WO2015096431A1 - 一种显示器装置及其制作方法 - Google Patents

一种显示器装置及其制作方法 Download PDF

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Publication number
WO2015096431A1
WO2015096431A1 PCT/CN2014/080727 CN2014080727W WO2015096431A1 WO 2015096431 A1 WO2015096431 A1 WO 2015096431A1 CN 2014080727 W CN2014080727 W CN 2014080727W WO 2015096431 A1 WO2015096431 A1 WO 2015096431A1
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WO
WIPO (PCT)
Prior art keywords
array substrate
unit display
identification area
substrate
color filter
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PCT/CN2014/080727
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English (en)
French (fr)
Inventor
王辉
郭远辉
王春
陈俊生
Original Assignee
京东方科技集团股份有限公司
合肥京东方光电科技有限公司
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Publication date
Application filed by 京东方科技集团股份有限公司, 合肥京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/424,508 priority Critical patent/US9798181B2/en
Priority to EP14838762.4A priority patent/EP2910997B1/en
Priority to JP2016561057A priority patent/JP6367966B2/ja
Priority to KR1020157014052A priority patent/KR101678328B1/ko
Publication of WO2015096431A1 publication Critical patent/WO2015096431A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133374—Constructional arrangements; Manufacturing methods for displaying permanent signs or marks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells

Definitions

  • the present invention relates to the field of display technologies, and more particularly to a thin film transistor liquid crystal display device (hereinafter referred to as TFT-LCD) and a method of fabricating the same.
  • TFT-LCD thin film transistor liquid crystal display device
  • a liquid crystal display panel is widely used in modern digital information equipment because of its small size, low power consumption, no radiation, high resolution, and the like.
  • the Panel ID is created on each unit display. Since the panel ID of each unit display is different, the production line needs to display each unit with a laser pointer.
  • the screens are sequentially labeled. When the number of unit displays in a mother board glass is small, the labeling work of the Panel ID is relatively simple, and the production capacity of the production line is less; but when the number of unit displays on a mother board glass is large, the Panel ID The marking work will be cumbersome and will take up more production line capacity. In particular, the size of the unit display screens made by each panel generation line is getting smaller and smaller.
  • the present invention is based on the existing process, and on the other hand, through the specific design of the mask of the liquid crystal panel array substrate, the same batch exposure is performed.
  • the unit display screen is separated.
  • a specific shape of the sealant coating area is set in the peripheral area of the unit display screen, and the units of different batch exposures are displayed by the coating length of the sealant in the area.
  • the screens are separated to achieve the marking of the unit display panel ID.
  • a display device comprising: an array substrate and a color filter substrate, wherein:
  • a part of the inner side surface of the color filter substrate is sequentially coated with a black matrix and an alignment film; a part of the inner side surface of the array substrate is coated with an alignment film;
  • the edge of the inner surface of the array substrate and the color filter substrate is bonded together by a sealant; the inner surface of the array substrate located at the electrode end of the bottom of the display device is provided with a first identification area for identifying the same batch Sub-exposure unit display;
  • the sealant is perpendicular to the inner side of the array substrate and the color filter substrate, between the array substrate and the color filter substrate, and is provided with a second identification area for identifying unit display screens of different batch exposures.
  • a method of fabricating a display device comprising the steps of:
  • a second marking area is provided for identifying the unit display screens of different batch exposures by coating the marking sealant;
  • the edge of the inner surface of the array substrate and the color filter substrate are bonded together by a sealant, wherein a part of the inner side surface of the color filter substrate is sequentially coated with a black matrix and an alignment film, and a part of the inner side of the array substrate The surface is coated with an alignment film.
  • FIG. 1 is a schematic view showing the arrangement of a unit display screen on a mother board glass
  • FIG. 2 is a schematic view of a Panel ID formed by an exposure process
  • FIG. 3 is a schematic plan view showing the structure of a unit display screen in the prior art
  • FIG. 4 is a plan view showing a planar display of a unit display screen according to an embodiment of the present invention
  • FIG. 5 is a cross-sectional view showing a peripheral portion of a unit display screen according to an embodiment of the present invention
  • a schematic cross-sectional view of the sealant of the display screen
  • Figure 7 is a schematic view of the display screen of different exposure batches;
  • Figure 8 is a schematic view showing the structure of the seal metal mark
  • Figure 9 is a schematic illustration of different exposure areas indicating the different lengths of the sealant coating.
