WO2012117990A1 - 低屈折率膜形成用組成物、低屈折率膜の形成方法、及び該形成方法により形成された低屈折率膜並びに反射防止膜 - Google Patents
低屈折率膜形成用組成物、低屈折率膜の形成方法、及び該形成方法により形成された低屈折率膜並びに反射防止膜 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/006—Anti-reflective coatings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/62—Nitrogen atoms
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Definitions
- the present invention relates to a composition for forming a low refractive index film, and more specifically to a display device such as a mobile phone, a personal computer, a TV, a touch panel, an optical component used in a camera, a copying machine, a facsimile, a laser beam printer, and the like.
- the present invention relates to a composition for forming a low refractive index film used for imparting a prevention function.
- the present invention also relates to a method for forming a low refractive index film using the composition, and a low refractive index film and an antireflection film formed by the method.
- An antireflection film is usually formed on a display surface of a display device such as a liquid crystal display device or an EL display in order to suppress reflection or reflection of external light.
- a display device such as a liquid crystal display device or an EL display
- an antireflection film is formed on optical parts used in cameras, copying machines, facsimile machines, laser beam printers, glasses, etc. as necessary.
- Antireflection uses optical interference, so theoretically, even with a single layer coat, the refractive index of the formed film is sufficiently lower than the refractive index of the substrate, as can be derived from the Fresnel formula. Reflection is possible. However, since the range of selection of low-refractive index materials that can be made low-reflective with a single layer coating is actually narrow, in general, anti-reflection films are not suitable for multilayer films (high refractive index layer and low refractive index layer) having different refractive indexes. Is formed.
- the low refractive index layer of the antireflection film composed of multilayer films high refractive index layer and low refractive index layer.
- polysilazane one of hydrogen atoms in polysilazane is used.
- a polysilazane in which a part is substituted with a fluorine-containing alkyl group such as a perfluoroalkyl group a refractive index (1.40 to 1.1) lower than the refractive index (1.46) of silica cured with an unsubstituted polysilazane. 46) (see Patent Document 1), a method of dispersing magnesium fluoride or oxide fine particles in a perhydropolysilazane solution (see Patent Document 2), and the like.
- the refractive index is about 1.40 to 1.46
- the method of obtaining a low refractive index film by incorporating low refractive index fine particles such as magnesium fluoride it is necessary to uniformly disperse a large amount of fine particles in the film and maintain stability.
- Another problem is that the transparency of the film is lost due to the dispersion of the fine particles.
- the use of environmentally friendly raw materials has been increasingly demanded, and the use of polysilazane containing a fluorine compound is feared to affect the environment.
- the present invention has been made on the basis of the above-described circumstances, and has an excellent antireflection function even with a single layer, and its antireflection effect by forming a high refractive index layer in the lower layer in advance. It is an object of the present invention to provide a composition for forming a low refractive index film that can be further improved and does not affect the environment.
- Another object of the present invention is to provide a method for forming a low refractive index film using the above composition for forming a low refractive index film, and a low refractive index film and an antireflection film formed by the method. is there.
- the present inventors have determined that a solution containing an inorganic polysilazane and at least one organic polymer selected from a silazane-containing organic polymer, a siloxazan-containing organic polymer, and a ureasilazane-containing organic polymer in a specific ratio
- a film having a low refractive index that is significantly lower than the refractive index peculiar to the compound when each of the inorganic polysilazane and the organic polymer is converted is obtained, and the refractive index of the film is very small.
- the present inventors have found that even a single layer is useful as an excellent antireflection film, and have made the present invention based on this finding.
- the present invention relates to the following composition for forming a low refractive index film, a method for forming a low refractive index film, a low refractive index film and an antireflection film formed by the method.
- a composition for forming a low refractive index film wherein the weight ratio is 40:60 to 17:83.
- the organic polymer is at least one selected from an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an alkylsilyl group, an alkylamino group, an alkoxy group, and a group represented by the following general formula (I)
- L 1 is bonded to Si of the organic polymer
- L 1 and L 2 are each independently —CH 2 —, —NR 5 —
- R 5 is a hydrogen atom, C 1 -C 4 Represents a hydrocarbon group
- —O—, —S—, —OC ( ⁇ O) — wherein oxygen is bonded to Si
- L 2 may be absent
- R 6 and R 7 are respectively And independently represents a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, or an aryl group
- P 1 and P 2 are each independently an integer of 0 to 4
- P 3 is an integer of 0 to 3.
- silazane-containing organic polymer is a silazane-containing organic polymer represented by the following general formula (II).
- R 1 represents a group represented by the above general formula (I)
- R 2 , R 3 , and R 4 are each independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, or an aryl group.
- An antireflection film comprising the low refractive index film according to (7).
- the film formed using the composition for forming a low refractive index film of the present invention has a low refractive index and functions as an antireflection film even with a single layer. Simplified.
- the film of the present invention is used as an upper layer of a multi-layer structure in which a high refractive index layer is previously formed as a lower layer, a significantly superior antireflection effect can be obtained as compared with the prior art.
- the composition for forming a low refractive index film of the present invention uses an organic polymer that does not contain a fluorine compound, and therefore does not adversely affect the environment. Furthermore, since it is not necessary to disperse the low refractive index fine particles, it is not necessary to be caught by the solubility, dispersibility, etc. of the film forming composition, and it is possible to easily form a low refractive index film excellent in transparency. it can.
- FIG. 1 is a drawing-substituting photograph, which is an SEM photograph of the film cross section obtained in Example 1.
- FIG. 2 is a drawing-substituting photograph, which is a SEM photograph of the film cross section obtained in Comparative Example 1.
- FIG. 3 is a drawing-substituting photograph and an SEM photograph of the film cross section obtained in Comparative Example 2.
- composition for forming a low refractive index film of the present invention
- method for forming a low refractive index film
- a low refractive index film formed by the method The antireflection film will be described in more detail.
- the composition of the present invention comprises an inorganic polysilazane, a silazane-containing organic polymer (hereinafter sometimes referred to as “organic polysilazane”), and a siloxazan-containing organic polymer (hereinafter referred to as “organic polysiloxazan”).
- organic polysiloxazan At least one organic polymer selected from a urea silazane-containing organic polymer (hereinafter sometimes referred to as “organic polyureasilazane”) (hereinafter simply referred to as “organic polymer”). Is included at a specific ratio.
- the inorganic polysilazane and organic polymer, the solvent, the forming method and the like used in the composition of the present invention will be sequentially described in detail.
