WO2012015229A3 - 마스크 및 이를 포함하는 광학필터 제조장치 - Google Patents

마스크 및 이를 포함하는 광학필터 제조장치 Download PDF

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Publication number
WO2012015229A3
WO2012015229A3 PCT/KR2011/005514 KR2011005514W WO2012015229A3 WO 2012015229 A3 WO2012015229 A3 WO 2012015229A3 KR 2011005514 W KR2011005514 W KR 2011005514W WO 2012015229 A3 WO2012015229 A3 WO 2012015229A3
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WO
WIPO (PCT)
Prior art keywords
mask
base film
manufacturing apparatus
optical filter
filter manufacturing
Prior art date
Application number
PCT/KR2011/005514
Other languages
English (en)
French (fr)
Other versions
WO2012015229A2 (ko
Inventor
김신영
홍경기
윤혁
주원철
조용일
박문수
고동호
유수영
Original Assignee
(주)Lg화학
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)Lg화학 filed Critical (주)Lg화학
Priority to JP2013521709A priority Critical patent/JP5800303B2/ja
Priority to US13/393,522 priority patent/US9069257B2/en
Priority to CN201180037021.5A priority patent/CN103119481B/zh
Priority to US13/335,126 priority patent/US9041993B2/en
Publication of WO2012015229A2 publication Critical patent/WO2012015229A2/ko
Publication of WO2012015229A3 publication Critical patent/WO2012015229A3/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Polarising Elements (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)

Abstract

본 발명은 마스크 및 이를 포함하는 광학필터 제조장치에 관한 것이다. 본 발명에 의한 광학필터 제조장치는 롤투롤(Roll to Roll) 공정에 사용되는 롤; 롤에 감아지는 기재 필름; 노광을 위해 광을 발생시키는 광원; 광원의 출사 측에 설치되어 광원에서 발생한 광을 편광시키는 편광판; 및 기재 필름에 패턴을 형성하고, 소정의 두께 및 폭을 갖도록 개구된 다수개의 가이드슬릿이 형성되는 마스크를 포함한다. 본 발명에 의하면, 기재 필름 전면에 걸쳐 광량을 균일하게 조사할 수 있으므로, 기재 필름에 패턴이 균일하게 형성될 수 있어 제품의 품질이 향상되고 기재 필름의 특성을 정확하게 구현할 수 있는 효과가 있다.
PCT/KR2011/005514 2010-07-26 2011-07-26 마스크 및 이를 포함하는 광학필터 제조장치 WO2012015229A2 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013521709A JP5800303B2 (ja) 2010-07-26 2011-07-26 立体映像表示装置に用いる光学フィルタの製造装置
US13/393,522 US9069257B2 (en) 2010-07-26 2011-07-26 Mask and optical filter manufacturing apparatus including the same
CN201180037021.5A CN103119481B (zh) 2010-07-26 2011-07-26 掩膜及包括该掩膜的滤光片制造设备
US13/335,126 US9041993B2 (en) 2010-07-26 2011-12-22 Mask

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20100072018 2010-07-26
KR10-2010-0072018 2010-07-26
KR10-2010-0090604 2010-09-15
KR20100090604 2010-09-15

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US13/335,126 Continuation-In-Part US9041993B2 (en) 2010-07-26 2011-12-22 Mask

Publications (2)

Publication Number Publication Date
WO2012015229A2 WO2012015229A2 (ko) 2012-02-02
WO2012015229A3 true WO2012015229A3 (ko) 2012-04-19

Family

ID=45530601

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/005514 WO2012015229A2 (ko) 2010-07-26 2011-07-26 마스크 및 이를 포함하는 광학필터 제조장치

Country Status (5)

Country Link
US (1) US9069257B2 (ko)
JP (2) JP5800303B2 (ko)
CN (1) CN103119481B (ko)
TW (1) TWI468750B (ko)
WO (1) WO2012015229A2 (ko)

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KR101347552B1 (ko) * 2011-07-21 2014-01-10 주식회사 엘지화학 마스크 및 이를 포함하는 광학필터 제조장치
CN104884982B (zh) * 2012-12-31 2017-09-08 Lg化学株式会社 光学装置
CN103955087B (zh) * 2014-05-12 2017-01-04 青岛斯博锐意电子技术有限公司 一种液晶光掩膜、其应用及制版装置
CN103955088B (zh) * 2014-05-12 2017-02-22 青岛斯博锐意电子技术有限公司 一种液晶光掩膜及其应用
US10343381B2 (en) * 2016-06-28 2019-07-09 John B. Troendle Method of producing a glueless dustless composite flooring material system
JP2020024236A (ja) * 2016-12-08 2020-02-13 株式会社ブイ・テクノロジー 液晶光配向用フォトマスク、光配向装置、光配向方法

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Also Published As

Publication number Publication date
US20130114055A1 (en) 2013-05-09
JP2015187731A (ja) 2015-10-29
TW201229577A (en) 2012-07-16
JP2013539065A (ja) 2013-10-17
WO2012015229A2 (ko) 2012-02-02
CN103119481B (zh) 2015-07-01
US9069257B2 (en) 2015-06-30
TWI468750B (zh) 2015-01-11
CN103119481A (zh) 2013-05-22
JP6025909B2 (ja) 2016-11-16
JP5800303B2 (ja) 2015-10-28

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