WO2014026416A1 - 一种彩膜显影机 - Google Patents

一种彩膜显影机 Download PDF

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Publication number
WO2014026416A1
WO2014026416A1 PCT/CN2012/081024 CN2012081024W WO2014026416A1 WO 2014026416 A1 WO2014026416 A1 WO 2014026416A1 CN 2012081024 W CN2012081024 W CN 2012081024W WO 2014026416 A1 WO2014026416 A1 WO 2014026416A1
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Prior art keywords
developing
tank
horizontal plane
developing tank
color film
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PCT/CN2012/081024
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English (en)
French (fr)
Inventor
胡立巍
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深圳市华星光电技术有限公司
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Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US13/642,543 priority Critical patent/US9016963B2/en
Publication of WO2014026416A1 publication Critical patent/WO2014026416A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Definitions

  • the present invention relates to the field of liquid crystal panel manufacturing, and more particularly to a color film developing machine. Background technique
  • color film developing machines are mainly used in the color filter R, G, and B processes, which can develop the in-plane resist of the substrate.
  • the structure of the color film developing machine in the prior art is mainly composed of the developing tank 9. As shown in FIG. 3, the developing tank 9 inclined at an angle with respect to the horizontal plane T can fix the developing substrate at a certain angle for development, and the inclined substrate is advantageous.
  • the development and downstream of the developer on the surface of the substrate prevent the developer from remaining due to the bending of the substrate, and reduce the occurrence of defective products due to poor liquid flow.
  • the color film developing machine of the above structure has the following defects due to unreasonable structural design:
  • the developing nozzle above the substrate sprays the developer on the photoresist on the substrate, and the developing liquid flows downward from the top to the bottom along the inclined substrate. Since the downstream developing solution still has a strong developing ability, it will always react chemically with the photoresist on the substrate during the downstream process, resulting in uneven development of the entire substrate surface, resulting in the upper edge portion and the lower surface of the substrate. The development size of the RGB process in the edge portion of the edge portion is greatly different, which affects the quality of the product to some extent. Summary of the invention
  • the technical problem to be solved by the present invention is to provide a color film developing machine which can reduce the occurrence of uneven development of the photoresist on the inclined substrate due to the flow of the developing solution from the top to the bottom when the substrate is developed by the developing tank; Uniformity of substrate development; Improve the uniformity of in-plane process, reduce the difference, and improve the quality of products.
  • a color film developing machine for uniformly developing a surface resist of a substrate in a liquid crystal panel manufacturing comprising a developing tank, wherein the developing tank comprises a first developing tank and a second developing tank which are respectively inclined with respect to a horizontal plane The first developing tank and the second developing tank are inclined in opposite directions with respect to the horizontal plane.
  • the angle of the inclination angle of the first developing tank with respect to the horizontal plane ranges from zero. -90.
  • the angle of the inclination angle of the second developing tank with respect to the horizontal plane is in the range of 90. -180. between.
  • the angle of the inclination angle of the first developing tank with respect to the horizontal plane ranges from 5° to 10°; the angle of the inclination angle of the second developing tank with respect to the horizontal plane ranges from 170° to - 175. between.
  • the inclination angle of the first developing tank with respect to the horizontal plane is complementary to the inclination angle of the second developing tank with respect to the horizontal plane.
  • the color film developing machine further includes a conveying mechanism for conveying between the first developing tank and the second developing tank; the conveying mechanism is rotatable with respect to a horizontal plane.
  • the conveying mechanism is respectively mounted on the first developing tank and the second developing tank.
  • the first developing tank and/or the second developing tank are connected to a cleaning device for removing the developer remaining on the surface of the substrate.
  • the substrate is transferred to the second developing tank by the transmission device after passing through the cleaning device through the first developing tank.
  • the inclination directions of the two developing tanks inclined with respect to the horizontal plane are opposite.
  • the substrate is caused to cancel each other out when developing through the developing groove because the developer has a difference in photoresist caused by the flow from top to bottom on the inclined substrate. It enhances the uniformity of substrate development; improves the uniformity of in-plane process, reduces the difference, and improves the quality of the product.
