WO2014045798A1 - アルミニウム膜の製造方法 - Google Patents
アルミニウム膜の製造方法 Download PDFInfo
- Publication number
- WO2014045798A1 WO2014045798A1 PCT/JP2013/072554 JP2013072554W WO2014045798A1 WO 2014045798 A1 WO2014045798 A1 WO 2014045798A1 JP 2013072554 W JP2013072554 W JP 2013072554W WO 2014045798 A1 WO2014045798 A1 WO 2014045798A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- aluminum
- aluminum film
- phenanthroline
- component
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/42—Electroplating: Baths therefor from solutions of light metals
- C25D3/44—Aluminium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
Definitions
- the present invention relates to an aluminum film production method capable of producing an aluminum film having excellent surface smoothness and a mirror surface.
- Aluminum has many excellent features such as conductivity, corrosion resistance, light weight, and non-toxicity, and is widely used for plating metal products. However, since aluminum has a high affinity for oxygen and a lower oxidation-reduction potential than hydrogen, it is difficult to perform electroplating in an aqueous plating bath.
- Patent Document 1 discloses an organic chloride salt such as 1-ethyl-3-methylimidazolium chloride (EMIC) or 1-butylpyridinium chloride (BPC) and a chloride. It is described that aluminum (AlCl 3 ) is mixed to form a liquid aluminum plating bath at room temperature, and aluminum is electroplated on the surface of the resin molded body using this plating bath.
- EMIC 1-ethyl-3-methylimidazolium chloride
- BPC 1-butylpyridinium chloride
- Patent Document 1 discloses that a smooth aluminum film can be formed by adding 1,10-phenanthroline to the aluminum plating solution so as to have a concentration of 0.25 g / L to 7.0 g / L. Are listed.
- an aluminum porous body manufactured by the method described in Patent Document 1 is very promising, for example, for improving the capacity of a positive electrode of a lithium ion battery.
- aluminum has excellent characteristics such as conductivity, corrosion resistance, and light weight
- an aluminum foil whose surface is coated with an active material such as lithium cobaltate is used as a positive electrode of a lithium ion battery.
- the positive electrode With a porous body made of aluminum, the surface area can be increased and the active material can be filled inside the aluminum. Thereby, even if the electrode is thickened, the utilization factor of the active material is not reduced, the utilization factor of the active material per unit area is improved, and the capacity of the positive electrode can be improved.
- the aluminum porous body having a three-dimensional network structure is very useful, and the present inventors have studied to continuously manufacture the aluminum porous body in large quantities.
- a very good porous aluminum body can be obtained by the method described in Patent Document 1, the smoothness of the aluminum film may be lowered if continuous production is continued, and the plating solution is replaced with a new one. There was a case where it was necessary.
- an object of the present invention is to provide a method for producing an aluminum film capable of continuously producing a large amount of an aluminum film having excellent surface smoothness and a mirror surface.
- 1,10-phenanthroline monohydrate is effective for the smoothness of the plated film.
- Anhydrous 1,10-phenanthroline is partially hydrated by moisture in the atmosphere, and it is difficult to obtain 1,10-phenanthroline consisting of only anhydride. Therefore, even when anhydrous 1,10-phenanthroline is added, 1,10-phenanthroline monohydrate is also mixed in the plating solution.
- the smoothness of the film surface decreased because the monohydrate contained in the anhydrous 1,10-phenanthroline was consumed by continuous operation. This is considered to be caused by a decrease in the concentration of 1,10-phenanthroline monohydrate in the plating solution.
- a method for producing an aluminum film in which aluminum is electrodeposited on a substrate surface in an electrolyte solution The electrolyte is (A) an aluminum halide; (B) any one or more compounds selected from the group consisting of alkylpyridinium halides, alkylimidazolium halides, and urea compounds; (C) 1,10-phenanthroline monohydrate; As an ingredient, The mixing ratio of the component (A) and the component (B) is in the range of 1: 1 to 3: 1 by molar ratio, A method for producing an aluminum film, wherein the concentration of the 1,10-phenanthroline monohydrate in the electrolytic solution is controlled to be in a range of 0.05 g / L to 7.5 g / L.
- the concentration of 1,10-phenanthroline monohydrate in the electrolyte solution was adjusted by adjusting the amount of 1,10-phenanthroline monohydrate added to the electrolyte solution so that the measured value of the overvoltage was within a set range.
- the present invention it is possible to provide a method for producing an aluminum film capable of continuously producing a large amount of an aluminum film having excellent surface smoothness and a mirror surface.
- a method for producing an aluminum film according to the present invention is a method for producing an aluminum film in which aluminum is electrodeposited on a substrate surface in an electrolytic solution, and the electrolytic solution comprises (A) an aluminum halide and (B) an alkyl. Containing at least one compound selected from the group consisting of pyridinium halides, alkylimidazolium halides, and urea compounds, and (C) 1,10-phenanthroline monohydrate as components,
- the mixing ratio of the component (B) and the component (B) is in the range of 1: 1 to 3: 1, and the concentration of the 1,10-phenanthroline monohydrate in the electrolyte is 0.05 g / L or more. And 7.5 g / L or less.
