WO2016063915A1 - 光学素子、光学複合素子及び保護フィルム付光学複合素子 - Google Patents
光学素子、光学複合素子及び保護フィルム付光学複合素子 Download PDFInfo
- Publication number
- WO2016063915A1 WO2016063915A1 PCT/JP2015/079709 JP2015079709W WO2016063915A1 WO 2016063915 A1 WO2016063915 A1 WO 2016063915A1 JP 2015079709 W JP2015079709 W JP 2015079709W WO 2016063915 A1 WO2016063915 A1 WO 2016063915A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical element
- recesses
- protrusions
- optical
- domains
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Definitions
- the present invention relates to an optical element, an optical composite element, and an optical composite element with a protective film.
- This application includes Japanese Patent Application No. 2014-217151 filed in Japan on October 24, 2014, Japanese Patent Application No. 2014-220231 filed in Japan on October 29, 2014, and October 29, 2014. Claiming priority based on Japanese Patent Application No. 2014-220232 filed in Japan and Japanese Patent Application No. 2015-101968 filed in Japan on May 19, 2015, the contents of which are here Incorporate.
- a film-like antireflection structure for improving visibility is often provided on the surface of a display such as a personal computer.
- This method uses the principle of a so-called moth eye (registered trademark) structure.
- the moth-eye structure is intended to prevent reflection by continuously changing the refractive index with respect to incident light in the thickness direction of the substrate, thereby eliminating the discontinuous interface of the refractive index.
- an antireflection structure can realize high antireflection performance if the refractive index with respect to incident light can be continuously changed. Therefore, in principle, the antireflection structure is not limited to a minute convex portion, and may be constituted by a minute concave portion.
- the antireflection performance of the antireflection structure increases when the refractive index change is more gradual. For this reason, it is preferable that the ratio of the height or depth (hereinafter referred to as aspect ratio) to the width of the structure of the fine protrusions or recesses is large.
- Patent Document 1 describes that by giving a specific variation in the height of the convex portion of the concavo-convex structure, it is possible to suppress the reflection color from becoming strong while suppressing the ratio of the convex portion having a high aspect ratio in the concavo-convex structure. Has been.
- the antireflection structure having fine convex portions or concave portions also has a problem that a fine foreign matter adheres between the convex portions or in the concave portions and the antireflection effect is impaired.
- Patent Document 2 describes a fine concavo-convex structure in which the water contact angle on the surface of the fine concavo-convex structure is 140 ° or more, making it difficult for water stains to adhere.
- the optical element described in Patent Document 2 is effective for water-soluble dirt such as dirty water, but is not effective for oily dirt such as human sebum and hand cream. Further, the antireflection performance was not sufficient.
- This invention is made
- an optical element excellent in antireflection performance and antifouling property can be obtained by forming a protruding portion that protrudes in the opposite direction to the plurality of recessed portions.
- An optical element according to an aspect of the present invention is an optical element having a plurality of recesses arranged on the surface at a mode pitch equal to or less than a wavelength of light under a use environment, and the optical element includes the plurality of There are a plurality of domains in which the recesses are arranged in a predetermined arrangement in plan view, and a plurality of protrusions are formed in a region sandwiched between the plurality of domains and / or a region surrounded by the plurality of recesses in the domain, The area ratio occupied by the plurality of protrusions in a plan view is 1% to 15%.
- the mode height of the plurality of protrusions may be not less than 0.2 times and not more than 0.8 times the mode depth of the plurality of recesses. Good.
- the number of concave portions adjacent to any of the plurality of protrusions is 10% or more to the total number of the plurality of concave portions. % Or less.
- the plurality of projecting portions includes a mountain-shaped projecting portion in which the adjacent projecting portions are partially connected. May be.
- the domains may be randomly arranged in a plan view.
- An optical composite element includes the optical element according to any one of (1) to (5) above, the plurality of concave portions and the plurality of protruding portions of the optical element.
- the surface to be formed further includes a first coating layer reflecting the shapes of the plurality of recesses and the plurality of protrusions.
- An optical composite element includes the optical element according to any one of (1) to (5), the plurality of recesses, and the plurality of protrusions of the optical element.
- the surface to be formed further includes a second coating layer that fills the entire shape of the plurality of recesses and the plurality of protrusions.
- An optical composite element includes the optical element according to any one of (1) to (5), the plurality of recesses, and the plurality of protrusions of the optical element.
- the surface to be formed has a protective film in contact with the plurality of protrusions.
- An optical composite element with a protective film according to an aspect of the present invention is the optical composite element according to (6) above, and a portion that covers the protruding portion of the first coating layer of the optical composite element Having a protective film in contact with.
- the optical element according to an embodiment of the present invention has a protruding portion that protrudes in the opposite direction to the plurality of recessed portions, whereby an optical element excellent in antireflection performance and antifouling property can be obtained.
- FIG. 1 It is a top view which shows typically the optical element which concerns on 1 aspect of this invention. It is a cross-sectional schematic diagram which cut
- FIG. 1 is a plan view schematically showing an optical element according to one aspect of the present invention.
- a plurality of concave portions h1 to hn are formed on one surface of the optical element 1.
- a plurality of recesses h1 ⁇ hn is divided into a plurality of domains C 1 ⁇ C n in plan view.
- a plurality of protrusions d1 to dn are formed in a part of the region sandwiched between the plurality of domains C 1 to C n and / or the region surrounded by the plurality of recesses h1 to hn in the domain.
- Grid orientation recess h1 ⁇ hn in the optical element 1 is are aligned in among the areas C 1 ⁇ C n, not aligned macroscopically. Therefore, it has a structure like a polycrystalline structure.
- the plurality of recesses h 1 to hn are arranged in a predetermined arrangement.
- the predetermined arrangement is preferably a triangular lattice as shown in FIG.
- the triangular lattice shape means that the center points of three adjacent concave portions are aligned in a positional relationship where the three vertexes of a substantially regular triangle are formed.
- the positional relationship that is the three vertices of a substantially equilateral triangle specifically refers to a relationship that satisfies the following conditions.
- a line segment L1 having a length equal to the most frequent pitch P is drawn in the direction from the center point t1 of one recess h1 to the center point t2 of the adjacent recess h2.
- a line segment L2 having a length equal to the most frequent pitch P is drawn from the center point t1 in the direction of 60 ° with respect to the line segment L1.
