WO2015192542A1 - 彩膜基板及其制作方法、显示面板和显示装置 - Google Patents

彩膜基板及其制作方法、显示面板和显示装置 Download PDF

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WO2015192542A1
WO2015192542A1 PCT/CN2014/088077 CN2014088077W WO2015192542A1 WO 2015192542 A1 WO2015192542 A1 WO 2015192542A1 CN 2014088077 W CN2014088077 W CN 2014088077W WO 2015192542 A1 WO2015192542 A1 WO 2015192542A1
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layer
color
spacer
film layer
auxiliary electrode
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PCT/CN2014/088077
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English (en)
French (fr)
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孙宏达
王东方
林俊仪
方金钢
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京东方科技集团股份有限公司
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Publication of WO2015192542A1 publication Critical patent/WO2015192542A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/871—Self-supporting sealing arrangements
    • H10K59/8723—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H10K59/8052—Cathodes
    • H10K59/80522—Cathodes combined with auxiliary electrodes

Definitions

  • Embodiments of the present invention relate to a color film substrate, a method of fabricating the same, a display panel, and a display device.
  • white organic light-emitting diodes WOLED
  • color filter CF
  • EL top emission electroluminescence
  • FIG. 1 The basic structure of the WOLED array substrate in the prior art is shown in FIG. 1 , where 1 is an array substrate; 2 is a gate; 3 is a gate insulating layer; 4 is an active layer; 5 is an etch barrier; a source drain layer; 7 is a passivation layer; 8 is a resin insulating layer; 9 is a pixel electrode (ITO) layer, where the pixel electrode layer is used as an anode; 10 is a luminescent material; 11 is a cathode material; 12 is a pixel defining layer .
  • ITO pixel electrode
  • FIG. 2 The basic structure of the color film substrate is shown in Figure 2: 13 is a substrate; 14 is a black matrix; 15 is a color filter; 16 is a layer of insulating material; 17 is a metal wire; 18 is a spacer; 19 is an ITO auxiliary electrode layer.
  • WOLED+CF requires that the gap between the array substrate and the color filter substrate must be sufficiently large, it is necessary to form a spacer having a higher height and form an ITO film on the spacer. However, this will make the ITO coated on the spacer when the pressure box is broken, the effect of the auxiliary electrode is not obvious, and the cathode will be damaged, which is not conducive to the illumination of the EL material.
  • Fig. 3 is a schematic view showing the appearance of damage of the spacer material on the surface of the cathode when the pressure box is pressed, where a is a microscopically observable crack at the cathode material.
  • An embodiment of the present invention provides a color filter substrate including: a substrate substrate; and a single color film layer formed in a color sub-pixel region on a side of the substrate substrate, and a portion of the color sub-pixel a color lamination layer formed by laminating a plurality of single-layer color film layers between regions;
  • the color filter substrate further includes a spacer between another portion of the color sub-pixel regions, and an auxiliary electrode layer covering a surface of the color lamination layer; a top surface of the spacer is higher than the The top surface of the color lamination layer, which can be elastically compressed in the height direction.
  • the single layer color film layer includes a red film layer, a blue film layer, and a green film layer.
  • the color lamination layer is a laminate of two or more of a red film layer, a blue film layer, and a green film layer.
  • the distribution density of the spacers is less than the distribution density of the color laminate layers.
  • the slope of the spacer is greater than the slope of the colored laminate layer.
  • an auxiliary electrode layer is included between the spacer and the single color film layer; and/or the spacer surface includes an auxiliary electrode layer.
  • a difference in height between a top surface of the spacer and a top surface of the color lamination layer is greater than a thickness of the auxiliary electrode layer on the color lamination layer.
  • Another embodiment of the present invention provides a display panel comprising: an array substrate of a pair of boxes and a color filter substrate according to any one of the above, wherein the spacers are in a state of being compressed in a height direction to make the color stack
  • the auxiliary electrode layer on the surface of the film layer is in contact with the cathode of the array substrate.
  • Still another embodiment of the present invention provides a display device including the display panel as described above.
  • a further embodiment of the present invention provides a method for fabricating a color film substrate, comprising:
  • An auxiliary electrode layer is formed on a surface of the color lamination layer, wherein a top surface of the spacer is higher than a top surface of the color lamination layer, and the spacer is elastically compressible in a height direction.