- the electrolytic solution used in the present invention is obtained by mixing at least the component (A), the component (B), and the component (C).
- each component will be specifically described.
- the aluminum halide as the component (A) can be favorably used as long as it forms a molten salt at about 110 ° C. or less when mixed with the component (B).
- aluminum chloride (AlCl 3 ), aluminum bromide (AlBr 3 ), aluminum iodide (AlI 3 ) and the like can be mentioned.
- aluminum chloride is most preferable.
- the (B) component alkylpyridinium halide a compound that forms a molten salt at about 110 ° C. or less when mixed with the (A) component can be used favorably.
- examples thereof include 1-butylpyridinium chloride (BPC), 1-ethylpyridinium chloride (EPC), 1-butyl-3-methylpyridinium chloride (BMPC), etc.
- BPC 1-butylpyridinium chloride
- EPC 1-ethylpyridinium chloride
- BMPC 1-butyl-3-methylpyridinium chloride
- 1-butylpyridinium chloride is most preferable.
- alkyl imidazolium halide of the component (B) those that form a molten salt at about 110 ° C. or less when mixed with the component (A) can be used favorably.
- imidazolium chloride having an alkyl group (1 to 5 carbon atoms) at the 1,3 position imidazolium chloride having an alkyl group (1 to 5 carbon atoms) at the 1,2,3 position, 1,3 position
- imidazolium ioside having an alkyl group (having 1 to 5 carbon atoms).
- EMIC 1-ethyl-3-methylimidazolium chloride
- BMIC 1-butyl-3-methylimidazolium chloride
- MPIC 1-methyl-3-propylimidazolium chloride
- EMIC 1-ethyl-3-methylimidazolium chloride
- the urea compound of the component (B) means urea and derivatives thereof, and those that form a molten salt at about 110 ° C. or less when mixed with the component (A) can be used favorably.
- a compound represented by the following formula (1) can be preferably used.
- R represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, which may be the same or different.
- urea and dimethylurea can be particularly preferably used.
- an aluminum film is formed on the surface of the base material by adjusting a mixing ratio of the component (A) and the component (B) in a molar ratio of 1: 1 to 3: 1.
- An electrolyte suitable for electrodeposition is obtained.
- the molar ratio of the component (A) is less than 1 when the component (B) is 1, no aluminum electrodeposition reaction occurs.
- the molar ratio of the component (A) is more than 3 when the component (B) is 1, aluminum chloride is precipitated in the electrolytic solution and taken into the aluminum film, resulting in deterioration of the film quality. To do.
- the surface of the aluminum film formed on the surface of the base material is smoothed to be mirror-like. be able to.
- the surface of the aluminum film being mirror-like means that the arithmetic average roughness Ra of the aluminum film surface measured by a laser microscope is 0.10 ⁇ m or less.
- the concentration of 1,10-phenanthroline monohydrate in the electrolyte is 0.05 g / L or more, a mirror-like aluminum film having excellent smoothness can be obtained.
- the stress remaining on the surface of the aluminum film increases and the adhesion between the aluminum film and the substrate decreases, or the aluminum film cracks.
- the concentration of 1,10-phenanthroline monohydrate in the electrolytic solution may be 0.05 g / L or more and 7.5 g / L or less.
- an aluminum film with excellent smoothness can be obtained when the concentration of 1,10-phenanthroline monohydrate in the electrolyte is within the above range, but an optimal concentration range should be selected according to the type of substrate. Is preferred.
- the concentration range is preferably set to a range of 0.1 g / L or more and 2.0 g / L or less.
- the substrate is a resin molded body having a three-dimensional network structure, aluminum having good appearance and mechanical properties by setting the concentration range to a range of 0.1 g / L or more and 2.0 g / L or less.
- the range be 0.3 g / L or more and 1.0 g / L or less.
- 1,10-phenanthroline monohydrate is taken in when aluminum is electrodeposited on the surface of the substrate, the concentration of 1,10-phenanthroline monohydrate in the electrolytic solution decreases as the operation continues. Therefore, it is necessary to add 1,10-phenanthroline monohydrate to the electrolytic solution as appropriate and control the concentration to be within the above range.
- an overvoltage when aluminum is deposited in the electrolytic solution is measured, and the measured value of the overvoltage falls within a set range. It is preferable to adopt a method of controlling the concentration of the 1,10-phenanthroline monohydrate in the electrolyte by adjusting the amount of 1,10-phenanthroline monohydrate added to the electrolyte. Since there is a correlation between the concentration of 1,10-phenanthroline monohydrate in the electrolyte and the overvoltage of the aluminum precipitation reaction, the measured value of the overvoltage falls within a predetermined range although it is indirect. Thus, by adjusting the amount of 1,10-phenanthroline monohydrate added to the electrolyte solution, the concentration of 1,10-phenanthroline monohydrate in the electrolyte solution can be controlled.
