WO2012020625A1 - 硬化性樹脂組成物及びその硬化物 - Google Patents
硬化性樹脂組成物及びその硬化物 Download PDFInfo
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- WO2012020625A1 WO2012020625A1 PCT/JP2011/066434 JP2011066434W WO2012020625A1 WO 2012020625 A1 WO2012020625 A1 WO 2012020625A1 JP 2011066434 W JP2011066434 W JP 2011066434W WO 2012020625 A1 WO2012020625 A1 WO 2012020625A1
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- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- curable resin
- bisphenol
- formula
- compound
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 41
- 150000001875 compounds Chemical class 0.000 claims abstract description 104
- 239000004593 Epoxy Substances 0.000 claims abstract description 74
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 57
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 47
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims abstract description 36
- 150000005846 sugar alcohols Polymers 0.000 claims abstract description 35
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 31
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 31
- 229930185605 Bisphenol Natural products 0.000 claims abstract description 25
- 239000003822 epoxy resin Substances 0.000 claims abstract description 23
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 23
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 16
- 230000003287 optical effect Effects 0.000 claims description 32
- 239000004065 semiconductor Substances 0.000 claims description 25
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 9
- 125000005129 aryl carbonyl group Chemical group 0.000 claims description 5
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 230000004907 flux Effects 0.000 abstract description 13
- 239000000565 sealant Substances 0.000 abstract description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract description 2
- 238000000465 moulding Methods 0.000 description 13
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- 0 C(**OCC1C(C2)OC2CC1)O**C1C(**OC**O*C2CC3OC3CC2)CC2OC2C1 Chemical compound C(**OCC1C(C2)OC2CC1)O**C1C(**OC**O*C2CC3OC3CC2)CC2OC2C1 0.000 description 4
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- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 2
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 2
- 239000004386 Erythritol Substances 0.000 description 2
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
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- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
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- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
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- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
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- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
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- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/226—Mixtures of di-epoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0203—Containers; Encapsulations, e.g. encapsulation of photodiodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
Definitions
- the present invention relates to a curable resin composition useful for sealing an optical semiconductor, a cured product thereof, and an optical semiconductor device in which an optical semiconductor element is sealed with the cured product.
- epoxy resin As a resin for sealing an optical semiconductor element such as a light emitting diode (LED), an optical sensor, a light emitting element for optical communication, and a light receiving element, epoxy resin is used because of its high transparency.
- Patent Document 1 Japanese Patent Publication No. 5-89278 discloses an optical element seal containing an epoxy resin having an oxycyclohexane skeleton in which an epoxy group is bonded to a cyclohexane ring by a single bond and a curing agent. Stop agents are disclosed.
- This encapsulant for optical elements has characteristics of excellent moisture resistance, heat resistance, and mechanical characteristics.
- Patent Document 2 Japanese Patent Laid-Open No. 2005-1711857 discloses an optical semiconductor encapsulant containing an epoxy resin component containing an alicyclic epoxy resin and a curing accelerator component containing an organoaluminum compound and an organosilicon compound having a hydroxyl group. A stopping resin composition is disclosed.
- Patent Document 3 Japanese Patent No. 4366934 discloses as epoxy resins 1 of 3,4-epoxycyclohexylmethyl (3,4-epoxy) cyclohexanecarboxylate and 2,2-bis (hydroxymethyl) -1-butanol. , 2-epoxy-4- (2-oxiranyl) cyclohexane adduct, and an optical module sealed with a light-transmitting sealing material containing a curing catalyst and alcohol having a specific structure for improving fluidity is disclosed Has been.
- An object of the present invention is remarkably excellent in moisture resistance. For example, when used as an LED sealant, the light flux does not decrease even under high temperature and high humidity, and curing with excellent crack resistance and heat resistance in heat cycle.
- An object of the present invention is to provide a curable resin composition that is excellent in molding workability, a cured product thereof, and an optical semiconductor device using the curable resin composition.
- the present inventor suppresses a decrease in luminous flux under high temperature and high humidity when used as a sealant for an LED, for example, when combining four specific epoxy compounds.
- the present invention was completed by discovering that all required characteristics of the above characteristics, crack resistance in heat cycle, heat resistance and molding workability can be satisfied.
- the present invention provides the following formula (I) [In the formula (I), R 1 is a residue of an n-valent alcohol, A is the following formula (a) [In the formula (a), X represents the following formulas (b), (c), (d) [In the formula (d), R 2 represents a hydrogen atom, an alkyl group, an alkylcarbonyl group or an arylcarbonyl group] Any group of The group represented by these is shown.
- m represents an integer of 0 to 30, and n represents an integer of 1 to 10.
- the groups in the n parentheses may be the same or different.
- m A's may be the same or different.
- the total number of A in the molecule is 1-100. However, at least one A in which X is a group represented by the formula (b) is contained in the molecule] At least one selected from an epoxy compound (A) represented by the formula, an alicyclic epoxy compound (B) having two or more alicyclic epoxy groups in the molecule, a bisphenol A type epoxy resin and a bisphenol F type epoxy resin
- a curable resin composition comprising, as essential components, a bisphenol diepoxy compound (C), an aliphatic polyhydric alcohol polyglycidyl ether (D), and a curing agent (E).
