WO2015196613A1 - 彩膜基板及其制造方法、显示面板 - Google Patents

彩膜基板及其制造方法、显示面板 Download PDF

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WO2015196613A1
WO2015196613A1 PCT/CN2014/087909 CN2014087909W WO2015196613A1 WO 2015196613 A1 WO2015196613 A1 WO 2015196613A1 CN 2014087909 W CN2014087909 W CN 2014087909W WO 2015196613 A1 WO2015196613 A1 WO 2015196613A1
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color
layer
spacer
coating
color resist
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PCT/CN2014/087909
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English (en)
French (fr)
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孙宏达
王东方
孔祥永
王美丽
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京东方科技集团股份有限公司
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Publication of WO2015196613A1 publication Critical patent/WO2015196613A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/126—Shielding, e.g. light-blocking means over the TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Embodiments of the present invention provide a color film substrate, a method of manufacturing the same, and a display panel.
  • the white organic light-emitting diodes (WOLED)+ color filter (CF) technology adopts the top emission electroluminescence (EL) method and has the advantages of high aperture ratio.
  • An object of the present invention is to provide a color filter substrate, a method of manufacturing the same, and a display panel.
  • Embodiments of the present invention provide a color filter substrate, including a substrate, a black matrix formed on the substrate, a single layer of color resist formed in a sub-pixel region surrounded by the black matrix, and more a spacer disposed between the sub-pixel regions and an auxiliary electrode overlying the spacer, wherein the spacer includes at least a single sheet corresponding to a plurality of adjacent sub-pixel regions A color resist layer laminated with a layer color resist and a light shielding layer covering the color resist layer.
  • the spacer further includes a transition layer between the top surface of the color resistive laminate and the light shielding layer.
  • the color resist stack is a stack of at least three color resists of red color resist, green color resist, blue color resist, and transparent color resist.
  • a stack in which a single layer of color resists in adjacent sub-pixel regions are overlapped as a color resist stack is used to reduce the manufacturing time of the spacer.
  • the material of the transition layer is the same as the material of the transparent color resist.
  • the spacer is within the black matrix occlusion region.
  • the cross-sectional pattern of the spacer is a trapezoid
  • the cross-sectional pattern of the color resist laminate is trapezoidal or rectangular.
  • the material of the light shielding layer is a metal material or an opaque resin material.
  • Embodiments of the present invention provide a display panel including the color film substrate as described above.
  • the embodiment of the invention provides a method for manufacturing a color film substrate, comprising:
  • An auxiliary electrode layer is formed over the spacer.
  • the method further includes forming a transition layer on a top surface of the color resist stack prior to applying the coating of the light shielding layer.
  • forming a transition layer on a top surface of the color resist stack includes:
  • the transition layer is formed by a patterning process.
  • forming the transition layer on the top surface of the color resist stack further includes pre-baking the coating of the transition layer after coating the coating of the transition layer.
  • FIG. 1 is a schematic view showing the basic structure of a known WOLED array substrate
  • FIG. 2 is a schematic view showing the basic structure of a known WOLED color film substrate
  • FIG. 3 is a partial plan view of a color filter substrate according to an embodiment of the present invention.
  • FIG. 4 is a cross-sectional view of a color filter substrate at AA' of FIG. 3 according to an embodiment of the present invention
  • FIG. 5 is a cross-sectional view of a spacer on a color filter substrate according to an embodiment of the present invention.
  • FIG. 6 is a cross-sectional view of another color film substrate according to an embodiment of the present invention taken along line AA′ of FIG. 3 ;
  • FIG. 7 is a cross-sectional view of a spacer on another color film substrate according to an embodiment of the present invention.
  • 101 a substrate; 102, a black matrix; 103, a single layer of color resist; 104, a spacer; 105, a color resist stack; 106, a light shielding layer; 107, a transition layer; 108, an auxiliary electrode.