  • Figure 1 is a schematic view of the arrangement of the unit display screen on a mother board glass.
  • a single unit display screen is arranged on a mother board glass, such as 54 pieces shown in Fig. 1, on the array substrate.
  • a mother board glass such as 54 pieces shown in Fig. 1, on the array substrate.
  • the current common process is the six exposure process shown in Figure 1, but in the future, cost and capacity are taken into account. The number of processes will be less and less.
  • the Panel ID of the unit display of different batch exposures cannot be distinguished by the exposure process.
  • the exposure process by designing a specific Panel ID (such as SI, S2, S3...S9, etc.) on a mask of a layer on the array glass substrate, the unit display of the same batch exposure can be recognized. Come, but the unit display of different batch exposures cannot be identified, as shown in Figure 2.
  • the narrow frame is the development trend of the future display screen. Therefore, the identification of the unit display panel ID should not only consider the production capacity at the time of production, but also consider the space size of the area around the panel display occupied by the Panel ID, in TV (television) and NB ( Notebook)
  • the space occupied by a Panel ID is lcm*10cm, but for mobile phones, due to display
  • the space around the screen is relatively small, and there are many traces on the array substrate. It is impossible to reserve a space as large as lcm*10cm like TV and NB products.
  • 3 is a schematic plan view of a unit display screen in the prior art. As shown in FIG. 3, the Panel ID is usually placed at one end or a corner of the display screen.
  • the present invention mainly realizes the effective identification of the panel ID of all the unit display panels on one mother board glass by the exposure process in combination with the frame sealant coating process of bonding the array substrate and the color film substrate.
  • FIG. 4 is a plan view showing a planar display of a unit display screen according to an embodiment of the present invention
  • FIG. 5 is a cross-sectional view of a peripheral portion of a unit display screen according to an embodiment of the present invention
  • FIG. 6 is a unit according to an embodiment of the present invention.
  • a cross-sectional view of the sealant of the display screen, as shown in FIGS. 4-6, according to an aspect of the invention, a display device is provided, the display device comprising an array substrate 1 and a color filter substrate 2, wherein:
  • the inner side surface of the color filter substrate 2 is sequentially coated with a black matrix 3 and an alignment film 4; a portion of the inner surface of the array substrate 1 is coated with an alignment film 4;
  • the edge of the inner surface of the array substrate 1 and the color filter substrate 2 is bonded together by the sealant 5, and the bonding position of the sealant 5 of the present invention is not particularly limited, but only for the seal having both sealing and conducting effects.
  • the sealant is in contact with the common electrode of the color filter substrate 2 and the inner surface of the array substrate 1 to electrically connect the common electrode of the array substrate 1 and the common electrode of the color filter substrate 2;
  • a first identification area is disposed on an inner side surface of the array substrate 1 at an electrode end (Source end) of the bottom of the display device for identifying a unit display screen of the same batch exposure; the frame seal glue 5 is perpendicular to the Between the array substrate 1 and the bottom inner side of the color filter substrate 2, between the array substrate 1 and the color filter substrate 2, a second marking area is provided for identifying different batches by coating the marking sealant 5
  • the exposed unit display screen for example, can distinguish the unit display screens of different batch exposures by the coating length of the sealant glue, or divide the second identification area into a plurality of sub-areas, by using different sub-areas A combination is applied to mark the exposure lot of the unit display.
  • the first marking area is formed simultaneously when the metal layer on the array substrate 1 is patterned.
  • the patterning process refers to thin film sputtering or deposition, and photoresist coating. Overlay, exposure, development, etching, stripping, etc.
  • the second marking area is a labeled sealant coating area.
  • the marking sealant coating area is rectangular, and the six-time exposure process of the array glass substrate is taken as an example. Set to 6mm, the area can be equally divided into six sub-areas by using the metal layer on the array glass substrate (the length of each sub-area is 1mm considering that the positional accuracy of the sealant coating is 0.2mm), and the sub-area is coated. The number of overlays indicates the number of exposures.
  • the second identification area is located inside the sealant, and is mainly indicated by a metal mark on the side of the array substrate and a coating of the sealant 6 to be marked.
  • Figure 7 is a schematic view showing the structure of the seal metal mark.