- the present invention also provides a cured product obtained by curing the curable resin composition.
- the present invention further provides an optical semiconductor device in which an optical semiconductor element is sealed with a cured product of the curable resin composition.
- the moisture resistance is extremely high.
- the luminous flux does not decrease even under high temperature and high humidity. Cracks are not generated by heat cycles, heat resistance is high, viscosity is low, and molding workability is excellent.
- the curable resin composition of the present invention comprises an epoxy compound (A) represented by the formula (I) (hereinafter sometimes simply referred to as “epoxy compound (A)”), and an alicyclic epoxy in the molecule. Selected from alicyclic epoxy compound (B) having two or more groups (hereinafter sometimes simply referred to as “alicyclic epoxy compound (B)”), bisphenol A type epoxy resin and bisphenol F type epoxy resin. Further, at least one bisphenol type diepoxy compound (C) (hereinafter sometimes simply referred to as “bisphenol type diepoxy compound (C)”), aliphatic polyhydric alcohol polyglycidyl ether (D), and curing agent ( E) is an essential component. By using these four types of epoxy compounds in combination, it has all the properties of suppressing the decrease in luminous flux under high temperature and high humidity, crack generation suppression in heat cycle, heat resistance and molding workability. be able to.
- R 1 represents an n-valent alcohol residue.
- A represents a group represented by the formula (a).
- X represents any group of the above formulas (b), (c), and (d).
- R 2 represents a hydrogen atom, an alkyl group, an alkylcarbonyl group or an arylcarbonyl group.
- m represents an integer of 0 to 30, and n represents an integer of 1 to 10. When n is 2 or more, the groups in the n parentheses may be the same or different.
- the m A's may be the same or different.
- the total number of A in the molecule is 1-100. However, at least one (preferably 3 or more) A in which X is a group represented by the formula (b) is contained in the molecule.
- the epoxy compound (A) represented by the formula (I) can be used alone or as a mixture of two or more. In Formula (I), the bond on the left side of Formula (a) in A is bonded to the oxygen atom of “residue of n-valent alcohol” in R 1 .
- n-valent alcohol examples include monovalent alcohols such as methanol, ethanol, 1-propanol, isopropyl alcohol, 1-butanol, 1-pentanol, 1-hexanol, benzyl alcohol, and allyl alcohol; ethylene glycol, 1 , 2-propanediol, 1,3-propanediol, 1,3-butanediol, 1,4-butanediol, 1,5-pentanediol, neopentyl glycol, 1,6-hexanediol, diethylene glycol, triethylene glycol , Tetraethylene glycol, polyethylene glycol, dipropylene glycol, polypropylene glycol, cyclohexanedimethanol, hydrogenated bisphenol A, hydrogenated bisphenol F, hydrogenated bisphenol S, etc.
- monovalent alcohols such as methanol, ethanol, 1-propanol, isopropyl alcohol, 1-butanol, 1-pentano
- the alcohol may be polyether polyol, polyester polyol, polycarbonate polyol, polyolefin polyol, or the like.
- the alcohol is preferably an aliphatic alcohol having 1 to 10 carbon atoms (particularly an aliphatic polyhydric alcohol having 2 to 10 carbon atoms such as trimethylolpropane).
- Examples of the alkyl group for R 2 include C 1-6 alkyl groups such as methyl and ethyl groups, examples of the alkylcarbonyl group include C 1-6 alkyl-carbonyl groups such as acetyl and propionyl groups, and examples of the arylcarbonyl group include And C 6-10 aryl-carbonyl group such as benzoyl group.
- the epoxy compound (A) represented by the formula (I) is a polyether resin obtained by ring-opening polymerization of 4-vinylcyclohexene-1-oxide using the n-valent alcohol as an initiator, that is, vinyl resin. It can be produced by epoxidizing a vinyl group side chain of a polycyclohexene oxide polymer having a group side chain with an oxidizing agent such as peracid (such as peracetic acid). Depending on the production conditions, the abundance ratio of A having formula (b) as X, A having formula (c) as X, and A having formula (d) as X differs.
- the vinyl group represented by the formula (c) is an unreacted vinyl group that has not been epoxidized, and the group represented by the formula (d) is a group derived from a reaction solvent, peracid, etc. No. 10471).
- epoxy compound (A) represented by the formula (I) can also be used as the epoxy compound (A) represented by the formula (I).
- a commercial item there exists a brand name "EHPE3150” (made by Daicel Chemical Industries Ltd.) etc., for example.
- the “alicyclic epoxy group” in the alicyclic epoxy compound (B) having two or more alicyclic epoxy groups in the molecule is composed of two adjacent carbon atoms with oxygen atoms among the carbon atoms constituting the alicyclic ring.
- the “alicyclic epoxy group” in the alicyclic epoxy compound (B) having two or more alicyclic epoxy groups in the molecule is composed of two adjacent carbon atoms with oxygen atoms among the carbon atoms constituting the alicyclic ring.
