WO2016112636A1 - 掩模板及其制备方法和显示面板中封框胶的固化方法 - Google Patents

掩模板及其制备方法和显示面板中封框胶的固化方法 Download PDF

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Publication number
WO2016112636A1
WO2016112636A1 PCT/CN2015/081525 CN2015081525W WO2016112636A1 WO 2016112636 A1 WO2016112636 A1 WO 2016112636A1 CN 2015081525 W CN2015081525 W CN 2015081525W WO 2016112636 A1 WO2016112636 A1 WO 2016112636A1
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WIPO (PCT)
Prior art keywords
mask
photosensitive resin
alignment mark
display panel
transparent substrate
Prior art date
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Ceased
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PCT/CN2015/081525
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English (en)
French (fr)
Inventor
张治超
郭总杰
刘正
张小祥
陈曦
刘明悬
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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Publication of WO2016112636A1 publication Critical patent/WO2016112636A1/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a mask, a method for fabricating the same, and a method for curing a frame sealant in a display panel.
  • the production process of the liquid crystal display panel is roughly as follows: firstly, the liquid crystal and the sealant are instilled at appropriate positions on the array substrate or the color filter substrate, and then the two substrates are paired, and then the sealant is cured.
  • the function of the sealant is to bond the array substrate and the color filter substrate, and to seal the liquid crystal between the two substrates from external air and water.
  • the sealant is usually cured by ultraviolet curing. Accordingly, the sealant is a UV-curable frame sealant, and a corresponding mask is needed in the process of performing ultraviolet curing.
  • the transparent substrate of the reticle is provided with at least one alignment mark for matching the corresponding alignment pattern in the display panel to achieve alignment of the reticle and the display panel.
  • the alignment mark is made of a metal material. Therefore, at least the metal material thin film deposition process, the photoresist coating process, the exposure (mask) process, the development process, and the engraving are required in preparing the alignment mark. Etching process and photoresist stripping process.
  • the prior art requires a large number of processes in preparing the alignment mark in the mask required for the ultraviolet curing process.
  • the invention provides a mask plate, a preparation method thereof and a curing method of the sealant in the display panel, which can effectively simplify the number of processes required in preparing the alignment mark in the mask.
  • the present invention provides a mask comprising: a transparent substrate and an alignment mark on the transparent substrate, the alignment mark for using the mask and the display panel to be subjected to ultraviolet curing treatment
  • the mask is characterized in that the alignment mark is composed of a photosensitive resin.
  • the photosensitive resin has a light transmittance of less than or equal to 80%.
  • the alignment mark is located in a peripheral area of the transparent substrate.
  • the mask further includes: a plurality of light shielding patterns disposed on the transparent substrate and respectively corresponding to the plurality of display areas on the display panel, wherein the light shielding patterns are formed of a light shielding material.
  • the light shielding material is a metal material.
  • the light shielding pattern is located at an intermediate portion of the transparent substrate.
  • the present invention also provides a method for preparing a mask, the preparation method comprising:
  • An alignment mark is formed on the transparent substrate for aligning the mask to a display panel to be subjected to ultraviolet curing, wherein the alignment mark is composed of a photosensitive resin.
  • the step of forming a registration mark on the transparent substrate comprises:
  • the photosensitive resin film after the exposure treatment is subjected to development processing to obtain a pattern of the alignment mark.
  • the photosensitive resin film may be a photo-crosslinking type photosensitive resin film, a photo-decomposable photosensitive resin film, or a photopolymerizable photosensitive resin film.
  • the preparation method further includes:
  • a plurality of light shielding patterns respectively corresponding to the plurality of display regions on the display panel are formed on the transparent substrate, and the light shielding patterns are formed of a light shielding material.
  • the light shielding material is a metal material.
  • the present invention also provides a method for curing a sealant in a display panel, which is characterized in that the above-mentioned mask is used as a mask for performing ultraviolet curing treatment on the sealant.
  • the invention provides a mask, a preparation method thereof and a method for curing a sealant in a display panel, wherein the mask is used as a mask for performing ultraviolet curing treatment on the sealant in the display panel, and the mask comprises:
  • the transparent substrate and the alignment mark on the transparent substrate are used for aligning the mask with the display panel to be subjected to ultraviolet curing, and the alignment mark is composed of a photosensitive resin.