  • the second mark is formed by using seven adjacent metal marks. The width of each metal mark is set to 0.02 mm and the height is set to 0.5 mm. The adjacent metal marks are distributed at equal intervals of 1 mm, so that six segments are separated, and the six segments respectively correspond to six exposure regions on the mother glass, and the sealant is coated in the first exposure region by one segment. Space, applying 2 sections of space in the second exposure area, and so on, coating six sections of space in the sixth exposure area, as shown in Fig.
  • the metal mark can be realized by a metal layer of a signal line (Data layer) or a gate line (Gate layer).
  • Data layer a signal line
  • Gate layer a gate line
  • the placement of the metal mark is not limited to the above case.
  • the width metal mark satisfies the minimum value of the metal exposure size, and the height is set between 0.1 mm and 1 mm, and the interval between adjacent metal marks should be greater than The minimum accuracy of the sealant coating is 0.2mm.
  • the exposure process can distinguish multiple unit displays that are exposed in the same batch, but it is not possible to distinguish the unit displays of different batch exposures.
  • the sealant when the sealant is applied, the first marking of the first marking area is applied, and then the unit display in different exposure areas (Al, A2, A3, A4, A5, A6) The sealant coating of the second marking area is performed. As shown in FIG. 9, for all the unit display screens in the A1 area, one piece of sealant is applied to the second mark area, and for all the unit display screens in the A2 area, two pieces of cover frame are applied to the second mark area.
  • Glue, and so on, for all the unit display screens in the A6 area apply 6 pieces of sealant in the second mark area, so that the difference of the pattern can be coated by the sealant to distinguish the different exposure batch unit display.
  • the purpose of the screen the ultimate realization of the mother board glass
  • the number of exposures in the present invention is not limited to six, and may be greater than or less than six.
  • the first identification area formed by the exposure process and the second identification area of each unit display screen can determine the position of any one of the unit display screens on the mother board glass, so as to achieve the purpose of accurately marking the unit display screen.
  • a method of fabricating a display device comprising the following steps:
  • Step 1 a first identification area is disposed on an inner side surface of the array substrate at an electrode end located at a bottom of the display device for identifying a unit display screen of the same batch exposure;
  • the first marking region is formed simultaneously when the metal layer on the array substrate is patterned.
  • the patterning process used refers to thin film sputtering or deposition, photoresist coating, exposure, Development, etching, stripping, etc.
  • Step 2 between the array substrate and the color filter substrate, a second marking area is provided for identifying a unit display screen of different batch exposures by coating the marking sealant;
  • Step 3 bonding the edge of the inner surface of the array substrate and the color filter substrate together by a sealant, wherein a part of the inner side surface of the color filter substrate is sequentially coated with a black matrix and an alignment film, the array A portion of the inner side surface of the substrate is coated with an alignment film.
  • the execution order of the steps 1 and 2 has no special requirements and can be interchanged.
  • the second marking area is an indication of the sealant coating area, for example, the coating display length of the sealant can be used to distinguish the unit display screens exposed by different batches, or the second identification area can be divided into multiple Sub-areas, the exposure lot of the unit display is marked by a combination of coatings for different sub-areas.
  • panel manufacturers use laser coder to code the unit display screen, that is, form a metal layer on the unit display screen, and use the laser to code each unit screen on the mother board glass once.
  • the disadvantages are: manual operation
  • the method takes a long time and affects the production capacity of the production line.
