JP2012137348A5 - - Google Patents

Download PDF

Info

Publication number
JP2012137348A5
JP2012137348A5 JP2010289105A JP2010289105A JP2012137348A5 JP 2012137348 A5 JP2012137348 A5 JP 2012137348A5 JP 2010289105 A JP2010289105 A JP 2010289105A JP 2010289105 A JP2010289105 A JP 2010289105A JP 2012137348 A5 JP2012137348 A5 JP 2012137348A5
Authority
JP
Japan
Prior art keywords
trademark
mppc
hamamatsu photonics
registered trademark
detecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010289105A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012137348A (ja
JP5637841B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2010289105A priority Critical patent/JP5637841B2/ja
Priority claimed from JP2010289105A external-priority patent/JP5637841B2/ja
Priority to KR1020137016614A priority patent/KR101496603B1/ko
Priority to PCT/JP2011/006129 priority patent/WO2012090371A1/ja
Priority to US13/997,496 priority patent/US9602780B2/en
Publication of JP2012137348A publication Critical patent/JP2012137348A/ja
Publication of JP2012137348A5 publication Critical patent/JP2012137348A5/ja
Application granted granted Critical
Publication of JP5637841B2 publication Critical patent/JP5637841B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010289105A 2010-12-27 2010-12-27 検査装置 Expired - Fee Related JP5637841B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010289105A JP5637841B2 (ja) 2010-12-27 2010-12-27 検査装置
KR1020137016614A KR101496603B1 (ko) 2010-12-27 2011-11-02 검사 장치
PCT/JP2011/006129 WO2012090371A1 (ja) 2010-12-27 2011-11-02 検査装置
US13/997,496 US9602780B2 (en) 2010-12-27 2011-11-02 Apparatus for inspecting defect with time/spatial division optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010289105A JP5637841B2 (ja) 2010-12-27 2010-12-27 検査装置

Publications (3)

Publication Number Publication Date
JP2012137348A JP2012137348A (ja) 2012-07-19
JP2012137348A5 true JP2012137348A5 (enExample) 2013-12-26
JP5637841B2 JP5637841B2 (ja) 2014-12-10

Family

ID=46382516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010289105A Expired - Fee Related JP5637841B2 (ja) 2010-12-27 2010-12-27 検査装置

Country Status (4)

