WO2014153897A1 - 透明导电膜 - Google Patents

透明导电膜 Download PDF

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Publication number
WO2014153897A1
WO2014153897A1 PCT/CN2013/078940 CN2013078940W WO2014153897A1 WO 2014153897 A1 WO2014153897 A1 WO 2014153897A1 CN 2013078940 W CN2013078940 W CN 2013078940W WO 2014153897 A1 WO2014153897 A1 WO 2014153897A1
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WO
WIPO (PCT)
Prior art keywords
conductive
transparent conductive
mesh
substrate
region
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Application number
PCT/CN2013/078940
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English (en)
French (fr)
Inventor
周菲
曹淼倩
Original Assignee
南昌欧菲光科技有限公司
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Application filed by 南昌欧菲光科技有限公司 filed Critical 南昌欧菲光科技有限公司
Priority to JP2016600011U priority Critical patent/JP3204335U/ja
Priority to KR2020147000003U priority patent/KR200482910Y1/ko
Priority to US13/985,922 priority patent/US9066426B2/en
Publication of WO2014153897A1 publication Critical patent/WO2014153897A1/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0448—Details of the electrode shape, e.g. for enhancing the detection of touches, for generating specific electric field shapes, for enhancing display quality
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • the present invention relates to a transparent conductive film.
  • Touch screen Screen also known as “touch screen” or “touch panel”
  • touch screen is an inductive liquid crystal display system that can receive input signals such as contacts. It can be used to replace the mechanical button panel and be manufactured by liquid crystal display. Vivid audio and video effects.
  • ITO indium Tin Oxides
  • a transparent conductive film comprising:
  • a substrate comprising a first region and a second region at an edge of the substrate
  • the transparent conductive layer formed on the first region of the substrate, the transparent conductive layer comprising a first conductive mesh containing a conductive material;
  • the lead electrode formed in a second region of the substrate, the lead electrode comprising a second conductive mesh comprising a conductive material;
  • a first connecting line formed on the substrate and located between the transparent conductive layer and the lead electrode, wherein a conductive material of the first conductive mesh and a conductive material of the second conductive mesh pass through the first A connecting wire is electrically connected.
  • the transition section includes a third conductive mesh containing a conductive material, and a density of the grid lines of the third conductive mesh is not less than a density of the grid lines of the first conductive mesh .
  • the density of the grid lines of the first conductive mesh and the density of the grid lines of the third conductive mesh are both less than the density of the grid lines of the second conductive mesh.
  • the transition section includes a second connection line electrically connected to the first conductive mesh through the second connection line, and the third conductive mesh passes The first connecting line is electrically connected to the second conductive grid, and the length of the second connecting line is greater than the length of the first connecting line.
  • the substrate is provided with a groove of a predetermined shape, and the conductive material of the transparent conductive layer, the conductive material of the lead electrode, and the conductive material of the first connecting line are respectively disposed correspondingly The groove.
  • the groove has a ratio of depth to width of not less than 1, and the width of the groove is not more than 10 ⁇ m.
  • the lead electrode protrudes from a surface of the second region.
  • the lead electrode is formed on the surface of the second region by inkjet printing.
  • the lead electrode has a minimum width of 2 ⁇ m to 20 ⁇ m, and the lead electrode has a height of 5 ⁇ m to 10 ⁇ m.
  • the substrate further includes a substrate layer attached to one side of the substrate, the first region and the second region being both located in the substrate layer.
  • a light shielding layer is further included, the light shielding layer is located at an edge of the substrate, and the lead electrode is formed on a side of the substrate layer away from the light shielding layer.
  • the light shielding layer has a width of 1 mm to 5 mm.
  • the mesh shapes of the first conductive mesh, the second conductive mesh, and/or the third conductive mesh are both regular meshes or random meshes.
  • the transparent conductive layer, the lead electrode, and the conductive material of the first connecting line are each one of gold, silver, copper, aluminum, nickel, zinc, or an alloy of at least two of them.
  • the transparent conductive layer, the lead electrode, and the conductive material of the first connecting line are each one of gold, silver, copper, aluminum, nickel, zinc, or an alloy of at least two of them.
  • the material of the substrate is polyethylene terephthalate, polybutylene terephthalate, polymethyl methacrylate, polycarbonate plastic or glass.
  • an alignment mark is further included, the alignment mark being disposed on the substrate.
  • the transparent conductive film has a transparent conductive layer embedded in a first region of the substrate, a lead electrode formed in a second region located at an edge of the substrate, and a first connecting line disposed between the transparent conductive layer and the lead electrode to make the first conductive mesh
  • the conductive material of the grid is electrically connected to the conductive material of the second conductive mesh through the first connecting line.
  • the first connecting line realizes the electrical connection between the transparent conductive layer and the lead electrode through the first connecting line, and can strengthen the electrical connection strength between the transparent conductive layer and the lead electrode, so that the conductive property of the conductive film is good, and the yield rate is improved.
