WO2010093415A1 - Developer waste reuse - Google Patents

Developer waste reuse Download PDF

Info

Publication number
WO2010093415A1
WO2010093415A1 PCT/US2010/000230 US2010000230W WO2010093415A1 WO 2010093415 A1 WO2010093415 A1 WO 2010093415A1 US 2010000230 W US2010000230 W US 2010000230W WO 2010093415 A1 WO2010093415 A1 WO 2010093415A1
Authority
WO
WIPO (PCT)
Prior art keywords
developer liquid
tank
waste
developer
conductivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2010/000230
Other languages
English (en)
French (fr)
Inventor
Kalman Shamir
Moshe Marom
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Priority to CN201080007777.0A priority Critical patent/CN102317869B/zh
Priority to JP2011550120A priority patent/JP2012518274A/ja
Priority to EP10709085A priority patent/EP2396702A1/en
Publication of WO2010093415A1 publication Critical patent/WO2010093415A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing

Definitions

  • This present invention relates to an apparatus and method for replenishment of developer liquid, inside a plate developing processor machinery for the printing industry.
  • Lithographic digital printing plates are imaged on special optomechanical plate setters.
  • the imaged plates should undergo a chemical development stage, this process is usually performed by a plate developing processor device.
  • the development process uses chemical development material in a liquid form. The material is filled into the developer section tank 10 within the plate processor device, as described in the prior art Figure 1.
  • developer liquid 12 inside developer section tank 10 should be maintained at fixed level.
  • new developer liquid is replenished from fresh developer container 13 via developer replenish pipe system 15.
  • developer replenish pipe system 15 The new developer material from fresh developer container 13 will flow into developer section tank 10, while maintaining the developer liquid level 12.
  • part of the developer liquid from developer section tank 10 will be drained into the developer waste container 14, via developer waste overflow pipe system 16.
  • the invention disclosed hereunder proposes extending the usage of the development material to a plurality of plate development cycles, causing the reduction of wasted material and removal events.
  • an apparatus for reusing developer liquid in a plate processor device comprises, a new developer liquid container, a work in progress developer liquid tank which is used for plate processing and is filled with a developer liquid from the new developer liquid container, a waste developer liquid container configured to receive spilled over developer liquid from the work in progress developer liquid tank.
  • the apparatus additionally comprises replenish means configured to replenish the waste developer liquid from the waste developer liquid container back according to the conductivity level of the waste developer liquid.
  • Figure 1 is a prior art schematic illustrating a developer liquid flow between the developer section tank, the fresh developer material container and developer waste material container;
  • Figure 2 is a schematic illustrating a developer liquid flow between the developer section tank, the fresh developer material container and developer waste material container used in the disclosed invention
  • Figure 3 is a chart illustrating the behavior function of the developer material conductivity level changing over time.
  • the present embodiments enable reusing of the developer material wasted due to plate developing process plurality of times, thus reducing the events of wasted material removal.
  • the proposed invention suggests reusing certain portions of the wasted material drained into developer waste container 14.
  • the material from developer waste container 14 will be made to flow back into developer section tank 10 via reused developer pipe system 21, while maintaining developer liquid level 12 in developer section tank 10.
  • conductivity level of the material in developer section tank 10 will be read, using conductivity level probe 11.
  • the reuse of developer material from developer waste container 14 will continue for each consecutive plate development cycle, till the point where the conductivity level reaches the i conductivity level break even point 31 , as it is illustrated in Figure 3.
  • the proposed invention is based on the fact that the conductivity level is degraded over time and/or usage, but the developer material can be still reused multiple times.
  • FIG 3 shows conductivity level behavior function 32, whereas conductivity level degrades over time and usage, till it reaches the conductivity level break even point 31.
  • the developer in the waste container 14 can not be reused anymore for plate development.
  • the material in developer waste container 14 should be safely removed and destroyed.
  • This invention enables to prolong the usage of the developer material in the system, thus reducing the total amount and cost of developer liquid required per plate development. In addition it also reduces the total amount of developer waste material and number of waste container removal events, which results favorably in respect to environmental friendliness and reducing waste removal cost.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Environmental & Geological Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Wet Developing In Electrophotography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
PCT/US2010/000230 2009-02-16 2010-01-28 Developer waste reuse Ceased WO2010093415A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201080007777.0A CN102317869B (zh) 2009-02-16 2010-01-28 显影剂废液再利用
JP2011550120A JP2012518274A (ja) 2009-02-16 2010-01-28 使用済現像液再利用
EP10709085A EP2396702A1 (en) 2009-02-16 2010-01-28 Developer waste reuse

