TW201422807A - 一種去除光阻的清洗液 - Google Patents
一種去除光阻的清洗液 Download PDFInfo
- Publication number
- TW201422807A TW201422807A TW102145084A TW102145084A TW201422807A TW 201422807 A TW201422807 A TW 201422807A TW 102145084 A TW102145084 A TW 102145084A TW 102145084 A TW102145084 A TW 102145084A TW 201422807 A TW201422807 A TW 201422807A
- Authority
- TW
- Taiwan
- Prior art keywords
- cleaning solution
- ether
- solution according
- hydroxide
- cleaning
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 claims abstract description 43
- 239000000908 ammonium hydroxide Substances 0.000 claims abstract description 10
- 125000001453 quaternary ammonium group Chemical group 0.000 claims abstract description 9
- 239000002904 solvent Substances 0.000 claims abstract description 8
- 229920005862 polyol Polymers 0.000 claims abstract description 7
- 150000003077 polyols Chemical class 0.000 claims abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 claims description 29
- 239000007788 liquid Substances 0.000 claims description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 10
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 10
- -1 alcohol amine Chemical class 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 6
- HEBKCHPVOIAQTA-UHFFFAOYSA-N meso ribitol Natural products OCC(O)C(O)C(O)CO HEBKCHPVOIAQTA-UHFFFAOYSA-N 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 5
- YAMHXTCMCPHKLN-UHFFFAOYSA-N imidazolidin-2-one Chemical compound O=C1NCCN1 YAMHXTCMCPHKLN-UHFFFAOYSA-N 0.000 claims description 5
- JDSQBDGCMUXRBM-UHFFFAOYSA-N 2-[2-(2-butoxypropoxy)propoxy]propan-1-ol Chemical compound CCCCOC(C)COC(C)COC(C)CO JDSQBDGCMUXRBM-UHFFFAOYSA-N 0.000 claims description 4
- SRBFZHDQGSBBOR-IOVATXLUSA-N D-xylopyranose Chemical compound O[C@@H]1COC(O)[C@H](O)[C@H]1O SRBFZHDQGSBBOR-IOVATXLUSA-N 0.000 claims description 4
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 claims description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- PYMYPHUHKUWMLA-UHFFFAOYSA-N arabinose Natural products OCC(O)C(O)C(O)C=O PYMYPHUHKUWMLA-UHFFFAOYSA-N 0.000 claims description 4
- SRBFZHDQGSBBOR-UHFFFAOYSA-N beta-D-Pyranose-Lyxose Natural products OC1COC(O)C(O)C1O SRBFZHDQGSBBOR-UHFFFAOYSA-N 0.000 claims description 4
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 claims description 4
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 claims description 4
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 claims description 3
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- DIIIISSCIXVANO-UHFFFAOYSA-N 1,2-Dimethylhydrazine Chemical compound CNNC DIIIISSCIXVANO-UHFFFAOYSA-N 0.000 claims description 2
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 claims description 2
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 claims description 2
