WO2010013641A1 - Procédé de fabrication d'un élément électroluminescent organique, dispositif d'émission de lumière et dispositif d'affichage - Google Patents

Procédé de fabrication d'un élément électroluminescent organique, dispositif d'émission de lumière et dispositif d'affichage Download PDF

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WO2010013641A1
WO2010013641A1 PCT/JP2009/063214 JP2009063214W WO2010013641A1 WO 2010013641 A1 WO2010013641 A1 WO 2010013641A1 JP 2009063214 W JP2009063214 W JP 2009063214W WO 2010013641 A1 WO2010013641 A1 WO 2010013641A1
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layer
substrate
organic
light emitting
derivatives
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PCT/JP2009/063214
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English (en)
Japanese (ja)
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行一 六原
智紀 松室
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住友化学株式会社
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Priority to CN2009801299183A priority Critical patent/CN102113412A/zh
Priority to US13/056,274 priority patent/US20110121282A1/en
Priority to EP09802884A priority patent/EP2320712A1/fr
Publication of WO2010013641A1 publication Critical patent/WO2010013641A1/fr

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/003—Printing processes to produce particular kinds of printed work, e.g. patterns on optical devices, e.g. lens elements; for the production of optical devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/26—Printing on other surfaces than ordinary paper
    • B41M1/30—Printing on other surfaces than ordinary paper on organic plastics, horn or similar materials

Definitions

  • the present invention relates to a method for manufacturing an organic electroluminescence element, a light emitting device, and a display device.
  • An organic electroluminescence element (hereinafter sometimes referred to as an organic EL element) includes a pair of electrodes and a light emitting layer (organic layer) disposed between the electrodes, and is injected from each of the pair of electrodes. Light is emitted by combining holes and electrons in the light emitting layer.
  • a display panel used in a display device has a large number of organic EL elements arranged in a matrix on a substrate. Each organic EL element functions as a part of the pixel.
  • the partition walls are usually arranged in a lattice pattern, and the organic layer of each organic EL element is formed in each pixel region defined by the partition walls.
  • the organic layer can be formed by a coating method using an ink containing the material of the organic layer and a solvent. Specifically, the organic layer is formed by first selectively supplying the ink to each pixel region, and further drying and removing the ink solvent. For example, the ink is selectively supplied to each pixel region by a relief printing method using a relief printing plate having projections patterned corresponding to the arrangement of each pixel region, and further dried to form an organic layer. A method is known (see, for example, Patent Document 1).
  • the ratio of the organic layer material in the ink is usually about 1% by weight, and most of the ink is composed of a solvent. Since the solvent is a component that is removed during drying after supplying the ink, when forming an organic layer using such ink, the ratio of the organic layer to the volume of the organic layer is required to form the organic layer with a predetermined thickness. Therefore, it is necessary to supply a large amount of ink into the partition wall, and it is usual that a larger amount of ink is supplied than the capacity in the partition wall. If it does so, the ink supplied in the predetermined partition may overflow from the partition, and may flow out into the adjacent partition.
  • a display panel for color display three types of ink each containing a material that emits each color of RGB are selectively supplied into a predetermined partition to form a light emitting layer of each color.
  • three types of ink each containing a material that emits each color of RGB are selectively supplied into a predetermined partition to form a light emitting layer of each color.
  • an object of the present invention is to provide a method for producing an organic EL element using a relief printing method capable of preventing color mixing that occurs when supplying ink, a light emitting device having a configuration that easily prevents color mixing, and a display including the light emitting device. Is to provide a device.
  • the present invention is a method for producing an organic electroluminescence device having a pair of electrodes and an organic layer located between the electrodes, Providing a substrate in which a plurality of partition walls are disposed substantially parallel to each other, and grooves are formed along a longitudinal direction of the partition walls on a surface facing the substrate side surface of the partition walls; Using a relief printing plate in which a plurality of convex portions are disposed substantially parallel to each other so as to correspond to the concave portions formed by the partition walls and the substrate, the ink containing the material of the organic layer is used. Forming the organic layer by supplying the recess; It is a manufacturing method of the organic electroluminescent element containing this.
  • the present invention is the method for producing an organic electroluminescence element, wherein the groove is formed through the partition wall.
  • the present invention is the apparatus for manufacturing an organic electroluminescent element, wherein the width of the groove portion in the thickness direction of the substrate and the direction perpendicular to the longitudinal direction is 5 ⁇ m to 30 ⁇ m.
  • the present invention is a method for producing an organic electroluminescence element, wherein the partition wall has a height of 0.1 ⁇ m or more.
  • the present invention also includes a substrate, A plurality of partition walls placed on the substrate in a substantially parallel relative relationship; A pair of electrodes provided on the substrate, and an organic electroluminescence element having an organic layer located between the electrodes, The organic layer is formed between the partition walls, In the light emitting device, a groove portion is formed along a longitudinal direction of the partition wall on a surface facing the substrate side surface of the partition wall.
  • the present invention is a display device including the light emitting device.
  • the groove portion is formed along the longitudinal direction of the partition wall on the surface facing the substrate side surface of the partition wall. Even if the ink supplied between the partition walls overflows from the partition wall, the overflowed ink flows into the groove formed in the partition wall, so that the ink can be prevented from flowing out between the adjacent partition walls. This can prevent color mixing.
