WO2013191092A1 - 反射防止構造体及び表示装置 - Google Patents
反射防止構造体及び表示装置 Download PDFInfo
- Publication number
- WO2013191092A1 WO2013191092A1 PCT/JP2013/066429 JP2013066429W WO2013191092A1 WO 2013191092 A1 WO2013191092 A1 WO 2013191092A1 JP 2013066429 W JP2013066429 W JP 2013066429W WO 2013191092 A1 WO2013191092 A1 WO 2013191092A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin layer
- moth
- antireflection
- eye
- resin
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
Definitions
- the present invention relates to an antireflection structure and a display device. More specifically, the present invention relates to an antireflection structure that lowers the surface reflectance by a concavo-convex structure provided on the surface, and a display device in which the surface reflectance is reduced using the antireflection structure.
- the moth-eye structure is a concavo-convex structure that is finer than the concavo-convex structure formed on an anti-glare (AG) film and smaller in size than the visible light wavelength.
- AG anti-glare
- the change in refractive index can be made pseudo continuous at the boundary between the outside world (air), which is a medium having a different refractive index, and the article, in general, the boundary between the media having different refractive indexes. It is possible to suppress the reflection of light that occurs in the above. Therefore, if the moth-eye structure is disposed on the surface of the article to be subjected to the antireflection treatment, the reflection of light on the surface of the article can be greatly suppressed, and the light transmittance can be remarkably increased.
- Such a moth-eye structure is extremely effective as a means for improving the visibility of the display device.
- a large amount of external light is incident on the outermost surface of the display device. Therefore, unless the surface reflectance is sufficiently reduced, the display light emitted from the inside of the display device is reduced. The ratio of the amount of reflected light to the amount becomes too large, and a clear display cannot be obtained. If the moth-eye structure is used, the surface reflectance at the outermost surface of the display device can be sufficiently reduced, so that such a decrease in the contrast ratio of the display image in a bright place can be prevented.
- a method of attaching an anti-reflection film having a moth-eye structure on the surface to the surface of an article to be subjected to anti-reflection treatment can be mentioned.
- a method for producing an antireflection film having a moth-eye structure on the surface a mold having an inverted structure of a moth-eye structure on the surface is pressed against the surface of the base film, and the inverted structure formed on the surface of the mold is applied to the surface of the base film.
- a method of transferring is known.
- a method for forming an inverted structure on the surface of the mold a method is known in which an oxide film is formed by anodizing the surface of the mold and the oxide film is selectively etched.
- Patent Document 1 describes a coating layer made of a hydrolysis condensate of a silane coupling agent.
- Patent Document 2 describes a transparent thin film such as silicon dioxide, and a layer with excellent oil repellency having a film thickness of several nm or less (see paragraph 0045).
- Patent Document 3 describes a film having a low surface energy such as a water repellent film made of polytetrafluoroethylene having a film thickness of 100 to 10,000 mm (see claims 2, 3 and paragraphs 0036 and 0037).
- Patent Document 4 describes an antifouling functional layer made of a material containing fluorine formed while maintaining an uneven structure (see claim 8, paragraph 0114).
- Patent Document 5 describes a resin coating having a contact angle with water of greater than 90 ° and a resin coating with a contact angle with water of less than 90 ° (see claims 6 and 7).
- Patent Document 6 describes a functional layer formed by chemically bonding a silicon-containing compound directly to the surface of a fine protrusion.
- Patent Document 7 describes a transparent conductive film having a shape following the shape of the structure and having a thickness of 9 to 50 nm (see claim 1, paragraphs 0020 and 0021).
- Patent Document 8 describes a transparent conductive film having the largest average film thickness at the top of a structure (see claim 5).
- Patent Document 9 describes a transparent conductive thin film and an opaque thin film (see claims 1 and 6).
- the conventional coating layer provided on the surface of the moth-eye structure is formed with a uniform thickness on the surface of the moth-eye structure or an extremely thin film thickness so as not to change the reflectance characteristics of the moth-eye structure. there were.
- the surface reflectance of the product can be remarkably lowered, so that a product with excellent visibility can be realized.
- the display image of the display device can be clearly recognized even in a bright outdoor environment, and the lighting device can be prevented from being reflected on the screen when indoors.
- the present invention has been made in view of the above situation, and an antireflection structure capable of improving design by adjusting the reflection characteristics of the moth-eye structure, and a display device using the antireflection structure Is intended to provide.
- the inventors of the present invention have intensively studied the design of the moth-eye structure, and have come up with the idea that the design of the product can be improved by adjusting the design conditions of the moth-eye structure. That is, the design condition of the moth-eye structure directly affects the appearance of the product. For example, when the height of the moth-eye structure is changed, the reflection characteristics change, and the reflection color appears to be changed by the human eye. Therefore, the present inventors have focused on the fact that by adjusting the reflection color of the moth-eye structure, it is possible to adjust the color tone of the external appearance of the product or to give a decorative design to the external appearance of the product. .
- an industrially useful method is to provide an inverted structure of the moth-eye structure on the surface.
- This is a method for transferring a moth-eye structure to a base film using a mold having the same.
- the surface structure of the film to be produced is uniquely determined according to the surface structure of the mold used, for example, in order to form a moth-eye structure having a different height, another mold corresponding to that is used. It is necessary to produce.
- the present inventors form various moth-eye structures from one mold having a specific surface structure so that moth-eye structures having different reflection colors can be created separately without producing a plurality of types of molds.
- the inventors have come up with a method of adjusting the height of the moth-eye structure by forming a resin layer on a substrate having a moth-eye structure and adjusting the thickness of the resin layer. Specifically, if the thickness of the resin layer is increased in the concave portion of the substrate having the moth-eye structure, the height of the moth-eye structure existing on the surface of the antireflection structure can be reduced. Then, the chromatic dispersion of the moth-eye structure looks slightly reddish compared to the case where the height of the moth-eye structure is high because the reflection in the red region of visible light increases.
- an antireflection structure including a resin base material having a concavo-convex structure on the surface whose height from the bottom to the top is not more than a visible light wavelength, and a resin layer covering at least a part of the concavo-convex structure.
- the structure is an antireflection structure in which the resin layer covers the bottom of the concavo-convex structure thicker than the top of the concavo-convex structure.
- the resin layer covering part or all of the concavo-convex structure formed on the surface of the resin base material changes the height from the bottom to the top of the concavo-convex structure, that is, the height difference of the concavo-convex structure. is doing. Specifically, the resin layer covers the bottom of the uneven structure thicker than the top of the uneven structure. As a result, the height difference of the uneven structure formed on the surface of the antireflection structure is smaller than the height difference of the uneven structure formed on the surface of the resin substrate.
- the concavo-convex structure of the resin base material is referred to as a first concavo-convex structure
- the concavo-convex structure in a region covered with the resin layer in the surface of the antireflection structure is referred to as a second concavo-convex structure.
- the first concavo-convex structure serves as a base for the antireflection structure, and when the resin layer covers only a part of the first concavo-convex structure, In the region where the resin layer is formed, the concavo-convex structure 1 serves as a base for the antireflection structure, and in the region where the resin layer is not formed, the surface of the antireflection structure is formed.
- the height from the bottom to the top of the first concavo-convex structure is not more than the visible light wavelength. Specifically, it is 380 nm or less which is the lower limit value of the visible light wavelength region.
- the first concavo-convex structure corresponds to a so-called moth-eye structure, and on the surface on which the first concavo-convex structure is formed, the reflectance at the interface between the antireflection structure and the outside (for example, the air layer) is remarkably increased. Can be reduced.
- the upper limit with the preferable height from the bottom part to the top part in the said 1st uneven structure is 280 nm, and a more preferable upper limit is 200 nm.
- a preferable lower limit of the height from the bottom to the top in the first concavo-convex structure is 100 nm, and a more preferable lower limit is 150 nm. That is, the height from the bottom to the top of the first concavo-convex structure is preferably 100 nm to 380 nm, and particularly preferably 150 nm to 200 nm. In the range of 150 nm to 200 nm, the mechanical strength of the protrusions in the first concavo-convex structure can be sufficiently secured, and a sufficient effect of reducing surface reflection can be obtained.
- the first concavo-convex structure is obtained by transferring the surface structure of the mold onto the surface of the resin base material.
- the antireflection structure has the second uneven structure on at least a part of the surface. That is, the surface of the antireflection structure may have only a region where the second concavo-convex structure is disposed (region covered with the resin layer) or a region where the first concavo-convex structure is disposed ( There may be both a region not covered with the resin layer) and a region where the second uneven structure is disposed (region covered with the resin layer). In the form in which only the region where the second uneven structure is arranged on the surface of the antireflection structure, the color of the desired reflection color is adjusted on the entire surface of the antireflection structure.
- the reflected color in the region where the first concavo-convex structure is arranged is adjusted to different colors.
- the reflection color in the region where the first uneven structure is arranged may be colorless.
- the height from the bottom to the top of the second concavo-convex structure is set lower than the height from the bottom to the top of the first concavo-convex structure. That is, the second uneven structure also corresponds to a so-called moth-eye structure.
- the height from the bottom to the top in the second concavo-convex structure is the height from the bottom to the top in the first concavo-convex structure, the thickness of the resin layer filled in the bottom of the first concavo-convex structure, and the above It is determined by the thickness of the resin layer deposited on the top of the first uneven structure. However, the resin layer may not be formed on the top of the second uneven structure.
- the upper limit with the preferable height from the bottom part to the top part in the said 2nd uneven structure is 280 nm. If it exceeds 280 nm, the color of the reflected color due to the second uneven structure becomes difficult to distinguish.
