WO2011052399A1 - 配線板及びその製造方法 - Google Patents
配線板及びその製造方法 Download PDFInfo
- Publication number
- WO2011052399A1 WO2011052399A1 PCT/JP2010/068129 JP2010068129W WO2011052399A1 WO 2011052399 A1 WO2011052399 A1 WO 2011052399A1 JP 2010068129 W JP2010068129 W JP 2010068129W WO 2011052399 A1 WO2011052399 A1 WO 2011052399A1
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- Prior art keywords
- wiring board
- layer
- wiring
- rigid
- insulating layer
- Prior art date
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/14—Structural association of two or more printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4688—Composite multilayer circuits, i.e. comprising insulating layers having different properties
- H05K3/4694—Partitioned multilayer circuits having adjacent regions with different properties, e.g. by adding or inserting locally circuit layers having a higher circuit density
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/14—Structural association of two or more printed circuits
- H05K1/142—Arrangements of planar printed circuit boards in the same plane, e.g. auxiliary printed circuit insert mounted in a main printed circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
- H05K3/4658—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern characterized by laminating a prefabricated metal foil pattern, e.g. by transfer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
Definitions
- the present invention relates to a wiring board and a manufacturing method thereof.
- Patent Document 1 discloses a multilayer wiring board partially provided with a region having a high wiring density.
- the second wiring board is bonded onto the first wiring board, and the wiring of the first wiring board and the wiring of the second wiring board are electrically connected.
- Patent Document 1 The wiring board described in Patent Document 1 is considered to have the following problems.
- the second wiring board protrudes from the surface of the wiring board, it is considered that the connection reliability between the first wiring board and the second wiring board against an external impact or the like is low. Since the symmetry of the wiring board is poor, there are concerns about warping. Since the surface mounting region is not flat, it is considered that there are great restrictions on the arrangement of components and the routing of wiring. Further, since the first wiring board and the second wiring board are not integrally formed, it is necessary to connect the first wiring board and the second wiring board by a separate method (for example, solder, adhesive, etc.). It is considered to be.
- the object of the present invention is to obtain better electrical characteristics with respect to the connection between the first rigid wiring board and the second rigid wiring board included in the wiring board.
- a wiring board includes a substrate having an accommodation space, a first insulating layer formed on the substrate so as to close an opening of the substrate formed by the accommodation space, A first rigid wiring board having a first wiring layer formed on the first insulating layer; a second rigid wiring board having a second wiring layer on the main surface and housed in the housing space; A first connecting conductor connecting the first wiring layer and the second wiring layer; and a first interlayer insulating layer formed on the first wiring layer.
- a second rigid wiring board having a second wiring layer on a main surface is disposed in a housing space provided on a substrate of the first rigid wiring board. And forming an insulating layer on the substrate and the second rigid wiring board, forming a first via hole in the insulating layer, forming a first connection conductor in the first via hole, and Forming the first wiring layer, and manufacturing the first rigid wiring board having the first wiring layer and accommodating the second rigid wiring board therein, the first via hole Is formed in an inner layer of the wiring board, and the first wiring layer and the second wiring layer are electrically connected by the first connecting conductor.
- FIG. (1) for demonstrating the manufacturing method using a semi-additive method.
- FIG. (2) for demonstrating the manufacturing method using a semi-additive method.
- FIG. (3) for demonstrating the manufacturing method using a semi-additive method.
- FIG. (4) for demonstrating the manufacturing method using a semi-additive method. It is FIG.
- FIG. (5) for demonstrating the manufacturing method using a semi-additive method. It is FIG. (6) for demonstrating the manufacturing method using a semi-additive method. It is FIG. (7) for demonstrating the manufacturing method using a semi-additive method. It is FIG. (8) for demonstrating the manufacturing method using a semi-additive method. It is FIG. (1) for demonstrating the manufacturing method using the transfer method. It is FIG. (2) for demonstrating the manufacturing method using the transfer method. It is FIG. (3) for demonstrating the manufacturing method using the transfer method. It is FIG. (4) for demonstrating the manufacturing method using the transfer method. It is FIG. (5) for demonstrating the manufacturing method using the transfer method. It is FIG. (6) for demonstrating the manufacturing method using the transfer method. It is FIG.
- FIG. (1) for demonstrating the wiring board by which the wiring layer was connected by the through-hole conductor.
- FIG. (2) for demonstrating the wiring board by which the wiring layer was connected by the through-hole conductor.
- arrows Z1 and Z2 indicate the stacking direction of the wiring boards corresponding to the normal direction (or the thickness direction of the core substrate) of the main surface (front and back surfaces) of the wiring boards, respectively.
- arrows X1, X2 and Y1, Y2 respectively indicate directions perpendicular to the stacking direction (directions parallel to the main surface of the wiring board).
- the main surface of the wiring board is an XY plane.
- the side surface of the wiring board is an XZ plane or a YZ plane.
- the two main surfaces facing in opposite normal directions are referred to as a first surface (a surface on the arrow Z1 side) and a second surface (a surface on the arrow Z2 side).