- the overvoltage may be appropriately set in accordance with the composition of the electrolytic solution.
- the electrolytic solution may be aluminum chloride, 1-ethyl-3-methylimidazolium chloride, 1,10-phenanthroline monohydrate.
- overvoltage should just be 105 mV or more and 170 mV or less.
- the overvoltage may be set to 120 mV or more and 180 mV or less.
- the measurement of the overvoltage may be performed continuously or periodically at intervals. Further, when measuring the overvoltage, the electrolyte solution may be taken out from the system and measured, or may be measured by providing an electrode in the electrolyte solution in the plating tank in which the aluminum film is manufactured. .
- the overvoltage means an absolute value of a difference between a theoretical precipitation potential of aluminum and a potential at which aluminum precipitation actually starts. In order to measure this overvoltage, first, an anode and a cathode are provided in the electrolytic solution, and a voltage is applied between both electrodes to measure a potential at which aluminum begins to precipitate, that is, a potential at which a current begins to flow.
- a potential difference between the potential at this time and a theoretical potential (equilibrium electrode potential) based on aluminum may be obtained as an overvoltage.
- aluminum may be used for the anode, and platinum, glassy carbon, or the like may be used for the cathode.
- 1,10-phenanthroline includes monohydrate and anhydride.
- the concentration of 1,10-phenanthroline monohydrate in the electrolytic solution is 0.05 g / L or more, 7.5 g / L. Control is performed so that it falls within the following range, but as long as it is within the concentration range of 1,10-phenanthroline monohydrate, 1,10-phenanthroline anhydride may be contained in the electrolytic solution.
- the ratio of 1,10-phenanthroline monohydrate is 1% by mass or more and 100% by mass or less with respect to the total amount of 1,10-phenanthroline monohydrate and 1,10-phenanthroline anhydride. What is necessary is just to do it, 10 mass% or more and 60 mass% or less are more preferable, and 20 mass% or more and 30 mass% or less are still more preferable.
- the electrolyte solution may contain additives in addition to the components (A), (B), and (C).
- the electrolytic solution contains any one or more selected from the group consisting of an organic solvent, a nitrogen-containing heterocyclic compound, and a sulfur-containing heterocyclic compound as a brightening agent, the surface gloss of the aluminum film is increased. It is possible to increase.
- the concentration of the brightener in the electrolytic solution is preferably in the range of 0.01 g / L to 10.0 g / L, more preferably 0.5 g / L to 7.5 g / L. More preferably, it is 2.5 g / L or more and 5.0 g / L or less.
- the organic solvent for example, benzene, xylene, toluene, tetralin and the like can be preferably used.
- the nitrogen-containing heterocyclic compound is preferably a compound having 3 to 14 carbon atoms.
- benzotriazole, pyridine, pyrazine, bipyridine and the like can be preferably used.
- sulfur-containing heterocyclic compound for example, thiourea, ethylenethiourea, phenothiazine and the like can be preferably used.
- the temperature of the electrolytic solution is more preferably 30 ° C. or more and 60 ° C. or less, and further preferably 40 ° C. or more and 50 ° C. or less.
- an aluminum electrode (anode) is provided in the electrolytic solution, and the substrate in the electrolytic solution becomes a cathode. As long as it is electrically connected, it may be energized. At this time, it is preferable to deposit aluminum on the surface of the base material so that the current density is 2.0 A / dm 2 or more and 10.0 A / dm 2 or less. When the current density is within the above range, an aluminum film having better smoothness can be obtained.
- the current density is more preferably 2.0 A / dm 2 or more and 6.0 A / dm 2 or less, and further preferably 2.5 A / dm 2 or more and 4.0 A / dm 2 or less.
- the electrolytic solution when electrodepositing aluminum on the substrate surface, the electrolytic solution may be stirred or may not be stirred.
- the substrate is not particularly limited as long as it has an application for forming an aluminum film on the surface.
- a copper plate, a steel strip, a copper wire, a steel wire, a resin subjected to a conductive treatment, or the like can be used as the substrate.
- a resin subjected to the conductive treatment for example, polyurethane, melamine resin, polypropylene, polyethylene or the like subjected to the conductive treatment can be used.
- the resin as the substrate may have any shape, but by using a resin molded body having a three-dimensional network structure, finally, various filters, catalyst carriers, battery electrodes, etc.
- An aluminum porous body having a three-dimensional network structure that exhibits excellent properties for use can be produced, which is preferable.
- an aluminum porous body having a porous structure can be finally produced by using a resin having a nonwoven fabric shape, and the thus produced aluminum porous body having a nonwoven fabric shape is also used for various filters and catalysts. It can be preferably used for applications such as carriers and battery electrodes.
- the resin molded body having the three-dimensional network structure for example, a foamed resin molded body produced using polyurethane, melamine resin or the like can be used.
