JP5817831B2 - 測定方法および測定装置 - Google Patents

測定方法および測定装置 Download PDF

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Publication number
JP5817831B2
JP5817831B2 JP2013532620A JP2013532620A JP5817831B2 JP 5817831 B2 JP5817831 B2 JP 5817831B2 JP 2013532620 A JP2013532620 A JP 2013532620A JP 2013532620 A JP2013532620 A JP 2013532620A JP 5817831 B2 JP5817831 B2 JP 5817831B2
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Japan
Prior art keywords
principal component
measuring
composition
spectral data
film thickness
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Expired - Fee Related
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JP2013532620A
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English (en)
Japanese (ja)
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JPWO2013035726A1 (ja
Inventor
佑司 西澤
佑司 西澤
淳一 四辻
淳一 四辻
津田　和呂
和呂 津田
貴彦 大重
貴彦 大重
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JFE Steel Corp
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JFE Steel Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8883—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges involving the calculation of gauges, generating models

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2013532620A 2011-09-07 2012-09-05 測定方法および測定装置 Expired - Fee Related JP5817831B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013532620A JP5817831B2 (ja) 2011-09-07 2012-09-05 測定方法および測定装置

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2011195192 2011-09-07
JP2011195192 2011-09-07
JP2013532620A JP5817831B2 (ja) 2011-09-07 2012-09-05 測定方法および測定装置
PCT/JP2012/072573 WO2013035726A1 (ja) 2011-09-07 2012-09-05 測定方法および測定装置

Publications (2)

Publication Number Publication Date
JPWO2013035726A1 JPWO2013035726A1 (ja) 2015-03-23
JP5817831B2 true JP5817831B2 (ja) 2015-11-18

Family

ID=47832171

Family Applications (1)

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JP2013532620A Expired - Fee Related JP5817831B2 (ja) 2011-09-07 2012-09-05 測定方法および測定装置

Country Status (4)

Country Link
JP (1) JP5817831B2 (zh)
KR (1) KR20140054165A (zh)
CN (1) CN103765158B (zh)
WO (1) WO2013035726A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105627936A (zh) * 2015-12-21 2016-06-01 中国科学院长春光学精密机械与物理研究所 基于od测量的金属膜厚度快速测量方法
KR20190123766A (ko) * 2017-04-25 2019-11-01 닛폰세이테츠 가부시키가이샤 스케일 조성 판정 시스템, 스케일 조성 판정 방법, 및 컴퓨터 판독 가능한 기억 매체

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10215554B2 (en) 2015-04-17 2019-02-26 Industry-University Cooperation Foundation Hanyang University Apparatus and method for non-contact sample analyzing using terahertz wave
DE102015221697B3 (de) * 2015-11-05 2017-02-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Anordnung zur Bestimmung der Oberflächenbeschaffenheit von Bauteiloberflächen
CN105466368A (zh) * 2016-01-01 2016-04-06 广州兴森快捷电路科技有限公司 一种镍基底表面处理可焊性的分析方法
CN114235970B (zh) * 2021-12-20 2024-04-23 西安科技大学 一种自适应超声重叠回波分离方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01132936A (ja) * 1987-11-18 1989-05-25 Kawasaki Steel Corp 被膜の分析方法及び装置
CN2151439Y (zh) * 1992-09-29 1993-12-29 清华大学 润滑介质膜厚度测量仪
JPH07270130A (ja) * 1994-03-31 1995-10-20 Nippon Steel Corp 酸化膜厚さ測定方法
JP2000131229A (ja) * 1998-10-23 2000-05-12 Nireco Corp 鉄亜鉛合金メッキ鋼板の表層Ｆｅ量測定方法
JP2001203250A (ja) * 2000-01-18 2001-07-27 Fuji Electric Co Ltd 膜厚管理方法
US6504618B2 (en) * 2001-03-21 2003-01-07 Rudolph Technologies, Inc. Method and apparatus for decreasing thermal loading and roughness sensitivity in a photoacoustic film thickness measurement system
CA2550390C (en) * 2005-09-16 2014-10-21 The Regents Of The University Of Michigan Method and system for measuring sub-surface composition of a sample
JP2008180618A (ja) * 2007-01-25 2008-08-07 Toray Ind Inc 表面欠点検出装置
JP4846741B2 (ja) * 2008-02-06 2011-12-28 新日本製鐵株式会社 酸化膜厚測定方法及び酸化膜厚測定装置
JP5294938B2 (ja) * 2009-03-27 2013-09-18 Ｈｏｙａ株式会社 膜厚測定方法およびガラス光学素子の製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105627936A (zh) * 2015-12-21 2016-06-01 中国科学院长春光学精密机械与物理研究所 基于od测量的金属膜厚度快速测量方法
KR20190123766A (ko) * 2017-04-25 2019-11-01 닛폰세이테츠 가부시키가이샤 스케일 조성 판정 시스템, 스케일 조성 판정 방법, 및 컴퓨터 판독 가능한 기억 매체
KR102197962B1 (ko) 2017-04-25 2021-01-05 닛폰세이테츠 가부시키가이샤 스케일 조성 판정 시스템, 스케일 조성 판정 방법, 및 컴퓨터 판독 가능한 기억 매체

Also Published As

Publication number Publication date
CN103765158A (zh) 2014-04-30
JPWO2013035726A1 (ja) 2015-03-23
CN103765158B (zh) 2016-09-07
KR20140054165A (ko) 2014-05-08
WO2013035726A1 (ja) 2013-03-14

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