  • the structure of the WOLED array substrate is as shown in FIG. 1, comprising: a substrate substrate 1; a gate metal layer 2; a gate insulating layer 3; an active layer 4; an etch barrier layer 5; a source and drain metal layer 6; a passivation layer 7; a planarization layer 8; a pixel electrode layer 9, where the pixel electrode layer 9 functions as an anode material; a luminescent material 10; a cathode material 11; and a pixel defining layer 12.
  • the structure of the color filter substrate is as shown in FIG. 2, and includes a base substrate 13, a black matrix 14, a color filter 15, an insulating material layer 16, a metal wire 17, a spacer (PS) 18, and an auxiliary electrode layer 19.
  • Electrode layer In the process of forming the PS, it is necessary to form a region where the PS is placed by using a patterning process (usually in a non-pixel region, for example, between adjacent pixel regions), planarize the entire substrate, and apply a thick coating for fabrication.
  • an embodiment of the present invention provides a color filter substrate 100 including a base substrate 101, and a black matrix 102 formed on the base substrate 101, which is formed in a sub-pixel region surrounded by the black matrix 102 (for example, a red R,
  • the single-layer color resist 103 in the green G, blue B, and white W sub-pixels further includes a plurality of spacers 104, and each spacer 104 is located between adjacent sub-pixel regions.
  • a corresponding single-layer color resist 103 is disposed in different sub-pixel regions.
  • a red color resist is set in the red sub-pixel region
  • a green color resist is set in the green sub-pixel region
  • a blue color resist is disposed in the blue sub-pixel region
  • the white sub-pixel region is disposed.
  • the color filter substrate 100 includes a base substrate 101, a black matrix 102, a single-layer color resist 103 corresponding to the sub-pixel region, and a color formed by the single-layer color resist 103 corresponding to the region between adjacent sub-pixels.
  • the resistive layer 105, the light shielding layer 106, and the auxiliary electrode 108 are overlaid on the spacer shown in FIG.
  • the spacer 104 shown in FIG. 3 includes at least a color resistive laminate 105 and a light shielding layer 106. Referring to FIG. 5, a schematic cross-sectional view of the spacer 104 is illustrated.
  • the spacer 104 includes at least a color resistive laminate 105 formed by overlapping a plurality of adjacent single-layer color resists 103 and a color resistive laminate 105. Shading layer 106, the light shielding layer 106 can prevent the color resistive laminate 105 from transmitting light, thereby avoiding the influence on the display effect.
  • the spacer 104 is fabricated by using the color resist stack 105 formed by overlapping the plurality of single-layer color resists 103, thereby saving the manufacturing process and manufacturing time of the spacer 104, thereby improving the color filter substrate 100. Manufacturing efficiency.
  • the spacer 104 shown in FIG. 5 may cause residue on the single-layer color resist 103 when the light-shielding layer 106 is manufactured during the manufacturing process.
  • another color filter substrate 100 is provided.
  • the color filter substrate 100 includes a base substrate 101, a black matrix 102, a single layer color resist 103, a color resist layer 105 formed by each single layer color resist 103, a transition layer 107, a light shielding layer 106, and an auxiliary electrode. 108, the auxiliary electrode 108 is covered on the spacer shown in FIG. 7;
  • FIG. 6 is a schematic cross-sectional view of the color filter substrate shown in FIG. 3 at AA', wherein the spacer 104 shown in FIG.
  • the spacer 104 includes a color resistive laminate 105 formed by overlapping a plurality of adjacent single-layer color resists 103 and a light-shielding layer 106 covering the color resistive laminate 105.
  • the light-shielding layer 106 can make the color resist layer
  • the laminate 105 does not have light transmission to avoid the influence on the display effect; and further includes a transition layer 107 between the top surface of the color resistive laminate 105 and the light shielding layer 106, and the transition layer 107 is provided to make the subsequent
  • the residue is generated on the transition layer coating in the sub-pixel region, and the transition layer coating of the sub-pixel region can be removed after the fabrication is completed, so that the single layer color resist 103 in the sub-pixel region does not There is a residue of the light shielding layer 106.
  • the color resist stack 105 is a stack of at least three of the red, green, blue, and transparent color resists.
  • a stack in which the single-layer color resists 103 in the adjacent sub-pixel regions are overlapped together is used as the color resist layer lamination 105, which is advantageous for reducing the manufacturing time of the spacers 104.