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 claims description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical group COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 2
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 claims description 2
- CAAMSDWKXXPUJR-UHFFFAOYSA-N 3,5-dihydro-4H-imidazol-4-one Chemical compound O=C1CNC=N1 CAAMSDWKXXPUJR-UHFFFAOYSA-N 0.000 claims description 2
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 claims description 2
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 claims description 2
- FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 claims description 2
- WQZGKKKJIJFFOK-IVMDWMLBSA-N D-allopyranose Chemical compound OC[C@H]1OC(O)[C@H](O)[C@H](O)[C@@H]1O WQZGKKKJIJFFOK-IVMDWMLBSA-N 0.000 claims description 2
- LKDRXBCSQODPBY-JDJSBBGDSA-N D-allulose Chemical compound OCC1(O)OC[C@@H](O)[C@@H](O)[C@H]1O LKDRXBCSQODPBY-JDJSBBGDSA-N 0.000 claims description 2
- FBPFZTCFMRRESA-KAZBKCHUSA-N D-altritol Chemical compound OC[C@@H](O)[C@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KAZBKCHUSA-N 0.000 claims description 2
- HEBKCHPVOIAQTA-QWWZWVQMSA-N D-arabinitol Chemical compound OC[C@@H](O)C(O)[C@H](O)CO HEBKCHPVOIAQTA-QWWZWVQMSA-N 0.000 claims description 2
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 claims description 2
- FBPFZTCFMRRESA-ZXXMMSQZSA-N D-iditol Chemical compound OC[C@@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-ZXXMMSQZSA-N 0.000 claims description 2
- WQZGKKKJIJFFOK-QTVWNMPRSA-N D-mannopyranose Chemical compound OC[C@H]1OC(O)[C@@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-QTVWNMPRSA-N 0.000 claims description 2
- HMFHBZSHGGEWLO-SOOFDHNKSA-N D-ribofuranose Chemical compound OC[C@H]1OC(O)[C@H](O)[C@@H]1O HMFHBZSHGGEWLO-SOOFDHNKSA-N 0.000 claims description 2
- ZAQJHHRNXZUBTE-NQXXGFSBSA-N D-ribulose Chemical compound OC[C@@H](O)[C@@H](O)C(=O)CO ZAQJHHRNXZUBTE-NQXXGFSBSA-N 0.000 claims description 2
- UNXHWFMMPAWVPI-QWWZWVQMSA-N D-threitol Chemical compound OC[C@@H](O)[C@H](O)CO UNXHWFMMPAWVPI-QWWZWVQMSA-N 0.000 claims description 2
- ZAQJHHRNXZUBTE-UHFFFAOYSA-N D-threo-2-Pentulose Natural products OCC(O)C(O)C(=O)CO ZAQJHHRNXZUBTE-UHFFFAOYSA-N 0.000 claims description 2
- YTBSYETUWUMLBZ-QWWZWVQMSA-N D-threose Chemical compound OC[C@@H](O)[C@H](O)C=O YTBSYETUWUMLBZ-QWWZWVQMSA-N 0.000 claims description 2
- ZAQJHHRNXZUBTE-WUJLRWPWSA-N D-xylulose Chemical compound OC[C@@H](O)[C@H](O)C(=O)CO ZAQJHHRNXZUBTE-WUJLRWPWSA-N 0.000 claims description 2
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 claims description 2
- 239000004386 Erythritol Substances 0.000 claims description 2
- 229930091371 Fructose Natural products 0.000 claims description 2
- RFSUNEUAIZKAJO-ARQDHWQXSA-N Fructose Chemical compound OC[C@H]1O[C@](O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-ARQDHWQXSA-N 0.000 claims description 2