- the inorganic polysilazane used in the present invention is not particularly limited, and can be arbitrarily selected from conventionally known ones as long as the effects of the present invention are not impaired.
- any method including a conventionally known method may be adopted.
- a dihalosilane represented by the general formula SiH 2 X 2 (where X is a halogen atom) is reacted with a base to form an adduct of dihalosilane, and then the adduct of the dihalosilane is used.
- combining by making it react with ammonia is mentioned.
- halosilanes are acidic and can react with bases to form adducts.
- the formation speed of the adduct and the stability as the adduct depend on the acidic strength of the halosilane and the basic strength of the basic substance, the steric factor, etc., so by appropriately selecting the type of halosilane and the type of base, Adducts that are stable and can easily produce inorganic polysilazane by reaction with ammonia may be formed.
- the stability of the adduct in this case does not necessarily mean that it can be isolated as an adduct, and not only when it is stably present in a solvent, but substantially all of which function as a reaction intermediate. Includes cases.
- the base used to form the adduct may be any base that does not react other than the reaction to form adduct with the halosilane, such as Lewis base, tertiary amines (trialkylamine), pyridine, picoline, and these.
- Derivatives secondary amines having sterically hindered groups, phosphine, arsine and derivatives thereof (for example, trimethylphosphine, dimethylethylphosphine, methyldiethylphosphine, trimethylarsine, trimethylstibine, trimethylamine, triethylamine, Thiophene, furan, dioxane, selenophene, etc.) are preferable, and pyridine and picoline are particularly preferable from the viewpoint of handling and economy.
- the adduct formation reaction is performed in a solvent.
- inorganic polysilazane is formed by reacting the adduct with ammonia in a non-reactive solution, but the amount of ammonia at that time should be an excess amount relative to silane.
- the reaction conditions may be any reaction temperature of ⁇ 78 ° C. to 100 ° C., preferably ⁇ 40 ° C. to 80 ° C., and the reaction time and reaction pressure are not particularly limited.
- the polymerization reaction of the inorganic polysilazane is preferably performed in an inert gas atmosphere, and nitrogen or argon is suitable as the inert gas.
- Perhydropolysilazane having a linear portion and a cyclic portion in the molecule is known.
- Perhydropolysilazane can be obtained by, for example, the method described in Japanese Patent Publication No. 63-16325 or D.I. Seyferth et al., Communication of Am. Cer. Soc. , C-13, January 1983, Japanese Patent Application Laid-Open No. 11-116815, etc., and basically includes a chain portion and a cyclic portion in the molecule.
- Japanese Patent Publication No. 63-16325 has a molecular weight of 690 to 2,000, 3 to 10 SiH 3 groups in one molecule, and an element ratio by chemical analysis is Si: 59 to 61, N: Perhydropolysilazanes with 31-34 and H: 6.5-7.5% by weight are shown.
- An example of the perhydropolysilazane structure is as follows.
- Inorganic polysilazane can be synthesized by the method described above. These inorganic polysilazanes are not particularly limited as long as they are soluble in the solvent, but in general, the number average molecular weight (polystyrene conversion) is preferably 500 to 5,000, more preferably 500 to 3, 000, more preferably 600 to 2,000.
- organic polymer used in the present invention can be arbitrarily selected from conventionally known organic polysilazanes, organic polysiloxazanes, and organic polyureasilazanes as long as the effects of the present invention are not impaired. These are polymers in which a nitrogen atom in a polymer is bonded to at least two silicon atoms, and an organic group is bonded to an arbitrary Si atom of the polymer.
- the organic polysilazane of the present invention has an organic group bonded to any Si atom of a polymer having at least one of a linear, branched or cyclic main chain containing at least one Si—N bond
- Polysiloxazan is an organic group bonded to any Si atom of a polymer having at least one of a linear, branched or cyclic main chain containing both Si-N and Si-O bonds
- the organic polyureasilazane has at least one linear, branched or cyclic backbone containing at least one Si—N bond and having at least one carbonyl group bonded to each of two nitrogen atoms.
- An organic group is bonded to an arbitrary Si atom of the polymer.
- an alkyl group As the organic group bonded to the Si atom in the polymer, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an alkylsilyl group, an alkylamino group, an alkoxy group, a group represented by the following general formula (I), Etc.
- the alkyl group is a C 1 -C 4 alkyl group
- the alkenyl group is a C 2 -C 3 alkenyl group
- the cycloalkyl group is a C 6 -C 8 cycloalkyl group
- the aryl group is C 6 aryl group ⁇ C 8
- the alkylsilyl group is an alkylsilyl group having C 1 ⁇ C 6
- the alkylamino group is an alkylamino group of C 1 ⁇ C 6
- C 1 ⁇ C 6 is the alkoxy group
- the alkoxy group is preferable.
- L 1 is bonded to Si of the organic polymer
- L 1 and L 2 are each independently —CH 2 —, —NR 5 —
- R 5 is a hydrogen atom, C 1 -C 4 —O—, —S—, —OC ( ⁇ O) — (ester group, oxygen is bonded to Si), but L 2 may be omitted.
- R 6 and R 7 are each independently a hydrogen atom, alkyl group, alkenyl group, cycloalkyl group, or aryl group
- P 1 and P 2 are each independently an integer of 0 to 4
- P 3 is 0 to 3 Is an integer.
- alkyl group of R 6 examples include an unsubstituted group, a hydroxyl group, a C 1 -C 6 alkoxy group, a C 2 -C 3 alkenyl group, a silyl group, and —N (R 8 ) 2 (where R 8 is A C 1 -C 10 alkyl group substituted with hydrogen, a C 1 -C 6 alkyl group and a C 2 -C 3 alkenyl group).
- alkenyl group examples include an unsubstituted group, a hydroxyl group, a C 1 -C 6 alkoxy group, a silyl group, and a C 1 -C 10 alkenyl group substituted with —N (R 8 ) 2 .
- the aryl group, unsubstituted or hydroxyl group, an alkyl group of C 1 ⁇ C 6, an alkenyl group of C 2 ⁇ C 3, alkoxy group of C 1 ⁇ C 6, a silyl group, and -N (R 8 1 ring or 2 aryl groups ring substituted with 2 may be mentioned as preferred.
- Preferred examples of the group for R 7 include a hydrogen atom, a hydroxyl group, and the substituted or unsubstituted alkyl group, alkenyl group, and aryl group mentioned for R 6 .
- the group represented by the general formula (I) is substituted as a side chain of the polymer by reacting a polymer prepared in advance with a reagent having a reactive amine or a hydroxyl functional group.