  • the single layer color film layer includes a red film layer, a blue film layer, and a green film layer.
  • the color lamination layer is formed by laminating two or more of a red film layer, a blue film layer, and a green film layer.
  • the spacer is formed between another portion of the color sub-pixel regions; forming the auxiliary electrode layer on the surface of the color lamination layer further includes:
  • an auxiliary electrode layer is formed on the surface of the single-layer color film layer and the color lamination layer; and a spacer is formed on the auxiliary electrode layer.
  • the distribution density of the spacers is less than the distribution density of the color laminate layers.
  • the slope of the spacer is greater than the slope of the colored laminate layer.
  • the manufacturing method thereof, the display panel and the display device, the spacer having a higher height and the color laminated layer having a lower height are used together to support the screen, thereby avoiding the screen over
  • the internal pressure is not uniform, causing the screen to become too large to be used properly.
  • the embodiment of the invention is applied to the display of the OLED, which can effectively reduce the damage of the ITO material and the cathode material of the auxiliary electrode layer, and can ensure good electrical conductivity.
  • FIG. 1 is a schematic diagram of a basic structure of a WOLED array substrate in the prior art
  • FIG. 2 is a schematic view showing the basic structure of a WOLED color film substrate in the prior art
  • FIG. 3 is a schematic view showing the damage of the cathode surface after the WOLED pressure box in the prior art
  • FIG. 4 is a schematic view showing the basic structure of a color filter substrate according to an embodiment of the present invention.
  • Figure 5 is a plan view of a color filter substrate according to an embodiment of the present invention.
  • FIG. 6 is a schematic structural view of a display panel according to an embodiment of the present invention.
  • FIG. 7 is a schematic diagram showing the basic flow of a method for fabricating a color filter substrate according to an embodiment of the present invention.
  • FIG. 8 is a schematic structural view showing a preferred flow of a method for fabricating a color filter substrate according to an embodiment of the present invention
  • FIG. 9 is a schematic structural view showing a preferred flow of a method for fabricating a color filter substrate according to an embodiment of the present invention.
  • the embodiment of the present invention firstly provides a color film substrate, see FIG. 4, comprising: a substrate substrate 13 and a single color film layer 20 formed in a color sub-pixel region formed on one side of the substrate substrate 13, and a portion of the color a color lamination layer 21 formed by laminating a plurality of single-layer color film layers between sub-pixel regions;
  • the color filter substrate further includes a spacer 18 located between the other portions of the color sub-pixel regions, and an auxiliary electrode layer 19 covering the surface of the color lamination layer 21; the top surface of the spacer 18 is higher than the color lamination layer 21 On the top surface, the spacer 18 can be elastically compressed in the height direction.
  • the top surface of the spacer 18 refers to the surface of the spacer on the opposite side of the base substrate 13, and the top surface of the color laminate layer 21 refers to the opposite side of the base substrate 12 of the color laminated layer 21. The surface of the end.
  • the top surface of the spacer 18 is higher than the top surface of the color lamination layer 21, meaning that the distance from the top surface of the spacer to the base substrate 13 is greater than the distance from the top surface of the color lamination layer 21 to the base substrate 13.
  • the height direction refers to a direction perpendicular to the surface of the base substrate 13.
  • the difference in height between the top surface of the spacer 18 and the top surface of the color laminate layer 21 is greater than the thickness of the auxiliary electrode layer 19 on the color laminate layer 21. Therefore, in a state where the spacer 18 is not compressed, the top surface of the spacer 19 is higher than the surface of the auxiliary electrode layer 18 on the top surface of the color laminated film 21.
  • the spacers 18 and the color lamination layer 21 are spaced apart, wherein the spacers 18 have a high height as a support; the color lamination layer 21 has a low height, after the box encapsulation process
  • the spacer 18 is lowered in height and compressed to conform to the color lamination layer 21, and the auxiliary electrode layer 19 is in full contact with the cathode to exert an electrical conduction effect. Since the spacer 18 still plays a main supporting role during the pressure box process, the auxiliary electrode layer 19 coated on the color lamination layer 21 is less stressed, and is only used for contact, which is advantageous for maintaining the ITO material on the auxiliary electrode layer 19. And the end of the cathode material 11 on the array substrate whole.
