WO2015089961A1 - 一种涂布机喷嘴清洁装置 - Google Patents

一种涂布机喷嘴清洁装置 Download PDF

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Publication number
WO2015089961A1
WO2015089961A1 PCT/CN2014/075116 CN2014075116W WO2015089961A1 WO 2015089961 A1 WO2015089961 A1 WO 2015089961A1 CN 2014075116 W CN2014075116 W CN 2014075116W WO 2015089961 A1 WO2015089961 A1 WO 2015089961A1
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WO
WIPO (PCT)
Prior art keywords
cleaning device
coating machine
nozzle cleaning
groove
solvent supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2014/075116
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English (en)
French (fr)
Inventor
张岳妍
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TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
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Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US14/413,160 priority Critical patent/US9623430B2/en
Publication of WO2015089961A1 publication Critical patent/WO2015089961A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B05C5/0266—Coating heads with slot-shaped outlet adjustable in length, e.g. for coating webs of different width
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • B05B15/555—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids discharged by cleaning nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B05C5/0258—Coating heads with slot-shaped outlet flow controlled, e.g. by a valve
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B05C5/0262—Coating heads with slot-shaped outlet adjustable in width, i.e. having lips movable relative to each other in order to modify the slot width, e.g. to close it
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0229—Suction chambers for aspirating the sprayed liquid