- the center points t1 to tn of the recesses h1 to hn are obtained as follows. A plurality of contour lines are drawn every 20 nm for each of the recesses h1 to hn in parallel with the reference plane corrected for inclination from the measurement result of the AFM (atomic force microscope), and the center of gravity of each contour line (a point determined by the x coordinate and the y coordinate) ) The average positions of these barycentric points (the positions determined by the average of the x coordinates and the average of the y coordinates) are the center points t1 to tn of the recesses h1 to hn.
- the most frequent pitch P is a distance between adjacent recesses, and can be specifically obtained as follows. First, an AFM image is obtained for a region selected at random on the optical element 1 and having a square region whose side is 30 to 40 times the most frequent pitch P. For example, when the most frequent pitch is about 300 nm, an image of an area of 9 ⁇ m ⁇ 9 ⁇ m to 12 ⁇ m ⁇ 12 ⁇ m is obtained. Then, this image is waveform-separated by Fourier transform to obtain an FFT image (fast Fourier transform image). Next, the distance from the zero-order peak to the primary peak in the profile of the FFT image is obtained.
- FFT image fast Fourier transform image
- each region is preferably selected at least 1 mm apart, more preferably 5 mm to 1 cm apart.
- the most frequent pitch of the recesses h1 to hn is equal to or less than the wavelength of light in the use environment.
- the most frequent pitch is preferably 50 nm to 300 nm. If the most frequent pitch is 50 nm or more, the shape can be easily formed by injection molding or nanoimprint. If the most frequent pitch is 300 nm or less, a good antireflection effect can be obtained.
- the mode Q (mode of each area) of each domain C 1 to C n is preferably in the following range.
- the modal area Q is in the AFM image measurement range of 10 [mu] m ⁇ 10 [mu] m, is preferably 0.026 ⁇ m 2 ⁇ 6.5 ⁇ m 2.
- the modal area Q is in the AFM image measurement range of 10 [mu] m ⁇ 10 [mu] m, is preferably 0.65 ⁇ m 2 ⁇ 26 ⁇ m 2.
- most frequent pitch P is not less than 1 [mu] m
- most frequent area Q is in the AFM image measuring range of 50 [mu] m ⁇ 50 [mu] m, is preferably 2.6 ⁇ m 2 ⁇ 650 ⁇ m 2. If the most frequent area Q is within a preferable range, it is easy to prevent the problem that the viewing angle dependency of the antireflection performance is increased.
- each domain C 1-in C n is preferably 3 to a 1000, and more preferably from 7 to 500.
- Each of the domains C 1 to C n may have the same predetermined shape or different shapes. From the viewpoint of suppressing the occurrence of interference fringes and the like, each of the domains C 1 to C n preferably has a different shape.
- the domains C 1 to C n are preferably randomly arranged in area, shape, and lattice orientation. Specifically, the degree of randomness of the area preferably satisfies the following conditions.
- the standard deviation of ⁇ ab in the 10 ⁇ m ⁇ 10 ⁇ m AFM image measurement range is preferably 0.08 ⁇ m 2 or more.
- the standard deviation of ⁇ ab in the AFM image measurement range of 10 ⁇ m ⁇ 10 ⁇ m is preferably 1.95 ⁇ m 2 or more.
- the standard deviation of ⁇ ab in the AFM image measurement range of 50 ⁇ m ⁇ 50 ⁇ m is preferably 8.58 ⁇ m 2 or more.
- the standard deviation of ⁇ ab is within a preferable range, the effect of averaging the reflected light is excellent, and the problem that the viewing angle dependency of the antireflection performance becomes high can be easily prevented.
- the degree of randomness of the shape of each domain C 1 to C n is preferably such that the ratio of a to b and the standard deviation of a / b in the formula (1) are 0.1 or more.
- FIG. 2 is a schematic cross-sectional view of an optical element according to an aspect of the present invention cut along a straight line connecting the center points of any adjacent concave portions.
- the recesses h1 to hn are voids formed below the standard surface N in the figure.
- the standard plane N is a plane parallel to the reference plane obtained by the AFM tilt correction, and is a plane at the surface most frequent height position of the recess obtained from the AFM.
- the height information of the recesses obtained from the AFM includes the bottom mode height and the surface mode height.
- the bottom mode height and surface mode height are obtained by the following procedure.
- a cross section passing through the center point of two adjacent concave portions arbitrarily selected is obtained by AFM.
- the position information of the deepest point of the two recesses and the position information of the highest point of the protruding portion between the two recesses are obtained.
- the same operation is performed at any 25 locations. By performing this operation, the position information of the deepest point of the concave portion is obtained at 50 locations, and the position information of the highest point of the protruding portion is obtained at 25 locations.
- Histogram of the obtained position information and fitting with a Gaussian function provides the most frequent position information of the deepest point of the recess and the most frequent position information of the highest point of the protruding portion.
- the most frequent position information of the deepest point of the recess is the bottom most frequent height
- the most frequent position information of the highest point of the protruding portion is the most frequent surface height.
- the mode depth of the recesses h1 to hn is also measured in the same procedure. From the cross section of the AFM, the position information of the deepest point of the two recesses and the difference between the position information of the highest point of the protruding portion between the two recesses (depth of the recess) are measured. The same operation is performed at any 25 points, a histogram is formed, and fitting is performed using a Gaussian function. The mode depth D of the recess is calculated by fitting a Gaussian function. At this time, the standard deviation 1 ⁇ of the depth of the recess is also obtained.
- the most frequent depth of the recesses h1 to hn is preferably 100 to 500 nm. If the most frequent depth is 500 nm or less, transfer failure hardly occurs in injection molding or nanoimprinting, and it can be easily produced. If the mode depth is 100 nm or more, good antireflection performance can be obtained.
- the standard deviation 1 ⁇ of the depth of the recess corresponds to the coefficient of variation of the depth of the recess.
- the coefficient of variation is preferably less than 8%, and more preferably less than 5%. By setting the coefficient of variation within this range, voids are less likely to occur when filling a mold with material by injection molding or nanoimprint.
- the protrusions d1 to dn are defined as follows.
- a surface that is translated from the standard surface N to the opposite side of the optical element 1 by a standard deviation 1 ⁇ of the depth of the recess is defined as a specified surface M.
- a portion protruding from the standard surface N at the position on the opposite side to the recesses h1 to hn is defined as the protrusions d1 to dn.
- the protrusion has a height that is greater than the standard deviation 1 ⁇ of the recess from the standard surface N.
- the mode height H of the protrusions d1 to dn is preferably 0.2 to 0.8 times the mode depth of the recesses h1 to hn, preferably 0.3 to 0.5 times. More preferably.