  • the groove portion is formed along the longitudinal direction of the partition wall on the surface facing the substrate side of the partition wall, color mixing is prevented and the relief printing method is efficiently produced.
  • a light-emitting device that can be realized can be realized.
  • FIG. 1 is a plan view showing a substrate used in a display device according to an embodiment of the present invention.
  • FIG. 2 is a cross-sectional view of the substrate taken along the section line II-II in FIG.
  • FIG. 3 is a diagram schematically showing a step of forming a hole injection layer or a hole transport layer from a solution.
  • FIG. 1 is a plan view showing a substrate used in a light emitting device according to an embodiment of the present invention and a state in which several members are provided thereon.
  • FIG. 2 is a cross-sectional view of the substrate taken along the section line II-II in FIG.
  • the light-emitting device includes a substrate 2, a plurality of partition walls 3 disposed substantially parallel to each other on the substrate 2, a pair of electrodes provided on the substrate 2, and an organic layer positioned between the electrodes. And an organic electroluminescence element.
  • the organic layer is formed between the partition walls 4, and grooves 8 are formed along the longitudinal direction of the partition walls 3 on the surface 3 a of the partition walls 3 facing the surface on the substrate 2 side.
  • FIG.1 and FIG.2 the state before providing an organic layer is shown.
  • a passive matrix light-emitting device In the present embodiment, a plurality of electrodes 5 (one electrode of a pair of electrodes; hereinafter, abbreviated as electrode 5 if necessary) are provided on the substrate 2 in a substantially parallel and relative arrangement.
  • the longitudinal direction of the electrode 5 may be referred to as a row direction X
  • the thickness direction of the substrate 2 may be referred to as a thickness direction Z
  • the direction perpendicular to the row direction X and the thickness direction Z may be referred to as an array direction Y.
  • the electrodes 5 in the present embodiment are arranged at equal intervals in the row direction X, respectively.
  • the light emitting device of the present embodiment is further provided with an insulating film 6 that covers the substrate 2 and the electrode 5 from one side in the thickness direction Z.
  • an insulating film 6 that covers the substrate 2 and the electrode 5 from one side in the thickness direction Z.
  • a plurality of through holes 7 penetrating in the thickness direction Z are formed on each electrode 5.
  • Each through hole 7 is formed on each electrode 5 at a predetermined interval in the row direction X.
  • the plurality of partition walls 3 are arranged at a predetermined interval in the arrangement direction Y with the longitudinal direction coinciding with the longitudinal direction of the electrodes 5 (row direction X in the present embodiment), and are arranged on the surface of the insulating film 6.
  • each partition 3 is provided on a gap between adjacent electrodes 5 when viewed from one side in the thickness direction Z.
  • the partition walls 3 may be formed so as to fit within the gaps between the adjacent electrodes 5, or may be formed so as to extend beyond the gaps.
  • a groove portion 8 is formed along the longitudinal direction of the partition wall 3 (in the row direction X in the present embodiment) on the surface 3a of each partition wall 3 facing the surface on the substrate 2 side.
  • the groove 8 is preferably drilled through the partition wall 3.
  • a groove 8 that penetrates the partition wall 3 in the thickness direction Z is formed along the longitudinal direction of the partition wall 3.
  • the organic EL element formed on the substrate 2 includes one or a plurality of organic layers between a pair of electrodes, and has at least one light emitting layer as the organic layer. Further, an organic layer different from the light emitting layer may be provided between the pair of electrodes, or an inorganic layer may be provided.
  • the light emitting device has a plurality of other electrodes formed so that the longitudinal direction coincides with the arrangement direction Y. That is, the other electrode is provided perpendicular to the electrode 5 when viewed from one side in the thickness direction Z.
  • the other electrode is arranged at a predetermined interval in the row direction X so as to overlap the through hole 7 when viewed from one side in the thickness direction Z.
  • each portion where the electrode 5 and the other electrode intersect when viewed from one side in the thickness direction Z functions as one organic EL element.
  • the organic EL element includes a pair of electrodes (anode and cathode) and a light emitting layer provided between the electrodes.
  • a plurality of organic layers or inorganic layers different from the light emitting layer may be provided between the anode and the cathode, or a plurality of light emitting layers may be provided.
  • Examples of the layer provided between the cathode and the light emitting layer include an electron injection layer, an electron transport layer, a hole blocking layer, and the like.
  • the layer close to the cathode is called an electron injection layer
  • the layer close to the light emitting layer is called an electron transport layer.
  • the electron injection layer is a layer having a function of improving the electron injection efficiency from the cathode.
  • the electron transport layer is a layer having a function of improving electron injection from the cathode, the electron injection layer, or the electron transport layer closer to the cathode.
  • the hole blocking layer is a layer having a function of blocking hole transport. In the case where the electron injection layer and / or the electron transport layer have a function of blocking hole transport, these layers may also serve as the hole blocking layer.
  • Examples of the layer provided between the anode and the light emitting layer include a hole injection layer, a hole transport layer, and an electron block layer.
  • a layer close to the anode is referred to as a hole injection layer
  • a layer close to the light emitting layer is referred to as a hole transport layer.
  • the hole injection layer is a layer having a function of improving hole injection efficiency from the anode.
  • the hole transport layer is a layer having a function of improving hole injection from the anode, the hole injection layer, or the hole transport layer closer to the anode.