Definitions

  • the invention belongs to the field of linear coating technology for manufacturing liquid crystal displays, and particularly relates to a coating machine nozzle cleaning device. Background technique
  • a linear photoresist applicator (slit coater) is commonly used in the photoresist coating process for the production process of a display panel.
  • Gel problems are common in photoresist coating processes. That is, after the photoresist coating is completed, part of the photoresist remains at the tip of the nozzle and around it. Coating when the tip of the nozzle is unclean can create defects and severely affect product yield. Rubber is generally used as a cleaning material for the nozzle before the photoresist coating of each piece of glass is performed. However, due to the poor water absorption of the rubber, it is impossible to remove the excess photoresist by the rubber cleaning nozzle. Summary of the invention
  • a coater nozzle cleaning device wherein the coater nozzle cleaning device comprises a cleaner, a glue removal solvent supply device, and a liquid discharge device, the cleaner having a nozzle matching a groove, a side of the groove is provided with a glue removing solvent supply hole, and the stripping solvent supply device is connected with the stripping solvent supply hole to supply a degumming solvent into the groove, the concave A drain hole is disposed on the bottom wall of the tank, and the liquid discharge device is connected to the drain hole.
  • a plurality of the stripping solvent supply holes are disposed on both sidewalls of the groove.
  • At least one row of the degreasing solvent supply hole and at least one row of the degreasing solvent supply hole are respectively disposed on the two opposite sidewalls of the groove, and the at least one row of the degumming solvent supply is provided.
  • the holes and the at least one row of the degumming solvent supply holes are arranged along the length of the cleaner.
  • the liquid discharge hole and the photoresist discharge hole of the nozzle do not overlap in the vertical direction.
  • a row of the liquid discharge holes is arranged on the bottom wall of the groove.
  • the bottom wall of the groove is provided with two rows of the liquid discharge holes.
  • the cleaner has a matching gap between the groove and the nozzle.
  • the stripping solvent supply holes are provided in a row along the length direction of the cleaner.
  • the stripping solvent supply holes are provided in two rows along the length direction of the cleaner.
  • the length of the cleaner is equal to the length of the nozzle.
  • the cleaner is a rubber cleaner.
  • the degumming solvent supply device includes a pressure tank containing a degumming solvent, and the pressure tank is connected to the degreasing solvent supply hole via a pipe.
  • the liquid discharge device includes a vacuum pump, and the vacuum pump is connected to the liquid discharge hole via a pipe.
  • the liquid discharging device further includes a waste liquid tank, and the vacuum pump is connected to the waste liquid tank.
  • the coater nozzle cleaning device comprises a cleaner, a stripping solvent supply device, and a draining device, the cleaner having a groove matching the nozzle, and the side wall of the groove is arranged There is a solvent supply hole, and a liquid discharge hole is arranged on the bottom wall of the groove, and the photoresist remaining on the nozzle is dissolved by the degumming solvent, and is discharged through the liquid discharge hole, and the remaining residue is smoothly removed. On the photoresist.
  • FIG. 1 is a schematic view of a coater nozzle cleaning device according to an embodiment of the present invention
  • FIG. 2 is a perspective view showing a state in which a cleaner of the coater nozzle cleaning device of FIG. 1 is engaged with a nozzle
  • Figure 4 is a bottom plan view of the cleaner of the coater nozzle cleaning device of Figure 1;
  • Figure 5 is a schematic view of a coater nozzle cleaning device in accordance with another embodiment of the present invention
  • Figure 6 is a perspective view of a state in which a cleaner and a nozzle of a coater nozzle cleaning device are fitted in accordance with still another embodiment of the present invention.
  • Stereoscopic view Figure 7 is a bottom plan view of a coater nozzle cleaning device in accordance with yet another embodiment of the present invention. detailed description
  • the applicator nozzle cleaning device of the present invention is provided with a degumming solvent supply hole 202 and a degumming solvent supply hole 204 on the inner walls of both sides of the cleaner, and a row of liquid is disposed on the bottom wall. Hole 206.
  • the present invention is not limited thereto, and for example, in the embodiment shown in Fig. 7, two rows of liquid discharge holes 206 are provided in the bottom wall. As shown in FIG.
  • the groove 210 of the cleaner 200 and the nozzle 100 have a matching gap 600, and the matching gap 600 can be used as a circulation path of the cleaning space and the degumming solvent, and the degumming solvent supply hole 202,
  • the degumming solvent supply hole 204 is in communication with the drain hole 206.