- the alicyclic epoxy group include, for example, an epoxycyclopentyl group, a 3,4-epoxycyclohexyl group, a 3,4-epoxytricyclo [5.2.1.0 2,6 ] decane 8- (or 9) yl group. (Epoxidized dicyclopentadienyl group) and the like.
- an alicyclic epoxy compound (B) having two or more alicyclic epoxy groups in the molecule a compound represented by the following formula (II) (two alicyclic epoxy groups are bonded by a single bond or a linking group).
- An alicyclic epoxy compound (B) can be used individually by 1 type or in combination of 2 or more types.
- Y 1 represents a single bond or a linking group.
- the linking group include a divalent hydrocarbon group, a carbonyl group (—CO—), an ether bond (—O—), an ester bond (—COO—), an amide bond (—CONH—), a carbonate bond (— OCOO-) and a group in which a plurality of these are bonded.
- divalent hydrocarbon group examples include linear or branched alkylene groups such as methylene, ethylidene, isopropylidene, ethylene, propylene, trimethylene, and tetramethylene groups (for example, C 1-6 alkylene groups); Divalent groups such as 2-cyclopentylene, 1,3-cyclopentylene, cyclopentylidene, 1,2-cyclohexylene, 1,3-cyclohexylene, 1,4-cyclohexylene, and cyclohexylidene groups And alicyclic hydrocarbon groups (particularly divalent cycloalkylene groups); groups in which a plurality of these are bonded. Of these, an ester bond (—COO—) is preferable.
- t is an integer from 1 to 30.
- alicyclic epoxy compound (B) an alicyclic epoxy compound having 3 or 4 or more alicyclic epoxy groups in the molecule as shown below can be used.
- a, b, c, d, e, and f are each an integer of 0 to 30.
- a commercially available product can also be used as the alicyclic epoxy compound (B) having two or more alicyclic epoxy groups in the molecule.
- alicyclic epoxy compound (B) having two or more alicyclic epoxy groups in the molecule.
- a commercial item there exists a brand name "CEL2021P” (made by Daicel Chemical Industries Ltd.) etc., for example.
- bisphenol diepoxy compound (C) In the present invention, as the bisphenol diepoxy compound (C), at least one epoxy resin selected from bisphenol A type epoxy resin and bisphenol F type epoxy resin is used.
- Examples of commercially available bisphenol diepoxy compounds (C) include trade names “EXA-850CRP”, “EXA-830CRP”, “EXA-830LVP”, “EXA-835LV” (manufactured by DIC).
- the aliphatic polyhydric alcohol polyglycidyl ether (D) functions as an epoxy resin and significantly reduces the viscosity of the curable resin composition. For this reason, molding workability such as casting workability is remarkably improved.
- Examples of the “aliphatic polyhydric alcohol” in the aliphatic polyhydric alcohol polyglycidyl ether (D) include, for example, ethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,3-butanediol, 1, Divalent, such as 4-butanediol, 1,5-pentanediol, neopentyl glycol, 1,6-hexanediol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, dipropylene glycol, polypropylene glycol, cyclohexanedimethanol Alcohols such as glycerin, diglycerin, polyglycerin, erythritol, trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol, etc.
- Aliphatic polyhydric alcohols include aliphatic polyhydric alcohols containing an alicyclic ring and aliphatic polyhydric alcohols having no alicyclic ring.
- the aliphatic polyhydric alcohol polyglycidyl ether (D) can be used alone or in combination of two or more.
- aliphatic polyhydric alcohol polyglycidyl ether examples include 1,6-hexanediol diglycidyl ether, 1,4-butanediol diglycidyl ether, cyclohexanedimethanol diglycidyl ether, trimethylolpropane polyglycidyl.
- examples include ether, diethylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, propylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, and polyethylene glycol diglycidyl ether.
- the viscosity (25 ° C.) of the aliphatic polyhydric alcohol polyglycidyl ether (D) is, for example, 5 to 1000 mPa ⁇ s, preferably 10 to 750 mPa ⁇ s, more preferably 10 to 500 mPa ⁇ s, and particularly preferably 10 to 200 mPa. -S.
- an epoxy compound other than the epoxy compound (A), the alicyclic epoxy compound (B), the bisphenol diepoxy compound (C) and the aliphatic polyhydric alcohol polyglycidyl ether (D) (Hereinafter may be referred to as “other epoxy compounds”).
- epoxy compounds include, for example, bisphenol S type epoxy resins, biphenyl type epoxy resins, phenol novolac type epoxy resins, cresol novolac epoxy resins, heterocyclic epoxy resins such as triglycidyl isocyanurate, glycidyl ester type epoxy resins, molecules Examples thereof include an epoxy compound having only one alicyclic epoxy group (such as limonene diepoxide), an epoxidized product of fats and oils, an epoxidized product of polyolefin or polyalkadiene (such as epoxidized polybutadiene), and the like.
- the total amount of the epoxy compound (A), the alicyclic epoxy compound (B), the bisphenol diepoxy compound (C) and the aliphatic polyhydric alcohol polyglycidyl ether (D) 70% by weight based on the total amount of [epoxy compound (A) + alicyclic epoxy compound (B) + bisphenol diepoxy compound (C) + aliphatic polyhydric alcohol polyglycidyl ether (D) + other epoxy compound]
- the above is preferable, more preferably 85% by weight or more, and particularly preferably 95% by weight or more.