  • the electron blocking layer is a layer having a function of blocking electron transport. In the case where the hole injection layer and / or the hole transport layer has a function of blocking electron transport, these layers may also serve as an electron blocking layer.
  • the electron injection layer and the hole injection layer may be collectively referred to as a charge injection layer, and the electron transport layer and the hole transport layer may be collectively referred to as a charge transport layer.
  • the substrate is preferably not deformed in the step of forming the organic EL element, and for example, glass, plastic, polymer film, silicon substrate, and a laminate obtained by laminating these are used. Moreover, you may use the plastics and polymer film which performed the low water permeability process for a board
  • Each organic EL element may have a configuration in which an anode is disposed on the substrate side with respect to the substrate and a cathode is disposed on the side away from the substrate, and the cathode is disposed on the substrate side and separated from the substrate.
  • positioned the anode on the side may be sufficient. That is, in the present embodiment, an organic EL element having one electrode as an anode and the other electrode as a cathode may be configured, or an organic EL element having one electrode as a cathode and the other electrode as an anode. It may be configured.
  • Each organic EL element can take a bottom emission type element configuration in which light is extracted from the substrate side, or a top emission type element configuration in which light is extracted from the side opposite to the substrate.
  • each layer from the light emitting layer to one electrode is constituted by a transparent layer
  • each layer from the light emitting layer to the other electrode is constituted by a transparent layer. Is done.
  • anode When a transparent electrode is used for the anode, a metal oxide, metal sulfide or metal thin film with high electrical conductivity can be used, and a high transmittance is preferably used. Specifically, indium oxide, zinc oxide, tin oxide, indium tin oxide (abbreviated as ITO), indium zinc oxide (abbreviated as IZO), gold, platinum, silver, copper, and the like A thin film is used, and it is appropriately selected depending on the type of layer provided between the electrodes. Of these, ITO, IZO, and tin oxide are preferable as the anode.
  • an organic transparent conductive film such as polyaniline or a derivative thereof, polythiophene or a derivative thereof may be used as the anode.
  • a thin film made of a mixture containing at least one selected from the group consisting of a material used for the organic transparent conductive film, a metal oxide, a metal sulfide, a metal, and a carbon material such as a carbon nanotube is used for the anode. May be.
  • the anode in an organic EL element having a structure in which light is extracted from the cathode side, the anode may be formed using a material that reflects light, such as a metal or metal oxide having a work function of 3.0 eV or more. Metal sulfides are preferred.
  • the film thickness of the anode can be appropriately selected in consideration of light transmittance and electric conductivity, and is, for example, 5 nm to 10 ⁇ m, preferably 10 nm to 1 ⁇ m, and more preferably 20 nm to 500 nm.
  • hole injection layer As a material constituting the hole injection layer, a known material can be appropriately used, and there is no particular limitation. Examples of the material include phenylamine, starburst amine, phthalocyanine, hydrazone derivative, carbazole derivative, triazole derivative, imidazole derivative, oxadiazole derivative having amino group, vanadium oxide, tantalum oxide, tungsten oxide, Examples thereof include oxides such as molybdenum oxide, ruthenium oxide, and aluminum oxide, amorphous carbon, polyaniline, and polythiophene derivatives.
  • the thickness of the hole injection layer is appropriately set according to the design of the target organic EL element, and is preferably about 5 to 300 nm. If the thickness is less than 5 nm, the production tends to be difficult. On the other hand, if the thickness exceeds 300 nm, the driving voltage and the voltage applied to the hole injection layer tend to increase.
  • hole transport layer An example of the material constituting the hole transport layer is not particularly limited, but N, N′-diphenyl-N, N′-di (3-methylphenyl) 4,4′-diaminobiphenyl (TPD), 4 , 4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (NPB), etc., polyvinyl carbazole or derivatives thereof, polysilane or derivatives thereof, aromatic amines in the side chain or main chain Polysiloxane derivatives having pyrazole, pyrazoline derivatives, arylamine derivatives, stilbene derivatives, triphenyldiamine derivatives, polyaniline or derivatives thereof, polythiophene or derivatives thereof, polyarylamine or derivatives thereof, polypyrrole or derivatives thereof, poly (p-phenylene vinylene) Or its derivatives, or poly (2 , 5-thienylene vinylene) or a derivative thereof.
  • the hole transport material used for forming the hole transport layer polyvinyl carbazole or a derivative thereof, polysilane or a derivative thereof, a polysiloxane derivative having an aromatic amine compound group in a side chain or a main chain, polyaniline or a derivative thereof
  • polymer hole transport materials such as derivatives, polythiophene or derivatives thereof, polyarylamines or derivatives thereof, poly (p-phenylene vinylene) or derivatives thereof, or poly (2,5-thienylene vinylene) or derivatives thereof, More preferred are polyvinylcarbazole or derivatives thereof, polysilane or derivatives thereof, and polysiloxane derivatives having an aromatic amine in the side chain or main chain.
  • a low-molecular hole transport material it is preferably used by being dispersed in a polymer binder.
