WO2012064046A2 - 고순도 실리콘 미세분말의 제조 장치 - Google Patents

고순도 실리콘 미세분말의 제조 장치 Download PDF

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Publication number
WO2012064046A2
WO2012064046A2 PCT/KR2011/008341 KR2011008341W WO2012064046A2 WO 2012064046 A2 WO2012064046 A2 WO 2012064046A2 KR 2011008341 W KR2011008341 W KR 2011008341W WO 2012064046 A2 WO2012064046 A2 WO 2012064046A2
Authority
WO
WIPO (PCT)
Prior art keywords
zinc
gas
silicon
aqueous solution
reaction
Prior art date
Application number
PCT/KR2011/008341
Other languages
English (en)
French (fr)
Korean (ko)
Other versions
WO2012064046A3 (ko
Inventor
시마무네타카유키
카토켄지
사카타토요아키
Original Assignee
타운마이닝 컴퍼니., 리미티드
씨.에스.라보레토리 인 테크놀로지 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 타운마이닝 컴퍼니., 리미티드, 씨.에스.라보레토리 인 테크놀로지 리미티드 filed Critical 타운마이닝 컴퍼니., 리미티드
Priority to KR1020137012076A priority Critical patent/KR101525860B1/ko
Publication of WO2012064046A2 publication Critical patent/WO2012064046A2/ko
Publication of WO2012064046A3 publication Critical patent/WO2012064046A3/ko

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0053—Details of the reactor
    • B01J19/006—Baffles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D21/00—Separation of suspended solid particles from liquids by sedimentation
    • B01D21/01—Separation of suspended solid particles from liquids by sedimentation using flocculating agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2221/00—Applications of separation devices
    • B01D2221/14—Separation devices for workshops, car or semiconductor industry, e.g. for separating chips and other machining residues
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00159—Controlling the temperature controlling multiple zones along the direction of flow, e.g. pre-heating and after-cooling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
PCT/KR2011/008341 2010-11-11 2011-11-03 고순도 실리콘 미세분말의 제조 장치 WO2012064046A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020137012076A KR101525860B1 (ko) 2010-11-11 2011-11-03 고순도 실리콘 미세분말의 제조 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010-265717 2010-11-11
JP2010265717A JP5533601B2 (ja) 2010-11-11 2010-11-11 高純度シリコン微粉末の製造装置

Publications (2)

Publication Number Publication Date
WO2012064046A2 true WO2012064046A2 (ko) 2012-05-18
WO2012064046A3 WO2012064046A3 (ko) 2012-07-19

Family

ID=46051381

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/008341 WO2012064046A2 (ko) 2010-11-11 2011-11-03 고순도 실리콘 미세분말의 제조 장치

Country Status (3)

Country Link
JP (1) JP5533601B2 (ja)
KR (1) KR101525860B1 (ja)
WO (1) WO2012064046A2 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101640286B1 (ko) * 2013-08-14 2016-07-15 주식회사 엘지화학 스트리머 방전을 이용한 폴리실리콘의 제조 장치 및 제조 방법
CN111755689A (zh) 2014-06-11 2020-10-09 日新化成株式会社 锂离子电池的负极材料、锂离子电池、锂离子电池的负极或负极材料的制造方法及制造装置
JP6300096B2 (ja) * 2014-06-30 2018-04-11 ティーエムシー株式会社 シリコン微細粒子
JPWO2017183487A1 (ja) 2016-04-21 2019-03-07 株式会社トクヤマ 金属粉末の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004018370A (ja) * 2002-06-19 2004-01-22 Yutaka Kamaike シリコンの製造装置および方法
JP2004284935A (ja) * 2003-03-19 2004-10-14 Takayuki Shimamune シリコンの製造装置及び製造方法
JP2007077007A (ja) * 2005-08-19 2007-03-29 Sumitomo Chemical Co Ltd 珪素の製造方法
JP2007284259A (ja) * 2006-04-12 2007-11-01 Shin Etsu Chem Co Ltd シリコンの製造方法及び製造装置
JP2008037735A (ja) * 2006-08-02 2008-02-21 Kinotech Corp シリコン製造装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004210594A (ja) * 2002-12-27 2004-07-29 Takayuki Shimamune 高純度シリコンの製造方法
JP4428484B2 (ja) * 2007-07-03 2010-03-10 有限会社シーエス技術研究所 高純度シリコンの製造装置
JP4392675B1 (ja) * 2008-07-25 2010-01-06 有限会社シーエス技術研究所 高純度シリコンの製造装置
JP4630993B2 (ja) * 2008-08-31 2011-02-09 北京中晶華業科技有限公司 高純度シリコンの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004018370A (ja) * 2002-06-19 2004-01-22 Yutaka Kamaike シリコンの製造装置および方法
JP2004284935A (ja) * 2003-03-19 2004-10-14 Takayuki Shimamune シリコンの製造装置及び製造方法
JP2007077007A (ja) * 2005-08-19 2007-03-29 Sumitomo Chemical Co Ltd 珪素の製造方法
JP2007284259A (ja) * 2006-04-12 2007-11-01 Shin Etsu Chem Co Ltd シリコンの製造方法及び製造装置
JP2008037735A (ja) * 2006-08-02 2008-02-21 Kinotech Corp シリコン製造装置

Also Published As

Publication number Publication date
KR101525860B1 (ko) 2015-06-03
JP5533601B2 (ja) 2014-06-25
KR20130100332A (ko) 2013-09-10
JP2012101998A (ja) 2012-05-31
WO2012064046A3 (ko) 2012-07-19

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