- the mode height of the protrusions d1 to dn means the mode value of the height H from the standard surface N to the apex of the protrusions d1 to dn.
- the mode height H of the protrusions d1 to dn can be obtained by measuring the height of any 25 protrusions d1 to dn and obtaining the mode value.
- Arbitrary 25 protrusions d1 to dn are arbitrarily extracted from a plurality of AFM images each having a square shape whose side is 30 to 40 times the most frequent pitch P.
- the mode height H of the protrusions d1 to dn is within this range, an optical element having high scratch resistance and antireflection performance can be obtained.
- the refractive index can be changed stepwise to further improve the antireflection performance. Further, by setting the most frequent height of the protrusions d1 to dn to a predetermined height or less, it is possible to suppress the aspect ratio of the protrusions d1 to dn from becoming too high, and to improve the scratch resistance.
- the shape of the protrusions d1 to dn is preferably such that the cross-sectional area decreases continuously or stepwise as it protrudes to the opposite side of the recesses h1 to hn.
- the side surface da of the projecting portions d1 to dn is continuous with the inclined surface ha constituting the recessed portions h1 to hn in a sectional view.
- continuous means that no bending or the like occurs on the inclined surface at the connection portion between the side surface da of the projecting portions d1 to dn and the inclined surface ha constituting the concave portions h1 to hn.
- a tangent line can be drawn at the connection part in a cross-sectional view.
- the shapes of the recesses h1 to hn are continuous or stepwise as the area ratio occupied by the optical element 1 in the cut surface is directed to the bottom of the recesses h1 to hn. It is preferable to be larger. In other words, it is preferable that the size of the gap forming the concave portion is continuously or stepwise reduced toward the bottom. Specific examples include a conical shape, a truncated cone, a hemisphere, a spindle, and a combination thereof.
- the projecting portions d1 to dn are, when viewed in plan, a boundary region of the domains C 1 to C n and / or a region surrounded by a plurality of recesses h1 to hn in each of the domains C 1 to C n .
- the protrusion when a protrusion exists in the boundary region between the domains C 1 to C n , the protrusion is often surrounded by four or more recesses. In this case, as shown by reference sign d4, adjacent protrusions may be partially connected.
- the projecting portion thus connected is referred to as a mountain-shaped projecting portion d4.
- the mountain-shaped protrusion d4 is structurally strong because adjacent protrusions are connected to each other. Therefore, the scratch resistance of the optical element 1 can be improved by having the mountain-shaped protrusion 4. In addition, damage or the like in the manufacturing process can be suppressed.
- Protruding portion present in the area surrounded by the plurality of recesses h1 ⁇ hn in each domain C 1 ⁇ C n is often surrounded by three recesses. This is because the protrusions formed in the domain are often formed by local disturbance of the arrangement of the recesses. As shown by reference numerals d2 and d3, the protrusions formed in this part often exist independently and have a conical shape.
- the cone shape may be any shape such as a cone shape, a triangular pyramid shape, a quadrangular pyramid shape, or a hexagonal pyramid shape.
- the area ratio occupied by the protrusions d1 to dn is preferably 1% to 15%, and more preferably 5% to 10%.
- the boundary portion the uneven shape for obtaining a gentle refractive index change is disturbed, so that the boundary portion causes reflection.
- the antireflection performance can be enhanced by providing the protrusions d1 to dn at this portion.
- the protrusions d1 to dn are not present on the entire surface, it is possible to suppress the dirt from adhering to the surface of the optical element 1.
- the size of dirt adhering to the surface of the optical element is larger than that of the recesses h1 to hn.
- the dirt adhering to the surface of the optical element having the protrusions d1 to dn is supported by the tips of the standing protrusions d1 to dn and does not adhere to the entire surface of the optical element. Therefore, the contact area between the dirt and the optical element 1 can be reduced, and the attached dirt can be easily removed.
- the area ratio of the protrusions d1 to dn in plan view is the ratio of the area occupied by the protrusions d1 to dn on the standard surface N. Specifically, the following procedure is used. An AFM image is obtained for a region selected at random on the optical element 1 and having a square region whose side is 30 to 40 times the most frequent pitch P. The protrusions d1 to dn are extracted from the obtained AFM image. The area ratio of the protrusions d1 to dn is calculated by obtaining the area of the extracted protrusions d1 to dn on the flat surface N and dividing by the total area.
- the number of the recesses h1 to hn adjacent to the plurality of protrusions d1 to dn is preferably 10% or more and less than 80%, and preferably 20% or more and 70% or less with respect to the total number of the plurality of recesses. More preferred.
- the appearance frequency of the protrusions By setting the appearance frequency of the protrusions within this range, an optical element having high scratch resistance and antireflection performance can be obtained.
- the protrusions are connected to each other, and it is possible to avoid that the pitch of the protrusions is typically equal to or greater than the wavelength of light in the usage environment, and the deterioration of the antireflection performance can be avoided.
- the optical element 1 is manufactured by shape transfer such as injection molding or nanoimprint, it has a good releasability and can be easily manufactured.
- the large number of the recesses h1 to hn adjacent to the protrusions d1 to dn means that the protrusions d1 to dn are scattered throughout.
- the adhering dirt can be supported by the tips of the protrusions d1 to dn, and the antifouling property can be improved.
- Whether or not it is adjacent to the protrusion is determined as follows. First, a range that is separated from the outer edge portion of the standard surface N of the protruding portion by the most frequent pitch of the concave portion is drawn in plan view. If the center point of the recess exists within the range, it is determined that the recess is adjacent to the protrusion.
- the total number of the recesses h1 to hn is obtained by the following procedure. At any location of the optical element 1, square AFM images with one side being 30 to 40 times the most frequent pitch P are obtained at 25 locations. Then, the number of recesses h1 to hn in each AFM image is measured and averaged. The number of recesses h1 to hn adjacent to the protrusions is averaged by counting the number of recesses h1 to hn adjacent to the protrusions d1 to dn in each image.
- the material of the optical element 1 is not particularly limited.
- An organic substance or an inorganic substance may be used.
- an organic substance for example, a commonly used UV curable resin, thermoplastic resin, thermosetting resin, or the like can be used.
- an inorganic material Si, SiO 2 , SiON, Ni, spin-on glass, or the like can be used.
- an organometallic compound, a metal alkoxide compound, or an oxide thereof can be used.
- the optical element 1 does not need to exist alone.
- An optical composite element in which another member or layer is further provided on the optical element 1 may be used.