  • the thickness of the hole transport layer is not particularly limited, but is appropriately set according to the design of the target organic EL element, and is preferably about 1 to 1000 nm. If the thickness is less than the lower limit value, production tends to be difficult or the effect of hole transport is not sufficiently obtained. On the other hand, if the thickness exceeds the upper limit value, the driving voltage and the hole transport layer are increased. There is a tendency that the voltage applied to is increased. Accordingly, as described above, the thickness of the hole transport layer is about 1 to 1000 nm, preferably 2 nm to 500 nm, and more preferably 5 nm to 200 nm.
  • the light emitting layer usually contains an organic substance (a low molecular compound and a high molecular compound) that mainly emits fluorescence and / or phosphorescence, and may further contain a dopant material.
  • organic substance a low molecular compound and a high molecular compound
  • dopant material examples include the following dye materials, metal complex materials, polymer materials, and dopant materials.
  • dye-based materials include cyclopentamine derivatives, tetraphenylbutadiene derivative compounds, triphenylamine derivatives, oxadiazole derivatives, pyrazoloquinoline derivatives, distyrylbenzene derivatives, distyrylarylene derivatives, pyrrole derivatives, thiophene rings.
  • examples thereof include compounds, pyridine ring compounds, perinone derivatives, perylene derivatives, oligothiophene derivatives, trifumanylamine derivatives, oxadiazole dimers, and pyrazoline dimers.
  • metal complex materials include metal complexes having light emission from triplet excited states such as iridium complexes and platinum complexes, aluminum quinolinol complexes, benzoquinolinol beryllium complexes, benzoxazolyl zinc complexes, benzothiazole zinc complexes, Azomethylzinc complex, porphyrin zinc complex, europium complex, etc., which has Al, Zn, Be, etc. or rare earth metals such as Tb, Eu, Dy, etc. as the central metal, and oxadiazole, thiadiazole, phenylpyridine, phenyl as the ligand Examples thereof include metal complexes having benzimidazole, quinoline structure, and the like.
  • polymer materials include polyparaphenylene vinylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polysilane derivatives, polyacetylene derivatives, polyfluorene derivatives, polyvinyl carbazole derivatives, the above dye bodies and metal complex light emitting materials. And the like.
  • Examples of materials that emit blue light among the light emitting layer forming materials include distyrylarylene derivatives, oxadiazole derivatives, and polymers thereof, polyvinylcarbazole derivatives, polyparaphenylene derivatives, polyfluorene derivatives, and the like. Of these, polymer materials such as polyvinyl carbazole derivatives, polyparaphenylene derivatives, and polyfluorene derivatives are preferred.
  • examples of materials that emit green light among the light emitting layer forming materials include quinacridone derivatives, coumarin derivatives, and polymers thereof, polyparaphenylene vinylene derivatives, polyfluorene derivatives, and the like. Of these, polymer materials such as polyparaphenylene vinylene derivatives and polyfluorene derivatives are preferred.
  • examples of the material that emits red light among the light emitting layer forming materials include coumarin derivatives, thiophene ring compounds, and polymers thereof, polyparaphenylene vinylene derivatives, polythiophene derivatives, polyfluorene derivatives, and the like.
  • polymer materials such as polyparaphenylene vinylene derivatives, polythiophene derivatives, and polyfluorene derivatives are preferable.
  • a dopant can be added to the light emitting layer for the purpose of improving the light emission efficiency or changing the light emission wavelength.
  • dopants include perylene derivatives, coumarin derivatives, rubrene derivatives, quinacridone derivatives, squalium derivatives, porphyrin derivatives, styryl dyes, tetracene derivatives, pyrazolone derivatives, decacyclene, phenoxazone, and the like.
  • the thickness of the light emitting layer is usually 2 nm to 200 nm.
  • any known material can be used, such as an oxadiazole derivative, anthraquinodimethane or a derivative thereof, benzoquinone or a derivative thereof, naphthoquinone or a derivative thereof, anthraquinone or a derivative thereof, tetra Cyanoanthraquinodimethane or derivatives thereof, fluorenone derivatives, diphenyldicyanoethylene or derivatives thereof, diphenoquinone derivatives, or metal complexes of 8-hydroxyquinoline or derivatives thereof, polyquinoline or derivatives thereof, polyquinoxaline or derivatives thereof, polyfluorene or derivatives thereof Etc.
  • oxadiazole derivatives benzoquinone or derivatives thereof, anthraquinones or derivatives thereof, or metal complexes of 8-hydroxyquinoline or derivatives thereof, polyquinoline or derivatives thereof, polyquinoxaline or derivatives thereof, polyfluorene or derivatives thereof are preferred, 2- (4-biphenylyl) -5- (4-t-butylphenyl) -1,3,4-oxadiazole, benzoquinone, anthraquinone, tris (8-quinolinol) aluminum, and polyquinoline are more preferable.
  • Electrode injection layer Examples of materials constituting the electron injection layer include alkali metals and alkaline earth metals, alloys containing one or more of the metals, oxides of the metals, halides and carbonates, and mixtures of the substances. And is appropriately selected depending on the type of the light emitting layer.
  • alkali metal or its oxide, halide, carbonate examples include lithium, sodium, potassium, rubidium, cesium, lithium oxide, lithium fluoride, sodium oxide, sodium fluoride, potassium oxide, potassium fluoride, oxide
  • alkaline earth metals or oxides, halides and carbonates thereof include magnesium, calcium, barium, strontium, magnesium oxide, magnesium fluoride, calcium oxide, calcium fluoride, calcium fluoride, barium oxide, fluorine. Barium fluoride, strontium oxide, strontium fluoride, magnesium carbonate and the like.
