WO2019119329A1 - 曲面触控面板的制造方法 - Google Patents

曲面触控面板的制造方法 Download PDF

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Publication number
WO2019119329A1
WO2019119329A1 PCT/CN2017/117591 CN2017117591W WO2019119329A1 WO 2019119329 A1 WO2019119329 A1 WO 2019119329A1 CN 2017117591 W CN2017117591 W CN 2017117591W WO 2019119329 A1 WO2019119329 A1 WO 2019119329A1
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Prior art keywords
curved
touch
pattern
conductive material
workpiece
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PCT/CN2017/117591
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English (en)
French (fr)
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包春贵
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深圳市柔宇科技有限公司
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Application filed by 深圳市柔宇科技有限公司 filed Critical 深圳市柔宇科技有限公司
Priority to PCT/CN2017/117591 priority Critical patent/WO2019119329A1/zh
Priority to CN201780097432.0A priority patent/CN111433719A/zh
Publication of WO2019119329A1 publication Critical patent/WO2019119329A1/zh

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

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  • the present invention relates to the field of touch technologies, and in particular, to a method for manufacturing a curved touch panel.
  • the current touch device is usually a flat touch device, and the user performs various operations by touching a flat surface.
  • the touch operation requirement has been developed in a three-dimensional direction, and the flat touch device is difficult to meet user requirements.
  • the prepared touch conductor is usually attached to the curved surface.
  • the touch conductor is not easily combined with the curved surface, and wrinkles are easily generated, which affects the use.
  • the embodiment of the invention discloses a method for manufacturing a curved touch panel.
  • a method of manufacturing a curved touch panel comprising the steps of:
  • planar reticle having the pre-patterned pattern is manufactured by designing a touch pattern on a curved surface, and calculating an effect diagram of simulating the touch pattern projected on a plane according to the touch pattern.
  • a planar reticle having a pre-pattern corresponding to the touch pattern is fabricated according to the effect map, and the curved surface is the same as a curved surface of the curved workpiece.
  • exposure development includes the following steps:
  • the curved workpiece includes oppositely disposed touch surfaces and molding surfaces, and the conductive material is formed on the molding surface.
  • planar reticle comprises a substrate and a light shielding layer formed on the substrate, and the light shielding layer has the prefabricated pattern.
  • the light shielding layer includes a plurality of voids, the width of the voids being much larger than the wavelength of light passing through the voids to prevent the light from passing through the plurality of the voids to cause diffraction.
  • the width of the void is 0.05 mm to 0.5 mm.
  • the light shielding layer is made of a rubber material.
  • the conductive material is formed on the curved workpiece by a magnetron sputtering process.
  • the conductive material is made of an exposed conductive material.
  • the method for manufacturing a curved touch panel forms a conductive material on the curved workpiece by means of coating, thereby avoiding the problem of wrinkles of the subsequently formed touch layer; secondly, through a planar mask with a prefabricated pattern, Forming a touch layer corresponding to the pre-patterned pattern on the curved workpiece, the process is simple, avoiding the problem that the touch layer is not easy to fit the curved workpiece, and the performance of the curved touch panel is ensured.
  • FIG. 1 is a flow chart of a method for manufacturing a curved touch panel according to an embodiment of the present invention.
  • Figure 2 is a schematic cross-sectional view of a curved workpiece.
  • FIG. 3 is a schematic cross-sectional view of a conductive material plated on a curved workpiece.
  • FIG. 4 is a schematic cross-sectional view of a photoresist layer coated with a conductive material.
  • Figure 5 is a schematic cross-sectional view of the reticle.
  • FIG. 6 is a schematic cross-sectional view showing the formation of a touch layer on a curved workpiece.
  • Figure 7 is a schematic illustration of a portion of the pre-formed pattern formed on a planar reticle.
  • FIG. 8 is a schematic diagram of a touch pattern formed by a corresponding pre-pattern of the touch layer.
  • FIG. 9 is a cross-sectional view of a curved workpiece according to another embodiment of the present invention.
  • the present invention provides a method for manufacturing a curved touch panel, which includes the following steps:
  • Step 1 referring to Figure 2, provides a curved workpiece 10.