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/371,667 US7854558B2 (en) 2009-02-16 2009-02-16 Developer waste reuse
US12/371,667 2009-02-16

Publications (1)

Publication Number Publication Date
WO2010093415A1 true WO2010093415A1 (en) 2010-08-19

Family

ID=42123142

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2010/000230 Ceased WO2010093415A1 (en) 2009-02-16 2010-01-28 Developer waste reuse

Country Status (5)

Country Link
US (1) US7854558B2 (enExample)
EP (1) EP2396702A1 (enExample)
JP (1) JP2012518274A (enExample)
CN (1) CN102317869B (enExample)
WO (1) WO2010093415A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7963708B1 (en) * 2009-12-08 2011-06-21 Eastman Kodak Company Minimize carbonization of developer liquid
CN107479342B (zh) * 2017-09-23 2020-11-06 武汉华星光电技术有限公司 一种显影装置及显影方法
CN108803258B (zh) * 2018-05-31 2021-04-27 深圳市华星光电半导体显示技术有限公司 显影控制系统及显影控制方法
CN109445255A (zh) * 2018-11-22 2019-03-08 武汉华星光电半导体显示技术有限公司 显影装置及其清洗方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0346871A2 (en) 1988-06-15 1989-12-20 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate automatic developing apparatus
US4969002A (en) 1988-05-09 1990-11-06 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate processing apparatus
EP0415392A2 (en) 1989-08-31 1991-03-06 Fuji Photo Film Co., Ltd. Light-sensitive material processing apparatus
US5930547A (en) 1992-02-17 1999-07-27 Agfa-Gevaert Ag Process and apparatus for developing radiation-sensitive, exposed printing forms

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5315296B2 (enExample) * 1974-02-21 1978-05-24
JPH07140671A (ja) * 1993-06-29 1995-06-02 Dainippon Screen Mfg Co Ltd 基板現像装置
JP3441035B2 (ja) * 1996-05-20 2003-08-25 ノーリツ鋼機株式会社 写真現像処理装置
JP2000147785A (ja) * 1998-11-12 2000-05-26 Tokyo Ohka Kogyo Co Ltd 現像装置
JP2000338684A (ja) * 1999-05-26 2000-12-08 Nagase & Co Ltd 基板表面処理装置
US6364544B1 (en) * 2000-01-31 2002-04-02 Fuji Photo Film Co., Ltd Automatic developing apparatus and method of replenishing replenisher for developer for said apparatuses
JP3686822B2 (ja) * 2000-05-19 2005-08-24 東京エレクトロン株式会社 現像処理装置および現像処理方法
US6752545B2 (en) * 2001-08-16 2004-06-22 Nagase & Co., Ltd. Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment
JP4026376B2 (ja) * 2002-02-27 2007-12-26 三菱化学エンジニアリング株式会社 現像液の供給装置
JP3894104B2 (ja) * 2002-11-15 2007-03-14 東京エレクトロン株式会社 現像方法及び現像装置及び現像液再生装置
JP2004219452A (ja) * 2003-01-09 2004-08-05 Fuji Photo Film Co Ltd 感光性平版印刷版用自動現像装置の現像補充方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969002A (en) 1988-05-09 1990-11-06 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate processing apparatus
EP0346871A2 (en) 1988-06-15 1989-12-20 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate automatic developing apparatus
EP0415392A2 (en) 1989-08-31 1991-03-06 Fuji Photo Film Co., Ltd. Light-sensitive material processing apparatus
US5930547A (en) 1992-02-17 1999-07-27 Agfa-Gevaert Ag Process and apparatus for developing radiation-sensitive, exposed printing forms

Also Published As

Publication number Publication date
CN102317869B (zh) 2014-04-16
US7854558B2 (en) 2010-12-21
US20100209098A1 (en) 2010-08-19
EP2396702A1 (en) 2011-12-21
CN102317869A (zh) 2012-01-11
JP2012518274A (ja) 2012-08-09

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