  • a metal, metal oxide, organometallic compound doped with a metal salt, organometallic complex compound, or a mixture thereof can be used as a material for the electron injection layer.
  • the electron injection layer may have a laminated structure in which two or more layers are laminated, and specifically includes a layer structure such as Li / Ca.
  • the thickness of the electron injection layer is preferably about 1 nm to 1 ⁇ m.
  • a material for the cathode is preferably a material having a low work function, easy electron injection into the light emitting layer, and high electrical conductivity.
  • a material having a high visible light reflectance for the cathode include metals, metal oxides, alloys, graphite or graphite intercalation compounds, and inorganic semiconductors such as zinc oxide (ZnO).
  • alkali metal alkaline earth metal, transition metal, Group IIIb metal, or the like
  • metals include lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, gold, silver, platinum, copper, manganese, titanium, cobalt, nickel, tungsten, tin, and aluminum.
  • the alloy examples include an alloy containing at least one of the above metals. Specifically, a magnesium-silver alloy, a magnesium-indium alloy, a magnesium-aluminum alloy, an indium-silver alloy, a lithium-aluminum alloy, Examples thereof include a lithium-magnesium alloy, a lithium-indium alloy, and a calcium-aluminum alloy.
  • a transparent electrode is used for the cathode, and examples of the material of the transparent cathode include conductive oxides such as indium oxide, zinc oxide, tin oxide, ITO, and IZO. And conductive organic substances such as polyaniline or a derivative thereof, polythiophene or a derivative thereof, and the like.
  • the cathode may have a laminated structure of two or more layers.
  • the electron injection layer is used as a cathode.
  • the film thickness of the cathode may be appropriately selected in consideration of electric conductivity and durability, and is, for example, 10 nm to 10 ⁇ m, preferably 20 nm to 1 ⁇ m, and more preferably 50 nm to 500 nm.
  • the light emitting device preferably further includes an upper sealing film for protecting the organic EL element.
  • the upper sealing film is formed so as to cover each organic EL element from one side in the thickness direction of the substrate 2.
  • the upper sealing film is made of a material having a high barrier property against gas and liquid, and is usually formed by alternately laminating inorganic layers and organic layers.
  • the plastic substrate has higher gas and liquid permeability than the glass substrate.
  • a lower sealing film having a high barrier property against gas and liquid may be laminated on a plastic substrate, and then an organic EL element may be laminated on the lower sealing film.
  • the lower sealing film is usually formed with the same configuration and the same material as the upper sealing film.
  • a substrate made of any of the aforementioned substrate materials is prepared.
  • a plastic substrate having high gas and liquid permeability is used, a lower sealing film is formed on the substrate as necessary.
  • an anode is patterned on the prepared substrate using any of the anode materials described above.
  • a transparent electrode material such as ITO, IZO, tin oxide, zinc oxide, indium oxide, zinc aluminum composite oxide or the like is used as described above.
  • ITO thin film having a uniform thickness is deposited on the substrate by sputtering, and the ITO thin film is patterned into a stripe shape by photolithography, thereby forming an anode corresponding to the electrode 5.
  • the insulating film 6 is provided as necessary.
  • the insulating film 6 is made of an organic material such as a photosensitive resin.
  • a photoresist layer is formed by applying a photoresist on a substrate on which an anode is formed, and then a predetermined region is exposed through a mask and then developed to form a plurality of through holes 7. The Thereby, the insulating film 6 is formed.
  • polyimide, acrylic resin, and novolak resin photosensitive resins can be appropriately used as the photoresist.
  • a highly durable polyimide resin is preferably used.
  • the photoresist can be applied by a coating method using a spin coater, bar coater, roll coater, die coater, gravure coater, slit coater or the like.
  • the insulating film 6 may be made of an inorganic material such as SiO 2 or SiN.
  • a thin film made of an inorganic insulating material having a thickness of 0.1 to 0.2 ⁇ m is first formed on a substrate by a known method such as plasma CVD or sputtering, and a through hole 7 is formed at a predetermined position by photography. . Thereby, the insulating film 6 made of an inorganic material is formed.
  • the partition wall 3 is made of an organic material or an inorganic material, and can be easily formed by photolithography. Therefore, the partition wall 3 is preferably made of a photosensitive resin.
  • a photoresist layer is formed on the substrate on which the insulating film 6 has been formed by applying a photoresist. Further, a predetermined region is exposed through a mask and further developed to form a plurality of partition walls 3. At this time, by simultaneously removing the region where the groove 8 is formed, the groove 8 can be formed in the same process.
  • the insulating film 6 is not provided, the anode 4 is exposed in the partition wall 4.
  • polyimide, acrylic resin, and novolak resin photosensitive resins can be appropriately used as the photoresist.
  • a highly durable polyimide resin is preferably used.
  • the photoresist can be applied by a coating method using a spin coater, bar coater, roll coater, die coater, gravure coater, slit coater or the like.
  • a material exhibiting light shielding properties may be included in the photoresist.
  • the main role of the partition wall 3 is to prevent insulation between adjacent pixels partitioned by the partition wall 3 and to prevent color mixing between adjacent pixels partitioned by the partition wall 3.