- the reagent examples include 1-triethoxysilylacetic acid, 3-trimethoxysilylpropionic acid, 3-ethoxysilylpropionic acid, triethoxysilylmethanethiol, trimethoxysilylmethanethiol, 3-triethoxysilylpropanethiol, 2-triethoxysilylpropanethiol Methoxysilylethanol, 2-triethoxysilylethanol, 3-triethoxysilylpropanol, acetoxymethyltriethoxysilane, acetoxymethyltrimethoxysilane, acetoxypropyltrimethoxysilane, N- (3-acryloxy-2-hydroxy-propyl) -3-aminopropyltriethoxysilane, (3-acryloxypropyl) -dimethylmethoxysilane, (3-acryloxypropyl) -methyldimethoxysilane, (3-acryloxypro ) -Trimethoxy
- organic polymers are prepared in advance, for example, by a method of polymerizing a monomer having an organic group as described in JP-A-7-18080 or as described in Japanese Patent No. 4236937. It is produced by a method in which a hydrogen atom of a polymer is replaced with an organic group.
- Silazane polymers can be prepared by the methods described in, for example, Japanese Patent No. 4236937, US Pat. No. 4,482,669, US Pat. No. 4,689,252, etc. No. 5,405,655, U.S. Pat. No. 5,919,572 and the like.
- Ureasilazane polymers can be prepared by, for example, U.S. Pat. No. 5,021,533, U.S. Pat. Although it can prepare by the method described in 929,704 etc., it is also possible to use a commercially available thing.
- organic polysilazane is preferable because a solvent that can be used for inorganic polysilazane can be used.
- examples of preferred organic polysilazane include those represented by the following general formula (II).
- R 1 represents a group represented by the above general formula (I)
- R 2 , R 3 , and R 4 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, Represents an alkylsilyl group, an alkylamino group, or an alkoxy group;
- n and n are numbers representing the molar ratio of the structural units of the organic polysilazane represented by the general formula (II).
- m + n 100
- m: n 50: 50 to 1:99
- m: n 33: 67 to 1:99
- more preferably m: n 15: 85 to 2:98.
- R 2 , R 3 , and R 4 include a C 1 to C 4 alkyl group, a C 2 to C 3 alkenyl group, a C 6 to C 8 cycloalkyl group, a C 6 to C 8 aryl group, and C A 1 to C 6 alkylsilyl group, a C 1 to C 6 alkylamino group, and a C 1 to C 6 alkoxy group are preferred.
- organic polymers are not particularly limited as long as they are soluble in a solvent, but in general, the number average molecular weight (in terms of polystyrene) is preferably 500 to 5,000, more preferably 500 to 3 1,000, more preferably 600 to 2,000.
- the inorganic polysilazane and the organic polymer described above are used in a weight ratio of 40:60 to 17:83, and a more preferable weight ratio is 33:67 to 20:80. If the content ratio of the inorganic polysilazane exceeds 40% by weight or less than 17% by weight, it is difficult to reduce the refractive index of the formed film. If the weight ratio is within the above range, the solvent evaporates after application of the composition, resulting in poor compatibility between the inorganic polysilazane and the organic polymer.
- each of them does not precipitate uniformly, thereby forming a fine concavo-convex structure with a step whose depth changes abruptly on the film surface, and an air layer is formed on the surface portion of the film.
- it is a layered film, it is assumed that the optical characteristics of the surface portion of the film and the inside of the film are different, and exhibit optical characteristics like a multilayer film.
- the unevenness of the film surface gradually disappears and is smoothed, and the refractive index of the entire film becomes a value close to the refractive index of the inorganic polysilazane or organic polymer material itself.
- the low refractive index film of the present invention is obtained by converting inorganic polysilazane and organic polymer into silica and organosiloxane, respectively, a catalyst for promoting the conversion is added to the composition as necessary. Can do.
- the catalyst examples include an N-heterocyclic compound, an amine compound, or a salt obtained by contacting at least one metal salt selected from the group consisting of transition elements with a basic organic compound.
- N-heterocyclic compound examples include piperidine, piperazine, pyrrolidine, imidazolidine, pyrazolidine, pyrazoline, pyrroline, pyrazine, indole, imidazole, triazine, etc., and 1,4-diazabicyclo [2.2.2].
- Hetero-bridged ring compounds such as octane, 7-azabicyclo [2.2.1] heptane, 1,3-di-4-piperidylpropane, 4,4′-trimethylenebis (1-methylpiperidine), 2 , 2-dipyridylamine, and the like.
- N-heterocyclic compounds include 1,3-di-4-piperidylpropane, 4,4′-trimethylenebis (1-methylpiperidine), diazabicyclo- [2.2.2] octane and cis-2. , 6-dimethylpiperazine.
- N-heterocyclic compound When the N-heterocyclic compound is added as a catalyst, it is preferably contained in an amount of 0.01 to 50% by weight, more preferably 0.1 to 10% by weight based on the total weight of the inorganic polysilazane and the organic polymer. %.
- R A independently represents hydrogen or a C 1 -C 4 hydrocarbon group, wherein two R A bonded to one nitrogen are not hydrogen at the same time, and L 1 and L 2 are each Independently represents —CH 2 —, —NR A1 — (wherein R A1 is hydrogen or a C 1 -C 4 hydrocarbon group), or —O—, and p1 and p3 are each independently 0 to 4 is an integer, and p2 is an integer of 1 to 4.) Or general formula (B):
- R B independently represents hydrogen or a C 1 -C 4 hydrocarbon group, and q 1 and q 2 each independently represents an integer of 1 to 4)
- q 1 and q 2 each independently represents an integer of 1 to 4
- These amine compounds are amine compounds having two or more N atoms in one molecule, and the distance between the N atoms is approximately the same as or more than five CC bonds. is there. If the amine compound has more than two N atoms, the distance between any two of them should satisfy the above-mentioned conditions. Further, it is desirable that a short-chain hydrocarbon group is bonded to the N atom, and it is more preferable that the number of hydrocarbon groups is larger. That is, it is desirable that the number of N—H bonds is small. However, regarding the amine compound represented by the general formula (B), the effect of the present invention can be achieved even if two hydrogen atoms are bonded to the terminal N atom.
- amine compounds can be used in combination of two or more as required.
- the amine compound is added as a catalyst, it is preferably contained in an amount of 50% by weight or less, more preferably 10% by weight or less, based on the total weight of the inorganic polysilazane and the organic polymer.
- the contact of at least one metal salt selected from the group consisting of transition elements with the basic organic compound is at least selected from the group consisting of transition elements prior to mixing with the inorganic polysilazane and organic polymer solution.