  • FIG. 1 is a schematic structural view of a transparent conductive film of Embodiment 1;
  • Figure 2 is a schematic enlarged view of the structure of Figure 1;
  • FIG. 3 is a schematic view showing another perspective view of the transparent conductive film shown in FIG. 1;
  • FIG. 4 is a schematic structural view of a transparent conductive film of Embodiment 2;
  • FIG. 5 is a schematic structural view of a transparent conductive film of Embodiment 3.
  • FIG. 6 is a schematic structural view of a transparent conductive film of Embodiment 4.
  • FIG. 7 is a schematic structural view of a transparent conductive film of Embodiment 5.
  • FIG. 8 is a schematic structural view of a transparent conductive film of Embodiment 6;
  • FIG. 9 is a schematic structural view of a transparent conductive film of Embodiment 7.
  • FIG. 10 is a schematic structural view of an alignment mark of a transparent conductive film
  • Figure 11 is a schematic enlarged view of the structure at B in Figure 10.
  • a transparent conductive film 100 includes a substrate 110, a transparent conductive layer 120, a lead electrode 130, and a first connecting line 140.
  • the substrate 110 includes a first region 112 and a second region 114 at an edge of the substrate 110.
  • the transparent conductive layer 120 is formed on the first region 112, and the lead electrode 130 is formed on the second region 114.
  • the first connection line 140 is formed on the substrate 110 and located at The transparent conductive layer 120 is between the lead electrode 130.
  • the transparent conductive layer 120 includes a first conductive mesh 122 containing a conductive material; the lead electrode 130 includes a second conductive mesh 132 containing a conductive material.
  • the conductive material of the first conductive mesh 122 is electrically connected to the conductive material of the second conductive mesh 132 through the first connection line 140.
  • the first region 112 is located at an intermediate region above the substrate 110
  • the second region 114 is located at an edge region of both sides of the substrate 110.
  • the transparent conductive layer 120 is buried in the first region 112 disposed on the substrate 110, and the lead electrode 130 is formed in the second region 114 at the edge of the substrate 110, and is disposed between the transparent conductive layer 120 and the lead electrode 130.
  • the first connecting line 140 electrically connects the conductive material of the first conductive mesh 122 and the conductive material of the second conductive mesh 132 through the first connecting line 140.
  • the lead electrode 130 is formed by embedding a conductive material in the first region 112 of the substrate 110 to form the transparent conductive layer 120, and then routing the second conductive mesh 132 in the second region 114.
  • a first connection line 140 is disposed between the transparent conductive layer 120 and the lead electrode 130, and the transparent conductive layer 120 is electrically connected to the lead electrode 130 through the first connection line 140, and the transparent conductive layer 120 and the lead are strengthened.
  • the electrode 130 is electrically connected to the strength to make the conductive film have good electrical conductivity and improve the yield.
  • a transparent boundary line is formed at the junction of the transparent conductive layer 120 and the lead electrode 130 , and the first connecting line 140 is disposed on the boundary line, so that the first conductive mesh 122
  • the electrically conductive material is in communication with the electrically conductive material of the second electrically conductive mesh 132.
  • the conductive material of the transparent conductive layer 120, the lead electrode 130 and the first connecting line 140 may each be selected from gold, silver, copper, aluminum, nickel, zinc or an alloy of at least two of them. It can be understood that the material for preparing the transparent conductive layer 120 is an electric conductor to achieve a corresponding function, such as carbon nanotubes, graphene, conductive polymer, and the like. In this embodiment, the material of the lead electrode 130 and the first connecting line 140 are both nano silver wires.
  • the material of the substrate 110 may be polyethylene terephthalate.
  • the substrate 110 may also be made of other materials such as polybutylene terephthalate, polymethyl methacrylate, polycarbonate plastic, glass, etc., preferably a transparent insulating material.
  • the transparent conductive film 100 further includes a transition portion 150 extending from the edge of the first conductive mesh 122.
  • the transition portion 150 is located in the second region 114, and the transition portion 150 is disposed on the first conductive portion.
  • the transition section 150 includes a third conductive grid 152 containing a conductive material, the density of the grid lines of the third conductive grid 152 being greater than the grid line of the first conductive grid 122. Density.
  • the grid lines are formed by providing a conductive material, that is, the density of the grid lines refers to the density of the conductive material.
  • a third conductive mesh 152 extends from the edge of the first conductive mesh 122, and the first conductive mesh 122 is connected to the first connection line 140 through the third conductive mesh 152. Since the density of the grid lines of the third conductive grid 152 is greater than the density of the grid lines of the first conductive grid 122, it is further ensured that more conductive materials of the first conductive grid 122 located at the boundary line are connected to the first connection line 140. The connection strength between the transparent conductive layer 120 and the lead electrode 130 is enhanced to make the conductivity of the conductive film better.
