WO2012015229A2 - 마스크 및 이를 포함하는 광학필터 제조장치 - Google Patents
마스크 및 이를 포함하는 광학필터 제조장치 Download PDFInfo
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- WO2012015229A2 WO2012015229A2 PCT/KR2011/005514 KR2011005514W WO2012015229A2 WO 2012015229 A2 WO2012015229 A2 WO 2012015229A2 KR 2011005514 W KR2011005514 W KR 2011005514W WO 2012015229 A2 WO2012015229 A2 WO 2012015229A2
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- WIPO (PCT)
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- mask
- light
- guide slit
- base film
- optical filter
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
Definitions
- the present invention relates to an optical filter manufacturing apparatus, and more particularly, a mask used to optically orientate an alignment film of a liquid crystal display device or an alignment film of an optical base film using a curable liquid crystal using a polarizing element in a roll-to-roll process.
- the present invention relates to an optical filter manufacturing apparatus.
- Such a photo-alignment technique has been enlarged with the enlargement of a liquid crystal panel, and accordingly, the light irradiation area
- the light source of the light irradiation apparatus In order to irradiate a large area with high illuminance, the light source of the light irradiation apparatus must be enlarged accordingly. Since the direction of polarization determining the orientation depends on the incident angle of the incident light, when the light source is enlarged, unevenness of the incident angle occurs in the light irradiation area. This results in nonuniformity of the polarization axis, resulting in a problem that the orientation direction is not uniform for each irradiation region and is oriented in an unwanted direction.
- the light irradiation area is often a curved surface.
- a polarization axis non-uniformity problem occurs in the light irradiation area along the curved surface.
- an object of the present invention is to solve the problems of the prior art as described above, while being able to uniformly expose a large area, it is possible to irradiate highly parallel light, and to provide uniform alignment performance. It is to provide a mask and an optical filter manufacturing apparatus comprising the same that can efficiently perform the optical alignment of the.
- Another object of the present invention is to provide a mask and an optical filter manufacturing apparatus including the same, which can improve the uniformity of the pattern and increase the straightness through a simple configuration in a high-speed roll-to-roll process.
- the mask according to the present invention is a mask used in a roll to roll process of forming a pattern on a base film, the mask has a predetermined thickness And a plurality of guide slits opened to have a width.
- the guide slit is characterized in that it is designed to satisfy the following equation.
- the guide slit is characterized in that it is designed to satisfy the following equation.
- the inner wall of the guide slit is characterized in that the width is narrower toward the bottom.
- the inner wall of the guide slit is characterized in that the total reflection coating is made to increase the straightness of the light.
- the guide slit is characterized in that it is arranged in a plurality of rows at regular intervals.
- Guide slits located in different rows are staggered from each other.
- the optical filter manufacturing apparatus is a roll used in a roll to roll (Roll to Roll) process; A base film wound on the roll; A light source for generating light for exposure; A polarizing plate provided on an emission side of the light source to polarize light generated by the light source; And a mask forming a pattern on the base film and having a plurality of guide slits opened to have a predetermined thickness and width.
- the light collecting plate may further include a light collecting plate for condensing light so as to uniformly irradiate the entire area of the base film.
- the light source is characterized in that the short arc discharge lamp.
- the light source is a UV lamp, characterized in that a cooling device is provided between the UV lamp and the base film.
- the plurality of light sources are arranged in a plurality of rows, the light sources located in different columns are arranged so that some of them overlap each other.
- the light sources located in the different columns are arranged to overlap each other.
- the present invention by using a short arc discharge lamp or the like as a light source using the straightened light, it is possible to uniformly expose a large area, and to irradiate highly parallel light and to provide a uniform alignment performance. There is an effect that can perform the optical alignment efficiently.
- FIG. 1 is a block diagram showing an optical filter manufacturing apparatus according to an embodiment of the present invention.
- Figure 2 is a block diagram showing a light source arrangement of the optical filter manufacturing apparatus according to an embodiment of the present invention.
- Figure 3 is a perspective view schematically showing the shape of the mask according to the present invention.
- Figure 4 is a perspective view schematically showing the shape of another example of a mask according to the present invention.
- FIG. 5 is a configuration diagram showing the relationship between the thickness and width of the guide slit of the mask according to the present invention, and the distance between the guide slit and the base film.