  • the single-layer color film layer 20 in the color filter substrate of the embodiment of the present invention may be three colors of red, blue, and green, and may also be four colors of red, blue, green, and white in the WOLED.
  • 5 is a top plan view of one embodiment of the present invention, wherein the single color film layer 20 may include a red film layer 22, a blue film layer 23, a green film layer 24, and a white film layer 25, respectively.
  • the film layers of the respective colors in the single-layer color film layer 20 are arranged on the surface of the base substrate in a predetermined pattern to form a single layer as a whole.
  • the color lamination layer 21 may be a laminate of two or more of the red film layer 22, the blue film layer 23, and the green film layer 24, and may further include a white film layer 25, which is among the above four layers. Two or more layers of the laminate, the thickness of which is selected according to actual production needs.
  • the distribution density of the spacers 18 can be sparse compared to the distribution density of the color laminate layer 21, which can significantly reduce damage to the cathode material.
  • the slope of the spacer 18 can be greater than the slope of the color laminate layer 21 such that the ITO material on the auxiliary electrode layer 19 is less susceptible to breakage during the press-pack process.
  • the slope of the spacer layer refers to the angle between the side of the spacer and the surface of the substrate.
  • the slope of the color laminate layer 21 refers to the surface between the side of the color laminate layer 21 and the surface of the substrate. Angle.
  • the spacer 18 on the color filter substrate of the embodiment of the present invention may be directly disposed on the single-layer color film layer 20, and after the spacer 18 is formed on the single-layer color film layer 20, the entire layer is deposited.
  • An embodiment of the present invention further provides a display panel, as shown in FIG. 6, comprising: an array substrate of a pair of boxes and a color filter substrate as described above, the spacer 18 is in a state of being compressed in a height direction to make the surface of the color lamination layer 21
  • the auxiliary electrode layer 19 is in contact with the cathode 11 of the array substrate. It can be seen that after the pressure box process, the spacer 18 is compressed and maintains elasticity, and appropriate process parameters are selected when the spacer 18 and the color laminate layer 21 are formed, and appropriate process conditions are selected during the pressure box. The spacer 18 is compressed to maintain the same height as the color lamination layer 21, and the auxiliary electrode layer 19 is made to conduct electricity.
  • the contact position of the spacer 18 with the cathode material 11 may be damaged, but since the density of the spacer 18 in the embodiment of the present invention is much lower than that of the spacer 18 in the prior art, it can be significantly reduced. Damage to the cathode material 11. Therefore, the structure of the display panel of the embodiment of the present invention can achieve the support The support effect ensures good electrical conductivity, and the damage to the cathode material 11 and the auxiliary electrode layer 19 can be reduced. At the same time, the auxiliary electrode material ITO on the laminated surface is less likely to be peeled off due to the small pressure applied to the laminated color film.
  • Embodiments of the present invention also provide a display device including the display panel as described above.
  • the display device may also include other components and structures such as a controller, and since it is not related to the improvement of the present invention, it will not be described herein.
  • the display device of the embodiment of the present invention may be, for example, an electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, or the like, or any product or component having a display function.
  • An embodiment of the present invention further provides a method for fabricating a color film substrate. Referring to FIG. 7, the method includes:
  • Step 701 sequentially forming a single-layer color film layer 20 on one side of the base substrate 13, wherein a single-layer color film layer 20 is formed in each color sub-pixel region, and a plurality of color sub-pixel regions are passed between a single layer of color film layer 20 is laminated to form a color laminate layer 21;
  • Step 702 forming a spacer 18 between another portion of the color sub-pixel regions
  • Step 703 forming an auxiliary electrode layer 19 on the surface of the color lamination layer 21, wherein the top surface of the spacer 18 is higher than the top surface of the color lamination layer 21, and the spacer 18 can be elastically compressed in the height direction.
  • any modification may be performed on the basis of the flow shown in FIG. 7 as needed, and the order of the steps may be adjusted as needed, which are all within the scope of protection of the present invention.
