WO2016101395A1 - 柔性oled显示器件及其制造方法 - Google Patents

柔性oled显示器件及其制造方法 Download PDF

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WO2016101395A1
WO2016101395A1 PCT/CN2015/072550 CN2015072550W WO2016101395A1 WO 2016101395 A1 WO2016101395 A1 WO 2016101395A1 CN 2015072550 W CN2015072550 W CN 2015072550W WO 2016101395 A1 WO2016101395 A1 WO 2016101395A1
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flexible
flexible substrate
oled
layer
package cover
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PCT/CN2015/072550
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English (en)
French (fr)
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刘亚伟
吴泰必
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深圳市华星光电技术有限公司
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Priority to US14/429,359 priority Critical patent/US20160343963A1/en
Publication of WO2016101395A1 publication Critical patent/WO2016101395A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/842—Containers
    • H10K50/8423—Metallic sealing arrangements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/50—Forming devices by joining two substrates together, e.g. lamination techniques
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/302—Details of OLEDs of OLED structures
    • H10K2102/3023—Direction of light emission
    • H10K2102/3026—Top emission
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/302—Details of OLEDs of OLED structures
    • H10K2102/3023—Direction of light emission
    • H10K2102/3035—Edge emission
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/311—Flexible OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a flexible OLED display device and a method of fabricating the same.
  • the flat display device has many advantages such as thin body, power saving, no radiation, and has been widely used.
  • the existing flat display devices mainly include a liquid crystal display (LCD) and an organic light emitting diode (OLED).
  • the OLED display device has many advantages such as self-luminous, low driving voltage, high luminous efficiency, short response time, high definition and contrast ratio, near 180° viewing angle, wide temperature range, and large-area full-color display. It is the most promising display device. Compared with other types of display devices, a prominent feature of OLED display devices is that flexible display can be realized. Flexible display devices made of flexible substrates and which are light in weight, flexible and portable are important development directions of OLED display devices.
  • Flexible Organic Light Emitting Diodes are composed of an anode, a cathode, and an organic material layer disposed between the anode and the cathode, wherein at least one of the electrodes is Transparent to obtain a luminous surface.
  • the FOLED display device has the advantages of wide viewing angle and high brightness of an ordinary OLED display device, and at the same time, since the substrate of the FOLED display device is a material having good flexibility, it is thinner and more impact-resistant than a conventional OLED display device using a glass substrate. And the preparation of the FOLED display device can adopt a roll-to-roll production method, thereby greatly reducing the manufacturing cost.
  • the selection of the flexible substrate determines the process route, production cost, display quality and product reliability of the entire display device, and is the basis for developing the FOLED display device.
  • the flexible display substrate is mainly a polymer substrate, but the polymer substrate has poor water-oxygen barrier ability as a flexible substrate and stability at high temperatures, and a FOLED display device using a polymer substrate as a substrate is prepared.
  • the key issue is to improve the barrier properties of the polymer substrate to water and oxygen and its thermal stability, as well as to improve the performance of Indium Tin Oxides (ITO) films deposited at low temperatures and the packaging of FOLED display devices.
  • ITO Indium Tin Oxides
  • the object of the present invention is to provide a flexible OLED display device which has good flexibility and can effectively prevent the penetration of water vapor and oxygen, and has a good packaging effect.
  • Another object of the present invention is to provide a method for manufacturing a flexible OLED display device.
  • the flexible OLED display device manufactured by the method has good flexibility and can effectively prevent the penetration of water vapor and oxygen, and has a good packaging effect.
  • the present invention firstly provides a flexible OLED display device comprising: a flexible substrate, a flexible package cover disposed opposite the flexible substrate, a TFT layer disposed on the flexible substrate, and An OLED thin film device on the TFT layer, a passivation layer disposed on the OLED thin film device and enclosing the OLED thin film device, and a flexible package cover plate disposed on a side of the flexible substrate and flexible package An organic packaging film with a cover plate bonded to the flexible substrate;
  • the flexible substrate is one of a metal foil and an ultra-thin glass
  • the flexible package cover is another one of a metal foil and an ultra-thin glass different from the flexible substrate.
  • the flexible substrate is an ultra-thin glass, and the flexible package cover is a metal foil;
  • the OLED thin film device has a bottom light-emitting structure, including a transparent anode disposed on the TFT layer, and disposed on the transparent anode An organic material layer and a reflective cathode provided on the organic material layer.
  • the flexible substrate is a metal foil
  • the flexible package cover is ultra-thin glass
  • the OLED thin film device has a top light-emitting structure, including a reflective anode disposed on the TFT layer, and disposed on the reflective anode An organic material layer thereon and a transparent cathode disposed on the organic material layer.