  • the invention realizes the identification (ie coding) of the unit display on the mother board glass through the combination of the exposure process and the frame sealant coating process, all processes are mechanical operations, and consume
  • the identification area of the invention occupies a small area around the display screen, thereby optimizing the design of the periphery of the display screen.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

一种显示器装置及其制作方法，该装置包括：阵列基板（1）和彩膜基板（2），其中：彩膜基板（2）的部分内侧表面依次涂覆有黑矩阵（3）和配向膜（4）；阵列基板（1）的部分内侧表面涂覆有配向膜（4）；阵列基板（1）和彩膜基板（2）内侧表面的边缘通过封框胶（5）粘接在一起；位于显示器装置底部的电极端处的阵列基板（1）的内侧表面上设置有第一标识区域，用于标识同批次曝光的单元显示屏；封框胶（5）垂直于阵列基板（1）和彩膜基板（2）的底部内侧，阵列基板（1）和彩膜基板（2）之间，设置有第二标识区域，用于标识不同批次曝光的单元显示屏。该装置及其制作方法解决了目前面板标示工艺影响产能以及面板标示占用显示屏周边较大空间的问题，有效的提高了产线产能，同时优化了显示屏周边区域的设计空间。

Description

一种显示器装置及其制作方法 技术领域 本发明涉及显示器技术领域， 尤其是一种薄膜晶体管液晶显示器装 置 （以下称 TFT-LCD) 及其制造方法。
背景技术 在显示技术领域中， 液晶显示面板以其体积小、 功耗低、 无辐射、 分辨率高等优点， 被广泛地应用于现代数字信息化设备中。
对于面板厂商， 同一张母板玻璃切出的单元显示屏越多， 产线盈利 性就越强。 为了区分每一块单元显示屏， 在制作过程中， 会在每个单元 显示屏上制作 Panel ID, 由于每块单元显示屏的 Panel ID都不一样， 因 此生产线上需要用激光笔对每块单元显示屏依次进行标号。 当一块母板 玻璃中的单元显示屏数量少的时候， Panel ID的标记工作比较简单， 占 用产线的产能较少； 但当一块母板玻璃上的单元显示屏数量较多的时候， Panel ID的标记工作就会比较繁琐， 将会占用较多的产线产能。 尤其是 目前各面板世代线做的单元显示屏的尺寸越来越小， 一块母板玻璃基板 上有几百个单元显示屏， Panel ID的标记工作就变得比较棘手。 有时考 虑到产线的产能， 就不标记单元显示屏的 Panel ID了， 这样就使得后段 制作工序中出现的问题无法追溯到前段工序， 大大降低了产线效率。 另 一方面， 目前小尺寸显示屏的周边区域越来越小， 而 Panel ID本身会占 用一定的空间， 因此探讨小尺寸显示屏 Panel ID的标记方法也是当务之 急。
发明内容 为了解决上述现有技术存在的问题， 本发明在现有工艺的基础上， 一方面通过对液晶屏阵列基板的掩膜版进行特定的设计， 将同批次曝光 的单元显示屏区分开来， 另一方面， 在单元显示屏的周边区域设置特定 形状的标示封框胶涂覆区域， 通过该区域封框胶的涂覆长度， 将不同批 次曝光的单元显示屏区分开来，从而实现了单元显示屏 Panel ID的标记。
根据本发明的一方面， 提供一种显示器装置， 该装置包括： 阵列基 板和彩膜基板， 其中：
所述彩膜基板的部分内侧表面依次涂覆有黑矩阵和配向膜； 所述阵列基板的部分内侧表面涂覆有配向膜；
所述阵列基板和彩膜基板内侧表面的边缘通过封框胶粘接在一起； 位于所述显示器装置底部的电极端处的阵列基板的内侧表面上设 置有第一标识区域， 用于标识同批次曝光的单元显示屏；