  • the curved workpiece 10 has a substantially hemispherical structure.
  • the curved workpiece 10 includes a touch surface 15 and a molding surface 17 that are oppositely disposed.
  • the curved workpiece 10 may be made of a transparent material such as glass, acrylic, or the like, or may be made of other materials that are opaque.
  • Step 2 referring to FIG. 3, the conductive workpiece 20 is plated on the curved workpiece 10.
  • the conductive material 20 is formed on the molding surface 17.
  • the conductive material 20 is made of an exposed conductive material.
  • the conductive material may be indium tin oxide (ITO), nano silver wire (AgNW), nano copper wire (CuNW) or CNT carbon nano, or the like.
  • the conductive material 20 is formed on the molding surface 17 of the curved workpiece 10 by sputtering a target (not shown) corresponding to the conductive material 20 by a magnetron sputtering process.
  • other curved coating processes may be employed to plate the curved workpiece 10 with a conductive material 20, such as a metal evaporation process.
  • Step 3 referring to FIG. 4, a photoresist layer 30 is coated on the conductive material 20.
  • Step 4 Referring to Figure 5, a planar reticle 40 having a pre-patterned pattern is provided.
  • the planar reticle 40 includes a substrate 41 and a light shielding layer 45 formed on the substrate 41.
  • the substrate 41 includes a photosensitive surface 411 and a light-emitting surface 413 disposed opposite to the photosensitive surface 411.
  • the substrate 41 is made of a light transmissive material such as glass, a flip chip, or the like.
  • the light shielding layer 45 is formed on the light exit surface 413.
  • the light shielding layer 45 has a prefabricated pattern.
  • the light shielding layer 45 is made of a light shielding material.
  • the light shielding layer 45 has a grid shape.
  • the light shielding material 45 is made of a rubber material.
  • the planar reticle having the pre-patterned pattern is manufactured by designing a touch pattern on a curved surface, and calculating an effect of simulating the projection of the touch pattern on a plane according to the touch pattern.
  • a planar reticle 40 having a pre-pattern corresponding to the touch pattern is manufactured, and the curved surface is the same as the curved surface of the curved workpiece 10.
  • the cost of manufacturing a curved mask is relatively high, and the cost of manufacturing a planar mask is relatively low.
  • the present invention obtains planar light by calculating a projection effect of simulating a touch pattern on a curved surface on a plane.
  • the prefabricated pattern of the cover 40 is further fabricated according to the prefabricated pattern, and the planar reticle 40 having the prefabricated pattern is formed. Since the planar reticle 40 is planar, the manufacturing process is mature, so that when a large number of curved touch panels are required to be manufactured Can reduce costs.
  • the light shielding layer 45 includes a plurality of voids 451, and the width of the voids 451 is much larger than the wavelength of light passing through the voids 451 to prevent the light from passing through the plurality of the voids.
  • the width of the void 451 may be 0.005 mm to 10 mm, preferably 0.05 mm to 0.5 mm.
  • the light is parallel light.
  • the light may be a common light such as ultraviolet light. It can be understood that the width of the void 451 may be greater than 0.5 mm, and the width of the void 451 may be less than 0.05 mm, and the width of the void 451 may prevent the light from passing through the plurality of the voids to cause diffraction.
  • Step 5 referring to FIG. 6, the curved workpiece 10 is exposed and developed by the planar reticle 40, thereby forming a touch layer 50 made of the conductive material on the curved workpiece 10.
  • the touch layer 50 has a touch pattern corresponding to the pre-made pattern.
  • the exposure can be performed in two or more times. It can also be realized by using a plurality of masks for exposure according to the touch pattern to be finally formed.
  • the conductive layer 20 formed on the curved workpiece 10 is exposed and developed by using the planar reticle 40, thereby obtaining the touch layer 50 made of the conductive material 20.
  • FIG. 7 is a schematic diagram of a portion of the pre-pattern 60 formed on the planar reticle 70.
  • the pattern of the planar reticle 40 is a pre-pattern 60
  • the touch layer 50 is formed on the curved workpiece 10 by illuminating the planar reticle 40 having the pre-pattern 60, see FIG.