  • the density of the grid lines of the first conductive mesh 122 and the grid of the third conductive mesh 152 may be reasonably set.
  • the density of the lines is less than the density of the grid lines of the second conductive mesh 132.
  • the transition section 150 further includes a second connecting wire 154 , and the third conductive mesh 152 is electrically connected to the first conductive mesh 122 through the second connecting line 154 , and the third conductive mesh 152 .
  • the first connecting line 140 is electrically connected to the second conductive mesh 132, and the length of the second connecting line 154 is greater than the length of the first connecting line 140.
  • a second connecting line 154 is disposed between the third conductive grid 152 and the first conductive grid 122, and the length of the second connecting line 154 is greater than the length of the first connecting line 140.
  • the second connecting line 154 can be further The conductive material of the plurality of first conductive meshes 122 is in contact, thereby ensuring that the conductive material of the first conductive mesh 122 is electrically connected to the conductive material of the third conductive mesh 152, and the third conductive mesh 152 is passed through A connection line 140 is electrically connected to the second conductive mesh 132. In this way, the electrical connection strength between the transparent conductive layer 120 and the lead electrode 130 can be further enhanced, and the conductivity of the conductive film can be improved.
  • the mesh shape of the first conductive mesh 122 is a random mesh.
  • the first conductive grid 122 includes a plurality of first grid cells.
  • the grid periods of at least two first grid cells are not Similarly, the mesh shape of the first conductive mesh 122 is a random mesh, and the first mesh unit is distributed at each angle of the transparent conductive layer 120.
  • the grid period is the size of each grid unit.
  • the random mesh may be periodically spliced by the local random mesh unit, that is, the global random mesh includes a plurality of local random mesh units, and the size of the local random mesh unit is greater than 1 mm.
  • Moiré fringes are optical phenomena that are visually interfering between two lines or two objects at a constant angle and frequency. When the human eye cannot distinguish between the two lines or two objects, it can only be seen. To the pattern of interference, this optical phenomenon is the moire fringe.
  • the shape of the first grid unit may be a rhombus, a rectangle, a parallelogram, a curved quadrilateral or a polygon, and the curved quadrilateral has four curved sides, and the opposite two curved sides have the same shape and a curved course.
  • the mesh shape of the first conductive mesh 122 is a regular mesh, that is, all the first mesh cells of the first conductive mesh 122.
  • the grid period is the same.
  • the mesh shape of the second conductive mesh 132 is a regular mesh, that is, the second conductive mesh 132 includes a plurality of second mesh cells, and all of the second mesh cells
  • the grid periods are all the same
  • the grid shape of the third conductive grid 152 is a regular grid, that is, the third conductive grid 152 includes a plurality of third grid cells, and the grid periods of all the third grid cells are the same.
  • the grid period refers to the size of each grid unit.
  • the second conductive mesh 132 and the third conductive mesh 152 both adopt a regular mesh, which can improve the conductivity stability of the conductive film, that is, improve the conductive performance of the conductive film, and the manufacturing process is simple, and the connection convenience is improved. ,save costs.
  • the mesh shapes of the second conductive mesh 132 and the third conductive mesh 152 may also be random meshes, that is, the second mesh cells constituting the second conductive mesh 132 and the third conductive mesh.
  • the grid periods of the third grid cells of cell 152 may also be different.
  • the shape of the second grid unit and the third grid unit may be a rhombus, a rectangle, a parallelogram, a curved quadrilateral or a polygon, and the curved quadrilateral has four curved sides, and the opposite two curved sides have the same shape and The curve goes.
  • the substrate 110 is provided with a predetermined shape of the trench 118.
  • the conductive material of the transparent conductive layer 120, the conductive material of the lead electrode 130, and the conductive material of the first connecting line 140 are respectively disposed correspondingly.
  • the surface of the substrate 110 is embossed by an imprinting mold to form a trench 118 corresponding to the first trench, the second trench, and the third trench, wherein the first trench is located in the first region 112.
  • the second trench and the third trench are both located in the second region 114.
  • the third trench is located between the first trench and the second trench, that is, the third trench is located between the transparent conductive layer 120 and the lead electrode 130.
  • the conductive material is filled in the first trench, and the first conductive mesh 122 is formed by a sintering process to form the transparent conductive layer 120, the conductive material is filled in the second trench, and the second conductive mesh is formed by a sintering process. 132.
  • the lead electrode 130 is formed, a conductive material is filled in the third trench, and the first connection line 140 is formed by a sintering process.
  • the transparent conductive film 100 further includes an alignment mark 170 , which is disposed on the substrate 110 .
  • the alignment mark 170 can be used to conveniently align the conductive film on the touch screen to ensure the conductivity of the conductive film.