- the side closer to the core is referred to as the lower layer (or inner layer side)
- the side far from the core is referred to as the upper layer (or outer layer side).
- the outer layer refers to the uppermost layer (outermost layer)
- the inner layer refers to a layer lower than the outer layer (a layer other than the outermost layer).
- a layer including a conductor pattern that can function as wiring of a circuit or the like is referred to as a wiring layer.
- the wiring layer may include through-hole conductors or via conductor lands.
- a conductor formed in the through hole and electrically connecting the wiring layers on both sides of the substrate is referred to as a through hole conductor.
- a conductor formed in the via hole and electrically connecting the upper wiring layer and the lower wiring layer to each other is referred to as a via conductor.
- the wiring board 1000 of this embodiment has a low density conductor region R1 and a high density conductor region R2, as shown in FIG.
- the conductor density of the high-density conductor region R2 is larger than the conductor density of the low-density conductor region R1.
- the number of wiring layers per unit thickness is compared between the low density conductor region R1 and the high density conductor region R2, the number of wiring layers in the high density conductor region R2 is larger than the number of wiring layers in the low density conductor region R1.
- the conductor density in the high-density conductor region R2 is higher than the conductor density in the low-density conductor region R1.
- the low-density conductor region R1 and the high-density conductor region R2 are part of the first rigid wiring board 10, respectively. Further, the first rigid wiring board 10 incorporates a second rigid wiring board 20. In the first rigid wiring board 10, the second rigid wiring board 20 corresponds to the high-density conductor region R2, and the other portion is the low-density conductor region R1. Therefore, the conductor density in the second rigid wiring board 20 is higher than the conductor density in the first rigid wiring board 10.
- the wiring board 1000, the first rigid wiring board 10, and the second rigid wiring board 20 are respectively printed wiring boards.
- the second rigid wiring board 20 is a multilayer wiring board having a plurality of wiring layers.
- the second rigid wiring board 20 includes a substrate 200, insulating layers 201 and 202, wiring layers 211 to 214, and via conductors 221 and 222.
- the wiring layers 213 and 214 are formed on the main surface (first surface, second surface) of the second rigid wiring board 20.
- Via conductors 221 and 222 are fill vias.
- the wiring layers 211 to 214 and the via conductors 221 and 222 are made of, for example, copper.
- the insulating layers 201 and 202 function as interlayer insulating layers.
- the insulating layers 201 and 202 are made of, for example, a cured prepreg.
- the substrate 200 is made of, for example, an epoxy resin.
- the epoxy resin preferably contains a reinforcing material such as glass fiber or aramid fiber by, for example, resin impregnation treatment.
- the reinforcing material is a material having a smaller coefficient of thermal expansion than the main material (epoxy resin).
- an inorganic material such as glass cloth, silica filler, or glass filler is preferable.
- a wiring layer 211 is formed on the first surface of the substrate 200, and a wiring layer 212 is formed on the second surface of the substrate 200.
- a through hole 200 a is formed in the substrate 200.
- a through hole conductor 200b is formed on the wall surface of the through hole 200a.
- the through-hole conductor 200b electrically connects the wiring layer 211 and the wiring layer 212 to each other.
- the through hole 200a is filled with, for example, a resin 200c flowing out from the insulating layers 201 and 202.
- the wiring board composed of the substrate 200, the wiring layers 211 and 212, and the through-hole conductor 200 b corresponds to the core substrate of the second rigid wiring board 20.
- An insulating layer 201 is formed on the first surface of the substrate 200, and an insulating layer 202 is formed on the second surface of the substrate 200.
- a wiring layer 213 is formed on the insulating layer 201, and a wiring layer 214 is formed on the insulating layer 202.
- a via hole 201 a is formed in the insulating layer 201, and a via hole 202 a is formed in the insulating layer 202.
- the via holes 201a and 202a are filled with a conductor (for example, copper) by plating, for example, to form via conductors 221 and 222, respectively.
- the wiring layer 211 and the wiring layer 213 are electrically connected to each other through the via conductor 221.
- the wiring layer 212 and the wiring layer 214 are electrically connected to each other through the via conductor 222.
- the first rigid wiring board 10 incorporates a second rigid wiring board 20.
- the first rigid wiring board 10 includes an insulating substrate 103 including a substrate 100 and insulating layers 101 and 102, wiring layers 111 and 112, and via conductors 121 and 122.
- the wiring layers 111 and 112 are formed on the main surface (first surface, second surface) of the first rigid wiring board 10.
- the substrate 100 includes, for example, five insulating layers, that is, insulating layers 100a to 100e.
- the insulating layers 100a to 100e are stacked in the order of the insulating layers 100a, 100b, 100c, 100d, and 100e from the first surface to the second surface.
- the thickness of the substrate 100 (the total thickness of the insulating layers 100a to 100e) is substantially the same as the thickness of the second rigid wiring board 20.
- the thickness of at least one wiring layer of the second rigid wiring board 20 is preferably smaller than the thickness of the wiring layer of the first rigid wiring board 10.
