WO2014148263A1 - 表示装置およびその製造方法ならびに電子機器 - Google Patents
表示装置およびその製造方法ならびに電子機器 Download PDFInfo
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- WO2014148263A1 WO2014148263A1 PCT/JP2014/055675 JP2014055675W WO2014148263A1 WO 2014148263 A1 WO2014148263 A1 WO 2014148263A1 JP 2014055675 W JP2014055675 W JP 2014055675W WO 2014148263 A1 WO2014148263 A1 WO 2014148263A1
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- display device
- insulating film
- light
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Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
- H10K59/352—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels the areas of the RGB subpixels being different
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/856—Arrangements for extracting light from the devices comprising reflective means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present disclosure relates to a display device that emits light using an organic electroluminescence (EL) phenomenon, a method for manufacturing the display device, and an electronic apparatus including the display device.
- EL organic electroluminescence
- the organic EL element attracting attention as a next-generation display element has an advantage of not only a wide viewing angle and excellent contrast but also a quick response time as a spontaneous emission type display element.
- Organic EL element has a configuration in which a plurality of layers including a light emitting layer are laminated. Specifically, it is composed of, for example, a wiring layer connected to a TFT for controlling the driving of a light emitting element, an anode for injecting holes, a light emitting layer, a cathode for injecting electrons, a resin, a color filter layer, and a pixel separation layer. Yes.
- the light emitting element holes and electrons are injected into the light emitting layer from the anode side and the cathode side, respectively, and light is emitted by recombination of the holes and electrons.
- Either the anode or the cathode sandwiching the light emitting layer also functions as a reflecting mirror, and produces different interference effects depending on the light emitting angle and wavelength. For this reason, the light emission intensity of the light emitting element varies greatly depending on the light emission angle and the wavelength.
- Patent Document 1 discloses a display device in which the optical distance of a light emitting element provided with a resonance unit is set for each element.
- the display device of Patent Document 1 has a problem that although the luminous efficiency is improved, the color reproducibility varies depending on the viewing angle. In addition, although the color reproducibility is improved in the display device of Patent Document 2, there is a problem that the manufacturing process becomes complicated.
- a display device includes a plurality of pixels that emit different emitted light, and an insulating film that is provided between the pixels and has a reflective surface for the emitted light. The angle of the reflection surface is set for each pixel.
- a method of manufacturing a display device includes disposing a plurality of pixels that emit different emission lights, and having a reflection surface for the emission light between the plurality of pixels, and the angle of the reflection surface is a pixel. Forming an insulating film set for each.
- An electronic apparatus includes the display device.
- an insulating film having a reflective surface is provided between the pixels, and the angle of the reflective surface of the insulating film is set for each pixel to be separately formed. It is possible to reflect emitted light having high emission intensity in each pixel in an arbitrary direction.
- the reflection surface angle of the insulating film is set for each pixel, and thus the emitted light having high emission intensity in each pixel.
- the injection direction is adjusted. Thereby, the color reproducibility of each pixel can be improved. In addition, it is possible to suppress variation in light emission luminance in each pixel.
- FIG. 2 is a cross-sectional view illustrating an example of one pixel of the display device illustrated in FIG. 1. It is a schematic diagram showing the optical path of the emitted light of the display apparatus which concerns on a comparative example. It is a characteristic view showing the relationship between the viewing angle and the luminance of the display device shown in FIG. 3A. It is a schematic diagram showing the optical path of the emitted light of the display apparatus shown in FIG. It is a characteristic view showing the relationship between the viewing angle of the display apparatus shown in FIG. 1, and a brightness
- FIG. 6 is a cross-sectional view illustrating another example of one pixel of the display device illustrated in FIG. 1.
- FIG. 12 is a cross-sectional view of a display device according to Modification 1.
- FIG. 10B is a plan view of the display device shown in FIG. 10A.
- 10 is an example of pixel shapes (A) to (D) according to Modification 2.
- FIG. 10 is a characteristic diagram illustrating a change in viewing angle and luminance in Example 2 of the present disclosure. It is a characteristic view showing the change of the viewing angle and the brightness
- FIG. 10 is a perspective view illustrating an appearance of Application Example 2 viewed from the front side.
- FIG. 12 is a perspective view illustrating an appearance of Application Example 2 viewed from the back side.
- FIG. 12 is a perspective view illustrating an appearance of application example 3.
- FIG. 14 is a perspective view illustrating an appearance of application example 4.
- FIG. 10 is a front view, a left side view, a right side view, a top view, and a bottom view of Application Example 5 in a closed state. It is the front view and side view of the application example 5 in the open state.
- Embodiment 1-1 Basic configuration 1-2. Overall configuration of display device 1-3. Manufacturing method 1-4. Action / Effect Modified example Modified example 1 (example in which the aperture ratio is adjusted for each pixel) Modification 2 (example of pixel shape) Modification 3 (example in which the reflectance of the insulating film is adjusted) 3.
- Example 4 Application examples (examples of electronic devices)
- FIG. 1 illustrates an example of a planar configuration of a display device (display device 1A) according to an embodiment of the present disclosure.
- the display device 1A is used for a camera finder, a head-mounted display, or the like, and has a configuration in which a plurality of pixels 2 are arranged in a display area 110 in a dot shape, for example.
- Each pixel 2 is composed of sub-pixels of three colors, for example, a red pixel 2R, a green pixel 2G, and a blue pixel 2B, and the sub-pixels 2R, 2G, and 2B each generate a corresponding monochromatic light.
- Red light emitting element 10R red pixel 2R that generates red monochromatic light
- green light emitting element 10G green pixel 2G that generates green monochromatic light
- blue light emitting element 10B blue pixel 2B that generates blue monochromatic light
- FIG. 2 shows a cross-sectional configuration of one pixel 2 shown in FIG.
- the pixel 2 is composed of the sub-pixels of the three colors of the red pixel 2R, the green pixel 2G, and the blue pixel 2B as described above, and each has a light emitting region partitioned by the insulating film 13 (13RG, 13GB, 13BR). is doing.
- the light emitting regions of the sub-pixels 2R, 2G, and 2B have a circular shape as shown in FIG. 1, for example.
- the insulating film 13 is a so-called partition that electrically separates the light emitting elements 10R, 10G, and 10B, and an opening 13A is provided as a light emitting region in each of the subpixels 2R, 2G, and 2B.
- the organic layer 14 including the light emitting layers 14C (the red light emitting layer 14CR, the green light emitting layer 14CG, and the blue light emitting layer 14CB) that constitute the corresponding light emitting elements 10R, 10G, and 10B.
- the material of the insulating film 13 include organic materials such as polyimide, novolac resin, and acrylic resin.
- the material is not limited thereto, and for example, an organic material and an inorganic material may be used in combination.
- the inorganic materials for example SiO 2, SiO, SiC, include SiN.