- a resin molded body having an arbitrary shape can be selected as long as it has continuous pores (continuous vent holes).
- a porous body having a three-dimensional network structure is also simply referred to as a “porous body”.
- the porosity of the porous body is preferably 80% to 98%, and the pore diameter is preferably 50 ⁇ m to 500 ⁇ m.
- the foamed urethane and the foamed melamine resin have high porosity, and have excellent porosity and thermal decomposability, so that they can be preferably used as foamed resin moldings.
- Foamed urethane is preferable in terms of pore uniformity and availability, and a foamed melamine resin is preferable in that a product having a small pore diameter can be obtained.
- foamed resin moldings such as foamed urethane and foamed melamine resin often have residues such as foaming agents and unreacted monomers in the foaming process, it is preferable to perform a cleaning treatment.
- the resin molded body having the three-dimensional network structure is subjected to a conductive treatment.
- the conductive treatment of the resin surface can be selected including known methods.
- a method of forming a metal layer such as nickel by electroless plating or a vapor phase method, or forming a metal or carbon layer by a conductive paint can be used.
- the conductivity of the resin surface can be increased.
- it is somewhat inferior from the viewpoint of electrical conductivity it is possible to make the resin surface conductive by carbon coating without introducing any metal other than aluminum into the aluminum structure after forming the aluminum film. It becomes possible to manufacture the structure which consists of. There is also an advantage that it can be made conductive at low cost.
- a carbon paint as a conductive paint is prepared.
- the suspension as the carbon paint preferably contains a binder, a dispersant and a dispersion medium in addition to the carbon particles.
- the suspension needs to maintain a uniform suspended state.
- the suspension is preferably maintained at 20 ° C. to 40 ° C. By maintaining the temperature of the suspension at 20 ° C. or higher, a uniform suspension can be maintained, and only the binder is concentrated on the surface of the skeleton forming the porous network structure to form a layer.
- the carbon particles can be uniformly applied.
- the particle size of the carbon particles is 0.01 to 5 ⁇ m, preferably 0.01 to 0.5 ⁇ m. If the particle size is large, the pores of the porous resin molded body may be clogged or smooth plating may be hindered. If it is too small, it is difficult to ensure sufficient conductivity.
- Example 1 (Electrolyte) A molten salt was prepared by mixing aluminum chloride (AlCl 3 ) and 1-ethyl-3-methylimidazolium chloride (EMIC) in a molar ratio of 2: 1. To this molten salt, 1,10-phenanthroline monohydrate was added to a concentration of 3.0 g / L to obtain an electrolytic solution.
- AlCl 3 aluminum chloride
- EMIC 1-ethyl-3-methylimidazolium chloride
- An aluminum electrode (anode) and a platinum electrode (cathode) are provided in the electrolyte to measure the overvoltage, and 1,10-phenanthroline monohydrate is appropriately electrolyzed so that the overvoltage is in the range of 105 mV to 170 mV. Added to the solution to control the concentration of 1,10-phenanthroline monohydrate.
- Example 2 An aluminum film was produced in the same manner as in Example 1 except that a resin molded body having a three-dimensional network structure subjected to electrical conductivity treatment was used as the base material.
- the resin molding foamed urethane (100 mm ⁇ 30 mm square) having a thickness of 1 mm, a porosity of 95%, and a pore number (number of cells) per inch of about 50 was used.
- the conductive treatment was performed by immersing urethane foam in a carbon suspension and drying.
- the components of the carbon suspension include 25% graphite and carbon black, and include a resin binder, a penetrating agent, and an antifoaming agent.