  • the degumming solvent supply hole 204 is connected to the pressure tank 302 containing the degumming solvent through a high pressure pipe, and the degumming solvent is sprayed at high pressure to both sides of the nozzle 100, and the residual photoresist is washed and dissolved under a high pressure degumming solvent.
  • the drain hole 206 is connected to the vacuum pump 504, and the stripping solvent and the dissolved photoresist are quickly discharged by the vacuum pump 504.
  • the length of the cleaner of the coater nozzle cleaning device of the present invention is made as long as the nozzle (i.e., as long as the short side of the glass). Since there is no need to travel the long distance of the short side of the glass, when the nozzle returns to the origin, the cleaner is raised directly, and the cleaning can be completed in a short period of time (for example, within 1 second), and the nozzle cleaning time can be shortened.
  • the coater nozzle cleaning device of the present invention can reduce defects caused by the gel problem generated during the coating process, improve the quality of the glass substrate, reduce the time for cleaning the nozzle, and improve the single-piece man-hour of the entire coating.
  • the coater nozzle cleaning device includes a cleaner 200, a stripping solvent supply device 300, and a drain device 500.
  • the cleaner 200 has a recess 210 that mates with the nozzle 100. The end of the nozzle 100 is received in the recess 210 during cleaning.
  • a degumming solvent supply hole 202 is disposed on a sidewall of the groove 210.
  • the degumming solvent supply device 300 is connected to the degreasing solvent supply hole 202 to supply the degumming solvent into the groove 210.
  • a drain hole 206 is disposed in the bottom wall of the recess 210.
  • the liquid discharge device 500 is connected to the liquid discharge hole 206.
  • the above degumming solvents are, for example, mineral spirits and orange oil.
  • the above degumming solvent may also be alcohol.
  • a plurality of stripping solvents are disposed on both sidewalls of the groove 210.
  • Supply holes As shown in FIG. 2 to FIG. 4, one side of the groove 210 is provided with a row of stripping solvent supply holes 202, and the other side wall is provided with a row of stripping solvent supply holes 204. As shown in FIG. 6, in one embodiment, the stripping solvent supply holes 204 are provided in two rows along the length direction of the cleaner 200.
  • the liquid discharge holes 206 and the photoresist ejection holes 102 of the nozzles 100 do not overlap in the vertical direction (not in a straight line). Thereby, the photoresist of the end portion of the nozzle discharge hole of the nozzle 100 can be well dissolved.
  • the length of the cleaner 200 is equal to the length of the nozzle 100, whereby the cleaning time can be shortened.
  • the cleaner 200 can be a rubber cleaner.
  • the stripping solvent supply device 300 includes a pressure tank 302 containing a degumming solvent, and the pressure tank 302 is connected to the stripping solvent supply hole 202 via a pipe.
  • a valve 304 is disposed between the pressure tank 302 and the stripping solvent supply hole 202.
  • the drain device 500 includes a vacuum pump 504.
  • the vacuum pump 504 is connected to the drain hole 206 via a pipe.
  • a valve 502 is disposed between the vacuum pump 504 and the drain hole 206.
  • the liquid discharge device 500 further includes a waste liquid tank 506, which is connected to the waste liquid tank 506. Thereby, the degumming solvent in which the photoresist is dissolved can be quickly discharged to the waste liquid tank 506.
  • the degumming solvent supply device 400 includes a pressure tank 402 containing a degumming solvent, and the pressure tank 402 is connected to the degreasing solvent supply hole 204 via a pipe.
  • a valve 404 is disposed between the pressure tank 402 and the stripping solvent supply port 204.
  • the degumming solvent supply unit 400 is not provided in the embodiment shown in Fig. 5.
  • the degumming solvent supply device 300 is identical in structure to the degumming solvent supply device 400.
  • the coater nozzle cleaning device of the present invention comprises a cleaner, a stripping solvent supply device, and a draining device, the cleaner having a groove matching the nozzle, and the side wall of the groove is provided with a degreasing solvent supply hole
  • the bottom wall of the groove is provided with a liquid discharging hole, and the photoresist remaining on the nozzle is dissolved by the degumming solvent, and is discharged through the matching gap and the liquid discharging hole, and the light remaining on the nozzle is smoothly removed. Engraved.
  • a degumming solvent supply hole and a drain hole are added to the cleaner.
  • vacuum pump extraction can effectively remove the residue of the photoresist in the nozzle, reduce the defects caused by the gelation problem generated during the coating process, and improve the substrate quality.
  • the cleaner is designed to be as long as the nozzle, reducing the time required to clean the nozzle and reducing the number of man-hours for coating.