- the substrate 100 is formed with a through hole 20b. And this through-hole 20b becomes accommodation space R11 (accommodating part). An opening is formed in the substrate 100 by the accommodation space R11.
- the second rigid wiring board 20 is accommodated in an accommodation space R ⁇ b> 11 provided in the first rigid wiring board 10 (substrate 100). The gap between the first rigid wiring board 10 and the second rigid wiring board 20 is filled with the resin 20a flowing out from the surrounding insulating layers (insulating layers 100a to 100e, insulating layers 101 and 102, etc.).
- the substrate 100 and the second rigid wiring board 20 are arranged side by side in the X direction or the Y direction, as shown in FIG.
- a plurality of (for example, four) rectangular storage spaces R11 are formed in one rectangular first rigid wiring board 10 (substrate 100), and each of the storage spaces R11 has a rectangular second rigid wiring.
- positions the board 20 is shown, it is not limited to this.
- the number and shape of the first rigid wiring board 10 and the second rigid wiring board 20 are arbitrary.
- the insulating layers 100a to 100e are made of, for example, a cured prepreg.
- a base material such as glass fiber or aramid fiber, epoxy resin, polyester resin, bismaleimide triazine resin (BT resin), imide resin (polyimide), phenol resin, or allylated phenylene ether resin (A-PPE)
- a resin impregnated with a resin such as (resin) is used.
- An insulating layer 101 (second insulating layer) is formed on the first surface of the second rigid wiring board 20 and the insulating layer 100a, and an insulating layer 102 (first layer) is formed on the second surface of the second rigid wiring board 20 and the insulating layer 100e. 1 insulating layer) is formed.
- One (first surface side) opening of the substrate 100 formed by the through hole 20b is closed by the insulating layer 101 formed on the first surface side of the substrate 100, and the substrate 100 formed by the through hole 20b.
- the other (second surface side) opening is closed by an insulating layer 102 formed on the second surface side of the substrate 100.
- a wiring layer 111 is formed on the insulating layer 101, and a wiring layer 112 is formed on the insulating layer 102.
- a via hole 101 a is formed in the insulating layer 101, and a via hole 102 a is formed in the insulating layer 102.
- the via holes 101a and 102a are filled with a conductor (for example, copper) by plating, for example, to form via conductors 121 and 122, respectively.
- the wiring layer 213 and the wiring layer 111 are electrically connected to each other via the via conductor 121.
- the wiring layer 214 and the wiring layer 112 are electrically connected to each other through the via conductor 122.
- the low-density conductor region R1 and the high-density conductor region R2 are electrically connected to each other via the via conductor 121 and the via conductor 122.
- the via conductors 121 and 122 are fill vias.
- the via conductor 122 corresponds to a first connection conductor
- the via conductor 121 corresponds to a second connection conductor.
- a through hole 10 a is formed in the substrate 100 and the insulating layers 101 and 102.
- a through hole conductor 10b is formed on the wall surface of the through hole 10a. The through-hole conductor 10b electrically connects the wiring layer 111 and the wiring layer 112 to each other.
- the wiring board 1000 includes insulating layers 301 and 302, wiring layers 311 and 312, via conductors 321, in addition to the first rigid wiring board 10 (including the second rigid wiring board 20). 322 and solder resist layers 331 and 332. Via conductors 321 and 322 are fill vias.
- the wiring board 1000 has a structure in which via conductors 221, 121, and 321 are stacked (stacked) in the Z direction on the first surface side of the substrate 200, and the via conductors 222, 122 on the second surface side of the substrate 200. 322 have a structure stacked in the Z direction.
- An insulating layer 301 (second interlayer insulating layer) is formed on the first surface of the insulating layer 101, and an insulating layer 302 (first interlayer insulating layer) is formed on the second surface of the insulating layer 102.
- the through hole 10a is filled with the resin 10c flowing out from the insulating layers 301 and 302.
- a wiring layer 311 is formed on the insulating layer 301, and a wiring layer 312 is formed on the insulating layer 302.
- a via hole 301 a is formed in the insulating layer 301, and a via hole 302 a is formed in the insulating layer 302.
- the via holes 301a and 302a are filled with a conductor (for example, copper) by plating, for example, to form via conductors 321 and 322, respectively.
- the wiring layer 111 and the wiring layer 311 are electrically connected to each other via the via conductor 321.
- the wiring layer 112 and the wiring layer 312 are electrically connected to each other via the via conductor 322.
- a solder resist layer 331 is formed on the first surface of the insulating layer 301, and a solder resist layer 332 is formed on the second surface of the insulating layer 302.
- Each of the solder resist layers 331 and 332 is made of, for example, a photosensitive resin using an acrylic-epoxy resin, a thermosetting resin mainly composed of an epoxy resin, an ultraviolet curable resin, or the like.
- An opening 331 a is formed in the solder resist layer 331, and an opening 332 a is formed in the solder resist layer 332.
- An external connection terminal 331b is formed in the opening 331a, and an external connection terminal 332b is formed in the opening 332a.
