WO2010007036A3 - Optische einrichtung mit einem deformierbaren optischen element - Google Patents
Optische einrichtung mit einem deformierbaren optischen element Download PDFInfo
- Publication number
- WO2010007036A3 WO2010007036A3 PCT/EP2009/058943 EP2009058943W WO2010007036A3 WO 2010007036 A3 WO2010007036 A3 WO 2010007036A3 EP 2009058943 W EP2009058943 W EP 2009058943W WO 2010007036 A3 WO2010007036 A3 WO 2010007036A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical
- optical element
- supporting structure
- optical module
- deformable
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
Die vorliegende Erfindung betrifft eine optische Einrichtung (108), insbesondere für die Mikrolithographie, mit einem optischen Modul (109) und einer Stützstruktur (110), wobei die Stützstruktur das optische Modul abstützt. Das optische Modul umfasst ein optisches Element (107.1) und eine Halteeinrichtung (111), wobei die Halteeinrichtung das optische Element hält. Die Halteeinrichtung umfasst eine Deformationseinrichtung (114) mit einer Mehrzahl von aktiven Deformationseinheiten (114.1), welche das optische Element kontaktieren und dazu ausgebildet sind, dem optischen Element eine definierte Verformung aufzuprägen. Das optische Modul ist austauschbar an der Stützstruktur befestigt.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011517893A JP5559165B2 (ja) | 2008-07-14 | 2009-07-14 | 変形可能な光学素子を有する光学装置 |
US13/004,470 US9217936B2 (en) | 2008-07-14 | 2011-01-11 | Optical device having a deformable optical element |
US14/969,703 US9798243B2 (en) | 2008-07-14 | 2015-12-15 | Optical device having a deformable optical element |
US15/789,375 US20180120710A1 (en) | 2008-07-14 | 2017-10-20 | Optical device having a deformable optical element |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8042308P | 2008-07-14 | 2008-07-14 | |
DE102008032853.7 | 2008-07-14 | ||
DE200810032853 DE102008032853A1 (de) | 2008-07-14 | 2008-07-14 | Optische Einrichtung mit einem deformierbaren optischen Element |
US61/080,423 | 2008-07-14 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/004,470 Continuation US9217936B2 (en) | 2008-07-14 | 2011-01-11 | Optical device having a deformable optical element |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2010007036A2 WO2010007036A2 (de) | 2010-01-21 |
WO2010007036A3 true WO2010007036A3 (de) | 2010-06-10 |
Family
ID=41427068
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/058943 WO2010007036A2 (de) | 2008-07-14 | 2009-07-14 | Optische einrichtung mit einem deformierbaren optischen element |
Country Status (4)
Country | Link |
---|---|
US (3) | US9217936B2 (de) |
JP (4) | JP5559165B2 (de) |
DE (1) | DE102008032853A1 (de) |
WO (1) | WO2010007036A2 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008032853A1 (de) | 2008-07-14 | 2010-01-21 | Carl Zeiss Smt Ag | Optische Einrichtung mit einem deformierbaren optischen Element |
WO2012084675A1 (en) * | 2010-12-20 | 2012-06-28 | Carl Zeiss Smt Gmbh | Arrangement for mounting an optical element |
DE102011007917A1 (de) * | 2011-04-21 | 2012-10-25 | Asml Netherlands B.V. | Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage |
DE102012206545A1 (de) * | 2012-04-20 | 2013-03-21 | Carl Zeiss Smt Gmbh | Optische Anordnung mit einstellbarer Kraftwirkung auf ein optisches Modul |
JP5989233B2 (ja) * | 2012-05-24 | 2016-09-07 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置およびデバイス製造方法 |
DE102013225694A1 (de) * | 2013-12-12 | 2014-12-24 | Carl Zeiss Smt Gmbh | Optisches modul |
JP6336274B2 (ja) * | 2013-12-25 | 2018-06-06 | キヤノン株式会社 | 光学装置、投影光学系、露光装置、および物品の製造方法 |
WO2015173363A1 (de) * | 2014-05-14 | 2015-11-19 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit feldnahem manipulator |
CN108292099B (zh) * | 2015-12-03 | 2021-07-06 | 卡尔蔡司Smt有限责任公司 | 具有主动可调整的度量支撑单元的光学成像布置 |
