JP5350853B2 - ガラス基板の製造方法、及び磁気記録媒体の製造方法 - Google Patents
ガラス基板の製造方法、及び磁気記録媒体の製造方法 Download PDFInfo
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- JP5350853B2 JP5350853B2 JP2009077000A JP2009077000A JP5350853B2 JP 5350853 B2 JP5350853 B2 JP 5350853B2 JP 2009077000 A JP2009077000 A JP 2009077000A JP 2009077000 A JP2009077000 A JP 2009077000A JP 5350853 B2 JP5350853 B2 JP 5350853B2
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- chemical strengthening
- glass substrate
- polishing
- chemical
- glass
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- 239000011521 glass Substances 0.000 title claims abstract description 113
- 239000000758 substrate Substances 0.000 title claims abstract description 96
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 33
- 238000005498 polishing Methods 0.000 claims abstract description 46
- 150000002500 ions Chemical class 0.000 claims abstract description 23
- 239000000203 mixture Substances 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 12
- 238000003426 chemical strengthening reaction Methods 0.000 claims description 110
- 239000010410 layer Substances 0.000 claims description 34
- 230000001050 lubricating effect Effects 0.000 claims description 3
- 239000011241 protective layer Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 abstract description 21
- 238000000034 method Methods 0.000 abstract description 19
- 239000000126 substance Substances 0.000 abstract description 7
- 230000002787 reinforcement Effects 0.000 abstract 5
- 230000002093 peripheral effect Effects 0.000 description 10
- 239000006061 abrasive grain Substances 0.000 description 7
- 239000002994 raw material Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Images
Landscapes
- Surface Treatment Of Glass (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
1a…………ガラス基材
3……………本体
5……………内孔
7a…………主表面
17…………化学強化層
18b………磁性層
21…………研削装置
21a………研磨装置
51…………化学強化装置
59…………化学強化液
Claims (3)
- ガラス基材をバッチ単位でイオンを含む溶液である化学強化液に浸漬して、前記ガラス基材表面のイオンを前記化学強化液のイオンと置換することにより化学強化を行う工程(a)と、
前記化学強化を行った前記ガラス基材の主表面をバッチ単位で研磨する工程(b)と、
を有し、
前記工程(a)は、複数のガラス基材を1つのバッチとして複数のバッチを連続的に処理してガラス基板を製造する際の研磨によって生じたガラス基板の2つの主表面の化学強化層の厚さ不均一に伴う反りの大きさが前記複数のバッチ間で変化するのを防止すべく、繰り返し使用することによる前記化学強化液の組成の変化に応じて、前記化学強化層が薄くなるのを防ぐように、前記化学強化の条件を変化させて前記化学強化を行う工程であり、
前記工程(b)は、前記化学強化液の組成の変化によらず、前記ガラス基材の主表面を一定の加工条件で前記主表面に化学強化層の一部を残すように研磨する工程であることを特徴とするガラス基板の製造方法。 - 前記工程(a)は、所定のバッチ毎に、
前のバッチよりも化学強化の際の温度を上昇させて前記化学強化を行う工程、および/または、前のバッチよりも化学強化の時間を長くして前記化学強化を行う工程であることを特徴とする請求項1記載のガラス基板の製造方法。 - 請求項1または2に記載のガラス基板の製造方法により製造したガラス基板の主表面上に少なくとも、下地層、磁性層、保護層、潤滑層を設けることを特徴とする磁気記録媒体の製造方法。
Priority Applications (1)
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JP2009077000A JP5350853B2 (ja) | 2009-03-26 | 2009-03-26 | ガラス基板の製造方法、及び磁気記録媒体の製造方法 |
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JP2009077000A JP5350853B2 (ja) | 2009-03-26 | 2009-03-26 | ガラス基板の製造方法、及び磁気記録媒体の製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2010231835A JP2010231835A (ja) | 2010-10-14 |
JP5350853B2 true JP5350853B2 (ja) | 2013-11-27 |
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JP2009077000A Active JP5350853B2 (ja) | 2009-03-26 | 2009-03-26 | ガラス基板の製造方法、及び磁気記録媒体の製造方法 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5896338B2 (ja) * | 2011-01-18 | 2016-03-30 | 日本電気硝子株式会社 | 強化用ガラスの製造方法及び強化ガラス板の製造方法 |
JP2013071854A (ja) * | 2011-09-27 | 2013-04-22 | Hoya Corp | 携帯機器用カバーガラスの製造方法 |
US9187365B2 (en) | 2013-02-25 | 2015-11-17 | Corning Incorporated | Methods for measuring the asymmetry of a glass-sheet manufacturing process |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3162558B2 (ja) * | 1993-11-11 | 2001-05-08 | 日本板硝子株式会社 | 磁気記録媒体用ガラス基板及び磁気記録媒体の製造方法 |
JP2000207730A (ja) * | 1999-01-12 | 2000-07-28 | Ishizuka Glass Co Ltd | 磁気記録媒体用ガラス基板 |
JP4185266B2 (ja) * | 2001-07-25 | 2008-11-26 | Hoya株式会社 | 情報記録媒体用基板の製造方法 |
JP2003146705A (ja) * | 2001-11-09 | 2003-05-21 | Nippon Sheet Glass Co Ltd | 情報記録媒体用ガラス基板の化学強化処理方法 |
JP4209316B2 (ja) * | 2003-12-12 | 2009-01-14 | Hoya株式会社 | 情報記録媒体用ガラス基板の製造方法 |
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