- the external connection terminal 331 b is formed on the wiring layer 311, and the external connection terminal 332 b is formed on the wiring layer 312.
- the external connection terminals 331b and 332b are, for example, solder bumps.
- the external connection terminals 331b and 332b are used for electrical connection with, for example, other wiring boards and electronic components.
- the wiring board 1000 can be used as a circuit board of a mobile phone or the like by being mounted on another wiring board on one side or both sides, for example.
- the second rigid wiring board 20 is accommodated in the accommodation space R11 of the first rigid wiring board 10.
- the first rigid wiring board 10 and the second rigid wiring board 20 are electrically connected to each other by via conductors 121 and 122. That is, in the wiring board 1000, the first rigid wiring board 10 and the second rigid wiring board 20 are integrally formed in the inner layer of the wiring board 1000. For this reason, the connection reliability between the first rigid wiring board 10 and the second rigid wiring board 20 is high with respect to an external impact or the like. As a result, cracks are also suppressed.
- the first rigid wiring board 10 and the second rigid wiring board 20 are electrically connected to each other via via conductors 121 and 122. For this reason, the first rigid wiring board 10 and the second rigid wiring board 20 are electrically connected in a normal manufacturing process such as formation of an inner layer pattern of the wiring board 1000 or formation of a via conductor for interlayer connection. Can do. Further, by sharing the manufacturing process, the manufacturing cost and the manufacturing time can be reduced. Further, no separate method (for example, solder or adhesive) is required for connection between the first rigid wiring board 10 and the second rigid wiring board 20.
- the surface of the wiring board 1000 is flat and seamless. As a result, the component mounting area or wiring area on the surface of the wiring board 1000 is widened. In addition, since the wiring distance is shortened as compared with the case where the first rigid wiring board 10 and the second rigid wiring board 20 are connected in the outermost layer, the impedance can be reduced. In addition, less conductor material is required for the wiring. Furthermore, the influence of signal noise is also reduced.
- the wiring layers 213 and 214 on both main surfaces of the second rigid wiring board 20 are connected to the wiring of the first rigid wiring board 10 via the via conductors 121 and 122 on the inner layer of the wiring board 1000. It is electrically connected to the layers 111 and 112. Therefore, the above-mentioned effects (improvement in impact resistance and flatness, etc.) can be obtained on both surfaces of the wiring board 1000.
- the wiring layer and the insulating layer are built up on both surfaces of the first rigid wiring board 10 and the second rigid wiring board 20. For this reason, the symmetry (especially the symmetry of a Z direction) of the wiring board 1000 increases, and the curvature of the wiring board 1000 is suppressed.
- the wiring board 1000 of this embodiment has a high-density conductor region R2 partially because the first rigid wiring board 10 incorporates the second rigid wiring board 20 having a high conductor density. By doing so, the wiring board 1000 can be partially fine pitched easily.
- the first rigid wiring board 10 and the second rigid wiring board 20 are connected via the resin 20a that has flowed out from the surrounding insulating layer.
- the adhesiveness of the 1st rigid wiring board 10 and the 2nd rigid wiring board 20 improves.
- the resin 20a serves as a buffer material, even when an impact is applied from the outside, the impact is not directly transmitted to the second rigid wiring board 20. Thereby, the impact resistance of the 2nd rigid wiring board 20 becomes high.
- the via conductors 221, 121, and 321 are laminated in the Z direction, so that the second rigid wiring board 20 can receive an impact from the first surface side. Further, since the via conductors 222, 122, and 322 are stacked in the Z direction, the second rigid wiring board 20 can also receive an impact from the second surface side. Thereby, the impact resistance of the 2nd rigid wiring board 20 becomes high.
- the substrate 100 includes a plurality (five layers) of prepreg layers (insulating layers 100a to 100e). For this reason, the thickness of the substrate 100 can be easily adjusted. In particular, the substrate 100 having a large thickness can be easily formed.
- the wiring board 1000 is manufactured, for example, according to the procedure shown in FIG.
- step S10 insulating layers 100a to 100e (substrate 100) having through holes 20b (FIG. 4) and a second rigid wiring board 20 are prepared.
- the second rigid wiring board 20 is prepared by cutting from a multi-piece substrate 21 having a plurality of (for example, 12) wiring boards (second rigid wiring board 20).
- the second rigid wiring board 20 is disposed in the through holes 20b (accommodating space R11) of the insulating layers 100a to 100e.
- the accommodation space R11 is generated, for example, by forming the through holes 20b in the insulating layers 100a to 100e with a laser.
- an accommodation space R11 is formed in each of the insulating layers 100a to 100e.
- the insulating layers 100a to 100e are stacked with the accommodation space R11 aligned.
- the size of the accommodation space R11 is preferably substantially the same as the size of the second rigid wiring board 20, for example.
- the second rigid wiring board 20 can be manufactured by, for example, a known build-up method.
- step S12 of FIG. 5 the first rigid wiring board 10 is manufactured.
- the second rigid wiring board 20 is embedded in the first rigid wiring board 10.