  • the order of steps 702 and 703 can be reversed or performed simultaneously as needed.
  • the single layer color film layer 20 may include a red film layer 22, a blue film layer 23, and a green film layer 24.
  • the color lamination layer 21 may be formed by laminating two or more of the red film layer 22, the blue film layer 23, and the green film layer 24.
  • Forming the spacer 18 between another portion of the color sub-pixel regions and forming the auxiliary electrode layer 19 on the surface of the color laminate layer 21 may include two ways.
  • a spacer 18 is formed on the single-layer color film layer 20; an auxiliary electrode layer 19 is formed on the surface of the single-layer color film layer 20, the color lamination layer 21, and the spacer 18.
  • the color film substrate formed by this method can be seen in FIG.
  • the auxiliary electrode layer 19 may be formed on the surface of the single-layer color film layer 20 and the color lamination layer 21; the spacer 18 may be formed on the auxiliary electrode layer 19, wherein the spacer 18 may be directly formed.
  • a pattern is formed on the auxiliary electrode layer 19, and a spacer 18 is formed, as shown in FIG.
  • the distribution density of the spacers 18 can be less than the distribution density of the color laminate layer 21.
  • the slope of the spacer 18 can be greater than the slope of the color laminate layer 21.
  • the manufacturing method thereof, the display panel and the display device, the spacer having a higher height and the color laminated layer having a lower height are used together to support the screen, thereby avoiding the screen over
  • the internal pressure is not uniform, causing the screen to become too large to be used properly.
  • the embodiment of the invention is applied to the display of the OLED, which can effectively reduce the damage of the ITO material and the cathode material of the auxiliary electrode layer, and can ensure good electrical conductivity.

