WO2014098458A1 - 이온성 액체를 이용한 유기소재 정제방법 및 정제장치 - Google Patents
이온성 액체를 이용한 유기소재 정제방법 및 정제장치 Download PDFInfo
- Publication number
- WO2014098458A1 WO2014098458A1 PCT/KR2013/011757 KR2013011757W WO2014098458A1 WO 2014098458 A1 WO2014098458 A1 WO 2014098458A1 KR 2013011757 W KR2013011757 W KR 2013011757W WO 2014098458 A1 WO2014098458 A1 WO 2014098458A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ionic liquid
- organic material
- sublimation
- crucible
- purification
- Prior art date
Links
- 239000011368 organic material Substances 0.000 title claims abstract description 281
- 239000002608 ionic liquid Substances 0.000 title claims abstract description 219
- 238000000034 method Methods 0.000 title claims description 91
- 238000000859 sublimation Methods 0.000 claims abstract description 130
- 230000008022 sublimation Effects 0.000 claims abstract description 130
- 238000000746 purification Methods 0.000 claims abstract description 123
- 238000010438 heat treatment Methods 0.000 claims abstract description 77
- 238000001953 recrystallisation Methods 0.000 claims abstract description 56
- 239000012535 impurity Substances 0.000 claims abstract description 36
- 239000007789 gas Substances 0.000 claims description 66
- 239000011261 inert gas Substances 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 33
- 239000002994 raw material Substances 0.000 claims description 32
- 238000000151 deposition Methods 0.000 claims description 18
- 238000007670 refining Methods 0.000 claims description 17
- 239000012298 atmosphere Substances 0.000 claims description 16
- 238000003860 storage Methods 0.000 claims description 16
- 230000008021 deposition Effects 0.000 claims description 15
- 238000004458 analytical method Methods 0.000 claims description 12
- 238000011084 recovery Methods 0.000 claims description 12
- 238000007599 discharging Methods 0.000 claims description 6
- 238000004090 dissolution Methods 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 3
- 238000004064 recycling Methods 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims description 2
- 230000008901 benefit Effects 0.000 abstract description 10
- 238000002474 experimental method Methods 0.000 description 27
- 230000008569 process Effects 0.000 description 26
- 238000002425 crystallisation Methods 0.000 description 23
- 230000008025 crystallization Effects 0.000 description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 239000013014 purified material Substances 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 239000000919 ceramic Substances 0.000 description 9
- 230000008859 change Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 239000013078 crystal Substances 0.000 description 7
- 238000001069 Raman spectroscopy Methods 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- ZXMGHDIOOHOAAE-UHFFFAOYSA-N 1,1,1-trifluoro-n-(trifluoromethylsulfonyl)methanesulfonamide Chemical compound FC(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F ZXMGHDIOOHOAAE-UHFFFAOYSA-N 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- LRESCJAINPKJTO-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;1-ethyl-3-methylimidazol-3-ium Chemical compound CCN1C=C[N+](C)=C1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F LRESCJAINPKJTO-UHFFFAOYSA-N 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000004626 scanning electron microscopy Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000000399 optical microscopy Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000002061 vacuum sublimation Methods 0.000 description 2
- IQQRAVYLUAZUGX-UHFFFAOYSA-N 1-butyl-3-methylimidazolium Chemical compound CCCCN1C=C[N+](C)=C1 IQQRAVYLUAZUGX-UHFFFAOYSA-N 0.000 description 1
- PFXGWBFQBGIGDM-UHFFFAOYSA-N C1(=CC=C(C=C1)N(C1=CC=C(C=C1)C1=CC=C(C=C1)N(C1=CC(=C(C=C1)C1=CC=CC=C1)C)C1=CC=C(C=C1)C1=CC=CC=C1)C1=CC(=C(C=C1)C1=CC=CC=C1)C)C1=CC=CC=C1 Chemical compound C1(=CC=C(C=C1)N(C1=CC=C(C=C1)C1=CC=C(C=C1)N(C1=CC(=C(C=C1)C1=CC=CC=C1)C)C1=CC=C(C=C1)C1=CC=CC=C1)C1=CC(=C(C=C1)C1=CC=CC=C1)C)C1=CC=CC=C1 PFXGWBFQBGIGDM-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 150000001793 charged compounds Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000012926 crystallographic analysis Methods 0.000 description 1
- 210000001787 dendrite Anatomy 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 1
- 238000013386 optimize process Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000005092 sublimation method Methods 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D7/00—Sublimation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D7/00—Sublimation
- B01D7/02—Crystallisation directly from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B63/00—Purification; Separation; Stabilisation; Use of additives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/82—Purification; Separation; Stabilisation; Use of additives
- C07C209/84—Purification
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/311—Purifying organic semiconductor materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D9/00—Crystallisation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
Definitions
- the present invention relates to an organic material purification method and a purification device based on an ionic liquid process, and more particularly, to screen an optimal purification combination between various ionic liquids and organic materials to be purified.
- the present invention relates to an organic material simple refining method and a refining apparatus which can quickly and experimentally determine which kind of ionic liquid is most suitable for recrystallization of a target organic material even when a small amount of organic material for organic light emitting diodes (OLED) is used.
- OLED organic light emitting diodes
- the present invention also relates to an organic material purification method and purification apparatus capable of purifying organic materials for OLED in large quantities by using an ionic liquid as a filter.
- OLED displays have been spotlighted as next generation displays. The reason is that not only the high driving voltage required by the inorganic LED is required, but also the advantages of self-luminous, thin film, fast response speed, wide viewing angle, etc.
- Such an OLED refers to a device in which holes and electrons recombine in an emission layer to generate excitons, and emit light having a specific wavelength by energy from the generated excitons.
- the OLED includes an anode 120, a hole injection layer (HIL) 130, and a hole transport layer on a transparent substrate 110 such as glass.
- layer: HTL 140, EML 150, electron transport layer ETL 160, electron injection layer EIL 170, and cathode (180) is composed of a laminated structure formed sequentially.
- an organic material for light emission and charge transport is required.
- the organic material is directly involved in the recombination of the injected holes and electrons as well as the injection of electrons and holes, the purity of the organic material is a very important factor that determines the color, luminous efficiency and lifetime of the OLED. That is, a small amount of impurities in the organic material increases the probability of dissipation of the injected charges, thereby lowering the probability of recombination of holes and electrons, leading to a decrease in luminous efficiency. It becomes a factor.
- OLEDs have been optimized along with optimization of electroluminescent device structure, development of new materials having excellent hole (or electron) injection and transport characteristics, and development of new materials for organic light emitting layers. Purity improvement of the organic substance is calculated
- the recrystallization method by recrystallization or sublimation using a solvent is generally used.
- the recrystallization method by sublimation since the organic material is sublimed and recrystallized under vacuum, impurities have a property of not entering. Therefore, the sublimation purification method is generally used as a purification method of the organic material for organic electroluminescent elements in general.
- sublimate refers to a gas-solid phase transition that occurs at temperatures and pressures below the triple point in phase equilibrium. Even if the material is pyrolyzed when heated at normal pressure, it is not decomposed even at a relatively high temperature at a low pressure below the triple point.
- the operation of heating the mixed material and separating the sublimation point from other impurities in a state in which the material is not decomposed is called a vacuum sublimation method. Since the vacuum sublimation method is a pure physical method and does not depend on the use of auxiliary reagents or other chemical methods, it is useful for the purification of organic materials for OLEDs because it has the advantage of no contamination of samples and a large separation rate.
- a method for purifying organic materials for OLEDs is a method of continuously purifying sublimation.
- the material to be purified is placed at the end of a long hollow tube, and the tube is heated with a heater while the inside of the tube is vacuumed to create a temperature gradient across the tube.