  • a flat layer is disposed between the flexible substrate and the TFT layer.
  • the material of the passivation layer is silicon nitride.
  • the invention also provides a manufacturing method of a flexible OLED display device, comprising the following steps:
  • Step 1 Providing a flexible substrate, the flexible substrate being one of a metal foil and an ultra-thin glass, and forming a TFT layer on the flexible substrate;
  • Step 2 fabricating an OLED thin film device on the TFT layer
  • Step 3 forming a passivation layer on the OLED thin film device that completely encloses the OLED thin film device;
  • Step 4 providing a flexible package cover plate, wherein the flexible package cover plate is another metal foil and ultra-thin glass different from the flexible substrate, and an organic packaging film is pasted on a side of the flexible package cover. Then, the flexible package cover plate and the flexible substrate are paired;
  • Step 5 Heating and curing the organic packaging film to bond the flexible package cover to the flexible substrate.
  • the flexible substrate in the step 1 is ultra-thin glass, and the flexible package cover in the step 4 a metal foil;
  • the OLED thin film device in the step 2 has a bottom light emitting structure, comprising a transparent anode disposed on the TFT layer, an organic material layer disposed on the transparent anode, and a layer disposed on the organic material Reflective cathode on.
  • the flexible substrate in the step 1 is a metal foil, and the flexible package cover in the step 4 is ultra-thin glass; the OLED thin film device in the step 2 has a top light-emitting structure, and is disposed on the TFT layer. a reflective anode, an organic material layer disposed on the reflective anode, and a transparent cathode disposed on the organic material layer.
  • the step 1 further includes depositing a planar layer on the flexible substrate.
  • an OLED thin film device is fabricated by a vacuum thermal evaporation method or a solution film formation method; in the step 3, a passivation layer is formed by a chemical vapor deposition method, and the material of the passivation layer is silicon nitride.
  • the present invention also provides a flexible OLED display device comprising: a flexible substrate, a flexible package cover disposed opposite the flexible substrate, a TFT layer disposed on the flexible substrate, and being disposed on the TFT layer
  • the flexible substrate is one of a metal foil and an ultra-thin glass
  • the flexible package cover is another one of a metal foil and an ultra-thin glass different from the flexible substrate
  • the flexible substrate is ultra-thin glass
  • the flexible package cover is a metal foil
  • the OLED thin film device has a bottom light-emitting structure, comprising a transparent anode disposed on the TFT layer, disposed on the transparent anode a layer of an organic material thereon, and a reflective cathode disposed on the layer of the organic material;
  • the flexible substrate is a metal foil
  • the flexible package cover is an ultra-thin glass
  • the OLED thin film device has a top light-emitting structure, including a reflective anode disposed on the TFT layer, and disposed on the reflective An organic material layer on the anode and a transparent cathode provided on the organic material layer.
  • a flexible OLED display device and a method of fabricating the same according to the present invention one of a metal foil and an ultra-thin glass is used as a flexible substrate, and the other is used as a flexible package cover, and an OLED is disposed correspondingly
  • the thin film device has a bottom light emitting structure or a top light emitting structure, so that the OLED display device has good flexibility, can effectively prevent the penetration of water vapor and oxygen, and has a good packaging effect.
  • FIG. 1 is a cross-sectional structural view showing a first embodiment of a flexible OLED display device of the present invention
  • FIG. 2 is a cross-sectional structural view showing a second embodiment of the flexible OLED display device of the present invention.
  • FIG. 3 is a flow chart of a method of fabricating a flexible OLED display device of the present invention.
  • a flexible OLED display device of the present invention comprising: a flexible substrate 1 which is an ultra-thin glass; a flexible package disposed opposite the flexible substrate 1 a cover plate 2, the flexible package cover 2 is a metal foil; a TFT layer 3 directly disposed on the flexible substrate 1, an OLED thin film device 4 disposed on the TFT layer 3, and an OLED film a passivation layer 5 of the OLED thin film device 4 is wrapped on the device 4; and the flexible package cover 2 is disposed near the flexible substrate 1 and bonds the flexible package cover 2 to the flexible substrate 1.
  • the passivation layer 5 is used to protect and package the OLED thin film device 4, and the material thereof is silicon nitride.
  • the organic encapsulating film 6 further protects and encapsulates the OLED thin film device 4.
  • the ultrathin glass has a thickness of 50 to 200 ⁇ m and is easily bent.