  • the technical solution of the present invention sets the material of the alignment mark in the mask to a sense a photo-resin, so that when the alignment mark composed of the photosensitive resin is prepared, it is only necessary to perform a photosensitive resin film coating process (which can be equivalent to a photoresist coating process), an exposure process, and a development process to complete the alignment mark.
  • the technical solution of the present invention can be The metal material deposition process, the etching process, and the photoresist stripping process are omitted, that is, the technical solution of the present invention can reduce the number of processes required in the process of preparing the alignment mark, simplify the process flow for manufacturing the mask, and save cost.
  • Embodiment 1 is a top plan view of a mask provided in Embodiment 1 of the present invention.
  • FIG. 2 is a schematic view of the mask plate shown in FIG. 1 in alignment with a display panel to be subjected to ultraviolet curing treatment;
  • 3 is a schematic diagram of matching the alignment mark in the mask to the alignment image in the display panel
  • FIG. 4 is a flowchart of a method for preparing a mask according to Embodiment 2 of the present invention.
  • FIG. 5 is a flowchart of still another method for preparing a mask according to Embodiment 2 of the present invention.
  • FIG. 1 is a plan view of a mask provided in Embodiment 1 of the present invention
  • FIG. 2 is a schematic view of the mask shown in FIG. 1 aligned with a display panel to be subjected to ultraviolet curing
  • FIG. 3 is a alignment in the mask.
  • the mask 4 is used as a mask for performing ultraviolet curing treatment on the sealant 5 in the display panel 8.
  • the mask 4 includes: a transparent substrate 1 and an alignment mark 2 on the transparent substrate 1.
  • the alignment mark 2 is used for aligning the mask 4 with the display panel 8 to be subjected to ultraviolet curing, and the alignment mark 2 is Made of photosensitive resin.
  • the photosensitive resin can directly undergo photocrosslinking reaction, photodecomposition reaction, or photopolymerization reaction with light
  • the photosensitive resin itself can be used as a photoresist in a patterning process.
  • the alignment process can be completed only by the photosensitive resin film coating process (which can be equivalent to the photoresist coating process), the exposure process, and the development process. Preparation of marker 2. Therefore, at least the metal material thin film deposition process, the photoresist coating process, the exposure process, the development process, the etching process, and the light are required in the alignment process in the mask required for preparing the ultraviolet curing process in the prior art.
  • the metal material thin film deposition process, the etching process, and the photoresist stripping process can be omitted. Therefore, the technical solution provided by the embodiment can reduce the number of processes required in the process of preparing the alignment mark 2, simplify the process flow for manufacturing the mask, and save cost.
  • the light transmittance of the photosensitive resin in the embodiment is less than or equal to 80%, thereby ensuring that the alignment mark 2 in the mask 4 can be easily and clearly observed by the manufacturer, thereby ensuring fast and accurate The mask 4 is aligned with the display panel 8.
  • the alignment mark 2 is disposed on a peripheral area of the transparent substrate 1 and corresponds to a position of the alignment pattern 6 disposed on the display panel 8, thereby facilitating the alignment mark 2 and the display panel in the mask 4.
  • the alignment pattern 6 in 8 is matched. More specifically, referring to the example shown in FIG. 3, the alignment mark 2 in the reticle 4 is a square shape, and the alignment pattern 6 in the display panel 8 is circular when the center of the square-shaped alignment mark 2 is presented. When the dot coincides with the center point of the alignment pattern 6 in which the circle is present, it means that the matching of the alignment mark 2 and the alignment pattern 6 is completed, and accordingly, the alignment of the mask 4 and the display panel 8 is completed.
  • the alignment mark 2 in the mask 4 is a square shape and the alignment pattern 6 in the display panel 8 is circular is only exemplary, and is not intended to limit the technical solution of the present application.
  • the alignment mark 2 and the alignment pattern 6 in this embodiment may also be other suitable shapes, which are not enumerated here.
  • the mask 4 of the present embodiment further includes a plurality of light shielding patterns 3 disposed on the transparent substrate 1 and corresponding to the plurality of display regions 7 on the display panel 8, respectively.
  • the light-shielding pattern 3 described in this embodiment is a rectangular light-shielding pattern located at an intermediate portion of the transparent substrate 1, and the rectangular light-shielding pattern 3 is composed of a light-shielding material.
