WO2013035726A1 - 測定方法および測定装置 - Google Patents

測定方法および測定装置 Download PDF

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Publication number
WO2013035726A1
WO2013035726A1 PCT/JP2012/072573 JP2012072573W WO2013035726A1 WO 2013035726 A1 WO2013035726 A1 WO 2013035726A1 JP 2012072573 W JP2012072573 W JP 2012072573W WO 2013035726 A1 WO2013035726 A1 WO 2013035726A1
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Prior art keywords
measuring
composition
subject
spectral data
film thickness
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PCT/JP2012/072573
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English (en)
French (fr)
Japanese (ja)
Inventor
佑司 西澤
淳一 四辻
津田　和呂
貴彦 大重
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Ｊｆｅスチール株式会社
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Priority to JP2013532620A priority Critical patent/JP5817831B2/ja
Priority to KR1020147005610A priority patent/KR20140054165A/ko
Priority to CN201280041663.7A priority patent/CN103765158B/zh
Publication of WO2013035726A1 publication Critical patent/WO2013035726A1/ja

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8883—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges involving the calculation of gauges, generating models

Definitions

  • the present invention relates to a measuring method and a measuring apparatus for measuring the thickness and composition of a film such as an oxide film formed on the surface of steel products.
  • Steel products such as hot-rolled steel plates and thick plates are manufactured by heating the slab, rolling it to the desired thickness, and then cooling it. In the process of heating, rolling, and cooling, an oxide film called scale is formed on the surface of the steel plate.
  • This scale has a function to protect the surface of the steel plate. Therefore, it is desirable that the steel sheet is covered with a scale having a uniform film thickness and high adhesion.
  • a steel plate having a uniform scale is not only excellent in appearance and paintability, but also excellent in maintainability because the scale is difficult to peel off.
  • the steel sheet is cut with a laser, it is desirable that the steel sheet is covered with a black scale having high adhesion.
  • the scale is mainly composed of iron oxide and oxides of additive elements, but its composition is complex and it consists of a mixture of substances with various oxidation numbers.
  • a scale composed of Fe 2 O 3 (hematite), Fe 3 O 4 (magnetite), and FeO (wustite) layers is often formed in this order from the surface side of the steel sheet.
  • the scale does not necessarily have a clearly separated multilayer structure, and a scale having a mixed structure is formed.
  • the scale when the scale is composed mainly of magnetite, it becomes a black scale and has excellent mechanical strength. On the other hand, when the scale is composed mainly of hematite, it becomes a red scale, which is inferior in mechanical strength and adhesion and easily peeled off. This red scale (red rust) tends to be avoided because it is transferred to other places or contaminated. Thus, the film thickness and composition of the scale are important indicators of the quality of steel products.
  • Patent Document 1 describes a technique for selectively forming a scale mainly composed of magnetite on the surface of a steel sheet by optimizing temperature control and scale removal (descaling).
  • an electromagnetic induction type film thickness meter As a technique for measuring the film thickness of the coating, cross-sectional observation, an electromagnetic induction type film thickness meter, an eddy current film thickness meter, an ultrasonic film thickness meter, and the like are known.
  • the cross-sectional observation in which the cut surface is polished and observed with a microscope can be said to be the most accurate method for measuring the film thickness.
  • the chemical composition of the film can be examined in detail by applying a technique such as XPS (X-ray photoelectron spectroscopy) or Raman spectroscopy to the cut surface.
  • the electromagnetic induction film thickness meter detects changes in magnetic impedance and can measure very thin films of about several microns.
  • Portable commercial products are widely used for measuring the thickness of non-magnetic films such as paint films on the surface of iron.
  • the eddy current film thickness meter is widely used to measure the dielectric film thickness on the surface of a conductor.
  • the ultrasonic film thickness meter calculates the film thickness of the film by making the ultrasonic wave incident on the subject and detecting the reflection echo at the boundary surface caused by the difference in acoustic impedance between the substrate and the film.
  • Patent Document 2 describes a technique for measuring the thickness of a scale formed on a pipe or the like of a heat exchanger.
  • Patent Document 3 discloses a technique for measuring the film thickness of a scale using infrared rays. According to this technique, since the scale is translucent to infrared rays, the film thickness is measured from the attenuation rate.
  • Patent Document 4 discloses a technique for measuring the film thickness of a scale by irradiating an oxide film with a laser to change the composition of the oxide film and eliminating the influence of the composition of the oxide film.