  • the alignment mark 170 may be formed by orthogonal grid lines having a line width of 2.2 ⁇ m, a grid period of 8 ⁇ m, and a relative transmittance of 53.5%.
  • the depth of the trench 118 is The ratio of the widths can be reasonably set to not less than 1, and the width of the grooves 118 is reasonably set to be not more than 10 ⁇ m.
  • the lead electrode 130 can also be directly protruded from the surface of the second region 114 .
  • the conductive material of the lead electrode 130 may be formed on the surface of the second region 114 by inkjet printing to form the lead electrode 130. While ensuring the conductivity of the conductive film, the manufacturing process is simple and cost-effective.
  • the width of the lead electrode 130 can be reasonably set to 2 ⁇ m to 20 ⁇ m, and the height of the lead electrode 130 is reasonably set to 5 ⁇ m to 10 ⁇ m.
  • the substrate 110 includes a substrate layer 116 attached to one side of the substrate 110, and the first region 112 and the second region 114 are both located in the substrate layer. 116. Therein, the first region 112 and the second region 114 may both be located in the substrate layer 116 by applying a gel on the substrate 110 and curing the gel to form the matrix layer 116.
  • the first region 112 is provided with a transparent conductive layer 120; at the edge of the upper surface of the substrate layer 116, that is, the second region 114 is provided with a lead electrode 130,
  • the light shielding layer 160 is disposed on a lower surface of the second region 114 of the substrate layer 116.
  • the substrate layer 116 can be used for insulation and molding.
  • the material of the matrix layer 116 may be OCA glue, UV glue, thermosetting glue or self-drying glue.
  • both the first region 112 and the second region 114 can also be disposed directly on the side of the substrate 110, so the matrix layer 116 is not necessary.
  • the sixth embodiment shown in FIG. 8 indicates that the first region 112 and the second region 114 are directly disposed on the substrate 110 side, and the lead electrode 130 is embedded in the second region 114.
  • the seventh embodiment shown in FIG. 9 indicates that the first region 112 and the second region 114 are directly disposed on the substrate 110 side, and the lead electrode 130 is protruded from the surface of the second region 114.
  • a light shielding layer 160 is further disposed on the edge of the substrate 110 , that is, the light shielding layer 160 is located in the second region 114 of the substrate layer 116 , and the lead electrode 130 is formed on a side of the matrix layer 116 away from the light shielding layer 160.