  • the light shielding pattern 3 is used to block ultraviolet light that is incident on the corresponding display region 7 of the display panel 8 during the ultraviolet curing process, thereby preventing the ultraviolet light from causing damage to the internal components of the display region 7. For this reason, the light-shielding pattern 3 must strictly ensure opacity.
  • the light shielding material constituting the light shielding pattern 3 The material is specifically a metal material, so that the light-shielding pattern 3 is effectively opaque.
  • a method for preparing a mask is also provided for preparing the mask in the first embodiment.
  • 4 is a flowchart of a method for preparing a mask according to Embodiment 2 of the present invention. As shown in FIG. 4, the method for preparing the mask includes:
  • Step S1 forming a registration mark composed of a photosensitive resin on the transparent substrate, the alignment mark being used for aligning the mask to the display panel to be subjected to ultraviolet curing.
  • step S1 the following steps are specifically included as shown in FIG. 5:
  • Step S11 forming a photosensitive resin film on the transparent substrate
  • Step S12 performing exposure processing on the photosensitive resin film by using a corresponding mask substrate
  • Step S13 developing the photosensitive resin film after the exposure processing to obtain a pattern of the alignment mark.
  • the photosensitive resin film may be a photo-crosslinking type photosensitive resin film, a photo-decomposable photosensitive resin film, or a photopolymerizable photosensitive resin film.
  • the above steps S11 to S13 may specifically correspond to the following steps 101 to 103.
  • Step 101 Forming a photocrosslinkable photosensitive resin film on a transparent substrate.
  • a coating method may be employed to form a photo-crosslinking type photosensitive resin film on a transparent substrate.
  • Step 102 performing exposure processing on the photo-crosslinking type photosensitive resin film by using the first mask substrate, the first mask substrate including the first light-shielding region and the first light-transmitting region, wherein the first light-transmitting region and the light-crosslinking type photosensitive A region of the resin film on which the alignment mark is to be formed corresponds.
  • step 102 the photo-crosslinking type photosensitive resin film is exposed to light by using an exposure device and a first mask substrate. At this time, the area of the photo-crosslinked photosensitive resin film to be formed with the alignment mark is irradiated with light, and light is generated. The reaction is carried out so as to have corrosion resistance on the photocrosslinking type photosensitive resin film corresponding to the region where the alignment mark is to be formed.
  • Step 103 Developing the photocrosslinked photosensitive resin film after the exposure treatment to obtain a pattern of the alignment mark.
  • step 103 the exposed photocrosslinking type photosensitive resin film is subjected to development treatment by a corresponding developer, and at this time, the area corresponding to the alignment mark to be formed on the photocrosslinking type photosensitive resin film is retained, and the other The area is removed, ie the alignment mark is formed.
  • the process of forming the alignment mark composed of the photopolymerizable photosensitive resin is similar to the above process of forming the alignment mark composed of the photocrosslinkable photosensitive resin, and the specific procedure can be referred to the above steps.
  • the description of 101 to 103 is not repeated here.
  • the above steps S11 to S13 may specifically correspond to the following steps 201 to 203.
  • Step 201 Forming a photo-decomposable photosensitive resin film on a transparent substrate.
  • a coating method may be employed to form a photo-decomposable photosensitive resin film on a transparent substrate.
  • Step 202 performing exposure processing on the photo-decomposable photosensitive resin film by using a second mask substrate, the second mask substrate including a second light-shielding region and a second light-transmitting region, wherein the second light-shielding region and the photo-decomposable photosensitive resin film Corresponding to the area where the alignment mark is to be formed.
  • step 202 the photo-decomposable photosensitive resin film is exposed to light by the exposure device and the second mask substrate. At this time, the region on the photo-decomposable photosensitive resin film to be formed with the alignment mark is not irradiated with light, and the photo-decomposable photosensitive resin Other regions on the film are irradiated with light and undergo a photodecomposition reaction, so that other regions on the photo-decomposable photosensitive resin film are soluble.
  • Step 203 Developing a photo-degradable photosensitive resin film after the exposure processing to obtain a pattern of alignment marks.
  • step 203 the photo-degradable photosensitive resin film after the exposure treatment is subjected to development processing by a corresponding developer, and at this time, the area on the photo-decomposable photosensitive resin film corresponding to the alignment mark to be formed is retained, and other regions are retained. Remove, that is, form a registration mark.