- the insulating film 13 may be formed as a single layer film made of the above organic material, for example. However, when the organic material and the inorganic material are combined, a stacked structure of the organic film and the inorganic film may be used.
- the cross-sectional shape of the insulating film 13 has, for example, a trapezoidal shape or a rectangular shape, and the side surface is a reflecting surface for the emitted light LR, LG, LB emitted from the light emitting layers 14CR, 14CG, 14CB.
- the emitted lights LR, LG, and LB are reflected by the reflecting surfaces, respectively, and are emitted upward as indicated by a one-dot broken line shown in FIG.
- the insulating film 13 has a reflection surface angle ( ⁇ ) set for each side surface surrounding the red pixel 2R, the green pixel 2G, and the blue pixel 2B.
- the reflection surface angle ( ⁇ ) is, for example, an angle formed between the upper surface of the first electrode 12 and the side surface of the insulating film 13 and may be, for example, 45 ° or more and 90 ° or less.
- FIG. 3A schematically shows a cross-sectional configuration of a display device 100 that is generally used and emitted light LR, LG, and LB from the light emitting elements 110R, 110G, and 110B.
- the solid line is light with high emission intensity
- the broken line is light with low emission intensity.
- the insulating film 113 provided between the light emitting elements 110R, 110G, and 110B is uniformly formed, that is, the reflection surface angle ( ⁇ ) of the insulating film 113 provided between the light emitting elements 110R, 110G, and 110B. Are formed at the same angle.
- the light emitted from the light emitting layers 114CR, 114CG, and 114CB of the light emitting elements 110R, 110G, and 110B has different emission intensity for each wavelength as described above.
- the emitted light emitted from each of the light emitting layers 114CR, 114CG, 114CB is reflected at each wavelength by the reflecting surface of the insulating film 113 as shown in FIG. 3A.
- the reflecting surface of the insulating film 113 is reflected in different directions. Therefore, a color shift at a viewing angle and a luminance variation as shown in FIG. 3B occur between the light emitting elements 110R, 110G, and 110B.
- FIG. 4A schematically shows the emission direction of the emitted light LR, LG, LB in the display device 1A of the present embodiment.
- the inclination angle of the insulating film 13 serving as the reflection surface of the emitted light LR, LG, LB that is, the reflection surface angle ( ⁇ ) is set for each sub-pixel 2R, 2G, 2B. ing.
- the light emitting elements 10R, 10G, and 10B have substantially uniform viewing angle characteristics. That is, the color shift and luminance variation between the sub-pixels 2R, 2G, and 2B are eliminated.
- the optimum reflection surface angle ( ⁇ ) of the insulating film 13 with respect to each of the emitted light beams LR, LG, LB includes the first electrode 12 and the light emitting layer 14C constituting each light emitting element 10 in addition to the wavelength of the reflected emitted light.
- the optimum angle varies depending on the film thickness of the organic layer 14 and the material constituting each layer. Therefore, the reflection surface angle ( ⁇ ) in each of the light emitting elements 10R, 10G, and 10B is a sample obtained by calculating an approximate value ( ⁇ ) using, for example, the following formula (1) where ⁇ is the angle at which the emission intensity is strong. Then, the color shift due to the viewing angle can be further reduced by further adjusting the reflection surface angle ( ⁇ ) of each insulating film 13.
- ⁇ 90 ⁇ / 2 (°) (1)
- the insulating film 13 having a different reflection surface angle ( ⁇ ) for each of the sub-pixels 2R, 2G, and 2B as in the present embodiment will be described in detail later.
- a photosensitive resin is used and formed by photolithography.
- Can do Specifically, for example, by using a photomask with a stepwise difference in light transmittance and a processing photoresist pattern adjusted to a corresponding side wall angle, an arbitrary reflecting surface is formed by combining with general dry etching. Can do.
- the reflection surface of the insulating film 13 is adjusted to an optimum angle for each of the red pixel 2R, the green pixel 2G, and the blue pixel 2B.
- any two sub-pixels have the same reflection angle, and the insulating film 13
- the reflection surface angle ( ⁇ ) may be designed.
- the red pixel 3R and the blue pixel 3B have the same reflection surface angle ( ⁇ ), and the red pixel 3R, the blue pixel 3B, and the green pixel 3G
- the reflection surface angle ( ⁇ ) of the insulating film 13 may be designed to adjust the emission direction of each emitted light.
- the upper surface of the insulating film 13 is described in a state of being horizontal with respect to the drive substrate 10.
- the present invention is not limited to this, and may have irregularities or curved surfaces.
- the thickness of the insulating film 13 only needs to be larger than the thickness of the first electrode 12, and preferably the film thickness that can reflect the light in the planar direction of the emitted light emitted from the light emitting layer 14C, for example, in the upper surface direction. If it is.
- the distance from the upper surface of the first electrode 12 to the upper surface of the partition wall 13 may be 1 ⁇ m or more.
- the upper limit is not particularly limited, but for example, it is preferable to set it to a pixel size or less.
- FIG. 6 illustrates the configuration of the display device 1A.
- This display device 1A is used as a small and medium-sized display device such as a camera finder provided with organic EL elements as the light emitting elements 10R, 10G, and 10B as described above.
- a signal line driver circuit 120 and a scanning line driver circuit 130 which are drivers for displaying images are included.
- a pixel driving circuit 140 is provided in the display area 110.
- FIG. 7 illustrates an example of the pixel driving circuit 140.
- the pixel driving circuit 140 is an active driving circuit formed below the first electrode 12 described later. That is, the pixel drive circuit 140 includes a drive transistor Tr1 and a write transistor Tr2, a capacitor (holding capacitor) Cs between the transistors Tr1 and Tr2, a first power supply line (Vcc), and a second power supply line (GND). ), The light emitting element 10R (or 10G, 10B) connected in series to the drive transistor Tr1.
- the drive transistor Tr1 and the write transistor Tr2 are configured by general thin film transistors, and the configuration thereof may be, for example, an inverted staggered structure (so-called bottom gate type) or a staggered structure (top gate type), and is not particularly limited.
- a plurality of signal lines 120A are arranged in the column direction, and a plurality of scanning lines 130A are arranged in the row direction.
- An intersection between each signal line 120A and each scanning line 130A corresponds to one of the light emitting elements 10R, 10G, and 10B (sub-pixel).
- Each signal line 120A is connected to the signal line drive circuit 120, and an image signal is supplied from the signal line drive circuit 120 to the source electrode of the write transistor Tr2 via the signal line 120A.
- Each scanning line 130A is connected to the scanning line driving circuit 130, and a scanning signal is sequentially supplied from the scanning line driving circuit 130 to the gate electrode of the writing transistor Tr2 via the scanning line 130A.
- each of the light emitting elements 10R, 10G, and 10B includes a driving transistor Tr1 of the pixel driving circuit 140 and a driving substrate 11 provided with a planarization insulating film (not shown), respectively.