  • the touch pattern 70 approximates a regular pattern.
  • step of step 5 that is, the step of forming the touch layer made of the conductive material 20 on the curved workpiece 10 by irradiating the planar reticle 40 by light
  • step of step 5 that is, the step of forming the touch layer made of the conductive material 20 on the curved workpiece 10 by irradiating the planar reticle 40 by light
  • step 501 the planar reticle 40 and the curved workpiece 10 are placed in an exposure machine for exposure processing.
  • the light in the exposure machine is incident on the substrate 41 through the photosensitive surface 411, and is emitted from the light-emitting surface 413 onto the photoresist layer 30.
  • the photoresist layer 30 is chemically reacted by a portion irradiated with light passing through the void 451.
  • part of the photoresist layer 30 blocked by the light shielding layer 45 does not undergo a chemical reaction because it is not irradiated with light.
  • Step 502 patterning the photoresist layer 30.
  • the exposed curved surface workpiece 10 is placed in a developing solution for development, so that a pattern imaged on the photoresist layer 30 is visualized, and a portion of the photoresist resisted by the photoresist layer 30 is removed.
  • Step 503 the conductive material 20 is patterned, and the touch layer 50 made of the conductive material 20 is formed on the curved workpiece 10.
  • the conductive material 20 is etched by an etchant to remove portions of the conductive material 20 that are not covered by the remaining photoresist layer 30.
  • Step 504 developing and removing the photoresist layer 30 remaining on the touch layer 50.
  • a curved workpiece 90 provided in an embodiment, the curved workpiece 90 comprising a plurality of curved structures 91.
  • the curvature of at least two of the plurality of curved structures 91 is different.
  • Each of the curved structures 91 includes a sub-touch surface 913 and a sub-molding surface 915 that are oppositely disposed.
  • the sub-touch surfaces 913 of the plurality of curved structures 91 are connected to form a touch surface 93, and the sub-molding surfaces 915 of the plurality of curved structures 91 are connected to form a molding surface 95.
  • the curved workpiece 90 is plated with a conductive material; a photoresist layer is coated on the conductive material; a planar mask having a pre-patterned pattern is provided; and the curved workpiece is exposed by the planar mask Developing, thereby forming a touch layer made of the conductive material on the curved workpiece 90, the touch layer having a touch pattern corresponding to the pre-pattern. Since the conductive material is formed on the curved surface workpiece 90 of the multi-curved surface directly by means of coating, the subsequent formation of the touch layer is easy to wrinkle and easy to be detached.
  • the method for manufacturing a curved touch panel forms a conductive material 20 on the curved workpiece 10 by means of coating, and secondly, a planar mask 40 having a pre-patterned pattern is formed on the curved workpiece 10
  • the touch layer 50 corresponding to the prefabricated pattern has a simple process and a low cost, and avoids the problem that the touch layer is not easy to fit the curved workpiece 10, and the performance of the curved touch panel is ensured.
  • the touch layer is formed directly by the coating method and the reticle, the cumbersome process of splicing the prepared touch electrodes to the curved workpiece in the prior art is avoided.