  • the technical solution of the embodiment can omit the metal material deposition process, the etching process, and the photoresist stripping process, that is, the technical solution provided by the embodiment can make the preparation of the alignment mark required.
  • the number of processes is reduced, simplifying the process of making the mask and saving costs.
  • the method for preparing the mask according to the second embodiment of the present invention further includes: after step S1:
  • Step S2 forming a plurality of light shielding patterns respectively corresponding to the plurality of display regions on the display panel on the transparent substrate, the light shielding patterns being composed of a light shielding material.
  • Preferred shading materials include metals material.
  • a corresponding light-shielding pattern 3 can be obtained through a metal material thin film deposition process, a photoresist coating process, an exposure (mask) process, a development process, an etching process, and a photoresist strip process.
  • step S2 may also be performed before step S1, and details are not described herein.
  • the third embodiment of the present invention further provides a method for curing a sealant in a display panel.
  • the mask provided in the first embodiment is used as a mask for performing ultraviolet curing on the sealant.

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Abstract

一种掩模板及其制备方法和显示面板中封框胶的固化方法。所述掩模板（4）包括：透明基板（1）和位于透明基板上的对位标识（2），对位标识（2）用于将掩模板（4）与将要进行紫外固化处理的显示面板（8）进行对位，其中对位标识（2）由感光树脂构成。通过利用由感光树脂构成掩模板（4）中的对位标识（2），在制备该由感光树脂构成的对位标识（2）时，相比现有技术，可减少工序数量，简化制作掩模板的工艺流程，节省成本。

Description

掩模板及其制备方法和显示面板中封框胶的固化方法 技术领域
本发明涉及显示技术领域，特别涉及掩模板及其制备方法和显示面板中封框胶的固化方法。
背景技术
液晶显示面板的生产过程大致如下：首先在阵列基板或者彩膜基板的适当位置上滴注液晶和封框胶，然后将两基板进行对盒，再对封框胶进行固化。其中，封框胶的作用是粘接阵列基板和彩膜基板，并起到密封作用以保护两基板之间的液晶不受外界空气和水的影响。
