WO2016093148A1 - 液状エポキシ樹脂組成物、半導体封止剤、半導体装置、および液状エポキシ樹脂組成物の製造方法 - Google Patents
液状エポキシ樹脂組成物、半導体封止剤、半導体装置、および液状エポキシ樹脂組成物の製造方法 Download PDFInfo
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- WO2016093148A1 WO2016093148A1 PCT/JP2015/084025 JP2015084025W WO2016093148A1 WO 2016093148 A1 WO2016093148 A1 WO 2016093148A1 JP 2015084025 W JP2015084025 W JP 2015084025W WO 2016093148 A1 WO2016093148 A1 WO 2016093148A1
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- epoxy resin
- component
- resin composition
- liquid
- liquid epoxy
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- 239000004850 liquid epoxy resins (LERs) Substances 0.000 title claims abstract description 82
- 239000000203 mixture Substances 0.000 title claims abstract description 80
- 239000004065 semiconductor Substances 0.000 title claims abstract description 54
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000007789 sealing Methods 0.000 title abstract description 5
- 239000003822 epoxy resin Substances 0.000 claims abstract description 59
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 59
- 239000007788 liquid Substances 0.000 claims abstract description 37
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 claims abstract description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 17
- 230000009477 glass transition Effects 0.000 claims abstract description 11
- 150000001412 amines Chemical class 0.000 claims abstract description 10
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 8
- 239000000945 filler Substances 0.000 claims abstract description 6
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 4
- 239000004594 Masterbatch (MB) Substances 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 18
- 239000008393 encapsulating agent Substances 0.000 claims description 17
- 239000002245 particle Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 10
- 238000002156 mixing Methods 0.000 claims description 8
- 229920001400 block copolymer Polymers 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- -1 etc. Substances 0.000 description 5
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229920006243 acrylic copolymer Polymers 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 230000009974 thixotropic effect Effects 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- PISLZQACAJMAIO-UHFFFAOYSA-N 2,4-diethyl-6-methylbenzene-1,3-diamine Chemical compound CCC1=CC(C)=C(N)C(CC)=C1N PISLZQACAJMAIO-UHFFFAOYSA-N 0.000 description 1
- GHKSKVKCKMGRDU-UHFFFAOYSA-N 2-(3-aminopropylamino)ethanol Chemical compound NCCCNCCO GHKSKVKCKMGRDU-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- QUPKCFBHJFNUEW-UHFFFAOYSA-N 2-ethyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCCN1 QUPKCFBHJFNUEW-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- DRPJWBIHQOHLND-UHFFFAOYSA-N 4-[dimethoxy(methyl)silyl]oxybutyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)OCCCCOC(=O)C(C)=C DRPJWBIHQOHLND-UHFFFAOYSA-N 0.000 description 1
- PRKPGWQEKNEVEU-UHFFFAOYSA-N 4-methyl-n-(3-triethoxysilylpropyl)pentan-2-imine Chemical compound CCO[Si](OCC)(OCC)CCCN=C(C)CC(C)C PRKPGWQEKNEVEU-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- FBBATURSCRIBHN-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyldisulfanyl)propyl]silane Chemical group CCO[Si](OCC)(OCC)CCCSSCCC[Si](OCC)(OCC)OCC FBBATURSCRIBHN-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3227—Compounds containing acyclic nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5033—Amines aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/20—Compounding polymers with additives, e.g. colouring
- C08J3/22—Compounding polymers with additives, e.g. colouring using masterbatch techniques
- C08J3/226—Compounding polymers with additives, e.g. colouring using masterbatch techniques using a polymer as a carrier
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/002—Physical properties
- C08K2201/005—Additives being defined by their particle size in general
Definitions
- the present invention relates to a liquid epoxy resin composition, and in particular, to a liquid epoxy resin composition suitable for a liquid semiconductor encapsulant, especially a liquid semiconductor encapsulant for flip chip type semiconductor devices.
- Flip chip bonding is used as a semiconductor element mounting method that can cope with higher density and higher output of wiring and the like of a semiconductor device.
- a semiconductor element and a substrate are joined by bumps, and a gap between the semiconductor element and the substrate is sealed with a liquid semiconductor sealing agent called an underfill material.
- An object of the present invention is to provide a liquid semiconductor encapsulant that is excellent in injectability into a flip chip type semiconductor device having a fine pitch wiring pattern and suppresses fillet cracks after curing.
- the present invention relates to a liquid epoxy resin composition, a semiconductor encapsulant, a semiconductor device, and a method for producing a liquid epoxy resin composition that have solved the above problems by having the following configuration.
