CN102317869B - 显影剂废液再利用 - Google Patents

显影剂废液再利用 Download PDF

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Publication number
CN102317869B
CN102317869B CN201080007777.0A CN201080007777A CN102317869B CN 102317869 B CN102317869 B CN 102317869B CN 201080007777 A CN201080007777 A CN 201080007777A CN 102317869 B CN102317869 B CN 102317869B
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CN
China
Prior art keywords
developer
developer liquid
waste
tank
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201080007777.0A
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English (en)
Chinese (zh)
Other versions
CN102317869A (zh
Inventor
K·沙米尔
M·马罗姆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of CN102317869A publication Critical patent/CN102317869A/zh
Application granted granted Critical
Publication of CN102317869B publication Critical patent/CN102317869B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Environmental & Geological Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Wet Developing In Electrophotography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201080007777.0A 2009-02-16 2010-01-28 显影剂废液再利用 Expired - Fee Related CN102317869B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/371,667 US7854558B2 (en) 2009-02-16 2009-02-16 Developer waste reuse
US12/371,667 2009-02-16
PCT/US2010/000230 WO2010093415A1 (en) 2009-02-16 2010-01-28 Developer waste reuse

Publications (2)

Publication Number Publication Date
CN102317869A CN102317869A (zh) 2012-01-11
CN102317869B true CN102317869B (zh) 2014-04-16

Family

ID=42123142

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080007777.0A Expired - Fee Related CN102317869B (zh) 2009-02-16 2010-01-28 显影剂废液再利用

Country Status (5)

Country Link
US (1) US7854558B2 (enExample)
EP (1) EP2396702A1 (enExample)
JP (1) JP2012518274A (enExample)
CN (1) CN102317869B (enExample)
WO (1) WO2010093415A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7963708B1 (en) * 2009-12-08 2011-06-21 Eastman Kodak Company Minimize carbonization of developer liquid
CN107479342B (zh) * 2017-09-23 2020-11-06 武汉华星光电技术有限公司 一种显影装置及显影方法
CN108803258B (zh) * 2018-05-31 2021-04-27 深圳市华星光电半导体显示技术有限公司 显影控制系统及显影控制方法
CN109445255A (zh) * 2018-11-22 2019-03-08 武汉华星光电半导体显示技术有限公司 显影装置及其清洗方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0346871A2 (en) * 1988-06-15 1989-12-20 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate automatic developing apparatus
US4969002A (en) * 1988-05-09 1990-11-06 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate processing apparatus
EP0415392A2 (en) * 1989-08-31 1991-03-06 Fuji Photo Film Co., Ltd. Light-sensitive material processing apparatus
US5930547A (en) * 1992-02-17 1999-07-27 Agfa-Gevaert Ag Process and apparatus for developing radiation-sensitive, exposed printing forms
CN1312490A (zh) * 2000-01-31 2001-09-12 富士胶片株式会社 自动显影装置及补充显影补充液的方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5315296B2 (enExample) * 1974-02-21 1978-05-24
JPH07140671A (ja) * 1993-06-29 1995-06-02 Dainippon Screen Mfg Co Ltd 基板現像装置
JP3441035B2 (ja) * 1996-05-20 2003-08-25 ノーリツ鋼機株式会社 写真現像処理装置
JP2000147785A (ja) * 1998-11-12 2000-05-26 Tokyo Ohka Kogyo Co Ltd 現像装置
JP2000338684A (ja) * 1999-05-26 2000-12-08 Nagase & Co Ltd 基板表面処理装置
JP3686822B2 (ja) * 2000-05-19 2005-08-24 東京エレクトロン株式会社 現像処理装置および現像処理方法
US6752545B2 (en) * 2001-08-16 2004-06-22 Nagase & Co., Ltd. Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment
JP4026376B2 (ja) * 2002-02-27 2007-12-26 三菱化学エンジニアリング株式会社 現像液の供給装置
JP3894104B2 (ja) * 2002-11-15 2007-03-14 東京エレクトロン株式会社 現像方法及び現像装置及び現像液再生装置
JP2004219452A (ja) * 2003-01-09 2004-08-05 Fuji Photo Film Co Ltd 感光性平版印刷版用自動現像装置の現像補充方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969002A (en) * 1988-05-09 1990-11-06 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate processing apparatus
EP0346871A2 (en) * 1988-06-15 1989-12-20 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate automatic developing apparatus
EP0415392A2 (en) * 1989-08-31 1991-03-06 Fuji Photo Film Co., Ltd. Light-sensitive material processing apparatus
US5930547A (en) * 1992-02-17 1999-07-27 Agfa-Gevaert Ag Process and apparatus for developing radiation-sensitive, exposed printing forms
CN1312490A (zh) * 2000-01-31 2001-09-12 富士胶片株式会社 自动显影装置及补充显影补充液的方法

Also Published As

Publication number Publication date
US7854558B2 (en) 2010-12-21
US20100209098A1 (en) 2010-08-19
EP2396702A1 (en) 2011-12-21
CN102317869A (zh) 2012-01-11
WO2010093415A1 (en) 2010-08-19
JP2012518274A (ja) 2012-08-09

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Granted publication date: 20140416

Termination date: 20150128

EXPY Termination of patent right or utility model