  • the material of the light shielding layer 160 is sprayed on the surface of the substrate 110 corresponding to the second region 114 of the substrate layer 116 to form the light shielding layer 160.
  • the first region 112 in which the transparent conductive layer 120 is formed is a transparent region and has a display function
  • the light shielding layer 160 is disposed on the edge of the substrate 110, that is, the second region 114, so that the contrast of the display region is stronger and the display effect is enhanced.
  • the lead electrode 130 located in the light shielding layer 160 can be blocked to improve the visual effect during use.
  • the material of the light shielding layer 160 may be selected from ink. To ensure the light shielding effect of the light shielding layer 160, the width of the light shielding layer 160 may be reasonably set to 1 to 5 mm.

Abstract

一种透明导电膜（100），包括基底（110）、透明导电层（120）、引线电极（130）和第一连接线（140），基底（110）包括第一区域（112）和位于基底（110）边缘的第二区域（114），透明导电层（120）嵌设于第一区域（112），引线电极（130）形成于第二区域（114）；第一连接线（140）形成于基底（110）并位于透明导电层（120）与引线电极（130）之间，以使第一导电网格（122）的导电材料与第二导电网格（132）的导电材料电连接；将透明导电层（120）嵌设于基底（110）的第一区域（112），在位于基底（110）边缘的第二区域（114）形成引线电极（130），与此同时，在透明导电层（120）与引线电极（130）之间设置第一连接线（140），通过第一连接线（140）来实现透明导电层（120）与引线电极电（140）连接的目的，可加强透明导电层（120）与引线电极（140）电连接强度，使导电膜（100）的导电性能好，提高良品率。

Description

透明导电膜
【技术领域】
本发明涉及一种透明导电膜。
【背景技术】
触摸屏（touch screen）又称为“触控屏”、“触控面板”，是一种可接收触头等输入讯号的感应式液晶显示系统，可用以取代机械式的按钮面板，并借由液晶显示画面制造出生动的影音效果。
目前，导电层是触摸屏中至关重要的组成部分。传统的触摸屏一般采用掺锡氧化铟（Indium Tin Oxides，ITO）导电层。在制备ITO层时，总是不可避免的需要镀膜，图形化，电极银引线制作。且在ITO图形化的时候需要对ITO膜进行蚀刻，这种传统的制作流程复杂且冗长，使导电层的导电性差，从而导致良品率不高。
【发明内容】
基于此，有必要提供一种导电性能好，良品率高的透明导电膜。
一种透明导电膜，包括：
基底，包括第一区域，及位于所述基底边缘的第二区域；
透明导电层，形成于所述基底的第一区域，所述透明导电层包括含有导电材料的第一导电网格；
引线电极，形成于所述基底的第二区域，所述引线电极包括含有导电材料的第二导电网格；
第一连接线，形成于所述基底并位于所述透明导电层与所述引线电极之间，所述第一导电网格的导电材料与所述第二导电网格的导电材料通过所述第一连接线电连接。
在其中一个实施例中，还包括由第一导电网格的边缘延伸出的过渡段，所述过渡段位于所述第二区域，所述过渡段设置于所述第一导电网格与所述第一连接线之间，所述过渡段包括含有导电材料的第三导电网格，所述第三导电网格的网格线的密度不小于所述第一导电网格的网格线的密度。
在其中一个实施例中，所述第一导电网格的网格线的密度和所述第三导电网格的网格线的密度均小于所述第二导电网格的网格线的密度。
在其中一个实施例中，所述过渡段包括第二连接线，所述第三导电网格通过所述第二连接线与所述第一导电网格电连接，所述第三导电网格通过所述第一连接线与所述第二导电网格电连接，所述第二连接线的长度大于所述第一连接线的长度。
在其中一个实施例中，所述基底开设有预设形状的沟槽，所述透明导电层的导电材料、所述引线电极的导电材料和所述第一连接线的导电材料均分别对应设置于所述沟槽。
在其中一个实施例中，所述沟槽的深度与宽度的比值不小于1，所述沟槽的宽度不大于10μm。
在其中一个实施例中，所述引线电极凸设于所述第二区域的表面。
在其中一个实施例中，所述引线电极通过喷墨打印形成于所述第二区域的表面。
在其中一个实施例中，所述引线电极的最小宽度为2μm~20μm，所述引线电极的高度为5μm~10μm。