  • FIG. 1 is a schematic cross-sectional structural view of a developing tank of a color film developing machine according to an embodiment of the present invention
  • FIG. 2 is a block diagram showing the structure of a color film developing machine according to an embodiment of the present invention.
  • FIG. 3 is a schematic cross-sectional view showing a developing tank of a color film developing machine in the prior art.
  • the embodiment of the invention provides a color film developing machine for performing uniform development of the in-plane photoresist in the liquid crystal panel manufacturing, which comprises a developing tank for fixing the substrate, wherein the developing tank includes The horizontal plane is provided with the inclined first developing tank 11 and the second developing tank 12;
  • the first developing tank 11 and the second developing tank 12 are inclined in opposite directions with respect to the horizontal plane, respectively.
  • the developing substrate can be prevented from being strongly developed on one end side in the developing process.
  • the structure for uniformly developing in-plane is carried out as follows:
  • the developing nozzle located above the first developing tank 11 sprays the developer on the photoresist on the substrate, since the developing solution sprayed on the substrate moves from the top to the bottom along the inclined substrate
  • the downward flow while the downstream developer still has a strong developing ability, and chemically reacts with the photoresist on the substrate during the downstream process, causing the inclined substrate to be closer to the inclined top edge than the inclined bottom edge.
  • the degree of development of part b is poor.
  • the developing substrate passes through the second developing tank 12, and the developing liquid is sprayed on the b-side side of the above-mentioned development degree, and the second direction is along the second developing tank 12, and the developing direction is opposite to the inclined direction of the first developing tank 11.
  • the direction in which the developing tank 12 is inclined flows downward from the top to the bottom, and the portion which is originally poor in development is enhanced by development, so that the development in the in-plane tends to be uniform.
  • the opposite inclination directions of the two developing grooves 11 and 12 with respect to the horizontal plane means that the inclination angles of the two developing grooves with respect to the horizontal plane are set in different value ranges, so that the inclination angles of the two developing grooves with respect to the horizontal plane are caused.
  • the values respectively form an opposite oblique direction with respect to the horizontal plane in the two ranges of the acute angle and the obtuse angle.
  • the inclination angle ⁇ of the first developing tank 11 with respect to the horizontal plane L is 0. -90.
  • the angular range between the acute angles, and the inclination angle ⁇ of the second developing tank 12 with respect to the horizontal plane L is 90. -180.
  • the inclination angle ⁇ of the first developing tank 11 with respect to the horizontal plane is complementary to the inclination angle ⁇ of the second developing tank 12 with respect to the horizontal plane.
  • the inclination angle ⁇ of the first developing tank 11 with respect to the horizontal plane L takes a value of 5. (Or any value between 5° and 10°), the inclination angle ⁇ of the second developing tank 12 with respect to the horizontal plane L is 175. (or any value between 170 ° -175 °).
  • the complementary effect of setting the two tilting angles is: since the parameters and conditions for the developing nozzles on the two developing tanks are the same, the complementary tilt angles are set, so that the two developing tanks have the same slope with respect to the horizontal plane L, and the developing The flow rate of the liquid on the two developing tanks is approximately the same, thereby ensuring that the development effects of the two-stage developing tank are similar, and the development in the sheet surface tends to be uniform.
  • the color film developing machine of the present invention transports the developing substrate by being implemented as follows:
  • the color film developing machine includes a conveying mechanism for conveying between the first developing tank 11 and the second developing tank 12. As shown in Fig. 2, the transport mechanism can drive the developing substrate from the first developing tank 11 to the second developing tank 12 to perform a developing process.
  • a transport mechanism is also mounted on each of the first developing tank 11 and the second developing tank 12, and the transport mechanism is set to be rotationally tiltable with respect to a horizontal plane.
  • the conveying mechanism can maintain the same inclination angle as the inclination angle ⁇ or the inclination angle ⁇ , and the rotation of the developing substrate can be brought into the first developing tank 11 by its own rotation, and then the substrate is driven to the second developing tank 12 and enter.
  • cleaning means respectively connected to the first developing tank 11 and/or the second developing tank 12 may be provided.