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  • Coating Apparatus (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)

Abstract

一种涂布机喷嘴清洁装置，包括清洁器（200）、去胶溶剂供应装置（300）、排液装置（500），所述清洁器（200）具有与喷嘴（100）匹配的凹槽（210），所述凹槽（210）的侧壁上设置有去胶溶剂供应孔（202），所述去胶溶剂供应装置（300）与所述去胶溶剂供应孔（202）连接以供应去胶溶剂至所述凹槽（210）内，所述凹槽（210）的底壁上设置有排液孔（206），所述排液装置（500）与所述排液孔（206）连接。通过去胶溶剂溶解残留在喷嘴上的光刻胶，并经排液孔将其排出，顺畅地清除残留在喷嘴上的光刻胶。

Description

一种涂布机喷嘴清洁装置 技术领域
本发明属于液晶显示器制造的线性涂胶技术领域， 特别涉及一种涂布机喷嘴 清洁装置。 背景技术
目前， 在显示面板的生产过程的光刻胶涂胶工艺中， 普遍使用线性光刻胶涂 布机 （狭缝涂布机）。 光阻涂布过程中普遍存在凝胶问题。 即光阻涂布完成后， 部 分光刻胶残留在喷嘴尖端和周围。 当喷嘴尖端处于不清洁状态下进行涂布会形成 缺陷， 并严重影响产品良率。 一般在进行每片玻璃的光刻胶涂布前， 会使用橡胶 作为喷嘴的清洁材料。 但是由于橡胶的吸水性差， 以橡胶清洁喷嘴无法将多余的 光刻胶清除。 发明内容
本发明的目的在于， 提供一种涂布机喷嘴清洁装置， 其可以清除残留在喷嘴 上的光刻胶。
本发明通过如下技术方案实现： 一种涂布机喷嘴清洁装置， 其中， 所述涂布 机喷嘴清洁装置包括清洁器、 去胶溶剂供应装置、 排液装置， 所述清洁器具有与 喷嘴匹配的凹槽， 所述凹槽的侧壁上设置有去胶溶剂供应孔， 所述去胶溶剂供应 装置与所述去胶溶剂供应孔连接以供应去胶溶剂至所述凹槽内， 所述凹槽的底壁 上设置有排液孔， 所述排液装置与所述排液孔连接。
作为上述技术方案的进一步改进， 所述凹槽的两个侧壁上均设置有多个所述 去胶溶剂供应孔。
作为上述技术方案的进一步改进， 所述凹槽的两个相对的侧壁上分别设置有 至少一排去胶溶剂供应孔和至少一排去胶溶剂供应孔， 所述至少一排去胶溶剂供 应孔和所述至少一排去胶溶剂供应孔沿所述清洁器的长度方向排列。
作为上述技术方案的进一步改进， 所述排液孔与喷嘴的光刻胶喷出孔在竖直 方向上不重叠。 作为上述技术方案的进一步改进， 所述凹槽的底壁上设置有一排所述排液孔。 作为上述技术方案的进一步改进， 所述凹槽的底壁上设置有两排所述排液孔。 作为上述技术方案的进一步改进， 所述清洁器的凹槽与喷嘴之间具有匹配间 隙。
作为上述技术方案的进一步改进， 所述去胶溶剂供应孔沿所述清洁器的长度 方向设置有一排。
作为上述技术方案的进一步改进， 所述去胶溶剂供应孔沿所述清洁器的长度 方向设置有两排。
作为上述技术方案的进一步改进， 所述清洁器的长度与所述喷嘴的长度相等。 作为上述技术方案的进一步改进， 所述清洁器为橡胶清洁器。
作为上述技术方案的进一步改进， 所述去胶溶剂供应装置包括容纳去胶溶剂 的压力罐， 所述压力罐经管道与所述去胶溶剂供应孔连接。
作为上述技术方案的进一步改进， 所述排液装置包括真空泵， 所述真空泵经 管道与所述排液孔连接。
作为上述技术方案的进一步改进， 所述排液装置还包括废液罐， 所述真空泵 与所述废液罐连接。
本发明的有益效果是： 所述涂布机喷嘴清洁装置包括清洁器、 去胶溶剂供应 装置、 排液装置， 所述清洁器具有与喷嘴匹配的凹槽， 所述凹槽的侧壁上设置有 去胶溶剂供应孔， 所述凹槽的底壁上设置有排液孔， 通过去胶溶剂溶解残留在喷 嘴上的光刻胶， 并经排液孔将其排出， 顺畅地清除残留在喷嘴上的光刻胶。
附图说明
图 1是根据本发明的一个具体实施例的涂布机喷嘴清洁装置的示意图； 图 2是图 1的涂布机喷嘴清洁装置的清洁器与喷嘴配合状态的透视示意图； 图 3是图 1的涂布机喷嘴清洁装置的清洁器与喷嘴配合状态的透视立体示意 图；
图 4是图 1的涂布机喷嘴清洁装置的清洁器的仰视示意图；
图 5是根据本发明的另一个具体实施例的涂布机喷嘴清洁装置的示意图； 图 6是根据本发明的再一个具体实施例的涂布机喷嘴清洁装置的清洁器与喷 嘴配合状态的透视立体示意图； 图 7是根据本发明的又一个具体实施例的涂布机喷嘴清洁装置的仰视示意图。 具体实施方式
以下结合附图对本发明的具体实施方式进行进一步的说明。