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  • General Engineering & Computer Science (AREA)
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Abstract

一种曲面触控面板的制造方法,其包括以下步骤:提供一曲面工件(10);在所述曲面工件(10)上镀覆导电材料(20);于所述导电材料(20)上涂覆光阻层(30);提供具有预制图案的平面光罩(40);利用所述平面光罩(40)对所述曲面工件(10)进行曝光并显影,从而在曲面工件(10)上形成由所述导电材料(20)制成的触控层(50),所述触控层(50)具有对应于所述预制图案的触控图案(70)。通过镀膜的方式于所述曲面工件(10)上形成导电材料(20),避免后续形成的触控层(50)发生褶皱的问题;通过具有预制图案的平面光罩(40),于所述曲面工件(10)上形成与所述预制图案对应图案的触控层(50),制程简单,避免所述触控层(50)不易贴合所述曲面工件(10)的问题且所述曲面触控面板的性能得到保证。

Description

曲面触控面板的制造方法 技术领域
本发明涉及一种触控技术领域,特别涉及一种曲面触控面板的制造方法。
背景技术
目前的触控装置通常为平面触控装置,用户通过触摸平坦表面进行各种操作,然而,触控操作需求已经向着立体化的方向发展,平面触控装置难以满足用户需求。目前,对于曲面触控面板,通常将制备好的触控导体贴设于曲面上,然而,对于不规则的曲面,所述触控导体不易与所述曲面结合,且容易产生褶皱,影响使用。
发明内容
为解决上述问题,本发明实施例公开一种曲面触控面板制造方法。
一种曲面触控面板的制造方法,其包括以下步骤:
提供一曲面工件;
在所述曲面工件上镀覆导电材料;
于所述导电材料上涂覆光阻层;
提供具有预制图案的平面光罩;
利用所述平面光罩对所述曲面工件进行曝光并显影,从而在所述曲面工件上形成由所述导电材料制成的触控层,所述触控层具有对应于所述预制图案的触控图案。
进一步地,所述具有预制图案的平面光罩是如下方式制造的:在一曲面上设计触控图案,依据所述触控图案,计算模拟所述触控图案投影于一平面时的效果图,根据该效果图制造具有对应所述触控图案的预制图案的平面光罩,并且所述曲面与所述曲面工件的曲面相同。
进一步地,曝光显影包括以下步骤:
将所述平面光罩与所述曲面工件放置于曝光机中进行曝光处理;
图形化所述光阻层;
图形化所述导电材料,进而于所述曲面工件上形成由所述导电材料制成的所述触控层;及
显影去除所述触控层上剩余的所述光阻层。
进一步地,所述曲面工件包括相对设置的触控面及成型面,所述导电材料形成于所述成型面上。
进一步地,所述平面光罩包括基板及形成于所述基板上的遮光层,所述遮光层具所述预制图案。
进一步地,所述遮光层包括多个空隙,所述空隙的宽度远大于穿过所述空隙的光的波长,以避免所述光穿过多个所述空隙时发生干涉及衍射。
进一步地,所述空隙的宽度为0.05mm~0.5mm。
进一步地,所述遮光层为橡胶材料制成。
进一步地,在所述曲面工件上镀覆导电材料的步骤中,通过磁控溅射工艺在所述曲面工件上形成所述导电材料。
进一步地,所述导电材料由曝光型导电材料制成。
本发明提供的曲面触控面板的制造方法,其通过镀膜的方式于所述曲面工件上形成导电材料,避免后续形成的触控层发生褶皱的问题;其次,通过具预制图案的平面光罩,于所述曲面工件上形成与所述预制图案对应图案的触控层,制程简单,避免所述触控层不易贴合所述曲面工件的问题且所述曲面触控面板的性能得到保证。
附图说明
为了更清楚地说明本发明实施例中的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的曲面触控面板的制造方法流程图。
图2为曲面工件的剖面示意图。
图3为在曲面工件上镀覆导电材料的剖面示意图。
图4为在导电材料涂覆光阻层的剖面示意图。
图5为光罩的剖面示意图。
图6为曲面工件上形成触控层的剖面示意图。
图7为平面光罩上形成的部分预制图案的示意图。
图8为触控层的对应预制图案而形成的触控图案的示意图。
图9为本发明另一实施例提供的曲面工件的剖面示意图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