- the second rigid wiring board 20 is arranged in the accommodation space R11 by the process of step S11. From this state, as shown in FIG. 8, the insulating layer 101 and the copper foil 1001 are disposed on the first surface side of the insulating layer 100a and the second rigid wiring board 20, and the insulating layer 100e and the second rigid wiring board 20 The insulating layer 102 and the copper foil 1002 are disposed on the second surface side. At this stage, the insulating layers 101 and 102 (prepreg) are in an uncured state.
- This press is, for example, a hot press.
- a pressing jig positioned by a pin and press the surface substantially perpendicularly to the main surface.
- the openings at both ends of the through hole 20b are closed by the insulating layer 101 formed on the first surface side and the insulating layer 102 formed on the second surface side.
- the resin 20a flows out from the prepregs constituting the insulating layers 100a to 100e and the insulating layers 101 and 102, respectively.
- the resin 20a is filled in the gap between the insulating layers 100a to 100e and the second rigid wiring board 20.
- each prepreg is cured and the members adhere to each other.
- the insulating layers 100a to 100e are integrated to form the substrate 100. Note that the pressing and heat treatment may be performed in a plurality of times. Moreover, you may perform heat processing and a press separately.
- via holes 101a and 102a and a through hole 10a are formed by, for example, irradiating a CO 2 laser. Then, desmear or soft etch is performed as necessary.
- a plating film is formed on the entire surface of the first surface and the second surface by panel plating (for example, chemical copper plating and electrolytic copper plating), and a predetermined lithography process (for example, pretreatment, lamination, exposure, development, etching, The plating film is patterned by peeling film or the like.
- panel plating for example, chemical copper plating and electrolytic copper plating
- a predetermined lithography process for example, pretreatment, lamination, exposure, development, etching
- the plating film is patterned by peeling film or the like.
- the first rigid wiring board 10 as shown in FIG. 3 is manufactured. That is, by this plating, a via conductor 121 is formed in the via hole 101a, a via conductor 122 is formed in the via hole 102a, and a through hole conductor 10b is formed on the wall surface of the through hole 10a.
- the wiring layer 111 is formed on the first surface of the insulating layer 101, and the wiring layer 112 is formed on the second surface
- step S13 of FIG. 5 a wiring layer and an insulating layer are built up on both surfaces of the first rigid wiring board 10.
- the insulating layer 301 and the copper foil 1003 are disposed on the first surface side of the first rigid wiring board 10, and the insulating layer 302 is disposed on the second surface side of the first rigid wiring board 10.
- the copper foil 1004 is disposed.
- the insulating layers 301 and 302 are in an uncured state.
- via holes 301a and 302a are formed by irradiating, for example, a CO 2 laser. Then, desmear or soft etch is performed as necessary.
- a plating film is formed on the entire first surface and the second surface by panel plating (for example, chemical copper plating and electrolytic copper plating), and the plating film is formed by a predetermined lithography process as shown in FIG. Pattern.
- panel plating for example, chemical copper plating and electrolytic copper plating
- the plating film is formed by a predetermined lithography process as shown in FIG. Pattern.
- a via conductor 321 is formed in the via hole 301a
- a via conductor 322 is formed in the via hole 302a.
- the wiring layer 311 is formed on the first surface of the insulating layer 301
- the wiring layer 312 is formed on the second surface of the insulating layer 302. Then, it roughens as needed.
- step S14 of FIG. 5 external connection terminals are formed on the outermost layer.
- openings 331a and 332a are formed in the solder resist layers 331 and 332 by a predetermined lithography process. A part of the wiring layers 311 and 312 is exposed as a pad through the openings 331a and 332a. Thereafter, if necessary, the pads are subjected to a surface treatment such as Ni / Au plating or OSP (Organic Solderability Preservative).
- a surface treatment such as Ni / Au plating or OSP (Organic Solderability Preservative).
- the openings 331a and 332a are formed after the solder resist layers 331 and 332 are formed.
- the present invention is not limited to this.
- solder resist layers 331 and 332 having the openings 331a and 332a are formed from the beginning by selectively forming the solder resist layers 331 and 332 with a mask material provided in advance at the positions of the openings 331a and 332a. Also good.
- solder paste is printed and reflowed to form external connection terminals 331b and 332b (solder bumps) in the openings 331a and 332a.
- the external connection terminals 331b and 332b are located on the pads.
- the wiring board 1000 (FIG. 1) is completed. Further, as necessary, external processing, warping correction, energization inspection, appearance inspection, or final inspection is performed.
- the manufacturing method of the present embodiment is suitable for manufacturing the wiring board 1000. With such a manufacturing method, a good wiring board 1000 can be obtained at low cost.
- the conductor density in the high-density conductor region R2 is larger than the conductor density in the low-density conductor region R1, but the present invention is not limited to this.
- the conductor density in the high-density conductor region R2 is greater than the conductor density in the low-density conductor region R1 due to the difference in the number of via conductors or the difference in the line width or pitch of the conductor pattern. Good.
- Via conductors 121, 122, 221, 222, 321, and 322 may be conformal vias instead of fill vias.
- a fill via is preferable.