  • the cleaning device is mainly composed of a water washing tank/air knife section. The liquid remaining on the surface of the substrate can be removed by the treatment of the water washing tank/air knife section, and is prepared for the subsequent processing steps.
  • the following is an example of the oblique direction of the two developing tanks opposite to the horizontal plane L, wherein the inclination angle ⁇ of the first developing tank 11 with respect to the horizontal plane L is 5°, and the inclination angle ⁇ of the second developing tank 12 with respect to the horizontal plane L is ⁇ .
  • the value is 175°, which illustrates the process of uniformly developing the in-plane photoresist of the substrate by the color film developing machine of the present invention:
  • the substrate to be developed enters the first developing tank 11 with the conveyance mechanism brought in, and the developing nozzle located above the first developing tank 11 sprays the developing solution against the photoresist on the substrate.
  • the developer sprayed on the substrate will flow down from the top to the bottom along the inclined substrate, while the downstream developer still has a strong developing ability, and continuously reacts with the photoresist on the substrate during the downstream process.
  • the portion a of the substrate near the inclined top edge of the developing tank is less developed than the portion b of the inclined bottom edge or the development is slightly insufficient.
  • the substrate is processed into the washing tank/air blade section, and the liquid remaining on the surface of the substrate is removed, and then introduced into the second developing tank 12 by the conveying mechanism. Since the oblique direction of the second developing tank 12 is opposite to the oblique direction of the first developing tank 11, the b-end side of the substrate developing degree is located at a position higher than that of the second developing tank 12, and the developer is sprayed thereon. The direction in which the second developing tank 12 is inclined flows downward from the top to the bottom. The developing solution continuously reacts with the photoresist on the substrate during the downstream process, originally The a-side portion of the poorly developed degree is enhanced by development.