- a preferred lower limit of the height from the bottom to the top in the second concavo-convex structure is 100 nm. If it is lower than 100 nm, it is difficult to sufficiently obtain the effect of reducing the surface reflection as the moth-eye structure.
- the color of the reflected color exhibited by the second uneven structure is the color of light reflected by the moth-eye structure.
- the reflectance of the moth-eye structure is very small (for example, 0.1%), the light reflected at the boundary surface between the surface on which the second uneven structure is disposed and the outside (for example, the air layer).
- the amount of is very small.
- antireflection is performed in a state where a large amount of light is transmitted from the back side of the antireflection structure (for example, a state in which the antireflection structure is provided on the display device and the display device emits display light).
- the color of what is seen through the structure does not vary greatly depending on the color of the reflected color exhibited by the second uneven structure.
- the color of the reflected color exhibited by the second concavo-convex structure is mainly observed in a state where a large amount of light is not transmitted from the back side of the antireflection structure.
- the thickness of the resin layer filled in the bottom of the first concavo-convex structure is preferably 50% or less with respect to the height from the bottom to the top in the first concavo-convex structure, more preferably 25. % To 50%.
- the surface reflection color of the region where the first uneven structure is arranged is colorless (graph in FIG. 4).
- the surface reflection color of the region where the second concavo-convex structure is arranged is colored when the height from the bottom to the top of the first concavo-convex structure is 280 nm or more. be able to. Further, even when the surface reflection color of the region where the first uneven structure is arranged is colored, the color of the surface reflection color can be changed.
- the color of the surface reflected light depends on the concavo-convex structure, and is determined by being particularly strongly influenced by the height difference.
- the reflection characteristic of the moth-eye structure is changed by the resin layer filled in the bottom of the first uneven structure.
- the surface reflection color of the region where the second uneven structure is arranged can be adjusted. This surface reflection color is related to the color of the region where the second uneven structure is arranged, and can be used for product design.
- the second uneven structure has a height difference lower than that of the first uneven structure, in other words, a portion where the bottom portion of the first uneven structure of the resin substrate is reinforced by the resin layer. Therefore, the second concavo-convex structure has improved mechanical strength and better scuff resistance than the first concavo-convex structure. Furthermore, since it becomes easy to scrape dirt that has entered between the projections of the moth-eye structure, it is possible to improve the wiping and antifouling properties of the antireflection structure.
- a layer having a uniform thickness may be formed on the surface of the resin base material.
- the layer having the uniform thickness has the same uneven structure on the surface as the uneven structure of the resin base material.
- the resin layer may cover the bottom part thicker than the top part of the same uneven structure formed on the surface of the uniform thickness layer.
- a layer having a uniform thickness may be formed on the surface of the resin layer.
- the layer having the uniform thickness has the same uneven structure as the uneven structure of the resin layer in a region where the resin layer covers the first uneven structure, and the resin layer has the uneven structure. In the area
- the height from the bottom to the top is 100 nm to 280 nm. is there. That is, the height from the bottom to the top of the second concavo-convex structure is preferably 100 nm to 280 nm.
- the thickness of the said resin layer with which the bottom part of the uneven structure of the said resin base material was filled is 280 nm or less.
- the height from the bottom to the top in the first concavo-convex structure is less than or equal to the visible light wavelength (380 nm or less), and the preferred range of the height from the bottom to the top in the second concavo-convex structure is 100 nm to 280 nm.
- the thickness of the resin layer filled in the bottom of the first uneven structure is preferably 280 nm or less.
- the resin layer is disposed 20 nm to 100 nm thicker on the bottom of the uneven structure of the resin base than on the top of the uneven structure of the resin base. That is, the difference in thickness between the bottom and top of the first concavo-convex structure of the resin layer is preferably 20 nm to 100 nm, and more preferably 20 nm to 50 nm. By changing the thickness to this extent, the reflected color of the second uneven structure can be made different from the reflected color of the first uneven structure. Note that the resin layer only needs to cover at least the bottom of the first concavo-convex structure, and may or may not be formed on the top of the first concavo-convex structure.
- the thickness of the resin layer filled in the bottom of the first concavo-convex structure is preferably 20 nm to 100 nm, more preferably 20 nm to 50 nm.
- the uneven structure on the surface of the antireflection structure has a shape different from the uneven structure of the resin base material in the region covered with the resin layer. Since the resin layer covers the bottom of the first uneven structure thicker than the top of the first uneven structure, the first uneven structure and the second uneven structure are different from each other. Become.
- the resin layer covers only a part of the first uneven structure.
- both a region where the first uneven structure is provided and a region where the second uneven structure is provided are formed on the surface of the reflective structure.
- the second concavo-convex structure constitutes only a part of the surface of the antireflection structure, and the design of the antireflection structure can be improved by the color of the reflected color. That is, it is preferable that the region provided with the first uneven structure and the region provided with the second uneven structure are recognized as regions having different reflection colors.
- the difference in reflected color is more noticeable when viewed from an oblique direction (direction tilted from the surface normal) than when viewed from the front direction (surface normal direction), and therefore from an oblique direction inclined at least 60 °. It is preferable that the reflected colors are recognized as different areas when viewed.
- the reason why the difference in reflected color is less likely to appear in the front direction than in the oblique direction is that the difference in the height of the projections of the concavo-convex structure is apparently smaller in the front direction than in the oblique direction, and the reflectance is extremely high. This is because the amount of reflected light is small because it is small, and its color is difficult to recognize.
- the thickness of the resin layer covering the first bottom of the first uneven structure is different from the thickness of the resin layer covering the second bottom of the first uneven structure.
- the height difference of the second uneven structure formed in the region covering the first bottom is different from the height difference of the second uneven structure formed in the region covering the second bottom.
- two or more regions having different reflection colors can be formed. In this example, there may be a region where the first uneven structure is provided on the surface of the reflective structure, or there may be no region where the first uneven structure is provided.
- the resin layer is not provided on the top of the first uneven structure of the resin base material.
- the resin layer in order to adjust the height from the bottom to the top of the second concavo-convex structure, it is only necessary to adjust the resin layer filled in the bottom of the first concavo-convex structure. Since it is not necessary to adjust the thickness at both the top and bottom, it is easy to adjust the thickness of the resin layer.
- the refractive index of the material of the resin layer is smaller than the refractive index of the material of the resin base material.
- the reflective structure can effectively suppress surface reflection.
- the material of the resin layer contains fluorine atoms.
- the refractive index is low and the slipping property is improved, so that the increase in the reflectance is suppressed and the abrasion resistance is also improved.
- the fluorine compound has an effect of reducing the surface energy, the transfer resin can be prevented from adhering to the mold. Since it becomes easy to scrape dirt that has entered between the protrusions of the moth-eye structure, it is possible to improve the wiping and antifouling properties of the antireflection structure.
- a fluorine compound the compound which has a fluoroalkyl group is mentioned, for example.
- the first concavo-convex structure is formed by transferring a shape peculiar to a hole formed by selectively etching a metal oxide film to the surface of the resin base material. If holes formed by selectively etching the metal oxide film are used for transfer, a uniform uneven structure can be efficiently formed.
- the hole formed at this time has a specific shape corresponding to the etching process conditions. Note that the metal oxide film can be formed by anodizing the metal film.
- the resin substrate is in the form of a film.
- the antireflection structure using a film-like resin substrate can be used as an antireflection film. That is, it can be easily attached to the surface of an article subjected to antireflection treatment, and can be used for various purposes.
- the said reflection preventing structure may use the article itself which performs an reflection preventing process as a resin base material.
- the first concavo-convex structure is formed by transferring the surface structure of the mold to the surface of the article subjected to the antireflection treatment.
- One aspect of the present invention is a display device in which the antireflection structure is disposed on a display surface.
- the antireflection structure can be applied to any object to be visually recognized, such as building materials such as window glass, water tanks, and underwater glasses, and a tool for visual recognition, and is particularly preferably used for a display device.
- an area where the resin layer of the antireflection structure does not cover the first uneven structure is disposed in a frame area of the display surface, and the resin layer of the antireflection structure is A region covering the first concavo-convex structure is disposed in the display region of the display surface.
- the frame area can generally be designed with more emphasis on design than the display area. Therefore, when the frame area is colored, the color of the display area is adjusted using the resin layer so as to match the frame area. It is conceivable to adjust slightly.
- a region where the resin layer of the antireflection structure does not cover the first uneven structure is disposed in a display region of the display surface, and the resin layer of the antireflection structure is The area covering the first concavo-convex structure may be arranged in the frame area of the display surface. In this case, it is possible to improve the design by changing the color of the frame region using the resin layer. In addition, the mechanical strength of the frame region can be increased using the resin layer.
- the said antireflection structure is affixed on the display surface. If the antireflection structure is an antireflection film, it can be easily attached to a display surface and can be applied to various display devices. Moreover, since another layer does not intervene between an antireflection film and the article which performs an antireflection process by affixing on a display surface, reflection can be suppressed effectively.
- the substrate to which the antireflection film is attached include a polarizing plate, an acrylic protective plate, a hard coat layer disposed on the surface of the polarizing plate, an antiglare layer disposed on the surface of the polarizing plate, and the like.
- the display device is a liquid crystal display (LCD), a plasma display panel (PDP), or an organic electroluminescence display (OELD). It is.
- LCD liquid crystal display
- PDP plasma display panel
- OELD organic electroluminescence display
- These display devices are thin display devices that can be used in portable information terminals, mobile phones, laptop computers, and the like, and are often used outdoors. Therefore, it is particularly effective to apply the antireflection structure. is there.