目前，通常采用紫外固化的方式对封框胶进行固化，相应地，所述封框胶为紫外固化型封框胶，在进行紫外固化处理的过程中需要用到相应的掩模板，其中在该掩模板的透明基板上设置有至少一个对位标识，该对位标识用于与显示面板中相应的对位图形进行匹配，以实现掩模板与显示面板的对位。在现有技术中，该对位标识用金属材料构成，因此在制备该对位标识时至少需要经过金属材料薄膜沉积工序、光刻胶涂覆工序、曝光(掩模)工序、显影工序、刻蚀工序以及光刻胶剥离工序。
由上述内容可见，现有技术在制备该紫外固化处理所需的掩模板中的对位标识时需要经过繁多的工序。
发明内容
本发明提供一种掩模板及其制备方法和显示面板中封框胶的固化方法，可有效地简化在制备掩模板中的对位标识时所需要的工序数量。
为实现上述目的，本发明提供一种掩模板，包括：透明基板和位于所述透明基板上的对位标识，所述对位标识用于将所述掩模板与将要进行紫外固化处理的显示面板进行对位，所述掩模板的特征在于，所述对位标识由感光树脂构成。
可选地，所述感光树脂的光透过率小于或等于80％。
可选地，所述对位标识位于所述透明基板的周边区域。
可选地，所述掩模板还包括：设置于所述透明基板上且分别与所述显示面板上的多个显示区域对应的多个遮光图形，所述遮光图形由遮光材料构成。
可选地，所述遮光材料为金属材料。
可选地，所述遮光图形位于所述透明基板的中间区域。
为实现上述目的，本发明还提供一种掩模板的制备方法，所述制备方法包括：
在透明基板上形成对位标识，所述对位标识用于将所述掩模板与将要进行紫外固化处理的显示面板进行对位，其中所述对位标识由感光树脂构成。
可选地，所述在透明基板上形成对位标识的步骤包括：
在所述透明基板上形成感光树脂薄膜；
利用相应的掩模基板对所述感光树脂薄膜进行曝光处理；
对曝光处理后的所述感光树脂薄膜进行显影处理，以得到所述对位标识的图形。
可选地，所述感光树脂薄膜可以为光交联型感光树脂薄膜、光分解型感光树脂薄膜、或者光聚合型感光树脂薄膜。
可选地，所述制备方法还包括：
在所述透明基板上形成分别与所述显示面板上的多个显示区域对应的多个遮光图形，所述遮光图形由遮光材料构成。
可选地，所述遮光材料为金属材料。
为实现上述目的，本发明还提供一种显示面板中封框胶的固化方法，其特征在于，采用上述的掩模板作为对所述封框胶进行紫外固化处理时的掩模。
本发明具有以下有益效果：
本发明提供了一种掩模板及其制备方法和显示面板中封框胶的固化方法，其中该掩模板用作对显示面板中的封框胶进行紫外固化处理时的掩模，该掩模板包括：透明基板和位于透明基板上的对位标识，对位标识用于将掩模板与将要进行紫外固化处理的显示面板进行对位，对位标识由感光树脂构成。本发明的技术方案通过将掩模板中对位标识的材料设置为感 光树脂，从而在制备该由感光树脂构成的对位标识时，仅需执行感光树脂薄膜涂覆工序(可等效于光刻胶涂覆工序)、曝光工序和显影工序即可完成对位标识的制备。与现有技术中制备对位标识时至少需要经过金属材料薄膜沉积工序、光刻胶涂覆工序、曝光工序、显影工序、刻蚀工序以及光刻胶剥离工序相比，本发明的技术方案可省去金属材料沉积工序、刻蚀工序和光刻胶剥离工序，即本发明技术方案可使得制备对位标识过程中所需要的工序数量减少，简化制作掩模板的工艺流程，节省成本。
附图说明
图1为本发明实施例一提供的掩模板的俯视图；
图2为图1所示的掩模板与将要进行紫外固化处理的显示面板进行对位时的示意图；
图3为掩模板中的对位标识与显示面板中的对位图像进行匹配的示意图；
图4为本发明实施例二提供的一种掩模板的制备方法的流程图；
图5为本发明实施例二提供的又一种掩模板的制备方法的流程图。
具体实施方式
为使本领域的技术人员更好地理解本发明的技术方案，下面结合附图对本发明提供的掩模板及其制备方法和显示面板中封框胶的固化方法进行详细描述。
图1为本发明实施例一提供的掩模板的俯视图，图2为图1所示的掩模板与将要进行紫外固化处理的显示面板进行对位时的示意图，图3为掩模板中的对位标识与显示面板中的对位图像进行匹配的示意图。如图1至图3所示，掩模板4用作对显示面板8中的封框胶5进行紫外固化处理时的掩模。该掩模板4包括：透明基板1和位于透明基板1上的对位标识2，对位标识2用于将掩模板4与将要进行紫外固化处理的显示面板8进行对位，对位标识2由感光树脂构成。
需要说明的是，由于感光树脂可直接与光进行光交联反应、光分解反应、或光聚合反应，因此感光树脂本身可用作构图工艺中的光刻胶。在 本实施例中，在制备由感光树脂构成的对位标识2时，仅需经过感光树脂薄膜涂覆工序(可等效于光刻胶涂覆工序)、曝光工序和显影工序即可完成对位标识2的制备。因此，与现有技术中制备紫外固化处理所需的掩模板中的对位标识过程中至少需要经过金属材料薄膜沉积工序、光刻胶涂覆工序、曝光工序、显影工序、刻蚀工序以及光刻胶剥离工序相比，在制备本实施例提供的掩模板4中的对位标识2过程中，可省去金属材料薄膜沉积工序、刻蚀工序和光刻胶剥离工序。因此，本实施例提供的技术方案可使得制备对位标识2过程中所需要的工序数量减少，简化制作掩模板的工艺流程，节省成本。