  • the material of the transition layer 107 is the same as the material of the transparent color resist.
  • the transition layer 107 does not need special materials, and can be manufactured with a transparent color resist material, and is easy to implement.
  • the spacers 104 are within the black matrix 102 occlusion range. In the embodiment of the present invention, the spacer 104 is placed within the occlusion range of the black matrix 102 to avoid affecting the pixel aperture ratio.
  • the cross-sectional pattern of the spacer 104 is trapezoidal, and the cross-sectional pattern of the color resistive laminate 105 is trapezoidal or rectangular.
  • the top surface to the bottom surface of the spacer 104 have a slope, which can improve stability.
  • the material of the light shielding layer 106 is a metallic material or an opaque resin material.
  • the beneficial effects of the embodiments of the present invention are as follows: after the single-layer color resist 103 is formed, it is not necessary to perform a manufacturing process on the region where the spacer 104 needs to be placed, and the color resistive laminate 105 directly overlapped by the plurality of single-layer color resists 103 is The base fabric spacer 104 is manufactured to save the manufacturing process and manufacturing time of the spacer 104, thereby improving the manufacturing efficiency of the color filter substrate 100.
  • the embodiment of the invention provides a display panel comprising the color filter substrate 100 provided in the above embodiment.
  • the beneficial effects of the embodiments of the present invention are as follows: after forming a single-layer color resist, it is not necessary to perform a manufacturing process on a region where the spacer needs to be placed, and the spacer is directly formed by using a plurality of single-layer color-resistance overlapping color resistive laminates.
  • the utility model saves the manufacturing process and the manufacturing time of the spacer, thereby improving the manufacturing efficiency of the color filter substrate.
  • the embodiment of the invention further provides a method for manufacturing a color film substrate, comprising:
  • Step 1 Apply a color resist coating on the base substrate, form a single layer color resist in the sub-pixel region by a patterning process, and form a color resist stack in the adjacent sub-pixel regions.
  • Step 2 coating a coating of the light shielding layer, and forming a spacer by a patterning process using a mask corresponding to the light shielding layer, the spacer comprising a color resist layer and a light shielding layer.
  • step 3 an auxiliary electrode layer is formed on the spacer.
  • 203 is further included to form a transition layer on the top surface of the color resistive laminate.
  • a transition layer is formed on the top surface of the color resist stack, including:
  • the transition layer is formed by a patterning process. It may also include pre-baking the coating of the transition layer after coating the coating of the transition layer.
  • the beneficial effects of the embodiments of the present invention are as follows: after forming a single-layer color resist, it is not necessary to perform a manufacturing process on a region where the spacer needs to be placed, and the spacer is directly formed by using a plurality of single-layer color-resistance overlapping color resistive laminates.
  • the utility model saves the manufacturing process and the manufacturing time of the spacer, thereby improving the manufacturing efficiency of the color filter substrate.

