WO2014080625A1 - 撮像素子および撮像ユニット - Google Patents
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- 239000004065 semiconductor Substances 0.000 claims abstract description 86
- 238000006243 chemical reaction Methods 0.000 claims abstract description 51
- 239000012535 impurity Substances 0.000 claims abstract description 21
- 238000003384 imaging method Methods 0.000 claims description 53
- 210000001747 pupil Anatomy 0.000 claims description 17
- 238000009825 accumulation Methods 0.000 claims description 8
- 238000000926 separation method Methods 0.000 claims description 7
- 230000004907 flux Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 58
- 238000009792 diffusion process Methods 0.000 description 24
- 238000001514 detection method Methods 0.000 description 20
- 230000003287 optical effect Effects 0.000 description 17
- 101100041125 Arabidopsis thaliana RST1 gene Proteins 0.000 description 13
- 101100443250 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) DIG1 gene Proteins 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 230000003321 amplification Effects 0.000 description 10
- 238000003199 nucleic acid amplification method Methods 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 101100443251 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) DIG2 gene Proteins 0.000 description 9
- 101100041128 Schizosaccharomyces pombe (strain 972 / ATCC 24843) rst2 gene Proteins 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 238000002955 isolation Methods 0.000 description 9
- 230000009977 dual effect Effects 0.000 description 8
- 239000004973 liquid crystal related substance Substances 0.000 description 8
- 230000006870 function Effects 0.000 description 7
- 239000013589 supplement Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000000295 complement effect Effects 0.000 description 3
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
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- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
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- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
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- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
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- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/66—Remote control of cameras or camera parts, e.g. by remote control devices
- H04N23/663—Remote control of cameras or camera parts, e.g. by remote control devices for controlling interchangeable camera parts based on electronic image sensor signals
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- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/67—Focus control based on electronic image sensor signals
- H04N23/672—Focus control based on electronic image sensor signals based on the phase difference signals
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/10—Circuitry of solid-state image sensors [SSIS]; Control thereof for transforming different wavelengths into image signals
- H04N25/11—Arrangement of colour filter arrays [CFA]; Filter mosaics
- H04N25/13—Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements
- H04N25/134—Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements based on three different wavelength filter elements
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- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
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- H04N25/62—Detection or reduction of noise due to excess charges produced by the exposure, e.g. smear, blooming, ghost image, crosstalk or leakage between pixels
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- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
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- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/703—SSIS architectures incorporating pixels for producing signals other than image signals
- H04N25/704—Pixels specially adapted for focusing, e.g. phase difference pixel sets
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- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
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- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
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- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
- H04N25/771—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising storage means other than floating diffusion
Definitions
- Non-Patent Document 1 In order to realize a global shutter with a CMOS (complementary metal oxide semiconductor) image sensor, an imaging device in which a storage unit is provided in a pixel is known (for example, see Non-Patent Document 1).
- CMOS complementary metal oxide semiconductor
- a photoelectric conversion unit of an R pixel (an example of a sixth pixel) whose upper half different from the third pixel is opened is arranged next to the photoelectric conversion unit of the fourth pixel.
- the configurations of the third pixel and the sixth pixel are the same.
- the photodiode PD formed in a substantially trapezoidal shape and the first reset transistor RST1 are disposed in the opening of the pixel PX on the light receiving surface side of the image sensor 12a.
- a first global switch transistor GS1, a storage diode SD, a transfer transistor TX, and a second global switch transistor GS2 are disposed in the light shielding portion of the pixel PX.
- 6 indicates a circuit in which an amplification transistor AMP and a selection transistor SEL shared by four pixels are integrated.
- symbol 24 of FIG. 6 shows 2nd reset transistor RST2 shared by 2 pixels. 6 and 7, the area of the photodiode PD on the light receiving surface is set larger than the area of the storage diode SD.
- the image sensor 12a of the first configuration example can obtain the phase difference information of the subject image in any of the R pixel, the G pixel, and the B pixel. Therefore, in the image sensor 12a, the detection accuracy of the phase difference information is unlikely to decrease due to the color of the subject. In other words, since there are fewer subjects or scenes that are not good at the phase difference AF, the focus detection accuracy of the phase difference AF is improved.