- the first electrode 12 as the anode, the insulating film 13, the organic layer 14 including the light emitting layer 14C, and the second electrode 15 as the cathode are stacked in this order.
- the drive transistor Tr1 is electrically connected to the first electrode 12 through a connection hole (not shown) provided in the planarization insulating film.
- Such light emitting elements 10R, 10G, and 10B are covered with a protective layer 16, and a sealing substrate 19 is bonded to the entire surface of the protective layer 16 with an adhesive layer 17 interposed therebetween.
- the sealing substrate 19 includes a color filter 18A and a black matrix 18B.
- the color filter 18A is a color filter (a red filter 18AR, a green filter 18AG, a blue filter) of a corresponding color on the light emitting elements 10R, 10G, and 10B. 18AB) are arranged respectively.
- the protective layer 16 is made of silicon nitride (SiN x ), silicon oxide, metal oxide, or the like.
- the adhesive layer 17 is made of, for example, a thermosetting resin or an ultraviolet curable resin.
- the first electrode 12 also functions as a reflective layer, and it is desirable to increase the luminous efficiency to have as high a reflectance as possible.
- the first electrode 12 is preferably made of a material having a high hole injection property.
- the thickness in the stacking direction (hereinafter simply referred to as thickness) is 100 nm or more and 1000 nm or less, and chromium (Cr), gold (Au), platinum (Pt), nickel (Ni ), Copper (Cu), tungsten (W), silver (Ag) and the like, and simple elements or alloys of metal elements.
- a transparent conductive film such as an oxide of indium and tin (ITO) may be provided on the surface of the first electrode 12.
- ITO indium and tin
- Appropriate hole injection is possible even in materials such as aluminum (Al) alloys that have a high reflectivity, but have a problem of the presence of an oxide film on the surface and a hole injection barrier due to a low work function. By providing a layer, it can be used as the first electrode 12.
- the insulating film 13 is for ensuring insulation between the first electrode 12 and the second electrode 15 and partitioning the light emitting region into a desired shape, and is made of, for example, a photosensitive resin.
- the insulating film 13 is provided around the first electrode 12, and a region of the first electrode 12 exposed from the insulating film 13, that is, an opening 13A of the insulating film 13 is a light emitting region.
- the side surface of the insulating film 13 has an inclination angle set for each of the red pixel 2R, the green pixel 2G, and the blue pixel 2B, that is, a reflection surface angle ( ⁇ ).
- the organic layer 14 and the second electrode 15 are also provided on the insulating film 13, but light emission occurs only in the light emitting region.
- the organic layer 14 has, for example, a structure in which a hole injection layer 14A, a hole transport layer 14B, a light emitting layer 14C, an electron transport layer 14D, and an electron injection layer 14E are stacked in this order from the first electrode 12 side. Of these, layers other than the light emitting layer 14C may be provided as necessary.
- the organic layer 14 may have a different configuration depending on the emission color of the light emitting elements 10R, 10G, and 10B.
- the hole injection layer 14A is a buffer layer for improving hole injection efficiency and preventing leakage.
- the hole transport layer 14B is intended to increase the hole transport efficiency to the light emitting layer 14C.
- the light emitting layer 14C generates light by applying an electric field to recombine electrons and holes.
- the electron transport layer 14D is for increasing the efficiency of electron transport to the light emitting layer 14C.
- the electron injection layer 14E is for increasing the electron injection efficiency.
- the hole injection layer 14A of the light emitting element 10R has, for example, a thickness of 5 nm to 300 nm, and is made of, for example, a hexaazatriphenylene derivative.
- the hole transport layer 14B of the light emitting element 10R has, for example, a thickness of 5 nm to 300 nm and is made of bis [(N-naphthyl) -N-phenyl] benzidine ( ⁇ -NPD).
- the light-emitting layer 14C of the light-emitting element 10R has, for example, a thickness of 10 nm to 100 nm, and 2,6-bis [4- [N- (4-methoxyphenyl) -N-phenyl] is added to 8-quinolinol aluminum complex (Alq3). Aminostyryl] naphthalene-1,5-dicarbonitrile (BSN-BCN) mixed by 40% by volume.
- the electron transport layer 14D of the light emitting element 10R has, for example, a thickness of 5 nm to 300 nm and is made of Alq3.
- the electron injection layer 14E of the light emitting element 10R has, for example, a thickness of about 0.3 nm and is made of LiF, Li 2 O, or the like.
- the second electrode 15 has a thickness of about 10 nm and is made of an alloy of aluminum (Al), magnesium (Mg), calcium (Ca), or sodium (Na).
- an alloy of magnesium and silver (Mg—Ag alloy) is preferable because it has both conductivity in a thin film and low absorption.
- the material of the second electrode 15 may be an alloy of aluminum (Al) and lithium (Li) (Al—Li alloy).
- the second electrode 15 may also function as a semi-transmissive reflective layer.
- the light emitting element 10R has a resonator structure MC1
- light generated in the light emitting layer 14C by the resonator structure MC1 is emitted from the first electrode. 12 and the second electrode 15 are caused to resonate.
- the interface between the first electrode 12 and the organic layer 14 is a reflection surface P1
- the interface between the intermediate layer 18 and the electron injection layer 14E is a semi-transmissive reflection surface P2
- the organic layer 14 is a resonance portion.
- the light generated in the light emitting layer 14C is resonated and extracted from the transflective surface P2.
- the resonator structure MC1 is provided in this way, the light generated in the light emitting layer 14C causes multiple interference, the half width of the spectrum of light extracted from the transflective surface P2 side is reduced, and the peak intensity is reduced. Can be increased. That is, the light emission intensity in the front direction can be increased and the color purity of light emission can be improved.
- external light incident from the sealing substrate 19 side can also be attenuated by multiple interference, and the combination of the color filter 23 can reduce the reflectance of external light in the light emitting elements 10R, 10G, and 10B. .
- a planarizing insulating film is formed by applying a photosensitive resin to the entire surface.
- the planarization insulating film is patterned into a predetermined shape by exposure and development, and connection holes are formed and baked.
- the first electrode 12 made of the above-described material is formed by, for example, sputtering, and the first electrode 12 is selectively removed by wet etching, so that each of the light emitting elements 10R, 10G, and 10B is obtained.
- a photosensitive resin to be the insulating film 13 is applied over the entire surface of the drive substrate 11.
- an insulating film 13 is formed by providing an opening corresponding to the light emitting region by photolithography, for example, and baking.
- a photomask 21A having a different light transmittance is formed on each of the pixels 2R, 2G, and 2B on the photosensitive resin, and then exposed, and each of the photomasks having a specific inclination angle is exposed.
- a resist pattern 22 is formed.