- a liquid epoxy resin containing (A) an aminophenol type epoxy resin, (B) an amine curing agent, (C) a silica filler, and (D) a silane coupling agent, (A) The aminophenol type epoxy resin is included in an amount of 10.0 to 70 parts by mass with respect to 100 parts by mass of the component, (B) component is a ratio of 0.7 to 1.2 equivalents with respect to (A) component: 1 equivalent,
- the aminophenol type epoxy resin contained in the component (A) is represented by the formula (1):
- the component (B) is represented by chemical formulas (2) to (4):
- the average particle size of the component (C) is 0.1 to 3.0 ⁇ m, and the component (C) is 55 to 75 parts by mass with respect to 100 parts by mass of the liquid epoxy resin composition.
- the component (D) is dispersed in at least a part of the component (A) excluding the aminophenol type epoxy resin to form a master batch, and then the master batch contains the aminophenol type epoxy resin.
- a liquid semiconductor encapsulant comprising the liquid epoxy resin composition according to the above [1].
- a flip chip type semiconductor device comprising a copper pillar according to [10].
- the component (D) is dispersed in the component (A) excluding the aminophenol type epoxy resin to form a master batch, and then the amino batch type epoxy resin and the component (B) are mixed into the master batch.
- liquid epoxy resin composition which is excellent in injectability into a flip chip type semiconductor device having a fine pitch wiring pattern and suppresses fillet cracks after curing.
- a highly reliable semiconductor device in which a liquid semiconductor encapsulant is satisfactorily injected into a fine-pitch wiring pattern and fillet cracks of the cured liquid semiconductor encapsulant are suppressed is easy. Can be provided.
- liquid epoxy resin composition The liquid epoxy resin composition of the present invention (hereinafter referred to as liquid epoxy resin composition) (A) a liquid epoxy resin containing an aminophenol type epoxy resin, (B) an amine curing agent, (C) a silica filler and (D) a silane coupling agent, (A) The aminophenol type epoxy resin is included in an amount of 10.0 to 70 parts by mass with respect to 100 parts by mass of the component, (B) component is a ratio of 0.7 to 1.2 equivalents with respect to (A) component: 1 equivalent, The glass transition temperature (Tg) after curing is 110 to 200 ° C.
- Tg glass transition temperature after curing
- the aminophenol type epoxy resin contained in the component (A) is an epoxy resin having a low molecular weight, which makes the liquid epoxy resin composition low in viscosity and good injectability. Moreover, generation
- the aminophenol type epoxy resin is preferably represented by the formula (5):
- liquid epoxy resin composition In view of the injection property of the liquid epoxy resin composition, curability, heat resistance, adhesiveness, durability such as fillet crack suppression of the liquid epoxy resin composition after curing, particularly from the viewpoint of migration resistance preferable.
- Commercially available products include aminophenol type epoxy resins (grade: JER630, JER630LSD) manufactured by Mitsubishi Chemical.
- the aminophenol type epoxy resin may be used alone or in combination of two or more.
- component (A) other than aminophenol type epoxy resin liquid bisphenol A type epoxy resin, liquid bisphenol F type epoxy resin, liquid naphthalene type epoxy resin, liquid hydrogenated bisphenol type epoxy resin, liquid alicyclic epoxy resin, liquid type Examples include alcohol ether type epoxy resins, liquid cycloaliphatic type epoxy resins, liquid fluorene type epoxy resins, liquid siloxane type epoxy resins, etc., liquid bisphenol A type epoxy resins, liquid bisphenol F type epoxy resins, and liquid siloxane type epoxy resins. From the viewpoint of curability, heat resistance, adhesion, and durability.
- the epoxy equivalent is preferably 80 to 250 g / eq from the viewpoint of viscosity adjustment.
- Nippon Steel Chemical's bisphenol A type epoxy resin product name: YDF8170
- Nippon Steel Chemical's bisphenol F type epoxy resin product name: YDF870GS
- DIC naphthalene type epoxy resin product name: HP4032D
- Shin-Etsu examples include chemical siloxane-based epoxy resins (product name: TSL9906).
- Components (A) other than the aminophenol-type epoxy resin may be used alone or in combination of two or more.
- the aminophenol type epoxy resin is contained in an amount of 10.0 to 70 parts by weight with respect to 100 parts by weight of the component (A) from the viewpoint of injectability and suppression of fillet cracks.