- 6A and 6B are photographs comparing the pattern shape when the guide slit is not formed on the mask and when it is formed.
- 7A to 7D are photographs comparing pattern shapes according to a gap between a mask and a base film.
- FIG. 8 is a schematic diagram illustrating pixel arrangement of a display panel of a stereoscopic image display device according to an exemplary embodiment of the present invention.
- the apparatus for irradiating light in the optical filter manufacturing apparatus 1 includes a light source 10 for irradiating light for large exposure; A light collecting plate 20 condensing light so that light can be uniformly irradiated with respect to the entire area of the base film 50; A polarizing plate 30 provided on the emission side of the light source 10; And a mask 40 for forming a pattern on the base film 50. And the light irradiated from the light source 10 is irradiated to the base film 50 wound by the roll 60 of a roll to roll process.
- the light source 10 is for imparting orientation performance, and it is necessary to be able to irradiate the straightened light.
- the distance between the mask 40 and the roll 60 increases in the process of irradiating light to the base film 50 through the mask 40, it is difficult to form the pattern accurately and uniformly. Further, as the distance between the mask 40 and the roll 60 increases, there are problems such as uneven pattern width and unevenness of the base film 50.
- the light source 10 irradiating the straightened light is irradiated. Is required.
- the gap between the mask 40 and the roll 60 is designed to be kept constant, it is not necessary to use the straightened light source 10 and the rod-shaped lamp or the existing high pressure water is It is also possible to use a light source 10 through which light is spread, such as a polymerization lamp. However, if the distance between the mask 40 and the roll 60 is not minimized by a certain distance, the pattern may be formed unevenly, so it is preferable to use the straightened light.
- a short arc discharge lamp which is a kind of UV lamp can be used.
- a discharge lamp such as a high-pressure mercury lamp other than the short-arc discharge lamp
- light is spread in all directions, so that when the base film 50 is irradiated with light, if it is not irradiated in the vertical direction, it is necessary to form different orientations between the minute regions. In this case, a problem may arise in that the orientation direction is different for each region.
- the use of straightened light in which light is irradiated in the vertical direction during polarized light irradiation is a short arc type because it is an important factor that can determine the close contact between the mask 40 and the base film 50 and the boundary between the minute regions.
- the discharge lamp not only the clearance between the mask 40 and the base film 50 is allowed, but also the light quantity of the light source 10 is greater than that of the high-pressure mercury lamp, resulting in productivity improvement during line work.
- a UV curing lamp a medium pressure or high pressure mercury ultraviolet lamp, a metal halide lamp, or a gallium UV lamp is used depending on the wavelength emitted, and the high pressure mercury ultraviolet light having a roughness of about 100 mW / cm 2 or more is used to cure the liquid crystal and the alignment layer.
- Lamps are commonly used, and a cold mirror or other cooling device may be provided between the base film and the ultraviolet lamp so that the surface temperature of the liquid crystal layer is within the liquid crystal temperature range when irradiated with ultraviolet rays.
- high-purity mercury and an inert gas are encapsulated in a quartz glass light emitting tube, and 365 nm is used as a main wavelength, and has a characteristic of total scattering according to a lamp shape.
- a lamp straight light lamp
- a lamp having an elliptical cylindrical condensing mirror in the cross section reflecting light from the lamp may be used, or a plurality of LEDs or LDs may be arranged to be used as the light source 10. .
- a plurality of light sources are arranged in the width direction, and are arranged in a plurality of rows in parallel along the moving direction of the base film.
- the orientation direction may be changed due to a difference in the amount of light, or a band-shaped stain may be generated.
- the light source 10 preferably overlaps about ⁇ between light sources 10 positioned in different columns.
- the present invention is not limited to the above numerical values, and may overlap each other at various ratios such as 1 ⁇ 2 between the light sources 10 positioned in different columns.
- the light collecting plate 20 is a portion provided for uniformly irradiating the base film 50 with the light amount. Even when the light source 10, which is a discharge lamp, is used, a non-uniform amount of light may exist in a portion where light is irradiated by a lamp shade provided in the discharge lamp. In other words, there is a difference between the amount of light reflected on the lamp shade and irradiated to the base film 50 and the amount of light directly irradiated on the base film 50, so that a pattern may be formed unevenly. Therefore, in order to solve this problem, the light collecting plate 20 is installed at the front end of the light source 10 so that the light can be uniformly irradiated with respect to the entire area of the base film 50.