- the photomask 21A is formed, for example, by applying a light-shielding resist film 21b to the lower surface of the glass substrate 21a and forming slits at predetermined positions.
- dry etching is performed using the photoresist pattern 22 as a mask to form insulating films 13 having different reflection surface angles ( ⁇ ) as shown in FIG. 8C.
- the photomask 21A in which a predetermined slit is formed at a position corresponding to each of the pixels 2R, 2G, and 2B is used.
- the present invention is not limited to this.
- a predetermined light transmittance is obtained as shown in FIG.
- the insulating film 13 may be processed using a photomask 21 ⁇ / b> B having an inclined angle.
- the hole injection layer 14A, the hole transport layer 14B, the light emitting layer 14C, and the electron transport layer 14D of the organic layer 14 made of the above-described thickness and material are formed by, for example, vapor deposition.
- the second electrode 15 made of the above-described thickness and material is formed by, for example, vapor deposition.
- the light emitting elements 10R, 10G, and 10B as shown in FIGS. 2 and 5 are formed.
- the protective layer 16 made of the above-described material is formed on the light emitting elements 10R, 10G, and 10B by, for example, CVD or sputtering.
- an adhesive layer 17 is formed on the protective layer 16, and a sealing substrate 19 including a color filter 18A and a black matrix 18B is bonded to the adhesive layer 17 therebetween.
- the display devices 1A and 1B shown in FIGS. 2 and 5 are completed.
- a scanning signal is supplied to each pixel 2 from the scanning line driving circuit 130 via the gate electrode of the writing transistor Tr2, and an image signal is sent from the signal line driving circuit 120 via the writing transistor Tr2. It is held in the holding capacitor Cs. That is, the driving transistor Tr1 is controlled to be turned on / off according to the signal held in the holding capacitor Cs, whereby the driving current Id is injected into the light emitting elements 10R, 10G, and 10B, thereby regenerating the holes and electrons. Combined to emit light.
- this light is multiple-reflected between the first electrode 12 and the second electrode 15, or the reflected light from the first electrode 12 and the light generated in the light emitting layer 14 ⁇ / b> C are intensified by interference, and the second electrode 15, the color filter 23 and the sealing substrate 19 are transmitted and taken out.
- the side surface of the insulating film 13 that separates the sub-pixels 2R, 2G, and 2B is used as a reflection surface for light emitted from the light emitting layer 14C, and the angle of the reflection surface (reflection surface angle ( ⁇ )) is set.
- Each subpixel 2R, 2G, and 2B is set.
- the insulating film 13 having a different reflection surface angle ( ⁇ ) for each of the sub-pixels 2R, 2G, 2B is photolithography using a photomask having a predetermined light transmittance at a position corresponding to each pixel 2R, 2G, 2B. It becomes possible to form by performing.
- the light emitting elements 10R, 10G, and 10B it is possible to reflect light emitted with high light emission intensity having different emission directions for each wavelength, in any direction. Specifically, the emitted light with high emission intensity is reflected in substantially the same direction between the sub-pixels 2R, 2G, and 2B.
- the sub-pixels 2R, 2G, and 2B are partitioned, and the inclination of the insulating film 13 that serves as a reflection surface of the light emitted from the light-emitting layer 14C.
- the surface (side surface) was formed by photolithography using a photomask having a predetermined light transmittance. Thereby, the inclined surface which has a different reflection angle for each pixel 2R, 2G, 2B can be formed easily.
- the inclined surfaces of the insulating films 13 of the sub-pixels 2R, 2G, and 2B are set to different angles suitable for the emitted light LR, LG, and LB of the light-emitting elements 10R, 10G, and 10B, specifically, different for each wavelength.
- the reflection direction of the emitted light having the emission intensity can be made differently at an angle (reflection surface angle ( ⁇ )) that can be reflected in substantially the same direction between the sub-pixels 2R, 2G, and 2B. Therefore, the occurrence of color misregistration in each of the sub-pixels 2R, 2G, 2B is suppressed, and the color reproduction degree is improved.
- Modification 1 10A shows a cross-sectional configuration of the pixel 4 (subpixels 4R, 4G, 4B) constituting the display device 1C according to the modification 1, and FIG. 10B shows a light emitting region of each subpixel 4R, 4G, 4B, that is, an opening 13AR, The size of the openings of 13AG and 13AB is schematically shown.
- the display device 1C is the same as the display devices 1A and 1B except that the light emitting regions of the light emitting elements 10R, 10G, and 10B, that is, the aperture ratios of the openings 13AR, 13AG, and 13AB of the pixels 4R, 4G, and 4B are different. It has a configuration.
- each pixel 4R, 4G, 4B is generally high for the blue pixel 4B and low for the red pixel 4R. This is due to the characteristics of the materials constituting the light emitting layers 14CR, 14CG, 14CB of the light emitting elements 10R, 10G, 10B. As described above, in a display device having different outputs for each of the pixels 4R, 4G, and 4B, there is a possibility that variation in color reproducibility, so-called coloring, may occur depending on the viewing angle.
- the aperture ratios of the openings 13AR, 13AG, and 13AB of the insulating film 13 are adjusted for each pixel, specifically, for example, in the red pixel 4R with reference to the opening 13AG of the green pixel 4G.
- the opening 13AR of the insulating film 13 is enlarged, and the opening 13AB of the insulating film 13 in the blue pixel 4B is reduced. That is, as shown in FIG. 10B, the aperture ratio is decreased (light emission area is narrowed) in the order of the red pixel 4R, the green pixel 4G, and the blue pixel 4B. In this way, by aligning the luminance in each of the pixels 4R, 4G, and 4B, RGB light emission levels are aligned, and coloring due to viewing angles is suppressed.
- FIG. 11 schematically shows another example of the pixel shape of the pixels 2 to 4 constituting the display devices 1A to 1C.
- the shape of the pixel 2 that is, the light emitting region is described as a circle.
- the present invention is not limited to this.
- each pixel is arranged on a dot.
- the pixel 2 is a vertically long rectangle as shown in FIG. 11C, for example, a lattice shape as shown in FIG. They are arranged in a matrix.
- the insulating film 13 constituting the display devices 1A to 1C has a reflection surface angle ( ⁇ ) designed for each of the sub-pixels 2R, 2G, and 2B, and also changes the constituent material of the insulating film, for example, has a different refractive index. You may adjust the emission direction of the emitted light from each light emitting layer 14CR, 14CG, 14CB by forming an insulating film using a material.
- Examples of materials having different refractive indexes include the following materials.
- Examples of the material having a high refractive index include silicon nitride (Si 3 N 4 ), aluminum oxide (Al 2 O 3 ), chromium oxide (Cr 2 O 3 ), gallium oxide (Ga 2 O 3 ), hafnium oxide ( HfO 2 ), nickel oxide (NiO), magnesium oxide (MgO), indium tin oxide (ITO), lanthanum oxide (La 2 O 3 ), niobium oxide (Nb 2 O 5 ), tantalum oxide (Ta 2 O 5 ), Examples thereof include yttrium oxide (Y 2 O 3 ), tungsten oxide (WO 3 ), titanium monoxide (TiO), titanium dioxide (TiO 2 ), and zirconium oxide (ZrO 2 ).