DE102017200793A1 (de) * | 2017-01-19 | 2018-01-11 | Carl Zeiss Smt Gmbh | Spiegelsystem und Projektionsbelichtungsanlage |
DE102017207433A1 (de) | 2017-05-03 | 2018-04-19 | Carl Zeiss Smt Gmbh | Abstützung eines optischen Elements |
DE102018207454A1 (de) * | 2018-05-15 | 2019-05-29 | Carl Zeiss Smt Gmbh | Aktuatoranordnung, Projektionsbelichtungsanlage und Waferinspektionsanlage für die Halbleiterlithographie |
WO2020207684A1 (en) * | 2019-04-10 | 2020-10-15 | Asml Netherlands B.V. | An object positioning system, diagnostic and calibration methods, positioning control method, lithographic apparatus and device manufacturing method |
DE102019218609A1 (de) * | 2019-11-29 | 2021-06-02 | Carl Zeiss Smt Gmbh | Abstützung einer optischen einheit |
EP3961305A3 (de) | 2020-06-29 | 2022-03-09 | Carl Zeiss SMT GmbH | Kompensation von kriecheffekten in einer abbildungseinrichtung |
EP3964893A1 (de) | 2020-06-29 | 2022-03-09 | Carl Zeiss SMT GmbH | Kompensation von kriecheffekten in einer abbildungseinrichtung |
DE102021205808A1 (de) | 2020-06-29 | 2021-12-30 | Carl Zeiss Smt Gmbh | Kompensation von kriecheffekten in einer abbildunsgseinrichtung |
DE102020212927A1 (de) * | 2020-10-14 | 2022-04-14 | Carl Zeiss Smt Gmbh | Abstützung eines optischen elements |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0964281A1 (de) * | 1998-06-09 | 1999-12-15 | Carl Zeiss | Baugruppe aus optischem Element und Fassung |
DE19859634A1 (de) * | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
US20010033437A1 (en) * | 2000-04-25 | 2001-10-25 | Silicon Valley Group, Inc. | Apparatus, system, and method for precision positioning and alignment of a lens in an optical system |
US20030234918A1 (en) * | 2002-06-20 | 2003-12-25 | Nikon Corporation | Adjustable soft mounts in kinematic lens mounting system |
US20040008433A1 (en) * | 2002-06-21 | 2004-01-15 | Nikon Corporation | Wavefront aberration correction system |
US20060082907A1 (en) * | 2004-10-18 | 2006-04-20 | Canon Kabushiki Kaisha | Optical element holding system, barrel, exposure apparatus, and device manufacturing method |
WO2006119970A2 (en) * | 2005-05-09 | 2006-11-16 | Carl Zeiss Smt Ag | Assembly for adjusting an optical element |
US20070014038A1 (en) * | 2001-08-18 | 2007-01-18 | Klaus Beck | Adjustment arrangement of an optical element |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6398373B1 (en) * | 2000-08-09 | 2002-06-04 | Asml Us, Inc. | Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems |
DE10151919B4 (de) | 2001-10-20 | 2007-02-01 | Carl Zeiss Smt Ag | Belichtungsobjektiv in der Halbleiterlithographie |
EP1345082A1 (de) | 2002-03-15 | 2003-09-17 | ASML Netherlands BV | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
JP4565261B2 (ja) * | 2002-06-24 | 2010-10-20 | 株式会社ニコン | 光学素子保持機構、光学系鏡筒及び露光装置 |
JP2004327529A (ja) | 2003-04-22 | 2004-11-18 | Canon Inc | 露光装置 |
US7265917B2 (en) * | 2003-12-23 | 2007-09-04 | Carl Zeiss Smt Ag | Replacement apparatus for an optical element |
JP2006245085A (ja) * | 2005-03-01 | 2006-09-14 | Nikon Corp | 投影光学系、投影光学系の調整方法、露光装置、および露光方法 |
DE102006022957A1 (de) * | 2005-05-16 | 2006-11-23 | WITTE, WELLER & PARTNER Patentanwälte | Optische Vorrichtung mit einem optischen Bauelement und mit einer Verstelleinrichtung und Verfahren zur Beeinflussung eines Polarisationszustands des optischen Bauelements |
US8717534B2 (en) * | 2005-06-20 | 2014-05-06 | Carl Zeiss Smt Gmbh | Lens comprising a plurality of optical element disposed in a housing |
JP5069232B2 (ja) * | 2005-07-25 | 2012-11-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の投影対物レンズ |
WO2007022922A2 (de) * | 2005-08-23 | 2007-03-01 | Carl Zeiss Smt Ag | Austauschvorrichtung für ein optisches element |
JP2007103657A (ja) | 2005-10-04 | 2007-04-19 | Canon Inc | 光学素子保持装置、露光装置およびデバイス製造方法 |