- the particle size of carbon black was 0.5 ⁇ m.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Automation & Control Theory (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Cell Electrode Carriers And Collectors (AREA)
Description
なお、無水物の1,10-フェナントロリンは大気中の水分によっても一部が水和されてしまうため、無水物のみからなる1,10-フェナントロリンを得ることが困難である。このため、無水物の1,10-フェナントロリンを添加した場合においても、めっき液中には1,10-フェナントロリン一水和物も混入する。従来の方法で連続的にアルミニウム膜を製造し続けた場合に膜表面の平滑性が低下したのは、無水物の1,10-フェナントロリンに含まれていた一水和物が連続操業によって消費され、めっき液中の1,10-フェナントロリン一水和物の濃度が低下したことが原因であると考えられる。また、得られるアルミニウム膜の平滑性が低下した状態のめっき液を用いて更に連続的にアルミニウム膜を製造した場合、めっき液中の1,10-フェナントロリン濃度が変化しないことから、1,10-フェナントロリン無水物については通電によって消費されず、めっき液中に蓄積すると考えられる。
(1)電解液中で基材表面にアルミニウムを電着させるアルミニウム膜の製造方法であって、
前記電解液は、
(A)アルミニウムハロゲン化物と、
(B)アルキルピリジニウムハロゲン化物、アルキルイミダゾリウムハロゲン化物及び尿素化合物からなる群より選択されるいずれか1種以上の化合物と、
(C)1,10-フェナントロリン一水和物と、
を成分として含み、
前記(A)成分と前記(B)成分の混合比はモル比で1:1~3:1の範囲にあり、
前記電解液における前記1,10-フェナントロリン一水和物の濃度を0.05g/L以上、7.5g/L以下の範囲になるように制御するアルミニウム膜の製造方法。
上記(1)に記載のアルミニウム膜の製造方法によれば、表面平滑性に優れ鏡面を有するアルミニウム膜を連続的に大量に製造することが可能となる。
(2)前記電解液におけるアルミニウムの析出による過電圧を測定して、
前記過電圧の測定値が設定範囲内になるように前記電解液への1,10-フェナントロリン一水和物の添加量を調整して前記電解液における前記1,10-フェナントロリン一水和物の濃度を制御する上記(1)に記載のアルミニウム膜の製造方法。
上記(2)に記載の発明によれば、電解液中の1,10-フェナントロリン一水和物の濃度を知ることができるため、電解液中の1,10-フェナントロリン一水和物の濃度を容易に制御することが可能となる。
(3)前記(A)成分が塩化アルミニウムであり、かつ前記(B)成分が1-エチル-3-メチルイミダゾリウムクロリドである上記(1)又は(2)に記載のアルミニウム膜の製造方法。
上記(3)に記載の発明によれば、より表面平滑性に優れたアルミニウム膜を連続的に大量に得ることができる。
(4)前記基材が、導電化処理された三次元網目構造を有する樹脂成形体である上記(1)~(3)のいずれか一項に記載のアルミニウム膜の製造方法。
上記(4)に記載の発明によれば、三次元網目構造を有する樹脂成形体の表面に平滑性に優れたアルミニウム膜を連続的に形成することができる。これにより得られる三次元網目構造を有する樹脂構造体から、リチウムイオン電池の正極等に利用可能なアルミニウム多孔体を得ることができる。
例えば、下記式(1)で表される化合物を好ましく用いることができる。
前記尿素化合物は上記の中でも、尿素、ジメチル尿素を特に好ましく用いることができる。
前記(B)成分を1とした場合の前記(A)成分のモル比が1未満の場合にはアルミニウムの電析反応が生じない。また、前記(B)成分を1とした場合の前記(A)成分のモル比が3を超える場合には、電解液中に塩化アルミニウムが析出し、アルミニウム膜に取り込まれ、膜の品質が低下する。
なお、本発明においてアルミニウム膜の表面が鏡面状であるとは、レーザー顕微鏡により測定されるアルミニウム膜表面の算術平均粗さRaが0.10μm以下であることをいう。
なお、過電圧とは、アルミニウムの理論析出電位と、実際にアルミニウムの析出が開始する電位との差の絶対値のことをいう。この過電圧を測定するには、まず、前記電解液中に陽極と陰極とを設け、両極間に電圧を印加してアルミニウムが析出し始める電位、即ち、電流が流れ始める電位を測定する。そして、この時の電位と、アルミニウムを基準とした理論電位(平衡電極電位)との電位差を過電圧として求めればよい。なお、前記陽極にはアルミニウムを使用し、前記陰極には例えば、白金、グラッシーカーボン等を使用すればよい。
前記含窒素複素環化合物としては、炭素原子数が3個~14個の範囲内の化合物が好ましく、例えば、ベンゾトリアゾール、ピリジン、ピラジン、ビピリジン等を好ましく用いることができる。
前記硫黄含有複素環化合物としては、例えば、チオ尿素、エチレンチオ尿素、フェノチアジン等を好ましく用いることができる。
このとき、電流密度が2.0A/dm2以上、10.0A/dm2以下となるようにして基材表面にアルミニウムを電着させることが好ましい。電流密度が前記範囲内にあることにより、より平滑性に優れたアルミニウム膜を得ることができる。前記電流密度は、2.0A/dm2以上、6.0A/dm2以下であることがより好ましく、2.5A/dm2以上、4.0A/dm2以下であることが更に好ましい。
なお、以下では三次元網目状構造の多孔体を単に「多孔体」とも記載する。
気孔率=(1-(多孔質材の重量[g]/(多孔質材の体積[cm3]×素材密度)))×100[%]
また、気孔径は、樹脂成形体表面を顕微鏡写真等で拡大し、1インチ(25.4mm)あたりの気孔数をセル数として計数して、平均孔径=25.4mm/セル数として平均的な値を求める。
無電解めっきや気相法により樹脂表面に金属層を形成することにより、樹脂表面の導電率を高くすることができる。一方、導電率の観点からは多少劣るが、カーボン塗布による樹脂表面の導電化は、アルミニウム膜形成後のアルミニウム構造体にアルミニウム以外の金属を混入することなくできることから、金属として実質的にアルミニウムのみからなる構造体を製造することが可能となる。また安価に導電化できる利点もある。