Abstract

一种彩膜基板及其制造方法和一种显示面板。彩膜基板（100）包括衬底基板（101），形成于衬底基板（101）上的黑矩阵（102）和形成于黑矩阵（102）围设的子像素区域中的单层色阻（103）；还包括多个设置于子像素区域之间的隔垫物（104）和覆盖于隔垫物（104）之上的辅助电极（108），其中隔垫物（104）至少包括由相邻的多个子像素区域对应的单层色阻（103）交叠而成的色阻叠层（105）和覆盖色阻叠层（105）的遮光层（106）。彩膜基板解决了形成隔垫物的复杂性、制造时间长的问题。

Description

彩膜基板及其制造方法、显示面板 技术领域
本发明实施例一种彩膜基板及其制造方法、显示面板。
背景技术
白光有机发光二极管(White organic light-emitting diodes，WOLED)+彩膜基板(Color Filter，CF)技术采用顶发射电致发光的(electroluminescent，EL)方式，具有开口率高等优点。
发明内容
本发明的目的是提供一种彩膜基板及其制造方法、显示面板。
本发明实施例提供一种彩膜基板，包括衬底基板，形成于所述衬底基板上的黑矩阵，形成于所述黑矩阵围设的子像素区域中的单层色阻，还包括多个设置于所述子像素区域之间的隔垫物和覆盖于所述隔垫物之上的辅助电极，其中所述隔垫物至少包括由相邻的多个所述子像素区域对应的单层色阻交叠而成的色阻叠层和覆盖所述色阻叠层的遮光层。
在一个示例中，所述隔垫物还包括过渡层，所述过渡层位于所述色阻叠层的顶面和所述遮光层之间。
在一个示例中，所述色阻叠层为红色色阻、绿色色阻、蓝色色阻和透明色阻中的至少三种色阻的叠层。本发明实施例中，以相邻的子像素区域内的单层色阻共同交叠的叠层作为所述色阻叠层，有利于减少所述隔垫物的制造时间。
在一个示例中，所述过渡层的材料与所述透明色阻的材料相同。
在一个示例中，所述隔垫物在所述黑矩阵遮挡区域内。
在一个示例中，所述隔垫物的剖面图形为梯形，所述色阻叠层的剖面图形为梯形或矩形。
在一个示例中，所述遮光层的材料为金属材料或不透明的树脂材料。
本发明实施例提供一种显示面板，包括如上所述的彩膜基板。
本发明实施例提供一种彩膜基板的制造方法，包括：
在衬底基板上涂覆色阻涂层，通过构图工艺在子像素区域中形成单层色阻，并在相邻的所述子像素区域中形成色阻叠层；
涂覆遮光层的涂层，并通过构图工艺形成隔垫物，所述隔垫物包括所述色阻叠层和所述遮光层；以及
在所述隔垫物之上形成辅助电极层。
在一个示例中，该方法还包括在涂覆遮光层的涂层之前，在所述色阻叠层的顶面上形成过渡层。
在一个示例中，在所述色阻叠层的顶面上形成过渡层，包括：
在所述色阻叠层之上涂覆所述过渡层的涂层；
通过构图工艺形成过渡层。
在一个示例中，在所述色阻叠层的顶面上形成过渡层还包括在涂覆过渡层的涂层之后，对过渡层的涂层进行前烘。
附图说明
图1为已知WOLED阵列基板基本结构示意图；
图2为已知WOLED彩膜基板基本结构示意图；
图3为本发明实施例提供的彩膜基板的局部俯视图；
图4为本发明实施例提供的一种彩膜基板在图3的AA'处的剖面图；
图5为本发明实施例提供的彩膜基板上的隔垫物的剖面图；
图6为本发明实施例提供的另一种彩膜基板在图3的AA'处的剖面图；
图7为本发明实施例提供的另一种彩膜基板上的隔垫物的剖面图。
附图标记说明：
101、衬底基板；102、黑矩阵；103、单层色阻；104、隔垫物；105、色阻叠层；106、遮光层；107、过渡层；108、辅助电极。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描 述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
已知WOLED阵列基板的结构如图1所示，包括：衬底基板1；栅极金属层2；栅极绝缘层3；有源层4；刻蚀阻挡层5；源漏极金属层6；钝化层7；平坦化层8；像素电极层9，此处像素电极层9用作阳极材料；发光材料10；阴极材料11；像素界定层12。彩膜基板的结构如图2所示，包括：衬底基板13；黑矩阵14；彩色滤光片15；绝缘材料层16；金属线17；隔垫物(PS)18；辅助电极层19。