JP2007281079A (ja) * | 2006-04-04 | 2007-10-25 | Canon Inc | 光学要素駆動装置及び基板露光装置 |
JP2007316132A (ja) * | 2006-05-23 | 2007-12-06 | Canon Inc | 反射装置 |
EP1882983A1 (de) * | 2006-07-25 | 2008-01-30 | Carl Zeiss SMT AG | Halterung mit Schwerkraftausgleich für ein optisches Element |
DE102006047666A1 (de) * | 2006-09-28 | 2008-04-03 | Carl Zeiss Smt Ag | Projektionsobjektiv für eine Mikrolithographieanlage mit verbesserten Abbildungseigenschaften und Verfahren zum Verbessern der Abbildungseigenschaften des Projektionsobjektives |
JP2008107667A (ja) * | 2006-10-27 | 2008-05-08 | Canon Inc | 光学要素の保持装置並びにその調整方法及びそれを備えた露光装置 |
DE102006050835A1 (de) * | 2006-10-27 | 2008-05-08 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zum Austausch von Objetkivteilen |
DE102007058158A1 (de) * | 2006-12-01 | 2008-06-05 | Carl Zeiss Smt Ag | Optisches System mit einer austauschbaren, manipulierbaren Korrekturanordnung zur Reduzierung von Bildfehlern |
DE102007014155A1 (de) * | 2007-03-20 | 2008-09-25 | Jenoptik Laser, Optik, Systeme Gmbh | Optikfassung und optisches Bauelement mit einer derartigen Optikfassung |
US7589921B2 (en) * | 2007-08-23 | 2009-09-15 | Carl Zeiss Smt Ag | Actuator device |
JP2010021535A (ja) * | 2008-06-11 | 2010-01-28 | Canon Inc | 変形機構、露光装置およびデバイス製造方法 |
DE102008032853A1 (de) | 2008-07-14 | 2010-01-21 | Carl Zeiss Smt Ag | Optische Einrichtung mit einem deformierbaren optischen Element |
-
2008
- 2008-07-14 DE DE200810032853 patent/DE102008032853A1/de not_active Ceased
-
2009
- 2009-07-14 JP JP2011517893A patent/JP5559165B2/ja active Active
- 2009-07-14 WO PCT/EP2009/058943 patent/WO2010007036A2/de active Application Filing
-
2011
- 2011-01-11 US US13/004,470 patent/US9217936B2/en active Active
-
2014
- 2014-06-05 JP JP2014116854A patent/JP5960752B2/ja active Active
-
2015
- 2015-12-15 US US14/969,703 patent/US9798243B2/en active Active
-
2016
- 2016-06-23 JP JP2016124114A patent/JP6306095B2/ja active Active
-
2017
- 2017-10-20 US US15/789,375 patent/US20180120710A1/en not_active Abandoned
-
2018
- 2018-03-07 JP JP2018040911A patent/JP2018116294A/ja active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0964281A1 (de) * | 1998-06-09 | 1999-12-15 | Carl Zeiss | Baugruppe aus optischem Element und Fassung |
DE19859634A1 (de) * | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
US20010033437A1 (en) * | 2000-04-25 | 2001-10-25 | Silicon Valley Group, Inc. | Apparatus, system, and method for precision positioning and alignment of a lens in an optical system |
US20070014038A1 (en) * | 2001-08-18 | 2007-01-18 | Klaus Beck | Adjustment arrangement of an optical element |
US20030234918A1 (en) * | 2002-06-20 | 2003-12-25 | Nikon Corporation | Adjustable soft mounts in kinematic lens mounting system |
US20040008433A1 (en) * | 2002-06-21 | 2004-01-15 | Nikon Corporation | Wavefront aberration correction system |
US20060082907A1 (en) * | 2004-10-18 | 2006-04-20 | Canon Kabushiki Kaisha | Optical element holding system, barrel, exposure apparatus, and device manufacturing method |
WO2006119970A2 (en) * | 2005-05-09 | 2006-11-16 | Carl Zeiss Smt Ag | Assembly for adjusting an optical element |
Also Published As
Publication number | Publication date |
---|---|
US9217936B2 (en) | 2015-12-22 |
US9798243B2 (en) | 2017-10-24 |
JP5559165B2 (ja) | 2014-07-23 |
US20110299053A1 (en) | 2011-12-08 |
JP2014232878A (ja) | 2014-12-11 |
JP2011528181A (ja) | 2011-11-10 |
JP5960752B2 (ja) | 2016-08-02 |
WO2010007036A2 (de) | 2010-01-21 |
DE102008032853A1 (de) | 2010-01-21 |
JP2018116294A (ja) | 2018-07-26 |
US20160209752A1 (en) | 2016-07-21 |
US20180120710A1 (en) | 2018-05-03 |
JP2016191936A (ja) | 2016-11-10 |
JP6306095B2 (ja) | 2018-04-04 |
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