- the height of the moth-eye structure can be easily adjusted by performing resin coating on the ultra-low reflection film (moth-eye sheet) having the moth-eye structure and controlling the thickness of the resin layer. Therefore, at least one of the following advantages (1) to (5) can be obtained without recreating the mold.
- the surface reflection color can be changed by changing the height of the moth-eye structure, and a decorative function can be imparted to the moth-eye sheet. In particular, if it is used in a place where the display area sinks darkly when a television or the like is not displayed, the color tone is emphasized and the decoration effect is great.
- It can cope with the production of moth-eye sheets of a small variety and variety.
- 6 is a graph showing a change in reflectance (%) when light is incident at an incident angle of 5 ° to 60 ° with respect to a surface normal with respect to a moth-eye structure having a pitch of 200 nm and a height of 280 nm.
- 6 is a graph showing a change in reflectance (%) when light is incident at an incident angle of 5 ° to 60 ° with respect to a surface normal with respect to a moth-eye structure having a pitch of 200 nm and a height of 190 nm. It is a figure for demonstrating the reflection characteristic when light injects from the perpendicular
- (A)-(g) is a figure explaining the manufacturing method of the type
- (A)-(d) is a figure explaining the transfer process of a moth-eye structure. It is the isometric view schematic diagram which showed an example of the type
- a concavo-convex structure whose height from the bottom to the top is not more than a visible light wavelength (380 nm or less) is referred to as a “moth eye structure”.
- the moth-eye structure preferably has a shorter cycle (distance between adjacent vertices) than the lower limit (380 nm) of the visible light wavelength.
- FIG. 1 is a schematic cross-sectional view of a moth-eye structure of an antireflection structure according to Embodiment 1.
- the antireflection structure of Embodiment 1 has a transfer resin layer 11 on a base film 10, and has a concavo-convex structure (moth eye structure) on the surface of the transfer resin layer 11.
- the moth-eye structure is for reducing reflection on the surface of the antireflection structure. Since the antireflection structure of Embodiment 1 uses a film-like resin base material composed of the base film 10 and the transfer resin layer 11, the antireflection film (antireflection film), the moth eye sheet, and the moth eye Also called film. According to the moth-eye film, it is possible to reduce the surface reflection of visible light on various substrates by placing the substrate on the substrate (target article whose surface reflection is to be reduced).
- a recess of the moth-eye structure of the transfer resin layer 11 is filled with a resin layer 12.
- the height from the bottom to the top of the moth-eye structure of the antireflection structure is made lower than the height from the bottom to the top of the moth-eye structure of the transfer resin layer 11.
- the moth-eye structure of the transfer resin layer 11 has a height from the bottom to the top of 380 nm or less, and the height from the bottom to the top of the moth-eye structure of the antireflection structure is 280 nm or less.
- FIG. 1 shows an example in which the resin layer 12 is formed only on the concave portion of the moth-eye structure of the transfer resin layer 11 and the resin layer 12 is not formed on the convex portion (top) of the moth-eye structure of the transfer resin layer 11.
- the resin layer 12a is formed not only on the concave portion of the moth-eye structure of the transfer resin layer 11, but also on the convex portion (top) of the moth-eye structure of the transfer resin layer 11. May be.
- the height from the bottom to the top of the moth-eye structure of the antireflection structure is determined from the bottom of the moth-eye structure of the transfer resin layer 11.
- the film thickness of the resin layer 12a on the concave portion of the moth-eye structure of the transfer resin layer 11 is changed to the film of the resin layer a12 on the convex portion (top) of the moth-eye structure of the transfer resin layer 11. Thicker than thickness.
- the convex portion (top portion) of the moth-eye structure of the transfer resin layer 11 can be protected.
- fluorine is added to the resin layer 12a, the friction coefficient can be reduced to improve the slipperiness.
- the thing which contacted the convex part (top part) slips it can prevent more effectively that a convex part (top part) is damaged.
- the height of the convex part of the moth-eye structure of the antireflection structure can be lowered, and the depth of the concave part can be reduced. This changes the reflectance characteristics obtained from the moth-eye structure. If the height of the convex part of the moth-eye structure is 280 nm or more, the reflected light has substantially the same color as the incident light. Therefore, in a white light environment, the reflected light of the moth-eye structure is white (achromatic color).
- the reflectance of the long wavelength component of visible light tends to increase more significantly than the reflectance of the short wavelength component of visible light. For this reason, the light reflected by the surface of the moth-eye structure has a reddish color compared to the incident light although the amount is small due to the low reflection characteristics of the moth-eye structure.
- the mold Since the moth-eye structure of the transfer resin layer 11 is formed by transferring the surface structure of the mold as will be described later, the mold needs to be changed in order to change the height of the moth-eye structure. However, it is not easy to produce a mold with a very fine uneven structure uniformly distributed in a uniform size, such as a moth-eye structure. Different moth-eye structures with various sizes and patterns can be created from the viewpoint of production efficiency. It is difficult.
- the height of the moth-eye structure can be adjusted by changing the filling degree of the resin layer 12. For this reason, it is not necessary to prepare the number of molds according to the size of the desired moth-eye structure and the type of pattern, and the filling degree of the resin layer 12 may be adjusted. Therefore, it is easy to adjust the reflection color of the moth-eye structure, and a desired reflection color can be realized. By utilizing this, it is possible to adjust the reflection color of the moth-eye structure according to the object to which the moth-eye film is attached, or to provide a decorative property to the moth-eye film by providing regions having different reflection colors in the moth-eye film.
- the base film 10 is not directly related to the control of the shape of the moth-eye structure, and serves as a base when the transfer resin layer 11 is formed.
- a film having high mechanical strength and high transparency is suitable.
- the material of the base film 10 include TAC (triacetyl cellulose) and acrylic resin.
- the transfer resin layer 11 is a layer that transfers the surface structure of the mold to form a moth-eye structure.
- a material having high mechanical strength (friction resistance), transparency and releasability is suitable.
- the material of the transfer resin layer 11 include acrylic resin and polyethylene terephthalate (PET). If the transfer resin layer 11 formed by transfer is carefully examined, shape defects caused by air trapped between the mold and the resin during transfer, shape anomalies due to foreign matter adhering to the mold, and foreign matter mixed into the resin May be observed, and it can be said that these are incidental structural features caused by transcription formation.
- the resin layer 12 is preferably made of a transparent resin, but since it is a very thin layer, even a resin that is not generally classified as a transparent resin can be used.
- the refractive index of the resin layer 12 is preferably equal to or lower than that of the transfer resin layer 11 forming the moth-eye structure. This is because the resin layer 12 is interposed between the transfer resin layer 11 and the air. Therefore, in order not to lower the reflectance characteristic by the resin layer 12 (not to increase the reflectance), the transfer resin layer 11 is used. This is because it is better to make the refractive index intermediate between air and air.
- the refractive index of the resin layer 12 is Preferably it is less than 1.5.
- the refractive index of the resin layer 12 can be made lower than the refractive index of the transfer resin layer 11.
- the acrylic resin is usually prepared by appropriately blending several kinds of acrylic monomers and oligomers, if the blending is prepared so that the refractive index is lower than the acrylic resin used for the transfer resin layer 11, Even if an acrylic resin is used for both the transfer resin layer 11 and the resin layer 12, the refractive index of the resin layer 12 can be made lower than the refractive index of the transfer resin layer 11. Even if the same acrylic resin is used for both the transfer resin layer 11 and the resin layer 12, the refractive index of the resin layer 12 can be made equal to that of the transfer resin layer 11.
- the moth-eye structure is used as shown in FIG. Both the convex portion (top portion) and the concave portion (bottom portion) have a substantially uniform film thickness. For this reason, the height of the moth-eye structure does not substantially change depending on the presence or absence of the monomolecular film 101, and as a result, the reflection characteristics do not change.
- Examples of the method for forming the resin layer 12 include spin coating, gravure coating, die coating, and spraying. From the viewpoint of adjusting the degree of resin filling (resin application amount) in the recesses of the moth-eye structure, spin coating that can adjust the film thickness at the rotational speed is preferable. On the other hand, from the viewpoint of using the continuous substrate film 10, gravure coating, die coating, and the like are preferable. In this case, a resin that is a material of the resin layer is contained in a solvent, and the coating thickness is adjusted by the solid content concentration. It is desirable.
- the height of the projection of the moth-eye structure is set to 200 nm or more. If the height of the protrusion changes, the wavelength characteristic of the reflectance changes, and particularly changes significantly in the long wavelength region. When the height of the protrusion is set to about 170 nm, the reflectance of the visible red region is increased. As a result, the surface of the moth-eye film looks a little reddish.
- FIG. 4 is a graph showing the relationship (wavelength dependence of reflectance) between the wavelength (nm) of incident light and the reflectance (%) for each height of the moth-eye structure.
- the reflectance in the red region is high, indicating that the surface of the moth-eye film is reddish.
- reflection in the red region is suppressed and the color appears greenish.
- FIG. 4 it can be seen that the color reflected from the surface of the moth-eye film looks different depending on the height of the protrusions.
- the reflectivity (Y) of the protrusion having a height of 185 nm shown in FIG. 4 is 0.059%
- the reflectivity (Y) of the protrusion having a height of 210 nm is 0.057%
- the reflection of the protrusion having a height of 280 nm is reflected.
- the rate (Y) is 0.031%.
- the reflectance (%) is a Y value of the “XYZ color system (CIE 1931 color system)”. In other words, it is the Y value of the X value, Y value, and Z value of the object color due to reflection in the XYZ color system.