所述封框胶垂直于所述阵列基板和彩膜基板的底部内侧、 所述阵列 基板和彩膜基板之间， 设置有第二标识区域， 用于标识不同批次曝光的 单元显示屏。
根据本发明的另一方面， 提供一种显示器装置的制作方法， 该方法 包括以下歩骤：
在位于所述显示器装置底部的电极端处的阵列基板的内侧表面上 设置第一标识区域， 用于标识同批次曝光的单元显示屏；
在所述阵列基板和彩膜基板之间， 设置第二标识区域， 用于通过对 于标示封框胶的涂覆来标识不同批次曝光的单元显示屏；
将所述阵列基板和彩膜基板内侧表面的边缘通过封框胶粘接在一 起， 其中， 所述彩膜基板的部分内侧表面依次涂覆有黑矩阵和配向膜， 所述阵列基板的部分内侧表面涂覆有配向膜。
本发明既解决了目前 Panel ID标记工艺影响产线产能的问题， 又解 决了 Panel lD占用显示屏周边较大空间的问题， 本发明通过简单的工艺 设计和变更， 有效的提高了产线产能， 同时优化了显示屏周边区域的设 计空间。 附图说明 图 1是一块母板玻璃上单元显示屏的排布示意图；
图 2是曝光工艺形成的 Panel ID的示意图；
图 3是现有技术中一个单元显示屏的平面结构示意图；
图 4是根据本发明一实施例的一单元显示屏的平面结构示意图； 图 5是根据本发明一实施例的单元显示屏的周边区域的截面图； 图 6是根据本发明一实施例的单元显示屏的封框胶的截面示意图; 图 7是不同曝光批次显示屏的示意图；
图 8是标示封框胶金属 mark的结构示意图；
图 9是不同曝光区域标示封框胶涂覆不同的长度的示意图。
具体实施方式 为使本发明的目的、 技术方案和优点更加清楚明白， 以下结合具体 实施例， 并参照附图， 对本发明进一歩详细说明。
图 1是一块母板玻璃上单元显示屏的排布示意图， 如图 1所示， 一 张母板玻璃上排布有多片单元显示屏， 比如图 1 中所示的 54片， 在阵 列基板的制作过程中， 由于各层膜曝光工艺的需求， 一般一张母板玻璃 需要分几次曝光， 目前常见的工艺是图 1所示的六次曝光工艺， 但今后 考虑到成本和产能， 曝光工艺次数会越来越少。
由于曝光工艺是重复制作工艺， 因此不同批次曝光的单元显示屏的 Panel ID无法通过曝光工艺来实现区分。 在曝光工艺中， 通过对阵列玻 璃基板上某一层的掩膜版设计特定的 Panel ID(比如 SI， S2， S3... S9等: )， 可以将同批次曝光的单元显示屏识别开来， 但无法识别不同批次曝光的 单元显示屏， 如图 2所示。
窄边框是将来显示屏的发展趋势， 因此单元显示屏 Panel ID的标识 不仅要考虑制作时的产能， 而且还要考虑 Panel ID占用单元显示屏周边 区域的空间大小， 在 TV (电视） 和 NB (笔记本） 产品上， 一般一个 Panel ID占用的空间是 lcm*10cm大小， 但是对于手机产品， 由于显示 屏周边的空间相对较小，阵列基板上的走线较多，其不可能像 TV和 NB 产品一样预留 lcm*10cm这么大的空间。 图 3是现有技术中一个单元显 示屏的平面结构示意图， 如图 3所示， Panel ID通常放置在显示屏的一 端或一角。
基于以上考虑， 本发明主要通过曝光工艺结合阵列基板与彩膜基板 对合时起粘接作用的封框胶涂覆工艺， 实现对于一张母板玻璃上所有单 元显示屏 Panel ID的有效标识。
图 4是根据本发明一实施例的一单元显示屏的平面结构示意图， 图 5是根据本发明一实施例的单元显示屏的周边区域的截面图， 图 6是根 据本发明一实施例的单元显示屏的封框胶的截面示意图， 如图 4-图 6所 示， 根据本发明的一方面， 提出一种显示器装置， 该显示器装置包括阵 列基板 1和彩膜基板 2， 其中：
所述彩膜基板 2的部分内侧表面依次涂覆有黑矩阵 3和配向膜 4; 所述阵列基板 1的部分内侧表面涂覆有配向膜 4;
所述阵列基板 1和彩膜基板 2内侧表面的边缘通过封框胶 5粘接在 一起， 本发明对于封框胶 5的粘接位置不作特别限定， 只是对于同时具 备密封和导电作用的封框胶， 所述封框胶需分别与彩膜基板 2和阵列基 板 1内侧表面的公共电极相接触， 以将阵列基板 1的公共电极和彩膜基 板 2的公共电极导通；