请参阅图1,本发明提供一种曲面触控面板的制造方法,其包括以下步骤:
步骤1,请参阅图2,提供一曲面工件10。
本实施方式中,所述曲面工件10大致呈半球面结构。所述曲面工件10包括相对设置的触控面15及成型面17。所述曲面工件10可以是由玻璃、亚克力等透明材料制成,也可以由不透明的其他材料制成。
步骤2,请参阅图3,在所述曲面工件10上镀覆导电材料20。
所述导电材料20形成于所述成型面17。所述导电材料20由曝光型导电材料制成。所述导电材料可以是氧化铟锡(ITO)、纳米银线(AgNW)、纳米铜线(CuNW)或CNT碳纳等。本实施方式中,通过磁控溅射工艺,溅射与所述导电材料20对应的靶材(图未示)而在所述曲面工件10的成型面17上形成所述导电材料20。在一些实施例中,可以采取其它镀膜工艺于所述曲面工件10上镀覆导电材料20,例如金属蒸镀工艺。
步骤3,请参阅图4,于所述导电材料20上涂覆光阻层30。
步骤4,请参阅图5,提供具预制图案的平面光罩40。
所述平面光罩40包括基板41及形成于所述基板41上的遮光层45。所述基板41包括感光面411及与所述感光面411相对设置的出光面413。
所述基板41由透光材料制成,所述透光材料例如为玻璃、覆晶薄膜等。所述遮光层45形成于所述出光面413上。所述遮光层45具预制图案。所述遮光层45由遮光材料制成。所述遮光层45呈网格状。本实施方式中,所述遮光材料45由橡胶材料制成。
在步骤4中,所述具有预制图案的平面光罩是如下方式制造的:在一曲面上设计触控图案,依据所述触控图案,计算模拟所述触控图案投影于一平面时的效果图,根据所述效果图制造具有对应所述触控图案的预制图案的平面光罩40,所述曲面与所述曲面工件10的曲面相同。
在现有技术中,制造曲面光罩的成本较高,而制造平面光罩的成本相对较低,本发明通过计算模拟在曲面上的触控图案于一平面上的投影效果,从而获得平面光罩40的预制图案,再依据所述预制图案制造具所述预制图案的所述平面光罩40,由于所述平面光罩40为平面,制造工艺成熟,如此在需大量制造曲面触控面板时能够降低成本。
进一步地,所述遮光层45包括多个空隙451,所述空隙451的宽度远大于穿过所述空隙451的光的波长,以避免所述光穿过多个所述空隙时发生干涉及衍射。本实施方式中,所述空隙451的宽度可以为0.005mm~10mm,优选为0.05mm~0.5mm。所述光为平行光。所述光可以为紫外光等常用光。可以理解,所述空隙451的宽度可以大于0.5mm,所述空隙451的宽度可以小于0.05mm,所述空隙451的宽度避免所述光穿过多个所述空隙时发生干涉及衍射即可。
步骤5,请参阅图6,利用所述平面光罩40对所述曲面工件10进行曝光并显影,从而在所述曲面工件10上形成由所述导电材料制成的触控层50,所述触控层50具对应所述预制图案的触控图案。所述曝光可以分两次或者多次进行。也可以根据最终要形成的触控图案,使用多个光罩进行曝光来实现。
通过利用所述平面光罩40对所述曲面工件10上形成的导电材料20进行曝光显影,从而获得由所述导电材料20制成的触控层50。
进一步地,请参阅图7,为所述平面光罩70上形成的部分预制图案60的 示意图。换句话说,即平面光罩40的图案为预制图案60,通过光照射具所述预制图案60的平面光罩40,在所述曲面工件10上形成所述触控层50,请参阅图8,为所述触控层50的对应所述预制图案60而形成的触控图案70的示意图。所述触控图案70近似规则图案。
其中,在步骤5中,即通过光照射所述平面光罩40,使所述曲面工件10上形成由所述导电材料20制成的触控层的步骤中,请参阅9,具体包括以下步骤:
步骤501,将所述平面光罩40与所述曲面工件10放置于曝光机中进行曝光处理。
所述曝光机中的光经所述感光面411射入所述基板41,并从所述出光面413射出至所述光阻层30上。所述光阻层30被穿过所述空隙451的光照射的部分发生化学反应。而被所述遮光层45遮挡的部分所述光阻层30由于未被光照射而不发生化学反应。
步骤502,图形化所述光阻层30。
具体的,将曝光后的曲面工件10放入显影液中进行显影,使成像在所述光阻层30上的图形被显现出来,且去除所述光阻层30被曝光的部分光阻。
