WO2015194557A1 - ガスバリアーフィルム及びその製造方法 - Google Patents

ガスバリアーフィルム及びその製造方法 Download PDF

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Publication number
WO2015194557A1
WO2015194557A1 PCT/JP2015/067324 JP2015067324W WO2015194557A1 WO 2015194557 A1 WO2015194557 A1 WO 2015194557A1 JP 2015067324 W JP2015067324 W JP 2015067324W WO 2015194557 A1 WO2015194557 A1 WO 2015194557A1
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WO
WIPO (PCT)
Prior art keywords
gas barrier
film
water vapor
vapor permeability
layer
Prior art date
Application number
PCT/JP2015/067324
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
浩了 有田
千明 門馬
源田　和男
Original Assignee
コニカミノルタ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by コニカミノルタ株式会社 filed Critical コニカミノルタ株式会社
Priority to JP2016529376A priority Critical patent/JP6635032B2/ja
Priority to KR1020167034991A priority patent/KR101946132B1/ko
Priority to CN201580032527.5A priority patent/CN106457765B/zh
Publication of WO2015194557A1 publication Critical patent/WO2015194557A1/ja

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0209—Pretreatment of the material to be coated by heating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/42—Silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/724—Permeability to gases, adsorption
    • B32B2307/7242—Non-permeable
    • B32B2307/7246—Water vapor barrier

Definitions

  • a gas barrier layer is formed by applying a vacuum ultraviolet light to a coating film formed by applying and drying a coating solution for forming a gas barrier layer containing polysilazane and drying it.
  • Methods, CVD methods using silicon-containing compounds, etc. are known.
  • the gas barrier layer preferably has (ii) the carbon distribution curve has at least two extreme values.
  • the gas barrier layer more preferably has at least three extreme values in the carbon distribution curve, more preferably at least four extreme values, and may have five or more extreme values.
  • the extreme value of the carbon distribution curve is one or less, the gas barrier property may be insufficient when the obtained gas barrier film is bent.
  • the upper limit of the number of extreme values in the carbon distribution curve is not particularly limited. For example, it is preferably 30 or less, more preferably 25 or less, but the number of extreme values is also caused by the film thickness of the gas barrier layer. Therefore, it cannot be specified in general.
  • the effect of the present invention is that carbon atoms are formed in a gas barrier layer formed by a plasma chemical vapor deposition method using a plasma generated by applying a voltage between opposed roller electrodes having a magnetic field generating member that generates a magnetic field.
  • a plasma chemical vapor deposition method using a plasma generated by applying a voltage between opposed roller electrodes having a magnetic field generating member that generates a magnetic field.
  • the base film is preheated before the film formation process by the plasma chemical vapor deposition method (hereinafter also referred to as plasma CVD method).
  • plasma CVD method plasma chemical vapor deposition method
  • the said heat processing is a preferable embodiment which controls the standard deviation ((sigma)) of the water-vapor permeability which concerns on this invention within the range prescribed

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Laminated Bodies (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Chemical Vapour Deposition (AREA)
  • Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
PCT/JP2015/067324 2014-06-17 2015-06-16 ガスバリアーフィルム及びその製造方法 WO2015194557A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2016529376A JP6635032B2 (ja) 2014-06-17 2015-06-16 ガスバリアーフィルム及びその製造方法
KR1020167034991A KR101946132B1 (ko) 2014-06-17 2015-06-16 가스 배리어 필름 및 그 제조 방법
CN201580032527.5A CN106457765B (zh) 2014-06-17 2015-06-16 气体阻隔膜和其制造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014124113 2014-06-17
JP2014-124113 2014-06-17

Publications (1)

Publication Number Publication Date
WO2015194557A1 true WO2015194557A1 (ja) 2015-12-23

Family

ID=54935540

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2015/067324 WO2015194557A1 (ja) 2014-06-17 2015-06-16 ガスバリアーフィルム及びその製造方法

Country Status (4)

Country Link
JP (1) JP6635032B2 (ko)
KR (1) KR101946132B1 (ko)
CN (1) CN106457765B (ko)
WO (1) WO2015194557A1 (ko)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018101026A1 (ja) * 2016-11-30 2018-06-07 コニカミノルタ株式会社 ガスバリア性フィルム
JP2018129225A (ja) * 2017-02-09 2018-08-16 住友化学株式会社 有機電子デバイスの製造方法
CN108603826A (zh) * 2016-02-03 2018-09-28 国立研究开发法人产业技术综合研究所 标准阻气膜
WO2019049618A1 (ja) * 2017-09-08 2019-03-14 コニカミノルタ株式会社 ガスバリアー性フィルム、水蒸気バリアー性評価試験片及びガスバリアー性フィルムの水蒸気バリアー性評価方法
JP2019089311A (ja) * 2017-11-14 2019-06-13 株式会社神戸製鋼所 ガスバリア膜、ガスバリアフィルム、有機エレクトロルミネッセンス素子及び電子ペーパー並びにガスバリアフィルムの製造方法
JP2019163500A (ja) * 2018-03-19 2019-09-26 株式会社神戸製鋼所 プラズマｃｖｄ装置、及びフィルムの製造方法
WO2024127931A1 (ja) * 2022-12-13 2024-06-20 富士フイルム株式会社 ガスバリアフィルム包装材料の製造方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7198607B2 (ja) * 2017-08-25 2023-01-04 住友化学株式会社 積層フィルム
CN109778149B (zh) * 2017-11-14 2020-12-29 株式会社神户制钢所 阻气膜、气体阻隔性薄膜、有机电致发光元件和电子纸以及气体阻隔性薄膜的制造方法
JP7054055B2 (ja) * 2018-05-23 2022-04-13 住友金属鉱山株式会社 ガス放出ロール及びその製造方法並びにガス放出ロールを用いた処理装置
CN114096406A (zh) * 2019-05-08 2022-02-25 昭和电工材料株式会社 阻隔材料及具备该阻隔材料的产品