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  • Mathematical Physics (AREA)
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Abstract

一种彩膜基板及其制作方法、显示面板和显示装置。该彩膜基板包括：衬底基板（13）以及形成在所述衬底基板（13）一侧的位于彩色子像素区域中的单层彩色膜层（20），和位于一部分所述彩色子像素区域之间的由多个单层彩色膜层层叠而成的彩色叠膜层（21）；所述彩膜基板还包括位于另一部分所述彩色子像素区域之间的隔垫物（18），以及覆盖在所述彩色叠膜层（21）表面的辅助电极层（19）；所述隔垫物（18）的顶面高于彩色叠膜层（21）的顶面，所述隔垫物（18）在高度方向可被弹性压缩。该彩膜基板可以有效减少辅助电极层ITO材料和阴极材料的破损，并且能够保证良好的导电作用。

Description

彩膜基板及其制作方法、显示面板和显示装置 技术领域
本发明的实施例涉及一种彩膜基板及其制作方法、显示面板和显示装置。
背景技术
目前，白光有机发光二极管(white organic light-emitting diodes，WOLED)+彩膜基板(Color Filter，CF)技术采用顶发射电致发光(electroluminescent，EL)，具有开口率高等优点，已经被业界关注。
现有技术中的WOLED阵列基板基本结构如图1所示，其中1为阵列衬底基板；2为栅极；3为栅极绝缘层；4为有源层；5为刻蚀阻挡层；6为源漏层；7为钝化层；8为树脂绝缘层；9为像素电极(ITO)层，此处像素电极层用作阳极；10为发光材料；11为阴极材料；12为像素界定层。彩膜基板的基本结构如图2所示：13为衬底基板；14为黑矩阵；15为彩色滤光片；16为绝缘材料层；17为金属线；18为隔垫物(spacer)；19为ITO辅助电极层。
由于WOLED+CF要求阵列基板和彩膜基板之间的间隙必须足够大，需要形成高度较高的隔垫物并在隔垫物上形成ITO薄膜。但是这样会使得压盒时隔垫物上披覆的ITO易断裂，辅助电极的作用不明显，同时还会造成阴极的破损，不利于EL材料的发光。图3为压盒时隔垫物材料在阴极表面造成破损的形貌示意图，图中a处即为阴极材料处微观可观测到的裂纹。
发明内容
本发明的一个实施例提供一种彩膜基板，包括：衬底基板以及形成在所述衬底基板一侧的位于彩色子像素区域中的单层彩色膜层，和位于一部分所述彩色子像素区域之间的由多个单层彩色膜层层叠而成的彩色叠膜层；
所述彩膜基板还包括位于另一部分所述彩色子像素区域之间的隔垫物，以及覆盖在所述彩色叠膜层表面的辅助电极层；所述隔垫物的顶面高于所述彩色叠膜层的顶面，所述隔垫物在高度方向可被弹性压缩。
在一个示例中，所述单层彩色膜层包括红色膜层、蓝色膜层、绿色膜层。
在一个示例中，所述彩色叠膜层为红色膜层、蓝色膜层和绿色膜层中的两种或两种以上的叠层。
在一个示例中，所述隔垫物的分布密度小于所述彩色叠膜层的分布密度。
在一个示例中，所述隔垫物的坡度大于所述彩色叠膜层的坡度。
在一个示例中，所述隔垫物和所述单层彩色膜层之间包括辅助电极层；和/或，所述隔垫物表面包括辅助电极层。
在一个示例中，所述隔垫物的顶面与所述彩色叠膜层的顶面的高度差大于所述彩色叠膜层上的辅助电极层的厚度。
本发明的另一个实施例提供一种显示面板，包括：对盒的阵列基板和如上任一项所述的彩膜基板，所述隔垫物处于在高度方向被压缩的状态使所述彩色叠膜层表面的辅助电极层与所述阵列基板的阴极接触。
本发明的再一个实施例提供一种显示装置，包括如上所述的显示面板。
本发明的又一个实施例提供一种彩膜基板制作方法，包括：
在衬底基板的一侧依次形成各单层彩色膜层，其中在每个彩色子像素区域中形成一个单层彩色膜层，在一部分所述彩色子像素区域之间通过使多个单层彩色膜层层叠形成彩色叠膜层；
在另一部分所述彩色子像素区域之间形成隔垫物；
在所述彩色叠膜层表面形成辅助电极层，其中，所述隔垫物的顶面高于所述彩色叠膜层的顶面，所述隔垫物在高度方向可被弹性压缩。
在一个示例中，所述单层彩色膜层包括红色膜层、蓝色膜层、绿色膜层。
在一个示例中，所述彩色叠膜层由红色膜层、蓝色膜层和绿色膜层中的两种或两种以上层叠而成。