  • the ultra-thin glass is used as the flexible substrate 1, and the metal foil is used as the flexible package cover 2. Since the ultra-thin glass can transmit light, the OLED thin film device 4 is correspondingly provided with a bottom-emitting structure.
  • the OLED thin film device 4 includes a transparent anode disposed on the TFT layer 3, an organic material layer disposed on the transparent anode, and a reflective cathode disposed on the organic material layer, thereby having a bottom emission Light emitted from the structured OLED thin film device 4 is emitted through the transparent anode and ultrathin glass as the flexible substrate 1.
  • the ultra-thin glass and the metal foil are excellent in flexibility, and the metal foil and the ultra-thin glass are densely dense, and the effect of preventing moisture and oxygen permeation is good
  • the ultra-thin glass is used as the flexible substrate 1
  • the metal foil is used as the flexible package.
  • the cover plate 2 is applied in the same flexible OLED display device, so that the OLED display device has good flexibility and can effectively prevent the penetration of water vapor and oxygen, and the package effect is good.
  • a second embodiment of a flexible OLED display device of the present invention includes: a flexible substrate 1 which is a metal foil; and is disposed opposite to the flexible substrate 1.
  • a flexible package cover 2 the flexible package cover 2 is an ultra-thin glass; a flat layer 11 disposed on the flexible substrate 1, a TFT layer 3 disposed on the flat layer 11, and a TFT
  • the OLED thin film device 4 on the layer 3; the passivation layer 5 disposed on the OLED thin film device 4 and enclosing the OLED thin film device 4; and the flexible package cover 2 disposed on the side of the flexible substrate 1 and An organic encapsulating film 6 that bonds the flexible package cover 2 to the flexible substrate 1.
  • the material of the flat layer 11 is an organic material, which serves to insulate and flatten the surface of the metal foil as the flexible substrate 1.
  • the passivation layer 5 is used to protect and package the OLED thin film device 4, and the material thereof is silicon nitride.
  • the organic encapsulating film 6 further protects and encapsulates the OLED thin film device 4.
  • the ultrathin glass has a thickness of 50 to 200 ⁇ m and is easily bent.
  • the metal foil is used as the flexible substrate 1, and the ultra-thin glass is used as the flexible package cover 2. Since the ultra-thin glass can transmit light, the OLED thin film device 4 is correspondingly provided with a top light-emitting structure.
  • the OLED thin film device 4 includes a reflective anode disposed on the TFT layer 3, an organic material layer disposed on the reflective anode, and a transparent cathode disposed on the organic material layer, thereby having a top Light emitted from the OLED thin film device 4 of the light-emitting structure is emitted through the transparent cathode and the ultra-thin glass as the flexible package cover 2.
  • the ultra-thin glass and the metal foil are excellent in flexibility, and the metal foil and the ultra-thin glass are densely dense, and the effect of preventing moisture and oxygen permeation is good
  • the foil is used as the flexible substrate 1
  • the ultra-thin glass is used as the flexible package.
  • the cover plate 2 is applied in the same flexible OLED display device, so that the OLED display device has good flexibility and can effectively prevent the penetration of water vapor and oxygen, and the package effect is good.
  • the present invention further provides a method for manufacturing a flexible OLED display device, comprising the following steps:
  • Step 1 A flexible substrate 1 is provided on which a TFT layer 3 is formed.
  • the flexible substrate 1 is one of a metal foil and an ultra-thin glass.
  • the TFT layer 3 is directly formed on the flexible substrate 1.
  • the step 1 further includes depositing a flat layer 11 on the flexible substrate 1, and then forming a TFT layer 3 on the flat layer 11.
  • the material of the flat layer 11 is an organic material, which serves to insulate and flatten the surface of the metal foil as the flexible substrate 1.
  • Step 2 On the TFT layer 3, an OLED thin film device 4 is formed by a vacuum thermal evaporation method or a solution film formation method.
  • the OLED thin film device 4 has a bottom light-emitting structure, including a transparent anode disposed on the TFT layer 3, and is disposed on An organic material layer on the transparent anode and a reflective cathode provided on the organic material layer.
  • the OLED thin film device 4 has a top light emitting structure, including a reflective anode disposed on the TFT layer 3, and disposed on the reflective anode. An organic material layer thereon and a transparent cathode disposed on the organic material layer.
  • Step 3 A passivation layer 5 for completely encapsulating the OLED thin film device 4 is formed on the OLED thin film device 4 by chemical vapor deposition (CVD).
  • CVD chemical vapor deposition
  • the material of the passivation layer 5 is silicon nitride.