如图 1至图 4所示， 本发明的涂布机喷嘴清洁装置在清洁器的两侧内壁上设 置去胶溶剂供应孔 202、 去胶溶剂供应孔 204， 在底壁上设置一排排液孔 206。 但 本发明不限于此， 例如在图 7所示的实施例中， 在底壁上设置两排排液孔 206。如 图 2所示， 所述清洁器 200的凹槽 210与喷嘴 100之间具有匹配间隙 600， 该匹配 间隙 600可用作清洗空间和去胶溶剂的流通路径， 将去胶溶剂供应孔 202、去胶溶 剂供应孔 204与排液孔 206连通。 当完成玻璃涂布而回到原点清洁时， 将该橡胶 清洁器升起，与整个喷嘴两侧和底部平行贴合，其间留少量缝隙（即匹配间隙 600)。 通过高压管道将去胶溶剂供应孔 204与容纳去胶溶剂的压力罐 302连接， 将去胶 溶剂高压喷射到喷嘴 100的两侧， 残留的光刻胶在高压的去胶溶剂下冲洗溶解。 而排液孔 206与真空泵 504连接， 通过真空泵 504将去胶溶剂及溶解的光刻胶迅 速排出。
另外， 本发明的涂布机喷嘴清洁装置的清洁器长度制作成和喷嘴一样长 （即 和玻璃的短边一样长）。 由于不需要行走玻璃的短边这样长的距离， 所以当喷嘴回 到原点后， 清洁器直接升起， 可以在很短的时间内 （例如 1 秒内） 完成清洁， 能 够縮短喷嘴清洁的时间。
本发明的涂布机喷嘴清洁装置可以减少由涂布过程中产生的凝胶问题造成的 缺陷， 提高玻璃基板的品^， 减少清洁喷嘴的时间， 提高整个涂布的单件工时。
在图 5所示的实施例中， 所述涂布机喷嘴清洁装置包括清洁器 200、去胶溶剂 供应装置 300、 排液装置 500。 所述清洁器 200具有与喷嘴 100匹配的凹槽 210。 清洁时， 喷嘴 100的端部容纳在凹槽 210内。 所述凹槽 210的侧壁上设置有去胶 溶剂供应孔 202。所述去胶溶剂供应装置 300与所述去胶溶剂供应孔 202连接以供 应去胶溶剂至所述凹槽 210内。所述凹槽 210的底壁上设置有排液孔 206。所述排 液装置 500与所述排液孔 206连接。 上述的去胶溶剂例如为溶剂油和橙油。 上述 的去胶溶剂也可以为酒精。
在图 1所示的实施例中， 所述凹槽 210的两个侧壁上均设置有多个去胶溶剂 供应孔。 如图 2至图 4所示， 所述凹槽 210的一个侧壁设置有一排去胶溶剂供应 孔 202， 另一侧壁设置有一排去胶溶剂供应孔 204。如图 6所示，在一个实施例中， 所述去胶溶剂供应孔 204沿所述清洁器 200的长度方向设置有两排。
如图 2所示， 所述排液孔 206与喷嘴 100的光刻胶喷出孔 102在竖直方向上 不重叠 （不在一条直线上）。 由此， 能够良好地溶解喷嘴 100的光刻胶喷出孔端部 的光刻胶。
其中， 优选的是， 所述清洁器 200的长度与所述喷嘴 100的长度相等， 由此 可以縮短清洁时间。 所述清洁器 200可以为橡胶清洁器。
如图 1所示， 所述去胶溶剂供应装置 300包括容纳去胶溶剂的压力罐 302， 所 述压力罐 302经管道与所述去胶溶剂供应孔 202连接。 所述压力罐 302与所述去 胶溶剂供应孔 202之间设置有阀门 304。 所述排液装置 500包括真空泵 504。 所述 真空泵 504经管道与所述排液孔 206连接。 所述真空泵 504与所述排液孔 206之 间设置有阀门 502。 所述排液装置 500还包括废液罐 506， 所述真空泵 504与所述 废液罐 506连接。由此，可以迅速地将溶解了光刻胶的去胶溶剂排出至废液罐 506。 另外， 所述去胶溶剂供应装置 400 包括容纳去胶溶剂的压力罐 402， 所述压力罐 402经管道与所述去胶溶剂供应孔 204连接。所述压力罐 402与所述去胶溶剂供应 孔 204之间设置有阀门 404。 与图 1所示实施例相比较， 在图 5所示的实施例中没 有设置去胶溶剂供应装置 400。所述去胶溶剂供应装置 300与所述去胶溶剂供应装 置 400结构相同。
本发明的涂布机喷嘴清洁装置包括清洁器、 去胶溶剂供应装置、 排液装置， 所述清洁器具有与喷嘴匹配的凹槽， 所述凹槽的侧壁上设置有去胶溶剂供应孔， 所述凹槽的底壁上设置有排液孔， 通过去胶溶剂溶解残留在喷嘴上的光刻胶， 并 经匹配间隙和排液孔将其排出， 顺畅地清除残留在喷嘴上的光刻胶。 本发明的涂 布机喷嘴清洁装置中， 在清洁器内增设去胶溶剂供应孔和排液孔。 在清洁时， 使 用真空泵抽取， 能够有效清除光刻胶在喷嘴的残留， 减少由涂布过程中产生的凝 胶问题造成的缺陷， 提高基板品^。 另外， 将清洁器设计为与喷嘴一样长， 能够 减少清洁喷嘴的时间， 减少涂布的单件工时。
以上具体实施方式对本发明进行了详细的说明， 但这些并非构成对本发明的 限制。 本发明的保护范围并不以上述实施方式为限， 但凡本领域普通技术人员根 据本发明所揭示内容所作的等效修饰或变化， 皆应纳入权利要求书中记载的保护 范围内