- the material can be separated by using the difference in the recrystallization position due to the difference between the material to be separated and the sublimation point of the impurities.
- nitrogen or an inert gas that does not react with the material constituting the refining apparatus is used as a carrier gas for transporting the gas of the organic material within the range from the high temperature to the low temperature does not drop significantly. This transport gas serves to smoothly flow the gas of the organic material.
- FIG. 2 is a schematic diagram showing the configuration of the sublimation purification apparatus according to the prior art for performing a continuous sublimation purification method.
- the organic material is contained in the crucible 240, and the crucible 240 is disposed at one side in the second quartz glass tube 210.
- the outside of the second quartz glass tube 210 has a structure that the first quartz glass tube 220 is wrapped.
- the crucible 240 although not shown, is fitted to both ends of the hollow cylindrical quartz tube with both ends open, and is made of a stainless steel material and has a pair of lids with holes.
- the heater 250 is installed to surround one side of the first quartz glass tube 220. In this case, the heater 250 is installed at a corresponding position where the crucible 240 is located.
- the vacuum pump 230 is disposed on the other side of the second quartz glass tube 210 to serve to maintain the interior of the second quartz glass tube 210 in a vacuum state.
- Sublimation refining apparatus 200 having the structure as described above, first, the inside of the second quartz glass tube 210 by using a vacuum pump 230 to make a vacuum state, and a small amount of transport gas vacuum agent 230 is installed 2 to the entire quartz glass tube 210 to form a fine pressure gradient.
- a temperature gradient is formed over the entire second quartz glass tube 210.
- the temperature distribution formed at this time represents a shape of a normal distribution curve.
- the material starts to sublime, and the gas molecules formed at this time come out of the crucible 240 and are vacuum pumped by a pressure gradient. 230 starts to move in the installed direction. At this time, impurities having a higher sublimation point than the organic material raw material remain inside the crucible 240.
- Reference numeral 260 denotes a refined material formed in a crystalline state on the inner surface of the second quartz glass tube 210.
- the heating is stopped and gradually cooled, and when the temperature is equal to room temperature, the second quartz glass tube 210 is dismantled to scrape and recover the purified material 260 in a crystalline state.
- the raw material in the case of the sublimation refining method, can be purified to a high purity organic material by using the difference in the sublimation point of the organic material, while a considerable amount of the organic material during the repetition of sublimation-condensation is performed. Since it is lost to the exhaust along with the inert gas, there is a problem that the yield of the final purified material compared to the starting material is very low. In addition, there is a problem that takes a huge time and cost to optimize the purification equipment for each organic material.
- the inventors rapidly optimize the purification process parameters based on the ionic liquid process by using the ionic liquid which can be used in vacuum as a solvent, the purification temperature of the organic material and the selection of the optimal ionic liquid, and the OLED.
- the present invention has been made to solve the problems of the prior art as described above, the ionic liquid that can experimentally confirm the organic material purification process by recrystallizing a small amount of organic material using a stable ionic liquid even in vacuum It is an object of the present invention to provide an organic material simple purification method and purification apparatus.
- the present invention has another object to provide a method for purifying and purifying an organic material using an ionic liquid that can be used to easily purify and produce a large amount of organic materials for OLED by using a stable ionic liquid as a filter.
- the organic material simple purification method using the ionic liquid according to the present invention for achieving the above object, the heating chamber of the vacuum atmosphere in which the crucible is installed containing the organic material raw material for OLED (Organic Light Emitting Diodes) containing impurities And a refining method using an organic material simple refining apparatus including a substrate installed in the heating chamber and coated with an ionic liquid, the heating step of heating the crucible to a sublimation point of the organic material raw material, and in the heating step. And depositing a sublimation gas of the organic material raw material generated in the ionic liquid, and recrystallizing the sublimation gas in the ionic liquid.
- OLED Organic Light Emitting Diodes
- the recrystallization step is characterized in that it further comprises a separation step of separating the recrystallized organic material from the ionic liquid.
- the recrystallization step is characterized in that to control the temperature of the ionic liquid to control the solubility of the ionic liquid.
- the temperature of the substrate in the recrystallization step is characterized in that it is maintained at room temperature ⁇ 200 °C range.
- the organic material simple purification apparatus using the ionic liquid according to the present invention for achieving the above object, the sublimation means of the vacuum atmosphere for heating and subliming the organic material raw material for OLED containing the impurities, the sublimed organic Recrystallization means in a vacuum atmosphere for depositing a sublimation gas of a material on the surface of the ionic liquid to recrystallize the ionic liquid, and control means for controlling the operation of the sublimation means and the recrystallization means.
- the sublimation means may include a crucible for accommodating the organic material, a heating chamber in which the crucible is installed, having a predetermined internal volume, a vacuum pump for maintaining the inside of the heating chamber in a vacuum state, A first heater for heating the crucible and a shutter for selectively opening or closing the upper side of the crucible.
- the shutter is characterized in that it is configured to cover the top of the crucible or at a predetermined distance from the top of the crucible.
- the recrystallization means includes a substrate coated with the ionic liquid, a mask for supporting the substrate, a second heater installed and fixed on the upper portion of the heating chamber, and a lower portion of the second heater. It is characterized in that it comprises a support member for supporting the mask.
- the recrystallization means further comprises a thermocouple is installed on the support member for measuring the temperature of the substrate, the control means using the temperature measured at the thermocouple 2 characterized by controlling the temperature of the heater.
- the ionic liquid is characterized in that the droplet is applied on the substrate (droplet).
- the present invention characterized in that it further comprises an analysis means for photographing and analyzing the recrystallized purified material from the ionic liquid.
- the analysis means is characterized in that it comprises a thickness monitor (thickness monitor) for measuring the thickness of the recrystallized tablet material.
- the organic material purification method using an ionic liquid according to the present invention for achieving the above object is, under the heating chamber of the vacuum atmosphere is equipped with a crucible containing an organic material raw material for OLED containing impurities, under a vacuum atmosphere
- a purification method using an organic material purification device including a storage tank containing an ionic liquid comprising: a heating step of heating the crucible to a sublimation point of the organic material raw material, and a sublimation gas of the organic material raw material generated in the heating step.
- the sublimation gas is characterized by flowing into the ionic liquid by the inert gas supplied into the heating chamber.
- the dissolution step is characterized in that it further comprises a discharge step of discharging the inert gas collected in the upper portion of the reservoir without dissolving in the dissolution step to the outside of the reservoir.
- the recrystallization step is characterized in that it further comprises a recovery step of recovering the recrystallized organic material from the ionic liquid.
- the method may further include heating the mixed gas to maintain the temperature above the sublimation point before the mixed gas is incorporated into the ionic liquid.
- the recrystallization step is characterized in that to control the temperature of the ionic liquid to control the solubility of the ionic liquid.
- the inert gas discharged in the discharge step is characterized in that it is recycled to the inert gas supplied in the mixing step.
- the organic material purification apparatus using the ionic liquid according to the present invention for achieving the above object, sublimation means of a vacuum atmosphere for heating and subliming the organic material raw material for the OLED containing the impurities, and the sublimed organic material And recrystallization means in a vacuum atmosphere for incorporating a sublimation gas into the ionic liquid to recrystallize in the ionic liquid, and control means for controlling the operation of the sublimation means and the recrystallization means.
- the sublimation means may include a crucible for accommodating the organic material, a heating chamber in which the crucible is installed, having a predetermined internal volume, a vacuum pump for vacuuming the inside of the heating chamber, and A first heater for heating the crucible, and an inert gas supply source connected to one side of the heating chamber to supply an inert gas.