- the amount of the epoxy compound (A) is as follows: epoxy compound (A), alicyclic epoxy compound (B), bisphenol diepoxy compound (C), and aliphatic polyhydric alcohol polyglycidyl ether.
- epoxy compound (A) is 5 to 60% by weight, preferably 10 to 55% by weight, more preferably 20 to 50% by weight, based on the total amount of (D).
- the amount of the epoxy compound (A) is too small, the luminous flux tends to decrease under high temperature and high humidity. If the amount is too large, the viscosity becomes high and bubbles are difficult to escape, and the molding workability tends to decrease.
- the amount of the alicyclic epoxy compound (B) is based on the total amount of the epoxy compound (A), the alicyclic epoxy compound (B), the bisphenol diepoxy compound (C) and the aliphatic polyhydric alcohol polyglycidyl ether (D). For example, 5 to 80% by weight, preferably 10 to 70% by weight, more preferably 15 to 55% by weight. If the amount of the alicyclic epoxy compound (B) is too small, the heat resistance tends to be lowered, and if it is too much, the light flux tends to be lowered under high temperature and high humidity, or cracks due to thermal cycles are likely to occur.
- the amount of bisphenol diepoxy compound (C) is based on the total amount of epoxy compound (A), alicyclic epoxy compound (B), bisphenol diepoxy compound (C) and aliphatic polyhydric alcohol polyglycidyl ether (D). For example, 5 to 60% by weight, preferably 8 to 50% by weight, and more preferably 10 to 40% by weight. If the amount of the bisphenol diepoxy compound (C) is too small, cracks are likely to occur due to heat cycles, and if it is too large, the luminous flux tends to decrease under high temperature and high humidity.
- the amount of the aliphatic polyhydric alcohol polyglycidyl ether (D) is that of the epoxy compound (A), the alicyclic epoxy compound (B), the bisphenol diepoxy compound (C), and the aliphatic polyhydric alcohol polyglycidyl ether (D). For example, it is 3 to 50% by weight, preferably 4 to 40% by weight, more preferably 5 to 30% by weight, based on the total amount. If the amount of the aliphatic polyhydric alcohol polyglycidyl ether (D) is too small, the viscosity becomes high and bubbles are difficult to escape or the molding workability tends to be lowered, and if too large, the heat resistance tends to be lowered.
- the epoxy compound (A), the alicyclic epoxy compound (B), the bisphenol diepoxy compound (C) and the aliphatic polyhydric alcohol polyglycidyl ether (D) The viscosity (25 ° C.) in the case of mixing is, for example, 500 to 50000 mPa ⁇ s, preferably 800 to 30000 mPa ⁇ s, and more preferably 1000 to 20000 mPa ⁇ s. When this viscosity is too large, molding workability such as casting workability tends to be lowered.
- An acid anhydride can be used as the curing agent (E).
- the acid anhydride those generally used for curing epoxy compounds can be used, but those which are liquid at room temperature are preferred, and specifically, for example, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride , Dodecenyl succinic anhydride, methylendomethylenetetrahydrophthalic anhydride, and the like.
- acid anhydrides that are solid at room temperature such as phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylcyclohexene dicarboxylic acid anhydride, and the like, can be used within a range that does not impair molding workability.
- an acid anhydride that is solid at room temperature it is preferably dissolved in a liquid acid anhydride at room temperature and used as a liquid mixture at room temperature.
- curing agent (E) can be used individually by 1 type or in combination of 2 or more types.
- curing agent (E) commercially available products such as trade name “Rikacid MH700” (manufactured by Shin Nippon Chemical Co., Ltd.) and trade name “HN-5500” (manufactured by Hitachi Chemical Co., Ltd.) can also be used.
- the compounding amount of the curing agent (E) is the total amount of the epoxy compound contained in the curable resin composition of the present invention [or epoxy compound (A), alicyclic epoxy compound (B), bisphenol diepoxy compound (C) and For example, 10 to 300 parts by weight, preferably 30 to 200 parts by weight, and more preferably 50 to 150 parts by weight with respect to 100 parts by weight of the total amount of the aliphatic polyhydric alcohol polyglycidyl ether (D). More specifically, it is preferable to use the curing agent (E) at a ratio of 0.5 to 1.5 equivalents per equivalent of epoxy groups of all epoxy compounds contained in the curable resin composition. If the amount of the curing agent (E) used is too small, the curing becomes insufficient and the toughness of the cured product tends to be lowered. If the amount is too large, the cured product may be colored to deteriorate the hue.
- the curable resin composition of the present invention preferably contains a curing accelerator in order to accelerate the curing of the epoxy compound.
- the curing accelerator is not particularly limited as long as it is used for accelerating the curing of the epoxy compound.
- a diazabicycloundecene-based curing accelerator [1,8-diazabicyclo [5.4.0] undecene-7 is used.
- DBU diazabicycloundecene curing accelerators
- a hardening accelerator can be used individually or in combination of 2 or more types.