  • Step 4 providing a flexible package cover 2, attaching an organic encapsulation film 6 on the side of the flexible package cover 2, and then aligning the flexible package cover 2 with the flexible substrate 1.
  • the flexible package cover 2 is another one of the metal foil and the ultra-thin glass different from the flexible substrate 1.
  • the flexible package cover 2 is a metal foil.
  • the flexible package cover 2 is an ultra-thin glass.
  • Step 5 Heating and curing the organic encapsulating film 6 to bond the flexible package cover 2 and the flexible substrate 1.
  • the manufacture of the flexible OLED display device has been completed.
  • the flexible substrate 1 is ultra-thin glass and the flexible package cover 2 is a metal foil
  • light emitted from the OLED thin film device 4 having the bottom light-emitting structure is transmitted through the transparent anode and the flexible substrate 1 Ultra-thin glass is shot.
  • the flexible substrate 1 is a metal foil and the flexible package cover 2 is ultra-thin glass
  • light emitted from the OLED thin film device 4 having a top light-emitting structure is transmitted through the transparent cathode and as a flexible package cover 2
  • the ultra-thin glass is shot.
  • the manufacturing method of the flexible OLED display device is in the metal foil and the ultra-thin glass.
  • One is used as the flexible substrate 1, and the other is used as the flexible package cover 2, and the OLED thin film device 4 is provided with a bottom light emitting structure or a top light emitting structure, so that the OLED display device has both good flexibility and can effectively prevent Water vapor, oxygen penetration, packaging effect is good.
  • the flexible OLED display device of the present invention and the method of fabricating the same, using one of a metal foil and an ultra-thin glass as a flexible substrate, and the other as a flexible package cover, and correspondingly providing an OLED thin film device having a bottom