  • the complementary tilt angles are set such that the two developing tanks have the same slope with respect to the horizontal plane L, and the flow rates of the developing solution on the two developing tanks are approximately the same. Therefore, the development effects of the two-stage developing tank are similar, and the development in the surface of the substrate tends to be uniform. The remaining liquid is removed.
  • the inclination angle of the two developing tanks with respect to the horizontal plane may be other values of the complementary relationship as long as the inclination direction inclined with respect to the horizontal plane is satisfied;
  • the device improves the quality of the product by other means; when the parameters and conditions of the nozzle for spraying the developer above the two-stage developing tank are different, the two-stage developing tank can be changed by changing the angle of the inclination angle of the two developing tanks with respect to the horizontal plane.
  • the development effect is similar.
  • the inclination directions of the two developing grooves inclined with respect to the horizontal plane are opposite.
  • the development difference due to the photoresist from the top to the bottom of the developer on the inclined substrate is reduced. It enhances the uniformity of substrate development; improves the uniformity of in-plane process, narrows the difference, and improves product quality.

Abstract

一种彩膜显影机，用于在液晶面板制造中对基板面内光阻进行均匀显影，包括显影槽，所述显影槽包括分别相对于水平面设置倾斜的第一显影槽（11）和第二显影槽（12）；所述第一显影槽（11）和所述第二显影槽（12）相对于所述水平面（L）倾斜的倾斜方向相反。采用这样的彩膜显影机，可以避免发生基板在通过显影槽显影时因为显影液由上至下的流动对倾斜基板上光阻造成二次显影情况的发生；增强了基板显影的均匀性；改善面内制程均匀程度，缩小差异性，提升产品的品质。

Description

一种彩膜显影机 本申请要求于 2012 年 8 月 1 3 日提交中国专利局、 申请号为 20121 0286041. 2 、 发明名称为 "一种彩膜显影机" 的中国专利申请的优先权， 上述专利的全部内容通过引用结合在本申请中。 技术领域
本发明涉及液晶面板制造领域， 尤其涉及一种彩膜显影机。 背景技术