- the blending amount of the curing accelerator is the total amount of the epoxy compound contained in the curable resin composition of the present invention [or epoxy compound (A), alicyclic epoxy compound (B), bisphenol diepoxy compound (C) and fat.
- Total amount of polyhydric alcohol polyglycidyl ether (D)] is 100 to 15 parts by weight, for example, 0.01 to 15 parts by weight, preferably 0.1 to 10 parts by weight, more preferably 0.5 to 8 parts by weight. It is.
- the blending amount of the curing accelerator is too small, the curing accelerating effect may be insufficient, and when it is too large, the hue in the cured product may be deteriorated.
- a compound having a hydroxyl group such as ethylene glycol, diethylene glycol, propylene glycol, or glycerin
- the reaction can be allowed to proceed gently.
- the amount of such a hydroxyl group-containing compound (polyhydric alcohol or the like) used is, for example, 0.1 to 10 parts by weight, preferably 0.5 to 5 parts by weight with respect to 100 parts by weight of the curing agent (E). is there.
- ester diester or the like
- a polyhydric carboxylic acid anhydride alicyclic polycarboxylic acid anhydride or the like
- a polyhydric alcohol polyalkylene glycol or the like
- the amount of the ester used is the total amount of the epoxy compound contained in the curable resin composition of the present invention [or epoxy compound (A), alicyclic epoxy compound (B), bisphenol diepoxy compound (C) and aliphatic.
- the total amount of the polyhydric alcohol polyglycidyl ether (D) is, for example, 0.1 to 10 parts by weight, preferably 0.5 to 8 parts by weight with respect to 100 parts by weight.
- silicone-based or fluorine-based antifoaming agent, leveling agent, silane coupling agent, surfactant, inorganic as long as the viscosity of the curable resin composition and the transparency of the cured product are not impaired.
- the compounding quantity of these various additives is 5 weight% or less with respect to the whole curable resin composition, for example.
- the curable resin composition of the present invention may contain a solvent, but if the amount of the solvent is too large, bubbles may be formed in the cured resin, and preferably 10% by weight or less based on the entire curable composition. In particular, it is 1% by weight or less.
- the ratio of the total amount of the epoxy compound and the total amount of the curing agent and other components is such that the total amount of the curing agent and other components is 70 parts by weight with respect to 100 parts by weight of the total amount of the epoxy compound. It is preferably ⁇ 150 parts by weight, more preferably 80 to 130 parts by weight.
- the viscosity (25 ° C.) of the curable resin composition of the present invention is, for example, 50 to 1800 mPa ⁇ s, preferably 100 to 1600 mPa ⁇ s, and more preferably 200 to 1500 mPa ⁇ s.
- this viscosity is too large, it is difficult for bubbles to escape, and molding workability such as sealing workability and casting workability tends to deteriorate.
- the curable resin composition of the present invention includes, for example, the above epoxy compound (A), alicyclic epoxy compound (B), bisphenol diepoxy compound (C), aliphatic polyhydric alcohol polyglycidyl ether (D), and necessary
- the B agent is prepared by mixing the curing agent and other components (such as a curing accelerator), and then the A agent and the B agent Is stirred and mixed at a predetermined ratio, and degassed under vacuum.
- the order of addition of each component during preparation of agent A is not particularly limited. First, the alicyclic epoxy compound (B) and the bisphenol diepoxy compound (C) are mixed, and the epoxy compound (A) is added thereto.
- the temperature at the time of stirring and mixing when preparing the liquid A is, for example, 30 to 150 ° C., preferably 35 to 130 ° C.
- the temperature at the time of stirring and mixing when preparing the liquid B is, for example, 30 to 150 ° C., preferably 35 to 100 ° C.
- a known apparatus such as a rotation / revolution mixer, a planetary mixer, a kneader, a dissolver, or the like can be used.
- a cured product is obtained by injecting the curable resin composition of the present invention into a desired place or mold and curing it.
- the curing temperature is, for example, 45 to 200 ° C, preferably 80 to 190 ° C, more preferably 100 to 180 ° C.
- the curing time is, for example, 30 to 600 minutes, preferably 45 to 540 minutes, and more preferably 60 to 480 minutes.
- the glass transition temperature of the cured product is preferably 120 ° C. or higher, more preferably 140 ° C. or higher.
- optical semiconductor device In the optical semiconductor device of the present invention, the optical semiconductor element is sealed with a cured product of the curable resin composition of the present invention.
- the optical semiconductor element examples include a light emitting diode, an optical sensor, a light emitting element for optical communication, and a light receiving element.
- the optical semiconductor element is sealed by, for example, injecting the curable resin composition into a predetermined mold in which the optical semiconductor element is installed (or injecting the curable resin composition into the mold, It can be performed by installing a semiconductor element) and heating and curing under predetermined conditions.
- the curing conditions are the same as above.
- the viscosity of the curable resin composition is low, molding workability (sealing workability, casting workability) is extremely good.
- the light beam stability is excellent even under high temperature and high humidity.
- the thermal cycle is repeated, the occurrence rate of cracks is extremely small.
- the glass transition temperature is high, the heat resistance is excellent. For this reason, an optical semiconductor device with extremely high reliability can be stably supplied.