- a support base may be provided on the surface of the optical element 1 opposite to the surface where the recesses h1 to hn are formed.
- the support substrate may have any shape such as a film shape, a sheet shape, a plate shape, a block shape, and a lens shape, and can be changed according to the intended use.
- the material of the support base is not particularly limited.
- polyethylene terephthalate (PET), triacetyl cellulose (TAC), polycarbonate (PC), a synthetic resin such as an acrylic resin, an inorganic film such as glass or a semiconductor can be used.
- PET polyethylene terephthalate
- TAC triacetyl cellulose
- PC polycarbonate
- synthetic resin such as an acrylic resin
- an inorganic film such as glass or a semiconductor
- Polycarbonate has the advantage of high heat resistance.
- polycarbonate is inferior in workability compared with other materials, and therefore other materials may be used when the support base and the optical element are made of the same material.
- the difference in refractive index between the support substrate and the optical element is preferably small. Specifically, the refractive index difference is preferably within 0.1, and more preferably no refractive index difference (made of the same material).
- an intermediate layer having a refractive index between the support base and the optical element may be inserted between the support base and the optical element.
- the intermediate layer may have a multilayer structure in which the refractive index changes stepwise, and may also serve as an adhesive layer or an adhesive layer.
- Another antireflection treatment such as an AR treatment or an AG treatment may be performed on the surface of the support base opposite to the surface on which the optical element 1 is formed.
- the AR treatment is an antireflection method using interference between light reflected at the interface of the treatment film.
- the AR treatment can be performed by laminating a plurality of layers having different refractive indexes on one surface of the support substrate by means of dry coating such as vapor deposition or sputtering, or wet coating.
- the AG process is an antireflection process using scattering.
- AG treatment can be performed by coating a surface containing fine particles on one surface of the support substrate or increasing the surface roughness of one surface of the support substrate.
- antibacterial coating treatment, antifouling treatment, and the like may be performed.
- An optical composite element in which another antireflection treatment is performed on the surface opposite to the surface on which the optical element 1 is provided can be used as a transparent protective member for protecting the surface of a display device or the like, for example.
- a mode in which a transparent protective member is installed on the viewing side of the display device can be considered.
- the transparent protective member When the transparent protective member is installed on the viewing side of the display device, the surface of the transparent protective member that faces the display device is not exposed to the outside, so that contamination is less likely to occur. On the other hand, the surface on the viewing side of the transparent protective member is likely to be contaminated by sebum, dust or the like accompanying human contact. Therefore, it is preferable to provide an antireflection film such as an AR process or an AG process on the viewing side and the optical element 1 on the display device side.
- an antireflection film such as an AR process or an AG process
- the shape of the plurality of recesses h1 to hn and the plurality of protrusions d1 to dn is formed on the surface of the optical element 1 where the recesses h1 to hn are formed.
- a reflected first coating layer 2 may be further provided.
- “reflecting” does not need to completely reflect the shapes of the plurality of recesses h1 to hn and the plurality of protrusions d1 to dn.
- the shape change rate with respect to the shapes of the plurality of recesses h1 to hn and the plurality of protrusions d1 to dn is within 10% with respect to the extending direction of the recesses and the protrusions, and with respect to the surface direction perpendicular to the extending direction. If it is within 10%, it can be said that it is sufficiently reflected.
- the first coating layer 2 can be variously changed depending on the application.
- the antifouling property can be further improved by forming the first coating layer 2 with a monomolecular film such as fluorine.
- a monomolecular film of fluorine or the like can be obtained, for example, by applying a release agent or the like in which a polymer material containing a fluorine atom is dissolved in a solvent and drying it.
- an optical composite element 11 further having a second coating layer 3 filling the recesses h1 to hn of the optical element 1 may be used.
- a material having a lower refractive index than that of the optical element 1 can be used.
- the 2nd coating layer 3 can be obtained by apply
- the optical composite element 11 coated with the second coating layer 3 can also be used as a part of a layer structure such as a solar cell or a light emitting diode.
- a protective film or the like that covers the surface of the optical element 1 on which the concave portions h1 to hn are formed may be provided.
- the protective film covers the surface of the optical element 1 on which the recesses h1 to hn are formed so as to come into contact with the tips of the plurality of protrusions.
- the optical element 1 includes various displays (for example, liquid crystal displays, plasma displays, rear projectors, FPDs such as FEDs and OLEDs), window glasses such as show windows, display frames, various display windows, etc. in personal computers, mobile phones, digital cameras, etc. It can be used as an anti-reflective body applied to the surface of optical lenses, solar cells, optical materials constituting road / traffic signs and signboards, and it can be used as a master for a nanoimprint mold for producing such an anti-reflective body. You can also.
- various displays for example, liquid crystal displays, plasma displays, rear projectors, FPDs such as FEDs and OLEDs
- window glasses such as show windows, display frames, various display windows, etc. in personal computers, mobile phones, digital cameras, etc. It can be used as an anti-reflective body applied to the surface of optical lenses, solar cells, optical materials constituting road / traffic signs and signboards, and it can be used as a master for a nanoimprint mold for producing such an anti-reflect
- the optical element according to one embodiment of the present invention can be obtained by transferring a mold having a predetermined shape once or a plurality of times. This mold can be manufactured by using an etching mask in which a large number of particles are two-dimensionally arranged on a substrate.
- the etching mask is formed on the substrate by a method using, for example, the LB method (Langmuir-Blodget method). Specifically, a dropping step of dropping a dispersion in which particles are dispersed in a solvent onto a liquid surface in a water tank, a single particle film forming step of forming a single particle film F made of particles by volatilizing the solvent, And a transfer step of transferring the single particle film onto the substrate.
- the LB method Liangmuir-Blodget method
- a dispersion liquid is prepared by adding particles having a hydrophobic surface to a hydrophobic organic solvent composed of one or more of volatile solvents such as chloroform, methanol, ethanol, methyl ethyl ketone and the like. This dispersion is dropped onto the liquid surface of the liquid stored in the water tank (dropping step). The dropped dispersion liquid volatilizes the solvent as a dispersion medium, and the particles develop in a single layer on the liquid surface to form a two-dimensional close packed single particle film (single particle film forming step). .
- the dispersion is dropped simultaneously at a plurality of locations on the liquid surface in the water tank.
- the simultaneously dropped dispersion liquid develops in a single layer on the liquid surface around the dropped position.
- a plurality of domains in which particles are arranged in a predetermined arrangement are formed. Domains are usually irregular.