  • the electromagnetic induction type film thickness meter can be applied only to a non-magnetic film, it cannot measure the film thickness of the scale of steel products including magnetite having magnetism.
  • an error occurs because magnetic flux passes through the magnetic layer.
  • the eddy current film thickness meter is not applicable to the film thickness measurement of the film formed on the base of magnetic material such as iron. In this case, since it is influenced not only by the base but also by the magnetism of the scale, it cannot be applied to the measurement of the oxide film thickness of steel products.
  • the film thickness of a film having a thickness of several tens of microns or more is measured. Since it is difficult to separate the reflected echo from the surface echo, it cannot be measured. Furthermore, it is necessary to use a coupling medium such as a water column, which is not convenient.
  • Patent Document 3 The technique described in Patent Document 3 is not simple because the apparatus is complicated. In addition, since the infrared wavelength (wavelength) is selected and used for measurement, it is not possible to distinguish between changes in attenuation due to film composition and changes in attenuation due to film thickness. Highly accurate measurement is difficult.
  • the present invention has been made in view of the above, and measures the film thickness of a film formed on the surface of a subject (material under measurement) in a non-contact / non-destructive manner, and the composition of the film.
  • An object of the present invention is to provide a measurement method and a measurement apparatus capable of obtaining the above information.
  • a measurement method is a measurement method for measuring the film thickness and composition of a film formed on the surface of a subject, and is a known method.
  • a pre-measurement step for measuring spectroscopic data of the specimen, and a fundamental decomposition of the spectroscopic data measured in the pre-measurement step to extract characteristic parameters of the spectroscopic data Pre-calculation step for calculating the relationship between the feature amount and the film thickness and composition of the film formed on the surface of the known subject, a measurement step for measuring the spectral data of the subject, and measurement in the measurement step
  • the spectral data of the subject is subjected to base decomposition to extract the feature quantity of the spectral data, and the subject is calculated based on the relationship between the feature quantity calculated in the pre-calculation step and the film thickness and composition of the film. Having a calculation step of calculating the film thickness and composition of the coating formed on the surface of the body, the.
  • the calculating step includes a single type or a plurality of types of principal component scores (score on the principal component) or residual (residual component) calculated from the spectral data of the subject. ) To calculate the film thickness and composition of the film formed on the surface of the subject, and estimate the surface texture.
  • the subject is a steel product
  • the coating is an oxide film
  • the oxide film includes at least one of magnetite, hematite, and wustite.
  • the spectral data is reflectance or absorbance with respect to infrared rays having a wavelength of 10 to 25 ⁇ m.
  • the measuring apparatus is a measuring apparatus for measuring the film thickness and composition of the film formed on the surface of the subject, and a pre-measurement means for measuring spectroscopic data of a known subject in advance, Spectral data measured by the prior measurement means is fundamentally decomposed to extract feature values of the spectral data, and the relationship between the feature values and the film thickness and composition of the film formed on the surface of the known subject
  • Pre-calculating means for calculating the spectral data
  • measuring means for measuring the spectral data of the subject, and analyzing the spectral data of the subject measured by the measuring means to extract a feature quantity of the spectral data
  • Calculating means for calculating the film thickness and composition of the film formed on the surface of the subject based on the relationship between the feature amount calculated by the pre-calculating means and the film thickness and composition of the film.
  • the measurement method is a measurement method for measuring the composition of a film formed on the surface of a subject, a pre-measurement step for measuring spectral data of a known subject in advance, A pre-calculation step of extracting the feature amount of the spectral data by base decomposition of the spectral data measured in the measurement step and calculating the relationship between the feature amount and the composition of the film formed on the surface of the known specimen
  • the measuring apparatus is a measuring apparatus that measures the composition of a film formed on the surface of a subject, a pre-measuring unit that measures spectroscopic data of a known subject in advance, Pre-calculation means for extracting the feature amount of the spectral data by base decomposition of the spectral data measured by the measurement means and calculating the relationship between the feature amount and the composition of the film formed on the surface of the known subject Measuring means for measuring the spectral data of the subject, and extracting the feature amount of the spectral data by base decomposition of the spectral data of the subject measured by the measuring means, and calculating by the prior calculation means Calculating means for calculating the composition of the film formed on the surface of the subject based on the relationship between the feature amount and the composition of the film.
  • the film thickness and composition of the film formed on the surface of the object are calculated simply by measuring the spectroscopic data of the object. Rather, information on the composition of the coating can be obtained.