- the Y value is an integral value over the entire visible light region having a wavelength of 380 nm to 780 nm, and does not mean the reflectance at a specific wavelength.
- FIG. 5 is a diagram for explaining that the relationship between the wavelength (nm) of incident light and the reflectance (%) changes for each height of the moth-eye structure.
- the optical characteristics are determined by the height of the protrusion of the transfer resin layer 11 itself.
- the height of the protrusions of the moth-eye structure is the resin in the recess of the transfer resin layer 11 as in the example in the center and the right end of FIG. From the surface of the layer 12 to the tip of the protrusion of the transfer resin layer 11. For this reason, as the resin layer becomes thicker, the height of the projection of the moth-eye structure becomes lower.
- the low reflection characteristic is substantially flat in the visible light wavelength region before the resin layer is formed, the reflectance of the red region tends to increase as the thickness of the resin layer increases.
- the tip of the protrusion is filled with resin, the shape of the protrusion no longer exists and the function of the moth-eye structure does not appear.
- the graph of FIG. 4 has shown the result measured on the conditions of 5 degree regular reflection.
- the color of the reflected color varies depending on the angle from which the surface of the moth-eye film is viewed.
- the apparent height of the projection of the moth-eye structure is lowered, and the reflectance of the red region is increased. Therefore, in the moth-eye film having a protrusion having a height of 185 nm, redness is more emphasized when viewed obliquely.
- FIG. 6 and 7 has shown the result of having measured the reflectance (%) about the moth-eye film which has a protrusion of different height.
- FIG. 6 is a graph showing a change in reflectance (%) when light is incident on the moth-eye structure with a pitch of 200 nm and a height of 280 nm at an incident angle of 5 ° to 60 ° with respect to the surface normal.
- FIG. 7 is a graph showing the change in reflectance (%) when light is incident at an incident angle of 5 ° to 60 ° with respect to the surface normal for a moth-eye structure with a pitch of 200 nm and a height of 190 nm.
- the graphs in FIGS. 6 and 7 are the results of measuring the incident angle of light from the normal direction to the surface of the moth-eye film at 5 °, 30 °, 45 ° and 60 °, respectively.
- the moth-eye film has the lowest reflectivity for light incident at an angle close to vertical.
- the greater the incident angle the greater the reflectivity on the longer wavelength side. It can also be seen that the higher the protrusion height, the milder the increase in reflectance with respect to the increase in incident angle.
- FIG. 8 is a diagram for explaining the reflection characteristics when light is incident on the moth-eye structure shown in FIGS. 6 and 7 from the vertical direction
- FIG. 9 shows the moth-eye structure shown in FIGS.
- FIGS. 8 and 9 it is a figure for demonstrating the reflection characteristic when light injects from the diagonal direction.
- both the moth-eye film having a high protrusion without a resin layer and the moth-eye film having a low protrusion with a resin layer have a very high reflectance at an incident angle close to perpendicular. The difference is very small.
- the incident angle is increased, the reflectance of the moth-eye film having a low protrusion tends to be significantly increased.
- the reflectance is larger by about 2% when the resin layer is provided. Therefore, the difference in hue is recognized. Therefore, if the protrusion of the moth-eye structure is lowered by the resin layer, the color can be adjusted.
- the pitch of the projections of the moth-eye structure (the interval between adjacent projections) is preferably 380 nm or less. If the size of the pitch is sufficiently smaller than the wavelength of visible light, the size of the pitch does not affect the reflection characteristics, but if the size of the pitch approaches 380 nm, which is the lower limit of the wavelength of visible light, visible light in the short wavelength region. Becomes more susceptible. When the regularity of the arrangement of the protrusions is low, scattering occurs, and when the protrusions are arranged regularly and the regularity of the arrangement of the protrusions is high, diffraction tends to occur. In scattering, blue light with a short wavelength is easily scattered, so that the color of the moth-eye film becomes bluish. In diffraction, strong light is observed at a certain viewing angle.
- the pitch of the projections of the moth-eye structure is more preferably 200 nm or less.
- it exceeds 200 nm when the moth-eye surface is viewed from an oblique direction (around 60 ° or more) that is greatly inclined from the normal of the moth-eye surface, the moth-eye surface may appear pale and cloudy due to scattering. Thus, scattering can be sufficiently suppressed. Therefore, if the pitch is 200 nm or less, the color of the reflected light does not change due to the influence of the pitch.
- the projection shape (shape) of the moth-eye structure may slightly change the reflectance of each wavelength and affect the color of the reflected light, but the shape gradually decreases toward the tip of the projection. If present, the refractive index at the interface can be changed at a constant rate with respect to the traveling direction of light, and desired reflection characteristics can be obtained.
- the unit structure of the moth-eye structure formed on the surface of the antireflection structure has a bell shape.
- the unit structure may have a shape other than a bell shape, for example, a cone shape or a pyramid shape such as a quadrangular pyramid shape.
- FIGS. 10A to 10G illustrate a method of manufacturing a mold for transferring a moth-eye structure.
- mold (mold) for forming a moth-eye film is demonstrated below, referring FIG.
- the Al base material 21 was prepared (FIG. 10A).
- the Al base material 21 may be one in which an Al film is formed on another base material.
- the thickness of the Al film is, for example, 1.0 ⁇ m.
- a porous alumina layer 20 is formed by anodizing the surface layer portion of the Al base 21, and by etching it, a minute wavelength below the visible light wavelength order is formed.
- a large number of recesses (pores) 22a were formed in a wide range on the surface at regular intervals.
- the size of the recess 22a, the generation density, the depth of the recess 22a, and the like can be controlled by the conditions of anodization such as the formation voltage, the type of electrolyte, the concentration, and time.
- the regularity of the arrangement of the recesses 22a can be controlled by controlling the magnitude of the formation voltage in the anodic oxidation.
- porous alumina layer 20 generated in the initial stage, the arrangement of the recesses 22a tends to be disturbed. Therefore, in consideration of reproducibility, in the present embodiment, as shown in FIG.
- the porous alumina layer 20 was removed. By removing the bottom portion so as to leave only a portion having a substantially equal distance, the position where the hole is opened can be determined in the next anodizing step (FIG. 10D).
- anodic oxidation was performed again to form a porous alumina layer 20 having a recess 22a.
- the porous alumina layer 20 having the recess 22a is brought into contact with an alumina etchant and isotropically etched by a predetermined amount to enlarge the hole diameter of the recess 22a (wide). Ning).
- anodic oxidation is performed by applying a voltage of 80 V to an electrolyte solution of oxalic acid 0.6 wt% and a liquid temperature of 5 ° C. for 24 seconds, and then phosphoric acid 1 mol / L and a liquid temperature of 30 ° C. for 25 minutes. Etching was performed by dipping.
- an acidic electrolytic solution such as sulfuric acid or phosphoric acid or an alkaline electrolytic solution may be used instead of oxalic acid.
- the Al base material 21 was partially anodized again to grow the recess 22 a in the depth direction and to thicken the porous alumina layer 20.
- the porous alumina layer 20 was further contacted with an alumina etchant and further etched to further enlarge the hole diameter of the recess 22a.
- the porous alumina layer 20 having the desired recess 22a is obtained by repeating the above-described anodic oxidation step (FIG. 10D) and etching step (FIG. 10E).
- the above-described anodization and etching are alternately performed, and the anodization is performed 5 times and the etching is performed 4 times, and a mold having a conical hole with a pitch of adjacent holes of 200 nm and a depth of 380 nm is manufactured. .
- the method for manufacturing the transfer mold is not limited to the above-described method in which the anodic oxidation and etching are repeated, and for example, an electron beam drawing method or a method using laser beam interference exposure may be used.
- the material for forming the recess in the transfer mold is not limited to an Al base or an Al film.
- a glass substrate (2) a metal material such as SUS, Ni, (3) polypropylene Polyolefins of polymethylpentene, cyclic olefin polymers (typically, product names such as norbornene resins such as “ZEONOR” (manufactured by ZEON CORPORATION), product names “ARTON” (manufactured by JSR Corporation), etc.)
- resin materials such as resin, polycarbonate resin, polyethylene terephthalate, polyethylene naphthalate, and triacetyl cellulose.
- FIG. 11 ⁇ Production of moth-eye film> (A) to (d) of FIG. 11 are diagrams for explaining a transfer process of the moth-eye structure. The manufacturing method of an antireflection film will be described with reference to FIG.
- the base film 10 is prepared, the transfer resin 11 is apply
- the kind of base material is not specifically limited, For example, what uses glass, a plastics, a metal, etc. as a constituent material is mentioned.
- the transfer resin 11 is not particularly limited, but in the case of optical nanoimprint, an ultraviolet curable resin is preferably used, and examples thereof include PAK01 (manufactured by Toyo Gosei Co., Ltd.) and SU-8 (manufactured by Nippon Kayaku Co., Ltd.). It is done.
- the mold 31 produced by the above-described method is placed on the surface of the transfer resin 11 to which the moth-eye structure is imparted.
- a mold release / antifouling agent is applied to the surface of the mold 31.
- the mold 31 is pressed against the transfer resin 11, and ultraviolet rays are irradiated to cure the transfer resin 11. Thereby, the nanostructure pattern formed on the mold 31 can be transferred to the transfer resin 11.
- the antireflection film is completed through the above steps (FIG. 11D).
- FIG. 12 is a schematic perspective view showing an example of a mold for continuously transferring the moth-eye structure.
- a large number of circles ( ⁇ ) written on the surface of the mold 31 schematically represent recesses used for transferring the moth-eye structure. Since FIG. 12 is a schematic diagram, the recesses are arranged at intervals, but in an actual mold, the recesses are spread so that there is no gap.