前記三次元網目状構造を有する樹脂成形体を使用する場合に、多孔体中にカーボン粒子の塗布を均一に行うには、懸濁液が均一な懸濁状態を維持している必要がある。そのためには、懸濁液は20℃~40℃に維持されていることが好ましい。懸濁液の温度を20℃以上に維持することにより、均一な懸濁状態を保つことができ、多孔体の網目構造をなす骨格の表面に粘結剤のみが集中して層をなすということがなくなり、均一にカーボン粒子の塗布を行うことができる。このようにして均一に塗布されたカーボン粒子の層は剥離し難いため、強固に密着した金属めっきの形成が可能となる。一方、懸濁液の温度が40℃以下であることにより、分散剤の蒸発を抑制することができるため、塗布処理時間の経過とともに懸濁液が濃縮され難くなる。
また、カーボン粒子の粒径は、0.01~5μmで、好ましくは0.01~0.5μmである。粒径が大きいと多孔質樹脂成形体の空孔を詰まらせたり、平滑なめっきを阻害したりする要因となり、小さすぎると十分な導電性を確保することが難しくなる。
(電解液)
塩化アルミニウム(AlCl3)と1-エチル-3-メチルイミダゾリウムクロリド(EMIC)との混合比がモル比で2:1となるように混合して溶融塩を準備した。この溶融塩に1,10-フェナントロリン一水和物を3.0g/Lの濃度となるように添加して電解液を得た。
上記で用意した電解液を用いて基材の表面にアルミニウム膜を電着させた。
基材には銅(Cu)板(20mm×40mm×1mm)を用いた。そして、この基材を整流器の陰極側に接続し、対極のアルミニウム板(純度99.99%)を陽極側に接続した。電解液の温度が45℃となるようにし、また、電流密度が3.0A/dm2となるように制御した。
前記電解液中にアルミニウム電極(陽極)と白金電極(陰極)とを設けて前記過電圧を測定し、当該過電圧が105mV~170mVの範囲になるように適宜1,10-フェナントロリン一水和物を電解液に添加して、1,10-フェナントロリン一水和物の濃度を制御した。
基材の銅板の表面に20μmのアルミニウム膜が形成されたところで銅板を新たなものに交換し、同じ電解液のまま、続けて同様の手順で新たな銅板にアルミニウム膜の形成を行うという操作を繰り返した。
前記操作を繰り返し、50枚目の銅板の表面に形成されたアルミニウム膜の表面の算術平均粗さRaをレーザー顕微鏡により測定したところ、0.055μmと、非常に良好な鏡面状態であることが確認された。
基材として、導電化処理をした三次元網目構造を有する樹脂成形体を用いた以外は実施例1と同様にしてアルミニウム膜の製造を行った。樹脂成形体には、厚み1mm、気孔率95%、1インチ当たりの気孔数(セル数)約50個の発泡ウレタン(100mm×30mm角)を用いた。導電化処理は発泡ウレタンをカーボン懸濁液に浸漬して乾燥させることにより行った。カーボン懸濁液の成分は、黒鉛とカーボンブラックを25%含み、樹脂バインダー、浸透剤、消泡剤を含むものとした。カーボンブラックの粒径は0.5μmとした。
基材の導電化処理した発泡ウレタンの表面に20μmのアルミニウム膜が形成されたところで基材を新たな発泡ウレタンに交換し、続けて同様の手順で新たな基材にアルミニウム膜の形成を行うという操作を繰り返した。
前記操作を繰り返し、50枚目の発泡ウレタンの表面に形成されたアルミニウム膜の表面の算術平均粗さRaをレーザー顕微鏡により測定したところ、0.10μmと、非常に良好な鏡面状態であることが確認された。
前記1,10-フェナントロリン一水和物の代わりに、1,10-フェナントロリン無水物を用いた以外は実施例1と同様にして銅板の表面にアルミニウム膜の形成を行った。
<アルミニウム膜の評価>
実施例1と同様にして、50枚目の銅板の表面に形成されたアルミニウム膜の表面の算術平均粗さRaをレーザー顕微鏡により測定したところ、0.75μmと、表面平滑性に優れていないことが確認された。
Claims (4)
- 電解液中で基材表面にアルミニウムを電着させるアルミニウム膜の製造方法であって、前記電解液は、
(A)アルミニウムハロゲン化物と、
(B)アルキルピリジニウムハロゲン化物、アルキルイミダゾリウムハロゲン化物及び尿素化合物からなる群より選択されるいずれか1種以上の化合物と、
(C)1,10-フェナントロリン一水和物と、
を成分として含み、
前記(A)成分と前記(B)成分の混合比はモル比で1:1~3:1の範囲にあり、
前記電解液における前記1,10-フェナントロリン一水和物の濃度を0.05g/L以上、7.5g/L以下の範囲になるように制御するアルミニウム膜の製造方法。 - 前記電解液におけるアルミニウムが電析する際の過電圧を測定して、
前記過電圧の測定値が設定範囲内になるように前記電解液への1,10-フェナントロリン一水和物の添加量を調整して前記電解液における前記1,10-フェナントロリン一水和物の濃度を制御する請求項1に記載のアルミニウム膜の製造方法。 - 前記(A)成分が塩化アルミニウムであり、かつ前記(B)成分が1-エチル-3-メチルイミダゾリウムクロリドである請求項1又は2に記載のアルミニウム膜の製造方法。
- 前記基材が、導電化処理された三次元網目構造を有する樹脂成形体である請求項1~3のいずれか一項に記載のアルミニウム膜の製造方法。
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201380048581.XA CN104641022B (zh) | 2012-09-18 | 2013-08-23 | 铝膜的制造方法 |
| KR1020157006639A KR20150054840A (ko) | 2012-09-18 | 2013-08-23 | 알루미늄막의 제조 방법 |
| US14/428,645 US20150233012A1 (en) | 2012-09-18 | 2013-08-23 | Method for producing aluminum film |
| DE112013004530.3T DE112013004530T5 (de) | 2012-09-18 | 2013-08-23 | Verfahren zur Erzeugung eines Aluminiumfilmes |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-203815 | 2012-09-18 | ||
| JP2012203815A JP5950162B2 (ja) | 2012-09-18 | 2012-09-18 | アルミニウム膜の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2014045798A1 true WO2014045798A1 (ja) | 2014-03-27 |