Country Link
US (1) US9602780B2 (enExample)
JP (1) JP5637841B2 (enExample)
KR (1) KR101496603B1 (enExample)
WO (1) WO2012090371A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9068917B1 (en) * 2006-03-14 2015-06-30 Kla-Tencor Technologies Corp. Systems and methods for inspection of a specimen
JP5331771B2 (ja) * 2010-09-27 2013-10-30 株式会社日立ハイテクノロジーズ 検査装置
US9121702B2 (en) * 2010-11-09 2015-09-01 Panasonic Corporation Distance measurement apparatus and distance measurement method
EP2993682A1 (en) * 2014-09-04 2016-03-09 Fei Company Method of performing spectroscopy in a transmission charged-particle microscope
US11169075B2 (en) 2014-12-10 2021-11-09 Cytek Biosciences, Inc. Self-triggered flow cytometer
US9784689B2 (en) * 2015-07-10 2017-10-10 Applied Materials Israel Ltd. Method and system for inspecting an object with an array of beams
TWI585394B (zh) * 2015-12-09 2017-06-01 由田新技股份有限公司 動態式自動追焦系統
JP6549061B2 (ja) * 2016-05-09 2019-07-24 富士フイルム株式会社 撮影装置および方法並びに撮影装置制御プログラム
JP2018155600A (ja) * 2017-03-17 2018-10-04 東レエンジニアリング株式会社 外観検査装置
US12345661B2 (en) * 2019-08-14 2025-07-01 Hitachi High-Tech Corporation Defect inspection apparatus and defect inspection method
CN110874837B (zh) * 2019-10-31 2023-07-25 中导光电设备股份有限公司 一种基于局部特征分布的缺陷自动检测方法
KR102719272B1 (ko) * 2021-05-12 2024-10-18 (주)하이비젼시스템 위치 선택형 가변 광원 제어 시스템 및 방법
KR20230024468A (ko) 2021-08-11 2023-02-21 삼성전자주식회사 레이저 어닐링 장치 및 그것의 동작 방법
JP2023092933A (ja) * 2021-12-22 2023-07-04 株式会社ヴィーネックス 検査装置及び検査方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3142991B2 (ja) * 1993-06-04 2001-03-07 三井金属鉱業株式会社 レーザ走査装置および画像形成方法
JPH07243988A (ja) * 1994-03-04 1995-09-19 Toshiba Corp 表面検査装置
JP3490792B2 (ja) * 1995-03-27 2004-01-26 富士写真フイルム株式会社 表面検査装置
JP3411780B2 (ja) * 1997-04-07 2003-06-03 レーザーテック株式会社 レーザ顕微鏡及びこのレーザ顕微鏡を用いたパターン検査装置
US6248988B1 (en) 1998-05-05 2001-06-19 Kla-Tencor Corporation Conventional and confocal multi-spot scanning optical microscope
JP3453128B2 (ja) * 2001-06-21 2003-10-06 レーザーテック株式会社 光学式走査装置及び欠陥検出装置
US7088443B2 (en) 2002-02-11 2006-08-08 Kla-Tencor Technologies Corporation System for detecting anomalies and/or features of a surface
US6809808B2 (en) 2002-03-22 2004-10-26 Applied Materials, Inc. Wafer defect detection system with traveling lens multi-beam scanner
US6724473B2 (en) 2002-03-27 2004-04-20 Kla-Tencor Technologies Corporation Method and system using exposure control to inspect a surface
JP2005283190A (ja) * 2004-03-29 2005-10-13 Hitachi High-Technologies Corp 異物検査方法及びその装置
JP2005300581A (ja) * 2004-04-06 2005-10-27 Sony Corp マスク検査装置
JP4164470B2 (ja) * 2004-05-18 2008-10-15 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP2006078421A (ja) 2004-09-13 2006-03-23 Olympus Corp パターン欠陥検出装置及びその方法
JP4500641B2 (ja) * 2004-09-29 2010-07-14 株式会社日立ハイテクノロジーズ 欠陥検査方法およびその装置
JP2006162500A (ja) * 2004-12-09 2006-06-22 Hitachi High-Technologies Corp 欠陥検査装置
JP5349742B2 (ja) * 2006-07-07 2013-11-20 株式会社日立ハイテクノロジーズ 表面検査方法及び表面検査装置
JP4875936B2 (ja) * 2006-07-07 2012-02-15 株式会社日立ハイテクノロジーズ 異物・欠陥検出方法および異物・欠陥検査装置
JP5279992B2 (ja) * 2006-07-13 2013-09-04 株式会社日立ハイテクノロジーズ 表面検査方法及び装置
JP4857174B2 (ja) * 2007-04-25 2012-01-18 株式会社日立ハイテクノロジーズ 欠陥検査方法及び欠陥検査装置
JP5466377B2 (ja) * 2008-05-16 2014-04-09 株式会社日立ハイテクノロジーズ 欠陥検査装置
JP5572293B2 (ja) * 2008-07-07 2014-08-13 株式会社日立ハイテクノロジーズ 欠陥検査方法及び欠陥検査装置
JP2010236966A (ja) * 2009-03-31 2010-10-21 Hitachi High-Technologies Corp 欠陥検査装置およびその方法
JP2012137350A (ja) * 2010-12-27 2012-07-19 Hitachi High-Technologies Corp 欠陥検査方法および欠陥検査装置

Similar Documents

Publication Publication Date Title
JP2012137348A5 (enExample)
HUE039895T2 (hu) Eljárás és berendezés DRX ciklusok és lapozó ciklusok közötti interakció menedzselésére
JP2011505522A5 (enExample)
JP2010527021A5 (enExample)
SMT201400017B (it) Agenti assorbenti per luce uv/visible per materiali per lenti oftalmiche
BRPI1011886A2 (pt) solução contendo ácido hiplocloroso e métodos do uso do mesmo.
JP2011508438A5 (enExample)
NO20085322L (no) Fremgangsmate for raskere ansiktsdeteksjon
JP2012098988A5 (enExample)
JP2012513124A5 (enExample)
IL206241A0 (en) Modified nanowires for use in detecting nitro - containing chemicals
EP2293840A4 (en) VACUUM WOUND THERAPY DEVICE
EP2306194A4 (en) DEVELOPMENT SOLUTION FOR THE IMMUNCHROMATOGRAPHY AND MEASURING PROCESS THEREFOR
EP2394432A4 (en) PROCESS AND DEVICES FOR MOTION COMPENSATION WITH SMOOTH REFERENCE IMAGE IN BITTIEFENSKALIERBARKEIT
NO20081956L (no) Reel med dreibar spoleanordning og utskiftbar trommel, fremgangsmåte ved bruk av samme.
EP2621110A4 (en) REFERENCE SIGNAL GENERATING DEVICE AND PREAMBLE SEQUENCE DETECTION DEVICE THEREFOR
EP2631949A3 (en) Display apparatus and display method
JP2011154573A5 (enExample)
DE602006009761D1 (de) Vorrichtung zum Sammeln von Energie
NL2003192A1 (nl) Alignment of collector device in lithographic apparatus.
FR2928034B1 (fr) Capteur matriciel pour tube amplificateur de lumiere
JP2010161740A5 (enExample)
FI20090251A0 (fi) Menetelmä kalkopyriittirikasteen liuottamiseksi
EP2077586A4 (en) CONCENTRATING PHOTOVOLATAIC DEVICE
JP2011173937A5 (enExample)