- polarizing plate 30 As the polarizing plate 30 is provided for polarization, a glass plate, a wire grid polarizing plate, or the like, which is usually disposed at a Brewster angle, may be used.
- a plurality of guide slits 42 are opened to a predetermined thickness.
- the guide slit 42 is formed in parallel with one side of the mask 40, and improves the uniformity of the pattern by increasing the straightness of the light.
- the base film 50 is transferred along the belt moving along the curved surface at the time of exposure for pattern formation.
- the substrate film 20 and the mask 10 for pattern formation proceed at a predetermined interval when the pattern is formed.
- the polarization is prevented by the gap between the mask 10 and the substrate film 20.
- the mask 10 when manufacturing an optical filter using a mask, the mask 10 is positioned at a certain distance from the base film 20 on which the alignment film is formed, in which case the polarized light to be irradiated is the mask 10 and the base film 20 Can spread as it progresses between Therefore, it is difficult to irradiate the polarization of uniform intensity to all desired areas, and as a result, the boundary part of an alignment film pattern becomes unclear, and the unoriented area
- the predetermined guide slit 42 is formed in the mask 40.
- the guide slit 42 is formed, and thus the light is irradiated to improve the straightness of the light, thereby increasing the uniformity of the pattern formed on the base film 50.
- the straightness of the light may be improved.
- the guide slits 42 shown in FIG. 3 may be arranged not only in one row but in a plurality of rows.
- the guide slits 42 arranged in a plurality of rows may be alternately arranged to form various patterns.
- the portion in which the guide slits 42 in one row are formed may be formed to be placed on the extension line and the portion in which the two rows of guide slits 42 are not formed.
- the thickness t, the width w, and the distance a between the mask 40 and the base film 50 (hereinafter, ') It is important to properly design the spacing (a) '. Specifically, if the exposure is performed in a state where the mask 40 is attached to the base film 50, the thickness t of the guide slit 42 may be reduced. If there is a) and the thickness t of the guide slit 42 is increased, pattern formation is possible even if the gap a is to some extent.
- the thickness t of the guide slit 42 when the thickness t of the guide slit 42 is thickened, there is an advantage that a pattern can be formed even when the distance a is slightly increased.
- the thickness t of the guide slit 42 when the thickness t of the guide slit 42 is unconditionally increased, there is a disadvantage in that the light transmittance decreases and the orientation is not good due to the decrease in the amount of light. Therefore, it is necessary to appropriately design the thickness t of the guide slit 42. .
- Figure 5 is a block diagram showing the relationship between the thickness and width of the guide slit of the mask according to the present invention, and the gap between the guide slit and the base film.
- the thickness t and the width w of the guide slit 42 and the distance a between the guide slit 42 and the base film 50 are indicated.
- a line extending from the upper end side of the guide slit 42 to the lower end side in the diagonal direction is defined as a first reference line L1.
- the first reference line L1 is a line extending from the upper left side of the guide slit 42 to the lower right side.
- a line extending along one side surface of the guide slit 42 is defined as a second reference line L2.
- the distance between the point where the first reference line L1 and the second reference line L2 meet the base film 50 defined above is defined as a maximum departure distance b and is shown in FIG. 5. That is, the maximum separation distance b may be regarded as the maximum distance that the light passing through the guide slit 42 is irradiated to the base film 50 by moving out of the straight path. It is preferable that all the light passes through the side surface of the guide slit 42 to be irradiated to the pattern region S of the base film 50. However, as shown in the first reference line L1 of FIG. The case of irradiation outside the pattern area S should also be considered.
- the pattern is uniformly implemented by minimizing the range of light irradiated beyond the portion where the pattern is normally formed.
- the maximum departure distance b is equal to or smaller than 1/5 of the unit pixel width of the stereoscopic image display device. This is because when the maximum deviation distance (b) exceeds 1/5 of the unit pixel width, there is a problem in that crosstalk is largely formed (the occurrence of an unwanted signal of one channel caused by an electrical signal of another channel). to be.
- the design conditions described above are expressed by the following equation.
- Equation 1 is as follows.
- Equation 2 The relationship between the maximum deviation distance b and the unit pixel width from Equation 2 is expressed as follows.
- Equation 3 can be summarized as follows.