Family
ID=50341121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2013/072554 Ceased WO2014045798A1 (ja) | 2012-09-18 | 2013-08-23 | アルミニウム膜の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20150233012A1 (ja) |
| JP (1) | JP5950162B2 (ja) |
| KR (1) | KR20150054840A (ja) |
| CN (1) | CN104641022B (ja) |
| DE (1) | DE112013004530T5 (ja) |
| WO (1) | WO2014045798A1 (ja) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6143005B2 (ja) * | 2014-01-27 | 2017-06-07 | 住友電気工業株式会社 | アルミニウムめっき液及びアルミニウム膜の製造方法 |
| JP6287541B2 (ja) * | 2014-04-24 | 2018-03-07 | 住友電気工業株式会社 | アルミニウム電気めっき液の評価方法、アルミニウム電気めっき方法及びアルミニウム電気めっき物の製造方法 |
| JP2016027190A (ja) * | 2014-06-24 | 2016-02-18 | 住友電気工業株式会社 | アルミニウムめっき液、アルミニウム膜の製造方法、及びアルミニウム多孔体 |
| KR20160149522A (ko) | 2015-06-18 | 2016-12-28 | 주식회사 에스제이테크 | 알루미늄 박막의 코팅방법과 이에 의해 제조된 알루미늄 코팅제품 |
| CN106757198B (zh) * | 2016-12-16 | 2019-09-27 | 中色科技股份有限公司 | 一种制备多孔铝过程中具有均匀镀层且无裂纹产生的方法 |
| DE112017007404T5 (de) * | 2017-04-05 | 2019-12-19 | Sumitomo Electric Industries, Ltd. | Poröser Aluminium-Körper und Verfahren zur Erzeugung eines porösen Aluminium-Körpers |
| JP7149804B2 (ja) * | 2018-10-25 | 2022-10-07 | 株式会社Uacj | 水和物を用いたアルミニウムの製造方法 |
| US11283110B2 (en) | 2018-12-27 | 2022-03-22 | Industrial Technology Research Institute | Electrolyte composition and metal-ion battery employing the same |
| CN113913868B (zh) * | 2021-10-29 | 2024-06-11 | 北京欧菲金太科技有限责任公司 | 一种离子液体电解质及其得到的6n超纯铝和制备方法 |
| CN115058743B (zh) * | 2021-12-28 | 2024-05-24 | 昆明理工大学 | 一种新型复合电解质及其低温电解精炼再生铝的方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006299291A (ja) * | 2005-04-15 | 2006-11-02 | Fukuda Metal Foil & Powder Co Ltd | 銅箔の粗面化処理方法及び粗面化処理液 |
| JP2012144763A (ja) * | 2011-01-11 | 2012-08-02 | Sumitomo Electric Ind Ltd | アルミニウム構造体の製造方法およびアルミニウム構造体 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07840B2 (ja) * | 1985-11-25 | 1995-01-11 | 大和特殊株式会社 | 電気めつき添加剤の管理方法並びにそのための装置 |
| JP3221897B2 (ja) * | 1991-11-22 | 2001-10-22 | ディップソール株式会社 | 電気アルミニウムめっき液の精製方法およびめっき方法 |
| US5804053A (en) * | 1995-12-07 | 1998-09-08 | Eltech Systems Corporation | Continuously electroplated foam of improved weight distribution |
| JP2008195990A (ja) * | 2007-02-09 | 2008-08-28 | Dipsol Chem Co Ltd | 電気アルミニウムめっき浴及びそれを用いためっき方法 |
| DE102009035660A1 (de) * | 2009-07-30 | 2011-02-03 | Ewald Dörken Ag | Verfahren zur elektrochemischen Beschichtung eines Werkstücks |
| US10030312B2 (en) * | 2009-10-14 | 2018-07-24 | Massachusetts Institute Of Technology | Electrodeposited alloys and methods of making same using power pulses |
| CN101914792B (zh) * | 2010-08-11 | 2012-07-04 | 浙江大学 | 一种Al-Cr合金涂层及其制备方法 |
| CN101994128A (zh) * | 2010-11-26 | 2011-03-30 | 昆明理工大学 | 采用离子液体低温电沉积制备Al-Ti合金或电镀Al-Ti合金的方法 |
| CN102206841B (zh) * | 2011-04-28 | 2014-04-16 | 上海交通大学 | 铝基复合材料表面离子液体电沉积铝膜的制备方法 |
-
2012
- 2012-09-18 JP JP2012203815A patent/JP5950162B2/ja active Active