- the roll type mold 31 include a roll type produced by cutting Al, or a type in which an aluminum film is formed on the surface of a thin sleeve tube serving as a base material.
- FIG. 13 is a schematic perspective view showing an example of a process for continuously forming a moth-eye structure on a base film.
- the manufacturing steps (a) to (d) in FIG. 13 correspond to the manufacturing steps (a) to (d) in FIG.
- the transfer resin 11 is applied to a base film (for example, a TAC film) 10 (FIG. 13A), and the transfer resin 11 is dried in a drying furnace.
- a base film for example, a TAC film
- the transfer resin 11 is dried in a drying furnace.
- the transfer resin 11 is irradiated with ultraviolet rays with an integrated light amount of 2 J / cm 2 (FIG. 13C).
- a moth-eye structure is formed on the surface of the transfer resin 11 by continuous transfer using a mold (transfer roll mold) 31 on which a reversal pattern of the moth-eye structure is formed.
- the moth-eye film before resin filling is completed by transferring the surface structure of the mold 31 by a roll-to-roll method in which the respective steps are successively performed (FIG. 13D).
- an acrylic resin not containing a solvent may be used, or an acrylic resin containing a solvent (for example, methyl ethyl ketone (MEK), methyl isobutyl ketone (MEBK), toluene) is used. Also good.
- the solid content concentration is appropriately adjusted to about 0.1 wt% to 2.0 wt%, for example.
- the solvent is usually removed in a drying oven after coating.
- the moth-eye structure is formed by a combination of embossing and ultraviolet irradiation (UV imprint), but heat and visible light may be used for curing the transfer resin 11 instead of ultraviolet rays.
- the resin is filled in the recesses of the moth-eye structure formed in the transfer resin layer 11 to form the resin layer 12.
- the method for filling the resin include spin coating, gravure coating, die coating, and spraying.
- the film thickness can be adjusted at the rotation speed.
- the resin can be contained in a solvent, and the coating thickness can be adjusted by adjusting the solid content concentration.
- the solvent for example, toluene, MEK, or MEBK can be used.
- the solid content concentration is adjusted to about 0.1 wt%, for example.
- the ink jet technology is a technology in which ink droplets (droplets) are ejected from holes (nozzles) formed in the ink reservoirs, and ink is landed on an adherend.
- ink is applied to a desired position of the adherend by ejecting ink droplets from the nozzle at a desired position while scanning a head having a plurality of nozzles.
- a piezo method As a method for ejecting ink, a piezo method, a thermal method, and the like are known. In the piezo method, whether or not ink is ejected from the nozzles is controlled depending on whether or not an electric signal for vibrating the piezo elements corresponding to the respective nozzles is input.
- the inkjet technology using a moth-eye film as an adherend and a resin as an ink it is possible to fill the resin only in a part of the recesses in the moth-eye film.
- an installation form of an inkjet apparatus the form which installs an inkjet apparatus in a film transfer line, and the form apply
- Example As an example, an example in which a resin is coated (applied) on a moth-eye film (resin substrate) is shown.
- a present Example is an example and is not necessarily limited to this.
- the reflectance characteristic shown as a result of the example in the graph of FIG. 19 is also an example of the reflectance characteristic of the antireflection structure of the present invention. Note that the color of the reflected color due to the moth-eye structure strongly depends on the height of the projection of the moth-eye structure, but also depends to some extent on the shape (shape) of the projection of the moth-eye structure. Accordingly, the reflectance characteristics of the graph of FIG. 19 are not uniquely determined only by the height of the protrusions.
- the moth-eye film is obtained by forming an acrylic UV curable resin layer having a moth-eye structure on the surface of a TAC (triacetyl cellulose) film.
- the moth-eye structure had a pitch between protrusions of about 200 nm and a protrusion height of about 200 nm.
- the refractive index of the acrylic UV curable resin layer was 1.49.
- Cytop manufactured by Asahi Glass Co., Ltd. was used as the coating resin.
- the refractive index of this resin was 1.32 and the solid content concentration was 0.5 wt%.
- As a coating method a dipping method was used, and the film was pulled up at a speed of 3 mm / sec after dipping. After pulling up, it was dried at 60 ° C. for 30 minutes and then baked at 100 ° C. for 1 hour.
- FIG. 15 is a photograph of the surface of the moth-eye structure before the resin layer is formed.
- FIG. 16 is a photograph of the surface of the moth-eye structure after resin layer formation (after firing).
- FIG. 17 is a photograph of a cross section of the moth-eye structure before the resin layer is formed.
- FIG. 18 is a photograph of a cross section of the moth-eye structure after the resin layer is formed. From FIG. 16 and FIG. 18 after application, it can be seen that the resin fills the concave portion of the moth-eye structure to a height of about 1/4 to half of the projection of the moth-eye structure. The apparent height of the projection of the moth-eye structure after resin filling was estimated to be approximately 100 nm to 150 nm.
- FIG. 19 shows the result of measuring the change in optical characteristics before and after the resin application.
- FIG. 19 is a graph showing changes in reflectance (%) depending on the presence or absence of a resin layer for each wavelength (nm).
- the graph of FIG. 19 is a result of measuring the reflectance when light is incident from a direction inclined by 5 ° from the normal line of the surface of the moth-eye film. The measurement was performed by attaching the moth-eye film on a black acrylic substrate having a refractive index of 1.5 with an adhesive having a refractive index of 1.5.
- the reflection characteristics remained low reflection because the moth-eye shape remained even after coating, but the color changed from approximately neutral (colorless) to orange as shown by the values of a * and b *. did. Note that the small value of chromaticity is derived from the fact that the reflected light is slight due to the very low reflection characteristics of the moth-eye structure.
- the antireflection structure in the present embodiment is, for example, a component of a display device (self-luminous display element, non-self-luminous display element, light source, light diffusion sheet, prism sheet, polarizing reflection sheet, phase difference Plate, polarizing plate, front plate, housing, etc.), lens, window glass, frame glass, show window, water tank, printed matter, photograph, painted article, lighting equipment, and the like. Especially, it is used suitably for a display device.