- B agent was prepared The viscosity of B agent (25 degreeC) was 149 mPa * s.
- the A agent and the B agent were mixed uniformly while defoaming using a trade name “Awatori Nertaro” manufactured by Shinky Corporation to prepare a curable resin composition.
- the obtained curable resin composition was poured into a mold (shape: lamp shape, size: ⁇ 5), a lead frame mounted with a red light emitting diode element was inserted, and cured in an oven at 110 ° C. for 2 hours.
- the cured product was taken out of the mold and further cured in an oven at 140 ° C. for 3 hours to obtain an optical semiconductor device.
- Examples 2 to 5 and Comparative Examples 1 to 7 An optical semiconductor device was fabricated by performing the same operation as in Example 1 except that the amount of each raw material component was changed to the amount shown in Table 1.
- LED conduction test The total luminous flux of the LED was measured in advance with an LED measuring instrument (trade name “OL-771”) manufactured by OPTRONIC LABORATORIES.
- the optical semiconductor device was installed in a constant temperature and humidity chamber, and a current of 40 mA was passed in an environment of 85 ° C. and 85% RH to turn on the LED. After 500 hours of lighting, the total luminous flux of the LED was measured, and the retention rate relative to the initial total luminous flux was expressed in%. After 500 hours, a sample having a retention rate of 90% or more was evaluated as pass ( ⁇ ), and a sample having a retention rate of less than 90% was determined as reject (x).
- Heat shock test The optical semiconductor device was installed in a heat shock tester manufactured by Espec (trade name “TSE-11-A”), exposed to ⁇ 40 ° C. for 15 minutes, then exposed to 120 ° C. for 15 minutes, and A cycle of exposure to 40 ° C. for 15 minutes (“-40 ° C. ⁇ 15 minutes, 120 ° C. ⁇ 15 minutes” as one cycle) was tested for 500 cycles, and the occurrence frequency of cracks was visually observed. Of the five LEDs, the occurrence frequency of cracks was 2 (or less), and 3 or more (failed).
- a sealing material (cured product) was cut from the tip of the sealed LED to obtain a test piece.
- a thermomechanical analyzer (trade name “EXSTAR TMA / SS6000”) manufactured by SII Nanotechnology Inc., analysis was performed from room temperature to 300 ° C. at a temperature rising rate of 5 ° C./min.
- the Tg of the sealing material was determined from the change point of the TMA curve, and the one higher than 120 ° C. was accepted ( ⁇ ) and the one less than 120 ° C. was rejected ( ⁇ ).
- Agent A and Agent B were mixed using a trade name “Awatori Nertaro” manufactured by Shinky Corporation, and the viscosity at 25 ° C. was measured with an E-type viscometer.
- the viscosity is 1500 mPa ⁇ s or more, particularly 1800 mPa ⁇ s or more, there is a problem that bubbles are difficult to escape or casting workability is lowered.
- the moisture resistance is extremely high.