- the fill via can be formed to be laminated. Therefore, the fill via is preferable in increasing the degree of freedom in design.
- the second rigid wiring board 20 may be a wiring board containing the electronic component 500.
- the second rigid wiring board 20 may incorporate a plurality of electronic components.
- a plurality of second rigid wiring boards 20 may be built in one accommodation space R11 of the first rigid wiring board 10.
- the resin flowing out from the upper insulating layer is filled in the gap between the substrate 100 and the second rigid wiring board 20, but the present invention is not limited to this.
- a resin prepared separately may be filled in the gap before the upper insulating layer is formed.
- the second rigid wiring board 20 may be temporarily fixed with an adhesive before the upper insulating layer is formed.
- the conductor pattern in the wiring board 1000 may have a form of fan-out from a component connection terminal (for example, the external connection terminal 331b) to a board connection terminal (for example, the external connection terminal 332b).
- the first rigid wiring board 10 and the second rigid wiring board 20 may have a wiring layer only on one side.
- only the wiring layer 214 on one main surface of the second rigid wiring board 20 is electrically connected to the wiring layer 112 of the first rigid wiring board 10 via the via conductor 122 on the inner layer of the wiring board 1000. May be connected to each other.
- the wiring board 1000 and the first rigid wiring board 10 cannot be distinguished from each other and are substantially coincident with each other, the first layer in the inner layer of the wiring board 1000 (first rigid wiring board 10). Since the rigid wiring board 10 and the second rigid wiring board 20 are electrically connected to each other by the via conductor 122, the first rigid wiring board 10 and the second rigid wiring board 20 are protected against external impacts or the like. Connection reliability is high.
- the shape and size of the accommodation space R11 are arbitrary. However, in positioning the second rigid wiring board 20, the shape and size corresponding to the second rigid wiring board 20 are preferable.
- the accommodation space R11 is not limited to the through hole.
- the accommodation space R11 may be a depression.
- the substrate 100 is composed of five prepreg layers (insulating layers 100a to 100e).
- the present invention is not limited to this.
- the substrate 100 may be a single substrate (for example, an epoxy resin).
- the formation method of the accommodation space R11 is arbitrary.
- the accommodation space R11 may be formed by etching or the like, for example.
- the manufacturing method of the present invention is not limited to the contents and order shown in the flowchart of FIG. 5, and the contents and order can be arbitrarily changed without departing from the spirit of the present invention. Moreover, you may omit the process which is not required according to a use etc.
- the formation method of the conductor pattern or the connecting conductor is arbitrary.
- a conductor pattern may be formed.
- a semi-additive method and a manufacturing method using a transfer method will be described.
- the description is abbreviate
- the insulating layers 100a to 100e are integrated to form the substrate 100.
- the gap between the substrate 100 and the second rigid wiring board 20 is filled with the resin 20a that has flowed out from the surrounding insulating layers (insulating layers 100a to 100e, insulating layers 101 and 102, etc.).
- via holes 101a and 102a and a through hole 10a are formed by irradiating, for example, a CO 2 laser. Then, desmear or soft etch is performed as necessary.
- electroless copper plating is performed on the first and second surfaces of the insulating layers 101 and 102 to form a plating film 130 in the through hole 10 a and on the insulating layers 101 and 102.
- a patterned plating resist 131 is formed on the plating film 130 formed on the insulating layers 101 and 102.
- the plating resist 131 has an opening 131a.
- electrolytic plating is performed on the plating film 130 on which the plating resist 131 is formed to form a plating film 132 that covers the plating film 130.
- the plating film 132 is formed in the opening 131 a of the plating resist 131.
- ⁇ Manufacturing method using transfer method> In the manufacturing method using the transfer method, for example, as shown in FIG. 28, a pair of stainless steel plates 141 and 142 is prepared. Stainless steel plates 141 and 142 each have a conductor pattern 150 made of electrolytic copper on the surface. In the transfer method, a conductor pattern is formed using the conductor pattern 150.
- the insulating layers 100a to 100e (substrate 100), the second rigid wiring board 20, and the insulating layers 101 and 102 are hot-pressed to integrate them, 28, the stainless steel plates 141 and 142 are disposed so that the surface on which the conductor pattern 150 is formed faces the insulating layers 101 and 102, respectively.
- the via holes 101a and 102a and the through hole 10a are formed by irradiating, for example, a CO 2 laser. Then, desmear or soft etch is performed as necessary.
- electroless copper plating is performed on the first and second surfaces of the insulating layers 101 and 102 to form a plating film 151 in the through hole 10 a and on the insulating layers 101 and 102. .
- a patterned plating resist 152 is formed on the plating film 151 formed on the insulating layers 101 and 102.
- the plating resist 152 has an opening 152a.
- electrolytic copper plating is performed on the plating film 151 on which the plating resist 152 is formed to form the plating film 153.
- the plating film 153 is formed in the opening 152 a of the plating resist 152.
- the manufacturing method using the semi-additive method or the transfer method described above is suitable for manufacturing the wiring board 1000. With such a manufacturing method, a good wiring board 1000 can be obtained at low cost.