- the concave portion of the optical element corresponds to a convex portion formed on the mold surface by etching the single particle film. That is, the mode pitch of the recesses, the number of domains, the area of the domains, and the like are affected by the state of the single particle film. Therefore, the most frequent pitch of the recesses can be controlled by the average particle diameter of the particles used. Further, the number of domains, the area of the domains, and the like can be controlled by the position interval of the dispersion liquid dropped simultaneously, the dropping speed, the dropping process end time, and the like. If the time from the start of contact between domains to the end of dripping is shortened, the frequency of appearance of mountain-shaped protrusions can be increased. Narrowing the dropping interval increases the number of domains and reduces the domain area.
- the formed single particle film is transferred onto a substrate which is an etching target.
- a substrate which is an etching target.
- the specific method for transferring the single particle film onto the substrate For example, while maintaining the hydrophobic substrate substantially parallel to the single particle film, the single particle film is lowered from above to form the single particle film.
- the single particle film can be transferred to the substrate due to the affinity between the hydrophobic single particle film and the substrate.
- the single particle film transferred onto the substrate functions as a single particle etching mask.
- a substrate provided with a single-particle etching mask on one side is subjected to gas phase etching and surface processing (etching step), and a convex portion is formed on one side of the substrate.
- the etching gas passes through the gaps between the particles constituting the etching mask and reaches the surface of the substrate. Therefore, a groove is formed in that portion, and a cylinder appears at a position corresponding to each particle.
- the particles on each cylinder are gradually etched and become smaller. Therefore, a convex part is formed by continuing etching further.
- the convex portions become concave portions h1 to hn of the optical element 1 by transfer. Therefore, the shape and average depth of the recesses h1 to hn of the optical element 1 can be controlled by the etching time, the kind of etching gas, the material of the particles, the material of the substrate, and a combination thereof.
- the particles constituting the etching mask are not particularly limited.
- gold particles and colloidal silica particles can be used.
- a generally used etching gas can be used.
- Ar, SF 6 , F 2 , CF 4 , C 4 F 8 , C 5 F 8 , C 2 F 6 , C 3 F 6 , C 4 F 6 , CHF 3 , CH 2 F 2 , CH 3 F, C 3 F 8 , Cl 2 , CCl 4 , SiCl 4 , BCl 2 , BCl 3 , BC 2 , Br 2 , Br 3 , HBr, CBrF 3 , HCl, CH 4 , NH 3 , O 2 , H 2 , N 2 , CO, CO 2 and the like can be used.
- These particles and etching gas can be changed according to the substrate to be etched.
- a glass substrate is selected as the base, and these are combined, if an etching gas that is reactive with glass such as CF 4 or CHF 3 is used, The etching rate of the particles becomes relatively slow, and the glass substrate is selectively etched.
- the etching mask has a domain.
- the gap formed between the domains is larger than the gap between the particles constituting the etching mask. Therefore, in the gap portion formed between the domains, the etching proceeds more than the gap portion between the particles constituting the etching mask, and a deep recess is formed.
- the deep concave portion formed in the gap portion formed between the domains becomes a protruding portion formed in a region sandwiched between the domains C 1 to C n of the optical element 1 by transfer.
- the height of the protrusions d1 to dn can be controlled by controlling the depth of the recess mainly depending on the etching conditions.
- the projecting portion in addition to the region between the domains C 1 ⁇ C n, are also formed in the domain C 1 ⁇ C n.
- the height and frequency of appearance of the protrusions formed in the domains C 1 to C n can be controlled by the particle size variation of the particles constituting the etching mask.
- the particle variation of the particles constituting the etching mask causes the arrangement of the particles arranged in a predetermined domain in the etching mask to be disturbed. For this reason, when an etching process is performed using an etching mask having a disordered arrangement, the size of the gap between particles varies, and the progress of etching changes. In the portion where the size of the gap between particles is large, a deep recess is formed. The deep concave portions become protrusions d1 to dn formed in the domains C 1 to C n of the optical element 1 by transfer.
- the CV value (coefficient of variation) of the particle diameter is preferably 3% to 20%, and preferably 5% to 10%. It is more preferable.
- the height of the protrusions d1 to dn can also be controlled by changing the transfer conditions.
- the filling rate of the molding material into the mold is increased at the time of transfer, the filling property to the deep concave portion formed in the mold is also increased, and the height of the formed protruding portion can be increased.
- the filling rate of the molding material into the mold is lowered during the transfer, it becomes difficult to fill the molding material into the deep recess formed in the mold, and the height of the protruding portion to be formed can be lowered.
- the filling rate of the molding material into the mold can be controlled by the applied pressure, the viscosity of the molding material, the processing temperature, and the like.
- the antireflection layer having a recess is sliced into N layers from the reference point side, and is regarded as a layer structure having the first layer,..., The Nth layer from the reference point side.
- the jth layer is composed of an air region having a width q and an antireflection layer region having a width 1-q.
- the width at this time is the width of the interface with the (j ⁇ 1) th layer.
- the j-th effective refractive index in the layer n j, the thickness of this layer was d j.
- n j can be obtained from the refractive indexes n 0 , n s and the width q. d j can be determined by dividing the modal depth of the recess in the number of layers N.
- ⁇ j and ⁇ j are the following expressions (3) and (4).
- Example 2 The second embodiment is different from the first embodiment only in that the area ratio occupied by the protrusions is 2%.
- the 5 ° reflection spectrum of the optical element of Example 2 was obtained by the above simulation. The result is shown in FIG.
- Example 3 is different from Example 1 only in that the height of the protrusion is set to 30 nm.
- the 5 ° reflection spectrum of the optical element of Example 3 was obtained by the above simulation. The result is shown in FIG.
- Comparative Example 1 In Comparative Example 1, no protrusion was provided. That is, the difference from Example 1 is that the area ratio occupied by the protrusions is 0%.
- the 5 ° reflection spectrum of the optical element of Comparative Example 1 was determined by the above simulation. The result is shown in FIG.
- Comparative Example 2 Comparative Example 2 is different from Example 1 only in that the area ratio occupied by the protrusions is 18.8%.
- the 5 ° reflection spectrum of the optical element of Comparative Example 2 was determined by the above simulation. The result is shown in FIG.
- Comparative Example 3 Comparative Example 3 is different from Example 3 only in that the area ratio occupied by the protrusions is 18.8%.
- the 5 ° reflection spectrum of the optical element of Comparative Example 3 was determined by the above simulation. The result is shown in FIG.