在其中一个实施例中，所述基底还包括基质层，所述基质层附着于所述基底的一侧，所述第一区域和所述第二区域均位于所述基质层。
在其中一个实施例中，还包括遮光层，所述遮光层位于所述基底的边缘，所述引线电极形成于所述基质层远离所述遮光层的一侧。
在其中一个实施例中，所述遮光层的宽度为1 mm ~5mm。
在其中一个实施例中，所述第一导电网格、所述第二导电网格和/或所述第三导电网格的网格形状均为规则网格或者随机网格。
在其中一个实施例中，所述透明导电层、所述引线电极和所述第一连接线的导电材料均为金、银、铜、铝、镍、锌或其中至少二者的合金中的一种。
在其中一个实施例中，所述基底的材料为聚对苯二甲酸乙二酯、聚对苯二甲酸丁二酯、聚甲基丙烯酸甲酯、聚碳酸酯塑料或者玻璃。
在其中一个实施例中，还包括对准标记，所述对准标记设置于所述基底。
上述透明导电膜，将透明导电层嵌设于基底的第一区域，在位于基底边缘的第二区域形成引线电极，在透明导电层与引线电极之间设置第一连接线，使第一导电网格的导电材料与第二导电网格的导电材料通过第一连接线电连接。如此，通过在基底的第一区域嵌设第一导电网格以形成透明导电层，再将第二区域布设第二导电网格形成引线电极，与此同时在透明导电层与引线电极之间设置第一连接线，通过第一连接线来实现透明导电层与引线电极电连接的目的，可加强透明导电层与引线电极电连接强度，使导电膜的导电性能好，提高良品率。
【附图说明】
图1为实施例一的透明导电膜的结构示意图；
图2为图1中A处的放大结构示意图；
图3为图1所示的透明导电膜的另一视角结构示意图；
图4为实施例二的透明导电膜的结构示意图；
图5为实施例三的透明导电膜的结构示意图；
图6为实施例四的透明导电膜的结构示意图；
图7为实施例五的透明导电膜的结构示意图；
图8为实施例六的透明导电膜的结构示意图；
图9为实施例七的透明导电膜的结构示意图；
图10为透明导电膜的对准标记的结构示意图；
图11为图10中B处的放大结构示意图。
【具体实施方式】
下面结合附图和具体实施例对本发明做进一步说明。
如图1、图2和图3所示的实施例一，一种透明导电膜100，包括基底110、透明导电层120、引线电极130和第一连接线140。基底110包括第一区域112和位于基底110边缘的第二区域114，透明导电层120形成于第一区域112，引线电极130形成于第二区域114，第一连接线140形成于基底110并位于透明导电层120与引线电极130之间。其中，透明导电层120包括含有导电材料的第一导电网格122；引线电极130包括含有导电材料的第二导电网格132。第一导电网格122的导电材料通过第一连接线140与第二导电网格132的导电材料电连接。具体如图3所示，第一区域112位于基底110上方的中间区域，第二区域114位于基底110两边的边缘区域。
上述透明导电膜100，将透明导电层120埋入设置于基底110的第一区域112，在位于基底110边缘的第二区域114形成引线电极130，在透明导电层120与引线电极130之间设置第一连接线140，使第一导电网格122的导电材料与第二导电网格132的导电材料通过第一连接线140电连接。
如此，通过将导电材料埋入设置于基底110的第一区域112，以形成透明导电层120，再在第二区域114布设第二导电网格132形成引线电极130。与此同时在透明导电层120与引线电极130之间设置第一连接线140，通过第一连接线140来实现透明导电层120与引线电极130电连接的目的，可加强透明导电层120与引线电极130电连接强度，使导电膜的导电性能好，提高良品率。
请参阅图2，具体到本实施例中，透明导电层120与引线电极130连接处会形成一虚拟边界线，将该第一连接线140设置于该分界线，从而第一导电网格122的导电材料与第二导电网格132的导电材料连通。
其中，透明导电层120、引线电极130和第一连接线140的导电材料均可以选用金、银、铜、铝、镍、锌或其中至少二者的合金中的一种。其中可以理解，制备透明导电层120的材料为电的导体即可实现相应的功能，如碳纳米管，石墨烯，导电高分子等。在本实施例中，引线电极130和第一连接线140的材料均为纳米银线。
其中，基底110的材料可以为聚对苯二甲酸乙二酯。在其它的实施例中，该基底110还可以为其它材质，例如聚对苯二甲酸丁二酯、聚甲基丙烯酸甲酯、聚碳酸酯塑料以及玻璃等，以透明绝缘材料为佳。
请参阅图4所示的实施例二，透明导电膜100还包括由第一导电网格122的边缘延伸出的过渡段150，过渡段150位于第二区域114，过渡段150设置于第一导电网格122与第一连接线140之间，过渡段150包括含有导电材料的第三导电网格152，第三导电网格152的网格线的密度大于第一导电网格122的网格线的密度。该网格线是通过设置导电材料形成，即网格线的密度指的是导电材料的密集程度。在第一导电网格122边缘延伸出第三导电网格152，第一导电网格122通过第三导电网格152与第一连接线140连接。因第三导电网格152网格线的密度大于第一导电网格122网格线的密度，从而可进一步保证更多位于边界线的第一导电网格122导电材料与第一连接线140连接，加强了透明导电层120与引线电极130的连接强度，使导电膜的导电性更好。
为了进一步保证引线电极130的导电材料与足够多的透明导电层120的导电材料电连接的目的，可合理设置第一导电网格122的网格线的密度和第三导电网格152的网格线的密度均小于第二导电网格132的网格线的密度。
请参阅图4所示的实施例二，过渡段150还包括第二连接线154，第三导电网格152通过第二连接线154与第一导电网格122电连接，第三导电网格152通过第一连接线140与第二导电网格132电连接，第二连接线154的长度大于第一连接线140的长度。在第三导电网格152与第一导电网格122之间加设第二连接线154，且第二连接线154的长度大于第一连接线140的长度，故第二连接线154可与更多的第一导电网格122的导电材料接触，从而保证足够多的第一导电网格122的导电材料可与第三导电网格152的导电材料电连接，第三导电网格152再通过第一连接线140与第二导电网格132电连接。如此，可进一步加强透明导电层120与引线电极130的电连接强度，提高导电膜的导电性。