- Examples of the material having a low refractive index include silicon oxide (SiO 2 ), aluminum fluoride (AlF 3 ), calcium fluoride (CaF 2 ), cerium fluoride (CeF 3 ), lanthanum fluoride (LaF 3 ), Examples thereof include lithium fluoride (LiF), magnesium fluoride (MgF 2 ), neodymium fluoride (NdF 3 ), and sodium fluoride (NaF).
- silicon nitride Si 3 N 4
- silicon oxide SiO 2
- Example> Hereinafter, examples according to the display device of the present disclosure will be described.
- Example 1 the display device 1A was created as a standard sample with the pixel configuration described in the above embodiment. Specifically, in the light emitting elements 10R, 10G, and 10B, the film thickness of each layer including the light emitting layer 14C is common to the subpixels 2R, 2G, and 2B.
- the reflection surface angle ( ⁇ ) of the insulating film 13 is common between the pixels 2R, 2G, and 2B, and the reflection surface angle ( ⁇ ) of the insulating film 13 is set to the sub-pixel 2R, 2G and 2B are adjusted, specifically, the reflection surface angle ( ⁇ ) of the insulating film 13 in the green pixel 2G is set to 70 °, and the reflection surface angles ( ⁇ ) of the red pixel 2R and the blue pixel 2B are set to 80 °.
- Sample 2 (Example) was prepared. Samples 1 and 2 each measured the luminance at each viewing angle.
- FIG. 13A and 13B are characteristic diagrams showing the relationship between the viewing angle and the luminance (intensity) in Samples 1 and 2, respectively.
- FIG. 13A there is a large variation between the green emission light and the red and blue emission lights, whereas in FIG. 13B, the luminance value at each viewing angle in each pixel 2R, 2G, 2B is almost constant. It can also be seen that the luminance at a viewing angle of 0 ° is significantly improved as compared with FIG. 13A.
- Example 2 The present embodiment is different from the above embodiment in that the thickness of the first electrode 12 is changed for each light emitting element.
- FIG. 14A is a characteristic diagram showing the relationship between the viewing angle and the luminance of sample 3 as a comparative example
- FIG. 14B is a characteristic diagram showing the relationship between the viewing angle and the luminance of sample 4 as an example. Note that the reflection surface angles ( ⁇ ) of the insulating film 13 in the pixels 2R, 2G, and 2B of the sample 4 were 80 °, 70 °, and 70 °, respectively.
- the luminance was improved by adjusting the film thickness of the first electrode 12 for each of the pixels 2R, 2G, and 2B.
- the variation in luminance at the viewing angle between the pixels 2R, 2G, and 2B was obtained. Became prominent.
- FIG. 14B it can be seen that the luminance at each viewing angle of the sub-pixels 2R, 2G, and 2B is substantially the same as in the sample 2 of the first embodiment.
- FIG. 15A is a characteristic diagram showing the relationship between the viewing angle and the luminance of the sample 5 as a comparative example
- FIG. 15B is a characteristic diagram showing the relationship between the viewing angle and the luminance of the sample 6 as an example. Note that the reflection surface angles ( ⁇ ) of the insulating film 13 in the pixels 2R, 2G, and 2B of the sample 6 were set to 70 °, 70 °, and 80 °, respectively.
- the brightness of the organic layer 14 was adjusted for each of the pixels 2R, 2G, and 2B.
- the brightness of the pixel 2R, 2G, and 2B was improved.
- the variation in luminance at the viewing angle was remarkable.
- FIG. 14B it can be seen that the luminance at each viewing angle of the pixels 2R, 2G, and 2B is substantially the same as the samples 2 and 4 of the first embodiment.
- Example 4 the size of the light emitting region of sample 6 was adjusted for each pixel. Specifically, the light emission area of the red pixel 2R of Sample 6 was increased by 3%, and the light emission area of the blue pixel 2B was reduced by 3%.
- FIG. 16 is a characteristic diagram showing the relationship between the viewing angle and the luminance of the sample 7.
- the pixels 2R, 2G, and 2B can be further adjusted. It can be seen that the color shift due to the viewing angle is reduced and optimized.
- the display devices 1A to 1C including the pixels 2 to 4 described in the above embodiment and the modified examples 1 to 3 are particularly preferably used for a camera finder or a display device for a head mounted display. It can also be mounted on electronic devices in all fields that display images (or video).
- the smartphone includes, for example, a display unit 110 (display device 1A), a non-display unit (housing) 120, and an operation unit 130.
- the operation unit 130 may be provided on the front surface of the non-display unit 120 or may be provided on the upper surface.
- FIG. 18 shows an external configuration of the television device.
- the television device includes a video display screen unit 200 (display device 1A) including a front panel 210 and a filter glass 220, for example.
- FIGS. 19A and 19B show the external configuration of the digital still camera, and show the front surface and the rear surface, respectively.
- the digital still camera includes, for example, a light emitting unit 310 for flash, a display unit 320 (display device 1A), a menu switch 330, and a shutter button 340.
- FIG. 20 shows the external configuration of a notebook personal computer.
- the personal computer includes, for example, a main body 410, a keyboard 420 for inputting characters and the like, and a display unit 430 (display device 1A) that displays an image.
- FIG. 21 shows an external configuration of the video camera.
- the video camera includes, for example, a main body 510, a subject photographing lens 520 provided on the front side surface of the main body 510, a start / stop switch 530 during photographing, and a display 540 (display device 1A). It has.
- FIG. 22A and 22B show the external configuration of the mobile phone.
- FIG. 19A shows a front surface, a left side surface, a right side surface, an upper surface, and a lower surface in a state where the mobile phone is closed, respectively.
- FIG. 19B shows the front and side surfaces of the mobile phone opened, respectively.
- an upper housing 610 and a lower housing 620 are connected by a connecting portion (hinge portion) 620, a display 640 (display devices 1A to 1C), a sub-display 650, A picture light 660 and a camera 670 are provided.
- the present disclosure has been described with the embodiment and the first to third modifications, the present disclosure is not limited to the above-described embodiment and the like, and various modifications can be made.
- the material and thickness of each layer described in the above embodiment and the like, or the film formation method and film formation conditions are not limited, and other materials and thicknesses may be used. It is good also as film
- layers other than those described in the above embodiments and the like may be added.
- a layer using a material having a hole transporting ability such as a common hole transporting layer described in JP2011-233855A, between the charge transporting layer 17 and the blue light emitting layer 14CB of the blue light emitting element 10B.
