JP2010097768A5 - - Google Patents

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Publication number
JP2010097768A5
JP2010097768A5 JP2008266475A JP2008266475A JP2010097768A5 JP 2010097768 A5 JP2010097768 A5 JP 2010097768A5 JP 2008266475 A JP2008266475 A JP 2008266475A JP 2008266475 A JP2008266475 A JP 2008266475A JP 2010097768 A5 JP2010097768 A5 JP 2010097768A5
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JP
Japan
Prior art keywords
dimension
measure
optical system
observation apparatus
measuring optical
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Application number
JP2008266475A
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English (en)
Japanese (ja)
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JP2010097768A (ja
JP5325522B2 (ja
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Application filed filed Critical
Priority to JP2008266475A priority Critical patent/JP5325522B2/ja
Priority claimed from JP2008266475A external-priority patent/JP5325522B2/ja
Priority to US12/588,387 priority patent/US8351115B2/en
Publication of JP2010097768A publication Critical patent/JP2010097768A/ja
Publication of JP2010097768A5 publication Critical patent/JP2010097768A5/ja
Application granted granted Critical
Publication of JP5325522B2 publication Critical patent/JP5325522B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008266475A 2008-10-15 2008-10-15 複合型観察装置 Expired - Fee Related JP5325522B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008266475A JP5325522B2 (ja) 2008-10-15 2008-10-15 複合型観察装置
US12/588,387 US8351115B2 (en) 2008-10-15 2009-10-14 Complex type microscopic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008266475A JP5325522B2 (ja) 2008-10-15 2008-10-15 複合型観察装置

Publications (3)

Publication Number Publication Date
JP2010097768A JP2010097768A (ja) 2010-04-30
JP2010097768A5 true JP2010097768A5 (enExample) 2011-11-24
JP5325522B2 JP5325522B2 (ja) 2013-10-23

Family

ID=42098606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008266475A Expired - Fee Related JP5325522B2 (ja) 2008-10-15 2008-10-15 複合型観察装置

Country Status (2)

Country Link
US (1) US8351115B2 (enExample)
JP (1) JP5325522B2 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5303781B2 (ja) * 2008-12-26 2013-10-02 株式会社堀場製作所 電子顕微鏡装置
JP5492409B2 (ja) * 2008-12-26 2014-05-14 株式会社堀場製作所 電子顕微鏡装置
JP5047318B2 (ja) * 2010-03-05 2012-10-10 株式会社日立ハイテクノロジーズ 電子顕微鏡画像と光学画像を重ねて表示する方法
JP5459399B2 (ja) * 2010-06-03 2014-04-02 株式会社ニコン 顕微鏡装置
JP5770434B2 (ja) * 2010-06-24 2015-08-26 株式会社堀場製作所 電子顕微鏡装置
JP5690086B2 (ja) * 2010-07-02 2015-03-25 株式会社キーエンス 拡大観察装置
JP5564346B2 (ja) * 2010-07-08 2014-07-30 株式会社キーエンス 拡大観察装置
EP2450936B1 (en) 2010-11-03 2013-03-13 Carl Zeiss NTS Ltd. Microscope system, method for operating a charged-particle microscope
US10048480B2 (en) * 2011-01-07 2018-08-14 Zeta Instruments, Inc. 3D microscope including insertable components to provide multiple imaging and measurement capabilities
JP6455829B2 (ja) * 2013-04-01 2019-01-23 キヤノン株式会社 画像処理装置、画像処理方法、およびプログラム
JP6177817B2 (ja) 2015-01-30 2017-08-09 松定プレシジョン株式会社 荷電粒子線装置及び走査電子顕微鏡
EP3385977B1 (en) * 2015-12-03 2021-07-28 Matsusada Precision, Inc. Charged particle beam device and scanning electron microscope
JP6333871B2 (ja) * 2016-02-25 2018-05-30 ファナック株式会社 入力画像から検出した対象物を表示する画像処理装置
CN120107078A (zh) * 2018-07-13 2025-06-06 Asml荷兰有限公司 Sem图像增强方法和系统
JP7065731B2 (ja) * 2018-08-30 2022-05-12 株式会社キーエンス 拡大観察装置
CN113272820B (zh) 2018-12-31 2025-11-28 Asml荷兰有限公司 用于电子束图像增强的全自动sem采样系统
DE102019102438B3 (de) 2019-01-31 2020-07-09 Leica Mikrosysteme Gmbh Verfahren zur mikroskopischen Bilderzeugung und System hierfür sowie Verwendung
NL2024861B1 (en) * 2020-02-07 2021-09-13 Univ Delft Tech Method for recording and correlating light and charged particle microscopy images
US11355307B1 (en) * 2020-12-08 2022-06-07 Fei Company 3D mapping of samples in charged particle microscopy
JP7635103B2 (ja) * 2021-09-06 2025-02-25 株式会社日立ハイテク 電子線応用装置及び検査方法
JP7581536B2 (ja) 2021-09-30 2024-11-12 株式会社日立ハイテク 解析システム
US20250046569A1 (en) * 2022-01-28 2025-02-06 Hitachi High-Tech Corporation Inspection device and film quality inspection method
WO2023187876A1 (ja) * 2022-03-28 2023-10-05 株式会社日立ハイテク 荷電粒子線装置の調整方法及び荷電粒子線装置
WO2024232351A1 (ja) * 2023-05-09 2024-11-14 国立大学法人大阪大学 共焦点イメージング装置、及び共焦点イメージング方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6196644A (ja) * 1984-10-17 1986-05-15 Hitachi Ltd 外観検査装置
JPH0393140A (ja) * 1989-09-05 1991-04-18 Jeol Ltd 走査電子顕微鏡像と光学顕微鏡像の対応装置
JPH06308039A (ja) 1993-04-22 1994-11-04 Matsushita Electric Ind Co Ltd 異物分析装置
JPH08273578A (ja) * 1995-03-30 1996-10-18 Topcon Corp 走査型電子顕微鏡装置
JP3293739B2 (ja) * 1996-06-13 2002-06-17 株式会社日立製作所 走査電子顕微鏡
JP2001027730A (ja) * 1999-05-13 2001-01-30 Keyence Corp 共焦点顕微鏡
JP3619132B2 (ja) * 2000-08-25 2005-02-09 株式会社日立製作所 電子顕微鏡
JP4004490B2 (ja) 2004-07-22 2007-11-07 株式会社トプコン 走査型電子顕微鏡装置
JP4936841B2 (ja) * 2006-09-28 2012-05-23 株式会社キーエンス 共焦点顕微鏡、共焦点顕微鏡操作方法、共焦点顕微鏡操作プログラム及びコンピュータで読み取り可能な記録媒体並びに記録した機器
JP4936867B2 (ja) * 2006-12-05 2012-05-23 株式会社キーエンス 拡大画像観察装置、拡大画像観察方法

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