  • the main role of the insulating film 6 is to insulate the pixels arranged along the longitudinal direction (row direction X) of the partition 3, and the insulating film 6 is adjacent to and partitioned by the partition 3. Does not have a function to prevent color mixture between pixels. Therefore, the height in the thickness direction Z of the insulating film 6 does not need to be as high as the height in the thickness direction Z of the partition walls 3 and is set to such an extent that electrical insulation can be secured.
  • the height in the thickness direction Z of the partition wall 3 is set to such an extent that the applied ink does not overflow beyond the partition wall when the ink described later is applied. From this reference, the height in the thickness direction Z of the partition walls 3 is preferably set to 0.1 ⁇ m or more, and more preferably set to 2 to 3 ⁇ m. The height in the thickness direction Z of the insulating film 6 is preferably set to 0.1 to 0.2 ⁇ m.
  • the width L1 of the partition walls 3 in the arrangement direction Y is usually 5 ⁇ m to 50 ⁇ m, preferably 10 ⁇ m to 30 ⁇ m.
  • the width L2 in the arrangement direction Y of the grooves 8 is set to a value that can accommodate the ink flowing into the grooves 8 in the process of supplying ink described later, and is usually 1 ⁇ m to 30 ⁇ m, preferably 5 ⁇ m to 30 ⁇ m. More preferably, it is 5 ⁇ m to 20 ⁇ m.
  • the surface of the partition wall 3 preferably exhibits liquid repellency with respect to the supplied ink, and more preferably exhibits liquid repellency than one electrode (anode).
  • anode one electrode
  • the lyophilicity of the ink is approximately the same as that of the anode 5 with reference to the anode 5, it is described as lyophilic and exhibits more lyophobic than the anode 5. In some cases, it is described as exhibiting liquid repellency.
  • the surfaces of the partition walls 3 are lyophilic, the ink supplied between the partition walls 4 spreads on the surface 3a (hereinafter sometimes referred to as the upper surface) facing the substrate side surface of the partition walls 3 and is adjacent to the partition walls.
  • the surface of the partition wall 3 exhibits liquid repellency
  • the ink is repelled on the upper surface of the partition wall 3, so that the ink supplied to the partition wall 4 flows into the adjacent partition wall 4. Can be prevented.
  • One method for imparting liquid repellency to the surface of the partition wall 3 is a surface treatment such as a plasma treatment.
  • a surface treatment such as a plasma treatment.
  • a method of modifying the surface by substituting a functional group of an organic material on the partition wall surface with fluorine is given. It is done.
  • liquid repellency can be imparted to the partition wall surface by converting the CF 4 gas into plasma using a vacuum plasma apparatus and subjecting the partition wall surface to plasma treatment.
  • liquid repellency is imparted to a member containing an organic substance. Therefore, the anode 5 made of an inorganic substance does not exhibit liquid repellency even after the plasma treatment. Therefore, ink is easily applied on the electrode.
  • by performing the process which provides liquid repellency to the partition 3 it can prevent that the ink supplied in the partition 3 overflows and flows into between adjacent partitions.
  • the liquid repellency is imparted to the organic member and the liquid repellency is not imparted to the inorganic member. Therefore, when the insulating film 6 is composed of the inorganic material, the insulating film 6 Indicates lyophilicity, and when the insulating film 6 is made of an organic material, it exhibits liquid repellency. Thus, the plasma treatment using CF 4 gas is preferable because it can selectively impart liquid repellency only to a member made of an organic substance.
  • both the partition 3 and the insulating film 6 exhibit liquid repellency.
  • a structure such as a wiring is formed on the insulating film 6.
  • This structure usually has a height in the thickness direction Z of 0.1 ⁇ m to 2 ⁇ m.
  • the organic layer tends to be thicker at the periphery than at the center, even if a structure is provided on the insulating film 6 by forming the insulating film 6 exhibiting liquid repellency. Since the ink is repelled on the insulating film 6, an organic layer having a uniform thickness can be formed regardless of the structure.
  • a liquid repellent substance may be added to the photosensitive material used when forming the partition wall.
  • a coating solution containing a component may be applied, or the liquid repellent component may be vaporized and deposited on the partition wall surface. It is preferable that the surface of the partition wall 3 exhibits liquid repellency with respect to all inks used when forming each layer of the organic EL element.
  • liquid repellent substance added to the photosensitive material for example, a silicone compound or a fluorine-containing compound is used. These liquid repellent substances can be preferably used because they exhibit liquid repellency with respect to ink containing materials such as a light emitting layer and a hole transport layer described later.
  • the hole injection layer and the hole transport layer described above are formed as necessary.
  • the method for forming the hole injection layer and the hole transport layer is not particularly limited, but an example of a film forming method using a low molecular material is a film forming method from a mixed solution with a polymer binder.
  • An example of a film formation method using a polymer material is a film formation method from a solution. That is, the hole injection layer or the hole transport layer is formed by applying an ink containing a material for the hole injection layer or the hole transport layer by a coating method and further drying.
  • polymer binder to be mixed those not extremely disturbing charge transport are preferable, and those that do not strongly absorb visible light are preferably used.
  • examples of such a polymer binder include polycarbonate, polyacrylate, polymethyl acrylate, polymethyl methacrylate, polystyrene, polyvinyl chloride, polysiloxane and the like.
  • the solvent for the ink used for film formation from a solution is not particularly limited as long as it can dissolve or disperse the material for the hole injection layer or the hole transport layer described above.