- the recrystallization means includes a reservoir containing the ionic liquid, a connection conduit in which one side is in communication with the inside of the heating chamber and the other side is immersed in the ionic liquid in the reservoir, and And a discharge pump for discharging the gas collected on the ionic liquid of the reservoir out of the reservoir.
- this invention characterized in that it further comprises a second heater for heating the outside of the connection conduit to maintain the sublimation point of the organic material.
- it characterized in that it further comprises a third heater for heating the lower portion of the reservoir containing the ionic liquid to control the solubility of the organic material.
- the ionic liquid used for the purification of the organic material is installed on the top of the reservoir and heated in a vacuum above a certain temperature and evaporated to recycle through impurities and dissolved organic materials and the separate purification process It characterized in that it further comprises an ionic liquid collecting unit for collecting.
- the ionic liquid collecting unit includes a collecting plate fixed to the inner side of the reservoir, and a collecting container for collecting the ionic liquid collected by the collecting plate fixed to the inner side of the reservoir It is characterized by.
- it characterized in that it further comprises an ionic liquid return means for returning to the reservoir for recycling the ionic liquid collected in the collecting container.
- it is characterized in that it further comprises a recovery container for selectively communicating with the reservoir and configured to be combined and separated to separately recover the recrystallized organic material.
- it characterized in that it further comprises bubble refinement means for reducing the volume of bubbles generated as the mixed gas is incorporated into the ionic liquid of the reservoir.
- this invention characterized in that it further comprises an inert gas return means for returning to the inert gas supply source for recycling the inert gas discharged through the discharge pump.
- the present invention can confirm that even if a trace amount of organic material is sublimated, it is recrystallized in an ionic liquid, and thus there is an advantage that the refinability of the organic material can be easily confirmed as a trace amount of organic material.
- the present invention has an advantage that the recrystallization process of the organic material can be quickly confirmed because the sublimation gas of the organic material is easily supersaturated even in a small amount of the ionic liquid due to the non-volatile characteristics of the ionic liquid.
- the present invention has the advantage that the configuration of the device is very simple to save the cost and time to search for the optimum ionic liquid and optimize the process conditions even if the organic material is different.
- the present invention can significantly improve the purification yield of organic materials by incorporating a sublimation gas generated in the sublimation refining process of organic materials into a stable ionic liquid in a vacuum and utilizing the ionic liquid as a liquid filter of the sublimation gas. There is an advantage.
- the present invention has the advantage that the organic material can be purified in large quantities by adjusting the capacity of the device by using a large amount of ionic liquid and injecting the organic material up to the supersaturation limit into the ionic liquid, thereby reducing the cost of the organic material.
- the present invention has the advantage that can be recycled through the refining process of the ionic liquid to realize the greening of the manufacturing process.
- FIG. 2 is a schematic diagram showing the configuration of the sublimation purification apparatus according to the prior art
- FIG. 3 is a conceptual diagram showing the configuration of the organic material simple purification apparatus using the ionic liquid according to the first embodiment of the present invention
- FIG. 4 is a flowchart illustrating a purification method using an organic material simple purification apparatus using the ionic liquid shown in FIG.
- FIG. 5 is a conceptual diagram showing the configuration of the organic material purification apparatus using an ionic liquid according to a second embodiment of the present invention
- FIG. 6 is a flowchart illustrating a purification method using an organic material purification device using the ionic liquid shown in FIG.
- FIG. 7 is a conceptual diagram showing the configuration of the organic material purification apparatus using an ionic liquid according to a third embodiment of the present invention.
- FIG. 8 is a perspective view schematically showing the configuration of the organic material simple purification experiment apparatus using an ionic liquid
- FIG. 9 is a graph showing a change in substrate temperature according to a ceramic heater set temperature in the organic material simple purification experiment shown in FIG. 8;
- 10 to 12 are graphs showing the deposition rate and total organic thickness variation according to the sublimation temperature of the organic material according to the crystallization temperature (substrate temperature) in the organic material simple purification experiment shown in FIG. 8,
- FIG. 13 is a photograph analyzing the crystallization process of NPB organic material in an ionic liquid according to the organic material evaporation temperature and the substrate temperature in the organic material simple purification experiment shown in FIG.
- FIG. 15 is a graph analyzing the crystal phase of NPB organic material recrystallized by the organic material simple purification apparatus shown in FIG. 8 and the crystal phase of NPB organic material before purification through Raman analysis.
- FIG. 16 is a photograph analyzing the grain size of the NPB organic material recrystallized by the organic material simple purification apparatus shown in FIG. 8 and the grain size of the NPB organic material before being purified through an optical microscope.
- the organic material simple purification apparatus 300 includes sublimation means for subliming large organic material raw materials and recrystallization means for recrystallizing a sublimation gas of the sublimed organic material in an ionic liquid. And analyzing means for photographing and analyzing the recrystallized refined material in the ionic liquid, and control means for controlling the sublimation means, the recrystallization means, and the operation of the analysis means as a whole.
- the ionic liquid according to this embodiment is 1-butyl-3-methyllimidazorium bis (trifluoromethyl sulfonyl) imide of formula (1) (BMIM) TFSI) or 1-octyl-3-methyllimidazorium bis (trifluoromethyl sulfonyl) imide (1-Octyl-3-methylimidazorium bis (trifluoromethyl sulfonyl) imide) of formula 2 (OMIM TFSI) Can be.
- BMIM 1-butyl-3-methyllimidazorium bis (trifluoromethyl sulfonyl) imide
- 1-octyl-3-methyllimidazorium bis (trifluoromethyl sulfonyl) imide (1-Octyl-3-methylimidazorium bis (trifluoromethyl sulfonyl) imide) of formula 2 (OMIM TFSI)
- 1-ethyl-3-methyllimidazorium bis (trifluoromethyl sulfonyl) imide (1-Etyl-3-methylimidazorium bis (trifluoromethyl sulfonyl) imide) (EMIM TFSI) may be used.
- ionic liquids are non-volatile organic solvents, which are faster in supersaturation in the process of repeating dissolution-recrystallization of organic substances and impurities in the ionic liquid. Due to the mechanism in which the arriving organic material is first recrystallized, it can be used to purify and recrystallize various organic materials.
- BMIM TFSI, OMIM TFSI, and EMIM TFSI include low melting point, low vapor pressure, nonflammable, consist of organic molecular ions, and negative-positive ion combinations. Controllable properties by combinations of anions and cations.
- the ionic liquid according to this embodiment is used to purify and recrystallize an organic material, and is stable in the liquid phase even at 100 to 120 ° C. and 10 ⁇ 7 Torr, and thus may be used as a solvent even in a vacuum process.
- the organic material raw material according to this embodiment is NPB (N, N'-bis (naphthalen-1-yl) -N, N'-bis (phenyl) -benzidine) material used as the hole transport layer (HTL) material It is available.
- NPB N, N'-bis (naphthalen-1-yl) -N, N'-bis (phenyl) -benzidine
- HTL hole transport layer
- NPB has a sublimation point of 180 degreeC or more. Therefore, when the crucible in the heating chamber which comprises a sublimation means is heated to 200 degreeC or more, it sublimes.
- the deposition material (organic material raw material) used for the OLED device fabrication there are a variety of materials in addition to the above materials. Therefore, this invention can use these various kinds of organic materials as a raw material.
- the sublimation means includes a crucible 320 containing an organic material 321 containing impurities, a heating chamber 310 in which the crucible 320 is installed and having a predetermined internal volume, and a vacuum inside the heating chamber 310.
- a vacuum pump (not shown) to maintain the state, a first heater 322 for heating the crucible 320, and a shutter 340 for selectively opening or closing the upper side of the crucible 320. .