请参阅图2所示的实施例一和图4所示的实施例二，第一导电网格122的网格形状为随机网格。第一导电网格122包括多个第一网格单元，在将透明导电膜100与其他显示装置贴合时，为了避免莫尔条纹的产生，至少两个第一网格单元的网格周期不相同，即第一导电网格122的网格形状为随机网格，在透明导电层120的各个角度均分布有第一网格单元。其中，网格周期为每个网格单元的大小。具体地，该随机网格可以是通过局部随机网格单元经周期性拼接而成，即整体随机网格包括多个局部随机网格单元，该局部随机网格单元的大小大于1mm。
莫尔条纹是一种光学现象，是两条线或两个物体之间，以恒定的角度和频率发生干涉的视觉结果，当人眼无法分辨这两条线或两个物体时，只能看到干涉的花纹，这种光学现象就是莫尔条纹。其中，第一网格单元的形状可以为菱形、矩形、平行四边形、曲边四边形或者多边形，曲边四边形具有四条曲边，相对的两条曲边具有相同的形状及曲线走向。
请参阅图5所示的实施例三和图6所示的实施例四，第一导电网格122的网格形状为规则网格，即第一导电网格122所有的第一网格单元的网格周期均相同。如此，在将透明导电膜100与其他显示装置贴合时，特别是对于显示屏幕较小的显示装置，可避免显示图片出现紊乱的现象。
请参阅图4所示的实施例二，第二导电网格132的网格形状为规则网格，即第二导电网格132包括多个第二网格单元，所有的第二网格单元的网格周期均相同，第三导电网格152的网格形状为规则的网格，即第三导电网格152包括多个第三网格单元，所有的第三网格单元的网格周期均相同。其中，网格周期指的是每个网格单元的大小。如此，第二导电网格132和第三导电网格152均采用规则网格，可提高导电膜导电的稳定性，即提高了导电膜的导电性能，且制作过程简单，提高了连接的便利性，节约成本。需要指出的是，第二导电网格132和第三导电网格152的网格形状均还可以为随机网格，即构成第二导电网格132的第二网格单元和构成第三导电网格152的第三网格单元的网格周期均还可以不相同。
其中，第二网格单元和第三网格单元的形状均可以为菱形、矩形、平行四边形、曲边四边形或者多边形，曲边四边形具有四条曲边，相对的两条曲边具有相同的形状及曲线走向。
请参阅图3所示的实施例一，基底110开设有预设形状的沟槽118，透明导电层120的导电材料、引线电极130的导电材料和第一连接线140的导电材料均分别对应设置于沟槽118。具体地，在基底110表面通过压印模具压印以形成沟槽118，该沟槽118对应包括第一沟槽、第二沟槽和第三沟槽，其中，第一沟槽位于第一区域112，第二沟槽和第三沟槽均位于第二区域114，第三沟槽位于第一沟槽和第二沟槽之间，即第三沟槽位于透明导电层120与引线电极130之间，将导电材料填充于第一沟槽，并通过烧结工艺形成第一导电网格122，构成透明导电层120，将导电材料填充于第二沟槽，并通过烧结工艺形成第二导电网格132，构成引线电极130，将导电材料填充于第三沟槽，并通过烧结工艺形成第一连接线140。通过采用沟槽118，可一次压印成型，简化压印模具，制作工艺简便，节约成本。同时可加强导电材料与电路板键合时的粘合强度，进一步提高导电膜的导电性。
如图10和图11所示，具体到本实施例中，透明导电膜100还包括对准标记170，该对准标记170设置于基底110。采用对准标记170可方便将导电膜准确对位安装于触摸屏，保证导电膜的导电性。对准标记170可以为正交的网格线构成，该对准标记170的线宽可以为2.2μm，网格周期为8μm，相对透过率可以为53.5%。
还请参阅图3，具体到本实施例中，为了保证导电材料填充于沟槽118后，在经过烧结成型的过程中不发生断裂，以及为了保证导电膜的导电性，沟槽118的深度与宽度的比值可合理设置为不小于1，沟槽118的宽度合理设置为不大于10μm。
请参阅图7所示的实施例五，引线电极130还可以直接凸设于第二区域114的表面。具体地，引线电极130的导电材料可通过喷墨打印形成于第二区域114表面，形成引线电极130。在保证导电膜导电性的同时，该制作工艺简便，节约成本。
具体地，为了保证导电膜的导电性，所述引线电极130的宽度可合理设置为2μm~20μm，所述引线电极130的高度合理设置为5μm~10μm。
请参阅图3所示的实施例一，所述基底110包括基质层116，基质层116附着于基底110的一侧，所述第一区域112和所述第二区域114均位于所述基质层116。其中，可通过在基底110上涂覆胶状物，并使胶状物固化以形成基质层116，第一区域112和第二区域114均位于基质层116。在本实施例中，在基质层116的上表面的中间，即第一区域112设有透明导电层120；在基质层116的上表面的边缘，即第二区域114设有引线电极130，将遮光层160设置于基质层116第二区域114的下表面。该基质层116可用于绝缘和成型。其中，基质层116的材料可以为OCA胶、UV胶、热固胶或者自干胶等。
需要指出的是，第一区域112和第二区域114均还可以直接设置于基底110一侧，所以基质层116不是必须的。如图8所示的实施例六，表示的是第一区域112和第二区域114均直接设置于基底110一侧，且引线电极130嵌设于第二区域114。如图9所示的实施例七，表示的是第一区域112和第二区域114均直接设置于基底110一侧，且引线电极130凸设于第二区域114表面。
请参阅图3所示的实施例一，还包括遮光层160，所述遮光层160位于所述基底110的边缘，即遮光层160位于所述基质层116的第二区域114，所述引线电极130形成于所述基质层116远离所述遮光层160的一侧。在基底110对应基质层116第二区域114的表面喷涂遮光层160的材料，以形成遮光层160。因形成有透明导电层120的第一区域112为透明区域，还具有显示功能，在基底110的边缘也就是第二区域114设置遮光层160，可使显示区域的对比度更强，加强显示效果。同时也可以遮挡位于遮光层160的引线电极130，改善在使用过程中的视觉效果。其中遮光层160的材料可以选用油墨，为了保证遮光层160的遮光效果，遮光层160的宽度可合理设置为1~5mm。