由于WOLED+CF技术所需的工艺步骤较多，为减少ITO沉积时的颗粒数量，要求阵列基板和彩膜基板之间的间隙必须足够大，需要形成高度较高的PS并在PS上形成辅助电极层。在形成PS过程中，需要利用构图工艺形成放置PS的区域(通常是在非像素区域，例如在相邻像素区域之间)、对整个衬底基板进行平坦化、涂覆较厚的用于制造PS的涂层、利用构图工艺对该较厚的涂层进行刻蚀进行等多个步骤，其中构图工艺包括曝光、显影。因此，现有技术存在工艺复杂，且对于较厚的制造PS的涂层构图时间较长的问题，不利于提高彩膜基板的制造效率。
参见图3，本发明实施例提供一种彩膜基板100，包括衬底基板101，形成于衬底基板101上的黑矩阵102，形成于黑矩阵102围设的子像素区域(例如红色R、绿色G、蓝色B、白色W子像素)中单层色阻103，还包括多个隔垫物104，各隔垫物104位于相邻子像素区域之间。不同子像素区域内设置相应的单层色阻103，例如，红色子像素区域内设置红色色阻，绿色子像素区域设置绿色色阻，蓝色子像素区域内设置蓝色色阻，白色子像素区域内设置透明色阻。
参见图4，为图3所示的彩膜基板100在AA'处的剖面示意图。该剖面示意图中，彩膜基板100包括衬底基板101，黑矩阵102，子像素区域对应的单层色阻103，相邻的多个子像素之间的区域对应的单层色阻103形成的色阻叠层105，遮光层106，及辅助电极108，该辅助电极108覆盖于图5所示的隔垫物之上。图3中所示的隔垫物104至少包括色阻叠层105和遮光层106。参见图5，示出了隔垫物104的剖面示意图，隔垫物104至少包括由相邻的多个单层色阻103交叠而成的色阻叠层105和覆盖色阻叠层105的遮光层 106，遮光层106可以使色阻叠层105不会有光透过，避免对显示效果的影响。本发明实施例中，利用多个单层色阻103交叠而成的色阻叠层105来制造隔垫物104，节省隔垫物104的制造工序和制造时间，从而提高彩膜基板100的制造效率。
图5所示的隔垫物104，在制造过程中的遮光层106制造时，可能会造成在单层色阻103上产生残留物，为了解决这一问题，提供另一种彩膜基板100，参见图6，彩膜基板100包括衬底基板101，黑矩阵102，各单层色阻103，各单层色阻103形成的色阻叠层105，过渡层107，遮光层106，及辅助电极108，该辅助电极108覆盖于图7所示的隔垫物之上；图6为基于图3所示彩膜基板在AA'处的剖面示意图，其中，图3中所示的隔垫物104包括色阻叠层105、和遮光层106，还包括过渡层107。参图图7，隔垫物104包括由相邻的多个单层色阻103交叠而成的色阻叠层105和覆盖色阻叠层105的遮光层106，遮光层106可以使色阻叠层105不会有光透过，避免对显示效果的影响；还包括过渡层107，过渡层107位于色阻叠层105的顶面和遮光层106之间，通过设置过渡层107，使后续制造遮光层106时，残留物产生在子像素区域内的过渡层涂层上，制造完成后可以将子像素区域的过渡层涂层清除，因此子像素区域内的单层色阻103上不会有遮光层106的残留物。
在一个示例中，色阻叠层105为红色色阻、绿色色阻、蓝色色阻和透明色阻中的至少三种色阻的叠层。本发明实施例中，以相邻的子像素区域内的单层色阻103共同交叠的叠层作为色阻叠层105，有利于减少隔垫物104的制造时间。
在一个示例中，过渡层107的材料与透明色阻的材料相同。本发明实施例中，过渡层107不需要特殊的材料，与透明色阻的材料制造即可，易于实现。
在一个示例中，隔垫物104在黑矩阵102遮挡范围内。本发明实施例中，使隔垫物104落于黑矩阵102遮挡范围内，避免影响像素开口率。
在一个示例中，隔垫物104的剖面图形为梯形，色阻叠层105的剖面图形为梯形或矩形。本发明实施例中，隔垫物104顶面至底面面具有一坡度，能够提高稳定性。