- a metal salt is brought into contact with a basic organic compound.
- the transition element include La, Ce, Ti, Zr, V, Cr, W, Mn, Fe, Co, Ni, Pd, Cu, Ag, Zn, Al, In, Sn, Bi, and Pt.
- These metal salts include halides such as chlorides, organic acid salts such as acetylacetonate, inorganic acid salts such as nitrates and sulfates, and hydroxides.
- suitable metal salts include, for example, LaCl 3 , CeCl 3 , TiCl 4 , ZrCl 4 , VCl 4 , CrCl 6 , WCl 6 , MnCl 2 , FeCl 3 , CoCl 3 , NiCl 2 , PdCl 2 , CuCl 2 , AgCl, ZnCl 2 , AlCl 3 , InCl 3 , SnCl 4 , SnCl 2 , BiCl 3 , PtCl 2 , La (CH 3 COO) 3 , Ce (CH 3 COO) 3 , Cr (CH 3 COO) 2 , Mn ( CH 3 COO) 2, Fe ( CH 3 COO) 2, Co (CH 3 COO) 2, Ni (CH 3 COO) 2, Pd (CH 3 COO) 2, Pd (C 2 H 5 COO) 2, Cu ( CH 3 COO) 2, Ag ( CH 3 COO), Zn (CH 3 COO) 2, In (CH 3 COCO)
- the basic organic compound to be brought into contact with the metal salt as described above includes primary, secondary and tertiary amines, pyridines, and other strongly basic organic compounds.
- the basic organic compound may be a gas or a liquid upon contact with the metal salt.
- primary, secondary and tertiary amines include methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, propylamine, dipropylamine, tripropylamine, butylamine, dibutylamine, tributylamine, pentyl.
- pyridine examples include pyridine, picoline, lutidine, pyrimidine, pyridazine and the like.
- strongly basic organic compounds include 1,8-diazabicyclo [5.4.0] -7-undecene (DBU), 1,5-diazabicyclo [4.3.0] -5-nonene ( DBN) and the like.
- DBU 1,8-diazabicyclo [5.4.0] -7-undecene
- DBN 1,5-diazabicyclo [4.3.0] -5-nonene
- Particularly suitable as the basic organic compound in the present invention are primary amines, secondary amines, DBU and DBN.
- the metal salt is brought into contact with the basic organic compound.
- the basic organic compound may be brought into contact with the metal salt in an amount sufficient to obtain the desired effect.
- the basic organic compound may be contacted in an amount of 0.01 to 50 mol, preferably 1 to 10 mol, per 1 mol of the metal salt.
- the contact amount of the basic organic compound with respect to 1 mol of the metal salt is lower than 0.01 mol, the inorganic polysilazane and the organic polymer react rapidly with the metal salt when the inorganic polysilazane and the organic polymer solution are mixed later, Large solid particles are produced in large quantities.
- the contact amount of the basic organic compound is higher than 50 mol, the stability of the inorganic polysilazane and the organic polymer to be mixed later is lowered. By this contact, it is considered that the metal salt and the basic organic compound react to form a complex.
- the inorganic polysilazane and organic polymer and metal salt of the present invention contain a metal salt /
- the inorganic polysilazane and organic polymer are mixed so that the weight ratio is generally 0.0001 to 0.5, preferably 0.001 to 0.2. If the mixing amount of the metal salt is increased more than this, the molecular weight of the inorganic polysilazane and the organic polymer will be excessively increased to cause gelation, and if it is less, sufficient effects cannot be achieved.
- it is preferable to perform mixing in an inert atmosphere for example, an atmosphere such as nitrogen or argon, but it is also possible to mix in an oxidizing atmosphere such as air.
- composition according to the present invention may contain other additive components as required.
- additive components include a viscosity adjusting agent and a crosslinking accelerator.
- a phosphorus compound such as tris (trimethylsilyl) phosphate may be contained for the purpose of obtaining a sodium gettering effect when used in a semiconductor device.
- the composition of the present invention may contain a solvent.
- the solvent is not particularly limited as long as it can dissolve each component such as an inorganic polysilazane, an organic polymer, a catalyst, and an additive. Specific examples of preferable solvents include the following. .
- (A) aromatic compounds such as benzene, toluene, xylene, ethylbenzene, diethylbenzene, trimethylbenzene, triethylbenzene, etc.
- (B) saturated hydrocarbon compounds such as n-pentane, i-pentane, n-hexane, i-hexane, n-heptane, i-heptane, n-octane, i-octane, n-nonane, i-nonane, n -Decane, i-decane, etc.
- ethers such as dipropyl ether, dibutyl ether , Diethyl ether, methyl tertiary butyl ether (hereinafter referred to as MTBE), anisole and the like
- MIBK ketones
- solvents can be used in combination of two or more as appropriate in order to adjust the evaporation rate of the solvent, to reduce the harmfulness to the human body, or to adjust the solubility of each component.
- a commercially available solvent can also be used as such a solvent.
- a solvent with low volatility from the viewpoint of safety. Specifically, it is more preferable to use the following low volatility among the solvents described above.
- dibutyl ether is particularly preferable from the viewpoint of forming a fine concavo-convex structure on the film surface after coating, and the solvents described above can be used as long as the solubility and the effects of the present invention are not impaired.
- membrane by this invention is formed by apply
- the surface material of the base material used is not particularly limited, for example, a transparent base material such as glass or plastic is preferable.
- the base material may be a non-transparent base material such as a silicon substrate.
- the substrate may be plate-shaped, film-shaped or massive, plate-shaped, or curved. Any conventionally known glass may be used as the glass material.
- the plastic material may be any conventionally known one, such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer.
- Polyester resins such as polyethylene terephthalate / polyethylene naphthalate coextruded films; Polyamide resins such as nylon 6, nylon 66 and nylon 610; Polyolefin resins such as polyethylene, polypropylene and polymethylpentene; Vinyl such as polyvinyl chloride Resin; acrylic resin such as polyacrylate, polymethacrylate, polymethyl methacrylate; polyimide, polyamideimide, polyester Imide resins such as terimide; engineering resins such as polyarylate, polysulfone, polyethersulfone, polyphenylene ether, polyphenylene sulfide (PPS), polyaramide, polyetherketone, polyethernitrile, polyetheretherketone, polyethersulfite; polycarbonate Styrene resins such as polystyrene, high impact polystyrene, AS resin, and ABS resin; and cellulose films such as cellophane, cellulose diacetate, cellulose triacetate, cellulose diacetate,
- any conventionally known method such as a spin coating method, a dip method, a spray method, a roller coating method, a transfer method, a slit coating method, a printing method such as gravure coating, and the like can be used.