- One layer or a plurality of layers may be added. By adding such a layer, the luminous efficiency and lifetime characteristics of the blue light emitting element 10B are improved.
- the subpixels constituting the pixel are three types of red pixels, green pixels, and blue pixels has been described as an example, but in addition to these three types of subpixels, white pixels or Yellow pixels may be added.
- this technique can also take the following structures.
- (1) A plurality of pixels that emit different emission light and an insulating film that is provided between the plurality of pixels and that has a reflection surface for the emission light, the angle of the reflection surface of the insulation film being different for each pixel Display device set to.
- a first pixel composed of a red pixel, a green pixel, or a blue pixel, and a second pixel having a color different from that of the first pixel, wherein the reflection surface angle ( ⁇ ) of the first pixel is the first pixel
- the display device according to (1) or (2) which is different from two pixels.
- the reflection surface angle ( ⁇ ) is determined using an angle ( ⁇ ) having a high emission intensity in the emitted light.
- a reflective surface of the insulating film has a different refractive index for each of the plurality of pixels.
- a display device is provided, and the display device includes a plurality of pixels that emit different emitted light, and an insulating film that is provided between the plurality of pixels and has a reflective surface for the emitted light.
- An electronic device in which the angle of the reflection surface of the film is set for each pixel.
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Abstract
Description
1.実施の形態
1-1.基本構成
1-2.表示装置の全体構成
1-3.製造方法
1-4.作用・効果
2.変形例
変形例1(開口率を画素ごとに調整した例)
変形例2(画素形状の例)
変形例3(絶縁膜の反射率を調整した例)
3.実施例
4.適用例(電子機器の例)
図1は、本開示の一実施の形態に係る表示装置(表示装置1A)の平面構成の一例を表したものである。この表示装置1Aは、カメラのファインダーやヘッドマウントディスプレイ等に用いられるものであり、表示領域110に複数の画素2を例えばドット状に配置した構成を有している。各画素2は、例えば、赤画素2R,緑画素2Gおよび青画素2Bの3色の副画素から構成されており、各副画素2R,2G,2Bにはそれぞれ対応する単色光を発生する発光素子(赤色の単色光を発生する赤色発光素子10R(赤画素2R)、緑色の単色光を発生する緑色発光素子10G(緑画素2G)および青色の単色光を発生する青色発光素子10B(青画素2B))が設けられている(いずれも図2参照)。
図2は、図1に示した一つの画素2の断面構成を表したものである。画素2は、ここでは上記のように赤画素2R,緑画素2Gおよび青画素2Bの3色の副画素から構成され、それぞれ絶縁膜13(13RG,13GB,13BR)によって区画された発光領域を有している。ここでは各副画素2R,2G,2Bの発光領域は、例えば図1に示したように円形形状を有している。
(数式)θ=90-φ/2(°)・・・・・・(1)
図6は、表示装置1Aの構成を表したものである。この表示装置1Aは、上述したように発光素子10R,10G,10Bとして有機EL素子を備えたカメラのファインダー等の中小型の表示装置として用いられるものであり、例えば、表示領域110の周辺に、映像表示用のドライバである信号線駆動回路120および走査線駆動回路130を有している。
次に、表示装置1Aの製造方法を図8A~図8Cおよび図9を用いて説明する。
本実施の形態では、各副画素2R,2G,2Bを分離する絶縁膜13の側面を発光層14Cから射出される光の反射面とし、その反射面の角度(反射面角度(θ))を各副画素2R,2G,2Bごとに設定するようにした。各副画素2R,2G,2Bごとに異なる反射面角度(θ)を有する絶縁膜13は、各画素2R,2G,2Bに対応する位置に所定の光透過率を有するフォトマスクを用いたフォトリソグラフィを行うことによって形成が可能となる。これにより、各発光素子10R,10G,10Bの発光光のうち、特に波長ごとに射出方向の異なる発光強度の高い発光光を任意の方向に反射させることが可能となる。具体的には、各副画素2R,2G,2B間において発光強度の高い発光光が略同一方向に反射されるようになる。
次に、上記実施の形態に係る変形例について説明する。以下では、上記実施の形態と同様の構成要素については同一の符号を付し、適宜その説明を省略する。
図10Aは変形例1に係る表示装置1Cを構成する画素4(副画素4R,4G,4B)の断面構成を、図10Bは各副画素4R,4G,4Bの発光領域、即ち開口部13AR,13AG,13ABの開口の大きさを模式的に表したものである。この表示装置1Cは発光素子10R,10G,10Bの発光領域、即ち各画素4R,4G,4Bの開口部13AR,13AG,13ABの開口率がそれぞれ異なる以外は、上記表示装置1A,1Bと同様の構成を有する。
図11は上記表示装置1A~1Cを構成する画素2~4の画素形状の他の例を模式的に表したものである。上記実施の形態および変形例1では画素2の形状、即ち発光領域を円形として説明したがこれに限らない。例えば図11(A)に示したように楕円形状、または図11(B),(C)に示したような矩形形状あるいは図11(D)に示したような略矩形形状としてもよい。上記実施の形態のような円形状では各画素をドット上に配置したが、図11(C)のように画素2を縦長の矩形とした場合には、例えば図12に示したように格子状(マトリクス状)に配置される。
なお、上記表示装置1A~1Cを構成する絶縁膜13は、反射面角度(θ)を副画素2R,2G,2Bごとに設計する他に、絶縁膜の構成材料を変える、例えば屈折率の異なる材料を用いて絶縁膜を形成することによって各発光層14CR,14CG,14CBからの発光光の射出方向を調整してもよい。
以下、本開示の表示装置に係る実施例について説明する。
本実施例では、標準サンプルとして上記実施の形態において説明した画素構成にて表示装置1Aを作成した。具体的には、発光素子10R,10G,10Bは、発光層14Cを含む各層の膜厚を各副画素2R,2G,2Bにおいて共通とした。この条件で、各画素2R,2G,2B間において絶縁膜13の反射面角度(θ)が共通のサンプル1(比較例)と、絶縁膜13の反射面角度(θ)を各副画素2R,2G,2Bごとに調整、具体的には、緑画素2Gにおける絶縁膜13の反射面角度(θ)を70°とし、赤画素2Rおよび青画素2Bの反射面角度(θ)を80°としたサンプル2(実施例)とを作成した。このサンプル1およびサンプル2はそれぞれ各視野角における輝度を測定した。