- 239000005715 Fructose Substances 0.000 claims description 2
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 claims description 2
- LKDRXBCSQODPBY-AMVSKUEXSA-N L-(-)-Sorbose Chemical compound OCC1(O)OC[C@H](O)[C@@H](O)[C@@H]1O LKDRXBCSQODPBY-AMVSKUEXSA-N 0.000 claims description 2
- 229930195725 Mannitol Natural products 0.000 claims description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 2
- AKNUHUCEWALCOI-UHFFFAOYSA-N N-ethyldiethanolamine Chemical compound OCCN(CC)CCO AKNUHUCEWALCOI-UHFFFAOYSA-N 0.000 claims description 2
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 claims description 2
- JVWLUVNSQYXYBE-UHFFFAOYSA-N Ribitol Natural products OCC(C)C(O)C(O)CO JVWLUVNSQYXYBE-UHFFFAOYSA-N 0.000 claims description 2
- PYMYPHUHKUWMLA-LMVFSUKVSA-N Ribose Natural products OC[C@@H](O)[C@@H](O)[C@@H](O)C=O PYMYPHUHKUWMLA-LMVFSUKVSA-N 0.000 claims description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 2
- TVXBFESIOXBWNM-UHFFFAOYSA-N Xylitol Natural products OCCC(O)C(O)C(O)CCO TVXBFESIOXBWNM-UHFFFAOYSA-N 0.000 claims description 2
- HMFHBZSHGGEWLO-UHFFFAOYSA-N alpha-D-Furanose-Ribose Natural products OCC1OC(O)C(O)C1O HMFHBZSHGGEWLO-UHFFFAOYSA-N 0.000 claims description 2
- WQZGKKKJIJFFOK-PHYPRBDBSA-N alpha-D-galactose Chemical compound OC[C@H]1O[C@H](O)[C@H](O)[C@@H](O)[C@H]1O WQZGKKKJIJFFOK-PHYPRBDBSA-N 0.000 claims description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 claims description 2
- 150000004056 anthraquinones Chemical class 0.000 claims description 2
- PYMYPHUHKUWMLA-WDCZJNDASA-N arabinose Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)C=O PYMYPHUHKUWMLA-WDCZJNDASA-N 0.000 claims description 2
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 claims description 2
- HQFQTTNMBUPQAY-UHFFFAOYSA-N cyclobutylhydrazine Chemical compound NNC1CCC1 HQFQTTNMBUPQAY-UHFFFAOYSA-N 0.000 claims description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 2
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 claims description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 claims description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 claims description 2
- 235000019414 erythritol Nutrition 0.000 claims description 2
- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical compound OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 claims description 2
- 229940009714 erythritol Drugs 0.000 claims description 2
- FBPFZTCFMRRESA-GUCUJZIJSA-N galactitol Chemical compound OC[C@H](O)[C@@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-GUCUJZIJSA-N 0.000 claims description 2
- 229930182830 galactose Natural products 0.000 claims description 2
- 239000008103 glucose Substances 0.000 claims description 2
- 125000002951 idosyl group Chemical class C1([C@@H](O)[C@H](O)[C@@H](O)[C@H](O1)CO)* 0.000 claims description 2