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JP2010261078A (ja) * 2009-05-08 2010-11-18 Toppan Printing Co Ltd 真空成膜装置、および高分子フィルム積層体の製造方法、ならびに高分子フィルム積層体
WO2012046778A1 (ja) * 2010-10-08 2012-04-12 住友化学株式会社 プラズマｃｖｄ成膜による積層体の製造方法
WO2012176824A1 (ja) * 2011-06-21 2012-12-27 住友化学株式会社 積層フィルムの検査方法及び積層フィルムの製造方法
WO2014061627A1 (ja) * 2012-10-19 2014-04-24 コニカミノルタ株式会社 ガスバリアーフィルム及びガスバリアーフィルムの製造方法

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WO2012046767A1 (ja) 2010-10-08 2012-04-12 住友化学株式会社 積層フィルム
TWI552883B (zh) * 2011-07-25 2016-10-11 Lintec Corp Gas barrier film laminates and electronic components
JP2013160632A (ja) * 2012-02-06 2013-08-19 Toppan Printing Co Ltd ガス透過性試験片、ガス透過性試験片の作成方法、ガス透過性試験片作成装置及びガスバリア透過性評価装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010261078A (ja) * 2009-05-08 2010-11-18 Toppan Printing Co Ltd 真空成膜装置、および高分子フィルム積層体の製造方法、ならびに高分子フィルム積層体
WO2012046778A1 (ja) * 2010-10-08 2012-04-12 住友化学株式会社 プラズマｃｖｄ成膜による積層体の製造方法
WO2012176824A1 (ja) * 2011-06-21 2012-12-27 住友化学株式会社 積層フィルムの検査方法及び積層フィルムの製造方法
WO2014061627A1 (ja) * 2012-10-19 2014-04-24 コニカミノルタ株式会社 ガスバリアーフィルム及びガスバリアーフィルムの製造方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108603826A (zh) * 2016-02-03 2018-09-28 国立研究开发法人产业技术综合研究所 标准阻气膜
WO2018101026A1 (ja) * 2016-11-30 2018-06-07 コニカミノルタ株式会社 ガスバリア性フィルム
JPWO2018101026A1 (ja) * 2016-11-30 2019-10-17 コニカミノルタ株式会社 ガスバリア性フィルム
JP2018129225A (ja) * 2017-02-09 2018-08-16 住友化学株式会社 有機電子デバイスの製造方法
CN110268803A (zh) * 2017-02-09 2019-09-20 住友化学株式会社 有机电子器件的制造方法
US10950825B2 (en) 2017-02-09 2021-03-16 Sumitomo Chemical Company, Limited Method for manufacturing organic electronic device
WO2019049618A1 (ja) * 2017-09-08 2019-03-14 コニカミノルタ株式会社 ガスバリアー性フィルム、水蒸気バリアー性評価試験片及びガスバリアー性フィルムの水蒸気バリアー性評価方法
JPWO2019049618A1 (ja) * 2017-09-08 2020-10-29 コニカミノルタ株式会社 ガスバリアー性フィルム、水蒸気バリアー性評価試験片及びガスバリアー性フィルムの水蒸気バリアー性評価方法
JP7006694B2 (ja) 2017-09-08 2022-01-24 コニカミノルタ株式会社 ガスバリアー性フィルム、水蒸気バリアー性評価試験片及びガスバリアー性フィルムの水蒸気バリアー性評価方法
JP2019089311A (ja) * 2017-11-14 2019-06-13 株式会社神戸製鋼所 ガスバリア膜、ガスバリアフィルム、有機エレクトロルミネッセンス素子及び電子ペーパー並びにガスバリアフィルムの製造方法
JP2019163500A (ja) * 2018-03-19 2019-09-26 株式会社神戸製鋼所 プラズマｃｖｄ装置、及びフィルムの製造方法
WO2024127931A1 (ja) * 2022-12-13 2024-06-20 富士フイルム株式会社 ガスバリアフィルム包装材料の製造方法

Also Published As

Publication number Publication date
KR20170007797A (ko) 2017-01-20
KR101946132B1 (ko) 2019-02-08
CN106457765B (zh) 2019-01-11
JP6635032B2 (ja) 2020-01-22
JPWO2015194557A1 (ja) 2017-04-20
CN106457765A (zh) 2017-02-22

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