- the thickness of the silicon substrate required to absorb 50% of light is thinner than about 3.2 ⁇ m. Therefore, if the thickness of the silicon substrate is set to 3 ⁇ m or more, practically photoelectric conversion can be sufficiently caused in the semiconductor substrate SUB for any light of RGB.
- the difference between the image sensor 12c of the third configuration example and the second configuration example will be described.
- the area of the photodiode PD is smaller than the area of the storage diode SD on the back surface (second surface) of the light receiving surface. Accordingly, the arrangement interval of the first reset transistor RST1, the first global switch transistor GS1, and the second global switch transistor GS2 is reduced, and thus the size of the pixel PX can be reduced. Therefore, in the case of the third configuration example, it is easy to increase the number of pixels of the image sensor.
- the first substrate includes a photodiode PD, a first reset transistor RST1, a first global switch transistor GS1, a storage diode SD, a transfer transistor TX, and a second global switch transistor GS2.
- the second substrate may include a second reset transistor RST2, an amplification transistor AMP, a selection transistor SEL, a vertical signal line VL, a horizontal scanning unit 33, an A / D conversion circuit, a CDS circuit, and the like.
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Abstract
Description
図1は、撮像ユニットの一例としてのデジタルカメラの構成例を示す図である。デジタルカメラ1は、交換レンズ2とカメラボディ3とを有している。交換レンズ2は、マウント部4を介してカメラボディ3に装着される。
次に、撮像素子12の構成例を説明する。本実施形態での撮像素子は、例えば、シリコン基板上にCMOS(相補性金属酸化膜半導体)プロセスを使用して形成されたXYアドレス型の固体撮像素子である。
第2構成例の撮像素子12bは、第1構成例と同じ画素配列であって、受光面の裏面側にゲート層GLYおよび配線層MLYが形成される裏面照射型撮像素子である。第2構成例の撮像素子12bは第1構成例の撮像素子12aの変形例であり、第2構成例で第1構成例と共通する部分には同一の符号を付して重複説明を省略する。
次に、第2構成例の変形例として、第3構成例の撮像素子12cを説明する。図13は、第3構成例の撮像素子12cにおける受光面の裏面(第2面)側からの画素PXの例を示す図である。
(補足1):第1構成例から第3構成例の撮像素子は積層構造であってもよい。例えば、撮像素子12は、第1基板と、第2基板とを積層し、第1基板および第2基板を例えばマイクロバンプなどの接続部MBで電気的に接続して構成してもよい。撮像素子を積層構造とすることで、小さいスペースに回路を集積できるので撮像素子の高画素化が容易となる。
Claims (15)
- 光が入射する第1面と前記第1面とは反対側の第2面とを有し、前記第1面側の不純物濃度より前記第2面側の不純物濃度が高い同一導電型半導体を含む光電変換部を備えることを特徴とする撮像素子。
- 請求項1に記載の撮像素子において、
前記同一導電型半導体は、前記第1面から前記第2面に向けて不純物濃度の勾配を有することを特徴とする撮像素子。 - 請求項1または請求項2に記載の撮像素子において、
前記第1面に対して前記第2面側に配置され、前記光電変換部で光電変換された電荷を転送する転送ゲート部をさらに備えることを特徴とする撮像素子。 - 請求項3に記載の撮像素子において、
前記光電変換部により変換された電荷を蓄積する蓄積部をさらに備えることを特徴とする撮像素子。 - 請求項4に記載の撮像素子において、
前記蓄積部は、前記光電変換部と同一の導電型半導体で形成され且つ前記第2不純物濃度よりも高い不純物濃度であることを特徴とする撮像素子。 - 請求項5に記載の撮像素子において、
前記光電変換部の導電型とは異なる導電型の半導体で形成され、前記光電変換部の電荷が前記蓄積部へ入り込むことを遮蔽する遮蔽部をさらに備えることを特徴とする撮像素子。 - 請求項1から請求項6のいずれか1項に記載の撮像素子において、
前記光電変換部の導電型とは異なる導電型の半導体で形成され、前記第1面上に形成された第1半導体部をさらに備えることを特徴とする撮像素子。 - 請求項1から請求項7のいずれか1項に記載の撮像素子において、
前記光電変換部の導電型とは異なる導電型の半導体で形成され、前記第2面上に形成された第2半導体部をさらに備えることを特徴とする撮像素子。 - 請求項4から請求項8のいずれか1項に記載の撮像素子において、