  • solvents include chloro solvents such as chloroform, methylene chloride, dichloroethane, ether solvents such as tetrahydrofuran, aromatic hydrocarbon solvents such as toluene and xylene, ketone solvents such as acetone and methyl ethyl ketone, ethyl acetate, Examples thereof include ester solvents such as butyl acetate and ethyl cellosolve acetate, and water.
  • FIG. 3 is a diagram schematically showing a step of forming a hole injection layer or a hole transport layer from a solution.
  • the relief printing plate 20 has a plurality of projections 21 arranged so as to correspond to the arrangement of the depressions 9 formed by the partition walls 3 and the substrate 2. Therefore, the plurality of convex portions 21 are disposed substantially parallel to each other.
  • the relief printing plate 20 is configured to include a plate cylinder and a printing plate that is wound around and fixed to the surface of the plate cylinder, and is arranged so that the axis coincides with the horizontal direction.
  • the relief printing plate 20 is, for example, a flexographic plate, and is made of a flexible material such as a photosensitive material (for example, an ultraviolet curable resin).
  • the relief printing plate 20 is provided with a plurality of projections 21 extending in the circumferential direction.
  • the substrate 2 is arranged so that the longitudinal direction of the partition wall 3 coincides with the coating direction, and ink containing a material for the hole injection layer or the hole transport layer is attached to the convex portion 21 of the relief printing plate 20.
  • the substrate 2 is conveyed in a direction opposite to the printing direction, whereby the ink attached to the protrusion 21 is transferred to the depression 9.
  • a hole injection layer or a hole transport layer can be formed by drying the ink supplied to the recess 9 and removing the solvent.
  • corresponds to an organic layer formation process.
  • the ratio of the material of the hole injection layer or the hole transport layer in the ink is usually 0.1% by weight to 10% by weight, preferably 1% by weight to 5% by weight.
  • the plurality of convex portions 21 are formed so as to extend in the axial direction of the relief printing plate and are provided at predetermined intervals in the circumferential direction, using the hole injection layer and the hole transport.
  • a layer may be formed.
  • a light emitting layer is formed.
  • the hole injection layer and the hole transport layer are not provided, the light emitting layer is formed in contact with the anode.
  • the light emitting layer is formed by supplying ink containing the material of the light emitting layer to the concave portion 9 using the same relief printing plate as described above.
  • the solvent used for film formation from a solution include toluene, xylene, acetone, anisole, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, or a mixed solvent thereof.
  • aromatic organic solvents such as toluene, xylene, and anisole are preferable because the light emitting material can be dissolved well.
  • the ink can be supplied by the same method as described above shown in FIG.
  • the ratio of the material of the light emitting layer in the ink is usually 0.1% to 10% by weight, preferably 1% to 5% by weight.
  • the light emitting layer is an organic layer containing an organic substance, and the step of forming the light emitting layer corresponds to the organic layer forming step.
  • a light-emitting device for color display it is necessary to sequentially provide light-emitting layers (R light-emitting layer, G light-emitting layer, and B light-emitting layer) that respectively emit red, green, and blue light in the row direction X.
  • the repeating units are sequentially arranged in the row direction X with three light emitting layers arranged in the row direction X in the order of the R emitting layer, the G emitting layer, and the B emitting layer as repeating units.
  • R ink three types of inks (hereinafter referred to as R ink, G ink, and B ink) containing light emitting materials that respectively emit red, green, and blue light are separately applied, for example, first, R ink Are applied at intervals of two rows, then G ink is applied at intervals of two rows, and B ink is applied at intervals of two rows. That is, different types of ink are supplied to the adjacent recesses 9.
  • organic luminescent ink may be added.
  • surfactant antioxidant, a viscosity modifier, a ultraviolet absorber, etc.
  • an electron transport layer, an electron injection layer, and the like are formed as necessary.
  • the formation method of the electron transport layer is not particularly limited, but examples of the formation method using a low molecular electron transport material include a vacuum deposition method from a powder or a film formation method from a solution or a molten state. Examples of the forming method using the molecular electron transport material include a film forming method from a solution or a molten state. In film formation from a solution or a molten state, a polymer binder may be used in combination.
  • a film formation method similar to the method for forming a hole transport layer from a solution described above can be used.
  • a relief printing method in the same manner as the method for forming the light emitting layer described above.
  • the electron injection layer is formed using a vapor deposition method, a sputtering method, a printing method, or the like.
  • the cathode is formed by using any of the above-described cathode materials by a vacuum deposition method, a sputtering method, a CVD method, an ion plating method, a laser ablation method, a laminating method for pressing a metal thin film, or the like.
  • a plurality of partition walls 3 are arranged substantially parallel to each other, and a groove portion 8 is formed along a longitudinal direction of the partition wall 3 on a surface 3a facing the substrate side surface of the partition wall 3.
  • the step of providing the substrate 2 includes (a) directly providing the substrate 2 itself having such a configuration, or (b) first providing the substrate 2 having no such configuration, and then applying the substrate 2. Any step of providing the substrate 2 having such a configuration by processing it to have the configuration may be used.
  • the ratio of the material of the organic layer in the ink is low, and therefore a large amount of ink is supplied to the concave portion 9 relative to the volume of the organic layer, so that the ink may overflow from the concave portion 9.