- the luminous flux does not decrease even under high temperature and high humidity, cracks do not occur due to heat cycles, high heat resistance, low viscosity, and excellent workability. .
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Abstract
Description
本発明の目的は、耐湿性に著しく優れ、例えば、LEDの封止剤として用いた場合に、高温高湿下においても光束が低下せず、ヒートサイクルにおける耐クラック性及び耐熱性に優れた硬化物が得られ、しかも成形作業性に優れる硬化性樹脂組成物、その硬化物、並びに該硬化性樹脂組成物を用いた光半導体装置を提供することにある。
すなわち、本発明は、下記式(I)
の何れかの基を示す]
で表される基を示す。mは0~30の整数、nは1~10の整数を示す。nが2以上の場合、n個の括弧内の基はそれぞれ同一であっても異なっていてもよい。また、mが2以上の場合、m個のAはそれぞれ同一であっても異なっていてもよい。分子内におけるAの総数は1~100である。但し、Xが式(b)で表される基であるAが分子内に少なくとも1個含まれている]
で表されるエポキシ化合物(A)と、分子内に脂環エポキシ基を2以上有する脂環式エポキシ化合物(B)と、ビスフェノールA型エポキシ樹脂及びビスフェノールF型エポキシ樹脂から選択された少なくとも1種のビスフェノール型ジエポキシ化合物(C)と、脂肪族多価アルコールポリグリシジルエーテル(D)と、硬化剤(E)とを必須成分とする硬化性樹脂組成物を提供する。
式(I)で表されるエポキシ化合物(A)において、式(I)中、R1はn価のアルコールの残基を示す。Aは、前記式(a)で表される基を示す。式(a)中、Xは、前記式(b)、(c)、(d)の何れかの基を示す。式(d)中、R2は、水素原子、アルキル基、アルキルカルボニル基又はアリールカルボニル基を示す。また、式(I)中、mは0~30の整数、nは1~10の整数を示す。nが2以上の場合、n個の括弧内の基はそれぞれ同一であっても異なっていてもよい。また、mが2以上の場合、m個のAはそれぞれ同一であっても異なっていてもよい。分子内におけるAの総数は1~100である。但し、Xが式(b)で表される基であるAが分子内に少なくとも1個(好ましくは3以上)含まれている。式(I)で表されるエポキシ化合物(A)は1種単独で、又は2種以上の混合物として使用できる。なお、式(I)において、Aにおける式(a)の左側の結合手が、R1における「n価のアルコールの残基」の酸素原子と結合している。
分子内に脂環エポキシ基を2以上有する脂環式エポキシ化合物(B)における「脂環エポキシ基」とは、脂環を構成する炭素原子のうち隣接する2つの炭素原子を酸素原子とで構成されるエポキシ基をいう。脂環エポキシ基として、例えば、例えば、エポキシシクロペンチル基、3,4-エポキシシクロヘキシル基、3,4-エポキシトリシクロ[5.2.1.02,6]デカン8-(又は9)イル基(エポキシ化ジシクロペンタジエニル基)などが挙げられる。
本発明では、ビスフェノール型ジエポキシ化合物(C)として、ビスフェノールA型エポキシ樹脂及びビスフェノールF型エポキシ樹脂から選択された少なくとも1種のエポキシ樹脂を用いる。
本発明の硬化性樹脂組成物において、脂肪族多価アルコールポリグリシジルエーテル(D)は、エポキシ樹脂として機能しつつ、硬化性樹脂組成物の粘度を大幅に低下させる働きをする。このため、注型作業性等の成形作業性が著しく改善される。
硬化剤(E)としては酸無水物を使用できる。酸無水物としては、一般にエポキシ化合物の硬化に使用されるものを用いることができるが、常温で液状のものが好ましく、具体的には、例えば、メチルテトラヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、ドデセニル無水コハク酸、メチルエンドメチレンテトラヒドロ無水フタル酸等を挙げることができる。また、成形作業性を損なわない範囲で、常温で固体の酸無水物、例えば、無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、メチルシクロヘキセンジカルボン酸無水物等を使用することができる。常温で固体の酸無水物を使用する場合には、常温で液状の酸無水物に溶解させ、常温で液状の混合物として使用することが好ましい。硬化剤(E)は1種単独で又は2種以上を組み合わせて使用できる。
本発明の硬化性樹脂組成物は、エポキシ化合物の硬化を促進させるため、硬化促進剤を含有するのが好ましい。硬化促進剤は、エポキシ化合物の硬化促進に使用されるものであれば特に制限はなく、例えば、ジアザビシクロウンデセン系硬化促進剤[1,8-ジアザビシクロ[5.4.0]ウンデセン-7(DBU)又はその塩(p-トルエンスルホン酸塩、オクチル酸塩等)]、ベンジルジメチルアミン、2,4,6-トリス(ジメチルアミノメチル)フェノール等の三級アミン、2-エチル-4-メチルイミダゾール、1-シアノエチル-2-エチル-4-メチルイミダゾール等のイミダゾール類、トリフェニルホスフィン等の有機ホスフィン化合物、三級アミン塩、四級アンモニウム塩、四級ホスホニウム塩、オクチル酸スズ、ジラウリン酸ジブチルスズ、オクチル酸亜鉛等の有機金属塩、ホウ素化合物等が挙げられる。これらの硬化促進剤の中でも、ジアザビシクロウンデセン系硬化促進剤が好ましい。硬化促進剤は単独で又は2種以上を組み合わせて使用できる。
本発明の硬化性樹脂組成物を、所望の場所又は型に注入し、硬化させることにより硬化物が得られる。硬化温度は、例えば、45~200℃、好ましくは80~190℃、さらに好ましくは100~180℃である。硬化時間は、例えば、30~600分、好ましくは45~540分、さらに好ましくは60~480分である。
本発明の光半導体装置は、光半導体素子が本発明の硬化性樹脂組成物の硬化物で封止されている。
ダイセル化学工業社製、商品名「CEL2021P」(3,4-エポキシシクロヘキシルメチル(3,4-エポキシ)シクロヘキサンカルボキシレート)20重量部と、DIC社製、商品名「EXA-850CRP」(ビスフェノールA型エポキシ樹脂)20重量部を、80℃で30分撹拌混合した。これに、ダイセル化学工業社製、商品名「EHPE3150」[2,2-ビス(ヒドロキシメチル)-1-ブタノールの1,2-エポキシ-4-(2-オキシラニル)シクロヘキサン付加物 ]40重量部を投入し、100℃で1時間撹拌混合した。得られた混合物を45℃に冷却した後、これに、DIC社製、商品名「EPICLON 725」(トリメチロールプロパントリグリシジルエーテル)20重量部を投入し、撹拌混合して、A剤を調製した。A剤の粘度(25℃)は、14340mPa・sであった。