  • FIG. 1 is a schematic diagram showing a schematic configuration of a film thickness measuring apparatus according to an embodiment of the present invention.
  • FIG. 2 is a flowchart showing the flow of the film thickness measurement processing procedure of the present embodiment.
  • FIG. 3 is a diagram illustrating spectral data of a sample.
  • FIG. 4 is a diagram illustrating principal component vectors calculated by the principal component analysis of the present embodiment for the sample of FIG.
  • FIG. 5 is a diagram illustrating the relationship between the principal component score calculated by the principal component analysis of the present embodiment and the film thickness of the scale for the sample.
  • FIG. 6 is a diagram illustrating the relationship between the thickness of the scale calculated by the principal component analysis of this embodiment and the thickness of the scale measured by cross-sectional observation.
  • FIG. 1 is a schematic diagram showing a schematic configuration of a film thickness measuring apparatus according to an embodiment of the present invention.
  • FIG. 2 is a flowchart showing the flow of the film thickness measurement processing procedure of the present embodiment.
  • FIG. 3 is a diagram
  • FIG. 7 is a diagram illustrating an example of measurement of reflection spectra on a surface having a scale and a metal surface by rough mechanical polishing.
  • FIG. 8 is a diagram illustrating the principal component score calculated from the reflection spectrum at each measurement point for a plate-like sample whose predetermined region is mechanically polished.
  • the film thickness measuring device 1 includes a spectroscopic device 10 and a control unit 20.
  • the control unit 20 includes a prior measurement DB 21, a calculation device 22, and a storage device 23.
  • the spectroscopic device 10 includes a light source 11, and measures the wavelength distribution of reflected light or transmitted light as spectral data by irradiating the subject 30 with light from the light source 11.
  • the format of the spectral data is not limited, and it is possible to select and apply an appropriate format such as reflectance, attenuation rate, absorbance, and self-emission spectrum to the present embodiment.
  • the wavelength of light used for the measurement can be appropriately selected according to the characteristics of the subject 30, and in addition to the spectroscopic device 10 composed of a monochromator, an ultraviolet / visible / near infrared spectroscopic device or Fourier A conversion infrared spectrometer (FT-IR) or the like is also applicable.
  • FT-IR Fourier A conversion infrared spectrometer
  • the light source 11 is not necessary when measuring the self-luminous spectral data of the subject 30. Further, the relative positions of the light source 11, the subject 30, and the spectroscopic device 10 can be appropriately changed according to the characteristics of the subject 30 and the spectroscopic device 10.
  • a specular reflection optical system or a normal incidence optical system is used to measure the film thickness and composition of an oxide film including one or more of magnetite, hematite, and wustite formed on the surface of a steel product. It is desirable to apply the system.
  • the pre-measurement DB 21 stores spectroscopic data (pre-measurement data) for samples whose film thickness and composition are known.
  • the pre-measurement DB 21 is a mirror surface sample or a machined surface sample in which no scale is formed, a sample in which a scale composed only of magnetite is formed, a sample in which a scale containing hematite is formed, and the like.
  • Spectral data measured by the spectroscopic device 10 in advance is stored.
  • the computing device 22 is realized by using a memory that stores a processing program and a CPU that executes the processing program, and the like. Data obtained from the spectroscopic device 10 and premeasurement data obtained by referring to the premeasurement DB 21 are used. Based on this, a film thickness measurement process to be described later is executed. In addition, the arithmetic device 22 stores the result of the film thickness measurement process in the storage device 23.
  • the flowchart of FIG. 2 starts, for example, at the timing when an operator inputs an instruction to start film thickness measurement via an input unit (not shown), and the film thickness measurement process proceeds to step S1.
  • step S1 the arithmetic unit 22 acquires spectral data of a sample measured in advance from the prior measurement DB 21. Thereby, the process of step S1 is completed and the film thickness measurement process proceeds to the process of step S2.
  • step S2 the arithmetic unit 22 performs base decomposition of the spectral data of the sample acquired by the process of step S1, calculates a base vector and a coefficient, and extracts a feature quantity related to the film thickness and composition of the sample film. To do. Then, the arithmetic unit 22 calculates the relationship between the extracted feature amount, the film thickness and the composition of the coating. Thereby, the process of step S2 is completed and the film thickness measurement process proceeds to the process of step S3.
  • the arithmetic unit 22 applies a known principal component analysis as the basis decomposition, and calculates the principal component vector of the spectral data of the sample and the principal component score as the feature amount.
