WO2014071689A1 - Liquide nettoyant pour l'élimination de résidus formant barrière à la lumière - Google Patents

Liquide nettoyant pour l'élimination de résidus formant barrière à la lumière Download PDF

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Publication number
WO2014071689A1
WO2014071689A1 PCT/CN2013/001336 CN2013001336W WO2014071689A1 WO 2014071689 A1 WO2014071689 A1 WO 2014071689A1 CN 2013001336 W CN2013001336 W CN 2013001336W WO 2014071689 A1 WO2014071689 A1 WO 2014071689A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning solution
solution according
ether
group
gallic acid
Prior art date
Application number
PCT/CN2013/001336
Other languages
English (en)
Chinese (zh)
Inventor
刘兵
彭洪修
孙广胜
颜金荔
徐海玉
Original Assignee
安集微电子科技(上海)有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 安集微电子科技(上海)有限公司 filed Critical 安集微电子科技(上海)有限公司
Publication of WO2014071689A1 publication Critical patent/WO2014071689A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

Ce liquide nettoyant pour l'élimination de résidus formant barrière à la lumière renferme un aminoalcool, un solvant organique, un acide gallique et son ester, ainsi qu'un 3-amino -1 2, 4-triazole. Ce liquide nettoyant pour l'élimination de résidus formant barrière à la lumière ne renferme cependant ni eau, ni d'hydroxylamine, ni fluorure. Application : dans le domaine du nettoyage de plaquettes de semi-conducteurs ou de DEL en vue du retrait de résidus formant barrière à la lumière sur un substrat tel que l'aluminium métallique, l'argent, le cuivre, le titane, le tungstène et le dioxyde de silicium non métallique ou le nitrure de gallium, et ce, quasiment sans corrosion.
PCT/CN2013/001336 2012-11-12 2013-11-05 Liquide nettoyant pour l'élimination de résidus formant barrière à la lumière WO2014071689A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201210451120.4 2012-11-12
CN201210451120.4A CN103809393A (zh) 2012-11-12 2012-11-12 一种去除光阻残留物的清洗液

Publications (1)

Publication Number Publication Date
WO2014071689A1 true WO2014071689A1 (fr) 2014-05-15

Family

ID=50683988

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2013/001336 WO2014071689A1 (fr) 2012-11-12 2013-11-05 Liquide nettoyant pour l'élimination de résidus formant barrière à la lumière

Country Status (3)

Country Link
CN (1) CN103809393A (fr)
TW (1) TW201418913A (fr)
WO (1) WO2014071689A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109541897A (zh) * 2018-12-14 2019-03-29 江苏艾森半导体材料股份有限公司 一种低腐蚀铝线清洗液
US11945697B2 (en) 2018-02-08 2024-04-02 Vita Inclinata Ip Holdings Llc Multiple remote control for suspended load control equipment apparatus, system, and method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106527066B (zh) * 2015-08-31 2021-04-30 安集微电子科技（上海）股份有限公司 一种光阻残留物清洗液
CN105542990A (zh) * 2016-01-29 2016-05-04 苏州佳亿达电器有限公司 一种水基led芯片清洗剂

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW583719B (en) * 2002-10-11 2004-04-11 Wako Pure Chem Ind Ltd Agent for cleaning substrate
US20050119143A1 (en) * 1999-01-27 2005-06-02 Egbe Matthew I. Compositions for the removal of organic and inorganic residues
JP2006082253A (ja) * 2004-09-14 2006-03-30 Toyota Motor Corp 金型洗浄方法
CN101398638A (zh) * 2007-09-29 2009-04-01 安集微电子（上海）有限公司 一种光刻胶清洗剂
CN101412948A (zh) * 2007-10-19 2009-04-22 安集微电子（上海）有限公司 一种等离子刻蚀残留物清洗剂
CN101226346B (zh) * 2007-12-27 2010-06-09 周伟 光致抗蚀剂的脱膜工艺及在该工艺中使用的第一组合物、第二组合物和脱膜剂水溶液

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101162369A (zh) * 2006-10-13 2008-04-16 安集微电子（上海）有限公司 一种低蚀刻性光刻胶清洗剂及其清洗方法
CN101286016A (zh) * 2007-04-13 2008-10-15 安集微电子（上海）有限公司 低蚀刻性光刻胶清洗剂
CN101364056A (zh) * 2007-08-10 2009-02-11 安集微电子（上海）有限公司 一种光刻胶清洗剂

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050119143A1 (en) * 1999-01-27 2005-06-02 Egbe Matthew I. Compositions for the removal of organic and inorganic residues
TW583719B (en) * 2002-10-11 2004-04-11 Wako Pure Chem Ind Ltd Agent for cleaning substrate
JP2006082253A (ja) * 2004-09-14 2006-03-30 Toyota Motor Corp 金型洗浄方法
CN101398638A (zh) * 2007-09-29 2009-04-01 安集微电子（上海）有限公司 一种光刻胶清洗剂
CN101412948A (zh) * 2007-10-19 2009-04-22 安集微电子（上海）有限公司 一种等离子刻蚀残留物清洗剂
CN101226346B (zh) * 2007-12-27 2010-06-09 周伟 光致抗蚀剂的脱膜工艺及在该工艺中使用的第一组合物、第二组合物和脱膜剂水溶液

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11945697B2 (en) 2018-02-08 2024-04-02 Vita Inclinata Ip Holdings Llc Multiple remote control for suspended load control equipment apparatus, system, and method
CN109541897A (zh) * 2018-12-14 2019-03-29 江苏艾森半导体材料股份有限公司 一种低腐蚀铝线清洗液

Also Published As

Publication number Publication date
TW201418913A (zh) 2014-05-16
CN103809393A (zh) 2014-05-21

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