第1画素と、前記第1画素と隣り合う第2画素を有し、
前記第1画素及び前記第2画素はそれぞれ、前記光電変換部、前記蓄積部および前記転送ゲートを含み、
前記第1画素の前記光電変換部と前記第2画素の前記光電変換部とを分離する分離部をさらに備えることを特徴とする撮像素子。 - 請求項9に記載の撮像素子において、
前記分離部は、前記光電変換部の導電型とは異なる導電型で形成された半導体を有することを特徴とする撮像素子。 - 請求項9または請求項10に記載の撮像素子において、
前記分離部は、トレンチを有していることを特徴とする撮像素子。 - 請求項9から請求項11のいずれか1項に記載の撮像素子において、
前記第1画素の前記光電変換部および前記第2画素の前記光電変換部が瞳分割された光束を電荷に変換して位相差情報として出力するために、前記第1画素は第1瞳分割用遮光部をさらに含むとともに前記第2画素は第2瞳分割用遮光部をさらに含み、
所定方向において、前記第1画素の前記光電変換部と、前記第1瞳分割用遮光部と、前記第2瞳分割用遮光部と、前記第2画素の前記光電変換部との順に配置されていることを特徴とする撮像素子。 - 請求項9から請求項12のいずれか1項に記載の撮像素子において、
前記第1画素は、前記第1画素の前記蓄積部を遮光する第1遮光部をさらに含み、
前記第2画素は、前記第2画素の前記蓄積部を遮光する第2遮光部をさらに含むことを特徴とする撮像素子。 - 赤外カットフィルタと、
請求項1から請求項13のいずれか1項に記載の撮像素子と、を備え、
前記赤外カットフィルタを介した光が前記撮像素子に入射することを特徴とする撮像ユニット。 - 請求項14に記載の撮像ユニットにおいて、
前記第1面に直交する方向における前記光電変換部の厚さは、3μm以上であることを特徴とする撮像ユニット。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
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US14/646,039 US9905604B2 (en) | 2012-11-22 | 2013-11-20 | Imaging device and imaging unit |
CN201380070738.9A CN104937719B (zh) | 2012-11-22 | 2013-11-20 | 拍摄元件及拍摄单元 |
KR1020217002343A KR102425046B1 (ko) | 2012-11-22 | 2013-11-20 | 촬상 소자 및 촬상 유닛 |
JP2014548461A JPWO2014080625A1 (ja) | 2012-11-22 | 2013-11-20 | 撮像素子および撮像ユニット |
US15/869,662 US10204957B2 (en) | 2012-11-22 | 2018-01-12 | Imaging device and imaging unit |
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US14/646,039 A-371-Of-International US9905604B2 (en) | 2012-11-22 | 2013-11-20 | Imaging device and imaging unit |
US15/869,662 Continuation US10204957B2 (en) | 2012-11-22 | 2018-01-12 | Imaging device and imaging unit |
Publications (1)
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Country Status (6)
Country | Link |
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US (3) | US9905604B2 (ja) |
JP (3) | JPWO2014080625A1 (ja) |
KR (2) | KR102425046B1 (ja) |
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- 2013-11-20 KR KR1020157016035A patent/KR20150087322A/ko not_active Application Discontinuation
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Also Published As
Publication number | Publication date |
---|---|
CN104937719B (zh) | 2019-02-12 |
TW201426987A (zh) | 2014-07-01 |
CN104937719A (zh) | 2015-09-23 |
JP6965950B2 (ja) | 2021-11-10 |
US20160049438A1 (en) | 2016-02-18 |
JPWO2014080625A1 (ja) | 2017-01-05 |
US20190172867A1 (en) | 2019-06-06 |
TW201909401A (zh) | 2019-03-01 |
US10943933B2 (en) | 2021-03-09 |
US20180175097A1 (en) | 2018-06-21 |
US9905604B2 (en) | 2018-02-27 |
KR20210013295A (ko) | 2021-02-03 |
TWI637497B (zh) | 2018-10-01 |
JP2018137467A (ja) | 2018-08-30 |
CN109742098A (zh) | 2019-05-10 |
TWI729303B (zh) | 2021-06-01 |
KR20150087322A (ko) | 2015-07-29 |
US10204957B2 (en) | 2019-02-12 |
JP2020077886A (ja) | 2020-05-21 |
KR102425046B1 (ko) | 2022-07-25 |
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