- the aminophenol type epoxy resin is less than 10.0 parts by mass, the injectability is deteriorated and fillet cracks are easily generated.
- the aminophenol type epoxy resin exceeds 70 parts by mass, the glass transition of the cured liquid epoxy resin composition The point becomes too high, fillet cracks are likely to occur, and the reliability is lowered.
- the aminophenol type epoxy resin is 10.0 to 70 parts by weight, the crosslink density of the liquid epoxy resin composition after curing is increased, the rigidity of the bond of the component (A) is maintained, and the fillet crack is extended.
- the aminophenol type epoxy resin is added excessively, the rigidity of the bond of the component (A) is weakened, and the fillet crack of the liquid epoxy resin composition after curing is likely to extend. It is done.
- Component (B) imparts good reactivity (curing speed) and moderate viscosity to the liquid epoxy resin composition.
- any component having at least one active hydrogen capable of addition reaction with an epoxy group in the molecule may be used.
- aliphatic amine compounds such as diethylenetriamine, triethylenetetramine, n-propylamine, 2-hydroxyethylaminopropylamine, cyclohexylamine, 4,4′-diamino-dicyclohexylmethane; 4,4′- Aromatic amine compounds such as diaminodiphenylmethane and 2-methylaniline; imidazole compounds such as imidazole, 2-methylimidazole, 2-ethylimidazole and 2-isopropylimidazole; imidazoline compounds such as imidazoline, 2-methylimidazoline and 2-ethylimidazoline An aromatic amine compound is preferable from the viewpoint of liquidity and storage stability.
- (B) component is represented by chemical formulas (2) to (4):
- the amine-based curing agent represented by at least one of the above is included from the viewpoint of being liquid and storage stability.
- (B) component ALBEMARLE Co., Ltd. , Ltd., Ltd. Diethyltoluenediamine (compound of chemical formula (2), product name: Etacure 100), Nippon Kayaku amine curing agent (compound of chemical formula (3), product name: HDAA), ADEKA amine curing agent (chemical formula (4 ), Product name: EH105L).
- a component may be individual or may use 2 or more types together.
- the linear expansion coefficient of the liquid epoxy resin composition can be controlled by the component (C).
- the component (C) include colloidal silica, hydrophobic silica, fine silica, and nano silica.
- the average particle diameter of component (C) (or the average maximum diameter if not granular) is not particularly limited, but when it is 0.1 to 3 ⁇ m, component (C) is uniformly distributed in the liquid epoxy resin composition. It is preferable to disperse in the range of 0.3 to 2.0 ⁇ m. Moreover, it is preferable for reasons such as excellent injectability of the liquid epoxy resin composition. If it is less than 0.1 ⁇ m, the viscosity of the liquid epoxy resin composition increases and the injectability may be deteriorated.
- the component (C) preferably contains nanosilica having an average particle diameter of 10 to 100 nm from the viewpoint of bleeding.
- the average particle diameter of the filler is measured by a dynamic light scattering nanotrack particle size analyzer.
- a component may be individual or may use 2 or more types together.
- component (D) component provides adhesiveness to a liquid epoxy resin composition.
- component (D) 3-glycidoxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, vinyltrimethoxysilane, 3-triethoxysilyl-N- (1,3-dimethyl-butylidene) propylamine, p-styryltrimethoxysilane, 3-methacryloxypropylmethyltrimethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, bis (triethoxysilylpropyl) tetra And sulfide, 3-isocyanatopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-triethoxysilyl-N- (1,
- a component may be individual or may use 2 or more types together.
- the component (B) is in a ratio of 0.7 to 1.2 equivalents and preferably in a ratio of 0.7 to 1.0 equivalents to 1 equivalent of the component (A).
- the equivalent of (A) component is an epoxy equivalent
- the equivalent of (B) component is an amine equivalent.
- it is 0.7 or more, the reactivity, moisture resistance reliability of the liquid epoxy resin composition after curing, and migration resistance are good.
- it is 1.2 or less, the viscosity increase ratio does not become too high. , The generation of voids is suppressed.
- the component (C) is preferably 55 to 75 parts by mass with respect to 100 parts by mass of the liquid epoxy resin composition from the viewpoint of the linear expansion coefficient of the liquid epoxy resin composition after curing.
- the component (D) is preferably 0.05 to 5.0 parts by mass, more preferably 0.1 to 3.0 parts by mass with respect to 100 parts by mass of the component (A).