-
2013
- 2013-08-23 DE DE112013004530.3T patent/DE112013004530T5/de not_active Withdrawn
- 2013-08-23 WO PCT/JP2013/072554 patent/WO2014045798A1/ja not_active Ceased
- 2013-08-23 CN CN201380048581.XA patent/CN104641022B/zh active Active
- 2013-08-23 US US14/428,645 patent/US20150233012A1/en not_active Abandoned
- 2013-08-23 KR KR1020157006639A patent/KR20150054840A/ko not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006299291A (ja) * | 2005-04-15 | 2006-11-02 | Fukuda Metal Foil & Powder Co Ltd | 銅箔の粗面化処理方法及び粗面化処理液 |
| JP2012144763A (ja) * | 2011-01-11 | 2012-08-02 | Sumitomo Electric Ind Ltd | アルミニウム構造体の製造方法およびアルミニウム構造体 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104641022B (zh) | 2016-12-07 |
| JP5950162B2 (ja) | 2016-07-13 |
| JP2014058715A (ja) | 2014-04-03 |
| US20150233012A1 (en) | 2015-08-20 |
| KR20150054840A (ko) | 2015-05-20 |
| DE112013004530T5 (de) | 2015-05-28 |
| CN104641022A (zh) | 2015-05-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5950162B2 (ja) | アルミニウム膜の製造方法 | |
| CN104053824B (zh) | 铝膜制造方法和铝箔制造方法 | |
| US20100252446A1 (en) | Method to Electrodeposit Metals Using Ionic Liquids in the Presence of an Additive | |
| TW201241243A (en) | Process for production of aluminum structure, and aluminum structure | |
| CN106460216B (zh) | 铝镀液、铝膜的制造方法以及铝多孔体 | |
| JP6143005B2 (ja) | アルミニウムめっき液及びアルミニウム膜の製造方法 | |
| Saravanan et al. | Nucleation of copper on mild steel in copper chloride (CuCl 2· 2H 2 O)–1-ethyl-3-methylimidazolium chloride [EMIM] Cl–ethylene glycol (EG) ionic liquid | |
| JP2016000838A (ja) | アルミニウム膜、アルミニウム膜形成体、及びアルミニウム膜の製造方法 | |
| JP5692233B2 (ja) | アルミニウム構造体の製造方法およびアルミニウム構造体 | |
| WO2015111533A1 (ja) | アルミニウムめっき液、アルミニウム膜、樹脂構造体、アルミニウム多孔体、及びアルミニウム多孔体の製造方法 | |
| WO2018211740A1 (ja) | アルミニウムめっき膜及びアルミニウムめっき膜の製造方法 | |
| US11180828B2 (en) | Aluminum porous body and method for producing aluminum porous body | |
| WO2015198626A1 (ja) | アルミニウムめっき液、アルミニウムめっき膜の製造方法、及びアルミニウム多孔体 | |
| JP2016113638A (ja) | アルミニウム膜の製造方法 | |
| WO2014038292A1 (ja) | アルミニウム膜の製造方法 | |
| JP6124086B2 (ja) | アルミニウム膜の製造方法 | |
| JP2014051692A (ja) | アルミニウム膜の製造方法 | |
| JP2014051690A (ja) | アルミニウム膜の製造方法 | |
| JP2021120917A (ja) | アルミニウム多孔体、電極および蓄電デバイス | |
| WO2015129108A1 (ja) | アルミニウム多孔体及びアルミニウム多孔体の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 13839269 Country of ref document: EP Kind code of ref document: A1 |
|
| ENP | Entry into the national phase |
Ref document number: 20157006639 Country of ref document: KR Kind code of ref document: A |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 14428645 Country of ref document: US |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 112013004530 Country of ref document: DE Ref document number: 1120130045303 Country of ref document: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 13839269 Country of ref document: EP Kind code of ref document: A1 |