- 229940102253 isopropanolamine Drugs 0.000 claims description 2
- BJHIKXHVCXFQLS-PQLUHFTBSA-N keto-D-tagatose Chemical compound OC[C@@H](O)[C@H](O)[C@H](O)C(=O)CO BJHIKXHVCXFQLS-PQLUHFTBSA-N 0.000 claims description 2
- 239000000594 mannitol Substances 0.000 claims description 2
- 235000010355 mannitol Nutrition 0.000 claims description 2
- PZYDAVFRVJXFHS-UHFFFAOYSA-N n-cyclohexyl-2-pyrrolidone Chemical compound O=C1CCCN1C1CCCCC1 PZYDAVFRVJXFHS-UHFFFAOYSA-N 0.000 claims description 2
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 claims description 2
- HEBKCHPVOIAQTA-ZXFHETKHSA-N ribitol Chemical compound OC[C@H](O)[C@H](O)[C@H](O)CO HEBKCHPVOIAQTA-ZXFHETKHSA-N 0.000 claims description 2
- 239000000600 sorbitol Substances 0.000 claims description 2
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 claims description 2
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 claims description 2
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 claims description 2
- 239000000811 xylitol Substances 0.000 claims description 2
- 235000010447 xylitol Nutrition 0.000 claims description 2
- HEBKCHPVOIAQTA-SCDXWVJYSA-N xylitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)CO HEBKCHPVOIAQTA-SCDXWVJYSA-N 0.000 claims description 2
- 229960002675 xylitol Drugs 0.000 claims description 2
- KCOPAESEGCGTKM-UHFFFAOYSA-N 1,3-oxazol-4-one Chemical compound O=C1COC=N1 KCOPAESEGCGTKM-UHFFFAOYSA-N 0.000 claims 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 claims 1
- WDQFELCEOPFLCZ-UHFFFAOYSA-N 1-(2-hydroxyethyl)pyrrolidin-2-one Chemical compound OCCN1CCCC1=O WDQFELCEOPFLCZ-UHFFFAOYSA-N 0.000 claims 1
- WQZGKKKJIJFFOK-VSOAQEOCSA-N L-altropyranose Chemical compound OC[C@@H]1OC(O)[C@H](O)[C@@H](O)[C@H]1O WQZGKKKJIJFFOK-VSOAQEOCSA-N 0.000 claims 1
- NKAWWXQVDJITSK-UHFFFAOYSA-M ethyl-(hydroxymethyl)-dimethylazanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)CO NKAWWXQVDJITSK-UHFFFAOYSA-M 0.000 claims 1
- JEUXZUSUYIHGNL-UHFFFAOYSA-N n,n-diethylethanamine;hydrate Chemical compound O.CCN(CC)CC JEUXZUSUYIHGNL-UHFFFAOYSA-N 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 9
- 239000000758 substrate Substances 0.000 abstract description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 abstract description 3
- 239000010949 copper Substances 0.000 abstract description 3
- 238000005530 etching Methods 0.000 abstract description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 description 10
- 230000007797 corrosion Effects 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- 230000005764 inhibitory process Effects 0.000 description 3
- 239000004005 microsphere Substances 0.000 description 3
- 229910052755 nonmetal Inorganic materials 0.000 description 3
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 description 1