可选地，本实施例中感光树脂的光透过率小于或等于80％，由此可保证生产人员能容易且清楚地观察到掩模板4中的对位标识2，从而可确保快速且准确地将掩模板4与显示面板8进行对位。
可选地，该对位标识2设置于透明基板1的周边区域，并与设置于显示面板8上的对位图案6的位置相对应，从而便于掩模板4中的对位标识2与显示面板8中的对位图案6进行匹配。更具体地，参见图3所示示例，掩模板4中的对位标识2为方框形，显示面板8中的对位图案6为圆形，当呈现方框形的对位标识2的中心点与呈现圆形的对位图案6的中心点重合时，即说明对位标识2与对位图案6匹配完成，相应地，掩模板4与显示面板8对位完成。
需要说明的是，掩模板4中的对位标识2为方框形而显示面板8中的对位图案6为圆形的情况仅起到示例性作用，并不意在对本申请的技术方案进行限制，本实施例中的对位标识2以及对位图案6还可以为其他适当的形状，此处不再一一列举。
可选地，如图1和图2所示，本实施例的掩模板4还包括设置于透明基板1上且分别与显示面板8上的多个显示区域7对应的多个遮光图形3。本实施例所述的遮光图形3为位于透明基板1的中间区域的矩形遮光图形，并且该矩形遮光图形3由遮光材料构成。在本实施例中，该遮光图形3用于遮挡在紫外固化处理过程中射向显示面板8的对应显示区域7的紫外光，从而避免紫外光对显示区域7的内部构件造成损坏。为此，该遮光图形3必须严格的确保不透光。本实施例中，构成遮光图形3的遮光材 料具体为金属材料，从而可有效地保证遮光图形3不透光。
根据本发明的实施例二，还提供一种掩模板的制备方法，用以制备上述实施例一中的掩模板。图4为本发明实施例二提供的一种掩模板的制备方法的流程图，如图4所示，该掩模板的制备方法包括：
步骤S1：在透明基板上形成由感光树脂构成的对位标识，所述对位标识用于将掩模板与将要进行紫外固化处理的显示面板进行对位。
在步骤S1中，具体包括如图5所示的如下步骤：
步骤S11：在透明基板上形成感光树脂薄膜；
步骤S12:利用相应的掩模基板对感光树脂薄膜进行曝光处理；
步骤S13:对曝光处理后的感光树脂薄膜进行显影处理，以得到对位标识的图形。
需要说明的是，本实施例中该感光树脂薄膜可以为光交联型感光树脂薄膜、光分解型感光树脂薄膜、或光聚合型感光树脂薄膜。
当该感光树脂为光交联型感光树脂时，上述步骤S11～步骤S13可具体对应为下述步骤101～步骤103。
步骤101：在透明基板上形成光交联型感光树脂薄膜。
在步骤101中，可采用涂覆方式以在透明基板上形成光交联型感光树脂薄膜。
步骤102：利用第一掩模基板对光交联型感光树脂薄膜进行曝光处理，第一掩模基板包括第一遮光区域和第一透光区域，其中第一透光区域与光交联型感光树脂薄膜上待形成对位标识的区域对应。
在步骤102中，利用曝光装置和第一掩模基板对光交联型感光树脂薄膜进行曝光处理，此时光交联型感光树脂薄膜上待形成对位标识的区域被光线照射，并发生光交联反应，从而使得光交联型感光树脂薄膜上对应待形成对位标识的区域具有抗腐蚀性。
步骤103：对曝光处理后的光交联型感光树脂薄膜进行显影处理，以得到对位标识的图形。
在步骤103中，通过相应的显影液对曝光处理后的光交联型感光树脂薄膜进行显影处理，此时该光交联型感光树脂薄膜上对应待形成对位标识的区域得以保留，而其他区域被去除，即形成对位标识。
当感光树脂为光聚合型感光树脂时，形成由光聚合型感光树脂构成的对位标识的过程与上述形成由光交联型感光树脂构成的对位标识的过程类似，具体过程可参见上述步骤101～步骤103的描述，此处不再赘述。
当感光树脂为光分解型感光树脂，上述步骤S11～步骤S13可具体对应为下述步骤201～步骤203。
步骤201：在透明基板上形成光分解型感光树脂薄膜。
在步骤201中，可采用涂覆的方式以在透明基板上形成光分解型感光树脂薄膜。
步骤202：利用第二掩模基板对光分解型感光树脂薄膜进行曝光处理，第二掩模基板包括第二遮光区域和第二透光区域，其中第二遮光区域与光分解型感光树脂薄膜上待形成对位标识的区域对应。
在步骤202中，利用曝光装置和第二掩模基板对光分解型感光树脂薄膜进行曝光处理，此时光分解型感光树脂薄膜上待形成对位标识的区域未被光线照射，光分解型感光树脂薄膜上的其他区域被光线照射并发生光分解反应，从而使得光分解型感光树脂薄膜上的其他区域具有可溶性。
步骤203：对曝光处理后的光分解型感光树脂薄膜进行显影处理，以得到对位标识的图形。