- it is 0.05 parts by mass or more, the adhesion of the liquid epoxy resin composition is improved, the moisture resistance reliability of the liquid epoxy resin composition after curing becomes better, and when it is 5.0 parts by mass or less, Foaming of the liquid epoxy resin composition is suppressed.
- the liquid epoxy resin composition further contains (E) polyalkylsiloxane (alkyl groups bonded to Si include methyl, dimethyl, ethyl, etc.), the flow characteristics of the liquid epoxy resin composition are improved. This is preferable because the fillet shape can be changed.
- the component (E) is more preferably polyalkyldimethylsiloxane.
- Toray Dow Corning polyalkyl dimethylsiloxane product name: SF8421
- a component may be individual or may use 2 or more types together.
- the liquid epoxy resin composition contains (F) a block copolymer, since the flow characteristics of the liquid epoxy resin composition can be improved and the fillet shape can be changed.
- the component (F) include block copolymers such as acrylic copolymers, and a block copolymer of methyl methacrylate and butyl acrylate is more preferable.
- Commercially available products of the component (F) include Arkema block copolymer acrylic copolymer, product name: M52N, and molecular weight: 80,000 to 100,000.
- a component may be individual or may use 2 or more types together.
- the component (E) is preferably 2 to 8 parts by mass with respect to 100 parts by mass of the liquid epoxy resin composition from the viewpoint of the fillet shape.
- the component (F) is preferably 4 to 10 parts by mass with respect to 100 parts by mass of the liquid epoxy resin composition from the viewpoint of the fillet shape.
- liquid epoxy resin composition of the present invention a curing accelerator, a clathrate compound, a leveling agent, an ion trapping agent, an antifoaming agent, a decoloring agent, an oxidation agent are further added as necessary without departing from the object of the present invention.
- Additives such as inhibitors, pigments and dyes can be blended.
- the liquid epoxy resin composition has a glass transition temperature (Tg) after curing of 110 to 200 ° C, preferably 120 to 200 ° C. If the Tg is less than 110 ° C, the strength at high temperature decreases, so the reliability in the environmental test with the maximum temperature of 110 to 120 ° C is inferior. If the Tg exceeds 200 ° C, it becomes too hard and the fret Cracks are likely to occur, and shrinkage at the time of curing increases, so that the semiconductor device is likely to warp and the water absorption rate is likely to increase.
- Tg glass transition temperature
- the liquid epoxy resin composition preferably has a viscosity of 5 to 20 Pa ⁇ s at a temperature of 25 ° C. from the viewpoint of injectability.
- the viscosity is measured with a Brookfield HBT viscometer (model number: DV-I).
- the epoxy resin composition of the present invention is suitable for a liquid semiconductor encapsulant using flip chip bonding having a fine pitch wiring pattern in which the gap between the chip and the substrate is 5 to 25 ⁇ m.
- the component (D) is dispersed in the component (A) excluding the aminophenol type epoxy resin to form a master batch, and then the amino batch type epoxy resin is added to the master batch.
- the component (B) is mixed.
- (D) Component is dispersed in (A) component excluding aminophenol-type epoxy resin, and a master batch is used to separate (D) component in liquid epoxy resin composition, (D) component and aminophenol As compared with the case where all raw materials are mixed at the same time, the liquid epoxy resin composition can be easily produced.
- the component (A) excluding the aminophenol type epoxy resin mixed with the component (D) is 10 to 1000 parts by mass with respect to 100 parts by mass of the component (C).
- the amount is 50 to 500 parts by mass.
- a master batch When producing a master batch, it can be obtained by stirring, melting, mixing, and dispersing while applying heat treatment if necessary.
- the mixing, stirring, dispersing and the like devices are not particularly limited, and a raikai machine equipped with a stirring and heating device, a three-roll mill, a ball mill, a planetary mixer, a bead mill and the like can be used. . Moreover, you may use combining these apparatuses suitably.
- the mixing order is not particularly limited.
- the mixing method may be the same as that for producing a master batch.
- the liquid epoxy resin composition of the present invention is formed and applied at a desired position on the substrate by a dispenser, printing or the like.
- the liquid epoxy resin composition is formed between a substrate such as a flexible wiring substrate and a semiconductor element so that at least a part thereof is in contact with the wiring of the substrate.
- the liquid resin composition of the present invention is preferably cured at 90 to 170 ° C. for 60 to 180 minutes. Particularly, curing within 120 minutes is preferable from the viewpoint of productivity improvement as a sealant used in a semiconductor device.