- FFBLUEIOOLOTJD-UHFFFAOYSA-N 3-ethyl-1-hydroxypyrrolidin-2-one Chemical compound CCC1CCN(O)C1=O FFBLUEIOOLOTJD-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Substances C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- JAJRRCSBKZOLPA-UHFFFAOYSA-M triethyl(methyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(CC)CC JAJRRCSBKZOLPA-UHFFFAOYSA-M 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
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Abstract
本發明公開了一種低蝕刻性的適用與較厚光阻清洗的清洗液及其清洗方法。這種低蝕刻性的光阻清洗液含有季銨氫氧化物，醇胺，C4-C6多元醇以及溶劑。這種低蝕刻性的光阻清洗劑能夠高效的去除半導體晶圓上的光阻，同時對於基材基本沒有攻擊如金屬鋁、銅等，在半導體晶圓清洗等領域具有良好的應用前景。
Description
本發明涉及一種去除光阻的清洗液。
在通常的半導體製造工藝中，通過在一些材料的表面上形成光阻的掩膜，曝光後進行圖形轉移，在得到需要的圖形之後，進行下一道工序之前，需要剝去殘留的光阻。在這個過程中要求完全除去不需要的光阻，同時不能腐蝕任何基材。例如，在晶圓微球植入工藝(bumping technology)中，需要光阻形成掩膜，該掩膜在微球成功植入後同樣需要去除，但由於該光阻較厚，完全去除常較為困難。改善去除效果較為常用的方法是採用延長浸泡時間、提高浸泡溫度和採用更富有攻擊性的溶液，但這常會造成晶片基材的腐蝕和微球的腐蝕，從而導致晶片良率的顯著降低。
目前，光阻清洗液主要由極性有機溶劑、強鹼和/或水等組成，通過將半導體晶片浸入清洗液中或者利用清洗液沖洗半導體晶片，去除半導體晶片上的光阻。如WO2006/056298A1利用由四甲基氫氧化銨(TMAH)、二甲基
亞碸(DMSO)，乙二醇(EG)和水組成鹼性清洗液，用於清洗銅基板的光阻，同時對金屬銅基本無腐蝕，但其對金屬鋁有腐蝕；又例如US5529887由氫氧化鉀(KOH)、烷基二醇單烷基醚、水溶性氟化物和水等組成鹼性清洗液，將晶片浸入該清洗液中，在40~90℃下除去金屬和電介質基材上的厚膜光阻。其對半導體晶片基材的腐蝕較高。
由此可見，尋找更為有效抑制金屬腐蝕抑制方法和高效的光阻去除能力是該類光阻清洗液努力改進的優先方向。
為了解決上述技術問題，本發明提供了一種可以對厚膜光阻清洗能力強且對半導體晶片圖案和基材腐蝕性較低的光阻清洗劑。該清洗液可以解決的技術問題就是現有的厚膜光阻清洗液存在的清洗能力不足或者對半導體晶片圖案和基材腐蝕性較強的缺陷。
本發明解決上述技術問題所採用的技術方案是提供一種用於光阻清洗的清洗液，該清洗液包含季銨氫氧化物，醇胺，C4-C6多元醇以及溶劑。
其中，季銨氫氧化物包括四甲基氫氧化銨、四乙基氫氧化銨、四丙基氫氧化銨、四丁基氫氧化銨、甲基三乙基氫氧化銨和羥乙基三甲基氫氧化銨等中的一種或者幾種。
其中，醇胺為單乙醇胺、二乙醇胺、三乙醇胺、正丙醇胺、異丙醇胺、2-(二乙氨基)乙醇、乙基二乙醇胺和二甘醇胺中的一種或幾種。醇胺的存在有利於提高季銨氫氧化物的
溶解度。
其中，C4-C6多元醇為選自蘇阿糖、阿拉伯糖、木糖、核糖、核酮糖、木酮糖、葡萄糖、甘露糖、半乳糖、塔格糖、阿洛糖、阿卓糖、艾杜糖、塔羅糖、山梨糖、阿洛酮糖、果糖、蘇糖醇、赤蘚醇、核糖醇、阿拉伯糖醇、木糖醇、塔羅糖醇、山梨醇、甘露醇、艾杜糖醇和半乳糖醇中的一種或者幾種。
其中，溶劑可選自亞碸、碸、咪唑烷酮、咪唑啉酮、吡咯烷酮、醇醚、醯胺中的一種或多種。其中，所述的亞碸較佳的為二甲基亞碸；所述的碸較佳的為環丁碸；所述的咪唑烷酮較佳的為1,3-二甲基-2-咪唑烷酮；所述的咪唑啉酮較佳的為1,3-二甲基-2-咪唑啉酮；所述的吡咯烷酮較佳的為N-甲基吡咯烷酮、N-乙基吡咯烷酮、N-羥乙基吡咯烷酮和N-環己基吡咯烷酮；所述的醯胺較佳的為二甲基甲醯胺、二甲基乙醯胺；所述的醇醚較佳的為乙二醇醚和丙二醇醚；所述的乙二醇醚較佳的為二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚；所述的丙二醇醚較佳的為二丙二醇單甲醚、二丙二醇單乙醚。
其中，季銨氫氧化物的含量為0.1-10wt%(質量百分比)，醇胺的含量為0.1-30wt%，C4-C6多元醇的含量為0.1-10wt%，溶劑的含量為45-95wt%。
上述清洗液還可進一步含有水。水的存在有利於丙烯酸樹脂類光阻去除。含量為0.1-10wt%。
本發明中的低蝕刻性光阻清洗液，可以在25℃至90℃下
清洗光阻。具體方法如下：將含有光阻的晶片浸入本發明中的低蝕刻性的光阻清洗劑，在25℃至90℃下浸泡合適的時間後，取出洗滌後用高純氮氣吹乾。
本發明所具有的技術效果在於：本發明的清洗液具有光阻去除能力強；對金屬和非金屬的腐蝕抑制能力強；具有較大的操作空間。
下面通過具體實施例進一步闡述本發明的優點，但本發明的保護範圍不僅僅局限於下述實施例。
按照表1和表2中各實施例以及對比實施例的成分及其比例配製拋光液，混合均勻。
為了進一步考察該類清洗液的清洗情況，本發明採用了如下技術手段：即將含有光阻的晶片浸入清洗劑中，在25~90℃下利用恒溫振盪器以約60轉/分的振動頻率振盪5~60分鐘，然後經去離子水洗滌後用高純氮氣吹乾。光阻的清洗效果和清洗液對晶片的腐蝕情況如表3所示。
從表3可以看出，本發明的清洗液對光阻具有良好的清洗效果，使用溫度範圍廣。另外實施例與對比例的比較可以看出，本發明特定的季銨氫氧化合物，醇胺，溶劑以及水之間具有協同作用，本發明所公開的清洗液對金屬和非金屬基板等有較好的腐蝕抑制作用，光阻去除能力強。
綜上，本發明的積極進步效果在於：本發明的清洗液具有光阻去除能力強；對金屬和非金屬的腐蝕抑制能力強；具有較大的操作空間。
應當理解的是，本發明所述wt%均指的是質量百分比含量。
以上對本發明的具體實施例進行了詳細描述，但其只是作為範例，本發明並不限制於以上描述的具體實施例。對於本領域技術人員而言，任何對本發明進行的等同修改和替代也都在本發明的範疇之中。因此，在不脫離本發明的精神和
範圍下所作的均等變換和修改，都應涵蓋在本發明的範圍內。
Claims (13)
- 一種去除光阻的清洗液，包含季銨氫氧化物、醇胺、C4-C6多元醇及溶劑。