本実施例では、第1電極12の厚みを発光素子ごとに変えた点が上記実施例と異なる。図14Aは比較例としてのサンプル3の視野角と輝度との関係を表した特性図であり、図14Bは実施例としてのサンプル4の視野角と輝度との関係を表した特性図である。なお、サンプル4の各画素2R,2G,2Bにおける絶縁膜13の反射面角度(θ)はそれぞれ80°,70°,70°とした。
本実施例では、発光層14Cの膜厚を変えた点が上記実施例と異なる。図15Aは比較例としてのサンプル5の視野角と輝度との関係を表した特性図であり、図15Bは実施例としてのサンプル6の視野角と輝度との関係を表した特性図である。なお、サンプル6の各画素2R,2G,2Bにおける絶縁膜13の反射面角度(θ)はそれぞれ70°,70°,80°とした。
本実施例(サンプル7)では、サンプル6の発光領域の大きさを画素ごとに調整した。具体的には、サンプル6の赤画素2Rの発光領域を3%大きく、青画素2Bの発光領域を3%小さくした。図16はサンプル7の視野角と輝度との関係を表した特性図である。
上記実施の形態および変形例1~3において説明した画素2~4を備えた表示装置1A~1Cは、特に、カメラのファインダーやヘッドマウントディスプレイの表示装置に用いることが好ましいが、例えば次に示したような、画像(あるいは映像)表示を行う、あらゆる分野の電子機器に搭載することもできる。
(1)互いに異なる発光光を発する複数の画素と、前記複数の画素間に設けられると共に、前記発光光に対する反射面を有する絶縁膜とを備え、前記絶縁膜の反射面の角度は前記画素ごとに設定されている表示装置。
(2)赤画素、緑画素および青画素を有し、前記反射面角度(θ)は互いに異なる、前記(1)に記載の表示装置。
(3)赤画素、緑画素または青画素からなる第1画素と、前記第1画素とは異なる色の第2画素とを有し、前記第1画素の前記反射面角度(θ)は前記第2画素とは異なる、前記(1)または(2)に記載の表示装置。
(4)前記反射面角度(θ)は前記発光光のうち発光強度が強い角度(φ)を用いて決定される、前記(1)乃至(3)に記載の表示装置。
(5)前記複数の画素はそれぞれ開口率が異なる、前記(1)乃至(4)に記載の表示装置。
(6)前記絶縁膜の反射面は前記複数の画素ごとに屈折率が異なる、前記(1)乃至(5)に記載の表示装置。
(7)互いに異なる発光光を発する複数の画素を配置することと、前記複数の画素間に、前記発光光に対する反射面を有すると共に、前記反射面の角度が前記画素ごとに設定された絶縁膜を形成することとを含む表示装置の製造方法。
(8)前記絶縁膜の前記反射面の角度は光透過率が段階的に異なるフォトマスクを用いたフォトリソグラフィを用いて調整する、前記(7)に記載の表示装置の製造方法。
(9)表示装置を備え、前記表示装置は、互いに異なる発光光を発する複数の画素と、前記複数の画素間に設けられると共に、前記発光光に対する反射面を有する絶縁膜とを備え、前記絶縁膜の反射面の角度は前記画素ごとに設定されている電子機器。
Claims (9)
- 互いに異なる発光光を発する複数の画素と、
前記複数の画素間に設けられると共に、前記発光光に対する反射面を有する絶縁膜とを備え、
前記絶縁膜の反射面の角度は前記画素ごとに設定されている
表示装置。 - 赤画素、緑画素および青画素を有し、前記反射面角度(θ)は互いに異なる、請求項1に記載の表示装置。
- 赤画素、緑画素または青画素からなる第1画素と、前記第1画素とは異なる色の第2画素とを有し、前記第1画素の前記反射面角度(θ)は前記第2画素とは異なる、請求項1に記載の表示装置。
- 前記反射面角度(θ)は前記発光光のうち発光強度が強い角度(φ)を用いて決定される、請求項1に記載の表示装置。
- 前記複数の画素はそれぞれ開口率が異なる、請求項1に記載の表示装置。
- 前記絶縁膜の反射面は前記複数の画素ごとに屈折率が異なる、請求項1に記載の表示装置。
- 互いに異なる発光光を発する複数の画素を配置することと、
前記複数の画素間に、前記発光光に対する反射面を有すると共に、前記反射面の角度が前記画素ごとに設定された絶縁膜を形成することと
を含む表示装置の製造方法。 - 前記絶縁膜の前記反射面の角度は光透過率が段階的に異なるフォトマスクを用いたフォトリソグラフィを用いて調整する、請求項7に記載の表示装置の製造方法。
- 表示装置を備え、
前記表示装置は、
互いに異なる発光光を発する複数の画素と、
前記複数の画素間に設けられると共に、前記発光光に対する反射面を有する絶縁膜とを備え、
前記絶縁膜の反射面の角度は前記画素ごとに設定されている
電子機器。
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018074219A1 (ja) * | 2016-10-19 | 2018-04-26 | ソニー株式会社 | 液晶表示装置および投射型表示装置 |
CN110364637A (zh) * | 2018-04-09 | 2019-10-22 | 株式会社日本有机雷特显示器 | 有机电致发光元件、有机电致发光面板和电子设备 |
WO2020195273A1 (ja) * | 2019-03-26 | 2020-10-01 | ソニーセミコンダクタソリューションズ株式会社 | 表示装置、電子機器および表示装置の製造方法 |
JP2021180188A (ja) * | 2018-12-17 | 2021-11-18 | エルジー ディスプレイ カンパニー リミテッド | 表示パネル |
JP2022087804A (ja) * | 2020-12-01 | 2022-06-13 | シャープ株式会社 | 発光構造体、表示デバイスおよびサブ画素構造体 |
JP7463577B2 (ja) | 2017-12-26 | 2024-04-08 | ソニーセミコンダクタソリューションズ株式会社 | 表示素子、及び電子機器 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI674671B (zh) * | 2013-05-28 | 2019-10-11 | 日商新力股份有限公司 | 顯示裝置及電子機器 |
KR102114398B1 (ko) * | 2013-07-01 | 2020-05-25 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
EP3002797B1 (en) * | 2014-09-30 | 2020-04-29 | Novaled GmbH | A light emitting organic device and an active OLED display |
KR102331566B1 (ko) * | 2014-12-31 | 2021-11-26 | 삼성디스플레이 주식회사 | 발광 표시 장치 |
KR102408938B1 (ko) * | 2015-07-17 | 2022-06-14 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
JP6689977B2 (ja) * | 2016-07-12 | 2020-04-28 | パイオニア株式会社 | 発光装置 |
CN106897691B (zh) * | 2017-02-22 | 2021-01-01 | 北京小米移动软件有限公司 | 显示模组和电子设备 |
KR102599232B1 (ko) * | 2017-11-28 | 2023-11-06 | 엘지디스플레이 주식회사 | 유기 발광 표시 장치 |
KR102579252B1 (ko) * | 2018-06-27 | 2023-09-15 | 엘지디스플레이 주식회사 | 발광 표시 장치 및 이의 제조 방법 |
FR3085232B1 (fr) * | 2018-08-21 | 2020-07-17 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Pixel d’un micro-ecran a diodes electroluminescentes organiques |
US20200266389A1 (en) * | 2019-02-19 | 2020-08-20 | Int Tech Co., Ltd. | Light emitting panel |
EP4214757A4 (en) * | 2020-09-21 | 2024-06-05 | Applied Materials, Inc. | ORGANIC ELECTROLUMINESCENT DEVICES WITH IMPROVED OPTICAL OUTCOUPLING |