- a method is mentioned.
- a coating film drying step can be provided separately.
- a coating film can be made into a desired film thickness by applying it once or twice or more as necessary.
- the film applied to the surface of the substrate may be allowed to stand at room temperature in an atmosphere containing water vapor, oxygen, or a mixed gas thereof, that is, in an oxidizing atmosphere, and the composition may be converted.
- pre-baking it may be heated and fired, and may be allowed to stand at normal temperature to convert the composition, or may be further fired with heated steam after the baking.
- Pre-baking may be performed, for example, at a temperature of 40 ° C. to 80 ° C. for about 5 to 15 minutes using a hot plate or the like.
- the heat baking is performed at a low temperature, for example, about 120 ° C. to 200 ° C.
- a low refractive index film is formed by using the low refractive index forming composition of the present invention.
- the film formed using the composition of the present invention has a fine uneven structure with a step on the film surface after the conversion of the composition.
- an air layer with this uneven structure Although it is a layered film, the optical characteristics of the surface portion of the film and the inside of the film are different, and it is considered that the optical characteristics of a multilayer film are exhibited.
- the film thickness is preferably 100 to 500 nm, more preferably 150 to 300 nm.
- the thickness of the uneven layer is preferably about 50 to 150 nm.
- the high refractive index layer may be an existing one having a refractive index of about 1.44 to 2.00.
- the film thickness can be appropriately designed so as to obtain the desired optical performance, and is not necessarily limited to the following range, but the low refractive index film is 100 to 500 nm, and the high refractive index film is 50 to 500 nm. More preferably, the low refractive index film is 150 to 300 nm, and the high refractive index film is 100 to 300 nm.
- Film thickness and refractive index (633 nm) were measured using an ellipsometer.
- the film formed using the composition according to the present invention has a refractive index after conversion of inorganic polysilazane alone (1.45), a refractive index after conversion of organic polysilazane alone (1.40), 1. Refractive index of 1.30 to 1.40, display used in mobile phones, personal computers, televisions, etc., optical parts used in cameras, copiers, facsimiles, laser beam printers, touch panels, windows for exhibition and housing It is useful as an antireflection film for glass, glasses and the like.
- GPC RID-10A (manufactured by Shimadzu) Spin coater: 1H-360S (Mikasa) Film thickness meter: VUV302 type ellipsometer (manufactured by JA Woollam Japan Co., Ltd.)
- the obtained product was filtered under reduced pressure using a Buchner funnel under a dry nitrogen atmosphere to obtain 1,200 ml of a filtrate.
- pyridine was distilled off using an evaporator, 40 g of perhydropolysilazane was obtained.
- the number average molecular weight of the obtained perhydropolysilazane was measured by GPC (developing liquid: CDCl 3 ), it was 800 in terms of polystyrene.
- the IR (infrared absorption) spectrum was measured.
- the wave number (cm ⁇ 1 ) was 3350, the absorption based on NH near 1200: the absorption based on Si—H of 2170: Si—N—Si of 1020 to 820 It was confirmed to show absorption based on.
- GPC developing liquid: CDCl 3
- inorganic polysilazane solutions A1 and A2 and organic polysilazane solution B1 were prepared by the following method.
- the film was converted by the following “film conversion” (1) to (4).
- a spin coater 500 rpm for 5 seconds, then 1,000 rpm for 20 seconds.
- FIG. 1 shows an SEM photograph of the film cross section.
- Example 2 A film was formed in the same manner as in Example 1 except that the conversion of the film was changed to (2). As a result, the film thickness was 220 nm and the refractive index was 1.31.
- Example 3 A film was formed in the same manner as in Example 1 except that the conversion of the film was changed to (3).
- the film thickness was 230 nm and the refractive index was 1.30.
- Example 4 A film was formed in the same manner as in Example 1 except that the film conversion was changed to (4). As a result, the film thickness was 230 nm and the refractive index was 1.35.
- Example 5 A film was formed in the same manner as in Example 1 except that 4 g of the inorganic polysilazane solution (A1), 16 g of the organic polysilazane solution (B1), and 10.8 g of dibutyl ether were formed.
- the film thickness was 250 nm and the refractive index was 1 .35.
- Example 6 A film was formed in the same manner as in Example 1 except that 6 g of the inorganic polysilazane solution (A1), 12 g of the organic polysilazane solution (B1), and 14.7 g of dibutyl ether were formed. The film thickness was 230 nm and the refractive index was 1 .35.
- Example 7 A film was formed in the same manner as in Example 1 except that 3 g of the inorganic polysilazane solution (A1), 15 g of the organic polysilazane solution (B1), and 4.5 g of dibutyl ether were formed.
- the film thickness was 240 nm and the refractive index was 1 .39.
- Example 8 A film was formed in the same manner as in Example 3 except that 3 g of the inorganic polysilazane solution (A1), 15 g of the organic polysilazane solution (B1), and 4.5 g of dibutyl ether were formed.
- the film thickness was 240 nm and the refractive index was 1 .35.
- Example 9 A film was formed in the same manner as in Example 1 except that 6 g of the inorganic polysilazane solution (A1), 9 g of the organic polysilazane solution (B1), and 12.3 g of dibutyl ether were formed. The film thickness was 220 nm and the refractive index was 1 .39.
- Example 10 A film was formed in the same manner as in Example 2 except that 6 g of the inorganic polysilazane solution (A1), 9 g of the organic polysilazane solution (B1), and 12.3 g of dibutyl ether were formed. The film thickness was 220 nm and the refractive index was 1 .36.
- Example 11 A film was formed in the same manner as in Example 1 except that dibutyl ether was changed to 8.6 g.
- the film thickness was 290 nm and the refractive index was 1.34.
- Example 12 A film was formed in the same manner as in Example 1 except that 24.4 g of dibutyl ether was used. The film thickness was 160 nm and the refractive index was 1.37.
- Example 13 A film was formed in the same manner as in Example 1 except that 46.7 g of dibutyl ether was used. The film thickness was 110 nm and the refractive index was 1.39.
- Example 14 A low refractive index film was formed in the same manner as in Example 1 except that dibutyl ether was not added.
- the film thickness was 470 nm and the refractive index was 1.39.
- Example 15 When a low refractive index film was formed in the same manner as in Example 3 except that the inorganic polysilazane solution was changed to (A2), the film thickness was 200 nm and the refractive index was 1.36.