  • the arithmetic unit 22 may calculate a base function by applying other multivariable decomposition or independent component analysis.
  • FIG. 3 is a diagram illustrating spectral data of a sample.
  • a sample a milled metal surface on which no scale is formed, a sample on which a scale with a film thickness of 2.5 ⁇ m composed only of magnetite is formed, a sample on which a scale with a film thickness of 10 ⁇ m composed only of magnetite is formed, It is spectroscopic data which shows the wavelength distribution of a reflectance about four types of samples of the sample in which the scale with a film thickness of 20 micrometers comprised by hematite and magnetite was formed. In the present embodiment, measurement was performed using infrared rays having a wavelength of 10 to 25 ⁇ m.
  • FIG. 4 shows a large number of reference points extracted from the spectroscopic data of three types of samples except for the spectroscopic data illustrated in FIG. 3 excluding the sample having a film thickness of 10 ⁇ m composed only of magnetite.
  • FIG. 6 is a diagram illustrating principal component vectors calculated by performing principal component analysis.
  • the data to be analyzed can be defined by a matrix X as shown in the following equation (1). . Let each element of this matrix X be x (i, j).
  • the principal component vector at this time is w (i, k).
  • k 1, 2,.
  • k 1, that is, the first principal component vector w (i, 1) is determined so that the variation with respect to j is maximized in the following equation (2).
  • k 1, 2, 3 is applied.
  • the estimated value (reconstructed data) of x s is obtained as described above.
  • the one principal component vector w (i, 1), the second principal component vector w (i, 2), and the third principal component vector w (i, 3) it can be expressed as the following equation (4). .
  • the principal component score is calculated using the third principal component vector w (i, 3) as shown below. That is, the principal component score is expressed as the following equation (5).
  • the coupling coefficient of the principal component vector is expressed as the following equation (6).
  • the actual measurement data x s can be expressed as the following equation (7).
  • the principal component score can be calculated as the following equation (10).
  • the arithmetic unit 22 calculates the principal component vector and the principal component score of the spectral data of the sample. Thereby, the relationship between the film thickness and composition of the known film for each sample and the calculated principal component score can be calculated.
  • step S3 the arithmetic unit 22 measures the subject 30 with the spectroscopic device 10 and acquires spectroscopic data. Thereby, the process of step S3 is completed and the film thickness measurement process proceeds to the process of step S4.
  • step S4 the arithmetic unit 22 calculates a principal component score for the spectral data of the subject 30 acquired in step S3 based on the above formulas (5) to (10).
  • the arithmetic unit 22 compares the calculated principal component score with the relationship between the known coating thickness calculated in the process of step S2 and the principal component score, thereby determining the coating thickness and composition of the subject 30. calculate. Thereby, the process of step S4 is completed and a series of film thickness measurement processes are completed.
  • FIG. 5 is a diagram illustrating the relationship between the known film thickness and composition for each sample in FIG. 3 and the calculated principal component score.
  • FIG. 5 shows the relationship between the film thickness and the main component score for about 30 reference points extracted from the spectral data of FIG.
  • the first principal component score of the spectral data of the steel material on which the scale is formed has a strong correlation with the film thickness of the scale. From this relationship, for the subject 30 whose scale film thickness is unknown, the scale film thickness can be estimated (calculated) from the first principal component score.
  • FIG. 6 illustrates a relationship between the film thickness of the coating film of the subject 30 calculated according to the present embodiment and the film thickness measured by cross-sectional observation. As shown in FIG. 6, it can be seen that the accuracy of the film thickness measurement process of the present embodiment is high.
  • the third principal component score of the spectral data of the steel material on which the scale is formed is positive at three reference points that include hematite in the scale, and other reference points that do not include hematite. It turns out that it becomes a negative value. Therefore, for the subject 30 whose scale composition is unknown, the presence or absence of hematite can be detected from the third principal component score. In the present embodiment, the presence or absence of hematite is detected by performing threshold processing with a predetermined threshold on the third principal component score.
  • the scale (red rust) containing hematite has a low adhesion to the base steel plate and tends to be avoided by steel products, so it is highly meaningful to detect the presence or absence of hematite.
  • nonconforming product can be prevented from flowing out by appropriate care or changing the shipping destination.
  • the third principal component score can also be used as an indicator for facility monitoring and operation monitoring.