- the shutter 340 may be configured to cover the upper end of the crucible 320, but preferably configured to cover the upper end of the crucible 320 at a predetermined distance.
- the shutter 340 serves to control the sublimation gas of the organic material to be sublimated to move toward the recrystallization means at once as the crucible 320 is heated.
- the recrystallization means is to recrystallize the sublimation gas of the sublimed organic material in the ionic liquid, a silicon substrate 330 to which the ionic liquid 331 is applied, a mask 333 for supporting the silicon substrate 330,
- the second heater 332 is fixed to the upper portion of the heating chamber 310, the support member 334, which is formed under the second heater 332 to support the mask 333, and the support member 334
- a thermocouple 335 is installed to measure the temperature of the silicon substrate 330.
- the ionic liquid 331 is applied on the silicon substrate 330 in the form of droplets (droplets, droplets).
- the thermocouple 335 measures the actual temperature of the silicon substrate 330, and measures the actual temperature of the silicon substrate 330 according to the temperature applied to the second heater 332 to control the second temperature through the control means. It is used to adjust the temperature of the heater 332.
- the analyzing means is to photograph and analyze the recrystallized refined material in the ionic liquid 331, and is configured to have a thickness monitor 350 or the like.
- the control means controls the temperature of the first heater 322 of the sublimation means and the operation of the shutter 340, the temperature of the second heater 332 of the recrystallization means, the operation of the analysis means, and the like.
- FIG. 4 is a flowchart illustrating a purification method using an organic material simple purification apparatus using the ionic liquid shown in FIG. 3.
- the crucible 320 containing the organic material 321 is installed in the heating chamber 310, but the top of the crucible 320 is closed by the shutter 340. It is installed in a state, and the inside of the heating chamber 310 is vacuumed using a vacuum pump (S410).
- the crucible 320 is heated to the sublimation point of the organic material using the first heater 322 (S420). This becomes a sublimation gas of the organic material in which the organic material and some impurities are mixed.
- the sublimation gas of the sublimed organic material is collected by the shutter 340 blocking the upper part of the crucible 320.
- the sublimation gas of the organic material moves toward the silicon substrate 330 by its driving force, and the sublimation gas of the organic material is deposited on the ionic liquid 331 (S430). .
- the sublimation gas of the organic material is dissolved in the ionic liquid 331 and recrystallized (S440). That is, the sublimation gas of the organic material dissolved in the ionic liquid 331 is recrystallized when the supersaturated state is reached and precipitated as a high purity purified material.
- the temperature of the silicon substrate 330 within the range of room temperature to 200 °C.
- the ionic liquid since the polymer material composed of elements of C, H, F, N, and O exists in ionic form, the molecular structure is destroyed at a high temperature, and thus it is impossible to maintain its original characteristics.
- the use temperature range of the ionic liquid is limited to room temperature to 200 ° C. That is, the temperature of the ionic liquid is raised through the silicon substrate 330 in order to supersaturate the organic material within the range that the characteristics of the ionic liquid do not change.
- the temperature is lower than room temperature, a sufficient amount of the organic material cannot be dissolved. Organic materials cannot be recrystallized.
- the information on the purified material deposited on the ionic liquid 331 can be confirmed through the thickness meter (350).
- the precipitated high purity refined material may be properly recovered from the heating chamber 310.
- the present invention can easily experiment to dissolve and recrystallize in the ionic liquid 331 even when a small amount of the organic material is sublimed, and thus can be utilized in a large-scale organic material purification apparatus using an ionic liquid.
- the organic material purifying apparatus 500 includes a sublimation means of a vacuum atmosphere for heating and subliming an organic material raw material for OLED containing impurities and a sublimation gas of the sublimed organic material. Recrystallization means in a vacuum atmosphere incorporated into the liquid to recrystallize in the ionic liquid, and control means for controlling the operation of the sublimation means and the recrystallization means.
- the sublimation means is a crucible 510 for accommodating the organic material raw material 511, a heating chamber 520 in which the crucible 510 is installed and having a predetermined internal volume, and the inside of the heating chamber 520 in a vacuum state. It comprises a vacuum pump 550 to make, the first heater 512 for heating the crucible 510, and an inert gas supply source 560 connected to one side of the heating chamber 520 to supply an inert gas.
- the recrystallization means includes a reservoir 540 containing the ionic liquid 541, and one side of which communicates with the inside of the heating chamber 520, and the other side is immersed in the ionic liquid 541 in the reservoir 540.
- the heating chamber 520 and the reservoir 540 are connected to each other from the upper side, the vacuum pump 550 is installed on the connection portion.
- valves 551 and 552 for selectively communicating with the heating chamber 520 and the reservoir 540 are respectively installed in the connection line of the vacuum pump 550.
- the upper side of the storage tank 540 may be configured to further have an ionic liquid collecting unit 570 for collecting the ionic liquid 541 used for the purification of the organic material through the purification process.
- the ionic liquid 541 and the organic material raw material 511 according to this embodiment may be the same as those of the first embodiment.
- the crucible 510 is installed on the bottom side of the heating chamber 520 and is configured to have a first heater 512 on the bottom side.
- the crucible 510 is configured to have a form that can contain the organic material 511 to be purified therein.
- connection conduit 530 is disposed in such a way that one side thereof is connected to the upper portion of the heating chamber 520, the other side extends through the upper portion of the reservoir 540 to be immersed in the ionic liquid 541.
- a second heater 531 for heating the connection conduit 530 may be further installed around the connection conduit 530.
- the second heater 531 is a connection conduit 530 so that the mixed sublimation gas 513 can maintain the sublimation point in the process of mixing the mixed gas to be described later into the ionic liquid 541 through the connection conduit 530. ) Serves to heat the surroundings.
- a third heater 542 may be further installed below the reservoir 540.
- the third heater 542 heats the ionic liquid 541 to control solubility of the mixed sublimation gas 513 in the ionic liquid 541.
- the discharge pump 553 may be further installed on the upper side of the reservoir 540. At this time, it is preferable that the valve 554 is further installed in the installation line of the discharge pump 553.
- an ionic liquid collecting part 570 may be further installed at an upper side of the reservoir 540.
- the ionic liquid collection unit 570 serves to collect the ionic liquid 541 used for the purification of the organic material to be recycled through the separation and purification process with the organic material dissolved with impurities.
- the collecting plate 571 fixed to the inner side of the reservoir 540 and having a curved shape, and the collecting container 572 fixed to the inner side of the reservoir 540 to collect the ionic liquid collected by the collecting plate 571. It is configured to have.
- the following describes a method of purifying organic materials using the organic material purification apparatus of this embodiment configured as described above.
- FIG. 6 is a flowchart illustrating a purification method using an organic material purification device using the ionic liquid shown in FIG. 5.
- a crucible 510 containing an organic material 511 is installed in a heating chamber 520, and an appropriate amount of ionic liquid 541 is injected into the reservoir 540.
- the heating chamber 520 and the storage tank 540 are vacuumed using the vacuum pump 550.
- the crucible 510 is heated to the sublimation point of the organic material using the first heater 512.
- a mixed sublimation gas 513 of the organic material in which the organic material and some impurities are mixed S610).
- the inert gas is supplied into the heating chamber 520 from the inert gas supply source 560.
- nitrogen or argon gas that does not react with the material constituting the organic material purification apparatus 500 is used as the inert gas within a range where the degree of vacuum does not drop significantly.
- the inert gas serves to flow the mixed sublimation gas 513 into the ionic liquid 541 in the storage tank 540 and is mixed with the mixed sublimation gas 513 to form a mixed gas (S620).