- Equation 4 can be summarized as follows.
- the spacing a is preferably designed within the range of 0 ⁇ a ⁇ 50 mm. This is because it is difficult to implement a normal pattern when the interval a is designed to be out of the above range.
- the interval a may be designed to be 0.001 mm, 0.01 mm, 0.1 mm, or 1 mm or more, or may be designed to be 40 mm, 30 mm, 20 mm or less, and may be made of various combinations of the upper and lower limits exemplified. .
- FIG. 6A and 6B show photographs comparing the pattern shapes when the guide slits are not formed in the mask and when they are formed.
- FIG. 6A illustrates a case where no guide slit is formed in the mask
- FIG. 6B illustrates a case where the guide slit is formed.
- the pattern is formed more distinctly and uniformly than when the guide slit is not formed (Fig. 6a). You can check it.
- the formation of the guide slit in the mask used in the roll-to-roll process greatly contributes to the improvement of the uniformity of the pattern, which is supported by FIGS. 6A and 6B.
- FIG. 7A to FIG. 7D photographs in which the guide slits compare the pattern shape according to the gap between the mask and the base film are shown. 7A to 7D, the gap between the mask 40 and the base film 50 is increased in order.
- the pattern may be clearly and uniformly formed, and as the gap increases, the pattern may not be normally formed. In addition, it can be seen that the pattern almost disappears when the interval is greatly increased (FIG. 7D).
- the maximum separation distance b since the maximum separation distance b increases as the interval a increases, the maximum separation distance b may be reduced to reduce the maximum distance a, thereby forming a uniform pattern.
- the width w of the guide slit 42 may be designed to be the same as the pattern width of the stereoscopic image filter.
- the pitch formed by the guide slit 42 is for the left eye image or the right eye for the display panel of the stereoscopic image display device. It may be twice the width of the unit pixel generating the image.
- the stereoscopic image display apparatus for example, as illustrated in FIG. 8, has a unit pixel (UL of FIG. 8) for generating a left eye image and a unit pixel (for FIG. 8) for generating a right eye image.
- UR may be alternately arranged on a stripe, and when the film of the present invention is used in an optical filter applied to the stereoscopic image display device as described above, the above-mentioned pitch P is the unit It is preferable to have a numerical value equal to twice the width (W1 or W2 in FIG. 8) of the pixel UL or UR.
- the same "same” means substantially the same in the range which does not impair the effect of this invention, and includes an error which considered manufacturing error, a variation, etc., for example. That is, that the pitch is equal to twice the width of the unit pixel includes an error within about ⁇ 60 ⁇ m, preferably an error within about ⁇ 40 ⁇ m, more preferably an error within about ⁇ 20 ⁇ m. will be.
- the interval between the guide slits 42 has the same value as the width of the unit pixel (for example, W1 or W2 in FIG. 8) for generating the left eye image or the right eye image on the display panel of the stereoscopic image display apparatus. It is preferable.
- the same value as the width of the unit pixel in the above means substantially the same as described above, for example, an error within about ⁇ 30 ⁇ m, preferably an error within about ⁇ 20 ⁇ m, more preferably about ⁇ 10 ⁇ m It includes the error within.
- the mask 40 of the present invention may form an optical filter having a more precise alignment pattern and minimizing an unoriented region by adjusting the gap as described above.
- the mask 40 according to the present invention may have a curved shape in which the mask 40 itself is not flat in accordance with the radius of curvature of the roll used in the roll-to-roll process.
- the surface facing the roll in the mask 40 is preferably a curved surface having the same curvature as the roll.
- the mask 40 according to the present invention may change the shape of the guide slit 42 in order to improve the straightness of the light. That is, in FIG. 3, the inner walls of the guide slits 42 are formed to be parallel to each other, but the width thereof may be narrowed toward the lower side.
- the mask 40 according to the present invention may be configured to improve the straightness of light by coating a material for total reflection of light on the inner wall of the guide slit 42.
Abstract
Description
Claims (19)
- 기재 필름에 패턴을 형성하는 롤투롤(Roll to Roll) 공정에 사용되는 마스크에 있어서,상기 마스크에는 소정의 두께 및 폭을 갖도록 개구된 다수개의 가이드슬릿이 형성되는 것을 특징으로 하는 마스크.
