TW201418913A - 一種去除光阻殘留物的清洗液 - Google Patents

一種去除光阻殘留物的清洗液 Download PDF

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Publication number
TW201418913A
TW201418913A TW102140634A TW102140634A TW201418913A TW 201418913 A TW201418913 A TW 201418913A TW 102140634 A TW102140634 A TW 102140634A TW 102140634 A TW102140634 A TW 102140634A TW 201418913 A TW201418913 A TW 201418913A
Authority
TW
Taiwan
Prior art keywords
cleaning solution
solution according
imidazolidinone
ether
group
Prior art date
Application number
TW102140634A
Other languages
English (en)
Chinese (zh)
Inventor
Bing Liu
hong-xiu Peng
guang-sheng Sun
Jin-Li Yan
hai-yu Xu
Original Assignee
Anji Microelectronics Technology Shanghai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anji Microelectronics Technology Shanghai Co Ltd filed Critical Anji Microelectronics Technology Shanghai Co Ltd
Publication of TW201418913A publication Critical patent/TW201418913A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
TW102140634A 2012-11-12 2013-11-08 一種去除光阻殘留物的清洗液 TW201418913A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201210451120.4A CN103809393A (zh) 2012-11-12 2012-11-12 一种去除光阻残留物的清洗液

Publications (1)

Publication Number Publication Date
TW201418913A true TW201418913A (zh) 2014-05-16

Family

ID=50683988

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102140634A TW201418913A (zh) 2012-11-12 2013-11-08 一種去除光阻殘留物的清洗液

Country Status (3)

Country Link
CN (1) CN103809393A (fr)
TW (1) TW201418913A (fr)
WO (1) WO2014071689A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI696898B (zh) * 2015-08-31 2020-06-21 大陸商安集微電子科技(上海)股份有限公司 光阻殘留物清洗液

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105542990A (zh) * 2016-01-29 2016-05-04 苏州佳亿达电器有限公司 一种水基led芯片清洗剂
US11945697B2 (en) 2018-02-08 2024-04-02 Vita Inclinata Ip Holdings Llc Multiple remote control for suspended load control equipment apparatus, system, and method
CN109541897A (zh) * 2018-12-14 2019-03-29 江苏艾森半导体材料股份有限公司 一种低腐蚀铝线清洗液

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6828289B2 (en) * 1999-01-27 2004-12-07 Air Products And Chemicals, Inc. Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature
AU2002338176A1 (en) * 2002-10-11 2004-05-04 Wako Pure Chemical Industries, Ltd. Substrate detergent
JP4538286B2 (ja) * 2004-09-14 2010-09-08 トヨタ自動車株式会社 金型洗浄方法
CN101162369A (zh) * 2006-10-13 2008-04-16 安集微电子（上海）有限公司 一种低蚀刻性光刻胶清洗剂及其清洗方法
CN101286016A (zh) * 2007-04-13 2008-10-15 安集微电子（上海）有限公司 低蚀刻性光刻胶清洗剂
CN101364056A (zh) * 2007-08-10 2009-02-11 安集微电子（上海）有限公司 一种光刻胶清洗剂
CN101398638A (zh) * 2007-09-29 2009-04-01 安集微电子（上海）有限公司 一种光刻胶清洗剂
CN101412948B (zh) * 2007-10-19 2012-05-16 安集微电子（上海）有限公司 一种等离子刻蚀残留物清洗剂
CN101226346B (zh) * 2007-12-27 2010-06-09 周伟 光致抗蚀剂的脱膜工艺及在该工艺中使用的第一组合物、第二组合物和脱膜剂水溶液

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI696898B (zh) * 2015-08-31 2020-06-21 大陸商安集微電子科技(上海)股份有限公司 光阻殘留物清洗液

Also Published As

Publication number Publication date
CN103809393A (zh) 2014-05-21
WO2014071689A1 (fr) 2014-05-15

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