- Example 1 A film was formed in the same manner as in Example 1 except that 7 g of the inorganic polysilazane solution (A1), 7 g of the organic polysilazane solution (B1), and 14 g of dibutyl ether were formed.
- the film thickness was 200 nm and the refractive index was 1.43. Met.
- FIG. 2 shows an SEM photograph of the film cross section.
- Example 2 A film was formed in the same manner as in Example 1 except that 3 g of the inorganic polysilazane solution (A1), 27 g of the organic polysilazane solution (B1), and 5.3 g of dibutyl ether were formed.
- the film thickness was 240 nm and the refractive index was 1 .45.
- FIG. 3 shows an SEM photograph of the film cross section.
- Example 3 A film was formed in the same manner as in Example 1 except that 10 g of the inorganic polysilazane solution (A1), 0 g of the organic polysilazane solution (B1) and 10 g of dibutyl ether were formed.
- the film thickness was 250 nm and the refractive index was 1.47. Met.
- Example 5 A film was formed in the same manner as in Example 3 except that 10 g of the inorganic polysilazane solution (A1), 0 g of the organic polysilazane solution (B1) and 10 g of dibutyl ether were formed.
- the film thickness was 230 nm and the refractive index was 1.45. Met.
- Example 6> A film was formed in the same manner as in Example 1 except that the inorganic polysilazane solution (A1) was 0 g, the organic polysilazane solution (B1) was 12 g, and dibutyl ether was 3 g. The film thickness was 260 nm and the refractive index was 1.44. Met.
- ⁇ Comparative Example 7> A film was formed in the same manner as in Example 2 except that 0 g of the inorganic polysilazane solution (A1), 12 g of the organic polysilazane solution (B1), and 3 g of dibutyl ether were formed. The film thickness was 260 nm and the refractive index was 1.45. Met.
- Example 8 A film was formed in the same manner as in Example 3 except that 0 g of the inorganic polysilazane solution (A1), 12 g of the organic polysilazane solution (B1), and 3 g of dibutyl ether were formed. The film thickness was 250 nm and the refractive index was 1.44. Met.
- Table 2 shows a summary of the compositions for forming low refractive index films of Examples 1 to 15, films formed using the compositions, and films of Comparative Examples 1 to 8.
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Abstract
Description
まず、本発明に用いられる無機ポリシラザンについて説明する。
本発明に用いられる無機ポリシラザンは特に限定されず、本発明の効果が損なわれない限り、従来知られたものから任意に選択することができ、例えば一般式(III):
本発明に用いられる有機重合体は、本発明の効果を損なわない限り従来知られた有機ポリシラザン、有機ポリシロキサザン、有機ポリウレアシラザンから任意に選択することができる。これらは、重合体中の窒素原子が少なくとも二つのケイ素原子に結合され、重合体の任意のSi原子に有機基が結合した重合体である。
または一般式(B):
で表されるものが挙げられる。
本発明による組成物には、必要に応じてその他の添加剤成分を含有することもできる。そのような成分として、例えば粘度調製剤、架橋促進剤等が挙げられる。また、半導体装置に用いられたときにナトリウムのゲッタリング効果などを目的に、リン化合物、例えばトリス(トリメチルシリル)フォスフェート等、を含有することもできる。
本発明の組成物は、溶媒が含まれてもよい。溶媒としては、無機ポリシラザン、有機重合体、触媒、添加剤等の各成分を溶解し得るものであれば特に限定されるものではないが、好ましい溶媒の具体例としては、次のものが挙げられる。
(b)飽和炭化水素化合物、例えばn-ペンタン、i-ペンタン、n-ヘキサン、i-ヘキサン、n-ヘプタン、i-ヘプタン、n-オクタン、i-オクタン、n-ノナン、i-ノナン、n-デカン、i-デカン等、
(c)脂環式炭化水素化合物、例えばエチルシクロヘキサン、メチルシクロヘキサン、シクロヘキサン、シクロヘキセン、p-メンタン、デカヒドロナフタレン、ジペンテン、リモネン等、α-ピネン
(d)エーテル類、例えばジプロピルエーテル、ジブチルエーテル、ジエチルエーテル、メチルターシャリーブチルエーテル(以下、MTBEという)、アニソール等、および
(e)ケトン類、例えばメチルイソブチルケトン(以下、MIBKという)等。
(c1)エチルシクロヘキサン、メチルシクロヘキサン、シクロヘキサン、シクロヘキセン、p-メンタン、またはジペンテン、
(d1)ジプロピルエーテル、ジブチルエーテル、またはMTBE、
(e1)MIBK。
本発明による低屈折率膜は、前記した組成物を、基材に塗布し、必要に応じて加熱などにより組成物を転化させることにより形成される。
本発明の低屈折率形成用組成物を用いることにより低屈折率膜が形成される。前記したように、本発明の組成物を用いて形成された膜は、組成物の転化後に膜表面に微細で、段差のある凹凸構造が構築され、この凹凸構造による空気層の形成で、単層膜でありながら、膜の表面部分と膜の内部の光学特性が異なり、多層膜様の光学特性を示すと考えられる。そのため、本発明の低屈折率膜が単層の反射防止膜として用いられる場合、膜が薄すぎると多層膜様の光学特性を示さなくなり、また、膜が厚すぎると、膜に占める凹凸層の割合が少なくなることから、膜厚は、100~500nmが好ましく、より好ましくは、150~300nmである。なお、凹凸層の厚みは、50~150nm程度が好ましい。
スピンコーター:1H-360S(ミカサ製)