- the display device is not limited to a liquid crystal display device (LCD), and can be used for a plasma display panel (PDP), an inorganic electroluminescence (EL) display device, an organic electroluminescence (EL) display device, and the like.
- Base film 11 Transfer resin (layer) 12, 12a: Resin layer 20: Porous alumina layer 21: Al base material 22a: Concave portion 31: Mold (transfer mold) 101: Monomolecular film
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
- Liquid Crystal (AREA)
Abstract
Description
以下に本発明について詳述する。
好適な形態の一例では、上記反射防止構造体の上記樹脂層が上記第1の凹凸構造を覆っていない領域が、上記表示面の額縁領域に配置され、上記反射防止構造体の上記樹脂層が上記第1の凹凸構造を覆った領域が、上記表示面の表示領域に配置される。額縁領域は、一般に表示領域よりもデザイン性を重視した設計とすることができるので、額縁領域を着色した場合には、額縁領域と調和するように、上記樹脂層を用いて表示領域の色味を若干調整することが考えられる。
(1)モスアイ構造の高さを変えることで表面反射色を変えることができ、モスアイシートに装飾機能を付与することができる。特に、テレビ等の非表示時にその表示領域が暗く沈むような箇所に用いれば、色調が強調されるので装飾効果が大きい。
(2)少量多品種のモスアイシートの生産に対応できる。
(3)樹脂塗布によってモスアイ構造の根元部分を補強できるので、機械的強度(擦り耐性:エンピツ硬度、スチールウール耐性)を向上できる。
(4)モスアイ構造の突起高さが実質的に低くなるため、突起間に入る汚れをかき出し易くなり、拭取り性、防汚性が向上する。
(5)樹脂層の屈折率を空気の屈折率と基材の屈折率の中間値にすることにより、単に高さの低いモスアイ構造を形成する場合よりも反射率を低くすることができる。
(1)反射防止構造体の構成
図1は、実施形態1の反射防止構造体のモスアイ構造の断面模式図である。実施形態1の反射防止構造体は、基材フィルム10上に転写樹脂層11を有し、転写樹脂層11の表面に凹凸構造(モスアイ構造)を有する。モスアイ構造は、反射防止構造体の表面での反射を低減するためのものである。実施形態1の反射防止構造体は、基材フィルム10及び転写樹脂層11から構成された、フィルム状の樹脂基材を用いていることから、反射防止フィルム(反射防止膜)、モスアイシート、モスアイフィルムとも呼ばれる。モスアイフィルムによれば、基材(表面反射を低減しようとする対象物品)上に載置することにより、さまざまな基材において可視光の表面反射を低減することができる。
可視光領域の波長380nm~780nmの全体で充分な低反射特性を得る観点からは、モスアイ構造の突起の高さは200nm以上に設定される。突起の高さが変化すれば、反射率の波長特性は変化し、特に長波長領域において顕著に変化する。突起の高さを170nm位にすると、可視光の赤領域の反射率が高くなる。その結果、モスアイフィルムの表面は少し赤っぽく見えることになる。
モスアイ構造の突起を樹脂層によって低くする構成によれば、突起間に入り込んだ汚れを取り除きやすくなる。例えば、タッチパネルを有する表示装置の最表面にモスアイフィルムを配置した場合には、付着した皮脂の拭取り易さが向上する。また、モスアイ構造の突起を樹脂層によって低くする構成は、言い換えれば元々あったモスアイ構造の突起の根元を樹脂層により補強する構成であるとも言える。したがって、モスアイフィルム表面の機械的強度(耐性)の向上を図ることができる。
(4-1)モスアイ構造の転写用の型の作製
図10の(a)~(g)は、モスアイ構造を転写するための型の作製方法を説明する図である。図10を参照しながら、モスアイフィルムを形成するための型(モールド)を作製した例を以下に説明する。
図11の(a)~(d)は、モスアイ構造の転写プロセスを説明する図である。図11を参照しながら、反射防止フィルムの製造方法について説明する。
実施例として、モスアイフィルム(樹脂基材)上に樹脂をコーティング(塗布)した例を示す。なお、本実施例は一例であり、これに限定されるわけではない。図19のグラフに実施例の結果として示された反射率特性もまた、本発明の反射防止構造体が有する反射率特性の一例である。なお、モスアイ構造による反射色の色味は、モスアイ構造の突起の高さに強く依存するが、モスアイ構造の突起の形状(シェイプ)にもある程度依存する。したがって、図19のグラフの反射率特性は、突起の高さのみで一義的に決まったものではない。
一方、塗布後の波長550nmの5°正反射率は0.141%であり、Y値は0.158%であり、反射色はa*=0.857、b*=0.930であった。反射特性は、塗布後もモスアイ形状を残していたため、低反射を保っていたが、塗布によって色味は、a*及びb*の値から分かるように、略ニュートラル(無色)からオレンジ方向へ変化した。なお、色度の値が小さいのは、モスアイ構造の非常に低い反射特性により、僅かな反射光であることに由来する。
上述した実施形態における各形態は、本発明の要旨を逸脱しない範囲において適宜組み合わされてもよいし、変更されてもよい。例えば、本実施形態における反射防止構造体及び転写用型の表面形状は、モスアイ構造による凹凸を除けば、実質的に平坦であるが、陽極酸化処理の前にあらかじめサンドブラスト処理を行う等して、散乱凹凸構造を設けても構わない。
本実施形態における反射防止構造体は、例えば、表示装置の構成部材(自発光型表示素子、非自発光型表示素子、光源、光拡散シート、プリズムシート、偏光反射シート、位相差板、偏光板、前面板、筐体等)、レンズ、窓ガラス、額縁ガラス、ショウウインドウ、水槽、印刷物、写真、塗装物品、照明機器等に対して用いることができる。中でも、表示装置に好適に用いられる。表示装置としては、液晶表示装置(LCD)に限定されず、プラズマ・ディスプレイ・パネル(PDP)、無機エレクトロルミネッセンス(EL)表示装置、有機エレクトロルミネッセンス(EL)表示装置等に用いることができる。
11:転写樹脂(層)
12、12a:樹脂層
20:ポーラスアルミナ層
21:Al基材
22a:凹部
31:モールド(転写用型)
101:単分子膜
Claims (16)
- 底部から頂部までの高さが可視光波長以下である凹凸構造を表面に有する樹脂基材、及び、上記凹凸構造の少なくとも一部を覆う樹脂層を有する反射防止構造体であって、
上記樹脂層は、上記凹凸構造の頂部よりも上記凹凸構造の底部を厚く覆っていることを特徴とする反射防止構造体。 - 上記樹脂基材の凹凸構造が上記樹脂層で覆われて形成された、上記反射防止構造体の表面の凹凸構造では、底部から頂部までの高さが100nm~280nmであることを特徴とする請求項1に記載の反射防止構造体。
- 上記樹脂基材の凹凸構造の底部に充填された上記樹脂層の厚みは、280nm以下であることを特徴とする請求項1又は2に記載の反射防止構造体。
- 上記樹脂基材の凹凸構造の底部には、上記樹脂基材の凹凸構造の頂部上よりも、上記樹脂層が20nm~100nm厚く配置されていることを特徴とする請求項1~3のいずれかに記載の反射防止構造体。
- 上記反射防止構造体の表面の凹凸構造は、上記樹脂層で覆われた領域において、上記樹脂基材の凹凸構造とは異なる形状を有することを特徴とする請求項1~4のいずれかに記載の反射防止構造体。
- 上記樹脂層は、上記凹凸構造の一部のみを覆っていることを特徴とする請求項1~5のいずれかに記載の反射防止構造体。
- 上記凹凸構造の第1の底部を覆う上記樹脂層の厚みと、上記凹凸構造の第2の底部を覆う上記樹脂層の厚みとが異なることを特徴とする請求項1~6のいずれかに記載の反射防止構造体。
- 上記樹脂層は、上記樹脂基材の凹凸構造の頂部に設けられていないことを特徴とする請求項1~7のいずれかに記載の反射防止構造体。
- 上記樹脂層の材質の屈折率は、上記樹脂基材の材質の屈折率よりも小さいことを特徴とする請求項1~8のいずれかに記載の反射防止構造体。
- 上記樹脂層の材質は、フッ素原子を含むことを特徴とする請求項1~9のいずれかに記載の反射防止構造体。
- 上記凹凸構造は、酸化金属膜を選択的にエッチングして形成した穴に特有の形状を上記樹脂基材の表面に転写して形成したものであることを特徴とする請求項1~10のいずれかに記載の反射防止構造体。
- 上記樹脂基材は、フィルム状であることを特徴とする請求項1~11のいずれかに記載の反射防止構造体。
- 請求項1~12のいずれかに記載の反射防止構造体を表示面に配置したことを特徴とする表示装置。
- 上記反射防止構造体の上記樹脂層が上記凹凸構造を覆っていない領域が、上記表示面の額縁領域に配置され、上記反射防止構造体の上記樹脂層が上記凹凸構造を覆った領域が、上記表示面の表示領域に配置されたことを特徴とする請求項13記載の表示装置。
- 上記反射防止構造体が表示面に貼り付けられたものであることを特徴とする請求項13又は14記載の表示装置。
- 前記表示装置は、液晶表示装置、プラズマ・ディスプレイ・パネル、又は、有機エレクトロルミネッセンス表示装置であることを特徴とする請求項13~15のいずれかに記載の表示装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/409,159 US9784889B2 (en) | 2012-06-22 | 2013-06-14 | Antireflection structure and display device |
CN201380032292.0A CN104395783B (zh) | 2012-06-22 | 2013-06-14 | 防反射结构体和显示装置 |
JP2014521420A JP5947379B2 (ja) | 2012-06-22 | 2013-06-14 | 反射防止構造体、その製造方法及び表示装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012141318 | 2012-06-22 | ||
JP2012-141318 | 2012-06-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2013191092A1 true WO2013191092A1 (ja) | 2013-12-27 |
Family
ID=49768689
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2013/066429 WO2013191092A1 (ja) | 2012-06-22 | 2013-06-14 | 反射防止構造体及び表示装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US9784889B2 (ja) |
JP (1) | JP5947379B2 (ja) |
WO (1) | WO2013191092A1 (ja) |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015138042A (ja) * | 2014-01-20 | 2015-07-30 | 大日本印刷株式会社 | 表示体 |
WO2015136733A1 (ja) * | 2014-03-14 | 2015-09-17 | シャープ株式会社 | 光学素子及び表示装置 |
JP5788128B1 (ja) * | 2014-04-22 | 2015-09-30 | シャープ株式会社 | 殺菌作用を備えた表面を有する合成高分子膜、合成高分子膜を有する積層体、合成高分子膜の表面を用いた殺菌方法および合成高分子膜の表面の再活性化方法 |
WO2015163180A1 (ja) * | 2014-04-21 | 2015-10-29 | シャープ株式会社 | 積層印刷物 |
JPWO2013191091A1 (ja) * | 2012-06-22 | 2016-05-26 | シャープ株式会社 | 反射防止構造体、転写用型、これらの製造方法、及び、表示装置 |
WO2016104421A1 (ja) * | 2014-12-25 | 2016-06-30 | シャープ株式会社 | 食品を保存する方法、食品用フィルム、食品用容器および食品を取り扱う方法 |
JP2017083794A (ja) * | 2015-10-30 | 2017-05-18 | デクセリアルズ株式会社 | 光学体、および表示装置 |
JP2018124595A (ja) * | 2018-05-21 | 2018-08-09 | デクセリアルズ株式会社 | 反射防止構造体 |
US10071175B2 (en) | 2014-04-28 | 2018-09-11 | Sharp Kabushiki Kaisha | Filter and container having microbicidal activity |
US10251393B2 (en) | 2014-11-20 | 2019-04-09 | Sharp Kabushiki Kaisha | Synthetic polymer film having surface provided with bactericidal activity |
US10375953B2 (en) | 2015-07-17 | 2019-08-13 | Sharp Kabushiki Kaisha | Synthetic polymer film having surface that is provided with bactericidal action, and film comprising same |
WO2019187512A1 (ja) * | 2018-03-27 | 2019-10-03 | 富士フイルム株式会社 | 透光部材、画像表示装置および時計 |
JP2020044700A (ja) * | 2018-09-19 | 2020-03-26 | 日産自動車株式会社 | 撥水撥油構造体 |
US10907019B2 (en) | 2015-06-23 | 2021-02-02 | Sharp Kabushiki Kaisha | Synthetic polymer film provided with surface having sterilizing activity |
WO2021020159A1 (ja) * | 2019-07-31 | 2021-02-04 | ソニー株式会社 | 医療用観察システム及び表示装置 |
US10934405B2 (en) | 2018-03-15 | 2021-03-02 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, plastic product which includes synthetic polymer film, sterilization method with use of surface of synthetic polymer film, photocurable resin composition, and manufacturing method of synthetic polymer film |