- the wiring layer 112 (first wiring layer) and the wiring layer 214 (second wiring layer) are connected by the via conductor 122 (first connecting conductor), and the wiring layer 111 (third wiring layer). ) And the wiring layer 213 (fourth wiring layer) are connected by a via conductor 121 (second connection conductor).
- the present invention is not limited to this, and the wiring layer 112 (first wiring layer) and the wiring layer 214 (second wiring layer), or the wiring layer 111 (third wiring layer) and the wiring layer 213 (fourth wiring layer) They may be connected by through-hole conductors (first connection conductor, second connection conductor).
- a plating film is formed on the entire surface of the first surface and the second surface by panel plating, and the plating film is formed by a predetermined lithography process (for example, pretreatment, lamination, exposure, development, etching, peeling film, etc.). Pattern.
- a predetermined lithography process for example, pretreatment, lamination, exposure, development, etching, peeling film, etc.
- a wiring layer 112 (first wiring layer) and a wiring layer 214 (second wiring layer), and a wiring layer 111 (third wiring layer) and a wiring layer 213 (fourth wiring layer) are provided.
- a plating film through-hole conductor 154 formed inside the through-hole 11a.
- the wiring board according to the present invention is suitable for a circuit board of an electronic device. Moreover, the method for manufacturing a wiring board according to the present invention is suitable for manufacturing a circuit board of an electronic device.
- Second rigid wiring board 20a Resin 20b Through hole 100 Substrate 100a to 100e Insulating layer 101, 102 Insulating layer 101a Via hole 102a Via hole 111 Wiring layer 112 Wiring layer 121 Via conductor (second connecting conductor) 122 Via conductor (first connecting conductor) 154 Through hole conductor 200 Substrate 200a Through hole 200b Through hole conductor 200c Resin 201, 202 Insulating layer 201a, 202a Via hole 211, 212 Wiring layer 213 Wiring layer 214 Wiring layer 221, 222 Via conductor 301 Insulating layer (second interlayer insulating layer) ) 302 Insulating layer (first interlayer insulating layer) 301a, 302a Via hole 311, 312 Wiring layer 321, 322 Via conductor 331, 332 Solder resist layer 331b, 332b External connection terminal 500 Electronic component 1000 Wiring board R1 Low density conduct
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Abstract
Description
セミアディティブ法を用いた製造方法では、例えば図7の工程と同様、絶縁層100a~100eの貫通孔20b(収容スペースR11)に、第2リジッド配線板20を配置した後、図20に示すように、絶縁層100a及び第2リジッド配線板20の第1面側に絶縁層101を配置し、絶縁層100e及び第2リジッド配線板20の第2面側に絶縁層102を配置する。
転写法を用いた製造方法では、例えば図28に示すように、一組のステンレス鋼板141、142を用意する。ステンレス鋼板141、142は、それぞれ表面に電解銅からなる導体パターン150を有する。転写法では、この導体パターン150を用いて導体パターンを形成する。
10a スルーホール
10b スルーホール導体
10c 樹脂
11a スルーホール
20 第2リジッド配線板
20a 樹脂
20b 貫通孔
100 基板
100a~100e 絶縁層
101、102 絶縁層
101a バイアホール
102a バイアホール
111 配線層
112 配線層
121 バイア導体(第2接続用導体)
122 バイア導体(第1接続用導体)
154 スルーホール導体
200 基板
200a スルーホール
200b スルーホール導体
200c 樹脂
201、202 絶縁層
201a、202a バイアホール
211、212 配線層
213 配線層
214 配線層
221、222 バイア導体
301 絶縁層(第2層間絶縁層)
302 絶縁層(第1層間絶縁層)
301a、302a バイアホール
311、312 配線層
321、322 バイア導体
331、332 ソルダーレジスト層
331b、332b 外部接続端子
500 電子部品
1000 配線板
R1 低密度導体領域
R2 高密度導体領域
R11 収容スペース
Claims (11)
- 収容スペースを有する基板と、前記収容スペースにより形成される前記基板の開口を塞ぐように、前記基板上に形成される第1絶縁層と、前記第1絶縁層の上に形成される第1配線層とを有する第1リジッド配線板と、