- liquid semiconductor sealant The liquid semiconductor encapsulant of the present invention is suitable as a liquid semiconductor encapsulant for flip chip type semiconductor devices containing the above-described liquid epoxy resin composition and having a gap between the chip and the substrate of 5 to 25 ⁇ m.
- the semiconductor device of the present invention is sealed using the above-mentioned liquid semiconductor sealing agent. Any desired semiconductor element and substrate can be used, but a flip-chip semiconductor device having a gap between the chip and the substrate of 5 to 25 ⁇ m is suitable for exhibiting the effects of the present invention. In addition, the effect of the present invention can be exhibited also for a flip chip type semiconductor device including a copper pillar.
- Example 1 to 14 Comparative Examples 1 to 6
- resin composition a liquid epoxy resin composition (hereinafter referred to as “resin composition”) was prepared by dispersing using a three-roll mill at room temperature.
- component (D) was mixed with the component (A) and the component (C) excluding the aminophenol type epoxy resin at room temperature, and then dispersed with a three-roll mill to obtain a master batch.
- the aminophenol type epoxy resin and the component (B) were mixed in a master batch at room temperature and then dispersed by a three-roll mill.
- FIG. 1 the schematic diagram explaining the injection
- a test piece was prepared in which a gap 40 of 50 ⁇ m or 25 ⁇ m was provided on a substrate 20 and a glass plate 30 was fixed instead of a semiconductor element.
- a glass substrate was used instead of the flexible substrate.
- this test piece is placed on a hot plate set at 110 ° C., and as shown in FIG. 1 (B), the prepared resin composition 10 is applied to one end side of the glass plate 30, and FIG. ), The time until the gap 40 was filled with the resin composition 11 was measured.
- Tables 1 to 3 show the results.
- Tg glass transition point
- FIG. 2 is a photograph of a portion where no fillet crack is generated.
- FIG. 3 is a photograph of a location where the amount of fillet cracks generated is suppressed using the present invention. In FIG. 3, the locations (three locations) where the fillet crack has occurred are indicated by arrows.
- FIG. 4 is a photograph of a location where a large amount of fillet cracks occurred. In FIG. 4, the location (seven locations) where the fillet crack has occurred is indicated by an arrow.
- the component (D) is a master batch with the component (A) excluding the aminophenol type epoxy resin, and then the aminophenol type epoxy resin is added to the master batch and the component (B).
- Example 14 which was mixed at room temperature, the storage characteristics of the liquid epoxy resin composition were better than those in the other examples.
- Comparative Example 1 containing no aminophenol epoxy resin the rate of occurrence of fillet cracks was high.
- Comparative Examples 2 to 4 in which the content of the aminophenol epoxy resin was too low, the injectability at a gap of 20 ⁇ m was poor and the rate of occurrence of fillet cracks was also high.
- Comparative Example 5 in which the content of aminophenol epoxy resin was too high, the glass transition point was too high, the reliability could not be ensured, and the rate of occurrence of fillet cracks was also high.
- Comparative Example 6 in which the equivalent ratio of the component (B) is low and the glass transition point is too low, the glass transition point is too low and reliability cannot be ensured.
- the liquid epoxy resin composition of the present invention is excellent in injectability into a flip-chip type semiconductor device having a fine pitch wiring pattern and can suppress fillet cracks after curing. Suitable for stopping agent.