Claims

权 利 要 求 书
1、 一种涂布机喷嘴清洁装置， 其中， 所述涂布机喷嘴清洁装置包括清洁器、 去胶溶剂供应装置、 排液装置， 所述清洁器具有与喷嘴匹配的凹槽， 所述凹槽的 侧壁上设置有去胶溶剂供应孔， 所述去胶溶剂供应装置与所述去胶溶剂供应孔连 接以供应去胶溶剂至所述凹槽内， 所述凹槽的底壁上设置有排液孔， 所述排液装 置与所述排液孔连接。
2、 根据权利要求 1所述的涂布机喷嘴清洁装置， 其中， 所述凹槽的两个侧壁 上均设置有多个所述去胶溶剂供应孔。
3、 根据权利要求 1所述的涂布机喷嘴清洁装置， 其中， 所述凹槽的两个相对 的侧壁上分别设置有至少一排去胶溶剂供应孔和至少一排去胶溶剂供应孔， 所述 至少一排去胶溶剂供应孔和所述至少一排去胶溶剂供应孔沿所述清洁器的长度方 向排列。
4、 根据权利要求 1所述的涂布机喷嘴清洁装置， 其中， 所述排液孔与喷嘴的 光刻胶喷出孔在竖直方向上不重叠。
5、 根据权利要求 1所述的涂布机喷嘴清洁装置， 其中， 所述凹槽的底壁上设 置有一排所述排液孔。
6、 根据权利要求 1所述的涂布机喷嘴清洁装置， 其中， 所述凹槽的底壁上设 置有两排所述排液孔。
7、 根据权利要求 1所述的涂布机喷嘴清洁装置， 其中， 所述清洁器的凹槽与 喷嘴之间具有匹配间隙。
8、 根据权利要求 1所述的涂布机喷嘴清洁装置， 其中， 所述去胶溶剂供应孔 沿所述清洁器的长度方向设置有一排。
9、 根据权利要求 1所述的涂布机喷嘴清洁装置， 其中， 所述去胶溶剂供应孔 沿所述清洁器的长度方向设置有两排。
10、 根据权利要求 1 所述的涂布机喷嘴清洁装置， 其中， 所述清洁器的长度 与所述喷嘴的长度相等。
11、 根据权利要求 1 所述的涂布机喷嘴清洁装置， 其中， 所述清洁器为橡胶 清洁器。
12、 根据权利要求 1 所述的涂布机喷嘴清洁装置， 其中， 所述去胶溶剂供应 装置包括容纳去胶溶剂的压力罐， 所述压力罐经管道与所述去胶溶剂供应孔连接。
13、 根据权利要求 12所述的涂布机喷嘴清洁装置， 其中， 所述排液装置包括 真空泵， 所述真空泵经管道与所述排液孔连接。
14、 根据权利要求 13所述的涂布机喷嘴清洁装置， 其中， 所述排液装置还包 括废液罐， 所述真空泵与所述废液耀连接。
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