膜厚計:VUV302型エリプソメーター(ジェーエーウーラム・ジャパン株式会社製)
先ず、本発明の無機ポリシラザン及び有機ポリシラザンの合成例を以下に示す。
内容積1リットルの四つ口フラスコにガス吹き込み管、メカニカルスターラー、ジュワーコンデンサーを装着した。反応器内部を脱酸素した乾燥窒素で置換した後、四つ口フラスコに脱気した乾燥ピリジンを1,500ml入れ、これを氷冷した。次に、ジクロロシラン100gを加えると、白色固体状のアダクト(SiH2Cl2・2C5H5N)が生成した。反応混合物を氷冷し、撹拌しながらアンモニア70gを吹き込んだ。引き続き、乾燥窒素を液層に30分間吹き込み、余剰のアンモニアを除去した。
500gのメチルジクロロシランと、250gのジメチルジクロロシランの混合物を液体アンモニアにて共アンモノリシスによりポリシラザンを合成した。得られたポリシラザン250gに、3-アミノプロピルトリエトキシシラン34.1gを、23℃雰囲気下で添加し、1時間マグネチックスタラーとスタラーチップを用い撹拌を行った。次いで、23℃雰囲気下で12時間静置後、撹拌しながらホットプレートで78℃まで徐々に昇温させた。ホットプレートの温度が78℃になってから更に2時間撹拌した後、ホットプレートの電源を切り、23℃程度に冷めるまで乾燥窒素を送り込み、バブリング撹拌を行った。一般式(II)のR2~R4がメチル基もしくは水素、m:n=4:96であり、R1が一般式(I)の基で、該基のL1=-NH-、L2=-CH2-、P1=P2=1、P3=0、R6=-CH2CH3である有機ポリシラザンが得られた。得られた有機ポリシラザンの数平均分子量をGPC(展開液:CDCl3)により測定したところ、ポリスチレン換算で数平均分子量は850であった。
上記合成例1で合成された無機ポリシラザンを用いて以下の溶液を調製した。
(A1):容量100mlのガラス製ビーカーに、上記合成例1で得られたペルヒドロポリシラザン16gとジブチルエーテル63.2gを導入し、次に、そのポリシラザン溶液にテトラメチルヘキサンジアミン0.8g(ペルヒドロポリシラザンに対して5.0wt%)をスターラーで攪拌しながら、添加して、無機ポリシラザン重量が約20%のジブチルエーテル溶液を調製した。
(A2):容量100mlのガラス製ビーカーに、上記合成例1で得られたペルヒドロポリシラザン16gとジブチルエーテル64gを導入し、無機ポリシラザン重量が20%のジブチルエーテル溶液を調製した。
上記合成例2で合成された有機ポリシラザンを用いて以下の溶液を調製した。
(B1):容量100mlのガラス製ビーカーに、上記合成例2で得られた有機ポリシラザン16gとジブチルエーテル64gを導入し、有機ポリシラザン重量が20%のジブチルエーテル溶液を調製した。
(1)ホットプレートで、80℃で5分間プリベーク後、200℃で30分間焼成し、更に23℃、60RH%雰囲気下で3日間静置した。
(2)ホットプレートで、80℃で5分間プリベーク後、200℃で30分間焼成し、更に100℃の加熱水蒸気で1時間焼成した。
(3)ホットプレートで、80℃で5分間プリベーク後、200℃で30分間焼成し、更に400℃のホットプレートで30分間焼成した。
(4)23℃、60RH%雰囲気下で3日間放置した。
容量100mlのガラスビーカーに、無機ポリシラザン溶液(A1)を5.0g、有機ポリシラザン溶液(B1)を15.0g加え、次いで、ジブチルエーテルを13.3g加え、3分間乾燥窒素を送り込みバブリング撹拌を行い、無機ポリシラザン:有機ポリシラザン=1:3、無機及び有機ポリシラザン重量が12%のコーティング溶液を調製した。得られた溶液を、スピンコーターを用い(500rpmで5秒、次いで1,000rpmで20秒)、4インチ厚さ0.5mmのシリコンウェハー上に塗布した。その後、上記膜の転化(1)で処理を行った後の膜厚及び633nmにおける膜の屈折率の測定をウーラム社製エリプソメーターにて行ったところ、膜厚は230nm、屈折率は1.33であった。膜断面のSEM観察を行ったところ、膜表面は凹凸のある粗い形状で、空気層を有することが確認された。図1に膜断面のSEM写真を示す。
膜の転化を(2)とした以外は実施例1と同様にして膜を形成したところ、膜厚は220nm、屈折率は1.31であった。
膜の転化を(3)とした以外は実施例1と同様にして膜を形成したところ、膜厚は230nm、屈折率は1.30であった。
膜の転化を(4)とした以外は実施例1と同様にして膜を形成したところ、膜厚は230nm、屈折率は1.35であった。
無機ポリシラザン溶液(A1)を4g、有機ポリシラザン溶液(B1)を16g、ジブチルエーテルを10.8gとした以外は実施例1と同様にして膜を形成したところ、膜厚は250nm、屈折率は1.35であった。
無機ポリシラザン溶液(A1)を6g、有機ポリシラザン溶液(B1)を12g、ジブチルエーテルを14.7gとした以外は実施例1と同様にして膜を形成したところ、膜厚は230nm、屈折率は1.35であった。
無機ポリシラザン溶液(A1)を3g、有機ポリシラザン溶液(B1)を15g、ジブチルエーテルを4.5gとした以外は実施例1と同様にして膜を形成したところ、膜厚は240nm、屈折率は1.39であった。
無機ポリシラザン溶液(A1)を3g、有機ポリシラザン溶液(B1)を15g、ジブチルエーテルを4.5gとした以外は実施例3と同様にして膜を形成したところ、膜厚は240nm、屈折率は1.35であった。
無機ポリシラザン溶液(A1)を6g、有機ポリシラザン溶液(B1)を9g、ジブチルエーテルを12.3gとした以外は実施例1と同様にして膜を形成したところ、膜厚は220nm、屈折率は1.39であった。
無機ポリシラザン溶液(A1)を6g、有機ポリシラザン溶液(B1)を9g、ジブチルエーテルを12.3gとした以外は実施例2と同様にして膜を形成したところ、膜厚は220nm、屈折率は1.36であった。
ジブチルエーテルを8.6gとした以外は実施例1と同様にして膜を形成したところ、膜厚は290nm、屈折率は1.34であった。
ジブチルエーテルを24.4gとした以外は実施例1と同様にして膜を形成したところ、膜厚は160nm、屈折率は1.37であった。
ジブチルエーテルを46.7gとした以外は実施例1と同様にして膜を形成したところ、膜厚は110nm、屈折率は1.39であった。
ジブチルエーテルを添加しない以外は実施例1と同様にして低屈折率膜を形成したところ、膜厚は470nm、屈折率は1.39であった。
無機ポリシラザン溶液を(A2)にした以外は実施例3と同様にして低屈折率膜を形成したところ、膜厚は200nm、屈折率は1.36であった。
無機ポリシラザン溶液(A1)を7g、有機ポリシラザン溶液(B1)を7g、ジブチルエーテルを14gとした以外は実施例1と同様にして膜を形成したところ、膜厚は200nm、屈折率は1.43であった。膜断面のSEM観察を行ったところ、膜表面は比較的滑らかな形状であった。図2に膜断面のSEM写真を示す。
無機ポリシラザン溶液(A1)を3g、有機ポリシラザン溶液(B1)を27g、ジブチルエーテルを5.3gとした以外は実施例1と同様にして膜を形成したところ、膜厚は240nm、屈折率は1.45であった。膜断面のSEM観察を行ったところ、膜表面は比較的滑らかな形状であった。図3に膜断面のSEM写真を示す。
無機ポリシラザン溶液(A1)を10g、有機ポリシラザン溶液(B1)を0g、ジブチルエーテルを10gとした以外は実施例1と同様にして膜を形成したところ、膜厚は250nm、屈折率は1.47であった。
無機ポリシラザン溶液(A1)を10g、有機ポリシラザン溶液(B1)を0g、ジブチルエーテルを10gとした以外は実施例2と同様にして膜を形成したところ、膜厚は250nm、屈折率は1.45であった。
無機ポリシラザン溶液(A1)を10g、有機ポリシラザン溶液(B1)を0g、ジブチルエーテルを10gとした以外は実施例3と同様にして膜を形成したところ、膜厚は230nm、屈折率は1.45であった。
無機ポリシラザン溶液(A1)を0g、有機ポリシラザン溶液(B1)を12g、ジブチルエーテルを3gとした以外は実施例1と同様にして膜を形成したところ、膜厚は260nm、屈折率は1.44であった。
<比較例7>
無機ポリシラザン溶液(A1)を0g、有機ポリシラザン溶液(B1)を12g、ジブチルエーテルを3gとした以外は実施例2と同様にして膜を形成したところ、膜厚は260nm、屈折率は1.45であった。