- the mixed gas thus formed is mixed into the ionic liquid 541 through the connection conduit 530 as the pressure in the heating chamber 520 increases (S630). Meanwhile, in the process of mixing the mixed gas into the ionic liquid 541 through the connection conduit 530, the second heater 531 installed around the connection conduit 530 heats up the connection conduit 530. Accordingly, the mixed sublimation gas 513 may be mixed into the ionic liquid 541 while maintaining the sublimation point.
- the mixed gas mixed in the ionic liquid 541 forms bubbles, while the mixed sublimation gas 513 in the bubbles dissolves in the ionic liquid 541, and the inert gas is not dissolved in the ionic liquid 541. And float out of the ionic liquid 541 and collect at the top of the reservoir 540.
- the inert gas collected in the upper portion of the storage tank 540 is discharged and recovered outside the storage tank 540 by the discharge pump 553 (S640).
- the inert gas discharged out of the storage tank 540 is returned to the inert gas supply source 560 through the inert gas return means may be recycled.
- the inert gas return means may be configured using a general pump or the like.
- the solubility of the mixed sublimation gas 513 in the ionic liquid 541 may be adjusted using the third heater 542 installed under the storage tank 540. Therefore, by adjusting the solubility of the ionic liquid 541 in the mixed sublimation gas 513, it is possible to control the supersaturation of the organic material and the recrystallization rate of the organic material in the ionic liquid 541.
- the purified material 543 of high purity precipitated in the ionic liquid 541 can be properly recovered from the heating chamber 520.
- the opening and closing port is formed on one side of the storage tank 540, and the purified material 543 may be recovered therethrough.
- the organic material dissolved in the ionic liquid 541 up to the degree of supersaturation contained in the mixed gas and a small amount of impurities This part will remain.
- the impurity content in the ionic liquid 541 increases, and at some point, the impurity component also reaches a degree of supersaturation, and impurities are mixed in the recrystallized organic material. At this point, it is preferable to replace the ionic liquid for the purification process with a high purity ionic liquid.
- dissolved organic materials and impurities have different evaporation temperatures compared with ionic liquids. That is, the evaporation temperature of the ionic liquid is lower than that of organic materials and impurities. This property makes it possible to separate and purify the ionic liquid component separately.
- the third heater 542 is set to the evaporation temperature of the ionic liquid and heated, the ionic liquid is evaporated and recovered to the collecting container 572 via the collecting plate 571 of the ionic liquid collecting unit 570. And only highly concentrated organic materials and impurities remain.
- the ionic liquid recovered in the collection container 572 may be returned to the inside of the storage tank 540 through the ionic liquid return means and recycled.
- the ionic liquid return means may be configured using a general pump or the like.
- the mixed gas is mixed into the ionic liquid 541 of the storage tank 540, the mixed sublimation gas 513 in the bubble contacts the ionic liquid 541.
- a bubble refinement means may be included to make the volume of the bubble smaller so that it is easier to dissolve.
- the organic material purification apparatus 500 of this embodiment may further include a contact expanding means so that the mixed sublimation gas 513 is easily in contact with the ionic liquid 541.
- dissolution of the sublimation gas may be promoted by inducing the mixed sublimation gas 513 to pass through the ionic liquid 541 for a predetermined time while being mixed with the inert gas.
- FIG. 7 is a conceptual diagram showing the configuration of the organic material purification apparatus using an ionic liquid according to a third embodiment of the present invention.
- the organic material purifying apparatus 500A according to this embodiment partially modifies the shape of the storage tank 540A and the arrangement of the third heater 542A so as to facilitate the recovery of the purified material 543A.
- the organic material purification apparatus 500 of the second embodiment is configured in the same manner. Therefore, in this embodiment, the same reference numerals are assigned to the same components, and description thereof will be omitted.
- the reservoir 540A of this embodiment is configured to have a funnel form at the lower side thereof, and to have a recovery container 544 of the purified material 543A at the lower side.
- the recovery container 544 is configured to be separated and coupled to the lower end of the reservoir 540A. Therefore, in the recovery container 544, the refined material 543A deposited through the above-described process is gradually piled up.
- the lower portion of the reservoir 540A is further provided with a valve 545 for controlling the ionic liquid from moving to the recovery container 544. Accordingly, when a predetermined amount of purified material 543A is accumulated in the recovery container 544, the valve 545 may be closed, and the recovery container 544 may be separated from the storage tank 540A to recover the purified material 543A.
- the third heater 542A of this embodiment is configured to have a recovery container 544 at the lower portion of the reservoir 540A, so that the refined material 543A is smoothly installed in the side of the reservoir 540A by indirect heating. What is necessary is just to heat so that it may precipitate.
- the organic material simple refining experiment apparatus includes a sublimation unit for greatly subliming organic material, a recrystallization unit for recrystallizing the sublimed organic material (tablet material) in an ionic liquid, and a recrystallized organic material. It is divided into an analysis part that analyzes (refined material). Meanwhile, the recrystallization unit and the analysis unit are composed of a ceramic heater, a thickness monitor, a thermo-couple, and a mask, and the sublimation unit is composed of a shutter, a crucible, and a heating heater.
- the ionic liquid is applied to the Si wafer in the form of small droplets (droplets, droplets), fixed to a mask, and fixed to a ceramic heater.
- the organic material used is NPB (N, N'-di (biphenyl-4-yl) -N, N'-bis (2-methyl-biphenyl-4-yl) biphenyl-4,4'-diamine ) was used.
- Ionic liquid is applied to Si wafer (50x50mm 2 ) in droplet form and mounted on mask. Then, the mask was fixed to the support member connected to the ceramic heater, and then the thermocouple and the thickness gauge were used to check the crystallization temperature of the organic material and the amount of the organic material supplied from the sublimation part. . At this time, OMIM TFSI was used as the ionic liquid used.
- FIG. 9 is a graph showing a change in substrate temperature according to a ceramic heater set temperature in the organic material simple purification experiment shown in FIG. 8. As can be seen in Figure 9, after raising the set temperature of the ceramic heater mounted on the experimental apparatus up to 300 ⁇ 500 °C confirmed the temperature transferred to the actual recrystallization unit through the thermocouple results in the temperature gradient shown in Figure 9 Confirmed.
- This temperature change experiment was conducted in advance to confirm the crystallization temperature of the ionic liquid applied to the Si wafer, and based on the results, the actual crystallization temperature is based on the temperature measured at the thermocouple, not the temperature of the ceramic heater. Purification experiment was carried out.
- FIG. 10 is a graph showing the deposition rate and the total organic thickness variation according to the sublimation temperature of the NPB organic material when the crystallization temperature (substrate temperature) of the organic material simple purification experiment shown in FIG. 8 is room temperature.
- This experiment analyzes the deposition rate and overall thickness of NPB organic material by thickness gauge while changing the sublimation temperature of the sublimation part when the crystallization temperature is room temperature.
- the deposition rate is increased to 0.1 ⁇ 9 ⁇ / sec, it was confirmed that the thickness of the entire organic material is changed to 0.011 ⁇ 1.64 ⁇ m.
- FIG. 11 is a graph showing the deposition rate and total organic thickness variation according to the NPB organic material sublimation temperature when the crystallization temperature (substrate temperature) of the organic material simple purification experiment apparatus shown in FIG. 8 is 100 ° C.
- This experiment analyzes the deposition rate and overall thickness of NPB organic material by thickness gauge while changing the sublimation temperature of the sublimation part when the crystallization temperature is 100 °C.
- the deposition rate is increased to 0.1 ⁇ 9.2 ⁇ / sec, it was confirmed that the thickness of the entire organic material is changed to 0.011 ⁇ 1.51 ⁇ m.