位于所述显示器装置底部的电极端 （Source端） 处的阵列基板 1的 内侧表面上设置有第一标识区域， 用于标识同批次曝光的单元显示屏； 所述封框胶 5垂直于所述阵列基板 1和彩膜基板 2的底部内侧、 所 述阵列基板 1和彩膜基板 2之间， 设置有第二标识区域， 用于通过对于 标示封框胶 5的涂覆来标识不同批次曝光的单元显示屏， 比如可通过封 框胶的涂覆长度， 将不同批次曝光的单元显示屏区分开来， 或者将所述 第二标识区域分为多个子区域， 通过对于不同子区域的涂覆组合来标示 该单元显示屏的曝光批次。
在本发明一实施例中， 所述第一标识区域在阵列基板 1上的金属层 构图的时候同时形成， 通常， 构图工艺是指薄膜溅射或沉积、 光刻胶涂 覆、 曝光、 显影、 刻蚀、 剥离等工序。
所述第二标识区域为标示封框胶涂覆区域， 在本发明一实施例中， 所述标示封框胶涂覆区域为矩形， 以阵列玻璃基板六次曝光工艺为例， 该矩形的长度设置为 6mm，利用阵列玻璃基板上的金属层可将该区域等 分成六个子区域 （考虑到封框胶涂覆的位置精度为 0.2mm， 则每个子区 域的长度是 lmm)， 通过子区域涂覆的数量可标示曝光的次数。
如图 6所示， 所述第二标识区域位于封框胶的内侧， 其主要通过阵 列基板侧的金属标记 （mark) 和标示封框胶 6的涂覆来标示。 图 7是标 示封框胶金属 mark的结构示意图， 图 7中， 使用七个相邻的金属 mark 来形成所述第二标识区域， 每个金属 mark的宽度设置为 0.02mm， 高度 设为 0.5mm， 相邻金属 mark按照 lmm等间隔分布， 这样就分割出六段 空间， 这六段空间分别对应母板玻璃上的 6个曝光区域， 标示封框胶在 第一个曝光区域内涂覆 1段空间， 在第二个曝光区域内涂覆 2段空间， 依次类推， 在第六个曝光区域涂覆六段空间， 如图 8所示， 这样就达到 了将不同曝光区域的同一位置的单元 panel通过不同长度的标示封框胶 (如图 2所示） 区分开来的目的， 其中， 所述金属 mark可以用信号线 (Data层） 或栅极线 （Gate层） 的金属层来实现。 当然所述金属 mark 的放置不限于上述情况， 实际上， 所述宽度金属 mark的满足金属曝光 尺寸的最小值即可， 高度设置在 0.1mm到 lmm之间， 相邻金属标记的 间隔值应大于封框胶涂覆的最小精度 0.2mm。
上文提及， 通过曝光工艺可将同批次曝光的多个单元显示屏区别开 来， 但无法区别不同批次曝光的单元显示屏。 对于本发明， 在进行封框 胶涂覆的时候， 先进行第一标识区域封框胶的涂覆， 再对不同曝光区域 (Al， A2 , A3 , A4， A5， A6)内的单元显示屏进行第二标识区域的封 框胶涂覆。 如图 9所示， 对于 A1区域中所有的单元显示屏， 在第二标 识区域涂覆 1段封框胶， 对于 A2区域中所有的单元显示屏， 在第二标 识区域涂覆 2段封框胶，以此类推，对于 A6区域中所有的单元显示屏， 在第二标识区域涂覆 6段封框胶， 这样就可以通过封框胶涂覆图形的差 异， 达到区分不同曝光批次单元显示屏的目的， 最终实现母板玻璃上所 有单元显示屏 Panel ID的标识。当然本发明中的曝光次数并不限于 6次， 可大于或小于 6次。
由上可知， 本发明结合曝光工艺形成的第一标识区域和每个单元显 示屏的第二标识区域可以确定任意一个单元显示屏在母板玻璃上的位 置， 达到单元显示屏精确标记的目的。
根据本发明的另一方面， 还提出一种显示器装置的制作方法， 该方 法包括以下歩骤：
歩骤 1， 在位于所述显示器装置底部的电极端处的阵列基板的内侧 表面上设置第一标识区域， 用于标识同批次曝光的单元显示屏；
在本发明一实施例中， 所述第一标识区域在阵列基板上的金属层构 图的时候同时形成， 通常， 所使用的构图工艺是指薄膜溅射或沉积、 光 刻胶涂覆、 曝光、 显影、 刻蚀、 剥离等工艺。
歩骤 2， 在所述阵列基板和彩膜基板之间， 设置第二标识区域， 用 于通过对于标示封框胶的涂覆来标识不同批次曝光的单元显示屏；
歩骤 3， 将所述阵列基板和彩膜基板内侧表面的边缘通过封框胶粘 接在一起， 其中， 所述彩膜基板的部分内侧表面依次涂覆有黑矩阵和配 向膜， 所述阵列基板的部分内侧表面涂覆有配向膜。