- Comparative Example 2 and Comparative Example 3 if the area ratio of the protruding portion is too high, it is not preferable from the viewpoint of antifouling properties. This is probably because if the area ratio of the protrusions is too high, the frequency of contact between the dirt and the tips of the protrusions increases. When there is no protrusion as in Comparative Example 1, the entire standard surface of the recess comes into contact with the dirt, and in this case as well, the dirt is considered difficult to remove.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
本願は、2014年10月24日に、日本に出願された特願2014-217151号と、2014年10月29日に、日本に出願された特願2014-220231号と、2014年10月29日に、日本に出願された特願2014-220232号と、2015年5月19日に、日本に出願された特願2015-101968号と、に基づき優先権を主張し、その内容をここに援用する。
特許文献1では、凹凸構造の凸部の高さに特定のバラツキを持たせることにより、凹凸構造のうちアスペクト比が高い凸部の比率を抑えつつ、反射色が強くなることを抑制できることが記載されている。
(1)本発明の一態様に係る光学素子は、使用環境下の光の波長以下の最頻ピッチで配列する複数の凹部を一面に有する光学素子であって、前記光学素子は、前記複数の凹部が所定の配列で並ぶドメインを平面視で複数有し、複数の前記ドメインに挟まれる領域及び/または前記ドメイン内の前記複数の凹部に囲まれる領域には、複数の突出部が形成され、平面視において前記複数の突出部の占める面積率が、1%~15%である。
図1は、本発明の一態様に係る光学素子を模式的に示した平面図である。
光学素子1の一面には、複数の凹部h1~hnが形成されている。複数の凹部h1~hnは、平面視で複数のドメインC1~Cnに区分されている。複数のドメインC1~Cnに挟まれる領域及び/又はドメイン内の複数の凹部h1~hnに囲まれる領域の一部には、複数の突出部d1~dnが形成されている。
AFM(原子間力顕微鏡)の測定結果から傾き補正した基準面と平行に各凹部h1~hnについて20nm毎に複数の等高線を引き、各等高線の重心点(x座標とy座標で決定される点)を求める。これらの各重心点の平均位置(各x座標の平均とy座標の平均で決定される位点)を、凹部h1~hnの中心点t1~tnとする。
まず、光学素子1上における無作為に選択された領域で、一辺が最頻ピッチPの30~40倍の正方形の領域について、AFMイメージを得る。例えば、最頻ピッチが300nm程度の場合、9μm×9μm~12μm×12μmの領域のイメージを得る。そして、このイメージをフーリエ変換により波形分離し、FFT像(高速フーリエ変換像)を得る。ついで、FFT像のプロファイルにおける0次ピークから1次ピークまでの距離を求める。
最頻ピッチPが500nm未満の時、10μm×10μmのAFMイメージ測定範囲内における最頻面積Qは、0.026μm2~6.5μm2であることが好ましい。
最頻ピッチPが500nm以上1μm未満の時、10μm×10μmのAFMイメージ測定範囲内における最頻面積Qは、0.65μm2~26μm2であることが好ましい。
最頻ピッチPが1μm以上の時、50μm×50μmのAFMイメージ測定範囲内における最頻面積Qは、2.6μm2~650μm2であることが好ましい。
最頻面積Qが好ましい範囲内であれば、反射防止性能の視野角依存性が高くなる問題を防止しやすい。
ドメインC1~Cnのそれぞれは、同じ所定の形状であっても、異なる形状であってもよい。干渉縞等の発生を抑制する観点からは、ドメインC1~Cnのそれぞれは異なる形状であることが好ましい。
X2/a2+Y2/b2=1…(1)
最頻ピッチPが500nm以上1μm未満の時、10μm×10μmのAFMイメージ測定範囲内におけるπabの標準偏差は、1.95μm2以上であることが好ましい。
最頻ピッチPが1μm以上の時、50μm×50μmのAFMイメージ測定範囲内におけるπabの標準偏差は、8.58μm2以上であることが好ましい。
光学素子1上における無作為に選択された領域で、一辺が最頻ピッチPの30~40倍の正方形の領域について、AFMイメージを得る。得られたAFMイメージから突出部d1~dnを抽出する。抽出された突出部d1~dnの平坦面Nにおける面積を求め、全体の面積で割ることにより、突出部d1~dnの面積率が算出される。
光学複合素子の一例として、光学素子1の凹部h1~hnが形成された面と反対側の面に、支持基体を設けてもよい。支持基体は、フィルム状、シート状、プレート状、ブロック状、レンズ状等のいずれの形状でもよく、使用用途に合わせて変更することができる。
保護フィルムは複数の突出部の先端部と接触するように光学素子1の凹部h1~hnが形成された面を覆う。貼着側に粘着材料を有する保護フィルムを光学素子1に貼着する場合、複数の突出部により、光学素子1の凹部h1~hnと粘着材料とのクリアランスが保たれる。その結果、粘着材料が凹部を埋めて反射防止特性が低下することを防止できる。また保護フィルムは、図3に示す第1コーティング層2を施した光学複合素子10の凹凸面側に貼着してもよい。
以下に、光学素子の製造方法について説明する。本発明の一態様に係る光学素子は、所定の形状を有するモールドを1回又は複数回転写することで得ることができる。このモールドは、基板上に多数の粒子を2次元的に配列させたエッチングマスクを用いることで作製することができる。
単粒子膜を基板上に移し取る具体的な方法には特に制限はなく、例えば、疎水性の基板を単粒子膜に対して略平行な状態に保ちつつ、上方から降下させて単粒子膜に接触させ、疎水性である単粒子膜と基板との親和力により、単粒子膜を基板に移行させることができる。
屈折率n0の物質と、屈折率nsの物質の界面への光が入射した際の反射について考える。このとき屈折率nsの物体は、図5で示すように凹部形状を有する。
(実施例1)
突出部を有する光学素子の5°反射スペクトルを上述のシミュレーションにより求めた。その結果を図6に示す。このとき、凹部の深さは300nm、凹部のピッチ120nm、凹部の直径100nm、突出部の高さ100nm、突出部の占める面積率を15%とした。光は屈折率1.0の空気から、屈折率1.5の界面に入射角5°で入射するものとし、反射防止層の材料の屈折率も1.5とした。凹部の深さ、ピッチ、直径、及び突出部の高さはシミュレーションであるため固定値であるが、実際には最頻値に対応する。
実施例2では、突出部の占める面積率を2%とした点のみが実施例1と異なる。実施例2の光学素子の5°反射スペクトルを上述のシミュレーションにより求めた。その結果を図6に示す。
実施例3では、突出部の高さを30nmとした点のみが実施例1と異なる。実施例3の光学素子の5°反射スペクトルを上述のシミュレーションにより求めた。その結果を図6に示す。
比較例1では、突出部を設けなかった。すなわち、突出部の占める面積率が0%とした点が実施例1と異なる。比較例1の光学素子の5°反射スペクトルを上述のシミュレーションにより求めた。その結果を図6に示す。
比較例2では、突出部の占める面積率を18.8%とした点のみが実施例1と異なる。比較例2の光学素子の5°反射スペクトルを上述のシミュレーションにより求めた。その結果を図6に示す。
比較例3では、突出部の占める面積率を18.8%とした点のみが実施例3と異なる。比較例3の光学素子の5°反射スペクトルを上述のシミュレーションにより求めた。その結果を図6に示す。
実施例1~3及び比較例1~3のそれぞれの防汚性を試験した。防汚性の試験は以下の手順で行った。
ポリカーボネート板の表面に実施例1~3及び比較例1~3の光学素子を転写形成した。構造面の各5か所に皮脂を付着させて10分間放置した後、エタノールにより洗浄除去を行った。皮脂の残存状態を目視によって評価した。その結果を表1にまとめた。表1において「○」は皮脂の残存が確認できない場合であり、「△」は皮脂の輪郭のみが僅かに確認される場合であり、「×」は皮脂の残存が確認できる場合である。