在一个示例中，所述在另一部分所述彩色子像素区域之间形成隔垫物；在所述彩色叠膜层表面形成辅助电极层还包括：
在单层彩色膜层上形成隔垫物；在所述单层彩色膜层、彩色叠膜层和隔垫物的表面形成辅助电极层；
或，在所述单层彩色膜层和彩色叠膜层表面形成辅助电极层；在所述辅助电极层上形成隔垫物。
在一个示例中，所述隔垫物的分布密度小于所述彩色叠膜层的分布密度。
在一个示例中，所述隔垫物的坡度大于所述彩色叠膜层的坡度。
在本发明实施例提供的彩膜基板及其制作方法、显示面板和显示装置中，利用了高度较高的隔垫物和高度较低的彩色叠膜层共同起到支撑作用，避免了屏幕过大时内部压力不匀，导致屏幕形变过大而无法正常使用的问题。本发明实施例应用于OLED的显示，可以有效减少辅助电极层ITO材料和阴极材料的破损，并且能够保证良好的导电作用。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1是现有技术中WOLED阵列基板基本结构示意图；
图2是现有技术中WOLED彩膜基板基本结构示意图；
图3是现有技术中WOLED压盒后阴极表面破损示意图；
图4是本发明实施例彩膜基板的基本结构示意图；
图5是本发明实施例彩膜基板的俯视图；
图6是本发明实施例显示面板的结构示意图；
图7是本发明实施例彩膜基板的制作方法基本流程示意图；
图8是本发明实施例彩膜基板的制作方法一种优选流程的结构示意图；
图9是本发明实施例彩膜基板的制作方法一种优选流程的结构示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
在附图中，为了图示的清晰可能夸大了层和区域的尺寸。而且可以理解，当元件或层被称为在另一元件或层“上”时，它可以直接在其他元件上，或者可以存在中间的层。另外，可以理解，当元件或层被称为在另一元件或层“下” 时，它可以直接在其他元件下，或者可以存在一个以上的中间的层或元件。另外，还可以理解，当层或元件被称为在两层或两个元件“之间”时，它可以为两层或两个元件之间唯一的层，或还可以存在一个以上的中间层或元件。通篇相似的参考标记指示相似的元件。
可以理解，执行本发明实施例所披露的每个制造方法的操作步骤的顺序不限于这里阐述的，除非具体地另外提及。因此，执行本发明实施例所披露的每个制造方法的操作步骤的顺序可以在本发明实施例的范围内变化，且对于本发明实施例相关领域的普通技术人员显而易见的结果也将被认为在本发明实施例的范围内。
本发明实施例首先提供一种彩膜基板，参见图4，包括：衬底基板13以及形成在衬底基板13一侧的位于彩色子像素区域中的单层彩色膜层20，和位于一部分彩色子像素区域之间的由多个单层彩色膜层层叠而成的彩色叠膜层21；
彩膜基板还包括位于另一部分彩色子像素区域之间的隔垫物18，以及覆盖在彩色叠膜层21表面的辅助电极层19；隔垫物18的顶面高于彩色叠膜层21的顶面，隔垫物18在高度方向可被弹性压缩。隔垫物18的顶面是指隔垫物的在衬底基板13相反侧的端部的表面，彩色叠膜层21的顶面是指彩色叠膜层21的在衬底基板12相反侧的端部的表面。隔垫物18的顶面高于彩色叠膜层21的顶面是指隔垫物的顶面到衬底基板13的距离大于彩色叠膜层21的顶面到衬底基板13的距离。高度方向是指垂直于衬底基板13的表面的方向。
例如，隔垫物18的顶面与彩色叠膜层21的顶面的高度差大于彩色叠膜层21上的辅助电极层19的厚度。因此，在隔垫物18未被压缩的状态下，隔垫物19的顶面高于彩色叠膜层21的顶面上的辅助电极层18的表面。
本发明实施例中，采用隔垫物18和彩色叠膜层21间隔分布的方式，其中，隔垫物18高度较高，作为支撑；彩色叠膜层21高度较低，在对盒封装工艺之后，隔垫物18高度降低，压缩至与彩色叠膜层21一致，辅助电极层19与阴极完全接触，发挥导电作用。由于压盒过程中隔垫物18依然起到主要的支撑作用，彩色叠膜层21上披覆的辅助电极层19受力较小，仅为接触使用，有利于保持辅助电极层19上ITO材料和阵列基板上阴极材料11的完 整。
本发明实施例的彩膜基板中的单层彩色膜层20可以为红色、蓝色和绿色三色，在WOLED中也可以为红色、蓝色、绿色和白色四色。图5为本发明一个实施例的俯视图，其中单层彩色膜层20可以分别包括红色膜层22、蓝色膜层23、绿色膜层24和白色膜层25。例如，单层彩色膜层20中的各种颜色的膜层按照预定图案布置在衬底基板的表面上，以整体上形成单层。彩色叠膜层21可以为红色膜层22、蓝色膜层23和绿色膜层24中的两种或两种以上的叠层，也可以进一步包括白色膜层25，为以上四种膜层中的两种或两种以上的叠层，其厚度根据实际生产需要来选择。