在一个示例中，遮光层106的材料为金属材料或不透明的树脂材料。
本发明实施例有益效果如下：形成单层色阻103后不需要对隔垫物104需要放置的区域进行制造工艺，直接利用多个单层色阻103交叠而成的色阻叠层105为基础制造隔垫物104，节省隔垫物104的制造工序和制造时间，从而提高彩膜基板100的制造效率。
本发明实施例提供一种显示面板，包括如上实施例提供的彩膜基板100。
本发明实施例有益效果如下：形成单层色阻后不需要对隔垫物需要放置的区域进行制造工艺，直接利用多个单层色阻交叠而成的色阻叠层为基础制造隔垫物，节省隔垫物的制造工序和制造时间，从而提高彩膜基板的制造效率。
本发明实施例还提供一种彩膜基板的制造方法，包括：
步骤1，在衬底基板上涂覆色阻涂层，通过构图工艺在子像素区域中形成单层色阻，并在相邻的所述子像素区域中形成形成色阻叠层。
步骤2，涂覆遮光层的涂层，并利用遮光层对应的掩膜板通过构图工艺形成隔垫物，隔垫物包括色阻叠层和遮光层。
步骤3，在隔垫物之上形成辅助电极层。
在一个示例中，涂覆遮光层的涂层之前，还包括203，在色阻叠层的顶面上形成过渡层。
在一个示例中，在色阻叠层的顶面上形成过渡层，包括：
在色阻叠层之上涂覆过渡层的涂层；
通过构图工艺形成过渡层。还可包括在涂覆过渡层的涂层之后，对过渡层的涂层进行前烘。
本发明实施例有益效果如下：形成单层色阻后不需要对隔垫物需要放置的区域进行制造工艺，直接利用多个单层色阻交叠而成的色阻叠层为基础制造隔垫物，节省隔垫物的制造工序和制造时间，从而提高彩膜基板的制造效率。
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本申请基于并且要求于2014年6月26日递交的中国专利申请第201410300210.2号的优先权，在此全文引用上述中国专利申请公开的内容。

Claims (12)

  1. 一种彩膜基板，包括衬底基板，形成于所述衬底基板上的黑矩阵和形成于所述黑矩阵围设的子像素区域中的单层色阻，；还包括多个设置于所述子像素区域之间的隔垫物和覆盖于所述隔垫物之上的辅助电极，其中所述隔垫物至少包括由相邻的多个所述子像素区域对应的单层色阻交叠而成的色阻叠层和覆盖所述色阻叠层的遮光层。
  2. 如权利要求1所述的彩膜基板，其中，所述隔垫物还包括过渡层，所述过渡层设置于所述色阻叠层的顶面和所述遮光层之间。
  3. 如权利要求1所述的彩膜基板，其中，所述色阻叠层为红色色阻、绿色色阻、蓝色色阻和透明色阻中的至少三种色阻的叠层。
  4. 如权利要求3所述的彩膜基板，其中，所述过渡层的材料与所述透明色阻的材料相同。
  5. 如权利要求1至4任一项所述的彩膜基板，其中，所述隔垫物设置在所述黑矩阵遮挡区域内。
  6. 如权利要求1至5任一项所述的彩膜基板，其中，所述隔垫物的剖面图形为梯形，所述色阻叠层的剖面图形为梯形或矩形。
  7. 如权利要求1至6任一项所述的彩膜基板，其中，所述遮光层的材料为金属材料或不透明的树脂材料。
  8. 一种显示面板，包括如权利要求1至7任一项所述的彩膜基板。
  9. 一种彩膜基板的制造方法，包括：
    在衬底基板上涂覆色阻涂层，通过构图工艺在子像素区域中形成单层色阻，并在相邻的所述子像素区域中形成色阻叠层；
    涂覆遮光层的涂层，并通过构图工艺形成隔垫物，所述隔垫物包括所述色阻叠层和所述遮光层；以及
    在所述隔垫物之上形成辅助电极层。
  10. 如权利要求9所述的制造方法，还包括在涂覆遮光层的涂层之前，在所述色阻叠层的顶面上形成过渡层。
  11. 如权利要求10所述的制造方法，其中在所述色阻叠层的顶面上形成过渡层，包括：
    在所述色阻叠层之上涂覆所述过渡层的涂层；
    通过构图工艺形成过渡层。
  12. 如权利要求11所述的制造方法，在所述色阻叠层的顶面上形成过渡层还包括在涂覆过渡层的涂层之后，对过渡层的涂层进行前烘。
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