- FIG. 12 is a graph showing changes in deposition rate and total organic thickness according to NPB organic material sublimation temperature when the crystallization temperature (substrate temperature) is 110 ° C. in the organic material simple purification experiment shown in FIG. 8.
- This experiment analyzed the deposition rate and overall thickness of NPB organic materials by thickness gauge while changing the sublimation temperature of the sublimation part when the crystallization temperature is 110 °C.
- the deposition rate is increased to 0.1 ⁇ 12.8 kW / sec, it was confirmed that the thickness of the entire organic material is changed to 0.013 ⁇ 2.37 ⁇ m.
- FIG. 13 is a photograph analyzing the crystallization process of the NPB organic material in the ionic liquid according to the organic material sublimation temperature and the substrate temperature in the organic material simple purification experiment shown in FIG.
- the sublimation temperature (180 °C) of the sublimation unit does not sublimation of the NPB organic material is not supplied material to the ionic liquid.
- the sublimation process proceeds when the NPB organic material sublimation temperature is increased to 200 ° C. or more, and the grain size of the purified NPB organic material increases as the crystallization temperature (substrate temperature) of the ionic liquid increases.
- FIG. 14 is an NPB organic material crystallinity image (SEM analysis) manufactured by the organic material simple purification experiment shown in FIG. 8. That is, FIG. 14 is an SEM surface analysis of NPB organic material crystallinity according to the organic material sublimation temperature (200, 220 ° C) and crystallization temperature (RT, 100, 110 ° C) based on the result of analyzing the crystallinity of NPB organic material with an optical microscope. It is. As can be seen in Figure 14, the crystallinity of the NPB organic material showed the most excellent properties when the crystallization temperature of the ionic liquid is R.T, 100 °C, the crystallinity was lowered at the crystallization temperature (110 °C).
- FIG. 15 is a graph analyzing the crystal phase of the NPB organic material recrystallized by the organic material simple purification apparatus shown in FIG. 8 and the crystal phase of the NPB organic material before purification through Raman analysis.
- the crystal peaks of the NPB organic material recrystallized under the purification conditions of the sublimation temperature (220 °C), crystallization temperature (substrate temperature) (110 °C) of NPB organic material is 1125, 1199, 1222, 1289, Raman shift values of 1328, 1375, 1529, 1574, and 1609 cm -1 were shown, and the Raman shift values were almost identical to those of the NPB organic material before purification. This indicates that when recrystallized through the ionic liquid, the raw NPB organic material was recrystallized without losing crystallinity.
- FIG. 16 is a photograph analyzing the grain size (b) of the NPB organic material recrystallized by the organic material simple purification apparatus shown in FIG. 8 and the grain size (a) of the NPB organic material before purification through an optical microscope. .
- the grain size is also a constant pattern It showed various types of particle sizes without.
- the present invention is a purification process using a difference in solubility, the process of repeating dissolution-recrystallization of organic materials and impurities in the ionic liquid numerous times. Due to the mechanism in which the organic material that reaches supersaturation at, is first recrystallized, it is possible to purify and recrystallize various organic materials in a single process.
- the present invention can minimize the amount of impurities supplied from an external pollutant by purifying the organic material under vacuum conditions, it is possible to obtain a high-purity organic material (purified material).
- the purification process is performed in the ionic liquid using the ionic liquid as a filter, there is no loss due to carrier gas, and the ionic liquid is recovered after recrystallization of the organic material.
- the ionic liquid is recovered after recrystallization of the organic material.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Electroluminescent Light Sources (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (30)
- 불순물이 함유된 OLED(Organic Light Emitting Diodes)용 유기소재 원료를 수용하는 도가니가 설치된 진공분위기의 가열챔버와, 상기 가열챔버 내에 설치되며 이온성 액체가 도포된 기판을 포함하는 유기소재 간이 정제장치를 이용한 정제방법으로서,상기 도가니를 상기 유기소재 원료의 승화점까지 가열하는 가열단계와,상기 가열단계에서 발생한 상기 유기소재 원료의 승화기체가 상기 이온성 액체에 증착되는 증착단계, 및상기 승화기체가 상기 이온성 액체에서 재결정화되는 재결정화단계를 포함하는 이온성 액체를 이용한 유기소재 간이 정제방법.
- 청구항 1에 있어서,상기 재결정화단계 이후에 상기 재결정화된 유기소재를 상기 이온성 액체로부터 분리하는 분리단계를 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제방법.
- 청구항 1에 있어서,상기 재결정화단계에서는 상기 이온성 액체의 용해도를 조절하기 위해 상기 이온성 액체의 온도를 조절하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제방법.
- 청구항 1에 있어서,상기 재결정화단계에서 상기 기판의 온도를 상온 ~ 200℃ 범위 내에서 유지하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제방법.
- 불순물이 함유된 OLED(Organic Light Emitting Diodes)용 유기소재 원료를 가열하여 승화시키는 진공분위기의 승화수단과,승화된 유기소재의 승화기체를 이온성 액체의 표면에 증착시켜 상기 이온성 액체에서 재결정화시키는 진공분위기의 재결정화수단, 및상기 승화수단과 상기 재결정화수단의 작동을 제어하는 제어수단을 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제장치.
- 청구항 5에 있어서,상기 승화수단은 상기 유기소재 원료를 수용하는 도가니와, 상기 도가니가 설치되며 일정 내부 용적을 갖는 가열챔버와, 상기 가열챔버의 내부를 진공상태로 유지시키는 진공펌프와, 상기 도가니를 가열하는 제1 히터와, 상기 도가니의 상부 쪽을 선택적으로 개방하거나 폐쇄하는 셔터(shutter)를 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제장치.
- 청구항 6에 있어서,상기 셔터는 상기 도가니의 상단을 덮거나 상기 도가니의 상단과 일정 이격거리를 두고 덮도록 구성되는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제장치.
- 청구항 6에 있어서,상기 재결정화수단은 상기 이온성 액체가 도포된 기판과, 상기 기판을 지지하는 마스크와, 상기 가열챔버의 상부에 설치 고정되는 제2 히터, 및 상기 제2 히터의 하부에 형성되어 상기 마스크를 지지하는 지지부재를 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제장치.
- 청구항 8에 있어서,상기 재결정화수단은 상기 지지부재에 설치되어 상기 기판의 온도를 측정하는 서모커플(thermocouple)을 더 포함하며,상기 제어수단은 상기 서모커플에서 측정된 온도를 이용해 상기 제2 히터의 온도를 제어하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제장치.
- 청구항 5에 있어서,상기 이온성 액체는 상기 기판 위에 액적(droplet) 형태로 도포되는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제장치.
- 청구항 5 내지 청구항 10 중에서 어느 한 항에 있어서,상기 이온성 액체에서 재결정화된 정제소재를 촬영해 분석하는 분석수단을 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제장치.
- 청구항 11에 있어서,상기 분석수단은 상기 재결정화된 정제소재의 두께를 측정하는 두께 측정기(thickness monitor)를 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 간이 정제장치.
- 불순물이 함유된 OLED(Organic Light Emitting Diodes)용 유기소재 원료를 수용하는 도가니가 설치된 진공분위기의 가열챔버와, 진공분위기하에서 이온성 액체를 수용한 저장조를 포함하는 유기소재 정제장치를 이용한 정제방법으로서,상기 도가니를 상기 유기소재 원료의 승화점까지 가열하는 가열단계와,상기 가열단계에서 발생한 상기 유기소재 원료의 승화기체를 상기 저장조 내의 이온성 액체 안으로 유동시키는 유동단계, 및상기 이온성 액체 안으로 혼입된 상기 승화기체를 상기 이온성 액체 안에서 용해하고 재결정화시키는 재결정화단계를 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제방법.