液晶面板制造领域中，彩膜显影机主要应用在彩色滤光片 R、 G、 B制程中， 其可以对基板面内光阻进行显影。
现有技术中彩膜显影机的结构主要由显影槽 9组成， 如图 3所示， 相对于 水平面 T倾斜一定角度的显影槽 9可以将显影基板固定在一定角度进行显影， 倾斜的基板有利于基板表面显影液的显影和下流， 防止因为基板的弯曲造成显 影液残留， 减少因液体流动不畅造成产品不良情况的发生。
上述结构的彩膜显影机因结构设计不合理， 存在如下缺陷：
在基板进行显影时， 基板上方的显影喷嘴对基板上的光阻喷洒显影液， 显 影液会沿着倾斜的基板由上至下的向下流。 由于下流的显影液仍旧具有较强的 显影能力， 在下流的过程中会一直与基板上的光阻发生化学反应， 造成整个基 板面内显影程度的不均匀， 致使基板靠上边缘部分与靠下边缘部分面内 RGB制 程的显影大小呈现较大差异， 一定程度上影响产品的品质。 发明内容
本发明所要解决的技术问题在于， 提供一种彩膜显影机， 可以减少发生基 板在通过显影槽显影时因为显影液由上至下的流动对倾斜基板上光阻造成显影 不均的情况； 增强了基板显影的均匀性； 改善面内制程均匀程度， 缩小差异性， 提升产品的品质。
本发明的技术方案是： 一种彩膜显影机， 用于在液晶面板制造中对基板面内光阻进行均勾显影， 包括显影槽， 所述显影槽包括分别相对于水平面设置倾斜的第一显影槽和第二 显影槽； 所述第一显影槽和所述第二显影槽相对于所述水平面倾斜的倾斜方向 相反。
优选的， 所述第一显影槽相对于所述水平面的倾斜角的角度范围在 0。-90。 之间； 所述第二显影槽相对于所述水平面的倾斜角的角度范围在 90。-180。之间。
优选的， 所述第一显影槽相对于所述水平面的倾斜角的角度范围在 5° -10° 之间； 所述第二显影槽相对于所述水平面的倾斜角的角度范围在 170° -175。 之间。
优选的， 所述第一显影槽相对于所述水平面的倾斜角与所述第二显影槽相 对于所述水平面的倾斜角互补。
优选的， 所述彩膜显影机还包括用于在所述第一显影槽和所述第二显影槽 间进行传送的传送机构； 所述传送机构可相对于水平面设置旋转倾斜。
优选的， 所述第一显影槽和所述第二显影槽上分别安装有所述传送机构。 优选的， 所述第一显影槽和 /或所述第二显影槽连接设置用于去除所述基板 表面残留显影液的清洗装置。
优选的， 所述基板通过所述第一显影槽经所述清洗装置后， 由所述传动装 置传送至所述第二显影槽。
本发明所提供的彩膜显影机， 由于设置了相对于水平面倾斜的第一显影槽 和第二显影槽， 两显影槽相对于水平面倾斜的倾斜方向相反。 使得基板通过显 影槽显影时相互抵消因为显影液由上至下的流动对倾斜基板上光阻造成的差异 性。 增强了基板显影的均匀性； 改善面内制程均匀程度， 缩小差异性， 提升产 品的品质。 附图说明
图 1是本发明实施例的彩膜显影机的显影槽的截面结构示意图；
图 2是本发明实施例的彩膜显影机的结构框图；
图 3是现有技术中彩膜显影机的显影槽的截面结构示意图。 具体实施方式 下面参考附图对本发明的优选实施例进行描述。
本发明实施例提供了一种彩膜显影机， 用于在液晶面板制造中对基板面内 光阻进行均勾显影， 其包括用于对基板进行固定的显影槽， 所述显影槽包括相 对于水平面设置倾斜的第一显影槽 11和第二显影槽 12;
所述第一显影槽 11和所述第二显影槽 12分别相对于所述水平面倾斜的倾 斜方向相反。
参见图 1 , 该结构的彩膜显影机， 通过设置两倾斜方向相反的显影槽， 可以 使显影基板在显影工序中不至于一直处于一端侧被较强显影的状态。 该使面内 均匀显影的结构是通过如下方式实施的：
显影基板在经过倾斜的第一显影槽 11 时， 位于第一显影槽 11上方的显影 喷嘴对基板上光阻喷洒显影液， 由于喷洒在基板上的显影液会沿着倾斜的基板 由上至下的向下流， 而下流的显影液仍旧具有较强的显影能力， 在下流的过程 中不断的与基板上的光阻发生化学反应， 造成倾斜基板靠近倾斜顶缘的部分 a 相比倾斜底缘的部分 b的显影程度要差。 紧接着， 显影基板通过第二显影槽 12, 由于第二显影槽 12的倾斜方向与第一显影槽 11的倾斜方向相反， 显影液喷洒 在上述显影程度较强的 b端侧， 沿着第二显影槽 12倾斜的方向由上至下的向下 流， 原本显影程度差的部分得到了显影的加强， 进而使得面内的显影情况趋于 均匀。
上述实施方式中，两显影槽 11、 12相对于水平面倾斜的倾斜方向相反是指： 两显影槽相对于水平面的倾斜角设置在不同的取值范围中， 致使两显影槽相对 于水平面的倾斜角分别取值在锐角和钝角的两种取值范围中形成相对于水平面 相反的倾斜方向。
例如： 在一种实施方式中， 第一显影槽 11相对于水平面 L的倾斜角 α为取 值在 0。-90。之间的锐角的角度范围， 而第二显影槽 12相对于水平面 L的倾斜角 β为取值在 90。-180。之间的钝角的角度范围。