其中， 所述歩骤 1和歩骤 2的执行顺序没有特殊要求， 可互换。 所述第二标识区域为标示封框胶涂覆区域， 比如可通过封框胶的涂 覆长度， 将不同批次曝光的单元显示屏区分开来， 或者将所述第二标识 区域分为多个子区域， 通过对于不同子区域的涂覆组合来标示该单元显 示屏的曝光批次。
目前面板厂商利用激光打码机进行单元显示屏的打码， 即在单元显 示屏上形成一块金属层， 利用激光一次对母板玻璃上的每一块单元屏进 行打码， 其缺点是： 手动作业， 耗时长， 影响产线产能； 本发明通过曝 光工艺和封框胶涂覆工艺的结合， 实现了对母板玻璃上单元显示屏的标 识 （即打码）， 所有工艺都是机械操作， 耗时少， 产能影响小， 同时相 比目前 Panel ID占用的空间，本发明的标识区域占用显示屏周边区域小， 从而优化了显示屏周边的设计。 以上所述的具体实施例， 对本发明的目的、 技术方案和有益效果 进行了进一歩详细说明， 所应理解的是， 以上所述仅为本发明的具体实 施例而已， 并不用于限制本发明， 凡在本发明的精神和原则之内， 所做 的任何修改、 等同替换、 改进等， 均应包含在本发明的保护范围之内。

Claims

权 利 要 求
1、 一种显示器装置， 其特征在于， 该装置包括： 阵列基板和彩膜 基板， 其中：
所述彩膜基板的部分内侧表面依次涂覆有黑矩阵和配向膜； 所述阵列基板的部分内侧表面涂覆有配向膜；
所述阵列基板和彩膜基板内侧表面的边缘通过封框胶粘接在一起； 位于所述显示器装置底部的电极端处的阵列基板的内侧表面上设 置有第一标识区域， 用于标识同批次曝光的单元显示屏；
所述封框胶垂直于所述阵列基板和彩膜基板的底部内侧、 所述阵列 基板和彩膜基板之间， 设置有第二标识区域， 用于标识不同批次曝光的 单元显示屏。
2、 根据权利要求 1 所述的装置， 其特征在于， 所述第二标识区域 通过对于标示封框胶的涂覆来标识不同批次曝光的单元显示屏。
3、 根据权利要求 2所述的装置， 其特征在于， 通过封框胶的涂覆 长度， 将不同批次曝光的单元显示屏区分开来， 或者将所述第二标识区 域分为多个子区域， 通过对于不同子区域的涂覆组合来标示该单元显示 屏的曝光批次。
4、 根据权利要求 3 所述的装置， 其特征在于， 所述第二标识区域 的子区域通过阵列基板侧的多个金属标记分隔形成。
5、 根据权利要求 4所述的装置， 其特征在于， 每个金属标记的宽 度满足金属曝光尺寸的最小值， 高度设置在 0.1mm到 lmm之间， 相邻 金属标记的间隔值大于封框胶涂覆的最小精度。
6、 根据权利要求 1 所述的装置， 其特征在于， 所述第一标识区域 在阵列基板上的金属层构图的时候同时形成。
7、 一种显示器装置的制作方法， 其特征在于， 该方法包括以下歩 骤：
在位于所述显示器装置底部的电极端处的阵列基板的内侧表面上 设置第一标识区域， 用于标识同批次曝光的单元显示屏； 在所述阵列基板和彩膜基板之间， 设置第二标识区域， 用于通过对 于标示封框胶的涂覆来标识不同批次曝光的单元显示屏；
将所述阵列基板和彩膜基板内侧表面的边缘通过封框胶粘接在一 起， 其中， 所述彩膜基板的部分内侧表面依次涂覆有黑矩阵和配向膜， 所述阵列基板的部分内侧表面涂覆有配向膜。
8、 根据权利要求 7 所述的方法， 其特征在于， 所述第一标识区域 在阵列基板上的金属层构图的时候同时形成。
9、 根据权利要求 8所述的方法， 其特征在于， 所述第二标识区域 为标示封框胶涂覆区域， 通过封框胶的涂覆长度， 或者将所述第二标识 区域分为多个子区域， 通过对于不同子区域的涂覆组合来标示该单元显 示屏的曝光批次。
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US9798181B2 (en) 2017-10-24
EP2910997A4 (en) 2016-04-20
EP2910997B1 (en) 2018-02-21
US20160011456A1 (en) 2016-01-14
CN103777407B (zh) 2016-05-11
EP2910997A1 (en) 2015-08-26
JP2017503219A (ja) 2017-01-26

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