淋方式改为化学液涌动的方式，避免由于药液的喷淋造成铜网格的损坏。其中纯水的电阻率为16-18M′Ω.cm。其中，曝光步骤、显影步骤和蚀刻步骤均是分别在PET膜10的两侧同时进行，且均是在涌动的化学液体中进行。
本发明仅在一层PET膜的两面分别形成极细且密集的金属网格，使得两侧的金属网格通电后可以在功能片上形成密集的触摸网点，与现有技术相比不仅厚度大幅减薄，而且提高了电容屏功能片的触控灵敏度，观看者使用肉眼很难观察到金属网格，避免了莫尔纹现象，优化了显示效果。同时，由于使用PET膜作为基材的功能片弯曲性好，本发明的功能片可以通过卷对卷工艺在基材两侧一次曝光、一次显影、一次蚀刻完成，提高了制造效率，简化了制造工艺，降低了制造成本；由于采用PET铜膜代替了传统的ITO，因此价格低廉，制造成本比传统的材料降低了70％，市场前景深远。
以上所述仅是本申请的具体实施方式，应当指出，对于本技术领域的普通 技术人员来说，在不脱离本申请原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本申请的保护范围。

Claims (19)

  1. 一种金属网格单膜双面电容屏功能片，其中，包括一层PET膜和分别镀覆于所述PET膜的两个面上的金属网格，组成所述金属网格的金属线的线宽在1～20μm之间。
  2. 根据权利要求1所述的金属网格单膜双面电容屏功能片，其中，所述PET膜与其两面的所述金属网格之间均形成有氧化铬层。
  3. 根据权利要求1所述的金属网格单膜双面电容屏功能片，其中，所述金属线的线宽在2～8μm之间。
  4. 根据权利要求3所述的金属网格单膜双面电容屏功能片，其中，所述PET膜与其两面的所述金属网格之间均形成有氧化铬层。
  5. 根据权利要求1所述的金属网格单膜双面电容屏功能片，其中，所述金属网格包括多根平行设置的所述金属线，相邻的两根平行的所述金属线之间的间距为150～400μm。
  6. 根据权利要求5所述的金属网格单膜双面电容屏功能片，其中，所述PET膜与其两面的所述金属网格之间均形成有氧化铬层。
  7. 根据权利要求5所述的金属网格单膜双面电容屏功能片，其中，相邻的两根平行的所述金属线之间的间距为150～200μm。
  8. 根据权利要求7所述的金属网格单膜双面电容屏功能片，其中，所述PET膜与其两面的所述金属网格之间均形成有氧化铬层。
  9. 根据权利要求1所述的金属网格单膜双面电容屏功能片，其中，所述金属网格外表面形成有黑化层。
  10. 根据权利要求9所述的金属网格单膜双面电容屏功能片，其中，所述PET膜与其两面的所述金属网格之间均形成有氧化铬层。
  11. 一种金属网格单膜双面电容屏功能片的制作方法，其中，金属网格单膜双面电容屏功能片包括一层PET膜和分别镀覆于所述PET膜的两个面上的金属网格，组成所述金属网格的金属线的线宽在1～20μm之间；制作方法包括：
    提供一层PET膜；
    对所述PET膜老化处理；
    在所述PET膜的两面分别镀一层氧化铬材料；
    在每层所述氧化铬材料的表面镀一层金属材料；
    在每层所述金属材料的表面涂覆光刻胶；
    曝光，使所述光刻胶部分固化形成图案；
    显影，去除所述光刻胶未固化的部分；
    蚀刻，以去除部分金属材料并在所述金属材料上形成与所述光刻胶一致的图案的金属网格。
  12. 根据权利要求11所述的金属网格单膜双面电容屏功能片的制作方法，其中，还包括在所述蚀刻步骤完成后，对所述金属材料的表面黑化处理形成黑化层。
  13. 根据权利要求11所述的金属网格单膜双面电容屏功能片的制作方法，其中，所述曝光步骤、所述显影步骤和所述蚀刻步骤均是分别在所述PET膜的两侧同时进行。
  14. 根据权利要求13所述的金属网格单膜双面电容屏功能片的制作方法，其中，还包括在所述蚀刻步骤完成后，对所述金属材料的表面黑化处理形成黑化层。
  15. 根据权利要求11所述的金属网格单膜双面电容屏功能片的制作方法，其中，所述曝光步骤、所述显影步骤和所述蚀刻步骤均是在涌动的液体中进行。
  16. 根据权利要求15所述的金属网格单膜双面电容屏功能片的制作方法，其中，还包括在所述蚀刻步骤完成后，对所述金属材料的表面黑化处理形成黑化层。
  17. 根据权利要求11所述的金属网格单膜双面电容屏功能片的制作方法，其中，所述金属线的线宽在2～8μm之间。
  18. 根据权利要求11所述的金属网格单膜双面电容屏功能片的制作方法，其中，所述金属网格包括多根平行设置的所述金属线，相邻的两根平行的所述金属线之间的间距为150～400μm。
  19. 根据权利要求18所述的金属网格单膜双面电容屏功能片的制作方法，其中，相邻的两根平行的所述金属线之间的间距为150～200μm。
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