在优选的实施方式中， 第一显影槽 11相对于所述水平面的倾斜角 α与所述 第二显影槽 12相对于所述水平面的倾斜角 β互补。
例如： 第一显影槽 11相对于水平面 L的倾斜角 α取值为 5。 (或在 5° -10° 之间任意取值）， 第二显影槽 12相对于水平面 L的倾斜角 β取值为 175。（或在 170° -175° 之间任意取值）。 将两倾斜角设置互补的作用是： 由于位于两显影槽上的显影喷嘴喷出显影 液的参数和条件相同， 设置互补的倾斜角， 进而使两显影槽相对于水平面 L具 有相同的坡度， 显影液在两显影槽上的流速近似相同， 从而保证两段显影槽的 显影效果相近似， 进而 板面内的显影情况趋于均匀。
本发明的彩膜显影机传送显影基板是通过如下方式实施的：
彩膜显影机包括用于在第一显影槽 11和第二显影槽 12间进行传送的传送 机构。 如图 2所示， 传送机构可以将显影基板由第一显影槽 11传动至第二显影 槽 12进行显影工序。
优选的实施方式中， 第一显影槽 11和第二显影槽 12上也分别安装有传送 机构， 该传送机构可相对于水平面设置旋转倾斜。 实施中， 传送机构可保持与 倾斜角 α或倾斜角 β相同的倾斜角度， 通过其自身的旋转， 可将显影基板带入 第一显影槽 11 , 之后再将基板传动至第二显影槽 12并进入。
本发明的彩膜显影机的另一种实施方式中， 可以设置分别与第一显影槽 11 和 /或所述第二显影槽 12相接连的清洗装置。 清洗装置主要由水洗槽 /风刀段组 成， 通过水洗槽 /风刀段的处理可以将基板表面残留的液体除去， 为后续的处理 工序做好准备。
以下以两显影槽相对于水平面 L相反的倾斜方向为例， 其中， 第一显影槽 11相对于水平面 L的倾斜角 α取值为 5°, 第二显影槽 12相对于水平面 L的倾 斜角 β取值为 175°, 说明本发明彩膜显影机对基板面内光阻进行均匀显影的过 程：
需显影的基板在传送机构的带入下进入第一显影槽 11 , 位于第一显影槽 11 上方的显影喷嘴对基板上光阻喷洒显影液。 喷洒在基板上的显影液会沿着倾斜 的基板由上至下的向下流， 而下流的显影液仍旧具有较强的显影能力， 在下流 的过程中不断的与基板上的光阻发生化学反应， 使基板靠近显影槽倾斜顶缘的 部分 a相比倾斜底缘的部分 b的显影程度要差或显影稍有不足。
紧接着， 基板进入水洗槽 /风刀段进行处理， 基板表面残留的液体除去后， 再由传送机构带入到第二显影槽 12上。 由于第二显影槽 12的倾斜方向与第一 显影槽 11的倾斜方向相反， 基板显影程度较强的 b端侧位于第二显影槽 12如 图所示较高的位置， 显影液喷洒在其上沿着第二显影槽 12倾斜的方向由上至下 的向下流。 在下流的过程中显影液不断的与基板上的光阻发生化学反应， 原本 显影程度差的 a端侧部分得到了显影的加强。
由于位于两显影槽上的显影喷嘴喷出显影液的参数和条件相同， 设置互补 的倾斜角， 使得两显影槽相对于水平面 L具有相同的坡度， 显影液在两显影槽 上的流速近似相同， 从而保证两段显影槽的显影效果相近似， 进而使基板面内 的显影情况趋于均匀。 留的液体被除去。
本发明的彩膜显影机的其它实施方式中， 两显影槽相对于水平面的倾斜角 可以是互补关系的其它取值， 只要满足相对于所述水平面倾斜的倾斜方向相反 即可； 也可不设置清洗装置， 通过其它的方式提升产品的品质； 在两段显影槽 上方的设置的喷嘴喷洒显影液的参数和条件不同时， 可以通过改变两显影槽相 对于水平面的倾斜角的角度使两段显影槽的显影效果相近。
实施本发明的彩膜显影机， 由于设置了相对于水平面倾斜的第一显影槽和 第二显影槽， 两显影槽相对于水平面倾斜的倾斜方向相反。 使得基板通过显影 槽显影时减少因为显影液由上至下的流动对倾斜基板上光阻造成的显影差异。 增强了基板显影的均匀性； 改善面内制程均匀程度， 缩小差异性， 提升产品的 品质。

Claims

权 利 要 求
1、一种彩膜显影机，用于在液晶面板制造中对基板面内光阻进行均匀显影， 包括： 显影槽， 其特征在于， 所述显影槽包括分别相对于水平面设置倾斜的第 一显影槽和第二显影槽；
所述第一显影槽和所述第二显影槽相对于所述水平面倾斜的倾斜方向相 反。
2、 如权利要求 1所述的彩膜显影机， 其特征在于， 所述第一显影槽相对于 所述水平面的倾斜角 （α ) 的角度范围在 0°-90°之间；
所述第二显影槽相对于所述水平面的倾斜角 （β ) 的角度范围在 90。-180。之 间。
3、 如权利要求 2所述的彩膜显影机， 其特征在于， 所述第一显影槽相对于 所述水平面的倾斜角 （α ) 与所述第二显影槽相对于所述水平面的倾斜角 （β ) 互补。
4、 如权利要求 2所述的彩膜显影机， 其特征在于， 所述第一显影槽相对于 所述水平面的倾斜角 （α ) 的角度范围在 5。 -10。 之间；
所述第二显影槽相对于所述水平面的倾斜角（β )的角度范围在 170° -175° 之间。