Claims (9)
- 使用環境下の光の波長以下の最頻ピッチで配列する複数の凹部を一面に有する光学素子であって、
前記光学素子は、前記複数の凹部が所定の配列で並ぶドメインを平面視で複数有し、
複数の前記ドメインに挟まれる領域及び/または前記ドメイン内の前記複数の凹部に囲まれる領域には、複数の突出部が形成され、
平面視において前記複数の突出部の占める面積率が、1%~15%である光学素子。 - 前記複数の突出部の最頻高さが、前記複数の凹部の最頻深さの0.2倍以上0.8倍以下である請求項1に記載の光学素子。
- 前記複数の突出部のいずれかと隣接する凹部の個数が、前記複数の凹部の全個数に対し、10%以上80%以下である請求項1または2のいずれかに記載の光学素子。
- 前記複数の突出部の中に、隣接する前記突出部同士が一部で繋がった山脈状突出部を有する請求項1~3のいずれか一項に記載の光学素子。
- 前記ドメインが平面視でランダムに配置されている請求項1~4のいずれか一項に記載の光学素子。
- 請求項1~5のいずれか一項に記載の光学素子と、
前記光学素子の前記複数の凹部及び前記複数の突出部が形成される面に、前記複数の凹部及び前記複数の突出部の形状を反映した第1コーティング層をさらに有する光学複合素子。 - 請求項1~5のいずれか一項に記載の光学素子と、
前記光学素子の前記複数の凹部及び前記複数の突出部が形成される面に、前記複数の凹部及び前記複数の突出部の形状全体を埋める第2コーティング層をさらに有する光学複合素子。 - 請求項1~5のいずれか一項に記載の光学素子と、
前記光学素子の前記複数の凹部及び前記複数の突出部が形成される面に、前記複数の突出部と接触する保護フィルムと、を有する光学複合素子。 - 請求項6に記載の光学複合素子と、
前記光学複合素子の前記第1コーティング層の内、前記突出部を被覆する部分と接触する保護フィルムを有する保護フィルム付光学複合素子。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020177010900A KR20170074883A (ko) | 2014-10-24 | 2015-10-21 | 광학 소자, 광학 복합 소자 및 보호 필름이 부착된 광학 복합 소자 |
CN201580057156.6A CN107076877A (zh) | 2014-10-24 | 2015-10-21 | 光学元件、光学复合元件及附保护膜的光学复合元件 |
EP15852135.1A EP3211458B1 (en) | 2014-10-24 | 2015-10-21 | Optical element, optical composite element, and optical composite element having attached protective film |
JP2016555256A JP6642442B2 (ja) | 2014-10-24 | 2015-10-21 | 光学素子、光学複合素子及び保護フィルム付光学複合素子 |
US15/516,486 US10444407B2 (en) | 2014-10-24 | 2015-10-21 | Optical element including a plurality of concavities |
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014217151 | 2014-10-24 | ||
JP2014-217151 | 2014-10-24 | ||
JP2014220231 | 2014-10-29 | ||
JP2014-220232 | 2014-10-29 | ||
JP2014220232 | 2014-10-29 | ||
JP2014-220231 | 2014-10-29 | ||
JP2015101968 | 2015-05-19 | ||
JP2015-101968 | 2015-05-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2016063915A1 true WO2016063915A1 (ja) | 2016-04-28 |
Family
ID=55760946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2015/079709 WO2016063915A1 (ja) | 2014-10-24 | 2015-10-21 | 光学素子、光学複合素子及び保護フィルム付光学複合素子 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10444407B2 (ja) |
EP (1) | EP3211458B1 (ja) |
JP (1) | JP6642442B2 (ja) |
KR (1) | KR20170074883A (ja) |
CN (1) | CN107076877A (ja) |
TW (1) | TWI657927B (ja) |
WO (1) | WO2016063915A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018146937A (ja) * | 2017-03-09 | 2018-09-20 | マクセルホールディングス株式会社 | 光学素子 |
JP2021531517A (ja) * | 2019-03-12 | 2021-11-18 | エルジー・ケム・リミテッド | 反射防止フィルム、偏光板およびディスプレイ装置 |
WO2023188922A1 (ja) * | 2022-03-30 | 2023-10-05 | キヤノン株式会社 | 部材 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11485052B2 (en) * | 2018-07-30 | 2022-11-01 | Canon Kabushiki Kaisha | Resin product, method of making resin product, interchangeable lens, and optical device |
WO2020184865A1 (ko) * | 2019-03-12 | 2020-09-17 | 주식회사 엘지화학 | 반사 방지 필름, 편광판 및 디스플레이 장치 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008090212A (ja) * | 2006-10-05 | 2008-04-17 | Nissan Motor Co Ltd | 反射防止性光学構造、反射防止性光学構造体及びその製造方法 |
JP2011227387A (ja) * | 2010-04-22 | 2011-11-10 | Olympus Corp | 光学素子 |
WO2012091012A1 (ja) * | 2010-12-27 | 2012-07-05 | 三菱レイヨン株式会社 | 積層構造体および加工品の製造方法 |
JP2012242803A (ja) * | 2011-05-24 | 2012-12-10 | Dainippon Printing Co Ltd | 光学部材積層体の製造方法および光学的機能を有する部材の製造方法 |
WO2014092132A1 (ja) * | 2012-12-13 | 2014-06-19 | 王子ホールディングス株式会社 | 光学素子作製用金型及びその製造方法、光学素子 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4626721B1 (ja) | 2009-09-02 | 2011-02-09 | ソニー株式会社 | 透明導電性電極、タッチパネル、情報入力装置、および表示装置 |
JP2014066975A (ja) | 2012-09-27 | 2014-04-17 | Asahi Kasei E-Materials Corp | 微細凹凸成形体及び微細凹凸成形鋳型並びにそれらの製造方法 |
JP2014077040A (ja) | 2012-10-10 | 2014-05-01 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性組成物、およびそれを用いた微細凹凸構造体 |
JP2014170920A (ja) * | 2013-02-08 | 2014-09-18 | Oji Holdings Corp | 凹凸基板及び発光ダイオードの製造方法、並びに凹凸基板、発光ダイオード及び有機薄膜太陽電池 |