CN112436043A (zh) * | 2020-11-26 | 2021-03-02 | 合肥视涯技术有限公司 | 有机发光显示面板及其制作方法、有机发光显示装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004192977A (ja) * | 2002-12-12 | 2004-07-08 | Hitachi Ltd | 発光素子およびこの発光素子を用いた表示装置 |
JP2004205974A (ja) * | 2002-12-26 | 2004-07-22 | Fuji Photo Film Co Ltd | 2次元マトリクス素子、2次元マトリクス平面表示素子及びその駆動方法 |
JP2005166691A (ja) * | 1999-02-26 | 2005-06-23 | Sanyo Electric Co Ltd | カラー有機el表示装置 |
WO2010023839A1 (ja) * | 2008-08-29 | 2010-03-04 | パナソニック株式会社 | 有機elディスプレイパネルおよびその製造方法 |
WO2012049719A1 (ja) * | 2010-10-15 | 2012-04-19 | パナソニック株式会社 | 有機発光パネルとその製造方法、および有機表示装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101066411B1 (ko) * | 2004-03-31 | 2011-09-21 | 삼성전자주식회사 | 표시장치 및 이의 제조 방법 |
JP2006030250A (ja) | 2004-07-12 | 2006-02-02 | Fuji Xerox Co Ltd | 無線機能付メモリモジュールを含む装置 |
US20070145892A1 (en) * | 2005-12-27 | 2007-06-28 | Kuang-Jung Chen | Electro-luminescent display panel and electronic device using the same |
WO2008069219A1 (en) * | 2006-12-05 | 2008-06-12 | Semiconductor Energy Laboratory Co., Ltd. | Antireflective film and display device |
KR20100043011A (ko) | 2008-10-17 | 2010-04-27 | 세이코 엡슨 가부시키가이샤 | 유기 el 장치, 유기 el 장치의 제조 방법, 전자 기기 |
JP2010153127A (ja) | 2008-12-24 | 2010-07-08 | Sony Corp | 表示装置 |
WO2010143360A1 (ja) | 2009-06-11 | 2010-12-16 | パナソニック株式会社 | 有機elディスプレイ |
US8729534B2 (en) * | 2009-06-29 | 2014-05-20 | Panasonic Corporation | Organic EL display panel |
JP5574114B2 (ja) | 2009-12-22 | 2014-08-20 | パナソニック株式会社 | 表示装置とその製造方法 |
JP5649371B2 (ja) | 2010-08-25 | 2015-01-07 | キヤノン株式会社 | 画像形成装置および画像形成方法 |
CN102960066B (zh) | 2010-10-15 | 2015-09-30 | 株式会社日本有机雷特显示器 | 有机发光面板及其制造方法以及有机显示装置 |
KR20150113302A (ko) | 2014-03-27 | 2015-10-08 | 에스케이하이닉스 주식회사 | 노이즈 검출 회로 및 이를 이용한 반도체 시스템 |
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005166691A (ja) * | 1999-02-26 | 2005-06-23 | Sanyo Electric Co Ltd | カラー有機el表示装置 |
JP2004192977A (ja) * | 2002-12-12 | 2004-07-08 | Hitachi Ltd | 発光素子およびこの発光素子を用いた表示装置 |
JP2004205974A (ja) * | 2002-12-26 | 2004-07-22 | Fuji Photo Film Co Ltd | 2次元マトリクス素子、2次元マトリクス平面表示素子及びその駆動方法 |
WO2010023839A1 (ja) * | 2008-08-29 | 2010-03-04 | パナソニック株式会社 | 有機elディスプレイパネルおよびその製造方法 |
WO2012049719A1 (ja) * | 2010-10-15 | 2012-04-19 | パナソニック株式会社 | 有機発光パネルとその製造方法、および有機表示装置 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018074219A1 (ja) * | 2016-10-19 | 2018-04-26 | ソニー株式会社 | 液晶表示装置および投射型表示装置 |
JPWO2018074219A1 (ja) * | 2016-10-19 | 2019-09-05 | ソニー株式会社 | 液晶表示装置および投射型表示装置 |
US10866467B2 (en) | 2016-10-19 | 2020-12-15 | Sony Semiconductor Solutions Corporation | Liquid crystal display unit and projection display unit |
JP6991985B2 (ja) | 2016-10-19 | 2022-01-13 | ソニーグループ株式会社 | 液晶表示装置および投射型表示装置 |
JP7463577B2 (ja) | 2017-12-26 | 2024-04-08 | ソニーセミコンダクタソリューションズ株式会社 | 表示素子、及び電子機器 |
CN110364637A (zh) * | 2018-04-09 | 2019-10-22 | 株式会社日本有机雷特显示器 | 有机电致发光元件、有机电致发光面板和电子设备 |
JP2021180188A (ja) * | 2018-12-17 | 2021-11-18 | エルジー ディスプレイ カンパニー リミテッド | 表示パネル |
JP7242776B2 (ja) | 2018-12-17 | 2023-03-20 | エルジー ディスプレイ カンパニー リミテッド | 表示パネル |
WO2020195273A1 (ja) * | 2019-03-26 | 2020-10-01 | ソニーセミコンダクタソリューションズ株式会社 | 表示装置、電子機器および表示装置の製造方法 |
JP2022087804A (ja) * | 2020-12-01 | 2022-06-13 | シャープ株式会社 | 発光構造体、表示デバイスおよびサブ画素構造体 |
JP7235831B2 (ja) | 2020-12-01 | 2023-03-08 | シャープ株式会社 | 発光構造体、表示デバイスおよびサブ画素構造体 |
Also Published As
Publication number | Publication date |
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US10334692B2 (en) | 2019-06-25 |
US11968754B2 (en) | 2024-04-23 |
US11284483B2 (en) | 2022-03-22 |
JPWO2014148263A1 (ja) | 2017-02-16 |
CN105191501B (zh) | 2017-12-22 |
US20160021718A1 (en) | 2016-01-21 |
KR20190143465A (ko) | 2019-12-30 |
TW201442226A (zh) | 2014-11-01 |
KR20150133184A (ko) | 2015-11-27 |
US10368418B2 (en) | 2019-07-30 |
US20220167474A1 (en) | 2022-05-26 |
US20190327815A1 (en) | 2019-10-24 |
US20180263092A1 (en) | 2018-09-13 |
CN105191501A (zh) | 2015-12-23 |
JP6332265B2 (ja) | 2018-05-30 |
KR102060219B1 (ko) | 2019-12-27 |
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