在一个示例中，隔垫物18的分布密度可以较彩色叠膜层21的分布密度稀疏，这样能够明显减少对阴极材料的伤害。
在一个示例中，隔垫物18的坡度可以大于彩色叠膜层21的坡度，这样可以使得辅助电极层19上的ITO材料在压盒封装过程中不易破损。隔垫物层的坡度是指隔垫物的侧面与衬底基板的表面之间的夹角，彩色叠膜层21的坡度是指彩色叠膜层21的侧面与衬底基板的表面之间的夹角。
在一个示例中，本发明实施例的彩膜基板上隔垫物18可以直接位于单层彩色膜层20上，制作时在单层彩色膜层20上制作隔垫物18之后，再整层沉积辅助电极层19；另外，隔垫物18也可以位于单层彩色膜层20上的辅助电极层19上，此时首先在单层彩色膜层20上覆盖ITO材料作为辅助电极层19，然后再制作隔垫物18。因此，隔垫物18和单层彩色膜层20之间还可以包括辅助电极层19；或者，隔垫物18的表面还可以包括辅助电极层19。
本发明实施例还提供一种显示面板，见图6，包括：对盒的阵列基板和如上所述的彩膜基板，隔垫物18处于在高度方向被压缩的状态使彩色叠膜层21表面的辅助电极层19与阵列基板的阴极11接触。可见，经压盒工艺后，隔垫物18压缩，并保持弹性，在制作隔垫物18和彩色叠膜层21时选定合适的工艺参数，并在压盒时选定合适的工艺条件，使得隔垫物18压缩后能够与彩色叠膜层21保持在同一高度，并使得辅助电极层19发挥导电作用。压盒后，隔垫物18与阴极材料11的接触位置会出现破损，但由于本发明实施例中隔垫物18的密度比现有技术中隔垫物18的密度低很多，因此可以明显减少对阴极材料11的伤害。因此本发明实施例的显示面板的结构既能够达到支 撑效果，保证良好的导电作用，又可以减少对阴极材料11和辅助电极层19的伤害，同时由于叠层彩膜处受到的压力较小，使得其上面的辅助电极材料ITO不易剥落。
本发明实施例还提供一种显示装置，包括如上所述的显示面板。当然显示装置还可以包括控制器等其他部件和结构，由于与本发明的改进之处无关，在此不再赘述。
本发明实施例的显示装置例如可以为：电子纸、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
本发明实施例还提供一种彩膜基板制作方法，参见图7，包括：
步骤701：在衬底基板13的一侧依次形成各单层彩色膜层20，其中在每个彩色子像素区域中形成一个单层彩色膜层20，在一部分彩色子像素区域之间通过使多个单层彩色膜层20层叠形成彩色叠膜层21；
步骤702：在另一部分彩色子像素区域之间形成隔垫物18；
步骤703：在彩色叠膜层21表面形成辅助电极层19，其中，隔垫物18的顶面高于彩色叠膜层21的顶面，隔垫物18在高度方向可被弹性压缩。
在本发明的彩膜基板制作方法的实际实现中，可以根据需要在图7所示流程的基础上进行任意变形，各步骤的先后顺序也可以根据需要调整，这均属于本发明的保护范围之内，例如，步骤702和步骤703的顺序即可以根据需要进行调换或同时进行。
在一个示例中，单层彩色膜层20可以包括红色膜层22、蓝色膜层23、绿色膜层24。
在一个示例中，彩色叠膜层21可以由红色膜层22、蓝色膜层23和绿色膜层24中的两种或两种以上层叠而成。
在另一部分彩色子像素区域之间形成隔垫物18和在彩色叠膜层21表面形成辅助电极层19可以包括两种方式。在一个示例中，在单层彩色膜层20上形成隔垫物18；在单层彩色膜层20、彩色叠膜层21和隔垫物18的表面形成辅助电极层19。这种方法所形成的彩膜基板可以参见图8。而另一种方法可以为：在单层彩色膜层20和彩色叠膜层21表面形成辅助电极层19；在辅助电极层19上形成隔垫物18，其中，可以直接制作隔垫物18，也可以在辅 助电极层19上形成图形，再形成隔垫物18，见图9。
在一个示例中，隔垫物18的分布密度可以小于彩色叠膜层21的分布密度。
在一个示例中，隔垫物18的坡度可以大于彩色叠膜层21的坡度。
本发明实施例至少具有如下有益效果：
在本发明实施例提供的彩膜基板及其制作方法、显示面板和显示装置中，利用了高度较高的隔垫物和高度较低的彩色叠膜层共同起到支撑作用，避免了屏幕过大时内部压力不匀，导致屏幕形变过大而无法正常使用的问题。本发明实施例应用于OLED的显示，可以有效减少辅助电极层ITO材料和阴极材料的破损，并且能够保证良好的导电作用。
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本申请要求于2014年6月20日递交的中国专利申请第201410280359.9号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (15)