主面上に第2配線層を有し、前記収容スペースに収容される第2リジッド配線板と、
前記第1配線層と前記第2配線層とを接続する第1接続用導体と、
前記第1配線層の上に形成される第1層間絶縁層と、
を有する配線板。 - 前記第1絶縁層がプリプレグからなり、
前記第1リジッド配線板と前記第2リジッド配線板との隙間には、前記第1絶縁層から流出した樹脂が充填されている、
ことを特徴とする請求項1に記載の配線板。 - 前記第2リジッド配線板における導体の存在密度は、前記第1リジッド配線板における導体の存在密度よりも高い、
ことを特徴とする請求項1又は2に記載の配線板。 - 前記第2リジッド配線板は、前記第2配線層を含む複数の配線層を備える多層配線板であり、
前記第2リジッド配線板の前記配線層の総数は、前記第1リジッド配線板の前記第1配線層を含む配線層の総数よりも多い、
ことを特徴とする請求項1又は2に記載の配線板。 - 前記第2リジッド配線板は、前記第2配線層を含む複数の配線層を備える多層配線板であり、
前記第2リジッド配線板の少なくとも1つの配線層の厚みは、前記第1リジッド配線板の配線層の厚みよりも小さい、
ことを特徴とする請求項1又は2に記載の配線板。 - 前記第1接続用導体は、前記第1絶縁層に形成されたバイア導体である、
ことを特徴とする請求項1又は2に記載の配線板。 - 前記第1接続用導体は、フィルドバイアである、
ことを特徴とする請求項6に記載の配線板。 - 前記第1接続用導体は、前記第2リジッド配線板及び前記第1絶縁層を貫通するスルーホール導体である、
ことを特徴とする請求項1又は2に記載の配線板。 - 前記収容スペースは貫通孔であり、
前記第1リジッド配線板は、前記収容スペースにより形成される前記基板の他方の開口を塞ぐように、前記基板上に形成される第2絶縁層と、前記第2絶縁層の上に形成される第3配線層とを有しており、
前記第2リジッド配線板は、前記第2配線層が形成された前記主面とは反対側の主面に、第4配線層を有しており、
さらに、当該配線板は、
前記第3配線層と前記第4配線層とを接続する第2接続用導体と、
前記第3配線層の上に形成される第2層間絶縁層と、
を有する、
ことを特徴とする請求項1又は2に記載の配線板。 - 第1リジッド配線板の基板に設けられた収容スペースに、主面上に第2配線層を有する第2リジッド配線板を配置することと、
前記基板及び前記第2リジッド配線板上に絶縁層を形成し、該絶縁層に第1バイアホールを形成し、該第1バイアホールに第1接続用導体を形成し、前記絶縁層上に第1配線層を形成することにより、前記第1配線層を有し前記第2リジッド配線板を内部に収容する前記第1リジッド配線板を製造することと、
を含む配線板の製造方法において、
前記第1バイアホールは、前記配線板の内層に形成され、
前記第1配線層と前記第2配線層とは、前記第1接続用導体によって電気的に接続される、
ことを特徴とする配線板の製造方法。 - 前記絶縁層をプレスすることにより該絶縁層から樹脂を流出させ、該樹脂を、前記基板と前記第2リジッド配線板との隙間に充填することを含む、
ことを特徴とする請求項10に記載の配線板の製造方法。
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JP2011538346A JPWO2011052399A1 (ja) | 2009-10-30 | 2010-10-15 | 配線板及びその製造方法 |
CN2010800493278A CN102598885A (zh) | 2009-10-30 | 2010-10-15 | 电路板及其制造方法 |
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US61/256,374 | 2009-10-30 | ||
US12/795,737 | 2010-06-08 | ||
US12/795,737 US8334463B2 (en) | 2009-10-30 | 2010-06-08 | Wiring board and method for manufacturing the same |
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JP (1) | JPWO2011052399A1 (ja) |
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CN (1) | CN102598885A (ja) |
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CN102905460A (zh) * | 2011-07-25 | 2013-01-30 | 揖斐电株式会社 | 线路板及其制造方法 |
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KR101013992B1 (ko) * | 2008-12-02 | 2011-02-14 | 삼성전기주식회사 | 인쇄회로기판 제조방법 |
US8400782B2 (en) | 2009-07-24 | 2013-03-19 | Ibiden Co., Ltd. | Wiring board and method for manufacturing the same |
JP5579108B2 (ja) * | 2011-03-16 | 2014-08-27 | 株式会社東芝 | 半導体装置 |
JP5931547B2 (ja) * | 2012-03-30 | 2016-06-08 | イビデン株式会社 | 配線板及びその製造方法 |
JP2013214578A (ja) * | 2012-03-30 | 2013-10-17 | Ibiden Co Ltd | 配線板及びその製造方法 |
TWI433632B (zh) * | 2012-05-03 | 2014-04-01 | Subtron Technology Co Ltd | 基板結構的製作方法 |
JP6160308B2 (ja) * | 2013-07-02 | 2017-07-12 | 富士通株式会社 | 積層基板 |
US10034704B2 (en) | 2015-06-30 | 2018-07-31 | Ethicon Llc | Surgical instrument with user adaptable algorithms |
KR20220086320A (ko) * | 2020-12-16 | 2022-06-23 | 삼성전기주식회사 | 연결구조체 내장기판 |
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- 2010-10-15 JP JP2011538346A patent/JPWO2011052399A1/ja active Pending
- 2010-10-15 CN CN2010800493278A patent/CN102598885A/zh active Pending
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TW201132266A (en) | 2011-09-16 |
US20110100698A1 (en) | 2011-05-05 |
JPWO2011052399A1 (ja) | 2013-03-21 |
CN102598885A (zh) | 2012-07-18 |
KR20120064126A (ko) | 2012-06-18 |
US8334463B2 (en) | 2012-12-18 |
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