  • the overflowed ink flows into the groove 8 formed in the partition wall 3, so that the ink can be prevented from flowing into the adjacent recess 9.
  • the material of an organic layer means what becomes an organic layer after apply
  • the partition walls 3 exhibit liquid repellency, so that the ink is retained on the upper surface of the partition walls 3 so that the ink is held between the partition walls 4. Is repelled. As a result, the ink can be prevented from flowing out into the adjacent recesses 9.
  • the ink supplied to the recess 9 dries while being attracted to the partition wall 3, so that the thickness of the organic layer near the partition wall 3 is thicker than that of the central portion.
  • the ink supplied to the recess 9 dries while being repelled by the partition wall 3 exhibiting liquid repellency, so that an organic layer having a uniform film thickness can be formed.
  • the light emitting device of the present embodiment has a structure suitable for forming an organic layer using the above-described relief printing plate 20 because the groove portion 8 is formed in the partition wall 3.
  • the display device includes the light emitting device described above, and further includes a drive device that drives the light emitting device.
  • a drive device can selectively emit light by selectively applying a voltage to one electrode and the other electrode, whereby predetermined image information is displayed. Can do.
  • an active matrix light-emitting device may be configured using, for example, a TFT substrate. It may be configured.
  • the method for producing an organic electroluminescence element of the present invention is useful in, for example, production of a light emitting device and a display device in which color mixing is prevented, and efficient production of a light emitting device and a display device by a relief printing method.
  • the light-emitting device and the display device of the present invention are useful, for example, in that the color tone is excellent with the prevention of color mixing and that the device is efficiently manufactured by a relief printing method.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Printing Methods (AREA)

Abstract

L'invention porte sur un procédé de fabrication d'élément électroluminescent organique utilisant un procédé d'impression en relief apte à prévenir le mélange de couleurs survenant au cours de l’alimentation des encres. L'invention porte également sur un dispositif d'émission de lumière apte à prévenir le mélange de couleurs ainsi que sur un dispositif d'affichage comportant le dispositif d'émission de lumière. Le procédé permet de fabriquer un élément électroluminescent organique muni de deux électrodes entre lesquelles est disposée une couche organique. Le procédé consiste à se procurer un substrat dans lequel sont agencées plusieurs séparations sensiblement parallèles et se faisant face les unes aux autres et sur les surfaces opposées duquel sont formées des surfaces sur le côté substrat des séparations le long de la direction longitudinale des séparations ; puis à former la couche organique de telle sorte que les encres contenant le matériau de la couche organique sont alimentées vers des renfoncements formés par les séparations et le substrat par une plaque d'impression en relief, dans laquelle plusieurs saillies sont agencées sensiblement parallèlement les unes aux autres de façon à correspondre aux renfoncements.
PCT/JP2009/063214 2008-07-30 2009-07-23 Procédé de fabrication d'un élément électroluminescent organique, dispositif d'émission de lumière et dispositif d'affichage WO2010013641A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2009801299183A CN102113412A (zh) 2008-07-30 2009-07-23 有机电致发光元件的制造方法、发光装置及显示装置
US13/056,274 US20110121282A1 (en) 2008-07-30 2009-07-23 Manufacturing method of organic electroluminescence element, light-emitting device, and display device
EP09802884A EP2320712A1 (fr) 2008-07-30 2009-07-23 Procédé de fabrication d'un élément électroluminescent organique, dispositif d'émission de lumière et dispositif d'affichage

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JP2008195965A JP2010033931A (ja) 2008-07-30 2008-07-30 有機エレクトロルミネッセンス素子の製造方法、発光装置および表示装置
JP2008-195965 2008-07-30

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EP (1) EP2320712A1 (fr)
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CN107623082A (zh) * 2017-08-16 2018-01-23 上海天马微电子有限公司 一种有机电致发光显示面板及其制作方法、显示装置

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JP6519911B2 (ja) * 2012-08-02 2019-05-29 株式会社Ｊｏｌｅｄ 有機ｅｌ表示パネルとその製造方法
KR102059014B1 (ko) * 2013-05-28 2019-12-26 삼성디스플레이 주식회사 발광 표시 장치 및 그 제조 방법
KR102555403B1 (ko) * 2015-06-18 2023-07-13 엘지디스플레이 주식회사 유기 발광 다이오드 패널 및 이를 이용한 플렉서블 표시 장치
CN109315031B (zh) * 2016-06-15 2021-09-07 株式会社日本有机雷特显示器 显示装置和电子设备
JP6805221B2 (ja) * 2017-12-15 2020-12-23 株式会社Ｊｏｌｅｄ 有機ｅｌ表示パネル、有機ｅｌ表示装置、および、その製造方法
KR102693172B1 (ko) * 2018-09-28 2024-08-07 엘지디스플레이 주식회사 표시장치
CN113488571B (zh) * 2021-06-30 2023-07-04 上海天马微电子有限公司 一种显示面板及显示装置
CN113471352B (zh) * 2021-06-30 2023-03-10 上海天马微电子有限公司 一种显示面板及显示装置

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CN102113412A (zh) 2011-06-29
EP2320712A1 (fr) 2011-05-11
KR20110039295A (ko) 2011-04-15
JP2010033931A (ja) 2010-02-12
TW201014451A (en) 2010-04-01

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