US20140235069A1 (en) * | 2013-02-15 | 2014-08-21 | Novellus Systems, Inc. | Multi-plenum showerhead with temperature control |
JP6176152B2 (ja) * | 2013-04-10 | 2017-08-09 | 住友金属鉱山株式会社 | 非水系電解質二次電池用正極活物質とその製造方法、および、非水系電解質二次電池 |
JP2014217151A (ja) * | 2013-04-25 | 2014-11-17 | 富士電機株式会社 | 電力変換装置およびその過電流保護方法 |
JP2015101968A (ja) * | 2013-11-21 | 2015-06-04 | トヨタ自動車株式会社 | 内燃機関の排気浄化装置 |
JP2015196313A (ja) * | 2014-03-31 | 2015-11-09 | ソニー株式会社 | 保護フィルム、積層体、表示装置および被着体 |
-
2015
- 2015-10-21 KR KR1020177010900A patent/KR20170074883A/ko not_active Application Discontinuation
- 2015-10-21 WO PCT/JP2015/079709 patent/WO2016063915A1/ja active Application Filing
- 2015-10-21 CN CN201580057156.6A patent/CN107076877A/zh active Pending
- 2015-10-21 EP EP15852135.1A patent/EP3211458B1/en active Active
- 2015-10-21 JP JP2016555256A patent/JP6642442B2/ja active Active
- 2015-10-21 US US15/516,486 patent/US10444407B2/en active Active
- 2015-10-22 TW TW104134722A patent/TWI657927B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008090212A (ja) * | 2006-10-05 | 2008-04-17 | Nissan Motor Co Ltd | 反射防止性光学構造、反射防止性光学構造体及びその製造方法 |
JP2011227387A (ja) * | 2010-04-22 | 2011-11-10 | Olympus Corp | 光学素子 |
WO2012091012A1 (ja) * | 2010-12-27 | 2012-07-05 | 三菱レイヨン株式会社 | 積層構造体および加工品の製造方法 |
JP2012242803A (ja) * | 2011-05-24 | 2012-12-10 | Dainippon Printing Co Ltd | 光学部材積層体の製造方法および光学的機能を有する部材の製造方法 |
WO2014092132A1 (ja) * | 2012-12-13 | 2014-06-19 | 王子ホールディングス株式会社 | 光学素子作製用金型及びその製造方法、光学素子 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018146937A (ja) * | 2017-03-09 | 2018-09-20 | マクセルホールディングス株式会社 | 光学素子 |
JP2021531517A (ja) * | 2019-03-12 | 2021-11-18 | エルジー・ケム・リミテッド | 反射防止フィルム、偏光板およびディスプレイ装置 |
JP7150384B2 (ja) | 2019-03-12 | 2022-10-11 | エルジー・ケム・リミテッド | 反射防止フィルム、偏光板およびディスプレイ装置 |
WO2023188922A1 (ja) * | 2022-03-30 | 2023-10-05 | キヤノン株式会社 | 部材 |
Also Published As
Publication number | Publication date |
---|---|
CN107076877A (zh) | 2017-08-18 |
EP3211458B1 (en) | 2020-07-22 |
US10444407B2 (en) | 2019-10-15 |
EP3211458A1 (en) | 2017-08-30 |
TWI657927B (zh) | 2019-05-01 |
US20170307783A1 (en) | 2017-10-26 |
JPWO2016063915A1 (ja) | 2017-08-03 |
KR20170074883A (ko) | 2017-06-30 |
TW201622974A (zh) | 2016-07-01 |
JP6642442B2 (ja) | 2020-02-05 |
EP3211458A4 (en) | 2018-06-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2016063915A1 (ja) | 光学素子、光学複合素子及び保護フィルム付光学複合素子 | |
JP5947379B2 (ja) | 反射防止構造体、その製造方法及び表示装置 | |
CN103460080B (zh) | 光学设备用遮光材料 | |
CN103998953B (zh) | 防眩性膜、偏振片和图像显示装置 | |
CN102203639A (zh) | 导电光学器件及其制造方法、触摸面板器件、显示器和液晶显示装置 | |
CN108348966A (zh) | 具有疏水性纳米织构化表面的制品 | |
JP2000071290A (ja) | 反射防止物品の製造方法 | |
US9081134B2 (en) | Substrate having low reflection and high contact angle, and production method for same | |
JP6418240B2 (ja) | 光学素子 | |
US20160313474A1 (en) | Anti-reflective structure and method for designing same | |
JP2011169961A (ja) | 親水性反射防止構造及びその製造方法 | |
JP2014123077A (ja) | 反射防止体及びその製造方法 | |
JP6046733B2 (ja) | 反射防止フィルム及びその製造方法、並びに、表示装置 | |
JP6330711B2 (ja) | 光学素子 | |
JP2014168868A (ja) | 転写型および構造体の製造方法 | |
JP2011164457A (ja) | 反射防止フィルム | |
JP6263905B2 (ja) | 透過率異方性部材、透過率異方性部材の製造方法及び表示装置 | |
TW201445176A (zh) | 抗反射基板及包含其之顯示裝置 | |
JP2015197462A (ja) | ランダムな凹凸構造による低反射フィルムおよびその作製方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 15852135 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2016555256 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 15516486 Country of ref document: US |
|
REEP | Request for entry into the european phase |
Ref document number: 2015852135 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2015852135 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref document number: 20177010900 Country of ref document: KR Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |