WO2013080885A1 - ガラス板の研磨装置 - Google Patents
ガラス板の研磨装置 Download PDFInfo
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- WO2013080885A1 WO2013080885A1 PCT/JP2012/080306 JP2012080306W WO2013080885A1 WO 2013080885 A1 WO2013080885 A1 WO 2013080885A1 JP 2012080306 W JP2012080306 W JP 2012080306W WO 2013080885 A1 WO2013080885 A1 WO 2013080885A1
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- WIPO (PCT)
- Prior art keywords
- polishing
- glass plate
- polishing pad
- hardness
- pad
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
Definitions
- the present invention relates to a glass plate polishing apparatus.
- Patent Documents 1 and 2 An apparatus for producing a glass plate by a float method for producing a glass plate by pouring molten glass onto a molten tin bath is disclosed in Patent Documents 1 and 2 and the like.
- a polishing apparatus that polishes a glass plate manufactured by a float method onto a glass substrate for FPD (Flat Panel Display) such as a liquid crystal display or a plasma display has been conventionally known.
- FPD Full Panel Display
- a glass plate manufactured by the float method has minute irregularities and undulations (swells with a maximum height of 0.3 ⁇ m at a pitch of 3 to 30 mm) and scratches on the surface. Swelling and scratches cause distortion and uneven color in the image. For this reason, it is necessary to remove minute irregularities, undulations and scratches with a polishing apparatus.
- the polishing apparatus disclosed in Patent Document 3 presses the glass plate held by the glass holding member against the polishing pad attached to the platen, and relatively moves the platen and the glass holding member, It removes minute irregularities and undulations on the glass plate.
- Patent Document 4 includes two steps for polishing a glass plate, and smoothes the surface of the glass plate using a polishing pad made of a resin having a high hardness (70 to 80 degrees) in the previous rough polishing step. Thereafter, a technique for polishing and removing scratches existing on the surface of the glass plate using a polishing pad made of resin having a low hardness (20 degrees) in a subsequent precision polishing step is disclosed. That is, in a conventional glass plate polishing apparatus, after removing minute irregularities and undulations of a glass plate using a hard resin polishing pad, the polishing rate is increased by using a soft resin polishing pad, and the scratches are removed. It is generally practiced to remove.
- Patent Document 5 discloses that the hard resin polishing pad is made of urethane and the soft resin polishing pad is made of foamed urethane.
- the present invention has been made in view of such circumstances, and an object thereof is to provide a glass plate polishing apparatus capable of improving the polishing efficiency.
- the present invention provides a glass plate polishing apparatus for polishing a glass plate with a resin polishing pad, wherein the resin density of the polishing pad is 0.7 g / cm 3 or more, and ISO7619 According to the present invention, there is provided a glass plate polishing apparatus characterized by having an equivalent A hardness of 80 or more.
- the A hardness of the polishing pad is 90 or less.
- the resin density of the polishing pad is 0.9 g / cm 3 or less.
- the resin is preferably polyurethane.
- a polyurethane of a soft resin is preferable in order to exhibit the ability to suppress scratches.
- the A hardness of the resin requires 80 or more.
- a soft resin is used as a polishing pad, and the density of the soft resin is set to 0.7 g / cm 3 or more, whereby the A hardness is set to 80 or more.
- the glass plate can be polished by the polishing pad having both the flattening ability and the scratch suppressing ability, so that the processing time spent in the precision polishing step by the subsequent polishing pad having only the scratch suppressing ability is reduced. Can be shortened. Therefore, according to the glass plate polishing apparatus of the present invention, the polishing efficiency can be improved.
- the flaw suppression ability is further improved.
- the upper limit of the density of the resin is 0.9 g / cm 3 .
- the present invention is also a glass plate polished by the polishing apparatus, wherein the polishing surface of the glass plate has 100 or less scratches having a depth of 0.1 ⁇ m or more, a width of 2 ⁇ m or more, and a length of 5 ⁇ m or more. Regarding the board.
- the waviness height of the polished surface after polishing when the waviness height of the polished surface before polishing is 0.02 ⁇ m and the waviness pitch is P with a polishing amount of 1 ⁇ m is defined as H.
- H / P is preferably 1.6 ⁇ 10 ⁇ 6 or less.
- the polishing efficiency can be improved because the glass plate can be polished with the polishing pad having both the flattening ability and the scratch suppressing ability.
- FIG. 1 is a perspective view showing an overall configuration of a polishing apparatus to which a polishing pad of an embodiment is applied.
- FIG. 2 is a side view of the polishing apparatus shown in FIG.
- FIG. 1 is a table showing a list of densities and A hardnesses of polishing pads 1 to 18;
- FIG. 3 is a table showing the correlation between the density of 1 to 18 and the A hardness.
- FIG. 5 is an explanatory diagram used for explaining a method for evaluating the planarization ability of the polishing pad.
- FIG. 6 is a table summarizing the relationship between the number of scratches and H / P in one glass plate of a predetermined size.
- FIG. 1 is a perspective view showing an overall configuration of a glass plate polishing apparatus 10 according to an embodiment.
- FIG. 2 is a side view of the polishing apparatus 10 shown in FIG.
- the polishing apparatus 10 shown in these figures is a glass plate G manufactured by a float process, and is, for example, a rectangular glass plate G having a thickness of 1.1 mm or less and a side length of 300 mm or more.
- the surface is polished to a flatness required for the FPD glass substrate using a resin polishing pad 26. That is, the polishing apparatus 10 polishes the polished surface of the glass plate G where the undulation having a maximum height of 0.3 ⁇ m exists at a pitch of 3 to 30 mm, and the maximum height of the undulation is reduced to 0.05 ⁇ m or less.
- this is an apparatus for producing an optimum glass plate as a glass substrate for FPD that does not give distortion or color unevenness to the image.
- the measuring method of the said waviness is a method of JISB0601: 2001.
- the polishing amount for setting the maximum height of the waviness to 0.05 ⁇ m or less is determined according to the hardness of the polishing pad 26. The higher the hardness of the polishing pad 26, the higher the flattening ability. Therefore, at least the maximum height of the waviness can be reduced with the polishing amount. Further, the lower the hardness of a single resin that is the material of the polishing pad 26, the more effective the flaw suppression ability. The polishing pad 26 will be described later.
- the polishing apparatus 10 includes a polishing head 12 and a surface plate 14.
- the polishing head 12 is provided with a glass holding member 16 that holds the non-polished surface of the glass plate G, a glass holding surface plate 20 to which the glass holding member 16 is attached via a sealing material 18, and a glass holding surface plate 20.
- a carrier 22 is provided.
- a rotation shaft 24 is fixed to the carrier 22, and the rotation shaft 24 rotates about the rotation axis P 1 that is the center of the rotation, whereby the polishing head 12 rotates and the rotation shaft 24 rotates about the revolution axis P 2.
- the polishing head 12 rotates and revolves by revolving around the center.
- the air chamber 23 of the carrier 22 is supplied with compressed air from an air pump (not shown) via a hollow rotating shaft 24, and the pressure of the compressed air is applied to the glass holding surface plate 20, the sealing material 18, and the glass holding. It is transmitted to the glass plate G through the member 16.
- the surface plate 14 includes a polishing pad 26 and a polishing pad holding surface plate 30 to which the polishing pad 26 is attached via a sealing material 28, and the surface of the polishing pad 26 and the polishing surface of the glass plate G face each other.
- the sealing material 28 is a resin-made sealing material (for example, made of polyurethane) that is soft and improves adsorption retention.
- the polishing pad holding surface plate 30 may be swingable in the in-plane direction of the surface of the polishing pad 26.
- the polishing apparatus 10 of the embodiment presses the polishing surface of the glass plate G against the polishing pad 26 with a uniform pressure by the pressure of the compressed air, and rotates and revolves the polishing head 12 to thereby rotate the glass plate G. Polish the polished surface.
- the polishing apparatus 10 of the embodiment exemplifies a polishing apparatus that polishes the glass plate G with one polishing pad 26 and uses compressed air (pressurized fluid).
- the polishing apparatus of the present invention is the above polishing apparatus. It is not limited to 10.
- the present invention can also be applied to a continuous polishing apparatus in which a plurality of polishing pads are arranged, and the glass plate G is polished by the plurality of polishing pads while moving the glass plate G along the arranged plurality of polishing pads.
- the polishing pad 26 is made of a soft resin polyurethane, and has an A hardness (according to ISO 7619: 2004) of 80 or more (when the D hardness (according to ISO 7619) is 30 or more), and a density of 0.7 g / cm 3 or more (according to JIS K 7222: 2005).
- the polishing pad 26 has an A hardness of 90 or less (50 or less in the case of D hardness) and a density of 0.9 g / cm 3 or less.
- a polyurethane of a soft resin is preferable in order to exhibit the scratch suppressing ability, but the A hardness of the resin requires 80 or more in order to exhibit the flattening ability.
- a soft resin polyurethane is used as the polishing pad 26, and the A hardness is increased to 80 or more by setting the density of this polyurethane to 0.7 g / cm 3 or more.
- the glass plate G can be polished by the polishing pad 26 having both the flattening ability and the scratch suppressing ability. It is possible to shorten the processing time spent for the final polishing by (shown). Therefore, according to the polishing apparatus 10, the polishing efficiency of the glass plate G can be significantly improved as compared with the conventional polishing apparatus.
- the scratch suppressing ability is further improved by defining the upper limit value of the A hardness of the resin of the polishing pad 26 as 90.
- the upper limit of the density of the resin is 0.9 g / cm 3 .
- polyurethane is exemplified as the material for the soft resin, it is not particularly limited, and urethane and foamed polyurethane are exemplified.
- FIG. 4 is a table showing a list of the density and A hardness of polishing pads made of polyurethane foam 1 to 18 and the number of scratches generated on the surface of the glass plate G by polishing the polishing pad of each sample.
- No. 3 is a table showing the correlation between the density of 1 to 18 and the A hardness. Based on these tables, the superiority of the polishing pad 26 of the embodiment will be described.
- the glass plate G to be evaluated is a glass plate that does not substantially contain an alkali component, and has a long side of 470 mm, a short side of 370 mm, and a thickness of 0.7 mm.
- the size of the polishing pad is a circular shape having a diameter of 1690 mm, and a polishing slurry supply hole for supplying the polishing slurry to the surface of the polishing pad and a groove for spreading the polishing slurry over the entire surface of the polishing pad are formed on the surface. ing.
- the groove has a width of 1.5 mm, a pitch of 4.5 mm, and a depth of 1.5 mm.
- the polishing conditions were a polishing pressure of 3 kPa, a rotation speed of 50 rpm, a revolution speed of 120 rpm, a pad revolution radius of 75 mm, and a polishing slurry supply amount of 40 liters per minute.
- the polishing slurry is a dispersion in which cerium oxide is dispersed with water.
- a sample corresponding to the polishing pad 26 of the embodiment is No. referred to as a soft resin pad. 14 to 18 polishing pads. That is, no. No. 14 polishing pad has an A hardness of 86.6 and a density of 0.8 g / cm 3 .
- No. 15 polishing pad has an A hardness of 85.4 and a density of 0.8 g / cm 3 .
- No. 16 polishing pad has an A hardness of 84.7 and a density of 0.8 g / cm 3 .
- No. 17 polishing pad has an A hardness of 85.5 and a density of 0.7 g / cm 3 .
- the 18 polishing pads have an A hardness of 86.0 and a density of 0.8 g / cm 3 .
- the polishing pads 1 to 5 have only a flattening ability and are used in a rough polishing process in a conventional polishing apparatus. That is, no. No. 1 has a hardness of 96.1 and a density of 1.1 g / cm 3 .
- No. 2 has a hardness of 96.8 and a density of 1.0 g / cm 3 .
- 3 has a hardness of 96.1 and a density of 0.9 g / cm 3 .
- No. 4 polishing pad has an A hardness of 94.2 and a density of 0.9 g / cm 3 .
- the polishing pad No. 5 has an A hardness of 95.0 and a density of 1.0 g / cm 3 .
- the polishing pads Nos. 6 and 7 have only the ability to suppress scratches, and are used in a precision polishing process in a conventional polishing apparatus. That is, no. No. 6 has a hardness of 37.4 and a density of 0.5 g / cm 3 .
- the polishing pad No. 7 has an A hardness of 60.0 and a density of 0.6 g / cm 3 .
- the polishing pads 8 to 13 have an A hardness within the range of A hardness (80 to 90) of the polishing pad 26 of the embodiment, but the density is less than 0.7 g / cm 3 (0.5 to 0). .6 g / cm 3 ) polishing pad. That is, no. No. 8 has a hardness of 88.8 and a density of 0.5 g / cm 3 . No. 9 has an A hardness of 86.6 and a density of 0.5 g / cm 3 . No. 10 polishing pad has an A hardness of 88.8 and a density of 0.5 g / cm 3 . No.
- polishing pad has an A hardness of 82.9 and a density of 0.5 g / cm 3 .
- No. 12 polishing pad had an A hardness of 84.3 and a density of 0.5 g / cm 3 .
- the polishing hardness of No. 13 is 89.8, and the density is 0.6 g / cm 3 .
- the polishing pad 26 of the embodiment is No. According to the polishing pads 14 to 18, since the A hardness is 80 or more, it has a flattening ability and the density is 0.7 g / cm 3 or more and 0.9 g / cm 3 or less. Thus, the number of scratches remaining on the surface of the polished glass plate G was 72, 79, 48, 70, 91, and the number of scratches was 100 or less.
- the polishing pad 26 of the embodiment having an A hardness of 80 or more and 90 or less and a density of 0.7 g / cm 3 or more and 0.9 g / cm 3 or less has a flattening ability and a scratch suppressing ability. It turned out to be combined.
- the planarization ability of the polishing pad is higher as the ratio of the waviness height / waviness pitch on the surface of the glass plate is lower.
- the soft pad has a higher H / P ratio than others, so that the flattening ability is low but the number of scratches is smaller than the others. Since the H / P ratio of the hard pad is lower than the others, it can be seen that the number of scratches is higher than the others although the flattening ability is high. It can be seen that the medium elastic pad has a substantially larger number of scratches, although the ratio of H / P is substantially the same as that of the soft resin pad corresponding to the polishing pad of the present invention.
- the H / P ratio of the soft resin pad is such that H / P is 1.6 ⁇ 10 ⁇ 6 or less and 1.3 ⁇ 10 ⁇ 6 or more, which is higher than some hard pads but lower than soft pads.
- the soft resin pad corresponding to the polishing pad of the present invention has a higher leveling ability compared to the soft pad, and has a lower leveling ability than the hard pad, but can greatly reduce the number of scratches. did.
- the “scratch” described in the present specification refers to a scratch having a depth of 0.1 ⁇ m or more, a width of 2 ⁇ m or more, and a length of 5 ⁇ m or more.
Abstract
Description
また本発明は、上記研磨装置によって研磨されたガラス板であって、前記ガラス板の研磨面に、深さ0.1μm以上、幅2μm以上、長さ5μm以上の傷が100個以下であるガラス板に関する。
さらに、上記ガラス板において、研磨前の研磨面のうねり高さが0.02μm、うねりピッチがPのガラス板を、研磨量1μmで研磨したときの研磨後の研磨面のうねり高さをHとして、H/Pが1.6×10-6以下であることが好ましい。
また、前記うねりの最大高さを0.05μm以下にするための研磨量は研磨パッド26の硬度に応じて決定する。研磨パッド26の硬度が高い程、平坦化能力が高いので、前記研磨量であれば少なくともうねりの最大高さを低減できる。また、研磨パッド26の材料である樹脂単体の硬度が低い程、傷抑制能力を発揮する。研磨パッド26については後述する。
Claims (4)
- ガラス板を樹脂製の研磨パッドによって研磨するガラス板の研磨装置において、
前記研磨パッドの樹脂の密度が0.7g/cm3以上であり、ISO7619に準ずるA硬度が80以上であり、前記研磨パッドのA硬度が90以下であり、前記研磨パッドの樹脂の密度が0.9g/cm3以下であることを特徴とするガラス板の研磨装置。 - 前記樹脂は、ポリウレタンである請求項1に記載のガラス板の研磨装置。
- 請求項2に記載のガラス板の研磨装置によって研磨されたガラス板であって、
前記ガラス板の研磨面に、深さ0.1μm以上、幅2μm以上、長さ5μm以上の傷が100個以下であるガラス板。 - 研磨前の研磨面のうねり高さが0.02μm、うねりピッチがPのガラス板を、研磨量1μmで研磨したときの研磨後の研磨面のうねり高さをHとして、H/Pが1.6×10-6以下である請求項3に記載のガラス板。
Priority Applications (2)
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CN201280059234.2A CN103958124A (zh) | 2011-12-02 | 2012-11-22 | 玻璃板的研磨装置 |
KR1020147014646A KR20140106532A (ko) | 2011-12-02 | 2012-11-22 | 유리판 연마 장치 |
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JP2011-264901 | 2011-12-02 | ||
JP2011264901 | 2011-12-02 |
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PCT/JP2012/080306 WO2013080885A1 (ja) | 2011-12-02 | 2012-11-22 | ガラス板の研磨装置 |
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JP (1) | JPWO2013080885A1 (ja) |
KR (1) | KR20140106532A (ja) |
CN (1) | CN103958124A (ja) |
TW (1) | TW201328818A (ja) |
WO (1) | WO2013080885A1 (ja) |
Cited By (1)
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WO2015083713A1 (ja) * | 2013-12-04 | 2015-06-11 | 旭硝子株式会社 | ガラス基板の仕上げ研磨方法、および、該方法で仕上げ研磨された無アルカリガラス基板 |
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JP2003155471A (ja) * | 2001-08-21 | 2003-05-30 | Kao Corp | 研磨液組成物 |
JP2004059419A (ja) * | 2002-05-31 | 2004-02-26 | Nippon Sheet Glass Co Ltd | ガラス基材の製造方法及びその製造方法で得られたガラス基材 |
JP2004253058A (ja) * | 2003-02-20 | 2004-09-09 | Kao Corp | 研磨液組成物 |
JP2010099771A (ja) * | 2008-10-23 | 2010-05-06 | Kanai Hiroaki | ガラス用研磨パッド |
JP2011005563A (ja) * | 2009-06-23 | 2011-01-13 | Fujibo Holdings Inc | 研磨パッド、その製造方法および研磨加工方法 |
JP2011051072A (ja) * | 2009-09-03 | 2011-03-17 | Fujibo Holdings Inc | 研磨パッドの製造方法および研磨パッド |
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KR20050059123A (ko) * | 2002-08-30 | 2005-06-17 | 도레이 가부시끼가이샤 | 연마 패드, 정반 홀 커버 및 연마장치 및 연마방법 및 반도체 디바이스의 제조방법 |
JP4667848B2 (ja) * | 2004-12-13 | 2011-04-13 | 花王株式会社 | ガラス基板用研磨液組成物 |
EP2444433A4 (en) * | 2009-06-18 | 2014-06-11 | Jsr Corp | POLYURETHANE, COMPOSITION FOR THE FORMATION OF POLISHING LAYERS THEREFOR, CLOTH FOR CHEMICAL-MECHANICAL CLEANING AND CHEMICAL-MECHANICAL CLEANING PROCESS THEREWITH |
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2012
- 2012-11-22 CN CN201280059234.2A patent/CN103958124A/zh active Pending
- 2012-11-22 KR KR1020147014646A patent/KR20140106532A/ko not_active Application Discontinuation
- 2012-11-22 WO PCT/JP2012/080306 patent/WO2013080885A1/ja active Application Filing
- 2012-11-22 JP JP2013547126A patent/JPWO2013080885A1/ja active Pending
- 2012-11-30 TW TW101145118A patent/TW201328818A/zh unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003155471A (ja) * | 2001-08-21 | 2003-05-30 | Kao Corp | 研磨液組成物 |
JP2004059419A (ja) * | 2002-05-31 | 2004-02-26 | Nippon Sheet Glass Co Ltd | ガラス基材の製造方法及びその製造方法で得られたガラス基材 |
JP2004253058A (ja) * | 2003-02-20 | 2004-09-09 | Kao Corp | 研磨液組成物 |
JP2010099771A (ja) * | 2008-10-23 | 2010-05-06 | Kanai Hiroaki | ガラス用研磨パッド |
JP2011005563A (ja) * | 2009-06-23 | 2011-01-13 | Fujibo Holdings Inc | 研磨パッド、その製造方法および研磨加工方法 |
JP2011051072A (ja) * | 2009-09-03 | 2011-03-17 | Fujibo Holdings Inc | 研磨パッドの製造方法および研磨パッド |
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WO2015083713A1 (ja) * | 2013-12-04 | 2015-06-11 | 旭硝子株式会社 | ガラス基板の仕上げ研磨方法、および、該方法で仕上げ研磨された無アルカリガラス基板 |
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JPWO2013080885A1 (ja) | 2015-04-27 |
CN103958124A (zh) | 2014-07-30 |
TW201328818A (zh) | 2013-07-16 |
KR20140106532A (ko) | 2014-09-03 |
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