以上所述实施例仅表达了本发明的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对本发明专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本发明构思的前提下，还可以做出若干变形和改进，这些都属于本发明的保护范围。因此，本发明专利的保护范围应以所附权利要求为准。

Claims (16)

  1. 一种透明导电膜，其特征在于，包括：
    基底，包括第一区域，及位于所述基底边缘的第二区域；
    透明导电层，形成于所述基底的第一区域，所述透明导电层包括含有导电材料的第一导电网格；
    引线电极，形成于所述基底的第二区域，所述引线电极包括含有导电材料的第二导电网格；
    第一连接线，形成于所述基底并位于所述透明导电层与所述引线电极之间，所述第一导电网格的导电材料与所述第二导电网格的导电材料通过所述第一连接线电连接。
  2. 根据权利要求1所述的透明导电膜，其特征在于，还包括由第一导电网格的边缘延伸出的过渡段，所述过渡段位于所述第二区域，所述过渡段设置于所述第一导电网格与所述第一连接线之间，所述过渡段包括含有导电材料的第三导电网格，所述第三导电网格的网格线的密度不小于所述第一导电网格的网格线的密度。
  3. 根据权利要求2所述的透明导电膜，其特征在于，所述第一导电网格的网格线的密度和所述第三导电网格的网格线的密度均小于所述第二导电网格的网格线的密度。
  4. 根据权利要求2所述的透明导电膜，其特征在于，所述过渡段包括第二连接线，所述第三导电网格通过所述第二连接线与所述第一导电网格电连接，所述第三导电网格通过所述第一连接线与所述第二导电网格电连接，所述第二连接线的长度大于所述第一连接线的长度。
  5. 根据权利要求1所述的透明导电膜，其特征在于，所述基底开设有预设形状的沟槽，所述透明导电层的导电材料、所述引线电极的导电材料和所述第一连接线的导电材料均分别对应设置于所述沟槽。
  6. 根据权利要求5所述的透明导电膜，其特征在于，所述沟槽的深度与宽度的比值不小于1，所述沟槽的宽度不大于10μm。
  7. 根据权利要求1所述的透明导电膜，其特征在于，所述引线电极凸设于所述第二区域的表面。
  8. 根据权利要求1所述的透明导电膜，其特征在于，所述引线电极通过喷墨打印形成于所述第二区域的表面。
  9. 根据权利要求1所述的透明导电膜，其特征在于，所述引线电极的最小宽度为2μm~20μm，所述引线电极的高度为5μm~10μm。
  10. 根据权利要求1所述的透明导电膜，其特征在于，所述基底还包括基质层，所述基质层附着于所述基底的一侧，所述第一区域和所述第二区域均位于所述基质层。
  11. 根据权利要求10所述的透明导电膜，其特征在于，还包括遮光层，所述遮光层位于所述基底的边缘，所述引线电极形成于所述基质层远离所述遮光层的一侧。
  12. 根据权利要求11的透明导电膜，其特征在于，所述遮光层的宽度为1 mm ~5mm。
  13. 根据权利要求2的透明导电膜，其特征在于，所述第一导电网格、所述第二导电网格和/或所述第三导电网格的网格形状均为规则网格或者随机网格。
  14. 根据权利要求1的透明导电膜，其特征在于，所述透明导电层、所述引线电极和所述第一连接线的导电材料均为金、银、铜、铝、镍、锌或其中至少二者的合金中的一种。
  15. 根据权利要求1的透明导电膜，其特征在于，所述基底的材料为聚对苯二甲酸乙二酯、聚对苯二甲酸丁二酯、聚甲基丙烯酸甲酯、聚碳酸酯塑料或者玻璃。
  16. 根据权利要求1的透明导电膜，其特征在于，还包括对准标记，所述对准标记设置于所述基底。
PCT/CN2013/078940 2013-03-28 2013-07-06 透明导电膜 WO2014153897A1 (zh)

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WO2016208636A1 (ja) * 2015-06-22 2016-12-29 株式会社フジクラ 配線体、配線基板、及びタッチセンサ
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TWI674589B (zh) * 2018-07-10 2019-10-11 凌巨科技股份有限公司 石墨烯電路層的製造方法及可撓式觸控面板

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JP6755000B2 (ja) * 2016-03-28 2020-09-16 パナソニックＩｐマネジメント株式会社 タッチパネルセンサー用部材及びタッチパネル

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CN106155403A (zh) * 2015-04-27 2016-11-23 南昌欧菲光显示技术有限公司 触控元件
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EP3396500A4 (en) * 2015-12-25 2019-05-08 Fujikura Ltd. WIRING BODY, WIRING SUBSTRATE, AND TOUCH SENSOR
TWI674589B (zh) * 2018-07-10 2019-10-11 凌巨科技股份有限公司 石墨烯電路層的製造方法及可撓式觸控面板

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