  • the light-emitting structure or the top-emitting structure makes the OLED display device have good flexibility, can effectively prevent the penetration of water vapor and oxygen, and has a good packaging effect.

Abstract

一种柔性OLED显示器件及其制造方法，该OLED显示器件包括：一柔性衬底(1)、与柔性衬底(1)相对设置的柔性封装盖板(2)、设于柔性衬底(1)上的TFT层(3)、设于TFT层(3)上的OLED薄膜器件(4)、设于OLED 薄膜器件(4)上并包裹住该OLED薄膜器件(4)的钝化层(5)、及设于柔性封装盖板(2)靠近柔性衬底(1)一侧并将柔性封装盖板(2)与柔性衬底(1)粘结在一起的有机封装薄膜(6)；所述柔性衬底(1)为金属薄片与超薄玻璃中的一种，所述柔性封装盖板 (2)为金属薄片与超薄玻璃中不同于所述柔性衬底(1)的另一种。该OLED显示器件既具有良好的柔韧性，又能够有效阻止水汽、氧气的渗透，封装效果好。

Description

柔性OLED显示器件及其制造方法 技术领域
本发明涉及显示技术领域，尤其涉及一种柔性OLED显示器件及其制造方法。
背景技术
平面显示器件具有机身薄、省电、无辐射等众多优点，得到了广泛的应用。现有的平面显示器件主要包括液晶显示器件(Liquid Crystal Display，LCD)及有机发光二极管显示器件(Organic Light Emitting Diodes，OLED)。
OLED显示器件具有自发光、驱动电压低、发光效率高、响应时间短、清晰度与对比度高、近180°视角、使用温度范围宽，可实现大面积全色显示等诸多优点，被业界公认为是最有发展潜力的显示器件。相比于其它类型的显示器件，OLED显示器件的一大突出特点在于可以实现柔性显示，采用柔性衬底制成重量轻、可弯曲、便于携带的柔性显示器件是OLED显示器件的重要发展方向。
柔性有机发光二极管显示器件(Flexible Organic Light Emitting Diodes,FOLED)由制备在柔性衬底上的阳极、阴极、及设于所述阳极、阴极之间的有机材料层构成，其中至少有一侧的电极是透明的，以便获得发光面。
FOLED显示器件具备普通OLED显示器件的宽视角、高亮度等优点，同时由于FOLED显示器件的衬底是具有良好柔韧性的材料，相比使用玻璃衬底的普通OLED显示器件更轻薄、更耐冲击，并且FOLED显示器件的制备能够采用卷对卷的生产方式，从而可以大幅的降低制造成本。
在FOLED显示器件中，柔性衬底的选材决定着整个显示器件的工艺路线、生产成本、显示质量及产品可靠性，是开发FOLED显示器件的基础。
目前柔性显示衬底主要为聚合物基片，但聚合物基片作为柔性衬底的水氧阻隔能力和在高温下的稳定性都不好，制备采用聚合物基片作为衬底的FOLED显示器件，关键问题在于提高聚合物基片对水氧的阻隔能力及其热稳定性，以及改善在低温下沉积的氧化铟锡(Indium Tin Oxides，ITO)薄膜的性能和FOLED显示器件的封装。
因此，有必要对FOLED进行改进，使其既具有良好的柔性，又能够有效阻止水汽、氧气的渗透，具有较好的封装效果。
发明内容
本发明的目的在于提供一种柔性OLED显示器件，既具有良好的柔性，又能够有效阻止水汽、氧气的渗透，封装效果好。
本发明的目的还在于提供一种柔性OLED显示器件的制造方法，使用该方法制造的柔性OLED显示器件既具有良好的柔性，又能够有效阻止水汽、氧气的渗透，封装效果好。
为实现上述目的，本发明首先提供一种柔性OLED显示器件，包括：一柔性衬底、与所述柔性衬底相对设置的柔性封装盖板、设于所述柔性衬底上的TFT层、设于所述TFT层上的OLED薄膜器件、设于所述OLED薄膜器件上并包裹住所述OLED薄膜器件的钝化层、及设于所述柔性封装盖板靠近柔性衬底一侧并将柔性封装盖板与柔性衬底粘结在一起的有机封装薄膜；
所述柔性衬底为金属薄片与超薄玻璃中的一种，所述柔性封装盖板为金属薄片与超薄玻璃中不同于所述柔性衬底的另一种。
所述柔性衬底为超薄玻璃，所述柔性封装盖板为金属薄片；所述OLED薄膜器件具有底发光结构，包括设于所述TFT层上的透明阳极、设于所述透明阳极上的有机材料层、及设于所述有机材料层上的反射型阴极。