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CN201580047046.1A CN106687496A (zh) | 2014-12-12 | 2015-12-03 | 液态环氧树脂组合物、半导体封装剂、半导体装置和液态环氧树脂组合物制造方法 |
KR1020177005859A KR102352908B1 (ko) | 2014-12-12 | 2015-12-03 | 액상 에폭시 수지 조성물, 반도체 밀봉제, 반도체 장치, 및 액상 에폭시 수지 조성물의 제조 방법 |
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Cited By (2)
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WO2018181603A1 (ja) * | 2017-03-31 | 2018-10-04 | 日立化成株式会社 | 液状エポキシ樹脂組成物、半導体装置及び半導体装置の製造方法 |
KR20200023312A (ko) | 2017-06-29 | 2020-03-04 | 히타치가세이가부시끼가이샤 | 밀봉용 수지 조성물, 반도체 패키지 및 반도체 패키지의 제조 방법 |
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JP2018119032A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社ダイセル | 光反射用硬化性樹脂組成物及びその硬化物、並びに光半導体装置 |
JP6929069B2 (ja) * | 2017-01-23 | 2021-09-01 | 株式会社ダイセル | 光反射用硬化性樹脂組成物及びその硬化物、並びに光半導体装置 |
WO2018135557A1 (ja) * | 2017-01-23 | 2018-07-26 | 株式会社ダイセル | 硬化性エポキシ樹脂組成物 |
KR20190104063A (ko) * | 2017-01-23 | 2019-09-05 | 주식회사 다이셀 | 광반사용 경화성 수지 조성물 및 그의 경화물, 그리고 광반도체 장치 |
JP6920723B2 (ja) * | 2017-07-14 | 2021-08-18 | ナミックス株式会社 | 加圧実装用ncf |
CN110527046A (zh) * | 2019-08-19 | 2019-12-03 | 湖北三选科技有限公司 | 改质双胺型苯并恶嗪树脂及制备方法、及其在液态晶圆级封装材料中作为应力释放剂的应用 |
JP7099490B2 (ja) * | 2020-05-07 | 2022-07-12 | 昭和電工マテリアルズ株式会社 | 封止用液状樹脂組成物及び電子部品装置 |
CN112457808A (zh) * | 2020-11-20 | 2021-03-09 | 湖北三选科技有限公司 | 氮化镓功率器件用低翘曲高接着力液态模封胶及制备方法 |
KR102625325B1 (ko) * | 2021-08-11 | 2024-01-16 | 한국생산기술연구원 | 자가치유 가능한 에폭시접착제 |
WO2023140154A1 (ja) * | 2022-01-18 | 2023-07-27 | パナソニックIpマネジメント株式会社 | 液状封止用樹脂組成物及び半導体装置 |
WO2024075342A1 (ja) * | 2022-10-07 | 2024-04-11 | ナミックス株式会社 | エポキシ樹脂組成物、半導体装置、及び半導体装置の製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006016429A (ja) * | 2004-06-30 | 2006-01-19 | Shin Etsu Chem Co Ltd | 半導体封止用エポキシ樹脂組成物 |
JP2012162585A (ja) * | 2011-02-03 | 2012-08-30 | Namics Corp | 半導体樹脂封止材 |
JP2013001811A (ja) * | 2011-06-16 | 2013-01-07 | Hitachi Chemical Co Ltd | 電子部品用樹脂組成物及び電子部品装置 |
JP2014227465A (ja) * | 2013-05-22 | 2014-12-08 | 京セラケミカル株式会社 | 射出成形用液状樹脂組成物および半導体装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100655056B1 (ko) * | 2003-12-30 | 2006-12-06 | 제일모직주식회사 | 반도체 소자 밀봉용 액상 에폭시 수지 조성물 |
TW200948888A (en) * | 2008-04-16 | 2009-12-01 | Henkel Corp | Flow controllable B-stageable composition |
US20110253943A1 (en) * | 2010-04-19 | 2011-10-20 | Trillion Science, Inc. | One part epoxy resin including a low profile additive |
JP5593259B2 (ja) | 2011-03-16 | 2014-09-17 | ナミックス株式会社 | 液状エポキシ樹脂組成物 |
JP5862176B2 (ja) * | 2011-10-06 | 2016-02-16 | 日立化成株式会社 | 液状エポキシ樹脂組成物の選択方法及び製造方法、並びに電子部品装置の製造方法 |
-
2014
- 2014-12-12 JP JP2014252471A patent/JP6969729B2/ja active Active
-
2015
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- 2015-12-03 KR KR1020177005859A patent/KR102352908B1/ko active IP Right Grant
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006016429A (ja) * | 2004-06-30 | 2006-01-19 | Shin Etsu Chem Co Ltd | 半導体封止用エポキシ樹脂組成物 |
JP2012162585A (ja) * | 2011-02-03 | 2012-08-30 | Namics Corp | 半導体樹脂封止材 |
JP2013001811A (ja) * | 2011-06-16 | 2013-01-07 | Hitachi Chemical Co Ltd | 電子部品用樹脂組成物及び電子部品装置 |
JP2014227465A (ja) * | 2013-05-22 | 2014-12-08 | 京セラケミカル株式会社 | 射出成形用液状樹脂組成物および半導体装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018181603A1 (ja) * | 2017-03-31 | 2018-10-04 | 日立化成株式会社 | 液状エポキシ樹脂組成物、半導体装置及び半導体装置の製造方法 |
KR20200023312A (ko) | 2017-06-29 | 2020-03-04 | 히타치가세이가부시끼가이샤 | 밀봉용 수지 조성물, 반도체 패키지 및 반도체 패키지의 제조 방법 |
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TW201629117A (zh) | 2016-08-16 |
KR20170094115A (ko) | 2017-08-17 |
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