US10968292B2 (en) | 2017-09-26 | 2021-04-06 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, photocurable resin composition, manufacturing method of synthetic polymer film, and sterilization method with use of surface of synthetic polymer film |
US11364673B2 (en) | 2018-02-21 | 2022-06-21 | Sharp Kabushiki Kaisha | Synthetic polymer film and production method of synthetic polymer film |
KR20230023216A (ko) * | 2021-08-10 | 2023-02-17 | (주) 제이피이 | 나노패턴을 이용한 색변환 인테리어 필름 및 이의 제조방법 |
US11883999B2 (en) | 2015-09-17 | 2024-01-30 | Sharp Kabushiki Kaisha | Synthetic polymer film provided with surface having sterilizing effect, method for manufacturing synthetic polymer film and sterilization method using surface of synthetic polymer film |
JP7510640B2 (ja) | 2019-12-17 | 2024-07-04 | 国立研究開発法人産業技術総合研究所 | 反射防止構造体、及びその製造方法 |
US12135476B2 (en) | 2019-07-31 | 2024-11-05 | Sony Group Corporation | Medical observation system and display device |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104991680A (zh) * | 2015-08-05 | 2015-10-21 | 信利光电股份有限公司 | 一种触摸屏 |
US10684397B2 (en) * | 2015-09-08 | 2020-06-16 | Apple Inc. | Refractive coatings for a colored surface of an electronic device |
JP6931740B2 (ja) * | 2018-03-28 | 2021-09-08 | 富士フイルム株式会社 | 黒色構造体、ならびにそれを備えた自発光画像表示装置 |
JP7057431B2 (ja) * | 2018-09-28 | 2022-04-19 | 富士フイルム株式会社 | Ledディスプレイのフロント部材、及び、その製造方法 |
CN111016519B (zh) * | 2018-10-10 | 2024-10-25 | 浙江锦美材料科技有限公司 | 装饰膜 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07294706A (ja) * | 1994-04-28 | 1995-11-10 | Matsushita Electric Ind Co Ltd | 反射防止パネルとレンズと保護膜の形成方法 |
JP2008165212A (ja) * | 2006-12-05 | 2008-07-17 | Semiconductor Energy Lab Co Ltd | 反射防止フィルム及び表示装置 |
WO2009144970A1 (ja) * | 2008-05-27 | 2009-12-03 | シャープ株式会社 | 反射防止膜及び表示装置 |
JP2012063393A (ja) * | 2010-09-14 | 2012-03-29 | Canon Inc | 光学素子および、それを有する光学装置 |
JP2013041027A (ja) * | 2011-08-12 | 2013-02-28 | Canon Electronics Inc | 光学フィルタ |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000071290A (ja) | 1998-08-28 | 2000-03-07 | Teijin Ltd | 反射防止物品の製造方法 |
JP2003172808A (ja) | 2001-12-06 | 2003-06-20 | Hitachi Maxell Ltd | 超撥水性プラスチック基板及び反射防止膜 |
JP2007076242A (ja) | 2005-09-15 | 2007-03-29 | Fujifilm Corp | 保護フィルム |
JP2007187868A (ja) | 2006-01-13 | 2007-07-26 | Nissan Motor Co Ltd | 濡れ制御性反射防止光学構造体及び自動車用ウインドウガラス |
WO2008001662A1 (fr) * | 2006-06-30 | 2008-01-03 | Panasonic Corporation | Élément optique et dispositif optique le comprenant |
JP2010044184A (ja) | 2008-08-12 | 2010-02-25 | Mitsubishi Rayon Co Ltd | 透明成形体 |
JP4678437B2 (ja) | 2008-12-29 | 2011-04-27 | ソニー株式会社 | 光学素子およびその製造方法、ならびに表示装置 |
JP5630635B2 (ja) | 2009-03-06 | 2014-11-26 | 日産自動車株式会社 | 微細構造体、その製造方法、及び該微細構造体を用いた自動車部品 |
JP4626721B1 (ja) | 2009-09-02 | 2011-02-09 | ソニー株式会社 | 透明導電性電極、タッチパネル、情報入力装置、および表示装置 |
TWI467214B (zh) | 2009-09-02 | 2015-01-01 | Dexerials Corp | A conductive optical element, a touch panel, an information input device, a display device, a solar cell, and a conductive optical element |
JP5440165B2 (ja) | 2009-12-28 | 2014-03-12 | デクセリアルズ株式会社 | 導電性光学素子、タッチパネル、および液晶表示装置 |
JP2011167924A (ja) | 2010-02-18 | 2011-09-01 | Kanagawa Acad Of Sci & Technol | 低反射導電性表面を有する材料およびその製造方法 |
-
2013
- 2013-06-14 WO PCT/JP2013/066429 patent/WO2013191092A1/ja active Application Filing
- 2013-06-14 US US14/409,159 patent/US9784889B2/en active Active
- 2013-06-14 JP JP2014521420A patent/JP5947379B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07294706A (ja) * | 1994-04-28 | 1995-11-10 | Matsushita Electric Ind Co Ltd | 反射防止パネルとレンズと保護膜の形成方法 |
JP2008165212A (ja) * | 2006-12-05 | 2008-07-17 | Semiconductor Energy Lab Co Ltd | 反射防止フィルム及び表示装置 |
WO2009144970A1 (ja) * | 2008-05-27 | 2009-12-03 | シャープ株式会社 | 反射防止膜及び表示装置 |
JP2012063393A (ja) * | 2010-09-14 | 2012-03-29 | Canon Inc | 光学素子および、それを有する光学装置 |
JP2013041027A (ja) * | 2011-08-12 | 2013-02-28 | Canon Electronics Inc | 光学フィルタ |
Cited By (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2013191091A1 (ja) * | 2012-06-22 | 2016-05-26 | シャープ株式会社 | 反射防止構造体、転写用型、これらの製造方法、及び、表示装置 |
JP2015138042A (ja) * | 2014-01-20 | 2015-07-30 | 大日本印刷株式会社 | 表示体 |
WO2015136733A1 (ja) * | 2014-03-14 | 2015-09-17 | シャープ株式会社 | 光学素子及び表示装置 |
US9713935B2 (en) | 2014-04-21 | 2017-07-25 | Sharp Kabushiki Kaisha | Laminated printed matter |
WO2015163180A1 (ja) * | 2014-04-21 | 2015-10-29 | シャープ株式会社 | 積層印刷物 |
JPWO2015163180A1 (ja) * | 2014-04-21 | 2017-04-13 | シャープ株式会社 | 積層印刷物 |
JP2019007022A (ja) * | 2014-04-22 | 2019-01-17 | シャープ株式会社 | 合成高分子膜の表面処理方法 |
US10136638B2 (en) | 2014-04-22 | 2018-11-27 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, multilayer structure having synthetic polymer film, sterilization method with the use of surface of synthetic polymer film, method for reactivating surface of synthetic polymer film, mold for production of synthetic polymer film, and mold manufacturing method |
JP2016120478A (ja) * | 2014-04-22 | 2016-07-07 | シャープ株式会社 | 殺菌作用を備えた表面を有する合成高分子膜、合成高分子膜を有する積層体、合成高分子膜の表面を用いた殺菌方法、合成高分子膜の表面の再活性化方法、合成高分子膜を製造するための型および型の製造方法 |
CN105209238A (zh) * | 2014-04-22 | 2015-12-30 | 夏普株式会社 | 具有具备杀菌作用的表面的合成高分子膜、具有合成高分子膜的层叠体、使用了合成高分子膜的表面的杀菌方法、合成高分子膜的表面的再活化方法、用于制造合成高分子膜的模具以及模具的制造方法 |
US11638423B2 (en) | 2014-04-22 | 2023-05-02 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, multilayer structure having synthetic polymer film, sterilization method with the use of surface of synthetic polymer film, method for reactivating surface of synthetic polymer film, mold for production of synthetic polymer film, and mold manufacturing method |
WO2015163018A1 (ja) * | 2014-04-22 | 2015-10-29 | シャープ株式会社 | 殺菌作用を備えた表面を有する合成高分子膜、合成高分子膜を有する積層体、合成高分子膜の表面を用いた殺菌方法、合成高分子膜の表面の再活性化方法、合成高分子膜を製造するための型および型の製造方法 |
US9781924B2 (en) | 2014-04-22 | 2017-10-10 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, multilayer structure having synthetic polymer film, sterilization method with the use of surface of synthetic polymer film, method for reactivating surface of synthetic polymer film, mold for production of synthetic polymer film, and mold manufacturing method |
US9781925B2 (en) | 2014-04-22 | 2017-10-10 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, multilayer structure having synthetic polymer film, sterilization method with the use of surface of synthetic polymer film, method for reactivating surface of synthetic polymer film, mold for production of synthetic polymer film, and mold manufacturing method |
US9781926B2 (en) | 2014-04-22 | 2017-10-10 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, multilayer structure having synthetic polymer film, sterilization method with the use of surface of synthetic polymer film, method for reactivating surface of synthetic polymer film, mold for production of synthetic polymer film, and mold manufacturing method |