- 청구항 13에 있어서,상기 유동단계에서, 상기 승화기체는 상기 가열챔버 내부로 공급되는 불활성 기체에 의해 상기 이온성 액체 안으로 유동하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제방법.
- 청구항 14에 있어서,상기 용해단계 이후에 상기 용해단계에서 용해되지 않고 상기 저장조의 상부에 수집된 상기 불활성 기체를 상기 저장조의 외부로 배출하는 배출단계를 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제방법.
- 청구항 15에 있어서,상기 재결정화단계 이후에 상기 재결정화된 유기소재를 상기 이온성 액체로부터 회수하는 회수단계를 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제방법.
- 청구항 15에 있어서,상기 혼합기체가 상기 이온성 액체 안에 혼입되기 전에 상기 승화점 이상으로 온도를 유지하도록 상기 혼합기체를 가열하는 단계를 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제방법.
- 청구항 15에 있어서,상기 재결정화단계에서는 상기 이온성 액체의 용해도를 조절하기 위해 상기 이온성 액체의 온도를 조절하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제방법.
- 청구항 15에 있어서,상기 배출단계에서 배출된 상기 불활성 기체는 상기 혼합단계에서 공급되는 불활성 기체로 재활용되는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제방법.
- 불순물이 함유된 OLED(Organic Light Emitting Diodes)용 유기소재 원료를 가열하여 승화시키는 진공분위기의 승화수단과,승화된 유기소재의 승화기체를 이온성 액체 안으로 혼입시켜 상기 이온성 액체 안에서 재결정화시키는 진공분위기의 재결정화수단, 및상기 승화수단과 상기 재결정화수단의 작동을 제어하는 제어수단을 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 20에 있어서,상기 승화수단은 상기 유기소재 원료를 수용하는 도가니와, 상기 도가니가 설치되며 일정 내부 용적을 갖는 가열챔버와, 상기 가열챔버의 내부를 진공상태로 만드는 진공펌프와, 상기 도가니를 가열하는 제1 히터, 및 상기 가열챔버의 일측에 연결되어 불활성 기체를 공급하는 불활성 기체공급원을 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 21에 있어서,상기 재결정화수단은 상기 이온성 액체를 수용한 저장조와, 일측이 상기 가열챔버의 내부와 연통하고 타측이 상기 저장조의 이온성 액체에 침지되는 연결도관과, 상기 저장조의 내부를 진공상태로 만드는 진공펌프, 및 상기 저장조의 이온성 액체 위에 수집된 기체를 상기 저장조 밖으로 배출하는 배출펌프를 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 22에 있어서,상기 유기소재의 승화점을 유지하도록 상기 연결도관의 외부를 가열하는 제2 히터를 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 22에 있어서,상기 유기소재의 용해도를 조절하도록 상기 이온성 액체가 담긴 상기 저장조의 하부를 가열하는 제3 히터를 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 24에 있어서,상기 저장조의 상부에 설치되어 상기 유기소재의 정제에 사용된 상기 이온성 액체를 진공 중에서 일정 온도 이상으로 가열하고 증발시켜 불순물과 용해된 유기소재와 분리정제 공정을 거쳐 재활용할 수 있도록 수집하는 이온성 액체 수집부를 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 25에 있어서,상기 이온성 액체 수집부는 상기 저장조의 내측면에 고정되는 수집판과, 상기 저장조의 내측면에 고정되어 상기 수집판에 의해 수집되는 이온성 액체를 모으는 수집통을 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 26에 있어서,상기 수집통에 수집된 이온성 액체를 재활용하기 위해 상기 저장조로 리턴시키는 이온성 액체 리턴수단을 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 22에 있어서,상기 저장조와 선택적으로 연통되고 또한 결합 및 분리가 가능하게 구성되어 상기 재결정화된 유기소재를 별도로 회수하는 회수통을 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 22에 있어서,상기 혼합기체가 상기 저장조의 이온성 액체 안으로 혼입됨에 따라 생성되는 기포의 용적을 작게 만드는 기포 미세화수단을 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
- 청구항 22에 있어서,상기 배출펌프를 통해 배출된 불활성 기체를 재활용하기 위해 상기 불활성 기체공급원으로 리턴시키는 불활성 기체 리턴수단을 더 포함하는 것을 특징으로 하는 이온성 액체를 이용한 유기소재 정제장치.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201380066488.1A CN104884146A (zh) | 2012-12-18 | 2013-12-17 | 利用离子液体的有机材料提纯方法及提纯装置 |
JP2015549253A JP2016508977A (ja) | 2012-12-18 | 2013-12-17 | イオン性液体を用いた有機素材精製方法および精製装置 |
US14/653,612 US20160193543A1 (en) | 2012-12-18 | 2013-12-17 | Method and apparatus for purifying organic material using ionic liquid |
EP13865487.6A EP2937124A4 (en) | 2012-12-18 | 2013-12-17 | METHOD AND DEVICE FOR CLEANING AN ORGANIC MATERIAL USING AN IONIC LIQUID |
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2012-0148718 | 2012-12-18 | ||
KR20120148718 | 2012-12-18 | ||
KR10-2012-0148719 | 2012-12-18 | ||
KR20120148719 | 2012-12-18 | ||
KR10-2013-0156872 | 2013-12-17 | ||
KR1020130156872A KR20140079309A (ko) | 2012-12-18 | 2013-12-17 | 이온성 액체를 이용한 유기소재의 재결정화 방법 및 장치 |
KR10-2013-0156871 | 2013-12-17 | ||
KR1020130156871A KR101599454B1 (ko) | 2012-12-18 | 2013-12-17 | 이온성 액체를 이용한 유기소재 정제방법 및 정제장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014098458A1 true WO2014098458A1 (ko) | 2014-06-26 |
Family
ID=53951162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2013/011757 WO2014098458A1 (ko) | 2012-12-18 | 2013-12-17 | 이온성 액체를 이용한 유기소재 정제방법 및 정제장치 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20160193543A1 (ko) |
EP (1) | EP2937124A4 (ko) |
JP (1) | JP2016508977A (ko) |
CN (1) | CN104884146A (ko) |
WO (1) | WO2014098458A1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016138044A (ja) * | 2015-01-26 | 2016-08-04 | 国立大学法人東北大学 | 有機化合物析出方法及びその装置 |
US20160372673A1 (en) * | 2014-02-14 | 2016-12-22 | Ilsoled Co., Ltd. | Method and apparatus for purifying organic material by using ionic liquid |
KR102182531B1 (ko) * | 2019-06-03 | 2020-11-24 | (주) 에프엔지리서치 | 유기전계발광 재료의 정제 방법 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10067108B2 (en) | 2015-05-13 | 2018-09-04 | Elemental Sensor Llc | Device for detecting volatile organic compounds |
US10463275B2 (en) * | 2015-08-09 | 2019-11-05 | Elemental Sensor Llc | Device for capturing and concentrating volatile organic compounds |
JP2018150246A (ja) * | 2017-03-10 | 2018-09-27 | 国立大学法人東北大学 | 有機化合物析出方法 |
CN107591497B (zh) * | 2017-08-31 | 2019-04-16 | 武汉华星光电半导体显示技术有限公司 | 一种可调式振子传感器安装座 |
KR102482452B1 (ko) * | 2017-09-28 | 2022-12-29 | 삼성디스플레이 주식회사 | 유기 재료 정제 조성물 및 이를 이용한 유기 재료 정제 방법 |
