JP2012518274A - 使用済現像液再利用 - Google Patents

使用済現像液再利用 Download PDF

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Publication number
JP2012518274A
JP2012518274A JP2011550120A JP2011550120A JP2012518274A JP 2012518274 A JP2012518274 A JP 2012518274A JP 2011550120 A JP2011550120 A JP 2011550120A JP 2011550120 A JP2011550120 A JP 2011550120A JP 2012518274 A JP2012518274 A JP 2012518274A
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JP
Japan
Prior art keywords
developer
tank
conductivity
container
plate processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011550120A
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English (en)
Japanese (ja)
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JP2012518274A5 (enExample
Inventor
カルマン シャミア
モシェ マロム
Original Assignee
イーストマン コダック カンパニー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by イーストマン コダック カンパニー filed Critical イーストマン コダック カンパニー
Publication of JP2012518274A publication Critical patent/JP2012518274A/ja
Publication of JP2012518274A5 publication Critical patent/JP2012518274A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Environmental & Geological Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Wet Developing In Electrophotography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011550120A 2009-02-16 2010-01-28 使用済現像液再利用 Pending JP2012518274A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/371,667 US7854558B2 (en) 2009-02-16 2009-02-16 Developer waste reuse
US12/371,667 2009-02-16
PCT/US2010/000230 WO2010093415A1 (en) 2009-02-16 2010-01-28 Developer waste reuse

Publications (2)

Publication Number Publication Date
JP2012518274A true JP2012518274A (ja) 2012-08-09
JP2012518274A5 JP2012518274A5 (enExample) 2013-03-07

Family

ID=42123142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011550120A Pending JP2012518274A (ja) 2009-02-16 2010-01-28 使用済現像液再利用

Country Status (5)

Country Link
US (1) US7854558B2 (enExample)
EP (1) EP2396702A1 (enExample)
JP (1) JP2012518274A (enExample)
CN (1) CN102317869B (enExample)
WO (1) WO2010093415A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7963708B1 (en) * 2009-12-08 2011-06-21 Eastman Kodak Company Minimize carbonization of developer liquid
CN107479342B (zh) * 2017-09-23 2020-11-06 武汉华星光电技术有限公司 一种显影装置及显影方法
CN108803258B (zh) * 2018-05-31 2021-04-27 深圳市华星光电半导体显示技术有限公司 显影控制系统及显影控制方法
CN109445255A (zh) * 2018-11-22 2019-03-08 武汉华星光电半导体显示技术有限公司 显影装置及其清洗方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07140671A (ja) * 1993-06-29 1995-06-02 Dainippon Screen Mfg Co Ltd 基板現像装置
JP2000147785A (ja) * 1998-11-12 2000-05-26 Tokyo Ohka Kogyo Co Ltd 現像装置
JP2001332469A (ja) * 2000-05-19 2001-11-30 Tokyo Electron Ltd 現像処理装置および現像処理方法
JP2003248326A (ja) * 2002-02-27 2003-09-05 Mitsubishi Chemical Engineering Corp 現像液の供給装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5315296B2 (enExample) * 1974-02-21 1978-05-24
US4969002A (en) 1988-05-09 1990-11-06 Fuji Photo Film Co., Ltd. Photo-sensitive printing plate processing apparatus
DE68918338T2 (de) 1988-06-15 1995-01-19 Fuji Photo Film Co Ltd Automatisches Entwicklungsgerät für lichtempfindliche Platten.
US5136322A (en) 1989-08-31 1992-08-04 Fuji Photo Film Co., Ltd. Light-sensitive material processing apparatus
DE4204691A1 (de) 1992-02-17 1993-09-02 Hoechst Ag Verfahren und vorrichtung zum entwickeln von strahlungsempfindlichen, belichteten druckformen
JP3441035B2 (ja) * 1996-05-20 2003-08-25 ノーリツ鋼機株式会社 写真現像処理装置
JP2000338684A (ja) * 1999-05-26 2000-12-08 Nagase & Co Ltd 基板表面処理装置
US6364544B1 (en) * 2000-01-31 2002-04-02 Fuji Photo Film Co., Ltd Automatic developing apparatus and method of replenishing replenisher for developer for said apparatuses
US6752545B2 (en) * 2001-08-16 2004-06-22 Nagase & Co., Ltd. Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment
JP3894104B2 (ja) * 2002-11-15 2007-03-14 東京エレクトロン株式会社 現像方法及び現像装置及び現像液再生装置
JP2004219452A (ja) * 2003-01-09 2004-08-05 Fuji Photo Film Co Ltd 感光性平版印刷版用自動現像装置の現像補充方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07140671A (ja) * 1993-06-29 1995-06-02 Dainippon Screen Mfg Co Ltd 基板現像装置
JP2000147785A (ja) * 1998-11-12 2000-05-26 Tokyo Ohka Kogyo Co Ltd 現像装置
JP2001332469A (ja) * 2000-05-19 2001-11-30 Tokyo Electron Ltd 現像処理装置および現像処理方法
JP2003248326A (ja) * 2002-02-27 2003-09-05 Mitsubishi Chemical Engineering Corp 現像液の供給装置

Also Published As

Publication number Publication date
CN102317869B (zh) 2014-04-16
US7854558B2 (en) 2010-12-21
US20100209098A1 (en) 2010-08-19
EP2396702A1 (en) 2011-12-21
CN102317869A (zh) 2012-01-11
WO2010093415A1 (en) 2010-08-19

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