- 제 1 항에 있어서,상기 가이드슬릿의 내벽은 하부로 갈수록 폭이 좁게 형성되는 것을 특징으로 하는 마스크.
- 제 1 항에 있어서,상기 가이드슬릿의 내벽에는 광의 직진도를 높이기 위한 전반사 코팅이 이루어지는 것을 특징으로 하는 마스크.
- 제 1 항에 있어서,상기 가이드슬릿은 일정한 간격을 가지고 다수열로 배치되는 것을 특징으로 하는 마스크.
- 제 1 항에 있어서,서로 다른 열에 위치한 가이드슬릿은 서로 엇갈리게 배치되는 것을 특징으로 하는 마스크.
- 롤투롤(Roll to Roll) 공정에 사용되는 롤;상기 롤에 감아지는 기재 필름;노광을 위해 광을 발생시키는 광원;상기 광원의 출사 측에 설치되어 상기 광원에서 발생한 광을 편광시키는 편광판; 및상기 기재 필름에 패턴을 형성하고, 소정의 두께 및 폭을 갖도록 개구된 다수개의 가이드슬릿이 형성되는 마스크를 포함하는 것을 특징으로 하는 광학필터 제조장치.
- 제 8 항에 있어서,상기 기재 필름의 전면적에 대해 균일하게 광이 조사될 수 있도록 집광하는 집광판을 더 포함하는 것을 특징으로 하는 광학필터 제조장치.
- 제 8 항에 있어서,상기 광원은 숏 아크형 방전램프인 것을 특징으로 하는 광학필터 제조장치.
- 제 8 항에 있어서,상기 광원은 UV 램프이고, 상기 UV 램프와 기재 필름의 사이에는 냉각 장치가 설치되는 것을 특징으로 하는 광학필터 제조장치.
- 제 8 항에 있어서,상기 광원은 다수개가 다수 열로 배치되는데, 서로 다른 열에 위치한 광원은 일부가 서로 중첩되도록 배치되는 것을 특징으로 하는 광학필터 제조장치.
- 제 12 항에 있어서,상기 서로 다른 열에 위치한 광원은 ⅔가 중첩되게 배치되는 것을 특징으로 하는 광학필터 제조장치.
- 제 8 항에 있어서,상기 가이드슬릿의 내벽은 하부로 갈수록 폭이 좁게 형성되는 것을 특징으로 하는 광학필터 제조장치.
- 제 8 항에 있어서,상기 가이드슬릿의 내벽에는 광의 직진도를 높이기 위한 전반사 코팅이 이루어지는 것을 특징으로 하는 광학필터 제조장치.
- 제 8 항에 있어서,상기 가이드슬릿은 일정한 간격을 가지고 다수열로 배치되는 것을 특징으로 하는 광학필터 제조장치.
- 제 8 항에 있어서,서로 다른 열에 위치한 가이드슬릿은 서로 엇갈리게 배치되는 것을 특징으로 하는 광학필터 제조장치.
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JP2013521709A JP5800303B2 (ja) | 2010-07-26 | 2011-07-26 | 立体映像表示装置に用いる光学フィルタの製造装置 |
CN201180037021.5A CN103119481B (zh) | 2010-07-26 | 2011-07-26 | 掩膜及包括该掩膜的滤光片制造设备 |
US13/393,522 US9069257B2 (en) | 2010-07-26 | 2011-07-26 | Mask and optical filter manufacturing apparatus including the same |
US13/335,126 US9041993B2 (en) | 2010-07-26 | 2011-12-22 | Mask |
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US13/335,126 Continuation-In-Part US9041993B2 (en) | 2010-07-26 | 2011-12-22 | Mask |
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JP (2) | JP5800303B2 (ko) |
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Also Published As
Publication number | Publication date |
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JP5800303B2 (ja) | 2015-10-28 |
WO2012015229A3 (ko) | 2012-04-19 |
JP2013539065A (ja) | 2013-10-17 |
TWI468750B (zh) | 2015-01-11 |
CN103119481B (zh) | 2015-07-01 |
US20130114055A1 (en) | 2013-05-09 |
JP2015187731A (ja) | 2015-10-29 |
JP6025909B2 (ja) | 2016-11-16 |
US9069257B2 (en) | 2015-06-30 |
CN103119481A (zh) | 2013-05-22 |
TW201229577A (en) | 2012-07-16 |
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