JP6851603B2 (ja) | 2018-03-19 | 2021-03-31 | 国立大学法人東北大学 | 有機化合物析出方法 |
KR102249362B1 (ko) * | 2018-08-22 | 2021-05-11 | 김창남 | 승화 정제 방법 및 장치 |
KR102297249B1 (ko) | 2018-09-12 | 2021-09-03 | 주식회사 엘지화학 | 승화 정제 장치 및 승화 정제 방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20040102877A (ko) * | 2003-05-30 | 2004-12-08 | 학교법인 서강대학교 | 유기 전계 발광 소자에 사용되는 유기물의 초고순도정제방법 |
JP2005504700A (ja) * | 2001-10-01 | 2005-02-17 | ティーディーエイ リサーチ インコーポレイテッド | 金属内包フラーレン類及びその他のフラーレン類の化学的精製方法 |
KR100877992B1 (ko) * | 2007-02-07 | 2009-01-12 | 주식회사 지우기술 | 승화정제장치 |
JP2009106917A (ja) * | 2007-10-29 | 2009-05-21 | Kiriyama Seisakusho:Kk | 昇華性物質の分離・精製装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63116702A (ja) * | 1986-11-05 | 1988-05-21 | Hitachi Ltd | 昇華物の回収方法及び装置 |
JPH0483871A (ja) * | 1990-07-27 | 1992-03-17 | Semiconductor Energy Lab Co Ltd | 有機薄膜の作製方法及びその作製装置 |
JP5248721B2 (ja) * | 2000-12-28 | 2013-07-31 | 新日鉄住金化学株式会社 | 高融点有機材料の蒸留精製方法及び装置 |
JP2003095992A (ja) * | 2001-09-25 | 2003-04-03 | Sanyo Electric Co Ltd | 昇華精製方法 |
JP2006075740A (ja) * | 2004-09-10 | 2006-03-23 | Mitsubishi Materials Corp | イオン性液体の精製方法 |
CN201088871Y (zh) * | 2007-06-21 | 2008-07-23 | 中国矿业大学 | 真空升华提纯炉 |
JP4469396B2 (ja) * | 2008-01-15 | 2010-05-26 | 新日本製鐵株式会社 | 炭化珪素単結晶インゴット、これから得られる基板及びエピタキシャルウェハ |
JP2013177347A (ja) * | 2012-02-28 | 2013-09-09 | Osaka Univ | 結晶の縮合多環芳香族化合物を製造する方法 |
KR20130129728A (ko) * | 2012-05-21 | 2013-11-29 | 롬엔드하스전자재료코리아유한회사 | 승화 정제 장치 및 방법 |
-
2013
- 2013-12-17 EP EP13865487.6A patent/EP2937124A4/en not_active Withdrawn
- 2013-12-17 JP JP2015549253A patent/JP2016508977A/ja active Pending
- 2013-12-17 US US14/653,612 patent/US20160193543A1/en not_active Abandoned
- 2013-12-17 WO PCT/KR2013/011757 patent/WO2014098458A1/ko active Application Filing
- 2013-12-17 CN CN201380066488.1A patent/CN104884146A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005504700A (ja) * | 2001-10-01 | 2005-02-17 | ティーディーエイ リサーチ インコーポレイテッド | 金属内包フラーレン類及びその他のフラーレン類の化学的精製方法 |
KR20040102877A (ko) * | 2003-05-30 | 2004-12-08 | 학교법인 서강대학교 | 유기 전계 발광 소자에 사용되는 유기물의 초고순도정제방법 |
KR100877992B1 (ko) * | 2007-02-07 | 2009-01-12 | 주식회사 지우기술 | 승화정제장치 |
JP2009106917A (ja) * | 2007-10-29 | 2009-05-21 | Kiriyama Seisakusho:Kk | 昇華性物質の分離・精製装置 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2937124A4 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160372673A1 (en) * | 2014-02-14 | 2016-12-22 | Ilsoled Co., Ltd. | Method and apparatus for purifying organic material by using ionic liquid |
US10069070B2 (en) * | 2014-02-14 | 2018-09-04 | Ilsoled Co., Ltd. | Method and apparatus for purifying organic material by using ionic liquid |
JP2016138044A (ja) * | 2015-01-26 | 2016-08-04 | 国立大学法人東北大学 | 有機化合物析出方法及びその装置 |
KR102182531B1 (ko) * | 2019-06-03 | 2020-11-24 | (주) 에프엔지리서치 | 유기전계발광 재료의 정제 방법 |
Also Published As
Publication number | Publication date |
---|---|
EP2937124A1 (en) | 2015-10-28 |
CN104884146A (zh) | 2015-09-02 |
JP2016508977A (ja) | 2016-03-24 |
US20160193543A1 (en) | 2016-07-07 |
EP2937124A4 (en) | 2016-10-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2014098458A1 (ko) | 이온성 액체를 이용한 유기소재 정제방법 및 정제장치 | |
US8119204B2 (en) | Film formation method and method for manufacturing light-emitting device | |
KR101599454B1 (ko) | 이온성 액체를 이용한 유기소재 정제방법 및 정제장치 | |
WO2014038791A1 (ko) | 유기발광재료의 회수방법 | |
US20090011677A1 (en) | Method for Manufacturing Light-Emitting Device | |
KR100754902B1 (ko) | 유기전계 발광재료의 정제방법 | |
KR20140079309A (ko) | 이온성 액체를 이용한 유기소재의 재결정화 방법 및 장치 | |
WO2015122686A1 (ko) | 이온성 액체를 이용한 유기소재 정제방법 및 정제장치 | |
KR20140128676A (ko) | 용액기반의 유기소재 정제방법 및 그 장치 | |
KR102005471B1 (ko) | 유기 발광 소자의 재료로 사용되는 유기 물질 정제방법 | |
WO2016200108A1 (ko) | 이온성 액체를 이용한 유기재료 단결정 성장 방법 및 장치 | |
JP2005149924A (ja) | 蒸着装置および蒸着材料の回収・再利用方法並びに有機電界発光装置の製造方法。 | |
KR100582663B1 (ko) | 유기물질의 승화정제방법 | |
WO2015163734A1 (ko) | 보호층을 갖는 유기소재 | |
KR20050067845A (ko) | 유기물질의 정제장치 및 정제방법 | |
KR100781241B1 (ko) | 유기물 정제 방법 | |
TWI487566B (zh) | 利用離子液體的有機材料純化方法及純化裝置 | |
KR100394820B1 (ko) | Oeld패널 제작용 유기막 증착장치 | |
WO2015160169A1 (ko) | 이온성 액체를 이용한 유기재료 정제 방법 및 장치 | |
WO2018128488A1 (en) | Equipment and method for producing oled using phase-changed material | |
WO2019031809A2 (en) | PHASE CHANGE MATERIAL FOR THE PRODUCTION OF ORGANIC ELECTROLUMINESCENT DIODE | |
KR101801197B1 (ko) | 용액기반의 유기소재 정제방법 | |
KR100680146B1 (ko) | 혼합된 화학적 불순물의 승화를 이용한 oeld 패널제작 방법 | |
JPWO2018173728A1 (ja) | 有機エレクトロルミネッセンス素子用材料の回収方法及び有機エレクトロルミネッセンス素子用材料の製造方法 | |
KR100465513B1 (ko) | 승화 정제 과정을 통해 예비 도핑된 고순도 유기 호스트물질 및 유기 도판트 물질 혼합물의 제조방법 및 이를이용한 유기 전계 발광 소자 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 13865487 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2015549253 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14653612 Country of ref document: US |
|
REEP | Request for entry into the european phase |
Ref document number: 2013865487 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2013865487 Country of ref document: EP |