一方、新日本理化社製、商品名「MH700」(4-メチルヘキサヒドロ無水フタル酸/ヘキサヒドロ無水フタル酸=70/30)104.3重量部を温度40~80℃に調整しておき、これに、エチレングリコール1.6重量部、サンアプロ社製、商品名「U-CAT SA-506」(1,8-ジアザビシクロ[5.4.0]ウンデセン-7のp-トルエンスルホン酸塩)0.5重量部、サンアプロ社製、商品名「U-CAT SA-102」(1,8-ジアザビシクロ[5.4.0]ウンデセン-7のオクチル酸塩)0.5重量部を投入して、30分撹拌混合し、さらに、新日本理化社製、商品名「HF-08」(脂環族酸無水物とポリアルキレングリコールとのエステル)3.1重量部を投入し、30分撹拌混合して、B剤を調製した。B剤の粘度(25℃)は、149mPa・sであった。
A剤とB剤とを、シンキー社製、商品名「あわとり練太郎」を用いて、脱泡しながら、均一に混合し、硬化性樹脂組成物を調製した。得られた硬化性樹脂組成物を型(形状:ランプ形状、大きさ:φ5)に注入し、赤色の発光ダイオード素子を実装したリードフレームを挿して、110℃のオーブンで2時間硬化させた。硬化物を型から取りだし、さらに、140℃のオーブンで3時間硬化させ、光半導体装置を得た。
各原料成分の使用量を表1に示す量としたこと以外は実施例1と同様の操作を行い、光半導体装置を作製した。
実施例及び比較例で得られた各光半導体装置等について、以下の評価を行った。結果を表1に示す。表中、各原料成分の欄の数字は重量部を示す。
予め、LEDの全光束を、OPTRONIC LABORATORIES社のLED測定器(商品名「OL-771」)にて測定した。光半導体装置を恒温恒湿槽内に設置し、85℃、85%RHの環境下、40mAの電流を流し、LEDを点灯させた。点灯500時間後に、LEDの全光束を測定し、初期の全光束に対する保持率を%で表した。
500時間後、保持率が90%以上であるものを合格(○)、90%未満のものを不合格(×)とした。
光半導体装置を、エスペック社製のヒートショック試験機(商品名「TSE-11-A」)内に設置し、-40℃に15分間曝露し、次に120℃に15分間曝露し、また-40℃に15分曝露するというサイクル(「-40℃×15分、120℃×15分」を1サイクルとする)を500サイクル試験し、クラックの発生頻度を目視観察した。
クラックの発生頻度がLED5個中2個以下を合格(○)、3個以上を不合格(×)とした。
封止したLEDの先端部から封止材(硬化物)を切削して試験片とした。エスアイアイ・ナノテクノロジー社製の熱機械分析装置(商品名「EXSTAR TMA/SS6000」)を用い、昇温速度5℃/minにて、室温から300℃まで分析した。TMA曲線の変化点から封止材のTgを求め、120℃よりも高いものを合格(○)、120℃未満のものを不合格(×)とした。
A剤とB剤を、シンキー社製、商品名「あわとり練太郎」を用いて混合し、E型粘度計で25℃での粘度を測定した。この粘度が1500mPa・s以上、特に1800mPa・s以上の場合は気泡が抜けにくかったり、注型の作業性が低下するという問題が生じやすい。
Claims (3)
- 下記式(I)
の何れかの基を示す]
で表される基を示す。mは0~30の整数、nは1~10の整数を示す。nが2以上の場合、n個の括弧内の基はそれぞれ同一であっても異なっていてもよい。また、mが2以上の場合、m個のAはそれぞれ同一であっても異なっていてもよい。分子内におけるAの総数は1~100である。但し、Xが式(b)で表される基であるAが分子内に少なくとも1個含まれている]
で表されるエポキシ化合物(A)と、分子内に脂環エポキシ基を2以上有する脂環式エポキシ化合物(B)と、ビスフェノールA型エポキシ樹脂及びビスフェノールF型エポキシ樹脂から選択された少なくとも1種のビスフェノール型ジエポキシ化合物(C)と、脂肪族多価アルコールポリグリシジルエーテル(D)と、硬化剤(E)とを必須成分とする硬化性樹脂組成物。 - 請求項1記載の硬化性樹脂組成物を硬化して得られる硬化物。
- 光半導体素子が請求項1記載の硬化性樹脂組成物の硬化物によって封止されている光半導体装置。
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US20150166885A1 (en) * | 2013-12-18 | 2015-06-18 | Dow Global Technologies Llc | Transformative wavelength conversion medium |
CN104733595A (zh) * | 2013-12-18 | 2015-06-24 | 罗门哈斯电子材料有限公司 | 变化性波长转换介质 |
US9382472B2 (en) * | 2013-12-18 | 2016-07-05 | Rohm And Haas Electronic Materials Llc | Transformative wavelength conversion medium |
US9464224B2 (en) * | 2013-12-18 | 2016-10-11 | Rohm And Haas Electronic Materials Llc | Transformative wavelength conversion medium |
JP2016000801A (ja) * | 2014-05-21 | 2016-01-07 | 三菱化学株式会社 | エポキシ樹脂用希釈剤、及びエポキシ樹脂組成物 |
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TW201211146A (en) | 2012-03-16 |
TWI522414B (zh) | 2016-02-21 |
CN107266661B (zh) | 2022-09-02 |
MY163618A (en) | 2017-10-13 |
CN102869697A (zh) | 2013-01-09 |
KR20130118211A (ko) | 2013-10-29 |
US20130065986A1 (en) | 2013-03-14 |
EP2604638A1 (en) | 2013-06-19 |
JP2012036320A (ja) | 2012-02-23 |
CN107266661A (zh) | 2017-10-20 |
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