- 如請求項1所述的清洗液，其中所述的季銨氫氧化物選自四甲基氫氧化銨、四乙基氫氧化銨、四丙基氫氧化銨、四丁基氫氧化銨、甲基三乙基氫氧化銨和羥乙基三甲基氫氧化銨等中的一種或多種。
- 如請求項1所述的清洗液，其中所述的醇胺選自單乙醇胺、二乙醇胺、三乙醇胺、正丙醇胺、異丙醇胺、2-(二乙氨基)乙醇、乙基二乙醇胺和二甘醇胺中的一種或多種。
- 如請求項1所述的清洗液，其中所述的C4-C6多元醇選自蘇阿糖、阿拉伯糖、木糖、核糖、核酮糖、木酮糖、葡萄糖、甘露糖、半乳糖、塔格糖、阿洛糖、阿卓糖、艾杜糖、塔羅糖、山梨糖、阿洛酮糖、果糖、蘇糖醇、赤蘚醇、核糖醇、阿拉伯糖醇、木糖醇、塔羅糖醇、山梨醇、甘露醇、艾杜糖醇和半乳糖醇中的一種或多種。
- 如請求項1所述的清洗液，其中所述的溶劑選自亞碸、碸、咪唑烷酮、咪唑啉酮、吡咯烷酮、醇醚、醯胺中的一種或多種。
- 如請求項5所述的清洗液，其中所述的亞碸較佳的為二甲基亞碸；所述的碸較佳的為環丁碸；所述的咪唑烷酮較佳的為1,3-二甲基-2-咪唑烷酮；所述的咪 唑啉酮較佳的為1,3-二甲基-2-咪唑啉酮；所述的吡咯烷酮較佳的為N-甲基吡咯烷酮、N-乙基吡咯烷酮、N-羥乙基吡咯烷酮和N-環己基吡咯烷酮；所述的醯胺較佳的為二甲基甲醯胺、二甲基乙醯胺；所述的醇醚較佳的為乙二醇醚和丙二醇醚；所述的乙二醇醚較佳的為二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚；所述的丙二醇醚較佳的為二丙二醇單甲醚、二丙二醇單乙醚中的一種或多種。
- 如請求項1所述的清洗液，其中所述的季銨氫氧化物的含量為0.1-10wt%。
- 如請求項1所述的清洗液，其中所述的醇胺的含量為0.1-30wt%。
- 如請求項1所述的清洗液，其中所述的C4-C6多元醇的含量為0.1-10wt%。
- 如請求項1所述的清洗液，其中所述的溶劑的含量為45-95wt%。
- 如請求項1所述的清洗液，其中所述的清洗液包括去離子水。
- 如請求項11所述的清洗液，其中所述的去離子水的含量為0.1-10wt%。
- 一種使用如請求項1所述的清洗液清洗光阻的方法。
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI714010B (zh) * | 2018-03-07 | 2020-12-21 | 美商慧盛材料美國責任有限公司 | 光阻剝除劑 |
| TWI795433B (zh) * | 2018-01-04 | 2023-03-11 | 南韓商三星電機股份有限公司 | 用於移除乾膜光阻的剝離組成物及使用所述組成物的剝離方法 |
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| CN105527803B (zh) * | 2014-09-29 | 2020-08-18 | 安集微电子（上海）有限公司 | 一种光刻胶清洗液 |
| CN105807577B (zh) * | 2014-12-29 | 2020-08-18 | 安集微电子科技（上海）股份有限公司 | 一种光阻残留物清洗液 |
| CN106292207B (zh) * | 2015-06-10 | 2021-06-25 | 安集微电子科技（上海）股份有限公司 | 一种光阻残留物清洗液 |
| CN105505630A (zh) * | 2015-12-07 | 2016-04-20 | 苏州市晶协高新电子材料有限公司 | 一种半导体工艺中用的表面处理剂及方法 |
| CN108255027B (zh) * | 2016-12-28 | 2024-04-12 | 安集微电子（上海）有限公司 | 一种光刻胶清洗液 |
| CN109445256A (zh) * | 2018-12-14 | 2019-03-08 | 江苏艾森半导体材料股份有限公司 | 新型光刻胶去胶液 |
| CN110806683A (zh) * | 2019-11-25 | 2020-02-18 | 深圳市伯斯特科技有限公司 | 一种半导体光刻胶清洗剂 |
| CN115820351A (zh) * | 2022-12-19 | 2023-03-21 | 芯越微电子材料(嘉兴)有限公司 | 半导体晶圆基底清洗液组合物及其使用方法 |
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| US6440326B1 (en) * | 1998-08-13 | 2002-08-27 | Mitsubishi Gas Chemical Company, Inc. | Photoresist removing composition |
| US7923423B2 (en) * | 2005-01-27 | 2011-04-12 | Advanced Technology Materials, Inc. | Compositions for processing of semiconductor substrates |
| CN101286016A (zh) * | 2007-04-13 | 2008-10-15 | 安集微电子（上海）有限公司 | 低蚀刻性光刻胶清洗剂 |
| CN101578341A (zh) * | 2008-01-07 | 2009-11-11 | 巴斯夫欧洲公司 | 有机涂膜剥离用组合物及剥离有机涂膜的方法 |
| CN101750914A (zh) * | 2008-12-05 | 2010-06-23 | 安集微电子（上海）有限公司 | 一种光刻胶清洗剂组合物 |
| CN102338994B (zh) * | 2010-07-23 | 2014-12-31 | 安集微电子（上海）有限公司 | 一种光刻胶的清洗液 |
| CN102141743A (zh) * | 2010-08-25 | 2011-08-03 | 上海飞凯光电材料股份有限公司 | 具有金属保护的光刻胶剥离液组合物 |
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| TWI795433B (zh) * | 2018-01-04 | 2023-03-11 | 南韓商三星電機股份有限公司 | 用於移除乾膜光阻的剝離組成物及使用所述組成物的剝離方法 |
| TWI714010B (zh) * | 2018-03-07 | 2020-12-21 | 美商慧盛材料美國責任有限公司 | 光阻剝除劑 |
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