步骤503,图形化所述导电材料20,进而于所述曲面工件10上形成由所述导电材料20制成的所述触控层50。
通过蚀刻液蚀刻所述导电材料20,进而去除所述导电材料20未被剩余的光阻层30覆盖的部分。
步骤504,显影去除所述触控层50上剩余的所述光阻层30。
请参阅9,在一实施例中提供的曲面工件90,曲面工件90包括多个曲面结构91。所述多个曲面结构91中的至少两个曲面结构91的曲率不相同。每个曲面结构91包括相对设置的子触控面913及子成型面915。多个曲面结构91的子触控面913连接形成一个触控面93,多个曲面结构91的子成型面915连接形成一个成型面95。在一曲面上设计触控图案,然后计算模拟所述触控图案于曲面上的投影效果得到一预制图案,所述曲面与所述曲面工件90的曲面结构相同;依据所述预制图案,制造所述平面光罩。制造时,在所述曲面工件90上镀覆导电材料;于所述导电材料上涂覆光阻层;提供具有预制图案的 平面光罩;利用所述平面光罩对所述曲面工件进行曝光并显影,从而在所述曲面工件90上形成由所述导电材料制成的触控层,所述触控层具对应所述预制图案的触控图案。由于直接通过镀膜的方式将所述导电材料形成于多曲面的所述曲面工件90上,避免了后续形成的触控层容易起褶皱,以及易脱离等问题。
本发明提供的曲面触控面板的制造方法,其通过镀膜的方式于所述曲面工件10上形成导电材料20,其次,通过具预制图案的平面光罩40,于所述曲面工件10上形成与所述预制图案对应的触控层50,制程简单,成本较低,避免所述触控层不易贴合所述曲面工件10的问题,且所述曲面触控面板的性能得到保证。对于包括至少两个曲面结构的曲面工件,由于直接通过镀膜的方式及光罩形成触控层,避免了现有技术中通过多段制备好的触控电极拼接于曲面工件的繁琐制程。
以上所述是本发明的优选实施例,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也视为本发明的保护范围。

Claims (10)

  1. 一种曲面触控面板的制造方法,其包括以下步骤:
    提供一曲面工件;
    在所述曲面工件上镀覆导电材料;
    于所述导电材料上涂覆光阻层;
    提供具有预制图案的平面光罩;
    利用所述平面光罩对所述曲面工件进行曝光并显影,从而在所述曲面工件上形成由所述导电材料制成的触控层,所述触控层具对应所述预制图案的触控图案。
  2. 如权利要求1所述的曲面触控面板的制造方法,其特征在于,所述具有预制图案的平面光罩是如下方式制造的:在一曲面上设计所述触控图案,依据所述触控图案,计算模拟所述触控图案投影于一平面时的效果图,根据所述效果图制造具有对应所述触控图案的预制图案的平面光罩,并且所述曲面与所述曲面工件的曲面相同。
  3. 如权利要求1所述的曲面触控面板的制造方法,其特征在于,所述利用所述平面光罩对所述曲面工件进行曝光并显影包括以下步骤:
    将所述平面光罩与所述曲面工件放置于曝光机中进行曝光处理;
    图形化所述光阻层;
    图形化所述导电材料,进而于所述曲面工件上形成由所述导电材料制成的所述触控层;及
    显影去除所述触控层上剩余的所述光阻层。
  4. 如权利要求1所述的曲面触控面板的制造方法,其特征在于,所述曲面工件包括相对设置的触控面及成型面,所述导电材料形成于所述成型面上。
  5. 如权利要求1所述的曲面触控面板的制造方法,其特征在于,所述平面光罩包括基板及形成于所述基板上的遮光层,所述遮光层具所述预制图案。
  6. 如权利要求5所述的曲面触控面板的制造方法,其特征在于,所述遮光层包括多个空隙,所述空隙的宽度远大于穿过所述空隙的光的波长,以避免所述光穿过多个所述空隙时发生干涉及衍射。
  7. 如权利要求6所述的曲面触控面板的制造方法,其特征在于,所述空隙的宽度为0.05mm~0.5mm。
  8. 如权利要求5所述的曲面触控面板的制造方法,其特征在于,所述遮光层为橡胶材料制成。
  9. 如权利要求1所述的曲面触控面板的制造方法,其特征在于,在所述曲面工件上镀覆导电材料的步骤中,通过磁控溅射工艺在所述曲面工件上形成所述导电材料。
  10. 如权利要求1所述的曲面触控面板的制造方法,其特征在于,所述导电材料由曝光型导电材料制成。
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