JP2012518274A5 - - Google Patents
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- Publication number
- JP2012518274A5 JP2012518274A5 JP2011550120A JP2011550120A JP2012518274A5 JP 2012518274 A5 JP2012518274 A5 JP 2012518274A5 JP 2011550120 A JP2011550120 A JP 2011550120A JP 2011550120 A JP2011550120 A JP 2011550120A JP 2012518274 A5 JP2012518274 A5 JP 2012518274A5
- Authority
- JP
- Japan
- Prior art keywords
- developer
- tank
- conductivity
- container
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000523 sample Substances 0.000 claims 3
- 238000000034 method Methods 0.000 claims 2
- 238000004064 recycling Methods 0.000 claims 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/371,667 US7854558B2 (en) | 2009-02-16 | 2009-02-16 | Developer waste reuse |
| US12/371,667 | 2009-02-16 | ||
| PCT/US2010/000230 WO2010093415A1 (en) | 2009-02-16 | 2010-01-28 | Developer waste reuse |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012518274A JP2012518274A (ja) | 2012-08-09 |
| JP2012518274A5 true JP2012518274A5 (enExample) | 2013-03-07 |
Family
ID=42123142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011550120A Pending JP2012518274A (ja) | 2009-02-16 | 2010-01-28 | 使用済現像液再利用 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7854558B2 (enExample) |
| EP (1) | EP2396702A1 (enExample) |
| JP (1) | JP2012518274A (enExample) |
| CN (1) | CN102317869B (enExample) |
| WO (1) | WO2010093415A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7963708B1 (en) * | 2009-12-08 | 2011-06-21 | Eastman Kodak Company | Minimize carbonization of developer liquid |
| CN107479342B (zh) * | 2017-09-23 | 2020-11-06 | 武汉华星光电技术有限公司 | 一种显影装置及显影方法 |
| CN108803258B (zh) * | 2018-05-31 | 2021-04-27 | 深圳市华星光电半导体显示技术有限公司 | 显影控制系统及显影控制方法 |
| CN109445255A (zh) * | 2018-11-22 | 2019-03-08 | 武汉华星光电半导体显示技术有限公司 | 显影装置及其清洗方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5315296B2 (enExample) * | 1974-02-21 | 1978-05-24 | ||
| US4969002A (en) | 1988-05-09 | 1990-11-06 | Fuji Photo Film Co., Ltd. | Photo-sensitive printing plate processing apparatus |
| DE68918338T2 (de) | 1988-06-15 | 1995-01-19 | Fuji Photo Film Co Ltd | Automatisches Entwicklungsgerät für lichtempfindliche Platten. |
| US5136322A (en) | 1989-08-31 | 1992-08-04 | Fuji Photo Film Co., Ltd. | Light-sensitive material processing apparatus |
| DE4204691A1 (de) | 1992-02-17 | 1993-09-02 | Hoechst Ag | Verfahren und vorrichtung zum entwickeln von strahlungsempfindlichen, belichteten druckformen |
| JPH07140671A (ja) * | 1993-06-29 | 1995-06-02 | Dainippon Screen Mfg Co Ltd | 基板現像装置 |
| JP3441035B2 (ja) * | 1996-05-20 | 2003-08-25 | ノーリツ鋼機株式会社 | 写真現像処理装置 |
| JP2000147785A (ja) * | 1998-11-12 | 2000-05-26 | Tokyo Ohka Kogyo Co Ltd | 現像装置 |
| JP2000338684A (ja) * | 1999-05-26 | 2000-12-08 | Nagase & Co Ltd | 基板表面処理装置 |
| US6364544B1 (en) * | 2000-01-31 | 2002-04-02 | Fuji Photo Film Co., Ltd | Automatic developing apparatus and method of replenishing replenisher for developer for said apparatuses |
| JP3686822B2 (ja) * | 2000-05-19 | 2005-08-24 | 東京エレクトロン株式会社 | 現像処理装置および現像処理方法 |
| US6752545B2 (en) * | 2001-08-16 | 2004-06-22 | Nagase & Co., Ltd. | Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment |
| JP4026376B2 (ja) * | 2002-02-27 | 2007-12-26 | 三菱化学エンジニアリング株式会社 | 現像液の供給装置 |
| JP3894104B2 (ja) * | 2002-11-15 | 2007-03-14 | 東京エレクトロン株式会社 | 現像方法及び現像装置及び現像液再生装置 |
| JP2004219452A (ja) * | 2003-01-09 | 2004-08-05 | Fuji Photo Film Co Ltd | 感光性平版印刷版用自動現像装置の現像補充方法 |
-
2009
- 2009-02-16 US US12/371,667 patent/US7854558B2/en not_active Expired - Fee Related
-
2010
- 2010-01-28 CN CN201080007777.0A patent/CN102317869B/zh not_active Expired - Fee Related
- 2010-01-28 WO PCT/US2010/000230 patent/WO2010093415A1/en not_active Ceased
- 2010-01-28 EP EP10709085A patent/EP2396702A1/en not_active Withdrawn
- 2010-01-28 JP JP2011550120A patent/JP2012518274A/ja active Pending
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