5、 如权利要求 4所述的彩膜显影机， 其特征在于， 所述第一显影槽相对于 所述水平面的倾斜角 （α ) 与所述第二显影槽相对于所述水平面的倾斜角 （β ) 互补。
6、 如权利要求 1所述的彩膜显影机， 其特征在于， 所述彩膜显影机还包括 用于在所述第一显影槽和所述第二显影槽间进行传送的传送机构；
所述传送机构可相对于水平面设置旋转倾斜。
7、 如权利要求 6所述的彩膜显影机， 其特征在于， 所述第一显影槽和所述 第二显影槽上分别安装有所述传送机构。
8、 如权利要求 7所述的彩膜显影机， 其特征在于， 所述第一显影槽和 /或所 述第二显影槽连接设置用于去除所述基板表面残留显影液的清洗装置。
9、 如权利要求 8所述的彩膜显影机， 其特征在于， 所述基板通过所述第一 显影槽经所述清洗装置后， 由所述传动装置传送至所述第二显影槽。
10、 如权利要求 9所述的彩膜显影机， 其特征在于， 所述第一显影槽相对 于所述水平面的倾斜角 （α )与所述第二显影槽相对于所述水平面的倾斜角 （β ) 互补。
11、 一种彩膜显影机， 用于在液晶面板制造中对基板面内光阻进行均匀显 影， 包括： 显影槽， 其特征在于， 所述显影槽包括分别相对于水平面设置倾斜 的第一显影槽和第二显影槽；
所述第一显影槽和所述第二显影槽相对于所述水平面倾斜的倾斜方向相 反， 且所述第一显影槽相对于所述水平面的倾斜角 （α )与所述第二显影槽相对 于所述水平面的倾斜角 （β ) 互补。
12、 如权利要求 11所述的彩膜显影机， 其特征在于， 所述彩膜显影机还包 括用于在所述第一显影槽和所述第二显影槽间进行传送的传送机构；
所述传送机构可相对于水平面设置旋转倾斜。
13、 如权利要求 12所述的彩膜显影机， 其特征在于， 所述第一显影槽和所 述第二显影槽上分别安装有所述传送机构。
14、 如权利要求 13 所述的彩膜显影机， 其特征在于， 所述第一显影槽和 / 或所述第二显影槽连接设置用于去除所述基板表面残留显影液的清洗装置。
15、 如权利要求 14所述的彩膜显影机， 其特征在于， 所述基板通过所述第 一显影槽经所述清洗装置后， 由所述传动装置传送至所述第二显影槽。
16、 如权利要求 12所述的彩膜显影机， 其特征在于， 所述第一显影槽相对 于所述水平面的倾斜角 （α ) 的角度范围在 0。-90。之间； 所述第二显影槽相对于 所述水平面的倾斜角 （β ) 的角度范围在 90°-180°之间。
17、 如权利要求 12所述的彩膜显影机， 其特征在于， 所述第一显影槽相对 于所述水平面的倾斜角 （α )的角度范围在 5° -10° 之间； 所述第二显影槽相对 于所述水平面的倾斜角 （β ) 的角度范围在 170° -175° 之间。
18、 一种彩膜显影机， 用于在液晶面板制造中对基板面内光阻进行均匀显 影， 包括： 显影槽， 其特征在于， 所述显影槽包括分别相对于水平面设置倾斜 的第一显影槽和第二显影槽；
所述第一显影槽和所述第二显影槽相对于所述水平面倾斜的倾斜方向相 反， 且所述第一显影槽相对于所述水平面的倾斜角 （α )与所述第二显影槽相对 于所述水平面的倾斜角 （β ) 互补； 在所述第一显影槽和所述第二显影槽上分别安装有传送机构， 所述传送机 构可相对于水平面设置旋转倾斜， 用于所述第一显影槽和所述第二显影槽间进 行传送。
19、 如权利要求 18 所述的彩膜显影机， 其特征在于， 所述第一显影槽和 / 或所述第二显影槽连接设置用于去除所述基板表面残留显影液的清洗装置。
20、 如权利要求 19所述的彩膜显影机， 其特征在于， 所述基板通过所述第 一显影槽经所述清洗装置后， 由所述传动装置传送至所述第二显影槽。
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CN103207543A (zh) * 2013-04-19 2013-07-17 京东方科技集团股份有限公司 一种显影方法
CN104282598A (zh) * 2014-09-23 2015-01-14 安徽省大富光电科技有限公司 蚀刻、显影、清洗以及褪膜设备、喷淋处理设备及方法
CN107179654B (zh) * 2016-03-11 2020-12-01 上海和辉光电股份有限公司 Oled面板的显影方法、oled面板以及制造设备
CN106773559A (zh) * 2017-01-05 2017-05-31 京东方科技集团股份有限公司 一种传输装置、显影系统及显影方法
CN108897199A (zh) * 2018-05-10 2018-11-27 深圳市志凌伟业技术股份有限公司 一种带有ph值测试仪的自显影段药水槽
CN109407462A (zh) * 2018-10-25 2019-03-01 宁波微迅新材料科技有限公司 一种掩膜版制作工艺

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