  1. 一种彩膜基板，包括：
    衬底基板；
    形成在所述衬底基板一侧的位于彩色子像素区域中的单层彩色膜层；
    位于一部分所述彩色子像素区域之间的由多个单层彩色膜层层叠而成的彩色叠膜层；
    位于另一部分所述彩色子像素区域之间的隔垫物，所述隔垫物的顶面高于所述彩色叠膜层的顶面，所述隔垫物在高度方向可被弹性压缩；以及
    覆盖在所述彩色叠膜层表面的辅助电极层。
  2. 根据权利要求1所述的彩膜基板，其中：
    所述单层彩色膜层包括红色膜层、蓝色膜层、绿色膜层。
  3. 根据权利要求1或2所述的彩膜基板，其中：
    所述彩色叠膜层为红色膜层、蓝色膜层和绿色膜层中的两种或两种以上的叠层。
  4. 根据权利要求1至3中任一项所述的彩膜基板，其中：
    所述隔垫物的分布密度小于所述彩色叠膜层的分布密度。
  5. 根据权利要求1至4中任一项所述的彩膜基板，其中：
    所述隔垫物的坡度大于所述彩色叠膜层的坡度。
  6. 根据权利要求1至5中任一项所述的彩膜基板，其中：
    所述隔垫物和所述单层彩色膜层之间包括辅助电极层；
    和/或，所述隔垫物表面包括辅助电极层。
  7. 根据权利要求1至6中任一项所述的彩膜基板，其中：
    所述隔垫物的顶面与所述彩色叠膜层的顶面的高度差大于所述彩色叠膜层上的辅助电极层的厚度。
  8. 一种显示面板，包括：对盒的阵列基板和如权利要求1至7中任一项所述的彩膜基板，所述隔垫物处于在高度方向被压缩的状态使所述彩色叠膜层表面的辅助电极层与所述阵列基板的阴极接触。
  9. 一种显示装置，包括如权利要求8所述的显示面板。
  10. 一种彩膜基板制作方法，包括：
    在衬底基板的一侧依次形成各单层彩色膜层，其中在每个彩色子像素区域中形成一个单层彩色膜层，在一部分所述彩色子像素区域之间通过使多个单层彩色膜层层叠形成彩色叠膜层；
    在另一部分所述彩色子像素区域之间形成隔垫物；
    在所述彩色叠膜层表面形成辅助电极层，其中，所述隔垫物的顶面高于所述彩色叠膜层的顶面，所述隔垫物在高度方向可被弹性压缩。
  11. 根据权利要求10所述的彩膜基板制作方法，其中：
    所述单层彩色膜层包括红色膜层、蓝色膜层、绿色膜层。
  12. 根据权利要求10或11所述的彩膜基板制作方法，其中：
    所述彩色叠膜层由红色膜层、蓝色膜层和绿色膜层中的两种或两种以上层叠而成。
  13. 根据权利要求10至12中任一项所述的彩膜基板制作方法，其中，所述在另一部分所述彩色子像素区域之间形成隔垫物；在所述彩色叠膜层表面形成辅助电极层还包括：
    在单层彩色膜层上形成隔垫物；在所述单层彩色膜层、彩色叠膜层和隔垫物的表面形成辅助电极层；
    或，在所述单层彩色膜层和彩色叠膜层表面形成辅助电极层；在所述辅助电极层上形成隔垫物。
  14. 根据权利要求10至13中任一项所述的彩膜基板制作方法，其中：
    所述隔垫物的分布密度小于所述彩色叠膜层的分布密度。
  15. 根据权利要求10至14中任一项所述的彩膜基板制作方法，其中：
    所述隔垫物的坡度大于所述彩色叠膜层的坡度。
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CN107579168B (zh) * 2017-08-31 2023-11-03 京东方科技集团股份有限公司 一种彩膜基板及其制备方法、显示面板以及封装方法
CN107680991B (zh) * 2017-09-29 2020-05-05 京东方科技集团股份有限公司 一种oled封装基板及其制造方法、oled显示面板
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CN108231846B (zh) * 2018-01-02 2021-01-26 京东方科技集团股份有限公司 一种显示基板及其制备方法、显示装置
CN108598126B (zh) 2018-05-04 2021-10-15 京东方科技集团股份有限公司 彩膜基板及其制备方法以及显示面板
CN108878687B (zh) * 2018-06-29 2020-03-10 上海天马微电子有限公司 一种显示面板和电子设备
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