在步骤203中，通过相应的显影液对曝光处理后的光分解型感光树脂薄膜进行显影处理，此时该光分解型感光树脂薄膜上对应待形成对位标识的区域得以保留，而其他区域被去除，即形成对位标识。
通过上述步骤101～步骤103或步骤201～步骤203可见，在制备该由感光树脂构成的对位标识时，仅需经过感光树脂薄膜沉积工序(可等效于光刻胶涂覆工序)、曝光工序和显影工序即可完成对位标识的制备。与现有技术相比，本实施例的技术方案可省去金属材料沉积工序、刻蚀工序和光刻胶剥离工序，即本实施例提供的技术方案可使得制备对位标识过程中所需要的工序数量减少，简化制作掩模板的工艺流程，节省成本。
另外优选的是，如图4所示，本发明实施例二的掩模板的制备方法在步骤S1之后还包括：
步骤S2：在透明基板上形成分别与显示面板上的多个显示区域对应的多个遮光图形，该遮光图形由遮光材料构成。优选的遮光材料包括金属 材料。
具体地，在步骤S2中，经过金属材料薄膜沉积工序、光刻胶涂覆工序、曝光(掩模)工序、显影工序、刻蚀工序以及光刻胶剥离工序可得到对应的遮光图形3。
需要说明的是，上述步骤S2也可在步骤S1之前执行，具体情况此处不再描述。
本发明实施例三还提供一种显示面板中封框胶的固化方法，具体地，采用上述实施例一提供的掩模板作为对封框胶进行紫外固化处理时的掩模。
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本发明的保护范围。

Claims (12)

  1. 一种掩模板，包括：透明基板和位于所述透明基板上的对位标识，所述对位标识用于将所述掩模板与将要进行紫外固化处理的显示面板进行对位，所述掩模板的特征在于，所述对位标识由感光树脂构成。
  2. 根据权利要求1所述的掩模板，其特征在于，所述感光树脂的光透过率小于或等于80％。
  3. 根据权利要求1所述的掩模板，其特征在于，所述对位标识位于所述透明基板的周边区域。
  4. 根据权利要求3所述的掩模板，其特征在于，还包括：设置于所述透明基板上且分别与所述显示面板上的多个显示区域对应的多个遮光图形，所述遮光图形由遮光材料构成。
  5. 根据权利要求4所述的掩模板，其特征在于，所述遮光材料为金属材料。
  6. 根据权利要求4所述的掩模板，其特征在于，所述遮光图形位于所述透明基板的中间区域。
  7. 一种掩模板的制备方法，包括：
    在透明基板上形成对位标识，所述对位标识用于将所述掩模板与将要进行紫外固化处理的显示面板进行对位，
    所述掩模板的制备方法的特征在于，所述对位标识由感光树脂构成。
  8. 根据权利要求7所述的掩模板的制备方法，其特征在于，所述在透明基板上形成对位标识的步骤包括：
    在所述透明基板上形成感光树脂薄膜；
    利用相应的掩模基板对所述感光树脂薄膜进行曝光处理；
    对曝光处理后的所述感光树脂薄膜进行显影处理，以得到所述对位标识的图形。
  9. 根据权利要求8所述的掩模板的制备方法，其特征在于，所述感光树脂薄膜可以为光交联型感光树脂薄膜、光分解型感光树脂薄膜、或光聚合型感光树脂薄膜。
  10. 根据权利要求7所述的掩模板的制备方法，其特征在于，所述制备方法还包括：
    在所述透明基板上形成分别与所述显示面板上的多个显示区域对应的多个遮光图形，所述遮光图形由遮光材料构成。
  11. 根据权利要求10所述的掩模板的制备方法，其特征在于，所述遮光材料为金属材料。
  12. 一种显示面板中封框胶的固化方法，其特征在于，采用权利要求1-6中任一所述的掩模板作为对所述封框胶进行紫外固化处理时的掩模。
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KR102289723B1 (ko) * 2021-02-01 2021-08-17 풍원정밀(주) 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법
KR102295228B1 (ko) * 2021-02-01 2021-08-31 풍원정밀(주) 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법
WO2022164113A1 (ko) * 2021-02-01 2022-08-04 풍원정밀㈜ 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법

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