所述柔性衬底为金属薄片，所述柔性封装盖板为超薄玻璃；所述OLED薄膜器件具有顶发光结构，包括设于所述TFT层上的反射型阳极、设于所述反射型阳极上的有机材料层、及设于所述有机材料层上的透明阴极。
所述柔性衬底与TFT层之间设有一层平坦层。
所述钝化层的材料为氮化硅。
本发明还提供一种柔性OLED显示器件的制造方法，包括如下步骤：
步骤1、提供一柔性衬底，所述柔性衬底为金属薄片与超薄玻璃中的一种，在所述柔性衬底上制作TFT层；
步骤2、在所述TFT层上制作OLED薄膜器件；
步骤3、在所述OLED薄膜器件上制作一将所述OLED薄膜器件完全包裹住的钝化层；
步骤4、提供一柔性封装盖板，所述柔性封装盖板为金属薄片与超薄玻璃中不同于所述柔性衬底的另一种，在所述柔性封装盖板一侧粘贴有机封装薄膜，然后将所述柔性封装盖板与柔性衬底进行对组；
步骤5、加热固化所述有机封装薄膜，使所述柔性封装盖板与柔性衬底粘结在一起。
所述步骤1中的柔性衬底为超薄玻璃，所述步骤4中的柔性封装盖板 为金属薄片；所述步骤2中的OLED薄膜器件具有底发光结构，包括设于所述TFT层上的透明阳极、设于所述透明阳极上的有机材料层、及设于所述有机材料层上的反射型阴极。
所述步骤1中的柔性衬底为金属薄片，所述步骤4中的柔性封装盖板为超薄玻璃；所述步骤2中的OLED薄膜器件具有顶发光结构，包括设于所述TFT层上的反射型阳极、设于所述反射型阳极上的有机材料层、及设于所述有机材料层上的透明阴极。
所述步骤1还包括在所述柔性衬底上沉积一层平坦层。
所述步骤2通过真空热蒸镀法或溶液成膜法制作OLED薄膜器件；所述步骤3通过化学气相沉积法制作钝化层，所述钝化层的材料为氮化硅。
本发明还提供一种柔性OLED显示器件，包括：一柔性衬底、与所述柔性衬底相对设置的柔性封装盖板、设于所述柔性衬底上的TFT层、设于所述TFT层上的OLED薄膜器件、设于所述OLED薄膜器件上并包裹住所述OLED薄膜器件的钝化层、及设于所述柔性封装盖板靠近柔性衬底一侧并将柔性封装盖板与柔性衬底粘结在一起的有机封装薄膜；
所述柔性衬底为金属薄片与超薄玻璃中的一种，所述柔性封装盖板为金属薄片与超薄玻璃中不同于所述柔性衬底的另一种；
其中，所述柔性衬底为超薄玻璃，所述柔性封装盖板为金属薄片；所述OLED薄膜器件具有底发光结构，包括设于所述TFT层上的透明阳极、设于所述透明阳极上的有机材料层、及设于所述有机材料层上的反射型阴极；
其中，所述柔性衬底为金属薄片，所述柔性封装盖板为超薄玻璃；所述OLED薄膜器件具有顶发光结构，包括设于所述TFT层上的反射型阳极、设于所述反射型阳极上的有机材料层、及设于所述有机材料层上的透明阴极。
本发明的有益效果：本发明提供的一种柔性OLED显示器件及其制造方法，将金属薄片与超薄玻璃中的一种作为柔性衬底，另一种作为柔性封装盖板，并相应设置OLED薄膜器件具有底发光结构或顶发光结构，使得OLED显示器件既具有良好的柔韧性，又能够有效阻止水汽、氧气的渗透，封装效果好。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为本发明的柔性OLED显示器件的第一实施例的剖面结构图；
图2为本发明的柔性OLED显示器件的第二实施例的剖面结构图；
图3为本发明的柔性OLED显示器件的制造方法的流程图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图1，为本发明的柔性OLED显示器件的第一实施例，包括：一柔性衬底1，所述柔性衬底1为超薄玻璃；与所述柔性衬底1相对设置的柔性封装盖板2，所述柔性封装盖板2为金属薄片；直接设于所述柔性衬底1上的TFT层3；设于所述TFT层3上的OLED薄膜器件4；设于所述OLED薄膜器件4上并包裹住所述OLED薄膜器件4的钝化层5；及设于所述柔性封装盖板2靠近柔性衬底1一侧并将柔性封装盖板2与柔性衬底1粘结在一起的有机封装薄膜6。
具体的，所述钝化层5用于保护、封装OLED薄膜器件4，其材料为氮化硅。所述有机封装薄膜6进一步对OLED薄膜器件4进行保护、封装。所述超薄玻璃的厚度为50～200μm，易于进行弯曲。
在该第一实施例中，将超薄玻璃作为柔性衬底1，将金属薄片作为柔性封装盖板2，由于超薄玻璃能够透光，相应的设置所述OLED薄膜器件4具有底发光结构，所述OLED薄膜器件4包括设于所述TFT层3上的透明阳极、设于所述透明阳极上的有机材料层、及设于所述有机材料层上的反射型阴极，从而该具有底发光结构的OLED薄膜器件4发出的光透过所述透明阳极与作为柔性衬底1的超薄玻璃射出。