無機ポリシラザン溶液(A1)を0g、有機ポリシラザン溶液(B1)を12g、ジブチルエーテルを3gとした以外は実施例3と同様にして膜を形成したところ、膜厚は250nm、屈折率は1.44であった。
Claims (8)
- (A)無機ポリシラザン、および(B)シラザン含有有機重合体、シロキサザン含有有機重合体、ウレアシラザン含有有機重合体から選ばれる少なくとも1種の有機重合体を含み、(A):(B)の重量比が40:60~17:83であることを特徴とする低屈折率膜形成用組成物。
- 前記有機重合体が、アルキル基、アルケニル基、シクロアルキル基、アリール基、アルキルシリル基、アルキルアミノ基、アルコキシ基、および下記一般式(I)で表される基から選ばれる少なくとも1種の有機基を有することを特徴とする請求項1に記載の低屈折率膜形成用組成物。
- 溶媒を更に含むことを特徴とする請求項1~3のいずれか1項に記載の低屈折率膜形成用組成物。
- 触媒を更に含むことを特徴とする請求項1~4のいずれか1項に記載の低屈折率膜形成用組成物。
- 請求項4または5に記載の低屈折率膜形成用組成物を基材上に塗布し、該低屈折率膜形成用組成物を転化させることを特徴とする低屈折率膜の形成方法。
- 請求項6に記載の方法により形成されたことを特徴とする低屈折率膜。
- 請求項7に記載の低屈折率膜を含むことを特徴とする反射防止膜。
Priority Applications (6)
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US14/001,522 US20130337274A1 (en) | 2011-03-01 | 2012-02-17 | Composition for forming low-refractive-index film, method of forming low-refractive-index film, and low-refractive-index film and antireflective film both formed by the formation method |
KR1020137025798A KR101919305B1 (ko) | 2011-03-01 | 2012-02-27 | 저굴절율 막 형성용 조성물, 저굴절율 막의 형성 방법, 및 당해 형성 방법에 의해 형성된 저굴절율 막 및 반사 방지 막 |
SG2013061304A SG192740A1 (en) | 2011-03-01 | 2012-02-27 | Composition for forming low-refractive-index film, method of forming low-refractive-index film, and low-refractive-index film and antireflective film both formed by the formation method |
CN201280010918.3A CN103403112B (zh) | 2011-03-01 | 2012-02-27 | 低折射率膜形成用组合物、低折射率膜的形成方法以及通过该形成方法而形成的低折射率膜以及抗反射膜 |
EP12752127.6A EP2682439B1 (en) | 2011-03-01 | 2012-02-27 | Composition for forming low-refractive-index film, method of forming low-refractive-index film, and low-refractive-index film and antireflective film both formed by the formation method |
US15/338,614 US20170044376A1 (en) | 2011-03-01 | 2016-10-31 | Composition for forming low-refractive-index film, method of forming low-refractive-index film, and low-refractive-index film and antireflective film both formed by the formation method |
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JP2011043904A JP5840848B2 (ja) | 2011-03-01 | 2011-03-01 | 低屈折率膜形成用組成物、低屈折率膜の形成方法、及び該形成方法により形成された低屈折率膜並びに反射防止膜 |
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EP (1) | EP2682439B1 (ja) |
JP (1) | JP5840848B2 (ja) |
KR (1) | KR101919305B1 (ja) |
CN (1) | CN103403112B (ja) |
MY (1) | MY161746A (ja) |
SG (1) | SG192740A1 (ja) |
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WO2014050769A1 (ja) * | 2012-09-25 | 2014-04-03 | 株式会社カネカ | 防眩膜を備える太陽電池モジュールおよびその製造方法、太陽電池用防眩膜およびその製造方法ならびに防眩膜形成用塗布液 |
US20150307721A1 (en) * | 2012-12-11 | 2015-10-29 | Lg Hausys, Ltd. | Coating composition for layer having low refractive index, and transparent conductive film including same |
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JPWO2014050769A1 (ja) * | 2012-09-25 | 2016-08-22 | 株式会社カネカ | 防眩膜を備える太陽電池モジュールおよびその製造方法、太陽電池用防眩膜およびその製造方法ならびに防眩膜形成用塗布液 |
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US20150307721A1 (en) * | 2012-12-11 | 2015-10-29 | Lg Hausys, Ltd. | Coating composition for layer having low refractive index, and transparent conductive film including same |
Also Published As
Publication number | Publication date |
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TWI582170B (zh) | 2017-05-11 |
EP2682439B1 (en) | 2015-08-26 |
US20130337274A1 (en) | 2013-12-19 |
TW201241094A (en) | 2012-10-16 |
KR101919305B1 (ko) | 2018-11-16 |
CN103403112A (zh) | 2013-11-20 |
JP2012181334A (ja) | 2012-09-20 |
US20170044376A1 (en) | 2017-02-16 |
SG192740A1 (en) | 2013-09-30 |
EP2682439A1 (en) | 2014-01-08 |
CN103403112B (zh) | 2016-06-22 |
MY161746A (en) | 2017-05-15 |
KR20140014209A (ko) | 2014-02-05 |
JP5840848B2 (ja) | 2016-01-06 |
EP2682439A4 (en) | 2014-08-20 |
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