TWI613237B (zh) * | 2014-04-22 | 2018-02-01 | 夏普股份有限公司 | 具有具備殺菌作用之表面之合成高分子膜、具有合成高分子膜之積層體、使用合成高分子膜之表面之殺菌方法及合成高分子膜之表面之再活性化之方法 |
CN107914384A (zh) * | 2014-04-22 | 2018-04-17 | 夏普株式会社 | 合成高分子膜及其表面的再活化方法、层叠体、杀菌方法 |
JP6359787B1 (ja) * | 2014-04-22 | 2018-07-18 | シャープ株式会社 | 合成高分子膜を有するフィルム、合成高分子膜を有する積層体、フィルムの表面を用いた殺菌方法およびフィルムの表面の再活性化方法 |
US11641854B2 (en) | 2014-04-22 | 2023-05-09 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, multilayer structure having synthetic polymer film, sterilization method with the use of surface of synthetic polymer film, method for reactivating surface of synthetic polymer film, mold for production of synthetic polymer film, and mold manufacturing method |
CN105209238B (zh) * | 2014-04-22 | 2018-08-10 | 夏普株式会社 | 合成高分子膜、具有合成高分子膜的层叠体、杀菌方法及合成高分子膜的表面的再活化方法 |
CN107914384B (zh) * | 2014-04-22 | 2020-03-06 | 夏普株式会社 | 合成高分子膜及其表面的再活化方法、层叠体、杀菌方法 |
JP6420931B1 (ja) * | 2014-04-22 | 2018-11-07 | シャープ株式会社 | 合成高分子膜の表面処理方法 |
JP2018183996A (ja) * | 2014-04-22 | 2018-11-22 | シャープ株式会社 | 合成高分子膜を有するフィルム、合成高分子膜を有する積層体、フィルムの表面を用いた殺菌方法およびフィルムの表面の再活性化方法 |
TWI666103B (zh) * | 2014-04-22 | 2019-07-21 | 日商夏普股份有限公司 | 具有具備殺菌作用之表面之合成高分子膜、具有合成高分子膜之積層體、使用合成高分子膜之表面之殺菌方法及合成高分子膜之表面之再活性化之方法 |
CN108990977A (zh) * | 2014-04-22 | 2018-12-14 | 夏普株式会社 | 膜、层叠体、杀菌方法以及膜的表面的再活化方法 |
JP6453517B1 (ja) * | 2014-04-22 | 2019-01-16 | シャープ株式会社 | 合成高分子膜、合成高分子膜を有する積層体、合成高分子膜の表面を用いた殺菌方法および合成高分子膜の表面の再活性化方法 |
JP5788128B1 (ja) * | 2014-04-22 | 2015-09-30 | シャープ株式会社 | 殺菌作用を備えた表面を有する合成高分子膜、合成高分子膜を有する積層体、合成高分子膜の表面を用いた殺菌方法および合成高分子膜の表面の再活性化方法 |
JP2019035081A (ja) * | 2014-04-22 | 2019-03-07 | シャープ株式会社 | 合成高分子膜、合成高分子膜を有する積層体、合成高分子膜の表面を用いた殺菌方法および合成高分子膜の表面の再活性化方法 |
JP2019073710A (ja) * | 2014-04-22 | 2019-05-16 | シャープ株式会社 | 合成高分子膜、合成高分子膜を有する積層体、合成高分子膜を有するフィルム、合成高分子膜の表面を用いた殺菌方法および合成高分子膜の表面の再活性化方法 |
US10278387B2 (en) | 2014-04-22 | 2019-05-07 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, multilayer structure having synthetic polymer film, sterilization method with the use of surface of synthetic polymer film, method for reactivating surface of synthetic polymer film, mold for production of synthetic polymer film, and mold manufacturing method |
US10071175B2 (en) | 2014-04-28 | 2018-09-11 | Sharp Kabushiki Kaisha | Filter and container having microbicidal activity |
US10251393B2 (en) | 2014-11-20 | 2019-04-09 | Sharp Kabushiki Kaisha | Synthetic polymer film having surface provided with bactericidal activity |
WO2016104421A1 (ja) * | 2014-12-25 | 2016-06-30 | シャープ株式会社 | 食品を保存する方法、食品用フィルム、食品用容器および食品を取り扱う方法 |
US10980255B2 (en) | 2014-12-25 | 2021-04-20 | Sharp Kabushiki Kaisha | Food preservation method, food film, food container, and food handling method |
US10907019B2 (en) | 2015-06-23 | 2021-02-02 | Sharp Kabushiki Kaisha | Synthetic polymer film provided with surface having sterilizing activity |
US10375953B2 (en) | 2015-07-17 | 2019-08-13 | Sharp Kabushiki Kaisha | Synthetic polymer film having surface that is provided with bactericidal action, and film comprising same |
US11883999B2 (en) | 2015-09-17 | 2024-01-30 | Sharp Kabushiki Kaisha | Synthetic polymer film provided with surface having sterilizing effect, method for manufacturing synthetic polymer film and sterilization method using surface of synthetic polymer film |
US11789182B2 (en) | 2015-10-30 | 2023-10-17 | Dexerials Corporation | Micro concave-convex structure for optical body and display device |
JP2017083794A (ja) * | 2015-10-30 | 2017-05-18 | デクセリアルズ株式会社 | 光学体、および表示装置 |
US11307328B2 (en) | 2015-10-30 | 2022-04-19 | Dexerials Corporation | Micro concave-convex structure for optical body and display device |
US10968292B2 (en) | 2017-09-26 | 2021-04-06 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, photocurable resin composition, manufacturing method of synthetic polymer film, and sterilization method with use of surface of synthetic polymer film |
US11364673B2 (en) | 2018-02-21 | 2022-06-21 | Sharp Kabushiki Kaisha | Synthetic polymer film and production method of synthetic polymer film |
US10934405B2 (en) | 2018-03-15 | 2021-03-02 | Sharp Kabushiki Kaisha | Synthetic polymer film whose surface has microbicidal activity, plastic product which includes synthetic polymer film, sterilization method with use of surface of synthetic polymer film, photocurable resin composition, and manufacturing method of synthetic polymer film |
JPWO2019187512A1 (ja) * | 2018-03-27 | 2020-12-03 | 富士フイルム株式会社 | 透光部材、画像表示装置および時計 |
WO2019187512A1 (ja) * | 2018-03-27 | 2019-10-03 | 富士フイルム株式会社 | 透光部材、画像表示装置および時計 |
JP2018124595A (ja) * | 2018-05-21 | 2018-08-09 | デクセリアルズ株式会社 | 反射防止構造体 |
JP7078899B2 (ja) | 2018-09-19 | 2022-06-01 | 日産自動車株式会社 | 撥水撥油構造体 |
JP2020044700A (ja) * | 2018-09-19 | 2020-03-26 | 日産自動車株式会社 | 撥水撥油構造体 |
WO2021020159A1 (ja) * | 2019-07-31 | 2021-02-04 | ソニー株式会社 | 医療用観察システム及び表示装置 |
US12135476B2 (en) | 2019-07-31 | 2024-11-05 | Sony Group Corporation | Medical observation system and display device |
JP7510640B2 (ja) | 2019-12-17 | 2024-07-04 | 国立研究開発法人産業技術総合研究所 | 反射防止構造体、及びその製造方法 |
KR20230023216A (ko) * | 2021-08-10 | 2023-02-17 | (주) 제이피이 | 나노패턴을 이용한 색변환 인테리어 필름 및 이의 제조방법 |
KR102696144B1 (ko) * | 2021-08-10 | 2024-08-20 | (주) 제이피이 | 나노패턴을 이용한 색변환 인테리어 필름 및 이의 제조방법 |
Also Published As
Publication number | Publication date |
---|---|
CN104395783A (zh) | 2015-03-04 |
US9784889B2 (en) | 2017-10-10 |
JP5947379B2 (ja) | 2016-07-06 |
US20150177420A1 (en) | 2015-06-25 |
JPWO2013191092A1 (ja) | 2016-05-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5947379B2 (ja) | 反射防止構造体、その製造方法及び表示装置 | |
CN106030349B (zh) | 层积体的制造方法、层积体、偏振片、图像显示装置和图像显示装置的可见性改善方法 | |
TWI624697B (zh) | 積層膜及其製造方法、觸控面板裝置、圖像顯示裝置以及行動設備 | |
CN102869506B (zh) | 光学层积体、光学层积体的制造方法、偏振片和图像显示装置 | |
CN100501453C (zh) | 减反射层积膜和使用该减反射层积膜的显示装置 | |
JP2000071290A (ja) | 反射防止物品の製造方法 | |
KR20120109525A (ko) | 광학 적층체 및 광학 적층체의 제조 방법 | |
EP3211458B1 (en) | Optical element, optical composite element, and optical composite element having attached protective film | |
WO2011016270A1 (ja) | 板状部材及び観察窓付き構造物 | |
JP2010044184A (ja) | 透明成形体 | |
JP2007038447A (ja) | 反射防止積層体、光学部材および液晶表示素子 | |
JP2009075354A (ja) | 光学積層体、偏光板、及び、画像表示装置 | |
US20160313474A1 (en) | Anti-reflective structure and method for designing same | |
JP2007078780A (ja) | 光学物品およびその製造方法 | |
JP2012159598A (ja) | 光学部材及び表示パネル | |
WO2015071943A1 (ja) | 光学フィルムおよびその作製方法 | |
JP2004012657A (ja) | 反射防止フィルム | |
JP6164120B2 (ja) | 反射防止膜付き基材および物品 | |
CN104395783B (zh) | 防反射结构体和显示装置 | |
JP2006264221A (ja) | 防眩性反射防止フィルムの製造方法 | |
JP6686884B2 (ja) | 積層体 | |
JP2010056520A (ja) | 光学フィルタおよびその製造方法 | |
JP2007062102A (ja) | 防眩性フィルム及びその製造方法 | |
KR101769183B1 (ko) | 금속층을 포함하는 전도성 필름의 제조방법 및 이를 이용하여 제조된 전도성 필름 | |
JP2014071220A (ja) | 絵柄付きフィルム及び表示体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 13806212 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2014521420 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14409159 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 13806212 Country of ref document: EP Kind code of ref document: A1 |