  • the film thickness and composition can be calculated using regression equations using principal component scores of multiple types of principal components, depending on the surface properties of the measurement target, the selection of samples for pre-measurement data, and the method of taking principal component vectors.
  • principal component scores of multiple types of principal components, depending on the surface properties of the measurement target, the selection of samples for pre-measurement data, and the method of taking principal component vectors.
  • the surface roughness is extremely high, the reflectance decreases as a whole, so that the main component score of the first main component tends to be small.
  • the calculation accuracy of the film thickness may be improved by combining a plurality of types of principal component scores.
  • FIG. 7 is a diagram showing an example of measurement of reflection spectra on a surface having a scale and a metal surface by rough mechanical polishing. As shown in FIG. 7, since this machine-polished surface has a very large surface roughness, it can be seen that the reflectance is reduced as a whole and there is almost no wavelength dependency. At this time, the principal component score of the first principal component of the reflection spectrum is a small value, and if the film thickness is calculated by the above-described film thickness measurement process using only the first principal component score, the scale does not exist. However, a large value may be erroneously calculated as the film thickness.
  • FIG. 8 illustrates the principal component score calculated from the reflection spectrum at each measurement point in the width direction of the sample for a plate sample in which two regions in the longitudinal direction are mechanically polished within a predetermined range R in the width direction.
  • FIG. 8 illustrates the main component score of the first main component is almost uniform at any measurement point, and it can be seen that there is no difference between the scale surface and the mechanically polished surface.
  • the third principal component score indicating the presence or absence of hematite is not different between the scale surface and the mechanically polished surface.
  • the second principal component score varies greatly on the mechanically polished surface. From this, it is presumed that the second principal component score is a value related to surface properties such as the presence or absence of surface reflection. That is, the second principal component score can be used as an index of surface smoothness or flatness.
  • the film thickness measurement accuracy is improved by performing the film thickness measurement process using the first principal component score and the second principal component score.
  • the accuracy of film thickness measurement is improved by performing the film thickness measurement process using a regression equation combining other main component scores.
  • the residual in addition to the main component score, the effect of improving the accuracy of film thickness measurement can also be expected.
  • the residual is obtained by removing the contribution of each principal component from the reflection spectrum, and when the residual is large, it indicates that the contribution other than the known principal component is large. Therefore, for example, it can be used for detecting an unknown phenomenon, detecting an abnormality such as a time-dependent change of the apparatus, an error in measurement procedure, and the like.
  • the spectroscopic device 10 measures the spectroscopic data of the subject 30, and the arithmetic device 22 is formed on the surface of the subject 30. Extracts components that contain a lot of information on the film thickness and composition of the film, and calculates the film thickness and composition of the film, so it is non-contact, non-destructive, easy to use, and is not easily affected by external noise. Information on the composition of the film as well as the film thickness of the film can be obtained.
  • surface property can be estimated. That is, the film thickness, composition, and surface properties of the coating can be measured (estimated) from the spectral data. According to the present invention, other physical quantities obtained from spectroscopic data can be measured by the same method.
  • the above embodiment is merely an example for carrying out the present invention, and the present invention is not limited to these, and various modifications according to specifications and the like are within the scope of the present invention. It is obvious from the above description that various other embodiments are possible within the scope of the present invention.
  • this invention is not limited to this. For example, the measurement of only the film thickness of the coating film and the measurement of only the composition in the film thickness measuring apparatus 1 of the above embodiment are within the scope of the present invention.
  • the present invention can be applied to the measurement of the film thickness and composition of a coating such as an oxide film formed on the surface of a steel product.

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PCT/JP2012/072573 2011-09-07 2012-09-05 測定方法および測定装置 WO2013035726A1 (ja)

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WO2017076655A1 (de) * 2015-11-05 2017-05-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Anordnung zur bestimmung der oberflächenbeschaffenheit von bauteiloberflächen
JP6424998B1 (ja) * 2017-04-25 2018-11-21 新日鐵住金株式会社 スケール組成判定システム、スケール組成判定方法、およびプログラム
CN114235970A (zh) * 2021-12-20 2022-03-25 西安科技大学 一种自适应超声重叠回波分离方法

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US10215554B2 (en) 2015-04-17 2019-02-26 Industry-University Cooperation Foundation Hanyang University Apparatus and method for non-contact sample analyzing using terahertz wave
CN105627936A (zh) * 2015-12-21 2016-06-01 中国科学院长春光学精密机械与物理研究所 基于od测量的金属膜厚度快速测量方法
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