由于超薄玻璃与金属薄片的柔韧性均很好，且金属薄片与超薄玻璃均质地致密，阻止水汽、氧气渗透的作用好，将超薄玻璃作为柔性衬底1、将金属薄片作为柔性封装盖板2应用在同一个柔性OLED显示器件中，使得OLED显示器件既具有良好的柔韧性，又能够有效阻止水汽、氧气的渗透，封装效果好。
请参阅图2，为本发明的柔性OLED显示器件的第二实施例，包括：一柔性衬底1，所述柔性衬底1为金属薄片；与所述柔性衬底1相对设置的 柔性封装盖板2，所述柔性封装盖板2为超薄玻璃；设于所述柔性衬底1上的平坦层11；设于所述平坦层11上的TFT层3；设于所述TFT层3上的OLED薄膜器件4；设于所述OLED薄膜器件4上并包裹住所述OLED薄膜器件4的钝化层5；及设于所述柔性封装盖板2靠近柔性衬底1一侧并将柔性封装盖板2与柔性衬底1粘结在一起的有机封装薄膜6。
具体的，所述平坦层11的材料为有机物，起到绝缘及使作为柔性衬底1的金属薄片的表面平整的作用。所述钝化层5用于保护、封装OLED薄膜器件4，其材料为氮化硅。所述有机封装薄膜6进一步对OLED薄膜器件4进行保护、封装。所述超薄玻璃的厚度为50～200μm，易于进行弯曲。
在该第二实施例中，将金属薄片作为柔性衬底1，将超薄玻璃作为柔性封装盖板2，由于超薄玻璃能够透光，相应的设置所述OLED薄膜器件4具有顶发光结构，所述OLED薄膜器件4包括设于所述TFT层3上的反射型阳极、设于所述反射型阳极上的有机材料层、及设于所述有机材料层上的透明阴极，从而该具有顶发光结构的OLED薄膜器件4发出的光透过所述透明阴极与作为柔性封装盖板2的超薄玻璃射出。
由于超薄玻璃与金属薄片的柔韧性均很好，且金属薄片与超薄玻璃均质地致密，阻止水汽、氧气渗透的作用好，将金属薄片作为柔性衬底1、将超薄玻璃作为柔性封装盖板2应用在同一个柔性OLED显示器件中，使得OLED显示器件既具有良好的柔韧性，又能够有效阻止水汽、氧气的渗透，封装效果好。
请参阅图3，同时结合图1或图2，本发明还提供一种柔性OLED显示器件的制造方法，包括如下步骤：
步骤1、提供一柔性衬底1，在所述柔性衬底1上制作TFT层3。
所述柔性衬底1为金属薄片与超薄玻璃中的一种。
具体的，当所述柔性衬底1为超薄玻璃时，如图1所示，在所述柔性衬底1上直接制作TFT层3。
当所述柔性衬底1为金属薄片时，如图2所示，该步骤1还包括在所述柔性衬底1上沉积一层平坦层11，再在所述平坦层11上制作TFT层3。所述平坦层11的材料为有机物，起到绝缘及使作为柔性衬底1的金属薄片的表面平整的作用。
步骤2、在所述TFT层3上通过真空热蒸镀法或溶液成膜法制作OLED薄膜器件4。
具体的，当所述柔性衬底1为超薄玻璃时，如图1所示，所述OLED薄膜器件4具有底发光结构，包括设于所述TFT层3上的透明阳极、设于 所述透明阳极上的有机材料层、及设于所述有机材料层上的反射型阴极。
当所述柔性衬底1为金属薄片时，如图2所示，所述OLED薄膜器件4具有顶发光结构，包括设于所述TFT层3上的反射型阳极、设于所述反射型阳极上的有机材料层、及设于所述有机材料层上的透明阴极。
步骤3、在所述OLED薄膜器件4上通过化学气相沉积法(Chemical Vapor Deposition，CVD)制作一将所述OLED薄膜器件4完全包裹住的钝化层5。
具体的，所述钝化层5的材料为氮化硅。
步骤4、提供一柔性封装盖板2，在所述柔性封装盖板2一侧粘贴有机封装薄膜6，然后将所述柔性封装盖板2与柔性衬底1进行对组。
所述柔性封装盖板2为金属薄片与超薄玻璃中不同于所述柔性衬底1的另一种。
具体的，当所述柔性衬底1为超薄玻璃时，如图1所示，所述柔性封装盖板2为金属薄片。
当所述柔性衬底1为金属薄片时，如图2所示，所述柔性封装盖板2为超薄玻璃。
步骤5、加热固化所述有机封装薄膜6，使所述柔性封装盖板2与柔性衬底1粘结在一起。
至此，完成柔性OLED显示器件的制造。当所述柔性衬底1为超薄玻璃、所述柔性封装盖板2为金属薄片时，相应具有底发光结构的OLED薄膜器件4发出的光透过所述透明阳极与作为柔性衬底1的超薄玻璃射出。当所述柔性衬底1为金属薄片、所述柔性封装盖板2为超薄玻璃时，相应具有顶发光结构的OLED薄膜器件4发出的光透过所述透明阴极与作为柔性封装盖板2的超薄玻璃射出。
由于超薄玻璃与金属薄片的柔韧性均很好，且金属薄片与超薄玻璃均质地致密，阻止水汽、氧气渗透的作用好，该柔性OLED显示器件的制造方法将金属薄片与超薄玻璃中的一种作为柔性衬底1，另一种作为柔性封装盖板2，并相应设置OLED薄膜器件4具有底发光结构或顶发光结构，使得OLED显示器件既具有良好的柔韧性，又能够有效阻止水汽、氧气的渗透，封装效果好。
综上所述，本发明的柔性OLED显示器件及其制造方法，将金属薄片与超薄玻璃中的一种作为柔性衬底，另一种作为柔性封装盖板，并相应设置OLED薄膜器件具有底发光结构或顶发光结构，使得OLED显示器件既具有良好的柔韧性，又能够有效阻止水汽、氧气的渗透，封装效果好。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (13)

  1. 一种柔性OLED显示器件，包括：一柔性衬底、与所述柔性衬底相对设置的柔性封装盖板、设于所述柔性衬底上的TFT层、设于所述TFT层上的OLED薄膜器件、设于所述OLED薄膜器件上并包裹住所述OLED薄膜器件的钝化层、及设于所述柔性封装盖板靠近柔性衬底一侧并将柔性封装盖板与柔性衬底粘结在一起的有机封装薄膜；
    所述柔性衬底为金属薄片与超薄玻璃中的一种，所述柔性封装盖板为金属薄片与超薄玻璃中不同于所述柔性衬底的另一种。
  2. 如权利要求1所述的柔性OLED显示器件，其中，所述柔性衬底为超薄玻璃，所述柔性封装盖板为金属薄片；所述OLED薄膜器件具有底发光结构，包括设于所述TFT层上的透明阳极、设于所述透明阳极上的有机材料层、及设于所述有机材料层上的反射型阴极。
  3. 如权利要求1所述的柔性OLED显示器件，其中，所述柔性衬底为金属薄片，所述柔性封装盖板为超薄玻璃；所述OLED薄膜器件具有顶发光结构，包括设于所述TFT层上的反射型阳极、设于所述反射型阳极上的有机材料层、及设于所述有机材料层上的透明阴极。
  4. 如权利要求3所述的柔性OLED显示器件，其中，所述柔性衬底与TFT层之间设有一层平坦层。
  5. 如权利要求1所述的柔性OLED显示器件，所述钝化层的材料为氮化硅。
  6. 一种柔性OLED显示器件的制造方法，包括如下步骤：
    步骤1、提供一柔性衬底，所述柔性衬底为金属薄片与超薄玻璃中的一种，在所述柔性衬底上制作TFT层；
    步骤2、在所述TFT层上制作OLED薄膜器件；
    步骤3、在所述OLED薄膜器件上制作一将所述OLED薄膜器件完全包裹住的钝化层；
    步骤4、提供一柔性封装盖板，所述柔性封装盖板为金属薄片与超薄玻璃中不同于所述柔性衬底的另一种，在所述柔性封装盖板一侧粘贴有机封装薄膜，然后将所述柔性封装盖板与柔性衬底进行对组；
    步骤5、加热固化所述有机封装薄膜，使所述柔性封装盖板与柔性衬底粘结在一起。
  7. 如权利要求6所述的柔性OLED显示器件的制造方法，其中，所述 步骤1中的柔性衬底为超薄玻璃，所述步骤4中的柔性封装盖板为金属薄片；所述步骤2中的OLED薄膜器件具有底发光结构，包括设于所述TFT层上的透明阳极、设于所述透明阳极上的有机材料层、及设于所述有机材料层上的反射型阴极。
  8. 如权利要求6所述的柔性OLED显示器件的制造方法，其中，所述步骤1中的柔性衬底为金属薄片，所述步骤4中的柔性封装盖板为超薄玻璃；所述步骤2中的OLED薄膜器件具有顶发光结构，包括设于所述TFT层上的反射型阳极、设于所述反射型阳极上的有机材料层、及设于所述有机材料层上的透明阴极。
  9. 如权利要求8所述的柔性OLED显示器件的制造方法，其中，所述步骤1还包括在所述柔性衬底上沉积一层平坦层。
  10. 如权利要求6所述的柔性OLED显示器件的制造方法，其中，所述步骤2通过真空热蒸镀法或溶液成膜法制作OLED薄膜器件；所述步骤3通过化学气相沉积法制作钝化层，所述钝化层的材料为氮化硅。
  11. 一种柔性OLED显示器件，包括：一柔性衬底、与所述柔性衬底相对设置的柔性封装盖板、设于所述柔性衬底上的TFT层、设于所述TFT层上的OLED薄膜器件、设于所述OLED薄膜器件上并包裹住所述OLED薄膜器件的钝化层、及设于所述柔性封装盖板靠近柔性衬底一侧并将柔性封装盖板与柔性衬底粘结在一起的有机封装薄膜；
    所述柔性衬底为金属薄片与超薄玻璃中的一种，所述柔性封装盖板为金属薄片与超薄玻璃中不同于所述柔性衬底的另一种；
    其中，所述柔性衬底为超薄玻璃，所述柔性封装盖板为金属薄片；所述OLED薄膜器件具有底发光结构，包括设于所述TFT层上的透明阳极、设于所述透明阳极上的有机材料层、及设于所述有机材料层上的反射型阴极；
    其中，所述柔性衬底为金属薄片，所述柔性封装盖板为超薄玻璃；所述OLED薄膜器件具有顶发光结构，包括设于所述TFT层上的反射型阳极、设于所述反射型阳极上的有机材料层、及设于所述有机材料层上的透明阴极。
  12. 如权利要求11所述的柔性OLED显示器件，其中，所述柔性衬底与TFT层之间设有一层平坦层。
  13. 如权利要求11所述的柔性OLED显示器件，所述钝化层的材料为氮化硅。
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